Bulk substrate support with substrate warping capability

Abstract

Methods and apparatus for supporting substrates are provided herein. In some embodiments, a substrate support for supporting a plurality of substrates includes: a plurality of substrate support elements having an annular shape and configured to support a plurality of substrates in a vertically spaced relationship; and a plurality of substrate lifting elements interfacing with the plurality of substrate support elements and configured to selectively raise or lower substrates simultaneously to remove substrates from or place substrates on corresponding substrate support elements.

Description

Technical Field

[0001] Embodiments of the present invention generally relate to semiconductor substrate processing equipment and, more particularly, to batch substrate supports for supporting a plurality of substrates for use in such processing equipment. Background Art

[0002] In the processing of semiconductor substrates or wafers, on which integrated circuit structures are formed, the substrates are often degassed between processes to remove adsorbed gases, moisture, etc., from the substrates, for example, before deposition or other processes are performed on the substrates. If the adsorbed gaseous impurities are not removed prior to subsequent processing, they may undesirably outgas during processing, leading to contamination, quality degradation, etc.

[0003] Furthermore, the inventors have observed that many conventional degassing chambers process a single substrate at a time. Multiple degassing chambers could be provided to increase throughput. However, this solution is costly.

[0004] Accordingly, the present inventors provide improved methods and apparatus for supporting multiple substrates, and improved methods and apparatus for degassing substrates. Summary of the Invention

[0005] Methods and apparatus for supporting substrates are provided herein. In some embodiments, a substrate support for supporting a plurality of substrates includes: a plurality of substrate support elements having an annular shape and configured to support the plurality of substrates in a vertically spaced relationship; and a plurality of substrate lifting elements interfacing with the plurality of substrate support elements and configured to simultaneously selectively raise or lower the substrates to remove the substrates from the respective substrate support elements or place the substrates on the respective substrate support elements.

[0006] In some embodiments, a substrate support for supporting a plurality of substrates includes: a lift base; a plurality of substrate lifting members coupled to the lift base; a support base disposed between the lift base and the plurality of substrate lifting members and movable relative to the lift base; and a plurality of substrate support members coupled to the support base and configured to support the plurality of substrates in a vertically spaced relationship, wherein the plurality of substrate lifting members interface with the plurality of substrate support members to selectively raise or lower substrates to remove substrates from or place substrates on the substrate support members.

[0007] In some embodiments, a substrate processing system includes a processing chamber having an interior volume; a substrate support disposed in the interior volume, the substrate support having a lift base coupled to a plurality of lift members via a lift arm and a support base coupled to the plurality of support members via a support arm; a selectively sealable opening formed in a wall of the processing chamber; and a first actuator coupled to the lift base to control a position of the plurality of lift members between at least a transfer position and a processing position.

[0008] Other and further embodiments of the disclosure are described below. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Embodiments of the present invention, briefly summarized above and discussed in greater detail below, may be understood by reference to the illustrative embodiments of the invention depicted in the accompanying drawings. However, the drawings illustrate only typical embodiments of the invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.

[0010] Figure 1 is a schematic side view of a substrate processing system including a substrate support in accordance with at least some embodiments of the present disclosure.

[0011] Figure 2 is an isometric view of a substrate support according to at least some embodiments of the present disclosure.

[0012] Figure 3A and 3B is a partial isometric view of a substrate support in different support positions, according to at least some embodiments of the present disclosure.

[0013] Figure 4 is an exploded isometric view of a substrate support according to at least some embodiments of the present disclosure.

[0014] Figure 5A and 5B is a partial isometric view of a substrate support in different support positions, according to at least some embodiments of the present disclosure.

[0015] Figure 6 is a schematic side view of a substrate processing system including a substrate support in accordance with at least some embodiments of the present disclosure.

[0016] Figure 7 is an isometric view of a substrate support according to at least some embodiments of the present disclosure.

[0017] Figure 8A and 8B According to at least some embodiments of the present disclosure Figure 7 A partially exploded isometric view of a substrate support.

[0018] Figure 9 According to at least some embodiments of the present disclosure Figure 7 A cross-sectional isometric view of a substrate support.

[0019] Figure 10A and 10B are partial cross-sectional isometric views of a substrate support in different supporting positions, according to at least some embodiments of the present disclosure.

