Photomask transfer device that positions the side of the photomask with the pattern facing downwards.

Abstract

The present invention provides a photomask transfer device that positions the side of the photomask with the pattern facing downwards. [Solution] The photomask transfer device, which positions the side of the photomask with the pattern facing downwards, comprises a base, an X-direction moving platform, a Y-direction moving platform, a gripper mechanism, a thrust / positioning mechanism, a lifting / rotating platform, and a loading platform. The gripper mechanism has two gripping units. The thrust / positioning mechanism has a fixing unit and a thrusting unit. The loading platform has four frames. The loading platform is positioned in a loading position, a gripping position, or a bottom position by moving up and down. When the loading platform is positioned in the gripping position, the two gripping units can grip or release the photomask on the loading platform. The thrusting unit can move the photomask or keep it stationary.

Description

Technical Field

[0001] The present invention relates to a transfer technology of a photomask, and more particularly to a photomask transfer device that faces downward the surface having the pattern of the photomask.

Background Art

[0002] When inspecting a photomask, it is necessary to move the photomask on an inspection table. In the photomask inspection apparatus and method disclosed by Patent Document 1, since the transfer technology of the photomask employs a moving table that moves in a first direction, a rotating table that moves in a second direction, and a loading table on which the photomask is placed, it was clear to move the photomask between the first direction and the second direction perpendicular to the first direction, that is, in the X direction and the Y direction, but no specific technology for moving in other directions was disclosed.

[0003] In Patent Document 1, when inspecting a photomask, it is a drawback that the surface having a pattern is facing upward. Specifically, most of the surface having a pattern on the photomask is covered by a protective film, and the other parts are exposed from the protective film. The pattern must not be contaminated with dust. Since the protective film is a very expensive component, care is taken so that it is not contaminated with dust as much as possible, but it is inevitable that dust will fall even in a clean room. In particular, the upward pattern or protective film may be contaminated with the dust that has fallen during the inspection process, so not only a cleaning process and a subsequent drying process are required, but also problems such as affecting the inspection or having defects in the inspection result occur.

[0004] In view of the above-described situation, it is an object of the present invention to provide a technology that can not only has a structure superior to the prior art but also transfer the photomask with the surface having the pattern of the photomask facing downward.

Prior Art Documents

Patent Documents

[0005] [Patent Document 1] Taiwan Patent No. I609235 [Overview of the project] [Problems that the invention aims to solve]

[0006] The main objective of this invention is to provide a photomask transfer device that can transfer a photomask with the patterned side facing downwards.

[0007] Another objective of this invention is to provide a photomask transfer device that can transfer a photomask with a patterned surface facing downwards, using a structure different from that of the prior art. [Means for solving the problem]

[0008] To solve the aforementioned problems, the photomask transfer device, which positions the side of the photomask with the pattern facing downwards, comprises a base, an X-direction moving platform, a Y-direction moving platform, a gripper mechanism, a pushing / positioning mechanism, a lifting / rotating platform, and a loading platform. The X-direction moving platform is located on the base and is driven to move in the X direction of the base. The Y-direction moving platform is located on the X-direction moving platform and is driven to move in the Y direction of the X-direction moving platform. The gripper mechanism has two opposing gripping units. The two gripping units are each located on the Y-direction moving platform and grip the photomask by pressing two opposite sides of the rectangular photomask. The pushing / positioning mechanism has a fixing unit and a pushing unit. The pushing unit is located on the Y-direction moving platform and has a block for pushing and positioning the photomask towards the fixing unit. The lifting / rotating platform is located on the base and is driven to move in the Z direction of the base. The loading platform is located on the lifting / rotating platform and moves up and down in the Z direction together with the lifting / rotating platform, or rotates horizontally. The loading platform has four frames for loading photomasks. The photomask has its patterned side facing downwards. The four support structures contact the four sides of the bottom of the photomask. The loading platform moves up and down to be positioned in the loading, gripping, or bottom position. When the loading platform is in the loading position, the four support structures are higher than the two gripping units. When the loading platform is in the gripping position, the photomask is positioned between the two gripping units, allowing the two gripping units to grip or release the photomask on the loading platform. The thrusting unit can move the photomask or keep it stationary. When the loading platform is in the bottom position, the four support structures are lower than the two gripping units.

