Flow cell device

Abstract

The flow cell device of the present invention is characterized by comprising: a flow passage portion through which a flow medium flows; and a flow cell portion in which the flow passage portion is formed.

Description

Technical Field

[0001] The present invention relates to a flow cell device, and more particularly to a flow cell device capable of accurately monitoring the state of a flowing medium under the use conditions of the flowing medium. Background Art

[0002] Generally speaking, an etching process is performed in a semiconductor manufacturing process such as a semiconductor wafer or a solar cell. In the etching process, a high-temperature etching solution (flowing medium) such as a phosphoric acid solution is used to etch a silicon nitride film. Dissolved matter such as silicon from the semiconductor wafer is dissolved and included in the etching solution, and thus the concentration of the dissolved matter in the etching solution increases as the etching process of the semiconductor wafer proceeds. After the concentration of the dissolved matter in the etching solution increases to a fixed concentration or more, the etching solution is replaced.

[0003] Since it is difficult to micro-analyze the concentration of silicon in the etching solution at high temperature, a portion of the etching solution is collected and cooled to room temperature. In order to increase the detection sensitivity of the cooled etching solution, the concentration of the etching solution is detected after performing chemical treatment multiple times.

[0004] However, in the past, the etching solution was cooled to room temperature and then chemical treatment was performed multiple times, so the detection error range increased with the temperature difference of the etching solution. Therefore, it is difficult to accurately predict the state of the etching solution under the use conditions applied to actual semiconductor processes.

[0005] Furthermore, when a high-temperature etching solution is cooled to room temperature, an eluted substance is easily precipitated from the etching solution, and thus it is difficult to accurately measure the concentration of the eluted substance in the etching solution.

[0006] In addition, in order to accurately measure the concentration of the etching solution, chemical treatment is performed multiple times, which makes the matrix in the concentration analysis complicated and reduces the accuracy of the analyzed concentration.

[0007] The background technology of the present invention is disclosed in Korean Patent Gazette No. 1785859 (authorized on September 29, 2017, invention title: Fluorescent silicon nanoparticles for copper ion detection, manufacturing method thereof, and detection sensor using the same). Summary of the invention

[0008] Technical issues to be solved

[0009] According to one embodiment of the present invention, there is provided a flow cell device capable of accurately monitoring the state of a flowing medium under the use conditions of the flowing medium.

[0010] Solutions to technical problems

[0011] The flow cell device of the present invention includes: a flow passage portion through which a flow medium flows; and a flow cell portion in which the flow passage portion is formed.

[0012] The flow pool portion may include: a flow pool main body portion, which is formed with the flow path portion; a supply pipe portion, which is connected to one side of the flow pool main body portion so as to supply a flow medium to the flow pool main body portion; and a discharge pipe portion, which is connected to the other side of the flow pool main body portion so as to discharge the flow medium of the flow pool main body portion.

[0013] The supply pipe part may be connected to a lower side of the flow cell main body part, and the discharge pipe part may be connected to an upper side of the flow cell main body part.

[0014] The cross-sectional area of ​​the flow cell main body may be formed to be larger than the cross-sectional area of ​​the supply pipe portion so that the flow medium forms a turbulent flow in the flow cell main body.

[0015] The supply pipe portion may include: a first supply pipe portion that supplies a flow medium; a second supply pipe portion, the diameter of which is formed to be larger than the diameter of the first supply pipe portion so that the flow medium supplied by the first supply pipe portion forms turbulence; and a third supply pipe portion that extends from the second supply pipe portion and is connected to one side of the flow pool main body portion.

[0016] In addition, the present invention may further include: a first optical part, which is configured to allow light irradiated from the light source part to irradiate the flowing medium of the flow pool part; and a second optical part, which is configured to allow light that passes through the flowing medium of the flow path part and absorbs the wavelength of the flowing medium to irradiate the light detection part.

[0017] The first optical part may be disposed on one side of the flow cell main body so that the irradiation direction of the light is parallel to the flow direction of the flowing medium.

[0018] The first optical part may include: a first optical sliding part, which is arranged on one side of the flow cell main body; a first reflecting mirror, which is arranged on the first optical sliding part so that the light incident from the light source part is irradiated on the flowing medium of the flow cell main body; and a first position adjusting part, which is provided on the first optical sliding part to adjust the position of the first reflecting mirror.

[0019] The second optical part may include: a second optical sliding part, which is arranged on the other side of the flow cell main body; a second reflecting mirror, which is arranged on the second optical sliding part, so that light with a wavelength of the flowing medium of the flow cell main body is absorbed is irradiated to the light detecting part; and a second position adjusting part, which is provided on the second optical sliding part to adjust the position of the second reflecting mirror.