[0020] To facilitate understanding, identical reference numerals are used, where possible, to denote identical components common to the figures. The figures are not drawn to scale and may be simplified for clarity. Components and features of one embodiment may be advantageously incorporated into other embodiments without further description. DETAILED DESCRIPTION

[0021] Embodiments of a batch substrate support for supporting multiple substrates and a substrate processing chamber incorporating the batch substrate support are provided herein. Embodiments of the present disclosure advantageously provide full 360-degree substrate backside access when disposed on the substrate support. Embodiments of the present disclosure further advantageously provide accessibility for batch substrate transfer, wherein a substrate transfer robot transfer blade accesses at least two sides of the substrate support.

[0022] Figure 1 is a schematic side view of a substrate processing system having a batch substrate support according to at least some embodiments of the present disclosure. The substrate processing system (system 100) includes a substrate processing chamber (processing chamber 102) having a substrate support 104 configured to support a plurality of substrates aligned in a spaced relationship along a common linear axis that is perpendicular to a major surface of the substrate (e.g., a central axis of the substrate). For example, the substrate support 104 can be configured to support a plurality of substrates in a vertically spaced relationship, such as in Figure 1 . The plurality of substantially planar substrates are of the type commonly used in thin film manufacturing processes (e.g., microelectronic component manufacturing). For example, the substrates can be circular discs (e.g., semiconductor wafers, epoxy wafers, etc.), or glass or plastic substrates having rectangular or other form factors. The substrate support 104 is configured to support substrates having a given size (e.g., a given diameter, such as 150 mm, 200 mm, 300 mm, 450 mm, etc., or other given non-circular dimensions, such as rectangular (e.g., a given length and width), etc.). The spacing between the respective support members is sufficient to allow a transfer blade of a substrate transfer robot to transfer a substrate to or retrieve a substrate from the substrate support 104.

[0023] The substrate support 104 is coupled to an actuator 112 that controls the position of the substrate support 104 at least between a transfer position and a processing position. The actuator 112 can be any suitable linear motion controller, such as a linear drive servo actuator motor, etc. The actuator 112 can be disposed outside the processing chamber 102 and through an opening in the processing chamber 102 that is sealed with, for example, a stainless steel bellows, etc. In the transfer position, the substrate support 104 is configured to provide a path for a transfer blade of a substrate transfer robot to place a substrate on the substrate support 104 or pick up a substrate from the substrate support 104. In the processing position, the substrate support 104 is configured to support each substrate at least along the entire periphery of the substrate. The transfer position and the processing position are each disposed along a central axis of the substrate, such as Figure 1 To transfer multiple substrates to and from the substrate support, the transfer position may include multiple transfer positions, each transfer position corresponding to aligning a corresponding substrate to the substrate transfer plane 108 of the process chamber 102 .

[0024] One or more openings are provided in the processing chamber 102 aligned with the substrate transfer plane 108 to facilitate moving substrates into and out of the processing chamber 102. For example, Figure 1 In the illustrated embodiment, a first slit valve 110 and a second slit valve 111 are provided. The first and second slit valves 110, 111 each include an opening in a wall of the processing chamber and include a door that selectively opens and closes the opening to allow a transfer blade of a substrate transfer robot to extend into the processing chamber 102 to place a substrate on the substrate support 104, or to receive a substrate from the substrate support 104. In some embodiments, the first and second slit valves 110, 111 are disposed on opposite sides of the processing chamber 102.

[0025] exist Figure 1 In the illustrated embodiment, the substrate support 104 includes three vertically spaced substrate support elements or support members. However, a fewer or greater number of support elements may be provided. In some embodiments, the substrate support elements are spaced about 12.0 mm to about 16.0 mm apart.

[0026] The system 100 can be configured for any suitable substrate processing performed on a batch of substrates. Thus, the support system 116 can be operably coupled to the process chamber 102 to facilitate operation and control of the particular process performed in the process chamber 102. In some embodiments, the system 100 is configured to perform a degassing process to remove adsorbed gases, moisture, etc. from the substrates, for example, prior to performing deposition or other processing on the substrates (e.g., the process chamber 102 is a degassing chamber). In such embodiments, the support system can include a heat source (e.g., a microwave heat source, a variable frequency microwave heat source, etc.), a gas source (e.g., an inert gas source, etc.), an exhaust system, a process controller, etc.

