Partitioned controllable PECVD (Plasma Enhanced Chemical Vapor Deposition) Showerhead structure
By setting multiple baffles and gas equalization plates within the PECVD Showerhead structure, precise control and uniform diffusion of gas flow are achieved, solving the problem of uneven film thickness and achieving a uniform film thickness.
Patent Information
- Application Number
- CN202520306632.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-25
- Publication Date
- 2026-01-16
- Estimated Expiration
- 2035-02-25
AI Technical Summary
In existing PECVD showerhead structures, gas control is singular and imprecise, resulting in uneven film thickness.
A partitioned controllable PECVD Showerhead structure is designed, which divides the box-shaped cavity into multiple regions by setting multiple baffles. Each region is connected to an independent air inlet pipe, and a gas equalization plate and flow controller are set in the region to achieve precise control of gas flow and uniform diffusion.
It enables precise control of gas flow rate in different regions, improves gas concentration uniformity, and ensures uniform deposition of film thickness.
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Figure CN223805146U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to PECVD equipment technical field especially relates to a partition controllable PECVD showerhead structure. BACKGROUND
[0002] The existing showerhead part is composed of the box-shaped cavity structure of the upper gas groove plate, the lower spray plate and the peripheral baffle. The process gas flows into the gas groove plate center from a pipeline and diffuses to each area of the gas groove plate along the gas flow channel in the gas groove plate, and then flows into the cavity of the showerhead part through the gas holes designed in the gas flow channel, and then flows into the process cavity chemical reaction area through the showerhead.
[0003] Due to the simple structure, the following defects exist:
[0004] 1. The gas inlet pipeline is one, the gas control is single and not accurate enough;
[0005] 2. The gas diffuses from the center to the periphery along the gas flow channel in the gas groove plate, so that the gas concentration in the cavity center area is the highest when the gas flows into the cavity of the showerhead part, and the concentration at the edge position in the cavity is the lowest. Since the gas concentration in the cavity is already uneven, the thickness of the film deposited after the gas flows into the reaction area through the showerhead and undergoes chemical reaction is uneven. INVENTION CONTENTS
[0006] Therefore, the utility model discloses a partition controllable PECVD showerhead structure to solve the problems in the background art.
[0007] In order to achieve the above purpose, the utility model provides a partition controllable PECVD showerhead structure, which comprises the box-shaped cavity structure of the upper gas groove plate, the lower spray plate and the peripheral baffle, the inside of the box-shaped cavity structure is provided with a plurality of back-shaped baffles along the horizontal direction, each baffle divides the inside of the box-shaped cavity structure into an area, the side of the gas groove plate away from the spray plate is communicated with a plurality of gas inlet pipelines, each gas inlet pipeline is communicated with an area, an air uniformizing plate is arranged in each area, and the air uniformizing plate is provided with interlaced gas holes.
[0008] Preferably, the number of air uniformizing plates is multiple, and the multiple air uniformizing plates are arranged in the vertical direction.
[0009] Preferably, the gas hole density of the air uniformizing plate is adjustable in the area of the box-shaped cavity structure.
[0010] Preferably, a flow controller is connected to each of the gas inlet pipes.
[0011] Preferably, a control system is further included, which is electrically connected to all the flow controllers.
[0012] The utility model discloses the beneficial effect:
[0013] 1, each gas pipeline corresponds the region in box -like cavity structure, can accurate control the gas flow required in different regions.
[0014] 2, by being provided with multiple air distribution plates, by the different gas hole density of the interlaced gas hole and different region, the diffusion of gas in box -like cavity structure is enhanced, and the uniformity of gas concentration in cavity is improved.
[0015] 3, by the baffle, the box -like cavity structure is divided into multiple regions in horizontal direction, and the gas concentration in different regions can be set to be same or different according to the thickness of deposited film, and finally the purpose of the thickness of deposited film is uniform. DRAWINGS
[0016] In order to more clearly illustrate the technical scheme in the utility model or the prior art, the following will briefly introduce the drawing needed to be used in embodiment or prior art description, and obviously, the drawing in the following description is only the utility model, and for those skilled in the art, other drawings can also be obtained according to these drawings without creative labor.
[0017] Fig. 1 It is a top view structural schematic diagram of the embodiment of the utility model zone controllable PECVD showerhead structure;
[0018] Fig. 2 It is a front view schematic diagram of the embodiment of the utility model zone controllable PECVD showerhead structure;
[0019] Fig. 3 It is a partial schematic diagram of the embodiment of the utility model zone controllable PECVD showerhead structure.
[0020] Marked in the drawing as:
[0021] 1, gas groove plate;2, spray plate;3, baffle;4, baffle;5, gas inlet pipe;6, air distribution plate;7, flow controller;8, control system. SPECIFIC EMBODIMENT
[0022] In order to make the purpose, technical scheme and advantage of the utility model more clearly, the following is further in detail to the utility model with specific embodiment.
