Active material structure and method of manufacturing the same, electrode structure, and secondary battery

Abstract

This disclosure relates to an active material structure, an electrode structure therein, a secondary battery therein, and a method for manufacturing the same. The active material structure includes a first active material line arranged in a first direction, a second active material line arranged in a second direction intersecting the first direction, and an intermediate active material line between the first and second active material lines in a third direction intersecting the first and second directions. The intermediate active material line is provided in the overlapping region of the first and second active material lines, wherein the upper and second active material lines are electrically connected via the intermediate active material line.

Description

Technical Field

[0001] This disclosure relates to active material structures, electrode structures, secondary batteries, and methods for manufacturing the active material structures. Background Technology

[0002] Secondary batteries are rechargeable and dischargeable batteries, unlike non-rechargeable primary batteries. Compared to nickel-cadmium or nickel-metal hydride batteries, lithium secondary batteries can have higher voltage and higher energy density per unit weight. Summary of the Invention

[0003] An active material structure with improved performance was provided.

[0004] An electrode structure with improved performance is provided.

[0005] It provides a rechargeable battery with improved performance.

[0006] A method for manufacturing active material structures with improved properties is provided.

[0007] However, this is not the only aspect.

[0008] Other aspects will be set forth in part in the description which follows, and will be apparent in part from the description, or may be learned by practicing the embodiments presented in this disclosure.

[0009] According to one embodiment, an active material structure includes: a first active material line arranged in a first direction; a second active material line arranged in a second direction intersecting the first direction; a third active material line, located between the first and second active material lines in the third direction intersecting the first and second directions, with an intermediate active material line provided in the overlapping region of the first and second active material lines, wherein the first and second active material lines are electrically connected by the intermediate active material line.

[0010] The length of the intermediate active material line measured in the first direction can be equal to the width of the intermediate active material line measured in the second direction.

[0011] The intermediate active material lines may include a first pair of intermediate active material lines adjacent to each other in a first direction and a second pair of intermediate active material lines adjacent to each other in a second direction; the distance between the first pair of intermediate active material lines in the first direction may be equal to the distance between the second pair of intermediate active material lines in the second direction.

[0012] The intermediate active material line can extend upwards to a third party.

[0013] The first active material line can extend in the second direction, and the second active material line can extend in the first direction.

[0014] The second active material line may have a length measured in a third direction, and the intermediate active material line may have a width measured in a third direction, wherein the width of the intermediate active material line may be greater than the length of the second active material line.

[0015] The first active material line may have a thickness measured in a third direction, wherein the width of the intermediate active material line may be greater than the thickness of the first active material line.

[0016] The length of the second active material line can be equal to the thickness of the first active material line.

[0017] The second active material line may have a first sintering density, the intermediate active material line may have a second sintering density, and the first active material line may have a third sintering density, wherein the first sintering density, the second sintering density, and the third sintering density may be equal.

[0018] The second active material line may have a first sintering density, the intermediate active material line may have a second sintering density, and the first active material line may have a third sintering density, wherein the second sintering density may be greater than the first sintering density and the third sintering density.

[0019] The first sintering density and the third sintering density can be equal.

[0020] The second active material line may have a first sintering density, the intermediate active material line may have a second sintering density, and the first active material line may have a third sintering density, wherein the first sintering density may be less than the second sintering density and the third sintering density.

[0021] The second sintering density and the third sintering density can be equal.

[0022] The second active material line may include the first active material, the intermediate active material line may include the second active material, and the first active material line may include the third active material, wherein the first active material, the second active material, and the third active material may be the same.

[0023] The second active material line may include the first active material, the intermediate active material line may include the second active material, and the first active material line may include the third active material, wherein at least two of the first active material, the second active material, and the third active material may be different.

[0024] The side surface of the intermediate active material line may include at least one of the (101) plane and the {hk0} plane, wherein h and k may each represent an integer greater than or equal to 1 and may be the same.

[0025] The side surface of the second active material line may include at least one of the (101) surface and the {hk0} surface.

[0026] The side surface of the first active material line may include at least one of the (101) surface and the {hk0} surface.