[0027] Figure 2 is an isometric view of a substrate support 200 according to at least some embodiments of the present disclosure. The substrate support 200 may be the substrate support 200 described above with reference to FIG. Figure 1 The substrate support 104 is discussed.

[0028] The substrate support 200 includes a support assembly comprising a plurality of support members 202 disposed in a spaced relationship along a common axis of the substrate support (e.g., aligned along a vertical axis). The support members 202 may be configured as a ring having a central opening (e.g., Figure 2 ) or a plate, or some other planar geometry. Providing the support member 202 as a ring or plate advantageously provides full support for the substrate and can further help flatten a warped substrate in certain applications, such as when the substrate is heated while being disposed on the support member 202.

[0029] Each support member 202 includes a support surface 204. The support surface 204 is a substantially flat surface that supports a corresponding substrate and is configured to support a substrate having a given size (e.g., a given diameter for a circular substrate, a given length and width for a rectangular substrate, etc.). In some embodiments, one or more support guides 206 may be provided to guide and maintain the substrate in position on the support surface 204 of the support member 202. The support guides include an inclined surface that guides the substrate toward a center position on the support surface 204 and helps maintain the center position of the substrate during processing and transport. For example, the inclined surface may extend from an upper radially outward position to a lower radially inward position relative to the support surface 204, such that a substrate contacting the support guide 206 is urged toward the center position on the support surface 204 as the substrate moves toward the support surface 204. In some embodiments, a pair of support guides 206 are disposed on opposing sides of the support surface 204. In some embodiments, one or more support guides 206 are disposed along the peripheral edge of the support member 202.

[0030] The substrate support 200 also includes a lift assembly having a plurality of lift members 208 corresponding to the plurality of support members 202. Each lift member 208 includes one or more lift surfaces 210. The lift surfaces 210 are substantially flat surfaces to support a corresponding substrate and are configured to support substrates having the given dimensions discussed above with respect to the support surface 204. In some embodiments, multiple lift surfaces may be provided for a single lift member 208. In some embodiments, multiple lift members 208 may be provided for each respective support member 202. For example, in the embodiment of FIG. Figure 2 In a consistent embodiment, a pair of lifting members 208 are provided for each corresponding support member 202. In some embodiments, Figure 2 In concert, a pair of lifting surfaces 210 is provided for each respective lifting member 208 .

[0031] The plurality of lift members 208 (and corresponding lift surfaces 210) are movable relative to the support member 202 (and corresponding support surface 204) between a processing position in which the lift surfaces 210 are disposed below the support surface 204 and a transfer position in which the lift surfaces 210 are disposed above the support surface 204. In some embodiments, in the transfer position, the lift surfaces 210 are disposed about 7.0 mm to about 9.0 mm above the support surface 204.

[0032] Each support member 202 is configured to interface with one or more lifting members 208 corresponding to the support member 202. For example, openings, holes, and / or slots 252 can be provided in portions of the support members 202 to facilitate movement of the lifting members 208 relative to the support members 202. In some embodiments, the lifting members are provided radially outward of the support members and include inwardly directed fingers having lifting surfaces 210. The inwardly directed fingers (and lifting surfaces 210) extend into corresponding slots formed through the support members 202 to facilitate vertical movement therebetween (e.g., to achieve the handling and transfer positions discussed above).

[0033] In some embodiments, the lifting surfaces 210 are disposed adjacent to the support guides 206. For example, in some embodiments, the lifting surfaces 210 are disposed adjacent to the support guides 206. In some embodiments, the lifting surfaces 210 are disposed so as to at least partially overlap the support guides 206. In some embodiments, the lifting surfaces 210 and the support guides 206 are alternately disposed (e.g., at least one lifting surface 210 is disposed between at least one support guide 206, and / or at least one support guide 206 is disposed between at least one lifting surface 210).

[0034] In some embodiments, the plurality of support members 202 can be coupled to one or more support arms 212 to maintain the support members 202 in a spaced-apart relationship and to enable the plurality of support members 202 to move in unison. Figure 2 As shown, two support arms 212 are disposed on opposite sides of the support member 202. One or more support arms 212 can be coupled to a support base 214.

