Integrated circuit manufacturing light source optimization method and electronic equipment

Abstract

The present invention relates to the field of integrated circuit manufacturing technology, and in particular to an integrated circuit manufacturing light source optimization method and electronic equipment, the method comprising the following steps: S1, providing an initial light source; S2, performing region segmentation according to the light source intensity distribution of the initial light source to obtain a plurality of sub-light source regions; S3, providing at least two matching patterns, matching the at least two matching patterns with each sub-light source region respectively to obtain at least two matching results corresponding to each sub-light source region; S4, performing calculations with each sub-light source region based on the at least two matching results to obtain the best matching pattern corresponding to each sub-light source region; and S5, generating a light source to be optimized based on the best matching pattern corresponding to each sub-light source region. Matching the matching pattern with the segmented sub-light source region can well improve the light source intensity concentration of the light source to be optimized, while making the light source shape more ideal, and better obtaining a light source that meets user needs.

Description

Technical Field

[0001] The present invention relates to the technical field of integrated circuit manufacturing, and in particular to an integrated circuit manufacturing light source optimization method and electronic equipment. Background Art

[0002] Photolithography is one of the key technologies in the manufacture of very large-scale integrated circuits. When the exposure wavelength and numerical aperture of the photolithography machine are constant, resolution enhancement technology is needed to reduce the process factor and improve the photolithography resolution. Light source optimization technology is an important resolution enhancement technology. Compared with traditional resolution enhancement technologies such as optical proximity correction technology, it has greater freedom, low cost and fast implementation speed. It is a key technology to further improve photolithography resolution and process window.

[0003] The light source optimization methods currently under study include light source mask optimization methods based on genetic algorithms, light source optimization algorithms based on particle swarms, light source optimization methods based on linear programming, etc. However, due to the limitations of actual production technology, the light sources optimized by some algorithm simulations sometimes have insufficient light source intensity, fail to achieve the ideal optimization effect, and fail to obtain the desired light source shape. None of the existing algorithms can actually solve these problems. Summary of the invention

[0004] In order to overcome the current technical problem of non-centralized light source distribution when optimizing light sources, the present invention provides an integrated circuit manufacturing light source optimization method and electronic equipment.

[0005] In order to solve the above technical problems, the present invention provides a technical solution: a method for optimizing light sources in integrated circuit manufacturing, comprising the following steps: S1, providing an initial light source; S2, performing regional division according to the light source intensity distribution of the initial light source to obtain multiple sub-light source areas; S3, providing at least two matching patterns, and matching the at least two matching patterns with each of the sub-light source areas respectively to obtain at least two matching results corresponding to each sub-light source area; S4, performing calculations with each of the sub-light source areas based on the at least two matching results to obtain the best matching pattern corresponding to each sub-light source area; and S5, generating a light source to be optimized based on the best matching pattern corresponding to each of the sub-light source areas.

[0006] Preferably, the integrated circuit manufacturing light source optimization method further comprises the following step: S6, optimizing the light source to be optimized using a light source optimization algorithm.

[0007] Preferably, the integrated circuit manufacturing light source optimization method further includes the following steps: S20, pixelating the initial light source, setting a light source intensity threshold and removing light source pixel points below the light source intensity threshold, and removing isolated light source pixel points; step S20 is between step S1 and step S2.

[0008] Preferably, in the above step S3, the at least two matching results include shape parameters about each matching graphic.

[0009] Preferably, the step S4 includes the following steps: S41, generating a corresponding shape based on the shape parameters of each matching graphic and filling the light source intensity value in the shape; S42, obtaining matching parameters based on the shape parameters and light source intensity value in the step S41 and the initial light source calculation, and determining the best matching graphic according to the matching parameters.

[0010] Preferably, in the above step S42, matching calculation is performed based on the normalization method, and the matching parameters The calculation formula is as follows:

[0011]

[0012] Where: For each matching result The light intensity value at .

[0013] Preferably, in the above step S5, the best matching patterns are reassembled in order to obtain the light source to be optimized.

[0014] Preferably, in the above step S3, the at least two matching figures include regular polygons or irregular polygons, the regular polygons include one or more of a circle, a rectangle, and a fan shape, and the irregular polygons include one or more of a leaf shape, a zigzag shape, and an N shape.