[0020] The flow cell device may further include an elastic pressure portion, which is disposed on the housing portion to elastically support an outer side surface of the flow cell portion.

[0021] A spacing space may be further formed inside the housing portion to allow expansion space for the flow cell portion.

[0022] The flow cell device may further include: a first collimator portion opposite to the first optical portion and connected to the first optical fiber portion; and a second collimator portion opposite to the second optical portion and connected to the second optical fiber portion.

[0023] The flow cell device may further include a bubble removal section connected to a flowing medium inflow side of the flow cell section and removing bubbles mixed in the flowing medium flowing into the flow cell section.

[0024] The bubble removal unit may include: a bubble exhaust line connected to a flow medium inflow side of the flow cell unit; and a bubble exhaust valve provided on the bubble exhaust line.

[0025] One side of the bubble exhaust line may be connected to a circulation pump provided in the circulation flow path portion.

[0026] The bubble removal part may further include a medium discharge valve provided at the bubble discharge line to discharge the flow medium contained in the flow cell part.

[0027] Effects of the Invention

[0028] According to the present invention, a high-temperature flowing medium flows in the flow pool portion, and the wavelength of the flowing medium is absorbed by light, so there is no need to chemically treat the flowing medium multiple times to measure the concentration of the flowing medium under the conditions used in actual semiconductor processes and increase the detection sensitivity of the flowing medium.

[0029] In addition, according to the present invention, the elastic pressurizing portion elastically supports the outer side surface of the flow cell portion, so that even if the flow cell portion expands or contracts due to the temperature of the flowing medium, the elastic pressurizing portion can stably support the flow cell portion. Therefore, it is possible to prevent the flow cell portion from being damaged by the pressure of the housing portion when expanding or contracting. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 is a cross-sectional view showing a flow cell device according to one embodiment of the present invention.

[0031] Figure 2 1 is a perspective view showing a flow cell section in a flow cell device according to an embodiment of the present invention.

[0032] Figure 3 This is a diagram schematically showing a state where a flow cell device according to an embodiment of the present invention is installed in an inclined manner.

[0033] Figure 4 This is a diagram schematically showing a state in which a bubble removal unit according to an embodiment of the present invention is mounted on a flow cell device.

[0034] Figure 5 1 is a block diagram showing a first embodiment of an etching apparatus to which a flow cell apparatus according to an embodiment of the present invention is applied.

[0035] Figure 6 1 is a block diagram showing a second embodiment of an etching apparatus to which a flow cell apparatus according to an embodiment of the present invention is applied.

[0036] Figure 7 1 is a block diagram showing a third embodiment of an etching apparatus to which a flow cell apparatus according to an embodiment of the present invention is applied.

[0037] Figure 8 : is a graph showing a first method of measuring the concentration of a flowing medium in a flow cell device according to one embodiment of the present invention.

[0038] Fig. 9 : is a graph showing a second method of measuring the concentration of a flowing medium in a flow cell device according to one embodiment of the present invention. DETAILED DESCRIPTION

[0039] An embodiment of the flow cell device of the present invention is described below with reference to the accompanying drawings. In the process of describing the flow cell, the thickness of the lines shown in the figure or the size of the constituent elements, etc., can be exaggeratedly shown for the clarity and convenience of the description. In addition, the terms described later are defined as terms taking into account the functions in the present invention, and they may vary depending on the intention or convention of the user or operator. Therefore, the definition of such terms should be made based on the entire content of this specification.

[0040] Figure 1 is a cross-sectional view showing a flow cell device according to an embodiment of the present invention, Figure 2 is a perspective view showing a flow cell portion in a flow cell device according to an embodiment of the present invention, Figure 3 This is a diagram schematically showing a state where a flow cell device according to an embodiment of the present invention is installed in an inclined manner.

[0041] Reference Figures 1 to 3 A flow cell device 100 according to an embodiment of the present invention includes a housing portion 110 , a flow cell portion 120 , a first optical portion 130 , and a second optical portion 140 .

[0042] The housing 110 is formed long along the length direction. The housing 110 may be formed in a rectangular box shape. The housing 110 may be formed of a heat-resistant material to prevent thermal deformation at high temperatures.