[0035] In some embodiments, the plurality of lift members 208 may be coupled to one or more lift arms 216 to hold the lift members 208 in a spaced relationship and to move the plurality of lift members 208 in unison. The one or more lift arms 216 may be coupled to a lift base 218. In some embodiments, and as Figure 2 As shown, the two lifting arms 216 are disposed relative to each other. In some embodiments, and as Figure 2 As shown, two lifting arms 216 are disposed opposite each other, each supporting a separate lifting member 208. In some embodiments, one or more lifting arms 216 are disposed radially outward of one or more support arms 212.

[0036] In some embodiments, the support base 214 is movably disposed on the lift base 218. For example, the support base 214 can be movably coupled to the lift base 218, or the support base 214 can simply rest on the lift base 218 without being coupled to the lift base 218. The guide pin 220 can be disposed in the lift base 218 or at least extend from the lift base 218. In such embodiments, a corresponding guide opening 222 is provided through the support base 214 to interface with the guide pin 220. The guide opening 222 can be a hole, a slot, or other feature formed through the support base 214, having a geometry designed to allow the guide pin 220 to extend through the support base 214 and to allow the support base 214 to move freely along the guide pin 220. For example, the guide pin 220 can support the alignment of the support member 202 as the support base 214 moves in an axial direction away from or closer to the lift base 218.

[0037] In some embodiments, one or more openings 224 may be provided in the lift base 218 to facilitate coupling the lift base 218 to an actuator (e.g., as described above with reference to FIG. Figure 1 The actuator 112 discussed above is used to control the position of the lift base 218.

[0038] To facilitate control of the relative positions of the lift base 218 and the support base 214, in some embodiments, one or more openings 226 may be formed through the lift base 218, and corresponding one or more impact surfaces 228 may be positioned on the support base 214. The impact surfaces 228 cover the openings 226. One or more struts may be provided (see below for details on the impact surfaces). Figure 4 226 ). For example, one or more pillars are provided in the processing chamber, and the one or more pillars are positioned relative to the opening 226 so that the pillars can enter and pass through the lift base 218 as the lift base 218 moves relative to the pillars. When passing through the opening 226, the pillars contact the impact surface of the support base 214, causing the support base to rest on the pillars. Continued movement (e.g., lowering) of the lift base 218 will move the lift base 218 away from the support base 214, and accordingly, the lift member 208 will move downward relative to the support member 202.

[0039] In some embodiments, the lift arm 216 and the support arm 212 each have a length that is selected to provide the respective transfer positions and processing positions discussed above. For example, in some embodiments, the support base 214 can rest on the lift base 218, and when the support base 214 rests on the lift base 218, the lift arm 216 and the support arm 212 each have a length such that the lift surface 210 is disposed above the support surface 204 (e.g., a transfer position, such as Figure 3A In such embodiments, the support base 214 can be moved away from the lift base 218 by a sufficient amount to position the lift surface 210 flush with or below the support surface 204 (e.g., a processing position such as Figure 3B When the support base 214 contacts the posts passing through the opening 226 of the lift base 218 and the lift base 218 moves along the posts in a direction away from the support base 214 , the support base 214 may move away from the lift base 218 .

[0040] For example, Figure 4 is an exploded isometric view of a substrate support 200 according to at least some embodiments of the present disclosure. Figure 4 In the embodiment shown, the support assembly 412 is nested within the lift assembly 414. The support assembly 412 includes the components described above. Figure 2 The support components discussed above (e.g., support member 202, support arm 212, and support base 214). The lift assembly 414 includes Figure 2 The lift components discussed (eg, lift member 208, lift arm 216, and lift base 218).