[0027] The first active material line may include a first surface and a second surface opposite to each other, the second active material line may include a third surface and a fourth surface opposite to each other, the first surface may be between the second surface and the fourth surface, the second surface may be between the first surface and the third surface, and the first surface, the second surface, the third surface and the fourth surface may include a (003) plane, wherein, when X-ray diffraction analysis is performed using CuKα rays, the intensity of the peak corresponding to the (003) plane, the intensity of the peak corresponding to the (101) plane and the intensity of the peak corresponding to the {hk0} plane can satisfy the following relationship:

[0028] (B+C) / A≥2.7,

[0029] Where A represents the intensity of the peak corresponding to the (003) plane, B represents the intensity of the peak corresponding to the (101) plane, and C represents the intensity of the peak corresponding to the {hk0} plane.

[0030] According to one embodiment, an active material structure includes: a first active material layer on a second active material layer; an intermediate active material layer between the second active material layer and the first active material layer; a first channel extending in the first active material layer and the intermediate active material layer along a first direction; and a second channel extending in the second active material layer and the intermediate active material layer along a second direction intersecting the first direction, wherein the first channel and the second channel intersect each other in the intermediate active material layer.

[0031] The first active material layer may include a first surface and a second surface opposite to each other, the second active material layer may include a third surface and a fourth surface opposite to each other, the third surface may be between the second surface and the fourth surface, the second surface may be between the first surface and the third surface, a first channel may extend from the first surface of the first active material layer to the third surface of the second active material layer, thereby exposing the third surface of the second active material layer, and a second channel may extend from the fourth surface of the second active material layer to the second surface of the first active material layer, thereby exposing the second surface of the first active material layer.

[0032] The first channel may extend into the second active material layer, and the active material structure may include a third surface of the second active material layer exposed via the first channel and a step between the second active material layer and the surface of the second active material layer adjacent to the first active material layer.

[0033] The second channel may extend into the first active material layer, and the active material structure may include a step between a second surface of the first active material layer exposed via the second channel and a surface of the first active material layer adjacent to the second active material layer.

[0034] The active material structure may further include a third channel extending in the first active material layer and the intermediate active material layer, the third channel extending upward in a third direction intersecting with the first and second directions, wherein the third channel intersects with the first and second channels in the intermediate active material layer.

[0035] The first and third channels can intersect each other in the first active material layer.

[0036] According to one embodiment, an electrode structure includes: a current collector layer; and an active material structure on the current collector layer, wherein the active material structure includes a first portion and a second portion, the second portion of the active material structure being between the first portion of the active material structure and the current collector layer, the second portion of the active material structure including a first surface and a second surface opposite to each other, the first surface being between the first portion of the active material structure and the second surface, the current collector layer including a third surface and a fourth surface opposite to each other, the third surface being between the active material structure and the fourth surface, the active material structure including: a first channel extending in a first direction parallel to the third surface of the current collector layer; and a second channel intersecting the first channel and extending in a second direction parallel to the third surface of the current collector layer, the third surface of the current collector layer being exposed via the first channel, and the first surface of the second portion of the active material structure being exposed via the second channel.

[0037] The second part of the active material structure may include a second active material line extending in the first direction, wherein the first channel may be provided between the second active material lines.

[0038] The first part of the active material structure may include a first surface and a second surface that are opposite to each other. The second surface of the first part of the active material structure may be between the first surface of the first part of the active material structure and the second part of the active material structure. A second channel may pass through the first part of the active material structure, and the second surface of the first part of the active material structure may be exposed via the first channel.

[0039] The first part of the active material structure may include a first active material line extending in a second direction, wherein a second channel is provided between the first active material lines.

[0040] The depth of the first channel, measured in the third direction, can be about 50% to about 80% of the thickness of the active material structure, measured in the third direction, perpendicular to the first surface of the current collector layer. The depth of the second channel, measured in the third direction, can be about 50% to about 80% of the thickness of the active material structure, wherein the thickness of the active material structure can be in the range of about 50 micrometers (μm) to about 1,000 μm.

