Electron beam irradiation apparatus

Abstract

To provide an electron beam irradiation apparatus that can achieve both maintainability of a window part of an electron beam source and shielding performance against X-rays during electron beam irradiation.SOLUTION: An electron beam irradiation apparatus 1 comprises: an electron beam irradiation unit 10; and a target support unit 50. The electron beam irradiation unit 10 includes: an electron beam source 11; and a first wall 12 in which a first opening 12c is formed. The first opening 12c accommodates a window part 4 of the electron beam source 11. The target support unit 50 includes: a support part 51; and a second wall 52 in which a second opening 52c is formed. A protrusion 61 including the first opening 12c is provided on a surface 12b of the first wall 12. A recess 62 including the second opening 52c is provided on a surface 52a of the second wall 52. In a state where the first wall 12 and the second wall 52 are in contact with each other, the surface 12b and the surface 52a are in contact with each other, and the recess 62 and the protrusion 61 are fitted with each other.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an electron beam irradiation device. [Background technology]

[0002] An electron beam irradiation device is a device that irradiates an object with an electron beam, and is used for purposes such as drying ink on the object, sterilizing the object, modifying the object, etc. Patent Document 1 describes an electron beam irradiation device that includes a roller that feeds a web (film-like object) and an electron beam source having a window that emits electron beams, in which the roller facing the window of the electron beam source is configured to be able to be further separated from that state. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication No. 2010 / 104820 Summary of the Invention [Problem to be solved by the invention]

[0004] In the electron beam irradiation device described in Patent Document 1, when performing maintenance on the window part of the electron beam source (e.g., replacing the window part), the rollers are moved away from the window part, so that the space required for the maintenance of the window part can be secured. However, in the electron beam irradiation device described in Patent Document 1, since there are many open areas in the irradiation area of ​​the electron beam, it is difficult to sufficiently block the X-rays that are generated secondarily during the irradiation of the electron beam. Note that such X-rays are generated by the interaction of the electron beam with each member constituting the window part of the electron beam source, the gas existing outside the window part, the target object, etc.

[0005] An object of the present invention is to provide an electron beam irradiation apparatus capable of ensuring both the ease of maintenance of the window portion of the electron beam source and the shielding properties of X-rays during irradiation of the electron beam. [Means for solving the problem]

[0006] The electron beam irradiation device of the present invention is provided with: [1] "an electron beam irradiation unit and an object support unit, the electron beam irradiation unit having an electron beam generating section that generates an electron beam, a housing that houses the electron beam generating section, and an electron beam source that is provided in the housing and has a window section that emits the electron beam, and a first wall section that is arranged on the object support unit side with respect to the electron beam source and has a first opening that houses at least a part of the window section, the object support unit having a support section that supports an object, and a second wall section that is arranged on the electron beam irradiation unit side with respect to the support section and faces the first opening, and a second wall portion having a second opening formed therein that fits in with the first opening, wherein a first surface of the first wall portion facing the object support unit side has one of a recess and a protrusion including the first opening, and a second surface of the second wall portion facing the electron beam irradiation unit side has the other of the recess and the protrusion including the second opening, wherein the first wall portion and the second wall portion are separable from each other, and when the first wall portion and the second wall portion are in contact with each other, the first surface and the second surface are in contact with each other, and the recess and the protrusion are fitted in with each other.

[0007] In the electron beam irradiation device described in [1] above, the first opening of the first wall in the electron beam irradiation unit accommodates at least a part of the window of the electron beam source, and the first wall of the electron beam irradiation unit and the second wall of the object support unit can be separated from each other. Therefore, when performing maintenance on the window of the electron beam source, the first wall and the second wall can be separated from each other to ensure a space required for maintenance of the window. In addition, when the first wall and the second wall are in contact with each other, the first surface of the first wall and the second surface of the second wall are in contact with each other, and the recess and the protrusion fit into each other between the first wall and the second wall. As a result, the area between the first wall and the second wall is bent, so that X-rays generated secondarily during irradiation of the electron beam can be reliably shielded compared to a configuration in which the area between the first wall and the second wall is flat and wide. Therefore, according to the electron beam irradiation device described in [1] above, it is possible to ensure both the maintainability of the window of the electron beam source and the shielding of X-rays during irradiation of the electron beam.