[0043] The flow pool portion 120 is accommodated in the housing portion 110, and is formed with a flow passage portion 122 for the flow of the flow medium. The cross-section of the flow passage portion 122 is formed in a circular shape to reduce the resistance of the flow medium. The flow medium can be an etching solution used in a semiconductor process when manufacturing semiconductor wafers or solar cells. As an etching solution, a phosphoric acid solution of 150°C-200°C can be used. The flow pool portion 120 can be formed of any one of quartz material, pyrex glass, polytetrafluoroethylene material (Teflon) and sapphire material to prevent thermal deformation and corrosion due to the flow medium of about 150°C-200°C.

[0044] In the flow pool section 120 , in order to suppress the precipitation of substances contained in the flow medium, the flow medium heated to 150° C.-200° C. can be made to flow. Therefore, in order to make the wavelength of the high-temperature flow medium be absorbed by light, the high-temperature flow medium can flow in the flow pool section 120 .

[0045] Therefore, it is not necessary to chemically treat the flowing medium multiple times to measure the concentration of the flowing medium under the conditions used in the actual semiconductor process and increase the flowing medium detection sensitivity. In addition, since it is not necessary to cool the flowing medium to room temperature, it is possible to prevent detection errors caused by temperature differences in the flowing medium, and accurately predict the state of the flowing medium under the conditions of use applied in the actual semiconductor process. In addition, it is possible to simply create a matrix in the concentration analysis, improving the accuracy of the analysis concentration.

[0046] The first optical part 130 is arranged on the housing part 110 so that the light irradiated from the light source part 171 is irradiated in parallel with the flow direction of the flowing medium of the flow cell part 120. At this time, in the flow cell part 120, the light travels along the traveling direction of the flowing medium, so when the light passes through the flowing medium, the scattering and refraction caused by bubbles or dissolution can be minimized, and the light loss can be reduced. In addition, the light can smoothly absorb the wavelength of the dissolution contained in the flowing medium while passing through the flowing medium, so that the light detection efficiency can be improved.

[0047] The second optical portion 140 is disposed in the housing portion 110 so that light that has passed through the flowing medium of the flow passage portion 122 and has absorbed the wavelength of the flowing medium is irradiated onto the light detection portion 173 .

[0048] The flow cell portion 120 includes a flow cell body portion 121 , a supply pipe portion 123 , and a discharge pipe portion 125 .

[0049] The flow cell main body 121 is accommodated in the interior of the housing 110, and a flow passage 122 is formed therein. The cross section of the flow cell main body 121 is formed in a circular shape. Since the cross section of the flow cell main body 121 is formed in a circular shape, the flow resistance of the flow medium flowing along the flow passage 122 can be reduced.

[0050] The supply pipe part 123 is connected to one side of the flow cell main body part 121 to supply the flow medium to the flow cell main body part 121. The cross section of the supply pipe part 123 is formed in a circular shape to reduce the flow resistance of the flow medium.

[0051] The discharge pipe part 125 is connected to the other side of the flow cell main body part 121 to discharge the flow medium of the flow cell main body part 121. The cross section of the discharge pipe part 125 is formed in a circular shape to reduce the flow resistance of the flow medium.

[0052] Since the supply pipe 123 is connected to one side of the flow cell body 121 and the discharge pipe 125 is connected to the other side of the flow cell body 121 , the flow medium flows from one side of the flow cell body 121 to the other side of the flow cell body 121 .

[0053] The supply pipe 123 is connected to the lower side of the flow cell body 121, and the discharge pipe 125 is connected to the upper side of the flow cell body 121. At this time, the specific gravity of the bubbles contained in the fluid medium is lighter than the specific gravity of the fluid medium itself.

[0054] The cross-sectional area of ​​the flow cell main body 121 may be formed to be larger than the cross-sectional area of ​​the supply pipe 123 so that the flowing medium forms turbulence in the flow cell main body 121. Therefore, the cross-sectional area of ​​the flow cell main body 121 is sharply increased compared to the cross-sectional area of ​​the supply pipe 123, so that when the flowing medium of the supply pipe 123 flows into the flow cell main body 121, a part of the flowing medium can be prevented from stagnating inside the flow cell 120 by the turbulence. Therefore, when light passes through the flowing medium, the concentration of the flowing medium can be accurately measured.

[0055] The supply pipe part 123 is connected to the lower part of the flow cell part 120, and the discharge pipe part 125 is connected to the upper side of the flow cell part 120, so the flowing medium flows from the lower side to the upper side of the flow cell part 120. In addition, most of the bubbles contained in the flowing medium flow across the diameter of the flow cell part 120 and then flow along the upper side of the flow cell part 120, so when the light flows along the inside of the flow cell part 120, the light loss caused by light scattering or refraction caused by bubbles can be minimized.