[0041] The support base 214 of the support assembly 412 can rest by gravity on the upper surface of the lift base 218, with the guide pins 220 extending through the guide openings 222 of the support base 214 (as shown by the dashed lines 410). A processing chamber component (e.g., the bottom plate 402 of the processing chamber) can support one or more pillars 404 (three pillars 404 are shown), which, depending on the position of the substrate support 200, can extend through the openings 226 of the lift base 218 and can contact the impact surface 228 of the support base 214 (as shown by the dashed lines 408). The one or more pillars 404 can be coupled to the bottom plate 402 in a fixed position. Thus, the lift base 218 (and the entire lift assembly 414) can move freely, constrained only by the processing chamber volume or the travel of the actuator 112. Support base 214 and support assembly 412 will move with lift base 218 until lift base 218 moves downward enough that impact surface 228 of support base 214 contacts the upper surface of post 404. An actuator shaft, such as that of actuator 112, may extend through opening 406 in base plate 402 and couple to lift base 218 to control the position of the lift assembly (as shown by dashed line 416).

[0042] Figure 5A and 5B is a partial isometric view of a substrate support in different support positions, according to at least some embodiments of the present disclosure. Figure 5A The substrate support 200 is shown in a transfer position with the lifting surface 210 disposed above the support surface 204. In such a configuration, the actuator (e.g., Figure 1 The actuator 112 shown in FIG1 raises the lift base 218 sufficiently so that the top surface of the lift base 218 engages the bottom surface of the support base 214. Figure 5A In the position shown, the actuator has further lifted the lift base 218 above the top surface of the support column 404 .

[0043] Figure 5B The substrate support 200 is shown in a processing position with the lifting surface 210 disposed flush with or below the support surface 204. In such a configuration, the actuator (e.g., Figure 1 The actuator 112 shown in FIG) lowers the lift base 218 sufficiently to engage the bottom surface of the support base 214 with the top surface of the support post 404. Figure 5A In the illustrated position, the actuator has sufficiently lowered the lift base 218 to position the lift surface 210 at or below the support surface 204 without the lift surface or other portions of the corresponding lift member 208 entering the space between the corresponding support members 202 .

[0044] Figure 66 is a schematic side view of a substrate processing system having a batch substrate support according to at least some embodiments of the present disclosure. The substrate processing system (system 600) can be similar to system 100 and includes a substrate processing chamber (processing chamber 602) having a substrate support 604 configured to support a plurality of substrates aligned in a spaced relationship along a common linear axis that is perpendicular to a major surface of the substrate (e.g., a central axis of the substrate). The substrate support 604 is configured to support substrates having a given size (e.g., a given diameter, such as 150 mm, 200 mm, 300 mm, 450 mm, etc., or other given non-circular dimensions, such as rectangular (e.g., a given length and width), etc.).

[0045] The spacing between the respective support elements is sufficient to allow a transfer blade of a substrate transfer robot to transfer a substrate to or retrieve a substrate from the substrate support 604. Figure 6 In the illustrated embodiment, the substrate support 604 includes three vertically spaced substrate support elements or support members. However, a fewer or greater number of support elements may be provided. In some embodiments, the spacing between respective support elements is about 18.0 mm to about 19.0 mm.

[0046] The substrate support 604 includes a support assembly 620 and a lift assembly 622. The support assembly 620 is coupled to a first actuator 612, which controls the position of the support assembly 620 at least between a transport position and a processing position of the substrate support 604. The lift assembly 622 is coupled to a second actuator 614, which controls the position of the lift assembly 622 at least between the transport position and the processing position of the substrate support 604. The support assembly 620 is capable of moving independently of the lift assembly 622. The first actuator 612 and the second actuator 614 can be any suitable linear motion controller, such as a linear drive servo actuator motor, etc. The first and second actuators 612, 614 can be disposed external to the processing chamber 602 and pass through an opening in the processing chamber 602 that is sealed, for example, with a stainless steel bellows.

[0047] In the transfer position, the substrate support 604 is configured to provide a path for a transfer blade of a substrate transfer robot to place a substrate on or pick up a substrate from the substrate support 604. In the processing position, the substrate support 604 is configured to support each substrate along its entire periphery. In some embodiments, the substrate support 604 is configured to support each substrate along at least its periphery. The transfer position and the processing position are each disposed along a central axis of the substrate, such as Figure 6To transfer multiple substrates to and from the substrate support, the transfer position may include multiple transfer positions, each transfer position corresponding to aligning a corresponding substrate to the substrate transfer plane 608 of the processing chamber 602.

