X-ray analysis equipment

Abstract

The present invention provides an X-ray analysis device that is compact and capable of measuring a tiny part with a simple structure. An X-ray analysis device comprises: a goniometer having an incident side arm extending along a first direction, a fixing part, and a receiving side arm; an X-ray source part, which is arranged on the incident side arm and is used to generate an X-ray source extending along a second direction intersecting the first direction; a support table, which is arranged on the fixing part and is used to support a sample; a parallel slit, which is arranged on the fixing part and is used to limit the line width of the X-ray source generated by the X-ray source part along the second direction; and a detector, which is arranged on the receiving side arm and is used to detect scattered X-rays generated by the sample.

Description

Technical Field

[0001] The present invention relates to an X-ray analysis device, and more particularly to a technology for realizing miniaturization of the device and measurement of tiny parts. Background Art

[0002] Generally, an X-ray analysis device includes a goniometer having two arms: an X-ray source and an incident-side optical element are arranged on one arm, and a detector and a receiving-side optical element are arranged on the other arm.

[0003] An X-ray analysis device having parallel slits on the incident side of a sample is in use. Patent Document 1 discloses a Schulz slit disposed on the incident side of a sample. Patent Document 2 discloses a length-limited slit disposed on the incident side of a sample.

[0004] Patent Document 1: Japanese Patent Application Laid-Open No. 11-281595

[0005] Patent Document 2: Japanese Patent Application Publication No. 2015-102432 Summary of the invention

[0006] In recent years, the demand for X-ray analysis devices capable of measuring microscopic parts has been growing. As shown in Patent Documents 1 and 2, the use of a Schultz slit (or a length-limited slit) can limit the line width of the X-ray beam on the incident side, thereby limiting the irradiation area of ​​the X-rays irradiated on the sample.

[0007] Therefore, it is desirable to miniaturize and generalize the X-ray analyzer. Generally, since the arm of the goniometer of a general-purpose X-ray analyzer is relatively long, a variety of optical system components can be arranged on the arm. However, if the X-ray analyzer is miniaturized, the optical system consisting of the X-ray generating device and the incident optical system components will be limited.

[0008] The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide an optical system which is compact and simple in structure and capable of measuring a minute part.

[0009] (1) In order to solve the above-mentioned problems, the X-ray analysis device involved in the present invention comprises: a goniometer, which has an incident side arm extending along a first direction, a fixing part and a receiving side arm; an X-ray source part, which is arranged on the incident side arm and is used to generate an X-ray source extending along a second direction intersecting the first direction; a support table, which is arranged on the fixing part and is used to support a sample; a parallel slit, which is arranged on the fixing part and is used to limit the line width of the X-ray source generated by the X-ray source part along the second direction; and a detector, which is arranged on the receiving side arm and is used to detect scattered X-rays generated by the sample.

[0010] (2) The X-ray analysis apparatus described in (1) above may include a moving mechanism for moving the parallel slit in the second direction.

[0011] (3) The parallel slits in the X-ray analysis device described in (1) or (2) above may have a shape of a part of a hollow circle.

[0012] The present invention provides an X-ray analysis device which realizes a compact optical system capable of measuring a minute part with a simple structure. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram for showing the structure of the X-ray analysis device involved in the first embodiment of the present invention.

[0014] Figure 2 It is a schematic diagram for showing the function of the X-ray analysis device involved in the first embodiment of the present invention.

[0015] Figure 3 It is a schematic diagram for showing the parallel slit structure according to the first embodiment of the present invention.

[0016] Figure 4A It is a schematic diagram for showing the main structure of the X-ray analysis device involved in the second embodiment of the present invention.

[0017] Figure 4B It is a schematic diagram for showing the main structure of the X-ray analysis device involved in the second embodiment of the present invention.

[0018] Description of Reference Numerals

[0019] 1 X-ray analysis device

[0020] 11 X-ray source

[0021] 11A Linear X-ray Source

[0022] 12 Entrance side slit

[0023] 13 Parallel slits

[0024] 14 Support table

[0025] 15. 2D detector

[0026] 21 Goniometer

[0027] 21A Entrance side arm

[0028] 21B Fixed part

[0029] 21C Receiver side arm

[0030] 25 Mobile mechanism

[0031] 100 samples DETAILED DESCRIPTION

[0032] The following is an explanation of the embodiments of the present invention with reference to the accompanying drawings. In addition, since the drawings are intended to make the explanation clearer, the dimensions, shapes, etc. are sometimes schematically shown compared to the actual embodiments, which is only an example and does not limit the interpretation of the present invention. Moreover, in this specification and each figure, the same symbols are given to the same elements as the above-mentioned drawings, and the detailed explanation is appropriately omitted.