[0041] The width of the first channel, measured in the second direction, can be in the range of about 0.5 μm to about 10 μm, the width of the second channel, measured in the first direction, can be in the range of about 0.5 μm to about 10 μm, the distance between a pair of adjacent first channels can be in the range of about 1 μm to about 500 μm, and the distance between a pair of adjacent second channels can be in the range of about 1 μm to about 500 μm.

[0042] The electrode structure may also include a third channel that intersects with the first and second channels and extends upward on a third surface parallel to the current collector layer, wherein the first surface of the second portion of the active material structure may be exposed via the third channel.

[0043] The first and second channels can intersect each other between the second part of the active material structure and the first part of the active material structure.

[0044] According to one embodiment, a secondary battery includes: a first electrode structure on a second electrode structure; and a separator between the second electrode structure and the first electrode structure, wherein the second electrode structure includes: a first active material line arranged in a first direction; a second active material line arranged in a second direction intersecting the first direction; and an intermediate active material line provided in a third direction intersecting the first and second directions between the first and second active material lines, the intermediate active material line being provided in the overlapping region of the first and second active material lines, wherein the first and second active material lines are electrically connected through the intermediate active material line.

[0045] The second electrode structure may also include a current collector layer provided on the opposite side of the intermediate active material line, in which the second active material line is inserted.

[0046] The secondary battery may further include: a first channel between first active material lines; and a second channel between second active material lines, wherein the first active material lines may include a first surface and a second surface opposite to each other, the second active material lines may include a third surface and a fourth surface opposite to each other, the third surface may be between the second surface and the fourth surface, the second surface may be between the first surface and the third surface, the first channel extends between intermediate active material lines to expose the third surface, the second channel extends between intermediate active material lines to expose the second surface, and the first channel and the second channel intersect each other between intermediate active material lines.

[0047] The secondary battery may also include an electrolyte in the first channel and the second channel.

[0048] According to one embodiment, a method for manufacturing an active material structure includes: providing an active material film; forming a first channel in the active material film, the first channel being arranged in a first direction; forming a second channel in the active material film, the second channel being arranged in a second direction intersecting the first direction; and sintering the active material film, wherein the first channel is a recessed region of the active material film recessed from a first surface of the active material film to a first depth, the second channel is a recessed region of the active material film recessed from a second surface of the active material film to a second depth, the second surface of the active material film being opposite to the first surface of the active material film, and the sum of the first depth and the second depth being greater than the thickness of the active material film measured in a third direction, the third direction intersecting the first direction and the second direction.

[0049] The formation of the first channel may include pressing the first surface of the active material film with a first mold, such that the first mold is inserted into the active material film, and the formation of the second channel may include pressing the second surface of the active material film with a second mold, such that the second mold is inserted into the active material film.

[0050] Providing an active material film may include: forming an initial second active material layer; forming an initial intermediate active material layer on the initial second active material layer; and forming an initial first active material layer on the initial intermediate active material layer.

[0051] The first depth can be equal to the sum of the thickness of the initial intermediate active material layer measured in the third direction and the thickness of the initial first active material layer measured in the third direction, and the second depth can be equal to the sum of the thickness of the initial intermediate active material layer measured in the third direction and the thickness of the initial second active material layer.

[0052] The first depth may be greater than the sum of the thickness of the initial intermediate active material layer measured in the third direction and the thickness of the initial first active material layer measured in the third direction, and the second depth may be greater than the sum of the thickness of the initial intermediate active material layer and the thickness of the initial second active material layer measured in the third direction.

[0053] The binder can be provided in the active material membrane before sintering and removed from the active material membrane during sintering.

[0054] The method may further include forming a third channel in the active material film, the third channel being arranged in a third direction intersecting the first and second directions, wherein the third channel may be a recessed region of the active material film, the recessed region being recessed from the first surface of the active material film to a third depth. Attached Figure Description

[0055] The above and other aspects, features and advantages of certain embodiments of this disclosure will become more apparent from the following description taken in conjunction with the accompanying drawings, in which:

[0056] Figure 1 This is a perspective view of one embodiment of the active material structure;

[0057] Figure 2A It is along Figure 1 A sectional view taken by line I-I';

[0058] Figure 2B It is along Figure 1 A sectional view taken from line II-II';