[0048] One or more openings are provided in the processing chamber 602 aligned with the substrate transfer plane 608 to facilitate moving substrates into and out of the processing chamber 602. For example, Figure 6 In the illustrated embodiment, a first slit valve 610 and a second slit valve 611 are provided. The first slit valve 610 and the second slit valve 611 each comprise an opening in a wall of the processing chamber and include a door that selectively opens and closes the opening to allow a transfer blade of a substrate transfer robot to extend into the processing chamber 602 to place a substrate onto or receive a substrate from the substrate support 604. In some embodiments, the first slit valve 610 and the second slit valve 611 are disposed on opposite sides of the processing chamber 602.

[0049] System 600 may be configured for any suitable substrate processing performed on a batch of substrates, such as the processes discussed above with respect to system 100. Process chamber 602 may be operably coupled to support system 616 to facilitate operation and control of the particular process performed in process chamber 602.

[0050] Figure 7 is an isometric view of a substrate support 700 according to at least some embodiments of the present disclosure. The substrate support 700 may be the substrate support described above with respect to FIG. Figure 6 The substrate support 604 discussed above. The substrate support 700 includes a support assembly 728 comprising a plurality of support members 702 disposed in a spaced relationship along a common axis of the substrate support (e.g., aligned along a vertical axis). The support members 702 may be configured as a ring having a central opening (e.g., Figure 7 ) or a plate, or some other planar geometry. Providing the support member 702 as a ring or plate advantageously provides full support for the substrate and can further help flatten a warped substrate in certain applications, such as when the substrate is heated while being disposed on the support member 702.

[0051] Each support member 702 includes a support surface 704. The support surface 704 is a substantially flat surface for supporting a corresponding substrate and is configured to support a substrate having a given size (e.g., a given diameter for a circular substrate, a given length and width for a rectangular substrate, etc.). In some embodiments, one or more support guides 706 may be disposed on the support surface 704 of the support member 702. The support guide 706 includes an inclined surface 726 configured to guide the substrate toward a center position on the support surface 704 and help maintain the center position of the substrate during transport and processing. The inclined surface 726 may extend from an upper radially outward position to a lower radially inward position relative to the support surface 704, such that as the substrate moves toward the support surface 704, the substrate contacting the support guide 706 is urged toward the center position on the substrate support surface 704. In some embodiments, a pair of support guides 706 are disposed on opposing sides of the support surface 704. In some embodiments, one or more support guides 706 are disposed along the peripheral edge of the support member 702.

[0052] The substrate support 700 also includes a lift assembly 722 having a plurality of lift members 708 corresponding to the plurality of support members 702. Each lift member 708 includes one or more lift surfaces 710. The lift surface 710 is a substantially flat surface to support a corresponding substrate and is configured to support a substrate having a given size as discussed above with respect to the support surface 704. In some embodiments, multiple lift surfaces may be provided for a single lift member 708. In some embodiments, multiple lift members 708 may be provided for each corresponding support member 702. For example, in the embodiment of FIG. Figure 7 In a consistent embodiment, a pair of lifting members 708 are provided for each corresponding support member 710. In some embodiments, Figure 7 Correspondingly, a pair of lifting surfaces 710 are provided for each respective lifting member 708 .

[0053] The plurality of lift members 708 (and corresponding lift surfaces 710) are movable relative to the support member 702 (and corresponding support surface 704) between a processing position, in which the lift surfaces 710 are disposed coplanar with or below the support surface 704, and a transfer position, in which the lift surfaces 710 are disposed above the support surface 704. In some embodiments, in the transfer position, the lift surfaces 710 are disposed approximately 9.0 mm to approximately 13.0 mm above the support surface 704.

[0054] Each support member 702 is configured to interface with one or more lifting members 708 corresponding to that support member 702. For example, openings, holes, and / or slots 752 can be provided in portions of the support members 702 to facilitate movement of the lifting members 708 relative to the support members 702. In some embodiments, the lifting members 708 are disposed radially outward of the support members 702 and include inwardly directed fingers having lifting surfaces 710. The inwardly directed fingers (and lifting surfaces 710) extend into corresponding slots 724 formed through the support members 702 to facilitate vertical movement therebetween (e.g., to achieve the handling and transfer positions described above).