[0033] [First embodiment]

[0034] Figure 1 It is a schematic diagram for showing the structure of the X-ray analysis device 1 according to the first embodiment of the present invention. Figure 2 Schematic diagram for showing the function of the X-ray analysis device 1 involved in this embodiment. In order to simply explain the function, Figure 2 Here, although the X-ray analysis device 1 involved in this embodiment is an X-ray diffraction measurement device (XRD), it is not limited to this, and may also be a small-angle X-ray scattering measurement device (SAXS), and may also be other X-ray analysis devices. The X-ray analysis device 1 involved in this embodiment includes an X-ray source 11, an incident side slit 12, a parallel slit 13, a support table 14 for supporting a sample 100, a two-dimensional detector 15, and a goniometer 21.

[0035] The goniometer 21 is a θ-θ type goniometer in which the sample is arranged horizontally. The goniometer 21 includes an incident side arm 21A, a fixed part 21B, and a receiving side arm 21C. The incident side arm 21A is provided with an X-ray source 11 and an incident side slit 12, the fixed part 21B is provided with a parallel slit 13 and a support table 14, and the receiving side arm 21C is provided with a two-dimensional detector 15. The goniometer 21 can perform 2θ scanning while keeping the sample 100 supported by the support table 14 horizontal. Since the sample 100 is arranged horizontally, the influence of the tilt caused by the weight of the sample 100 can be minimized, thereby suppressing the risk of the sample 100 falling. In the goniometer 21, when the incident side arm 21A (X-ray source 11) rotates by θ relative to the fixed part 21B (support table 14), the receiving side arm 21C (two-dimensional detector 15) rotates by θ in the opposite direction relative to the fixed part 21B. In other words, the reception-side arm 21C is relatively rotated by 2θ with respect to the incident-side arm 21A.

[0036] The X-ray source 11 includes a rotating target. The rotating target is irradiated with an electron beam having a linear cross section, thereby generating X-rays on the rotating target surface. Among the X-rays generated by the rotating target, those that pass through the slit window are emitted to the outside from a slit window arranged parallel to the rotating axis of the rotating target.

[0037] Here, the extending direction of the incident side arm 21A (the propagation direction of the X-ray passing through the slit window: the first direction) is taken as the x-axis direction. The plane perpendicular to the x-axis direction is taken as the yz plane. When the direction of the rotating section penetrating the incident side arm 21A is taken as the y-axis direction, the direction parallel to the rotating section is taken as the z-axis direction. It can be considered that the X-ray source unit 11 has a linear X-ray source 11A extending along the y-axis direction (second direction). In addition, as long as the X-ray source unit 11 includes (can be considered to have) an element having a linear X-ray source 11A, it is not limited to a rotating target, and it can also be a packaging tube. In addition, although it is preferred that the second direction is perpendicular to the first direction, it is sufficient as long as it intersects with the first direction. In this case, it is also preferred that the angle between the first direction and the second direction is greater than 85 degrees (less than 90 degrees). And preferably, the second direction is parallel to the plane (xy plane) of the incident side arm 21A.

[0038] The incident side slit 12 is a single slit having its length in the y-axis direction, and is used to limit the divergence of X-rays generated by the X-ray source 11 in the z-axis direction (the width of the single slit in the z-axis direction is arbitrary).