[0059] Figure 2C It is along Figure 1 A sectional view taken from line III-III';

[0060] Figure 2D It is along Figure 1 A sectional view taken by line IV-IV';

[0061] Figure 2E It is along Figure 1 A sectional view taken by line V-V';

[0062] Figure 3 It is a manufacturing reference Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E A flowchart describing the method for constructing the active material structure;

[0063] Figure 4A It is used to explain the manufacturing process. Figure 3 A perspective view of the method for constructing the structure of active materials;

[0064] Figure 4B It is used to explain the manufacturing process. Figure 4A A conceptual diagram of a method for creating active material membranes;

[0065] Figure 4C It is used to explain the manufacturing process. Figure 3 A perspective view of the method for constructing the structure of active materials;

[0066] Figure 4D It is used to explain the manufacturing process. Figure 3 A perspective view of the method for constructing the structure of active materials;

[0067] Figure 5 This is a perspective view of one embodiment of the active material structure;

[0068] Figure 6A It is along Figure 5 A sectional view taken by line IV-IV';

[0069] Figure 6B It is along Figure 5 A sectional view taken by line V-V';

[0070] Figure 7 It shows the manufacturing process. Figure 5 , Figure 6A and Figure 6B A flowchart of a method for constructing active material structures;

[0071] Figure 8A It is used to explain the manufacturing process. Figure 7 A perspective view of the method for constructing the structure of active materials;

[0072] Figure 8B It is used to explain the manufacturing process. Figure 7 A perspective view of the method for constructing the structure of active materials;

[0073] Figure 8C It is used to explain the manufacturing process. Figure 7 A perspective view of the method for constructing the structure of active materials;

[0074] Figure 9 This is a perspective view of one embodiment of the active material structure;

[0075] Figure 10A It is along Figure 9 A sectional view taken by line IV-IV';

[0076] Figure 10B It is along Figure 9 A sectional view taken by line V-V';

[0077] Figure 11 This is a perspective view of one embodiment of the active material structure;

[0078] Figure 12 yes Figure 11 An exploded perspective view of the structure of the active material;

[0079] Figure 13A It is along Figure 12 A cross-sectional view of the active material structure taken along line I-I';

[0080] Figure 13B It is along Figure 12 A cross-sectional view taken from line II-II' of the active material structure;

[0081] Figure 13C It is along Figure 12 A cross-sectional view taken from line III-III' of the active material structure;

[0082] Figure 14 It is manufacturing Figure 11 , Figure 12 , Figure 13A , Figure 2B and Figure 13C A flowchart of a method for constructing active material structures;

[0083] Figure 15A It is used to explain the manufacturing process. Figure 14 A perspective view of the method for constructing the structure of active materials;

[0084] Figure 15B It is used to explain the manufacturing process. Figure 14 A perspective view of the method for constructing the structure of active materials;

[0085] Figure 15C It is used to explain the manufacturing process. Figure 14 A perspective view of the method for constructing the structure of active materials;

[0086] Figure 16 It is a perspective view of one embodiment of the electrode structure; and

[0087] Figure 17 This is a conceptual diagram of one implementation method of a secondary battery. Detailed Implementation

[0088] Reference will now be made in detail to embodiments, examples of which are shown in the accompanying drawings, wherein similar reference numerals always refer to similar elements. In this respect, embodiments may take different forms and should not be construed as limited to the description set forth herein. Therefore, aspects are described below only by reference to the accompanying drawings. When used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. Expressions such as “at least one of…”, when following a column of elements, modify the entire column of elements without modifying any individual element within the column.

[0089] In the following description, embodiments will be described in detail with reference to the accompanying drawings. In the drawings, the same reference numerals denote the same elements, and the dimensions of each element may be exaggerated for clarity and ease of description. The embodiments described below are merely examples and various modifications may be made therein.

[0090] When used herein, the term “on” or “above” an element may be understood to mean that the element may be directly on the other element, or on the other element without contact with the other element.

[0091] When used herein, the singular representation is intended to include the plural form as well, unless the context clearly indicates otherwise. It will be understood that when an element is referred to as “including” another element, that element may also include other elements unless otherwise specified.