[0008] The electron beam irradiation device of the present invention may be [2] "the electron beam irradiation device according to the above [1], in which the first surface is provided with the convex portion including the first opening, and the second surface is provided with the concave portion including the second opening." According to the electron beam irradiation device according to [2], the part of the first wall surrounding the first opening can be thickened, so that X-rays generated secondarily during irradiation of the electron beam can be reliably shielded compared to a configuration in which the first surface of the first wall is provided with a concave portion and the second surface of the second wall is provided with a convex portion. In addition, since the first opening that houses at least a part of the window portion of the electron beam source is formed in the convex portion, the window portion can be brought closer to the support portion of the object support unit, so that the electron beam can be efficiently irradiated to the object. Furthermore, since the first opening that houses at least a part of the window portion of the electron beam source is formed in the convex portion, the window portion can be easily accessed during maintenance of the window portion compared to a configuration in which the first opening is formed in the concave portion.

[0009] The electron beam irradiation device of the present invention may be the electron beam irradiation device described in [2] above, [3] "wherein the electron beam irradiation unit further has a cover that is detachable from the first wall, the cover being disposed at an end of the first opening on the object support unit side and covering a gap formed between a side surface of the window and a side surface of the first opening." According to the electron beam irradiation device described in [3], by removing the cover from the first wall during maintenance, the gap can be utilized to more easily replace the window. Note that, since the gap is covered by the cover during electron beam irradiation, leakage of X-rays through the gap can be suppressed.

[0010] The electron beam irradiation device of the present invention may be [4] "the electron beam irradiation device according to the above [3], in which the top surface of the convex portion, the surface of the window portion facing the object support unit, and the surface of the cover facing the object support unit are located on the same plane." According to the electron beam irradiation device according to [6], it is easy to bring the bottom surface of the recess and the top surface of the convex portion close to each other, thereby improving the shielding property against X-rays during irradiation with electron beams. Effect of the Invention

[0011] According to the present invention, it is possible to provide an electron beam irradiation device that can ensure both the ease of maintenance of the window portion of the electron beam source and the shielding properties of X-rays during irradiation of the electron beam. [Brief description of the drawings]

[0012] [Figure 1] FIG. 2 is a cross-sectional view of an electron beam irradiation apparatus according to an embodiment. [Diagram 2] FIG. 2 is a perspective view of the electron beam source shown in FIG. [Diagram 3] FIG. 3 is a perspective view of the internal structure of the electron beam source shown in FIG. 2. [Figure 4] 4 is a cross-sectional view of the electron beam source taken along line IV-IV shown in FIG. 2. [Diagram 5] FIG. 3 is a perspective view of the window unit shown in FIG. 2. [Figure 6] FIG. 6 is a plan view of the window unit shown in FIG. 5. [Figure 7] 7 is a cross-sectional view of the window unit taken along line VII-VII shown in FIG. 5. [Figure 8] 2 is a cross-sectional view of a portion of the electron beam irradiation apparatus shown in FIG. 1. [Figure 9] 2 is a cross-sectional view of a portion of the electron beam irradiation apparatus shown in FIG. 1. [Figure 10] FIG. 11 is a cross-sectional view of a modified example of an electron beam irradiation device. [Figure 11] FIG. 11 is a cross-sectional view of a modified example of an electron beam irradiation device. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0013] Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings. In each drawing, the same or corresponding parts are denoted by the same reference numerals, and duplicated explanations will be omitted. [Configuration of electron beam irradiation equipment]

[0014] As shown in FIG. 1, the electron beam irradiation device 1 includes an electron beam irradiation unit 10 and an object support unit 50. The electron beam irradiation unit 10 includes an electron beam source 11, a first wall 12, a first shield 13, and a second shield 14. The object support unit 50 includes a support unit 51 and a second wall 52. Hereinafter, the direction in which the electron beam irradiation unit 10 and the object support unit 50 are arranged is referred to as the Z-axis direction, a direction perpendicular to the Z-axis direction is referred to as the X-axis direction, and a direction perpendicular to both the Z-axis direction and the X-axis direction is referred to as the Y-axis direction. In this embodiment, the Z-axis direction is a vertical direction, but the Z-axis direction may be a direction other than the vertical direction. That is, in this embodiment, each of the X-axis direction and the Y-axis direction is a horizontal direction, but each of the X-axis direction and the Y-axis direction may be a direction other than the horizontal direction.