[0039] The parallel slits 13 include two parallel plates facing each other while maintaining a gap of a first width W. Each parallel plate has the shape of a portion (arc) of a hollow circle (ring). That is, it is a shape in which a hollow circle is intercepted by two straight lines passing through the center of the hollow circle. Here, the radius of the arc used to form the outer edge is 55 mm, and the radius of the arc used to form the inner edge is 35 mm. At this time, the length L (described later) of the parallel slits 13 is 20 mm, and the first width W is about 0.44 mm. The stacking direction of the two parallel plates is arranged along the y-axis direction. The radius of the arc used to form the inner edge is determined by the size of the support table 14 used to support the sample 100. Here, the area where the sample 100 is arranged is controlled to be within a distance of 21.5 mm from the center of the sample 100. For example, the sample 100 is in the shape of a plate with a length of 35 mm. Preferably, the center position (of the circle) of the shape configured as a portion of the hollow circle is located on the surface of the sample 100. Due to assembly accuracy, the center position can be located inside or near the sample 100. The parallel slits 13 are equivalent to a structure in which a plurality of single slits of the first width W are arranged side by side, and have a function of limiting the line width along the y-axis direction. In addition, the parallel slits are also called Schulz slits.

[0040] The support table 14 for supporting the sample 100 is arranged (fixed) on the fixing portion 21B together with the parallel slits 13. The relative positional relationship between the parallel slits 13 and the sample 100 supported by the support table 14 is fixed and is independent of the rotation of the incident side arm 21A and the receiving side arm 21C of the goniometer 21.

[0041] The two-dimensional detector 15 detects scattered X-rays generated by the sample 100. Here, the scattered X-rays include diffracted X-rays generated by the sample 100. Moreover, in this embodiment, the detector is not limited to a two-dimensional detector, and can be a one-dimensional detector or a zero-dimensional detector (such as a scintillation counter).

[0042] Figure 3 It is a schematic diagram for showing the structure of the parallel slits 13 according to this embodiment. Figure 3 = represents a cross section of the parallel slits 13 cut by the xy plane. As described above, the parallel slits 13 are a structure that is continuously arranged in one direction without interrupting a single slit of the first width W. If the length of the parallel slits 13 (the distance between the outer edge arc and the inner edge arc) is set to L, then Figure 3 The divergence angle θ shown is represented by θ=2arctan(W / L). When W=0.5 mm, in order to make θ less than 2.5°, the length L of the parallel slits 13 needs to be greater than 22.91 mm.

[0043] The X-ray analysis device 1 according to this embodiment can realize a micro-part (positioning) measurement device using a linear X-ray source 11A and based on a Bragg-Brentano optical system (focusing method) or a parallel beam method in a simple manner. By using the parallel slits 13 and a two-dimensional detector (N-dimensional detector: N=0, 1, 2) together, the occurrence of smearing can be suppressed.

[0044] In the X-ray analysis device 1 according to this embodiment, the linear X-ray source 11A can realize an optical system with a high light flux (high flux) of the X-ray beam irradiating the sample 100. In addition, by combining the parallel slits 13, the micro-section optical system can be easily switched.

[0045] Since the positional relationship between the sample 100 and the parallel slits 13 is fixed and the shape of the parallel slits 13 (two parallel plates), the intensity deviation of the X-ray beam irradiated on the sample 100 caused by the rotation of the goniometer 21 can be suppressed. In the Bragg-Brentano optical system, it is possible to perform measurement with the irradiation area of ​​the X-ray beam substantially limited to a certain value. Therefore, by limiting the irradiation area and focusing, the intensity fluctuation caused by the sample orientation can be reduced.

[0046] The X-ray analyzer 1 according to this embodiment can be easily realized by using existing X-ray sources and incident-side optical elements, except that the parallel slits 13 are arranged on the fixed portion 21B provided with the support table 14. The X-ray analyzer 1 according to this embodiment is an optical system for micro-part measurement, and is most suitable not only for micro-part measurement but also for extreme point measurement and stress measurement.

[0047] [Second embodiment]

[0048] The parallel slit 13 of the X-ray analysis apparatus 1 according to the second embodiment of the present invention includes a moving mechanism 25 for moving the parallel slit 13 at least in the y-axis direction, but the other structures are the same as those of the X-ray analysis apparatus 1 according to the first embodiment.

[0049] Figure 4A and Figure 4B Schematic diagram for showing the main structure of the X-ray analysis device 1 according to this embodiment. Since the parallel slit 13 is provided with the moving mechanism 25, the slit portion of the parallel slit 13 can be moved in the y-axis direction. Figure 4A and Figure 4B They respectively represent the parallel slits 13 located at different positions according to the scanning in the y-axis direction and the different regions (irradiation regions IR, IR') of the X-ray beam irradiated on the sample 100 at this time. As a result, the surface scanning (mapping) measurement in the y-axis direction can be performed while the sample 100 is fixed.