[0092] It will be understood that although the terms “first,” “second,” “third,” etc., may be used herein to describe various elements, components, regions, layers, and / or parts, these elements, components, regions, layers, and / or parts should not be limited by these terms. These terms are used only to distinguish one element, component, region, layer, or part from another. Therefore, without departing from the teaching herein, the “first element,” “component,” “region,” “layer,” or “part” discussed below may be referred to as a second element, component, region, layer, or part.

[0093] The terminology used herein is for the purpose of describing particular implementations only and is not intended to be limiting. For example, unless the context clearly indicates otherwise, “an element” has the same meaning as “at least one element”, and “at least one” is not to be construed as limiting “a” or “one”. “Or” means “and / or”.

[0094] Furthermore, relative terms such as “lower” or “bottom” and “upper” or “top” may be used herein to describe the relationship between one element and another as shown in the figures. It will be understood that, in addition to the orientations depicted in the figures, relative terms are intended to cover different orientations of the device. For example, if the device in one of the figures is flipped, an element described as being “below” the other element will be oriented “above” the other element. Thus, depending on the specific orientation of the figure, the exemplary term “lower” may cover both “lower” and “upper” orientations. Similarly, if the device in one of the figures is flipped, an element described as being “below” or “under” the other element will be oriented “above” the other element. Thus, the exemplary terms “below” or “under” may cover both “upper” and “lower” orientations.

[0095] When used herein, “about” includes the value and indicates that, as determined by one of ordinary skill in the art, a particular value is within an acceptable range of deviation, taking into account the measurement in question and the error associated with the measurement of the particular quantity (i.e., limitations of the measurement system). For example, “about” may mean within one or more standard deviations, or within ±30%, 20%, 10%, or 5% of the value.

[0096] Unless otherwise defined, all terms used herein (including technical and scientific terms) shall have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure pertains. It will also be understood that terms such as those defined in general dictionaries shall be interpreted as having a meaning consistent with their meaning in the relevant field and in the context of this disclosure, and shall not be interpreted in an idealized or overly formalized sense, unless expressly defined herein.

[0097] Exemplary embodiments are described herein with reference to cross-sectional diagrams, which are schematic illustrations of idealized exemplary embodiments. Therefore, variations in shape relative to the illustrations will be expected as a result of, for example, manufacturing techniques and / or tolerances. Consequently, the embodiments described herein should not be construed as limited to the particular shapes of the areas shown herein, but will include deviations in shape, for example, due to manufacturing processes. For example, areas shown or described as flat may generally have rough and / or non-linear characteristics. Furthermore, acute angles shown may be rounded. Therefore, the areas shown in the figures are schematic in nature, and their shapes are not intended to show the precise shapes of the areas, nor are they intended to limit the scope of the claims.

[0098] When used here, the phrase “equal to” or the term “same” when used to compare values ​​means that they are within 5%, 4%, 3%, 2%, 1%, or completely equal to each other.

[0099] When used herein, the term “perpendicular” means an angle of intersection between lines or surfaces that is in the range of 85° to 95°, 86° to 94°, 87° to 93°, 88° to 92°, 89° to 91°, or 90°.

[0100] When used here, a surface with "steps" in between refers to a surface that is not in the same plane.

[0101] High-capacity secondary batteries may include electrodes with a three-dimensional structure.

[0102] Figure 1 This is a perspective view of the structure of the active material according to one embodiment. Figure 2A It is along Figure 1 A sectional view taken by line I-I'. Figure 2B is a cross-sectional view taken along line II-II' of Figure 1 . Figure 2C is a cross-sectional view taken along line III-III' of Figure 1 . Figure 2D is a cross-sectional view taken along line IV-IV' of Figure 1 . Figure 2E is a cross-sectional view taken along line V-V' of Figure 1 .

[0103] Referring to Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E , an active material structure 11 can be provided. The active material structure 11 can be a cathode active material structure included in a secondary battery. The active material structure 11 can include, for example, a lower (e.g., second) active material line 100, an intermediate active material line 200, and an upper (e.g., first) active material line 300.