[0056] The supply pipe portion 123 includes a first supply pipe portion 123 a , a second supply pipe portion 123 b , and a third supply pipe portion 123 c .

[0057] The first supply pipe 123 a supplies the flow medium and is disposed at a fixed interval from one side of the flow cell main body 121 toward the center.

[0058] The second supply pipe portion 123b is formed to have a diameter thicker than that of the first supply pipe portion 123a, so that the flow medium supplied from the first supply pipe portion 123a forms turbulence. Since the second supply pipe portion 123b is thicker than the first supply pipe portion 123a, the flow medium of the first supply pipe portion 123a diffuses and the flow velocity increases when flowing into the second supply pipe portion 123b. Therefore, the flow medium forms turbulence in the second supply pipe portion 123b, thereby suppressing a portion of the flow medium from stagnating inside the flow cell portion 120.

[0059] The third supply pipe portion 123c extends from the second supply pipe portion 123b and is connected to one side of the flow cell main body 121 in a manner that is inclined with respect to the length direction of the flow cell main body 121. At this time, the third supply pipe portion 123c is formed to be inclined downward from one side of the flow cell main body 121 toward the other side of the flow cell main body 121. The third supply pipe portion 123c is connected to the flow cell main body 121 in a manner that is inclined with respect to the length direction of the flow cell main body 121, so that the bubbles contained in the flowing medium flow along the upper side of the third supply pipe portion 123c and then flow to the upper side of the flow cell main body 121. Therefore, light scattering or refraction caused by the bubbles contained in the flowing medium can be minimized.

[0060] The discharge pipe portion 125 includes: a first discharge pipe portion 125a extending vertically from the upper side of the flow cell main body 121; and a second discharge pipe portion 125b extending from the first discharge pipe portion 125a in a manner perpendicular to the length direction of the flow cell main body 121. The diameter of the first discharge pipe portion 125a is formed to be the same or almost the same as the diameter of the flow cell main body 121. Since the first discharge pipe portion 125a extends vertically on the upper side of the flow cell main body 121, the backflow of the flowing medium discharged from the flow cell main body 121 to the lower side of the first discharge pipe portion 125a due to the pressure difference can be minimized.

[0061] The first optical part 130 is arranged at one side of the flow cell body 121 so that the irradiation direction of the light is parallel to the flow direction of the flowing medium. The light travels along the traveling direction of the flowing medium in the flow cell body 121, thereby minimizing the scattering and refraction of the light due to bubbles or dissolution when passing through the flowing medium, thereby reducing the light loss. In addition, the light can smoothly absorb the wavelength of the dissolution contained in the flowing medium while passing through the flowing medium, thereby improving the light detection efficiency.

[0062] The first optical part 130 , the flow cell main part 121 , and the second optical part 140 are arranged on a straight line. Therefore, the light irradiated from the first optical part 130 can pass through the flow cell main part 121 and the second optical part 140 and travel along a straight line.

[0063] The first optical portion 130 includes a first optical sliding portion 131 , a first reflection mirror 133 , and a first position adjusting portion 135 .

[0064] The first optical sliding part 131 is disposed at one side of the flow cell main body 121. The first optical sliding part 131 is installed in a movable manner. The first reflector 133 is disposed at the first optical sliding part 131 so that the light incident from the light source part 171 is irradiated to the flowing medium of the flow cell main body 121. The first reflector 133 is configured to be inclined at about 45 degrees. The first position adjustment part 135 is provided at the first optical sliding part 131 to adjust the position of the first reflector 133. The first position adjustment part 135 may be formed in a screw form. The first optical sliding part 131 and the first reflector 133 move as the first position adjustment part 135 rotates.

[0065] The second optical portion 140 includes a second optical sliding portion 141, a second reflector 143, and a second position adjusting portion 145. The second optical sliding portion 141 is disposed on the other side of the flow cell main body 121. The second optical sliding portion 141 is installed in a movable manner. The second reflector 143 is disposed on the second optical sliding portion 141 so that the light incident from the light source portion 171 is irradiated on the flowing medium of the flow cell main body 121. The second reflector 143 is configured to be inclined at about 45 degrees. The second position adjusting portion 145 is provided on the second optical sliding portion 141 to adjust the position of the second reflector 143. The second position adjusting portion 145 may be formed in a screw form. The second optical sliding portion 141 and the second reflector 143 move as the second position adjusting portion 145 rotates.