[0015] The electron beam source 11 has an electron beam generation unit 2, a housing 3, and a window 4. The electron beam generation unit 2 generates an electron beam EB. The housing 3 contains the electron beam generation unit 2. The window 4 is provided in the housing 3. The window 4 emits the electron beam EB emitted from the electron beam generation unit 2. In this embodiment, the window 4 is provided in a portion of the housing 3 on the object support unit 50 side, and emits the electron beam EB toward the object support unit 50 side.

[0016] The first wall 12 is disposed on the object support unit 50 side with respect to the electron beam source 11. The first wall 12 has a pair of surfaces 12a, 12b. The surface 12a is the surface opposite to the object support unit 50. The surface (first surface) 12b is the surface on the object support unit 50 side. A first opening 12c is formed in the first wall 12. The first opening 12c is a through hole that opens on both sides of the first wall 12 in the Z-axis direction. The electron beam source 11 is attached to the first wall 12 with the window 4 disposed in the first opening 12c. In other words, the first wall 12 supports the electron beam source 11 with the first opening 12c housing the window 4. The first wall 12 is formed of a material that attenuates X-rays, for example, a metal.

[0017] The first shielding body 13 surrounds the housing 3 of the electron beam source 11 via a space. In this embodiment, the first shielding body 13 surrounds the housing 3 on the first wall portion 12. As an example, the first shielding body 13 is a box-shaped structure attached to the surface 12a of the first wall portion 12. The first shielding body 13 is formed of a material that attenuates X-rays, such as a metal.

[0018] The second shielding body 14 surrounds the first shielding body 13 via a space. In this embodiment, the second shielding body 14 surrounds the first shielding body 13 on the first wall portion 12. As an example, the second shielding body 14 is a box-shaped structure attached to the surface 12a of the first wall portion 12. The second shielding body 14 is formed of a material that attenuates X-rays, such as a metal.

[0019] The support unit 51 supports the object S. In this embodiment, the support unit 51 is configured with an actuator 511 and a support base 512. In this embodiment, the support base 512 on which the object S is placed is moved in the X-axis direction by the actuator 511.

[0020] The second wall 52 is disposed on the electron beam irradiation unit 10 side with respect to the support 51. The second wall 52 has a pair of surfaces 52a, 52b. The surface (second surface) 52a is the surface on the electron beam irradiation unit 10 side. The surface 52b is the surface on the opposite side to the electron beam irradiation unit 10. The second wall 52 has a second opening 52c. The second opening 52c is a through hole that opens on both sides of the second wall 52 in the Z-axis direction. The second opening 52c faces the first opening 12c. That is, the window 4 and the object S directly face each other through the first opening 12c and the second opening 52c. In this embodiment, the second wall 52 is a part of a housing that houses the support 51. The second wall 52 is formed of a material that attenuates X-rays, such as a metal. [Electron beam source configuration]

[0021] As shown in Figures 2, 3 and 4, the electron beam source 11 has the above-mentioned electron beam generating unit 2, a housing 3 and a window portion 4. The electron beam generating unit 2 is an elongated filament unit with its longitudinal direction in the Y-axis direction. The housing 3 is a cylindrical vacuum vessel with a center line parallel to the Y-axis direction. The window portion 4 is airtightly attached to a flange portion 31 that defines an opening 3a in the housing 3. The opening 3a is an elongated opening with its longitudinal direction in the Y-axis direction, and faces the electron beam generating unit 2 in the Z-axis direction. A connection port 32 is provided on the part of the housing 3 opposite the opening 3a to which a pipe for evacuating the space within the housing 3 is connected.