[0023] It should be noted that, unless otherwise defined, technical terms or scientific terms used in the present application should be understood as their common meanings to those skilled in the art to which the present application pertains. The terms "first", "second", and similar terms used in the present application do not represent any order, number, or importance, but are only used to distinguish different components. The terms "include" or "contain" and similar terms mean that the elements or objects before the terms encompass the elements or objects listed after the terms and their equivalents, without excluding other elements or objects. The terms "connect" or "connected" and similar terms are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. The terms "upper", "lower", "left", "right", and the like are only used to represent relative positional relationships, which can change accordingly when the absolute positions of the described objects change.
[0024] As shown in Figs. 1-3 A partition controllable PECVD showerhead structure, comprising a box-shaped cavity structure composed of an upper gas groove plate 1, a lower spray plate 2, and a peripheral baffle 3, a plurality of meandering partitions 4 are arranged in the horizontal direction inside the box-shaped cavity structure, each of the partitions 4 divides the inside of the box-shaped cavity structure into a region, a plurality of gas inlet pipes 5 are connected to the side of the gas groove plate 1 away from the spray plate 2, each of the gas inlet pipes 5 is arranged in communication with a region, and a gas distribution plate 6 is arranged in each region, and the gas distribution plate 6 is provided with gas holes that are staggered with each other.
[0025] As an optional embodiment, the number of the gas distribution plates 6 is multiple, and the multiple gas distribution plates 6 are arranged in the vertical direction.
[0026] As an optional embodiment, the gas hole density of the gas distribution plate 6 is adjustable according to the region in the box-shaped cavity structure where the gas hole is located.
[0027] As an optional embodiment, a flow controller 7 is connected to each of the gas inlet pipes 5.
[0028] As an optional embodiment, a control system 8 is further included, and the control system 8 is electrically connected to all the flow controllers 7.
[0029] The main working principle of the utility model discloses is: control system 8 controls the flow of flow controller 7, thereby controlling the gas flow of each inlet gas pipeline 5, process gas flows into gas groove plate 1 from the center of gas groove plate 1 through multiple inlet gas pipelines 5, each inlet gas pipeline 5 corresponds to a region in the box-shaped cavity structure of showerhead component, the gas in each inlet gas pipeline 5 diffuses to different regions of gas groove plate 1 along the respective flow channels in gas groove plate 1, then flows out of gas groove plate 1 through the gas holes designed in the gas flow channel, and then enters the process cavity chemical reaction region after flowing through multiple uniform gas plates 6 and spray plates 2, the gas flow of different regions can not only be accurately controlled, but also be controlled according to steps or sequences, three regions can have multiple step and sequence control modes in the arrangement combination mode, the gas flow of each region can be controlled at the same time, and the purpose of uniform deposition film thickness is finally achieved.
[0030] Those skilled in the art should understand: the discussion of the above any embodiment is only exemplary, and is not intended to imply that the scope of the present application is limited to these examples; under the idea of the present application, the above embodiments or technical features in different embodiments can also be combined, the steps can be implemented in any order, and there are many other changes of different aspects of the present application as described above. In order to be brief, they are not provided in details. Any omission, modification, equivalent replacement, improvement, etc. within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims
1. A partition-controllable PECVD showerhead structure, comprising a box-shaped cavity structure composed of an upper gas groove plate (1), a lower shower plate (2), and a peripheral baffle plate (3), characterized in that, The inside of the box-shaped cavity structure is provided with a plurality of back-shaped partitions (4) in the horizontal direction, each of the partitions (4) divides the inside of the box-shaped cavity structure into a region, the air channel plate (1) is communicated with a plurality of air inlet pipes (5) away from the side of the spray plate (2), each of the air inlet pipes (5) is respectively communicated with a region, and each of the regions is provided with an air uniformizing plate (6), and the air uniformizing plate (6) is provided with air holes staggered with each other.
2. A zoned controllable PECVD showerhead structure according to claim 1, wherein, The number of the air uniformizing plates (6) is multiple, and the multiple air uniformizing plates (6) are arranged in the vertical direction.
3. The zoned controllable PECVD showerhead structure of claim 1, wherein, The air hole density of the air uniformizing plate (6) is adjusted and arranged through the region in the box-shaped cavity structure where the air hole is located.
4. The zoned controllable PECVD showerhead structure of claim 1, wherein, Each of the air inlet pipes (5) is connected with a flow controller (7).
5. A zoned controllable PECVD showerhead structure according to claim 4, wherein, Further comprising a control system (8), and the control system (8) is electrically connected with all the flow controllers (7).