[0015] Preferably, in the above step S2, the rule for region segmentation is: light source pixel points with light source intensity values ​​at 8 pixel positions around each pixel are divided into the same group.

[0016] In order to solve the above technical problems, the present invention also provides an electronic device, which includes one or more processors; a storage device for storing one or more programs, when the one or more programs are executed by the one or more processors, the one or more processors implement the method described above.

[0017] Compared with the prior art, the present invention provides an integrated circuit manufacturing light source optimization method and electronic device with the following beneficial effects, including the following steps: S1, providing an initial light source; S2, performing region segmentation according to the light source intensity distribution of the initial light source to obtain a plurality of sub-light source regions; S3, providing at least two matching patterns, matching the at least two matching patterns with each of the sub-light source regions respectively to obtain at least two matching results corresponding to each sub-light source region; S4, performing calculations with each of the sub-light source regions based on the at least two matching results to obtain the best matching pattern corresponding to each of the sub-light source regions; and S5, performing calculations with each of the sub-light source regions based on the at least two matching results to obtain the best matching pattern corresponding to each of the sub-light source regions. The best matching pattern corresponding to the sub-light source area generates a light source to be optimized, and the at least two matching patterns are matched with each of the sub-light source areas respectively to obtain at least two matching results corresponding to each sub-light source area; based on the at least two matching results, calculations are performed with each sub-light source area respectively to obtain the best matching pattern corresponding to each sub-light source area. The provided matching pattern has the characteristics of concentrated light source intensity distribution and ideal light source shape. Matching it with the divided sub-light source areas can well improve the light source intensity concentration of the light source to be optimized, and at the same time make the light source shape more ideal, so as to better obtain a light source that meets user needs and improve the quality of the light source.

[0018] The integrated circuit manufacturing light source optimization method further comprises the following steps:

[0019] S20, pixelating the initial light source, setting a light source intensity threshold and removing light source pixel points that are lower than the light source intensity threshold, while removing isolated light source pixel points, can further centralize the light source, and at the same time effectively obtain an effective light source area that needs to be optimized, thereby improving the efficiency of light source optimization and improving the light source concentration.

[0020] The electronic device provided by the present invention has the same beneficial effects as the method. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 is a flow chart of a method for optimizing a light source for manufacturing an integrated circuit provided by a first embodiment of the present invention;

[0022] Figure 2 is a schematic diagram of an initial light source provided in the integrated circuit manufacturing light source optimization method provided in the first embodiment of the present invention;

[0023] Figure 3 The first embodiment of the present invention provides an integrated circuit manufacturing light source optimization method. Figure 2 An independent schematic diagram of region N;

[0024] Figure 4 is a flow chart of a light source optimization method for integrated circuit manufacturing provided in a variation of the first embodiment of the present invention;

[0025] Figure 5 is a schematic diagram of light source distribution after executing step S20 in the integrated circuit manufacturing light source optimization method provided in a variation of the first embodiment of the present invention;

[0026] Figure 6 It is a schematic diagram of dividing the light source distribution into 8 areas after executing step S20 in the integrated circuit manufacturing light source optimization method provided in the variation of the first embodiment of the present invention;

[0027] Figure 7 It is a schematic diagram of a shape after matching the first area with a fan shape and regenerating a graphic according to shape parameters and filling in the light source intensity in the first embodiment of the present invention;

[0028] Figure 8 It is a schematic diagram of the shape after the first area is matched with a rectangle and the light source intensity is filled after the shape parameters are regenerated;

[0029] Fig. 9 It is a schematic diagram of the shape after a circle is used to match the first area in the first embodiment of the present invention and a shape is regenerated according to shape parameters and then the light source intensity is filled;

[0030] Fig.10 is a detailed flow chart of step S4 in the integrated circuit manufacturing light source optimization method provided by the first embodiment of the present invention;

[0031] Fig.11 is a schematic diagram of the light source to be optimized generated after executing step S5 in the first embodiment;

[0032] Fig.12 is another schematic diagram of the light source to be optimized generated after step S5 is executed in the first embodiment;

