Thermal plasma systems and methods for gas phase reactions

Thermal plasma systems address inefficiencies in conventional thermochemical reactions by generating a stable plasma for high-temperature, short-duration exposure, enhancing reaction efficiency and yield in industrial-scale processes.

WO2025193681A1PCT designated stage Publication Date: 2025-09-18UNIV OF MARYLAND +1

Patent Information

Application Number
PCT/US2025/019345
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-03-11
Filing Date
2025-03-11
Publication Date
2025-09-18

Smart Images

  • Figure US2025019345_18092025_PF_FP_ABST
    Figure US2025019345_18092025_PF_FP_ABST
Patent Text Reader

Abstract

A thermal plasma can be generated using a pair of electrodes spaced apart from each other by a gap along a first direction. One or more reactants can be conveyed into and / or through at least a portion of the generated plasma. For example, the portion of the generated plasma can subject the reactant(s) to a temperature of at least 1000 K. As a result, the one or more reactants can undergo a thermochemical reaction that converts the one or more reactants into one or more products.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Chemical activation of carbon using RF and DC plasma

    US20160200583A1

  • System and Method for Enhanced Chemical Reaction, Dissociation, and Separation by Electrostatic / Microwave and / or Radio Frequency Controlled Resonant Electron Interaction

    US20190308161A1

  • Upper electrode and plasma processing apparatus

    US20200234930A1

  • Electrodes for Nitric Oxide Generation

    US20200360649A1

  • Electrode with engineered surface for improved energy performance

    WO2023048931A1

Cited By

  • Volumetric plasmas, and systems and methods for generation and use thereof

    US12621922B2

  • Volumetric plasmas, and systems and methods for generation and use thereof

    US20260013030A1