[0066] The flow cell device 100 may further include an elastic pressurizing portion 114, which is disposed on the housing portion 110 to elastically support the outer side of the flow cell portion 120. The elastic pressurizing portion 114 includes: a pressurizing rod portion 114a supporting the outer side of the flow cell portion 120; and an elastic member 114b installed to move the pressurizing rod portion 114a toward the flow cell portion 120. A plurality of elastic pressurizing portions 114 are arranged along the length direction of the flow cell portion 120. The elastic pressurizing portion 114 elastically supports the outer side of the flow cell portion 120, so that even if the flow cell portion 120 expands or contracts due to the temperature of the flowing medium, the elastic pressurizing portion 114 can stably support the flow cell portion 120. Therefore, it is possible to prevent the flow cell portion 120 from being damaged by the pressurization of the housing portion 110 when the flow cell portion 120 expands and contracts.

[0067] A space portion 112 is formed inside the housing portion 110 to allow expansion space for the flow cell portion 120. Therefore, even if the flow cell portion 120 expands and contracts due to the flowing medium, it is possible to prevent the flow cell portion 120 from being pressed by the housing portion 110 and damaged.

[0068] The flow cell device 100 may further include a first collimator portion 150 and a second collimator portion 160 , wherein the first collimator portion 150 is opposite to the first optical portion 130 and connected to the first optical fiber portion 154 ; and the second collimator portion 160 is opposite to the second optical portion 140 and connected to the second optical fiber portion 164 .

[0069] The first collimator part 150 collimates the light irradiated from the light source part 171 in parallel. Since the first collimator part 150 collimates the light in parallel, the light irradiated from the light source part 171 is incident in parallel to the flow cell part 120. The first adjustment screw part 152 is installed at the first collimator part 150 to adjust the position.

[0070] The first optical fiber portion 154 is connected to the light source portion 171 and the first collimator portion 150, so that the light source portion 171 can be installed separately from the flow cell portion 120. A high-temperature flowing medium of about 150° C. to 200° C. passes through the flow cell portion 120, so that the flow cell portion 120 is heated by the high-temperature flowing medium. The light source portion 171 and the light detection portion 173 are installed separately from the flow cell portion 120 by the first optical fiber portion 154 and the second optical fiber portion 164, so that the light source portion 171 can be prevented from being overheated by the heat of the flow cell portion 120. In addition, there is no need to install an additional cooling device or a heat insulating member in order to cool or insulate the light source portion 171.

[0071] The second collimator part 160 focuses the parallel light irradiated from the flow cell main body part 121 on the light detection part 173. The parallel light passes through the second collimator part 160 and is focused, thereby improving the detection efficiency of the light detection part 173. The second collimator part 160 is installed with a second adjustment screw part 162 to adjust the position.

[0072] The second optical fiber portion 164 is connected to the light detection portion 173 and the second collimator portion 160, so that the light detection portion 173 can be installed separately from the flow cell portion 120. A high-temperature flowing medium of about 150°C to 200°C passes through the flow cell portion 120, so that the flow cell portion 120 is heated by the high-temperature flowing medium. The light detection portion 173 is installed separately from the flow cell portion 120 through the second optical fiber portion 164, so that the light detection portion 173 can be prevented from being overheated by the heat of the flow cell portion 120. In addition, there is no need to install an additional cooling device or a heat insulating member in order to cool or insulate the light detection portion 173.

[0073] Since the first optical fiber unit 154 and the second optical fiber unit 164 are installed on both sides of the flow cell unit 120, it is not necessary to arrange the flow cell unit 120, the light source unit 171 and the light detection unit 173 in a row. Therefore, the installation freedom of the flow cell device 100 can be increased.

[0074] In addition, in the flow cell device 100, the flow cell section 120 may be configured to be tilted more and more upward from the supply pipe section 123 side (one side) to the discharge pipe section 125 side (the other side). Since the flow cell section 120 is configured to be tilted upward toward the discharge side of the flowing medium, the bubbles contained in the flowing medium flow along the upper side of the flow cell section 120. Therefore, when light flows along the inside of the flow cell section 120, the light loss caused by scattering or refraction caused by bubbles can be minimized.

[0075] Reference Figure 4 The flow cell device 100 may further include a bubble removal unit 180, which is connected to the flow medium inflow side of the flow cell unit 120 and removes bubbles mixed in the flow medium flowing into the flow cell unit 120. The bubbles mixed in the flow medium are removed by the bubble removal unit 180, and the flow medium from which the bubbles have been removed flows into the flow cell unit 120, thereby preventing the light irradiated to the flow medium from being scattered or refracted due to the bubbles, thereby suppressing the occurrence of light loss. Therefore, the accuracy of the concentration measurement of the flow medium can be improved.