[0009] Due to the technical features described above, the present invention allows for the transfer of a photomask with the patterned side facing downwards. In other words, the present invention allows for the transfer of a photomask with the patterned side facing downwards using a structure different from that of the prior art. [Brief explanation of the drawing]

[0010] [Figure 1] This is a perspective view showing a first embodiment of the present invention. [Figure 2] This is a portion of an exploded perspective view showing a first embodiment of the present invention. [Figure 3] This is a portion of an exploded perspective view of the first embodiment of the present invention, rotated 90 degrees. [Figure 4] This is a portion of an exploded perspective view of the first embodiment of the present invention, viewed from below. [Figure 5] This is a perspective view showing the gripper mechanism and the thrust / positioning mechanism according to the first embodiment of the present invention. [Figure 6] This is a perspective view showing a Z-direction moving platform and a loading platform according to the first embodiment of the present invention. [Figure 7] This is a perspective view showing the loading platform, gripper mechanism, and thrust / positioning mechanism according to the first embodiment of the present invention. [Figure 8] This is a side view showing the operating state of the first embodiment of the present invention. [Figure 9] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 10] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 11] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 12] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 13] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 14] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 15] This is a side view showing another operating state of the first embodiment of the present invention. [Figure 16] This is a perspective view showing some of the components of a second embodiment of the present invention. [Modes for carrying out the invention]

[0011] Embodiments of the present invention will be described below with reference to the drawings.

[0012] (First Embodiment) As shown in FIGS. 1 to 7, a photomask transfer device 10 that faces downward the surface having the pattern of the photomask according to the first embodiment of the present invention is composed of a base 11, an X-direction moving stage 21, a Y-direction moving stage 31, a gripper mechanism 41, a pushing and positioning mechanism 51, a lifting and rotating stage 61, and a loading stage 71.

[0013] The X-direction moving stage 21 is arranged on the base 11 and is driven to move in the X direction of the base 11. Although it is common to use a combination of a well-known linear guide or a ball screw and a motor for the X-direction moving stage 21, since this is not the main claim content of the present invention, the description thereof is omitted.

[0014] The Y-direction moving stage 31 is arranged on the X-direction moving stage 21 and is driven to move in the Y direction of the X-direction moving stage 21. Although it is common to use a combination of a well-known linear guide or a ball screw and a motor for the Y-direction moving stage 31 in the same way as the X-direction moving stage 21, since this is not the main claim content of the present invention, the description thereof is omitted.

[0015] The gripper mechanism 41 has two opposing gripping units 42. The two gripping units 42 are respectively arranged on the Y-direction moving stage 31, and hold the photomask 91 by pressing two opposite sides of a rectangular photomask 91 (see FIG. 10). In the first embodiment, each gripping unit 42 has a driver 43 and two gripper units 44. The driver 43 advances or retreats the two gripper units 44 toward the other gripping unit 42. The two gripper units 44 of one gripping unit 42 are arranged facing the two gripper units 44 of the other gripping unit 42. Each gripper unit 44 has an upper claw 441, a lower claw 442, and an opening 443. The upper claw 441 and the lower claw 442 are arranged vertically and symmetrically. The opening 443 is formed between the upper claw 441 and the lower claw 442, and the width gradually increases from the inside.

[0016] The gripper mechanism 41 further has two lower gripper units 46. The two lower gripper units 46 are lower than the two gripper units 44. The two lower gripper units 46 of one gripping unit 42 are positioned opposite the two lower gripper units 46 of another gripping unit 42. The structure of the lower gripper units 46 and the gripper units 44 is almost identical. In each gripping unit 42, the two lower gripper units 46 and the two upper gripper units 44 are not positioned in a straight line vertically, so that the horizontal position of the gripper units 44 and the lower gripper units 46 can be adjusted separately according to the actual needs.

[0017] The thrusting and positioning mechanism 51 includes a fixing unit 52 and a thrusting unit 56. The thrusting unit 56 is positioned on a Y-direction moving table 31 and has a block 57 for pushing and positioning the photomask 91 to the fixing unit 52. In the first embodiment, the thrusting unit 56 has a driver 58. The block 57 pushes the photomask 91 by the driving force of the driver 58. The fixing unit 52 consists of two fixed convex blocks.

[0018] The lifting and rotating platform 61 is positioned on the base 11 and is driven to move in the Z direction of the base 11. Since the lifting and rotating platform 61 commonly uses well-known linear guides or servo motors, a detailed explanation is omitted. The X and Y directions are two directions perpendicular to the plane. The Z direction is perpendicular to the plane.

[0019] The loading platform 71 is positioned on the lifting and rotating platform 61 and moves up and down in the Z direction or rotates horizontally together with the lifting and rotating platform 61. The loading platform 71 has four frames 72 for loading the photomasks 91. The photomasks 91 have the patterned side (not shown in the figure) facing downwards. Two opposing frames 72 have inclined walls 721. The two support frames 72 contact the four sides of the bottom of the photomask 91 by inclined walls 721. The inclined walls 721 reduce the contact area by having their inclined surfaces contact the photomask 91. In the first embodiment, the two gripper units 44 of each gripping unit 42 do not interfere with any of the support frames 72 of the loading platform 71. Generally, the patterned surface of the photomask 91 is protected by a protective film, but it is not limited to this, and in another embodiment, there is an example in which no protective film is placed on the patterned surface.