[0033] Fig.13 is a flowchart of a variation of the integrated circuit manufacturing light source optimization method provided by the first embodiment of the present invention;

[0034] Fig.14 is a schematic diagram of a module of an electronic device provided in a second embodiment of the present invention;

[0035] Fig.15 It is a schematic diagram of the structure of a computer system suitable for implementing a server of an embodiment of the present invention. DETAILED DESCRIPTION

[0036] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0037] See also Figure 1 The first embodiment of the present invention provides a method for optimizing a light source for manufacturing an integrated circuit, comprising the following steps:

[0038] S1, provide initial light source;

[0039] S2, performing region segmentation according to the light source intensity distribution of the initial light source to obtain a plurality of sub-light source regions;

[0040] S3, providing at least two matching patterns, and matching the at least two matching patterns with each of the sub-light source regions respectively to obtain at least two matching results corresponding to each sub-light source region;

[0041] S4, performing calculations based on the at least two matching results and each sub-light source area to obtain the best matching pattern corresponding to each sub-light source area; and

[0042] S5. Generate a light source to be optimized based on the best matching graph corresponding to each of the sub-light source areas.

[0043] See also Figure 2 The initial light source can be a light source that has not been optimized by any optimization method, or a light source that has been preliminarily optimized by a traditional light source optimization method. Figure 2 As shown in the figure, the horizontal axis of the coordinates is the x-coordinate and the vertical axis is the y-coordinate. The color at the corresponding coordinate position corresponds to the color value bar pattern on the right. The right side is the color map of the light source intensity value. The redder the color, the stronger the intensity, and the bluer the color, the lower the intensity. In order to facilitate the description of the steps later, the coordinate axis and intensity color map are no longer shown in the figure. Figure 2 It should be noted that: since black and white drawings cannot well display the depth of color and cannot intuitively represent the light source intensity value, Figure 2 This is just an example, and it cannot actually show the actual light intensity value representation of the initial light source. In the black and white view, black represents a light intensity value of 0, and a color that is lighter than black represents a light intensity value greater than 0. Figure 2 In the case of medium light intensity value, take out Figure 2 The light source intensity value is marked in a small area N in the image, such as Figure 3 The corresponding area is shown in Figure 1. The light source intensity values ​​are as follows: from the first row to the second row and from left to right in each row:

[0044] 0.08, 0.00, 0.00, 0.08;

[0045] 0.90, 0.95, 0.95, 0.90.

[0046] Traditional light source optimization methods are available, including a light source mask optimization method based on a genetic algorithm, a light source optimization algorithm based on a particle swarm, a light source optimization method based on linear programming, and the like.

[0047] See also Figure 4 , a method for optimizing light sources in integrated circuit manufacturing further comprises the following steps:

[0048] S20, pixelating the initial light source, setting a light source intensity threshold and removing light source pixel points below the light source intensity threshold, and removing isolated light source pixel points; step S20 is between step S1 and step S2.

[0049] In step S20, light source pixels below the light source intensity threshold and isolated light source pixels are removed, which can effectively improve the concentration of the light source, so as to better obtain a suitable light source in the light source optimization process. The specific light source intensity threshold can be set according to user needs, such as 0.1, 0.2, 0.3 and other values. Figure 5 As shown in , the light source intensity threshold is 0.1, and the schematic diagram after isolated light source pixels are removed.

[0050] In step S2, region segmentation is performed according to the light source intensity distribution of the initial light source to obtain a plurality of sub-light source regions.

[0051] See also Figure 6 In this step, the specific region segmentation rule is: divide the light source pixels with light source intensity values ​​at the 8 pixel positions around each pixel into the same group. Specifically, the 8 pixel positions include top, bottom, left, right, upper left, lower left, lower right, and upper right. As an example, the initial light source is divided into 8 sub-light source regions, specifically region 1, region 2, region 3, region 4, region 5, region 6, region 7, and region 8. Corresponding Figure 6 The numbers 1, 2, 3, 4, 5, 6, 7, 8 in the table.

[0052] After the initial light source is divided, the pixel values ​​of the pixels in each sub-light source area may be unified, or the original light source intensity value may be retained.