[0055] In some embodiments, the lifting surfaces 710 are disposed adjacent to the support guides 706. For example, in some embodiments, the lifting surfaces 710 are disposed adjacent to the support guides 706. In some embodiments, the lifting surfaces 710 are disposed so as to at least partially overlap the support guides 706. In some embodiments, the lifting surfaces 710 and the support guides 706 are alternately disposed (e.g., at least one lifting surface 710 is disposed between at least one support guide 706, and / or at least one support guide 706 is disposed between at least one lifting surface 710).

[0056] In some embodiments, the plurality of lift members 708 can be coupled to one or more lift arms 716 to hold the lift members 708 in a spaced relationship and to enable the plurality of lift members 708 to move in unison. The one or more lift arms 716 can be coupled to a lift base 718. In some embodiments, and as Figure 7 As shown, the two lifting arms 716 are disposed relative to each other. In some embodiments, and as Figure 7 As shown, two lifting arms 716 are disposed opposite each other, each supporting a separate lifting member 708. In some embodiments, one or more lifting arms 716 are disposed radially outward of one or more support arms 712.

[0057] In some embodiments, each lifting arm 716 includes spacers 730 disposed between adjacent lifting members 708. In some embodiments, each lifting arm 716 may also include a support 720 disposed between the lowest lifting member 708 and the lifting base 718. For example, Figure 8AAs shown, each lift arm 716 includes two spacers 730 and a support 720 to keep the three lift members 708 spaced apart from each other and from the lift base 718. The height of the support 720 can be greater than the taller of the spacers 730, so that the distance between the lowest lift member 708 and the lift base 718 is greater than the distance between the lowest lift member 708 and the adjacent lift member 708. In some embodiments, a threaded pin 740 is disposed in a first opening in the lift member 708, a first opening in the spacer 730, and a first opening in the support 720 to couple the lift member 708 to the lift base 718. In some embodiments, one or more pins 742 can be disposed in additional openings in the lift member 708 and additional openings in adjacent spacers 730 to advantageously reduce or prevent rotation of the lift member 708 relative to the lift arm 716.

[0058] In some embodiments, the plurality of support members 702 can be coupled to one or more support arms 712 to maintain the support members 702 in a spaced-apart relationship and to move the plurality of support members 702 in unison. In some embodiments, two support arms 712 are disposed on opposite sides of the support member 702. The one or more support arms 712 can be coupled to a support base 714.

[0059] In some embodiments, each support arm 712 includes a spacer 732 disposed between adjacent support members 702. In some embodiments, each support arm 712 may also include a support post 734 disposed between the lowest support member 702 and the support base 714. For example, Figure 8B As shown, each support arm 712 may include two spacers 732 and a support post 734 to maintain the three support members 702 spaced apart from each other and from the support base 714. The height of the support post 734 may be greater than the taller of the spacers 732, such that the distance between the lowest support member 702 and the support base 714 is greater than the distance between the lowest support member 702 and the adjacent support member 702. In some embodiments, the support member 702 may include an opening coaxial with the opening in the spacer 732 and the opening in the support post 734. In some embodiments, the opening in the support member 702 passes through the support guide 706. The support assembly 728 may also include a pin 738 configured to pass through the openings in the support member 702, the spacer 732, and the support post 734 to couple the support member 702 to the support base 714.

[0060] Figure 9 yes Figure 7 In some embodiments, one or more openings 746 are provided in the support base 714 to facilitate coupling the support base 714 to a first actuator (e.g., as described above with reference to FIG. Figure 6The first actuator 612 discussed above may include an actuator shaft that may extend through the opening 904 through the chamber floor 902 and coupled to the support base 714. In some embodiments, one or more openings 746 are provided in the lift base 718 to facilitate coupling the lift base 718 to a second actuator (e.g., as described above with reference to FIG. Figure 6 908 and coupled to the lift base 718. The first actuator 612 and the second actuator 614 are configured to control the position of the support assembly 728 and the lift assembly 722, respectively. Thus, the support base 714 (and the entire support assembly 728) can move freely, constrained only by the volume of the processing chamber or the travel of the first actuator 612. The lift base 718 (and the entire lift assembly 722) can move freely, constrained only by the volume of the processing chamber or the travel of the second actuator 614.