[0076] The bubble removal unit 180 includes a bubble exhaust line 181 connected to the flow medium inflow side of the flow cell unit 120 and a bubble exhaust valve 183 provided on the bubble exhaust line 181. As the bubble exhaust valve 183 is opened, bubbles can be exhausted through the bubble exhaust line 181.

[0077] At this time, the bubble exhaust valve 183 can adjust the degree of opening to adjust the exhaust pressure of the bubble exhaust line 181. The bubble exhaust valve 183 can adjust the degree of opening according to the suction pressure of the circulation pump 41. Therefore, the amount of bubbles exhausted from the bubble exhaust line 181 can be adjusted to prevent the flowing medium from being exhausted through the bubble exhaust line 181.

[0078] One side of the bubble exhaust line 181 may be connected to the circulation pump 41 installed in the circulation flow path unit 30. Therefore, the bubbles in the bubble exhaust line 181 may be exhausted to the circulation flow path unit 30 by the suction pressure of the circulation pump 41.

[0079] One side of the bubble exhaust line 181 may be installed to be exposed to the atmosphere. In this case, the bubbles in the bubble exhaust line 181 do not flow into the circulation flow path portion 30, and the flow medium from which the bubbles have been removed is supplied to the inner pool 20. Therefore, the bubbles mixed in the flow medium can be prevented from adhering to the wafer, thereby improving the processing precision of the wafer and reducing the defective rate.

[0080] The bubble removal unit 180 may further include a medium discharge valve 185 disposed on the bubble discharge line 181 to discharge the flow medium contained in the flow pool unit 120. The other side of the bubble discharge line 181 may be connected to a discharge cylinder (not shown in the figure). When the flow pool unit 120 is cleaned after the wafer processing process is stopped, the medium discharge valve 185 may be opened to discharge the flow medium contained in the flow pool unit 120.

[0081] A first embodiment of an etching device using the above-described flow cell device will be described.

[0082] Figure 5 1 is a block diagram showing a first embodiment of an etching apparatus to which a flow cell apparatus according to an embodiment of the present invention is applied.

[0083] Reference Figure 5 The etching device includes an outer pool 10 and an inner pool 20. The inner pool 20 and the outer pool 10 are connected to a circulation flow path section 30. A circulation pump 41, a buffer 42, a filter section 43, a main valve 32, a heater section 44, a defoamer 45 and a concentration measuring section 46 are sequentially installed on the circulation flow path section 30.

[0084] The flowing medium contained in the inner tank 20 overflows (overflow) to the outer tank 10. The flowing medium of the outer tank 10 flows into the buffer 42 through the circulation pump 41, and the filter unit 43 filters the flowing medium that flows in. The flowing medium filtered by the filter unit 43 flows into the heater unit 44 through the main valve 32, and is heated in the heater unit 44. The flowing medium heated in the heater unit 44 passes through the defoamer 45 to remove bubbles, and the concentration measuring unit 46 measures the concentration of the phosphoric acid solution.

[0085] The bypass flow path section 35 is connected to the circulation flow path section 30. The bypass flow path section 35 can connect the discharge side of the outer cell 10 and the inflow side of the pump 41, or the discharge side of the buffer 42 and the inflow side of the filter section 43, or the discharge side of the filter section 43 and the inflow side of the heater section 44. The high-temperature flowing medium flowing along the circulation flow path section 30 is supplied to the flow cell device 100 through the bypass flow path section 35. After the concentration of the flowing medium is measured in the flow cell device 100, the flowing medium is recovered to the circulation flow path section 30.

[0086] At this time, in the bypass flow path portion 35, when the bubble removal unit 180 is installed on the inflow side of the flow cell device 100, bubbles mixed in the flowing medium at the inflow side of the flow cell device 100 are removed by the bubble removal unit 180. The flowing medium from which bubbles have been removed flows into the flow cell device 100, and thus when measuring the concentration of the flowing medium, light can be prevented from being scattered or refracted due to bubbles, and the accuracy of concentration measurement can be improved.

[0087] In addition, the flowing medium heated to 150°C-200°C flows in the flow cell device 100 to suppress the precipitation of substances contained in the flowing medium. In addition, the high-temperature flowing medium may flow in the flow cell device 100 so that the wavelength of the heated flowing medium is absorbed by light.

[0088] Therefore, it is not necessary to chemically treat the flowing medium multiple times to measure the concentration of the flowing medium under the conditions used in the actual semiconductor process and to increase the detection sensitivity of the flowing medium. In addition, it is not necessary to cool the flowing medium to room temperature, thereby preventing detection errors caused by temperature differences in the flowing medium, and accurately predicting the state of the flowing medium under the conditions of use applied to the actual semiconductor process. In addition, the matrix in the concentration analysis can be easily prepared, thereby improving the accuracy of the concentration analysis.

