Semiconductor processing apparatus and method of controlling gas flow through semiconductor processing apparatus

Abstract

A semiconductor processing apparatus is disclosed. The apparatus comprises a process chamber configured to receive a plurality of substrates supported by a substrate boat; at least one gas injector for providing a gas to the process chamber; at least two gas exhaust outlets for removing a gas from the process chamber; and at least two gas exhaust conduits, each connected to a respective gas exhaust outlet. Each of the gas exhaust conduits extends in a vertical direction inside the process chamber over at least part of the substrate boat. At least one of the gas exhaust conduits comprises a plurality of holes spaced apart in the vertical direction.