[0022] The electron beam source 11 further includes a rail member 5, a pair of holding members 6 and 7, and a power supply unit 8. The rail member 5 is an elongated member with the Y-axis direction as the longitudinal direction, and holds the electron beam generating unit 2 inside the housing 3. The cross-sectional shape of the rail member 5 perpendicular to the Y-axis direction is a C-shape that opens to the window portion 4 side. The pair of holding members 6 and 7 are cylindrical members each having a center line parallel to the Y-axis direction, and hold both ends of the rail member 5 inside the housing 3. The holding member 6 is attached to the power supply unit 8. The holding member 7 is attached to the inner surface of the housing 3 via an insulating member (not shown). One end of the housing 3 in the Y-axis direction is hermetically sealed by the power supply unit 8. The other end of the housing 3 in the Y-axis direction is hermetically sealed by the opening / closing unit 33. In the electron beam source 11, the electron beam generating unit 2 can be inserted and removed from the rail member 5 by opening the cover 33a of the opening / closing unit 33.

[0023] The housing 3, the rail member 5, and the pair of holding members 6 and 7 are each formed of a conductive material such as metal. The housing 3 is at ground potential. The rail member 5 and the pair of holding members 6 and 7 are at cathode potential. The rail member 5 functions as an enclosing electrode that encloses the electron beam generating unit 2. The electron beam generating unit 2 is supplied with a high voltage from a power supply unit 8. Wiring for supplying a high voltage to the electron beam generating unit 2 is connected to the power supply unit 8.

[0024] The electron beam generating unit 2 has a main frame 21, a filament 22, a subframe 23, a power supply line 24, a connecting member 25, a grid electrode 26, and an insulating member 27. The main frame 21 is an elongated member with the Y-axis direction as its longitudinal direction. The cross-sectional shape of the main frame 21 perpendicular to the Y-axis direction is a U-shape that opens on the window portion 4 side. The filament 22 extends in the Y-axis direction inside the main frame 21. The filament 22 is made of a high-melting point metal material (e.g., a material containing tungsten), and emits electrons when heated by passing electricity through it.

[0025] The subframe 23 is disposed on the opposite side of the mainframe 21 to the window portion 4. The subframe 23 is an elongated member with its longitudinal direction in the Y-axis direction. The cross-sectional shape of the subframe 23 perpendicular to the Y-axis direction is a U-shape that opens on the opposite side to the window portion 4. The power supply line 24 extends in the Y-axis direction inside the subframe 23. The mainframe 21 and the subframe 23 are connected to each other by a connecting member 25.

[0026] The grid electrode 26 is disposed on the window portion 4 side with respect to the main frame 21. The grid electrode 26 is an elongated member whose longitudinal direction is in the Y-axis direction, and faces the filament 22 in the Z-axis direction. The grid electrode 26 is attached to the connecting member 25 via an insulating member 27. The grid electrode 26 is a sheet-like member having a plurality of through holes arranged two-dimensionally along a plane perpendicular to the Z-axis direction.

[0027] In the electron beam generating unit 2 configured as described above, the filament 22 is heated by energization, and in this state, a negative high voltage of, for example, "-tens of kV to -hundreds of kV" is applied to the filament 22. As a result, electrons are emitted from the filament 22. At this time, a voltage of, for example, the potential of the filament 22 plus "+100V to +150V" is applied to the grid electrode 26. As a result, an electric field is formed that draws out the electrons while suppressing their diffusion, and the electrons emitted from the filament 22 are emitted as an electron beam EB toward the window portion 4 via the grid electrode 26.

[0028] 5, 6 and 7, the window portion 4 has a support member 41, a sealing member 42, a window foil 43 and a pressing member 44. The support member 41 has a pair of surfaces 41a, 41b. The surface 41a is the surface on the electron beam generating unit 2 side and is the surface that contacts the flange portion 31 of the housing 3 (see FIG. 4). The surface 41b is the surface opposite the electron beam generating unit 2. The support member 41 is formed from a metal material with high thermal conductivity (for example, a material containing copper) into a plate shape with the Y-axis direction as the longitudinal direction and the Z-axis direction as the thickness direction.

