Computational lithography simulation using linear-fading-aware source-mask optimization

Abstract

A non-transitory computer-readable medium stores a set of instructions that is executable by at least one processor of an apparatus to cause the apparatus to perform operations for optimizing an illumination source and mask used in a lithography process. The operations include obtaining a pupil profile. The operations also include simulating the lithography process using the pupil profile to generate predictions resulting from the lithography process. The operations also include calculating a cost function based on the predictions. The cost function includes a linear fading effect term that is indicative of a linear fading effect on the predictions. The operations also include adjusting the pupil profile based on the linear fading effect term.

Images