[0020] The loading platform 71 can be positioned at loading position P1, gripping position P2, low gripping position P3, or bottom position P4 by moving up and down. When the loading platform 71 is positioned at loading position P1, the four frames 72 are higher than the two gripping units 42. When the loading platform 71 is positioned at gripping position P2, the photomask 91 is located between the two gripping units 42, so that the two gripping units 42 can grip or release the photomask 91 on the loading platform 71. The thrust unit 56 can move the photomask 91 or keep it stationary. The two gripper units 44 of each gripping unit 42 are located on either side of the frame 72. When the loading platform 71 is set to the bottom position P4, the four frames 72 are lower than the two gripping units 42. When the loading platform 71 is set to the lower gripping position P3, the two gripping units 42 can grip or release the photomask 91 on the loading platform 71. The two lower gripper units 46 of each gripping unit 42 are located on either side of the frame 72.

[0021] The above describes the structure of the first embodiment. Next, the operating state of the first embodiment will be explained.

[0022] As shown in Figure 8, before loading the photomask 91, the loading platform 71 is positioned at the bottom position P4.

[0023] As shown in Figure 9, when loading the photomask 91, the loading platform 71 rises to the loading position P1. The four support frames 72 are higher than the two gripping units 42. Subsequently, as shown in Figure 10, the robot arm (not shown in the figure) places the photomask 91 on the loading platform 71 with the patterned side (not shown in the figure) facing downwards, and the inclined walls 721 of the two support frames 72 are brought into contact with the four sides of the bottom of the photomask 91. If it is necessary to rotate the photomask 91 to a predetermined angle, the loading platform 71 can maintain the photomask 91 in a horizontal position and rotate it to a predetermined angle, for example, 90 degrees or 270 degrees.

[0024] As shown in Figure 11, the loading platform 71 is lowered to the gripping position P2. Subsequently, as shown in Figure 12, the propulsion unit 56 can push and position the photomask 91 to the fixing unit 52 via the block 57. Subsequently, as shown in Figure 13, the drives 43 of the two gripping units 42 move the two gripper units 44 closer together, and by fitting the opening 443 between the upper claws 441 and lower claws 442 of the gripper unit 44 with the edge of the photomask 91, the upper claws 441 and lower claws 442 grip the photomask 91, that is, fix it by sandwiching all four sides of the photomask 91, and maintain the photomask 91 in a stable state.

[0025] As shown in Figure 14, if the photomask 91 needs to be inspected at a lower position, the loading platform 71 is lowered from the gripping position P2 to the lower gripping position P3. Subsequently, as shown in Figure 12, the thrusting unit 56 can push and position the photomask 91 to the fixing unit 52 via the block 57. The two lower gripper units 46 of each gripping unit 42 approach each other and can grip or release the photomask 91. In other words, the lower gripping position P3 is positioned according to the need to grip and inspect the photomask 91 at different heights, thus improving convenience when inspecting with detection devices (not shown in the figure) with different viewing distances or focal lengths.

[0026] As shown in Figure 15, once the photomask 91 is fully grasped, the loading platform 71 no longer has the role of loading the photomask 91, and the loading platform 71 can be lowered to the bottom position P4. In other words, once the photomask 91 is grasped, it is no longer obstructed by the loading platform 71, so the movement of the X-direction moving platform 21 and the Y-direction moving platform 31 can be adjusted to position the photomask 91 in the inspection area.

[0027] After the inspection is complete, when removing the photomask 91, the photomask 91 is released by the two gripping units 42 according to the steps described above, and then the loading platform 71 is raised to the loading position P1, allowing the photomask 91 to be removed by the robot arm (not shown in the figure).

[0028] To summarize the technical details of the first embodiment described above, since the sides of the photomask 91 are fixed by the thrusting / positioning mechanism 51 and the gripper mechanism 41, the photomask 91 can be moved without taking any measures to support or contact the bottom of the photomask 91, i.e., the side with the pattern. In other words, the first embodiment eliminates any parts that would interfere with inspection at the bottom of the photomask 91, allows the photomask 91 to be moved with the side with the pattern facing downwards, and simultaneously prevents the photomask 91 from being contaminated by dust falling from above. In other words, the first embodiment can achieve simplified operation and stable gripping state through a structure different from the prior art.

[0029] (Second Embodiment) Figure 16 is a perspective view showing a portion of a photomask transfer device 10' according to a second embodiment of the present invention, in which the side with the photomask pattern is facing downwards. The differences from the first embodiment are as follows.

[0030] Compared to the first embodiment, the second embodiment eliminates the low gripping position P3 corresponding to the movement of the loading platform 71' and the two low gripper units 46.