[0053] In the above step S3, at least two matching patterns are provided, and the at least two matching patterns are matched with each of the sub-light source areas to obtain at least two matching results corresponding to each sub-light source area. The at least two matching patterns include regular polygons or irregular polygons, the regular polygons include one or more of the shapes of a circle, a rectangle, a fan, etc., and the irregular polygons include one or more of the shapes of a leaf, a zigzag, an N, etc.

[0054] The at least two matching results include shape parameters for each matching graphic. For example, the shape parameters of a sector are inner radius r1, outer radius r2, angle a1, angle a2, where the inner and outer radii are calculated with the coordinate point (0, 0) as the center of the circle; the shape parameters of a rectangle are lower left corner horizontal coordinate x1, lower left corner vertical coordinate y1, upper right corner horizontal coordinate x2, upper right corner vertical coordinate y2, upper left corner horizontal coordinate x3, upper left corner vertical coordinate y3, lower right corner horizontal coordinate x4, lower right corner vertical coordinate y4; the shape parameters of a circle are center coordinates (x, y), radius r.

[0055] See also Figure 7 , 8 and Fig. 9 , after matching the sector, rectangle and circle with area 1, the corresponding shape parameters are obtained, and the corresponding shape is regenerated by the shape parameters, and the light intensity value is filled in the shape as 1. It should be noted that Figure 7 There is a certain difference between the shape in the image and the fan-shaped shape, which is mainly determined by the resolution. If the resolution is increased, a strict fan-shaped shape will be obtained. Fig. 9 The circular area in the figure also appears similar to the positive direction shape due to the low resolution of the image.

[0056] In the above step S4, calculations are performed based on the at least two matching results and each sub-light source region to obtain the best matching pattern corresponding to each sub-light source region.

[0057] The at least two matching results are shape parameters corresponding to each matching graphic.

[0058] See also Fig.10 , the step S4 comprises the following steps:

[0059] S41, generating a corresponding shape based on the shape parameters of each matching graphic and filling the light source intensity value in the shape;

[0060] S42, obtaining matching parameters based on the shape parameters and light source intensity values ​​in step S41 and the initial light source calculation, and determining the best matching pattern according to the matching parameters.

[0061] In the above step S41, the light source intensity value filled in the shape may be the same value for each shape, or different values ​​may be filled according to some filling rules.

[0062] In the above step S42, there can be many methods for calculation and matching, which are not specifically limited. The following provides a method for matching calculation based on the normalization method, matching parameters The calculation formula is as follows:

[0063]

[0064] Where: For each matching result The light intensity value at .

[0065] After the calculation is completed, the matching parameters of each matching graph will be obtained, and the graph with the larger matching parameter value will be selected as the best matching graph.

[0066] See also Fig.11 After the best matching graph is obtained for each sub-light source area, in step S5, the light source to be optimized is generated based on the best matching graph corresponding to each sub-light source area. That is, the best matching graphs of each sub-light source area are reassembled in order to obtain the light source to be optimized. Fig.11 The image shown in FIG. 1 is an image with the same resolution as the initial light source layout, and the interval between the coordinate points is 0.625.

[0067] See also Fig.12 ,Usually, different users have different requirements for image resolution, Fig.12 The image in the figure shows the result after the resolution is increased, and the coordinate point interval is 0.1.

[0068] See also Fig.13 , the integrated circuit manufacturing light source optimization method further comprises the following steps:

[0069] S6, optimizing the light source to be optimized using a light source optimization algorithm. In this step, the light source optimization algorithm is an existing light source optimization algorithm, including a light source mask optimization method based on a genetic algorithm, a light source optimization algorithm based on a particle swarm, a light source optimization method based on linear programming, and the like.

[0070] See also Fig.14 , a second embodiment of the present invention provides an electronic device, which includes one or more processors 301;

[0071] The storage device 302 is used to store one or more programs.

[0072] When the one or more programs are executed by the one or more processors 301 , the one or more processors 301 implement the integrated circuit manufacturing light source optimization method provided in the first embodiment or its variant embodiments.

[0073] Reference below Fig.15 , which shows a schematic diagram of the structure of a computer system 800 of a terminal device / server suitable for implementing an embodiment of the present invention. Fig.15 The terminal device / server shown is merely an example and should not impose any limitations on the functionality and scope of use of the embodiments of the present application.