[0029] The support member 41 is formed with a recess 411, a plurality of through holes 412, a pair of flow paths 413, and a groove 414. The recess 411 is open to the surface 41a, and is formed in an elongated shape with the Y-axis direction as the longitudinal direction when viewed from the Z-axis direction. The plurality of through holes 412 are formed in the bottom of the recess 411, and are arranged two-dimensionally along a plane perpendicular to the Z-axis direction. The pair of flow paths 413 extend in the Y-axis direction on both sides of the recess 411 in the X-axis direction. Pipes for supplying a cooling liquid are connected to the pair of flow paths 413, and the cooling liquid flows through the pair of flow paths 413. The groove 414 is open to the surface 41b, and extends in an annular shape so as to surround the plurality of through holes 412 when viewed from the Z-axis direction.

[0030] The sealing member 42 is an annular elastic member (for example, an O-ring) and is disposed along the groove 414. A pair of portions of the sealing member 42 extending in the Y-axis direction overlap with a pair of flow paths 413 when viewed from the Z-axis direction.

[0031] The window foil 43 is disposed on the surface 41b of the support member 41 so as to cover the multiple through holes 412 and the sealing member 42. The window foil 43 is in contact with the support member 41 and is thermally connected to the support member 41. The window foil 43 is made of a material (e.g., beryllium, titanium, or aluminum) that is highly transparent to the electron beam EB, and is formed into a film shape with the Y-axis direction as the longitudinal direction and the Z-axis direction as the thickness direction.

[0032] The pressing member 44 is a frame-shaped member having an opening 44a. The pressing member 44 is arranged on the surface of the window foil 43 opposite to the support member 41 so as to overlap the sealing member 42 and not overlap the multiple through holes 412 when viewed from the Z-axis direction. The pressing member 44 is formed in a frame shape with the Y-axis direction as the longitudinal direction and the Z-axis direction as the thickness direction, by a metal material (e.g., a material containing copper) having high thermal conductivity. The region between the support member 41 and the window foil 43 is airtightly sealed by fastening the support member 41 and the pressing member 44 to each other with a fastening member (not shown) such as a bolt. Note that the fastening member for fastening the support member 41 and the pressing member 44 to each other may be provided separately from the fastening member for attaching the window portion 4 to the flange portion 31 of the housing 3, or may be provided as a fastening member for attaching the window portion 4 to the flange portion 31 of the housing 3.

[0033] The pressing member 44 is formed with a flow path 441 and a plurality of branch flow paths 442. The flow path 441 extends in the Y-axis direction on one side of the opening 44a in the X-axis direction. A pipe for supplying a cooling gas is connected to the flow path 441, and the cooling gas is made to flow. The plurality of branch flow paths 442 are aligned in the Y-axis direction, branch off from the flow path 441, and open to the side of the opening 44a. The cooling gas supplied to the flow path 441 is blown onto the window foil 43 via each branch flow path 442. As an example, an inert gas (e.g., nitrogen) is used as the cooling gas.

[0034] In the window section 4 configured as above, the electron beam EB emitted from the electron beam generating section 2 passes through the multiple through holes 412 of the support member 41, transmits through the window foil 43, and passes through the opening 44a of the pressing member 44. In this manner, the window section 4 emits the electron beam EB emitted from the electron beam generating section 2 to the object supporting unit 50 side (see FIG. 1). At this time, heat is generated in the support member 41, the window foil 43, and the pressing member 44 due to the incidence of the electron beam EB, but the cooling liquid flows through the pair of flow paths 413 of the support member 41 and the cooling gas is blown onto the window foil 43 from each branch flow path 442 of the pressing member 44, thereby dissipating heat from the window section 4 and suppressing deterioration of the sealing member 42 due to heat.

[0035] 2, 3 and 4, when viewed from the Z-axis direction, the side surface 31a of the flange portion 31 of the housing 3 coincides with the side surface 41c of the support member 41 and the side surface 44b of the pressing member 44 (see FIG. 4), but in this embodiment, when viewed from the Z-axis direction, the side surface 31a of the flange portion 31 of the housing 3 is located outside the side surface 41c of the support member 41 and the side surface 44b of the pressing member 44 (see FIGS. 8 and 9). [Detachable structure of electron beam irradiation unit and object support unit]

[0036] 8, in the electron beam irradiation unit 10, a protrusion 61 including a first opening 12c is provided on the surface 12b of the first wall 12. The protrusion 61 has a top surface 61a and a side surface 61b. Both ends of the first opening 12c in the Z-axis direction are located on the surface 12a of the first wall 12 and the top surface 61a of the protrusion 61. In this embodiment, the pair of surfaces 12a, 12b and the top surface 61a are each perpendicular to the Z-axis direction, and the side surface 61b is parallel to the Z-axis direction.