[0104] The lower active material line 100 can extend in a first direction DR1. The lower active material line 100 can be arranged in a second direction DR2 that intersects, e.g., crosses, the first direction DR1. For example, the lower active material lines 100 can be spaced apart from each other by the same distance in the second direction DR2. For example, the dimensions (e.g., widths) of the lower active material lines 100 in the second direction DR2 can be substantially the same. As used herein, unless otherwise indicated, the "width" of a feature (e.g., a line or a layer) refers to the measurement of the feature in the second direction (e.g., DR2).

[0105] The lower active material line 100 can include a cathode active material. For example, the lower active material line 100 can include LiCoO2 ("LCO"), Li(Ni a Co b Mn c )O2 (where 0 < a < 1, 0 < b < 1, 0 < c < 1, and a + b + c = 1) ("NCM"), Li(Ni x Co y Al z )O2, (where 0 < x < 1, 0 < y < 1, 0 < z < 1, and x + y + z = 1) ("NCA"), LiMn2O4 ("LMO"), or LiFePO4 ("LFP"). The lower active material line 100 can have a first sintering density.

[0106] The upper active material lines 300 may extend in the second direction DR2. The upper active material lines 300 may be arranged in the first direction DR1. For example, the upper active material lines 300 may be spaced apart from each other by the same distance in the first direction DR1. For example, the dimensions (e.g., lengths) of the upper active material lines 300 in the first direction DR1 may be substantially the same. When used herein, unless otherwise indicated, the “length” of a feature (e.g., a line or layer) refers to a measurement of the feature in the first direction (e.g., DR1).

[0107] The upper active material line 300 may include a cathode active material. The upper active material line 300 may include a material substantially the same as that of the lower active material line 100. For example, the upper active material line 300 may include LCO, NCM, NCA, LMO, or LFP. The upper active material line 300 may have a second sintering density substantially the same as the first sintering density.

[0108] An intermediate active material line 200 may be provided between the lower active material line 100 and the upper active material line 300. The intermediate active material line 200 may lie along a third direction DR3 between the upper active material line 300 and the lower active material line 100, the third direction DR3 intersecting with a first direction DR1 and a second direction DR2 (e.g., perpendicular to the first direction DR1 and the second direction DR2). The intermediate active material line 200 may be provided in the region where the upper active material line 300 and the lower active material line 100 overlap each other along the third direction DR3, the third direction DR3 intersecting with the first direction DR1 and the second direction DR2 (e.g., perpendicular to the first direction DR1 and the second direction DR2). The intermediate active material line 200 may connect (e.g., electrically connect) the lower active material line 100 to the upper active material line 300. The upper active material line 300 may be directly on the intermediate active material line 200, which may be directly on the lower active material line 100, or the upper active material line 300 may be directly on the intermediate active material line 200 and the intermediate active material line 200 may be directly on the lower active material line 100. The intermediate active material line 200 may extend in a third direction DR3. The dimension (e.g., thickness) of the intermediate active material line 200 in the third direction DR3 may be greater than the dimensions of the lower active material line 100 and the upper active material line 300 in the third direction DR3. The dimension (e.g., thickness) of the lower active material line 100 in the third direction DR3 may be the same as the dimension (e.g., thickness) of the upper active material line 300 in the third direction DR3. When used herein, unless otherwise specified, the “thickness” of a feature (e.g., a line or layer) refers to a measurement of the feature in a third direction (e.g., DR3).

[0109] The intermediate active material lines 200 can be arranged in the first direction DR1 and the second direction DR2. For example, the intermediate active material lines 200 can be spaced apart from each other by the same distance in the first direction DR1 and the second direction DR2. For example, the dimensions (e.g., length) of the intermediate active material lines 200 in the first direction DR1 and the second direction DR2 can be substantially the same.

[0110] The intermediate active material line 200 may include a cathode active material. The intermediate active material line 200 may include a material substantially the same as that of the lower active material line 100 and the upper active material line 300. For example, the intermediate active material line 200 may include LCO, NCM, NCA, LMO, or LFP. The intermediate active material line 200 may have a second sintering density substantially the same as the first and third sintering densities.