[0031] In other words, when inspecting the photomask 91 (see Figure 10), it is only possible to maintain the inspection height at the gripping position P2 disclosed in the first embodiment. It is sufficient if it can meet the user's needs.

[0032] Since the other structures and effects achieved in the second embodiment are the same as those in the first embodiment, their description will be omitted.

[0033] The present invention is not limited in any way to the embodiments described above, and can be implemented in various forms without departing from the spirit of the invention. [Explanation of Symbols]

[0034] 10, 10' Photomask transfer device with the side of the photomask pattern facing downwards. 11 Base 21 X direction moving table 31 Y-direction moving platform 41 Gripper mechanism 42 Gripping Unit 43. Drive unit 44 Gripper Units 441 Upper claw 442 Lower claw 443 Opening 46 Low-position gripper unit 51 Thrust / positioning mechanism 52 Fixing Unit 56. Propulsion Unit 57 blocks 58. Drive unit 61. Elevating and rotating platform 71, 71' Loading platform 72 mounting bases 721 Slanted wall 91 Photomasks P1 Loading position P2 gripping position P3 Low gripping position P4 bottom position

Claims

1. It comprises a base, an X-direction moving platform, a Y-direction moving platform, a gripper mechanism, a pushing / positioning mechanism, a lifting / rotating platform, and a loading platform. The X-direction moving platform is positioned on the base and is driven to move in the X direction of the base. The Y-direction moving platform is positioned on the X-direction moving platform and is driven to move in the Y-direction of the X-direction moving platform. The gripper mechanism has two opposing gripping units, each of which is positioned on the Y-direction moving platform and grips the rectangular photomask by pressing down on two opposite sides of the photomask. The aforementioned thrusting and positioning mechanism includes a fixing unit and a thrusting unit, the thrusting unit being positioned on the Y-direction moving platform and having a block for pushing and positioning the photomask towards the fixing unit. The lifting and lowering rotating platform is positioned on the base and is driven to move in the Z direction of the base. The loading platform is positioned on the lifting and rotating platform and moves up and down in the Z direction or rotates horizontally together with the lifting and rotating platform. The loading platform has four supports for loading the photomasks, the photomasks with the patterned side facing downwards, and the four supports abut against the four sides of the bottom of the photomasks. The aforementioned loading platform can be moved up and down to be positioned at the loading position, gripping position, or bottom position. When the loading platform is placed in the loading position, the four frames are higher than the two gripping units. When the loading platform is positioned in the gripping position, the photomask is located between the two gripping units, so that the two gripping units can grip or release the photomask on the loading platform, and the propulsion unit can move or keep the photomask stationary. When the loading platform is positioned at the bottom, the four frames are lower than the two gripping units. A photomask transfer device that positions the side of the photomask with the pattern facing downwards.

2. A photomask transfer device according to claim 1, wherein each of the gripping units has a drive and two gripper units, the drive moves the two gripper units forward or backward toward another gripping unit, and the two gripper units of one gripping unit are positioned facing the two gripper units of the other gripping unit.

3. A photomask transfer device according to claim 2, characterized in that the two gripper units of each gripping unit do not interfere with the four frames of the loading platform, with the side of the photomask with the pattern facing downwards.

4. The photomask transfer device according to claim 3, wherein when the loading platform is set in the gripping position, the two gripper units of each gripping unit are located on both sides of the frame, characterized in that the side of the photomask with the pattern facing downwards.

5. A photomask transfer device for positioning a photomask with a pattern facing downwards, characterized in that each of the gripper units has an upper claw, a lower claw and an opening, the upper claw and the lower claw are arranged vertically and symmetrically, the opening is formed between the upper claw and the lower claw and its width gradually increases from the back.

6. The aforementioned loading platform is moved up and down to be positioned in a lower gripping position. Each of the gripping units further has two lower gripper units, and the two lower gripper units are lower than the two gripper units. The two lower gripper units of one gripping unit are positioned opposite the two lower gripper units of another gripping unit. The photomask transfer device according to claim 2, characterized in that when the loading platform is set to the low gripping position, the two gripping units can grip or release the photomask on the loading platform, with the side of the photomask with the pattern facing downwards.

7. In each of the gripping units, the two lower gripper units and the two upper gripper units are arranged so as not to be aligned in a straight line vertically. The photomask transfer device according to claim 6, wherein when the loading platform is set to the low gripping position, the two low gripper units of each gripping unit are located on both sides of the frame, characterized in that the side of the photomask with the pattern facing downwards.

8. The photomask transfer device according to claim 1, wherein the propulsion unit has a drive, and the drive propels the photomask via a block, thereby aligning the side of the photomask with the pattern facing downwards.

9. The photomask transfer device according to claim 1, characterized in that the two opposing frames of the loading platform have inclined walls, and the inclined walls press down on the bottom edge of the photomask, thereby orienting the photomask so that the side with the pattern facing downwards.

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