[0037] The electron beam source 11 is attached to the first wall 12 with the window 4 disposed in the first opening 12c. In this embodiment, the electron beam source 11 is attached to the first wall 12 with the side surface 31a of the flange 31 of the housing 3 in contact with the side surface 12d of the first opening 12c and the side surface 41c of the support member 41 of the window 4 spaced apart from the side surface 12d of the first opening 12c. That is, a gap G is formed between the side surface 41c of the support member 41 and the side surface 12d of the first opening 12c.

[0038] The electron beam irradiation unit 10 further includes a cover 15. The cover 15 is disposed at an end 12e of the first opening 12c on the object support unit 50 side, and covers the gap G from the object support unit 50 side. The cover 15 is attached to the first wall 12 by a fastening member (not shown) such as a bolt, and is detachable from the first wall 12. In this embodiment, the end 12e is expanded in the X-axis direction and the Y-axis direction with respect to a portion of the first opening 12c excluding the end 12e. In this embodiment, the cover 15 is a frame-shaped plate material formed of a material that attenuates X-rays, for example, a metal, and expands from the side surface 44b of the pressing member 44 of the window 4 to the side surface of the end 12e of the first opening 12c. The top surface 61a of the convex portion 61, the surface 4a of the window 4 on the object support unit 50 side, and the surface 15a of the cover 15 on the object support unit 50 side are located on the same plane. In this embodiment, the surface 4a of the window portion 4 is the surface of the pressing member 44 facing the object supporting unit 50.

[0039] In the object support unit 50, a recess 62 including a second opening 52c is provided on the surface 52a of the second wall 52. The recess 62 has a bottom surface 62a and a side surface 62b. Both ends of the second opening 52c in the Z-axis direction are located on the surface 52b of the second wall 52 and the bottom surface 62a of the recess 62. In this embodiment, the pair of surfaces 52a, 52b and the bottom surface 62a are each perpendicular to the Z-axis direction, and the side surface 62b is parallel to the Z-axis direction.

[0040] 9, the first wall portion 12 is detachable from the second wall portion 52. That is, the first wall portion 12 and the second wall portion 52 are separable from each other. If the first wall portion 12 and the second wall portion 52 are structured to be separated from each other, one or both of the object support unit 50 and the electron beam irradiation unit 10 may be moved in either direction to separate them.

[0041] As shown in FIG. 8, when the first wall 12 is attached to the second wall 52, the surface 12b of the first wall 12 and the surface 52a of the second wall 52 are in contact with each other, and the recess 62 and the protrusion 61 are fitted into each other. That is, when the first wall 12 and the second wall 52 are in contact with each other, the surface 12b of the first wall 12 and the surface 52a of the second wall 52 are in contact with each other, and the recess 62 and the protrusion 61 are fitted into each other. Here, the recess 62 and the protrusion 61 are fitted into each other means that when the surface 12b and the surface 52a are in contact with each other, the entire protrusion 61 is located within the recess 62. When viewed from the Z-axis direction, the window 4 is located inside the second opening 52c of the second wall 52. [Action and Effects]

[0042] In the electron beam irradiation device 1, the first opening 12c of the first wall 12 in the electron beam irradiation unit 10 accommodates the window 4 of the electron beam source 11, and the first wall 12 of the electron beam irradiation unit 10 and the second wall 52 of the object support unit 50 can be separated from each other. Therefore, when performing maintenance on the window 4 of the electron beam source 11, the first wall 12 and the second wall 52 are separated from each other, so that a space necessary for maintenance of the window 4 can be secured. In addition, when the first wall 12 and the second wall 52 are in contact with each other, the surface 12b of the first wall 12 and the surface 52a of the second wall 52 are in contact with each other, and the recess 62 and the protrusion 61 are fitted into each other between the first wall 12 and the second wall 52. As a result, the region between the first wall portion 12 and the second wall portion 52 is curved, and therefore, compared to a configuration in which the region between the first wall portion 12 and the second wall portion 52 is flat and wide, it is possible to reliably block X-rays that are secondarily generated during irradiation with the electron beam EB. Therefore, according to the electron beam irradiation device 1, it is possible to ensure both the ease of maintenance of the window portion 4 of the electron beam source 11 and the shielding property of X-rays during irradiation with the electron beam EB.