[0050] By controlling the movement of the slit portion (gap of the first width W) of the parallel slit 13 in the y-axis direction within the range of the linear ends of the linear X-ray source 11A in the y-axis direction (the range of the linear length P), it is possible to suppress the intensity deviation of the X-ray beam irradiated on the sample 100 by scanning in the y-axis direction. In addition, since the intensity of the X-ray beam is also reduced near the linear ends of the linear X-ray source 11A, it is more preferable to control the movement of the slit portion of the parallel slit 13 in the y-axis direction within a predetermined length q from the linear ends so that the two ends are not affected. That is, the movement range s of the parallel slit 13 is P-2q. Here, the linear length P of the linear X-ray source 11A is about 12 mm, and the sample position has a range of about 20 mm. The predetermined length q for sufficiently suppressing the influence of the linear ends is about 4 mm, so the movement range of the slit portion of the parallel slit 13 in the y-axis direction is about 4 mm.

[0051] The X-ray analysis device 1 according to this embodiment can perform surface scanning measurement while the sample 100 is fixed. Furthermore, during the surface scanning measurement, it is possible to suppress the variation in the light flux of the X-ray beam irradiated on the sample 100.

[0052] Although the parallel slits 13 of this embodiment are provided with a moving mechanism 25, and the moving mechanism 25 moves the parallel slits 13 in the y-axis direction, the present invention is not limited thereto. A moving mechanism may be provided to fix the parallel slits 13 and move the support table 14. In this case, since the moving mechanism moves the support table 14 in the y-axis direction, the sample 100 can be moved in the y-axis direction. Furthermore, by moving the support table 14 on the xy plane through the moving mechanism, a surface scanning measurement of the sample 100 can be performed.

[0053] The X-ray analysis device according to the embodiment of the present invention has been described above. In the above embodiment, although the shape of the two parallel plates of the parallel slit 13 is a part of a hollow circle, it is not limited to this. When the rotation range of the goniometer 21 is small (θ is small), the shape of the two parallel plates of the parallel slit 13 can also be a rectangle, and an appropriate shape can be selected as needed. Moreover, based on the perspective of miniaturization of the device, although only the X-ray source 11, the incident side slit 12 and the parallel slit 13 are arranged on the incident side of the X-ray analysis device 1 according to the above embodiment, and the optical system is formed with a simple structure, an optical element that makes the X-ray parallel can be further arranged as needed. Moreover, although only the two-dimensional detector 15 is arranged on the receiving side of the X-ray analysis device 1 according to the above embodiment, an optical element such as a receiving side slit can also be arranged as needed.

[0054] The above-mentioned embodiment can reduce the intensity variation of the X-ray beam caused by the sample orientation. In particular, it is possible to perform a measurement in which the irradiation area of ​​the X-ray beam is substantially limited to a certain level. Therefore, the intensity variation caused by the sample orientation can be reduced by limiting the irradiation area and focusing.

[0055] Although the goniometer 21 of the X-ray analysis device 1 involved in the above-mentioned embodiment is a θ-θ type goniometer with a horizontal sample configuration, it is not limited to this, and can also be a 2θ-θ type goniometer in which the incident side arm 21A is fixed and the fixing part 21B is rotated θ relative to the incident side arm 21A, and the receiving side arm 21C is rotated 2θ relative to the incident side arm 21A.

Claims

1. An X-ray analysis device, characterized in that: have: A goniometer having an incident side arm extending along a first direction, a fixing portion, and a receiving side arm; An X-ray source, which is arranged on the incident side arm and is used to generate X-rays extending along a second direction intersecting the first direction; A support platform, which is arranged on the fixing part and is used to support the sample; A parallel slit, which is arranged on the fixing portion and includes two parallel plates facing each other, and is used to limit the line width of the X-rays generated by the X-ray source and propagating toward the sample through the parallel slits along the second direction; as well as The detector is arranged on the receiving side arm and is used for detecting the scattered X-rays generated by the sample.

2. The X-ray analysis device according to claim 1, characterized in that: A moving mechanism for moving the parallel slits in the second direction is provided.

3. The X-ray analysis device according to claim 1 or 2, characterized in that: The parallel slits have a shape of a portion of a hollow circle.

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