Method for Detecting an Attempt to Compromise the Integrity of an Integrated Circuit and Integrated Circuit

CN111933584BActive Publication Date: 2025-07-08STMICROELECTRONICS (ROUSSET) SAS
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Patent Information

Application Number
CN202010397652.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Priority Date
2019-05-13
Filing Date
2020-05-12
Publication Date
2025-07-08
Estimated Expiration
2040-05-12

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Abstract

A method and an integrated circuit for detecting an attempt to break the integrity of an integrated circuit are disclosed. The integrated circuit includes a semiconductor substrate. The semiconductor substrate has a front side and a back side. A first contact and a second contact spaced apart from each other are located on the front side. A conductive wafer is located on the back side. A detection circuit is configured to detect thinning of the substrate from the back side. The detection circuit includes a measurement circuit that measures a resistance value of the substrate between the at least one first contact, the at least one second contact, and the conductive wafer. Thinning is detected in response to the measured resistance value.
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Citation Information

Patent Citations

  • Method for detecting a breach of the integrity of a semiconductor substrate of an integrated circuit from its rear face, and corresponding device

    US20190244915A1

  • Tamper-resistant semiconductor device and methods of manufacturing thereof

    CN101772775A

  • Integrated circuit with detection of thinning via back face and decoupling capacitors

    CN108511418A

  • Integrated circuit

    CN212277172U