[0043] In the electron beam irradiation device 1, a convex portion 61 is provided on the surface 12b of the first wall portion 12, and a concave portion 62 is provided on the surface 52a of the second wall portion 52. This allows the portion of the first wall portion 12 surrounding the first opening 12c to be thickened, so that X-rays that are generated secondarily during irradiation with the electron beam EB can be reliably shielded compared to a configuration in which the concave portion 62 is provided on the surface 12b of the first wall portion 12 and the convex portion 61 is provided on the surface 52a of the second wall portion 52. In addition, since the first opening 12c that houses the window portion 4 of the electron beam source 11 is formed on the convex portion 61, the window portion 4 can be brought closer to the support portion 51 of the object support unit 50, so that the electron beam EB can be efficiently irradiated onto the object S. In particular, when the energy of the electron beam EB is low, the range of the electron beam EB in the irradiation atmosphere becomes shorter, so that the effect of bringing the window portion 4 and the object S closer to each other becomes more effective. Furthermore, since the first opening 12c that houses the window portion 4 of the electron beam source 11 is formed in the convex portion 61, the window portion 4 can be more easily accessed during maintenance of the window portion 4 compared to a configuration in which the first opening 12c is formed in the concave portion 62.

[0044] In the electron beam irradiation device 1, in the electron beam irradiation unit 10, a cover 15 that is detachable from the first wall portion 12 is disposed at the end 12e of the first opening 12c, and covers a gap G formed between a side surface of the window portion 4 (specifically, a side surface 41c of the support member 41) and a side surface 12d of the first opening 12c. This allows the window portion 4 to be replaced more easily by removing the cover 15 from the first wall portion 12 during maintenance, using the gap G. During irradiation with the electron beam EB, the gap G is covered by the cover 15, so that leakage of X-rays through the gap G can be suppressed. In addition, the electron beam source 11 can be protected from contamination by outgassing emitted from the target object S and contamination by gases such as ozone and NOx that are generated during irradiation with the electron beam EB. Furthermore, when the portion of the target object S that is irradiated with the electron beam EB is placed in an inert gas atmosphere, it is possible to prevent inert gas from flowing from the target object S side to the electron beam source 11 side, or prevent air from flowing from the electron beam source 11 side to the target object S side.

[0045] In the electron beam irradiation device 1, the top surface 61a of the convex portion 61, the surface 4a of the window portion 4, and the surface 15a of the cover 15 are located on the same plane. This makes it easy to bring the bottom surface 62a of the recess portion 62 and the top surface 61a of the convex portion 61 close to each other, thereby improving the X-ray shielding performance during irradiation with the electron beam EB. In addition, since the window portion 4 can be brought closer to the support portion 51 of the object support unit 50, the object S can be efficiently irradiated with the electron beam EB. [Variations]

[0046] The present invention is not limited to the above embodiment. For example, the surface 12b of the first wall portion 12 may be provided with a recess 62 including the first opening 12c, and the surface 52a of the second wall portion 52 may be provided with a protrusion 61 including the second opening 52c. That is, one of the recess 62 and the protrusion 61 including the first opening 12c may be provided on the surface 12b of the first wall portion 12, and the other of the recess 62 and the protrusion 61 including the second opening 52c may be provided on the surface 52a of the second wall portion 52. In addition, when the first wall portion 12 is attached to the second wall portion 52, the bottom surface 62a of the recess 62 and the top surface 61a of the protrusion 61 may be in contact with each other, or may be separated from each other with a small gap therebetween. In addition, when the first wall portion 12 is attached to the second wall portion 52, the side surface 62b of the recess 62 and the side surface 61b of the protrusion 61 may be in contact with each other, or may be separated from each other with a small gap therebetween. In addition, the top surface 61a of the protrusion 61, the surface 4a of the window portion 4, and the surface 15a of the cover 15 may not be located on the same plane. In addition, the gap G may not be formed between the side surface of the window portion 4 and the side surface 12d of the first opening 12c. In that case, the electron beam irradiation unit 10 may not have the cover 15. In addition, it is sufficient that at least a part of the window portion 4 is disposed within the first opening 12c of the first wall portion 12. In addition, the first wall portion 12 and the second wall portion 52 may be connected by a hinge structure, and the first wall portion 12 and the second wall portion 52 may be separated from each other starting from the hinge structure so that the first opening 12c and the second opening 52c are exposed.