[0074] like Fig.15 As shown, the computer system 800 includes a central processing unit (CPU) 801, which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM) 802 or a program loaded from a storage part 808 into a random access memory (RAM) 803. In the RAM 803, various programs and data required for the operation of the system 800 are also stored. The CPU 801, the ROM 802, and the RAM 803 are connected to each other via a bus 804. An input / output (I / O) interface 805 is also connected to the bus 804.

[0075] The following components are connected to the I / O interface 805: an input section 806 including a keyboard, a mouse, etc.; an output section 807 including a cathode ray tube (CRT), a liquid crystal display (LCD), etc., and a speaker, etc.; a storage section 808 including a hard disk, etc.; and a communication section 809 including a network interface card such as a LAN card, a modem, etc. The communication section 809 performs communication processing via a network such as the Internet. A drive 810 is also connected to the I / O interface 805 as needed. A removable medium 811, such as a magnetic disk, an optical disk, a magneto-optical disk, a semiconductor memory, etc., is installed on the drive 810 as needed, so that a computer program read therefrom is installed into the storage section 808 as needed.

[0076] According to an embodiment of the present disclosure, the process described above with reference to the flowchart can be implemented as a computer software program. For example, an embodiment of the present disclosure includes a computer program product, which includes a computer program carried on a computer-readable medium, and the computer program includes a program code for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from the network through the communication part 809, and / or installed from the removable medium 811. When the computer program is executed by the central processing unit (CPU) 801, the above functions defined in the method of the present invention are executed. It should be noted that the computer-readable medium described in the present invention can be a computer-readable signal medium or a computer-readable storage medium or any combination of the above two. The computer-readable storage medium can be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device or device, or any combination of the above. More specific examples of computer-readable storage media may include, but are not limited to, an electrical connection having one or more conductors, a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), optical fibers, a portable compact disk-read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing.

[0077] Computer program code for performing the operations of the present application may be written in one or more programming languages ​​or a combination thereof, including object-oriented programming languages, such as Java, Smalltalk, C++, and conventional procedural programming languages, such as "C" or similar programming languages. The program code may be executed entirely on the user's computer, partially on the user's computer, as a separate software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In the case of a remote computer, the remote computer may be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or may be connected to an external computer (e.g., via the Internet using an Internet service provider).

[0078] The flow chart and block diagram in the accompanying drawings illustrate the possible architecture, function and operation of the system, method and computer program product according to various embodiments of the present invention. In this regard, each square box in the flow chart or block diagram can represent a module, a program segment or a part of a code, and the module, the program segment or a part of the code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the square box can also occur in a sequence different from that marked in the accompanying drawings. For example, two square boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each square box in the block diagram and / or flow chart, and the combination of the square boxes in the block diagram and / or flow chart can be implemented with a dedicated hardware-based system that performs the specified function or operation, or can be implemented with a combination of dedicated hardware and computer instructions.

[0079] The computer-readable medium carries one or more programs. When the one or more programs are executed by the device, the device performs the following steps: S1, providing an initial light source; S2, performing region segmentation according to the light source intensity distribution of the initial light source to obtain multiple sub-light source regions; S3, providing at least two matching patterns, matching the at least two matching patterns with each of the sub-light source regions respectively to obtain at least two matching results corresponding to each sub-light source region; S4, performing calculations with each of the sub-light source regions based on the at least two matching results to obtain the best matching pattern corresponding to each sub-light source region; S5, generating a light source to be optimized based on the best matching pattern corresponding to each of the sub-light source regions; and

[0080] S6. Optimizing the light source to be optimized using a light source optimization algorithm.