[0111] The lower active material line 100, the intermediate active material line 200, and the upper active material line 300 can be a single-layer structure. For example, the lower active material line 100 and the intermediate active material line 200 can be connected to each other (e.g., electrically connected) without an interface between them. The intermediate active material line 200 can be directly on the lower active material line 100. Similarly, the upper active material line 300 and the intermediate active material line 200 can be connected to each other (e.g., electrically connected) without an interface between them. The upper active material line 300 can be directly on the intermediate active material line 200.

[0112] A first channel CH1 can be provided between the upper active material lines 300 and between the intermediate active material lines 200 arranged along the first direction DR1. The first channel CH1 can refer to the region between the upper active material lines 300 arranged along the first direction DR1 and the region between the intermediate active material lines 200 arranged along the first direction DR1. The first channel CH1 can extend from the upper surface of the upper active material line 300 to the upper surface of the lower active material line 100. The side surfaces of the upper active material line 300, the side surfaces of the intermediate active material lines 200, and the upper surface of the lower active material line 100 can be exposed via the first channel CH1. The side surfaces of the intermediate active material lines 200 exposed via the first channel CH1 can intersect the first direction DR1. The first channel CH1 can extend in the second direction DR2.

[0113] The second channel CH2 can be provided between the lower active material lines 100 and between the intermediate active material lines 200 arranged along the second direction DR2. The second channel CH2 can refer to the region between the lower active material lines 100 arranged along the second direction DR2 and the region between the intermediate active material lines 200 arranged along the second direction DR2. The second channel CH2 can extend from the bottom surface (e.g., the second surface) of the lower active material line 100 to the bottom surface of the upper active material line 300. The side surfaces of the lower active material line 100, the side surfaces of the intermediate active material lines 200, and the bottom surface of the upper active material line 300 can be exposed via the second channel CH2. The side surfaces of the intermediate active material lines 200 exposed via the second channel CH2 can intersect the second direction DR2. The second channel CH2 can extend in the first direction DR1.

[0114] The first channel CH1 and the second channel CH2 may intersect each other (e.g., cross each other) between the lower active material line 100 and the upper active material line 300. In other words, the first channel CH1 and the second channel CH2 may intersect each other (e.g., cross each other) between the intermediate active material line 200.

[0115] At least one of the side surfaces of the lower active material line 100, the middle active material line 200, and the upper active material line 300 exposed via the first channel CH1 and the second channel CH2 may include at least one (101) surface and one {hk0} surface. Here, h and k may each be the same integer greater than or equal to 1. When used herein, the symbol This indicates that through lattice symmetry equals The set of all faces.

[0116] At least one of the top and bottom surfaces of the upper active material line 300 and the top and bottom surfaces of the lower active material line 100 may include a (003) surface.

[0117] When the structure of the active material 11 is analyzed by X-ray diffraction using CuKα rays, the intensities of the peaks corresponding to the (003) plane, the peaks corresponding to the (101) plane, and the peaks corresponding to the {hk0} plane can satisfy the following relationship:

[0118] (B+C) / A≥2.7,

[0119] Where A represents the intensity of the peak corresponding to the (003) plane, B represents the intensity of the peak corresponding to the (101) plane, and C represents the intensity of the peak corresponding to the {hk0} plane.

[0120] In one embodiment, the values ​​of the active material structure 11 can be as follows: The dimensions (e.g., thickness) of the active material structure 11 on the third-direction DR3 can be in the range of about 50 μm to about 1,000 μm, for example, in the range of about 100 μm to about 900 μm, about 200 μm to about 800 μm, or about 300 μm to about 700 μm. The width of each of the first channel CH1 and the second channel CH2 can be in the range of about 0.5 μm to about 10 μm, for example, in the range of about 1 μm to about 9 μm, about 2 μm to about 8 μm, or about 3 μm to about 7 μm. The depth of each of the first channel CH1 and the second channel CH2 can be in the range of about 50% to about 80% of the dimensions (e.g., thickness) of the active material structure 11 on the third-direction DR3, for example, about 55% to about 75%, or about 60% to about 70%. The depths of the first channel CH1 and the second channel CH2 are measured on the third-direction DR3. The sum of the distances between the center point CP on the intermediate active material line 200 and the two channels adjacent to the center point CP can be referred to as the channel distance. For example, the two channels can be a pair of adjacent first channels CH1, a pair of adjacent second channels CH2, or adjacent first channels CH1 and second channels CH2. The channel distance can be in the range of about 1 μm to about 500 μm, for example, in the range of about 50 μm to about 450 μm, about 100 μm to about 400 μm, or about 150 μm to about 350 μm.