[0047] In addition, the support section 51 of the object support unit 50 may support the object S, and the shape of the object S is not particularly limited. As an example, as shown in FIG. 10 and FIG. 11, the support section 51 may have at least one feed roller 513 that feeds the film-like object S. In the object support unit 50 shown in FIG. 10, a portion of the film-like object S that extends between a pair of feed rollers 513 faces the second opening 52c of the second wall section 52 in the Z-axis direction. In the object support unit 50 shown in FIG. 11, a portion of the film-like object S that is located on one feed roller 513 faces the second opening 52c of the second wall section 52 in the Z-axis direction. As an example, when the electron beam irradiation device 1 is used for drying ink on the object S, it is preferable that the portion of the object S that is irradiated with the electron beam EB is placed in an inert gas atmosphere in order to promote drying of the ink. Therefore, as shown in FIG. 11, in order to prevent an inert gas (e.g., nitrogen) from escaping from the area where the portion of the object S is irradiated with the electron beam EB exists, a cover 514 surrounding the portion of the object S that is irradiated with the electron beam EB may be attached to the second wall portion 52. [Explanation of symbols]

[0048] 1...electron beam irradiation device, 2...electron beam generating section, 3...housing, 4...window section, 4a...surface, 10...electron beam irradiation unit, 11...electron beam source, 12...first wall section, 12b...surface (first surface), 12c...first opening, 12d...side surface, 12e...end section, 15...cover, 15a...surface, 41c...side surface (side surface of window section), 50...object support unit, 51...support section, 52...second wall section, 52a...surface (second surface), 52c...second opening, 61...convex section, 61a...top surface, 61b...side surface, 62...concave section, 62a...bottom surface, 62b...side surface, EB...electron beam, G...gap, S...object.

Claims

1. The apparatus includes an electron beam irradiation unit and an object support unit, The electron beam irradiation unit includes: an electron beam source including an electron beam generating unit that generates an electron beam, a housing that houses the electron beam generating unit, and a window that is provided in the housing and through which the electron beam is emitted; a first wall portion disposed on the target support unit side with respect to the electron beam source and having a first opening formed therein and accommodating at least a portion of the window portion; The object support unit includes: A support portion that supports an object; a second wall portion disposed on the electron beam irradiation unit side with respect to the support portion and having a second opening facing the first opening; a first surface of the first wall portion facing the object support unit is provided with one of a recess and a protrusion including the first opening, the other of the recess and the protrusion including the second opening is provided on a second surface of the second wall on the electron beam irradiation unit side, The first wall portion and the second wall portion are separable from each other, An electron beam irradiation device, wherein when the first wall portion and the second wall portion are in contact with each other, the first surface and the second surface are in contact with each other, and the concave portion and the convex portion fit into each other.

2. the first surface is provided with the protrusion including the first opening, The electron beam irradiation device according to claim 1 , wherein the second surface is provided with the recess including the second opening.

3. the electron beam irradiation unit further includes a cover that is detachable from the first wall portion, 3. The electron beam irradiation device according to claim 2, wherein the cover is disposed at an end of the first opening on the side of the object support unit, and covers a gap formed between a side surface of the window portion and a side surface of the first opening.

4. 4. The electron beam irradiation device according to claim 3, wherein a top surface of the convex portion, a surface of the window portion facing the object support unit, and a surface of the cover facing the object support unit are located on the same plane.

Images