[0061] In some embodiments, the lift arm 716 and the support arm 712 each have a length selected to provide the respective transfer and processing positions described above. For example, in some embodiments, the support arm 712 is shorter than the lift arm 716, such that the support base 714 is elevated relative to the lift base 718. In some embodiments, where the lift base 718 has an annular shape, the inner sidewall of the lift base 718 has a diameter greater than the outer diameter of the support base 714.

[0062] Figure 10A and 10B are partial cross-sectional isometric views of a substrate support in different supporting positions, according to at least some embodiments of the present disclosure. Figure 10A The substrate support 700 is shown in a transfer position with a lift surface 710 disposed above a support surface 704. In such a configuration, the second actuator 614 raises a lift base 718 closer to the support base 714. Alternatively, the first actuator 612 lowers the support base 714 closer to the lift base 718.

[0063] Figure 10B The substrate support 700 is shown in a processing position, wherein the lift surface 710 is disposed flush with or below the support surface 704. In such a configuration, the first actuator 612 lowers the lift base 718 away from the support base 714. Alternatively, the second actuator 614 lowers the support base 714 away from the lift base 718. In some embodiments, the lift base 718 can move between the processing position and the transfer position by approximately 50.0 mm to approximately 80.0 mm.

[0064] While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof.

Claims

1. A substrate support for supporting a plurality of substrates, comprising: a plurality of substrate support elements having an annular shape and configured to support a plurality of substrates in a vertically spaced relationship; and a plurality of substrate lifting elements interfacing with the plurality of substrate supporting elements and configured to selectively raise or lower substrates simultaneously to remove substrates from or place the substrates on the respective substrate supporting elements; a lift base coupled to the plurality of substrate lift elements; and a support base coupled to the plurality of substrate support elements and disposed between the lift base and the plurality of substrate lift elements and movable relative to the lift base; one or more openings formed through the lift base; and one or more corresponding impact surfaces of the support base, the impact surfaces being disposed above the one or more openings; One or more posts are disposed in a fixed position below the substrate support and are positioned to extend through the one or more openings of the lift pedestal and are positioned to contact the one or more corresponding impact surfaces of the support pedestal when the substrate support is in a processing position.

2. The substrate support of claim 1, wherein each of the plurality of substrate supporting elements comprises a slot to receive a finger having a lifting surface extending from each of the plurality of substrate lifting elements.

3. A substrate support according to claim 1, wherein the plurality of substrate lifting elements are movable relative to the plurality of substrate supporting elements between a processing position and a transfer position, wherein in the processing position, each of the plurality of substrate lifting elements is disposed below a corresponding one of the plurality of substrate supporting elements; and in the transfer position, each of the plurality of substrate lifting elements is disposed above the corresponding one of the plurality of substrate supporting elements. 4 . The substrate support of claim 1 , wherein each of the plurality of substrate supporting elements comprises a support guide having an inclined surface.

5. The substrate support of any one of claims 1 to 4, further comprising a lift pedestal coupled to the plurality of substrate lifting elements, wherein the lift pedestal comprises an opening to facilitate coupling the lift pedestal to an actuator.

6. The substrate support of claim 5, further comprising a support base coupled to the plurality of substrate support elements, wherein the support base comprises an opening to facilitate coupling the support base to a second actuator.

7. The substrate support of claim 1, further comprising: One or more guide pins extend from the lift base and through corresponding openings in the support base, wherein the guide pins do not restrict movement of the support base in an axial direction of the guide pins.

8. The substrate support of claim 1, further comprising: One or more support guides are disposed along the substrate support element along a diameter that is equal to or slightly larger than a given diameter of a substrate to be supported.

9. The substrate support of claim 1, wherein: The outer diameter of the lifting base is greater than the outer diameter of the supporting base.

10. A substrate processing system, comprising: a processing chamber having an interior volume; The substrate support of any one of claims 1 to 4, wherein the substrate support is disposed in the interior volume; a selectively sealable opening formed in a wall of the processing chamber; and An actuator is coupled to the lift base to control the position of the lift base in at least a processing position and a transfer position.

11. The substrate processing system according to claim 10, further comprising: A second selectively sealable opening is formed in a wall of the processing chamber.

12. The substrate processing system according to claim 10, wherein: The support base is coupled to a second actuator to control the position of the support base in at least a processing position and a transfer position.

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