[0081] Compared with the prior art, the present invention provides an integrated circuit manufacturing light source optimization method and electronic device with the following beneficial effects, including the following steps: S1, providing an initial light source; S2, performing region segmentation according to the light source intensity distribution of the initial light source to obtain a plurality of sub-light source regions; S3, providing at least two matching patterns, matching the at least two matching patterns with each of the sub-light source regions respectively to obtain at least two matching results corresponding to each sub-light source region; S4, performing calculations with each of the sub-light source regions based on the at least two matching results to obtain the best matching pattern corresponding to each sub-light source region; and S5, generating a light source to be optimized based on the best matching pattern corresponding to each of the sub-light source regions, matching the at least two matching patterns with each of the sub-light source regions respectively to obtain at least two matching results corresponding to each sub-light source region; performing calculations with each of the sub-light source regions based on the at least two matching results to obtain the best matching pattern corresponding to each sub-light source region, the provided matching pattern has the characteristics of concentrated light source intensity distribution and ideal light source shape, and using it to match the segmented sub-light source regions can well improve the light source intensity concentration of the light source to be optimized, and at the same time make the light source shape more ideal, so as to better obtain a light source that meets user needs.

[0082] The integrated circuit manufacturing light source optimization method further comprises the following steps:

[0083] S20, pixelating the initial light source, setting a light source intensity threshold and removing light source pixel points that are lower than the light source intensity threshold, while removing isolated light source pixel points, can further centralize the light source, and at the same time effectively obtain an effective light source area that needs to be optimized, thereby improving the efficiency of light source optimization and improving the light source concentration.

[0084] The electronic device provided by the present invention has the same beneficial effects as the method.

[0085] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A method for optimizing light sources in integrated circuit manufacturing, characterized in that: The steps include: S1, provide initial light source; S2, performing region segmentation according to the light source intensity distribution of the initial light source to obtain a plurality of sub-light source regions; S3, providing at least two matching patterns, and matching the at least two matching patterns with each of the sub-light source regions respectively to obtain at least two matching results corresponding to each sub-light source region; S4, performing calculations based on the at least two matching results and each sub-light source area to obtain the best matching graph corresponding to each sub-light source area; and S5. Generate a light source to be optimized based on the best matching graph corresponding to each of the sub-light source areas.

2. The integrated circuit manufacturing light source optimization method according to claim 1, characterized in that: The integrated circuit manufacturing light source optimization method further comprises the following steps: S6. Optimizing the light source to be optimized using a light source optimization algorithm.

3. The integrated circuit manufacturing light source optimization method according to claim 1, characterized in that: The integrated circuit manufacturing light source optimization method further comprises the following steps: S20, pixelating the initial light source, setting a light source intensity threshold and removing light source pixel points whose intensity is lower than the light source intensity threshold, and removing isolated light source pixel points; The step S20 is between the step S1 and the step S2.

4. The integrated circuit manufacturing light source optimization method according to claim 1, characterized in that: In the above step S3, the at least two matching results include shape parameters about each matching graphic.

5. The integrated circuit manufacturing light source optimization method according to claim 4, characterized in that: The step S4 comprises the following steps: S41, generating a corresponding shape based on the shape parameters of each matching graphic and filling the light source intensity value in the shape; S42, obtaining matching parameters based on the shape parameters and light source intensity values ​​in step S41 and the initial light source calculation, and determining the best matching pattern according to the matching parameters.

6. The integrated circuit manufacturing light source optimization method according to claim 5, characterized in that: In the above step S42, matching calculation is performed based on the normalization method, and the matching parameter R ccoeff_normed The calculation formula is as follows: Where: T′(x′, y′) is the light intensity value of the initial light source at point x′, y′; I′(x′, y′) is the light intensity value of the matching pattern corresponding to each matching result at point x′, y′.

7. The integrated circuit manufacturing light source optimization method according to claim 5, characterized in that: In the above step S5, the best matching patterns are reassembled in order to obtain the light source to be optimized.

8. The integrated circuit manufacturing light source optimization method according to claim 1, wherein: In the above step S3, the at least two matching graphics include regular polygons or irregular polygons, the regular polygons include one or more of a circle, a rectangle, and a fan, and the irregular polygons include one or more of a leaf shape, a zigzag shape, and an N shape.

9. The integrated circuit manufacturing light source optimization method according to claim 3, characterized in that: In the above step S2, the rule for region segmentation is: light source pixel points with light source intensity values ​​at 8 pixel positions around each pixel are divided into the same group.

10. An electronic device, characterized in that: It includes one or more processors; a storage device for storing one or more programs, When the one or more programs are executed by the one or more processors, the one or more processors implement the integrated circuit manufacturing light source optimization method as claimed in claim 1.

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