[0089] In addition, in the flow cell device 100, the flow cell section 120 can be configured to be tilted more and more upward from the supply pipe section 123 side (one side) to the discharge pipe section 125 side (the other side). Since the flow cell section 120 is configured to be tilted upward toward the discharge side of the flowing medium, the bubbles contained in the flowing medium flow along the upper side of the flow cell section 120. Therefore, when light flows along the inside of the flow cell section 120, the light loss caused by light scattering or refraction caused by bubbles can be minimized.

[0090] Figure 6 1 is a block diagram showing a second embodiment of an etching apparatus to which a flow cell apparatus according to an embodiment of the present invention is applied.

[0091] Reference Figure 6 The etching device includes an outer pool 10 and an inner pool 20. The inner pool 20 and the outer pool 10 are connected to a circulation flow path section 30. A circulation pump 41, a buffer 42, a filter section 43, a main valve 32, a heater section 44, a defoamer 45 and a concentration measuring section 46 are sequentially installed in the circulation flow path section 30.

[0092] The circulation flow path section 30 is connected to a discharge pipe section 38. A discharge valve 39 and a flow cell device 100 are installed in the discharge pipe section 38. As the discharge valve 39 is opened, the flowing medium flows into the flow cell device 100, and the concentration of the flowing medium is measured in the flow cell device 100. The flowing medium discharged from the flow cell device 100 is discharged to the outside of the etching device through the discharge pipe section 38.

[0093] At this time, in the discharge pipe portion 38, when the bubble removal portion 180 is installed on the inflow side of the flow cell device 100, the flowing medium from which bubbles have been removed flows into the flow cell device 100. When measuring the concentration of the flowing medium, light can be prevented from being scattered or refracted due to bubbles, and the accuracy of concentration measurement can be improved.

[0094] Figure 71 is a block diagram showing a third embodiment of an etching apparatus to which a flow cell apparatus according to an embodiment of the present invention is applied.

[0095] Reference Figure 7 The etching device includes an outer pool 10 and an inner pool 20. The inner pool 20 and the outer pool 10 are connected to a circulation flow path section 30. A circulation pump 41, a buffer 42, a filter section 43, a main valve 32, a heater section 44, a defoamer 45 and a concentration measuring section 46 are sequentially installed in the circulation flow path section 30.

[0096] The flow cell device 100 is directly mounted on the circulation flow path portion 30. At this time, a discharge pipe portion or a bypass pipe portion is not mounted on the circulation flow path portion.

[0097] The flowing medium flowing along the circulation flow path portion flows into the flow cell device 100, and the concentration of the flowing medium is measured in the flow cell device 100. The flowing medium discharged from the flow cell device 100 flows into the inner cell.

[0098] At this time, in the circulation flow path portion 35, when the bubble removal unit is installed on the inflow side of the flow cell device, the bubbles mixed in the flowing medium are removed by the bubble removal unit at the inflow side of the flow cell device 100. The flowing medium from which the bubbles have been removed flows into the flow cell device 100, so when measuring the concentration of the flowing medium, it is possible to prevent light from being scattered or refracted due to the bubbles, and improve the accuracy of the concentration measurement.

[0099] The following describes a method for the flow cell device to determine the timing for replacing a chip.

[0100] Figure 8 : is a graph showing a first method of measuring the concentration of a flowing medium in a flow cell device according to one embodiment of the present invention.

[0101] Reference Figure 8 , the concentration of the flowing medium is measured in the flow device. As the wafer is etched, the dissolution material is continuously dissolved from the wafer. If the concentration of the flowing medium during the first etching of the wafer is continuously measured in the etching device, an interval in which the concentration of the flowing medium increases and then stagnates will occur. Such a stagnant interval is judged as the first endpoint, and the wafer is replaced. If the first etching process is completed, the second etching process is performed. In the second etching process, if an interval in which the concentration of the flowing medium increases and then stagnates also occurs, the wafer that has been etched for the second time is replaced. Therefore, since the flowing medium measures the concentration of the flowing medium under the conditions used in the actual semiconductor process, the state of the flowing medium and the timing of replacing the wafer can be accurately judged.

[0102] Fig. 9 : is a graph showing a second method of measuring the concentration of a flowing medium in a flow cell device according to one embodiment of the present invention.

[0103] Reference Fig. 9 If the concentration of the flowing medium during the first etching of the chip is continuously measured in the etching device, an interval in which the concentration of the flowing medium increases and then stagnates will occur. Such a stagnant interval is judged as the first endpoint, and the chip is replaced. After the chip is replaced, the first endpoint value is initialized. The second etching process is performed starting with the initialized value. In the second etching process, if an interval in which the concentration of the flowing medium increases and then stagnates also occurs, the chip for the second etching is replaced. After the chip is replaced, the second endpoint value is initialized. Through this process, the timing of chip replacement can be predicted. Therefore, the flowing medium measures the concentration of the flowing medium under the conditions used in the actual semiconductor process, so that the state of the flowing medium and the timing of chip replacement can be accurately judged.

[0104] The present invention has been described with reference to the embodiments shown in the drawings, but these are merely examples, and a person skilled in the art will appreciate that various modifications and other equivalent embodiments may be derived therefrom.

[0105] Therefore, the true technical protection scope of the present invention should be determined according to the appended claims.

Claims

1. A flow cell device, comprising: A flow passage portion for the flow medium to flow; a flow cell portion, formed with the flow passage portion; as well as A plurality of elastic pressure parts are provided on the housing part to elastically support the outer side surface of the flow pool part, wherein the plurality of elastic pressure parts are arranged in the length direction of the flow pool part, and each elastic pressure part includes a pressure rod part; A spacing space is further formed inside the shell to allow expansion space for the flow cell. Wherein, the flow cell part comprises: A flow cell main body, formed with the flow passage portion; a supply pipe portion connected to the lower side of the flow cell main body portion so as to supply a flow medium to the flow cell main body portion; and A discharge pipe part is connected to the upper side of the flow cell main body so as to discharge the flow medium of the flow cell main body, Wherein, the supply pipe part comprises: A first supply pipe portion, supplying a flowing medium; a second supply pipe portion having a diameter formed to be larger than a diameter of the first supply pipe portion; and a third supply pipe portion extending from the second supply pipe portion and connected to one side of the flow cell main body portion, The third supply pipe is connected to the main body of the flow cell in an inclined manner relative to the length direction of the main body of the flow cell, and The main body of the flow cell is arranged to be inclined upward from the supply pipe side to the discharge pipe side. Also includes: a first optical section configured to allow the light irradiated from the light source section to irradiate the flowing medium of the flow cell section; and The second optical part is configured to irradiate the light that has passed through the flowing medium of the flow passage part and has absorbed the wavelength of the flowing medium to the light detection part. Also includes: a first collimator portion, opposite to the first optical portion and connected to the first optical fiber portion; and The second collimator portion is opposite to the second optical portion and connected to the second optical fiber portion.

2. The flow cell device according to claim 1, wherein The cross-sectional area of ​​the flow cell main body is formed to be larger than the cross-sectional area of ​​the supply pipe portion so that the flow medium forms a turbulent flow in the flow cell main body.

3. The flow cell device according to claim 1, wherein The first optical part is arranged at one side of the flow cell main body so that the irradiation direction of the light is parallel to the flow direction of the flowing medium.

4. The flow cell device according to claim 3, wherein: The first optical part comprises: A first optical sliding portion, disposed on one side of the flow cell main body; a first reflecting mirror disposed on the first optical sliding portion so that the light incident from the light source portion is irradiated onto the flowing medium of the flow cell main body portion; and The first position adjustment portion is disposed on the first optical sliding portion to adjust the position of the first reflecting mirror.

5. The flow cell device according to claim 4, wherein: The second optical part comprises: A second optical sliding portion, disposed on the other side of the flow cell main body; a second reflecting mirror disposed on the second optical sliding portion, irradiating the light having the wavelength of the flowing medium of the flow cell main body portion with the light detecting portion; and The second position adjusting portion is disposed on the second optical sliding portion to adjust the position of the second reflecting mirror.

6. The flow cell device according to claim 1, further comprising: The bubble removal section is connected to the flowing medium inflow side of the flow cell section and removes bubbles mixed in the flowing medium flowing into the flow cell section.

7. The flow cell device according to claim 6, wherein: The bubble removal unit comprises: a bubble exhaust line connected to the flow medium inflow side of the flow cell portion; and The bubble discharge valve is arranged on the bubble discharge pipeline.

8. The flow cell device according to claim 7, wherein One side of the bubble exhaust line is connected to a circulation pump provided in the circulation flow path portion.

9. The flow cell device according to claim 7, wherein: The bubble removal unit further includes a medium discharge valve provided on the bubble discharge line to discharge the flow medium contained in the flow cell unit.

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