[0121] In the case of secondary batteries with active material structures possessing high sintering density, a high sintering density active material structure may be required to increase the energy density of the secondary battery. To increase sintering density, channels with small widths may be necessary. When the active material structure has channels extending in only one direction, the structural stability of the active material structure can decrease as the channel width decreases.

[0122] This disclosure provides an active material structure 11 with intersecting (e.g., overlapping) first channels CH1 and second channels CH2. The structural stability of the active material structure 11 can be improved due to the first channels CH1 and second channels CH2. Therefore, the first channels CH1 and second channels CH2 can have smaller widths and increase the sintering density of the active material structure 11. Furthermore, the side surfaces of the lower active material line 100 and the upper active material line 300 can be exposed via the first channels CH1 and second channels CH2; therefore, the lower active material line 100 and the upper active material 300 are also usable. Thus, this disclosure can provide an active material structure 11 for providing a secondary battery with high energy density.

[0123] Figure 3 It is a manufacturing reference Figure 1 , Figure 2A, Figure 2B , Figure 2C , Figure 2D and Figure 2E A flowchart describing the method for constructing the active material structure. Figure 4A It is used to explain the manufacturing process. Figure 3 A perspective view of the method for constructing the active material structure. Figure 4B It is used to explain the manufacturing process. Figure 4A A conceptual diagram of a method for developing active material membranes. Figure 4C It is used to explain the manufacturing process. Figure 3 A perspective view of the method for constructing the active material structure. Figure 4D It is used to explain the manufacturing process. Figure 3 A perspective view of the method for constructing active material structures. For the sake of brevity, [the following is a description of the method]. Figure 3 , Figure 4A , Figure 4B , Figure 4C and Figure 4D The above references Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E Descriptions of parts that are essentially the same as those described can be omitted here.

[0124] refer to Figure 3 and Figure 4A An active material film 1 (S110) can be provided. The active material film 1 can have a uniform sintering density. The active material film 1 can be formed by a casting method. The following will refer to... Figure 4B A detailed description of the manufacturing method of the active material film 1 by casting is provided.

[0125] refer to Figure 4B An active material slurry 1" can be prepared. The active material slurry 1" can be formed by mixing active material powder, dispersant, binder, plasticizer, solvent, etc. The active material powder may contain cathode active materials. For example, the active material powder may contain LCO, NCM, NCA, LMO, or LFP.

[0126] The active material slurry 1" can be applied onto the conveyor belt 20. For example, the conveyor belt 20 can move in one direction, and the active material slurry 1" can be provided on the moving conveyor belt 20. The active material slurry 1" can be applied onto the conveyor belt 20 with a uniform thickness. For example, the thickness of the active material slurry 1" applied onto the conveyor belt 20 can be uniformly adjusted by a scraper (not shown).

[0127] The active material slurry 1” applied to conveyor belt 20 can be dried to form a large-area active material film 1'. For example, the active material slurry 1” can be dried by a heating process. In the large-area active material film 1', active material powders can be bonded together by an adhesive. The large-area active material film 1' can be cut to form... Figure 4A 1. Active material membrane.

[0128] refer to Figure 3 and Figure 4C The first channel CH1 (S120) can be formed, for example, by any suitable process (such as stamping), such that a first stamping process can be performed on the active material film 1 to form the first channel CH1 (S120). The first stamping process may include pressing the upper surface of the active material film 1 with a blade 30, such that the blade 30 is inserted into the active material film 1. The blade 30 can be inserted into the active material film 1 by being aligned to extend in the second direction DR2. Therefore, the first channel CH1 can be formed in a shape extending in the second direction DR2. The first channel CH1 may refer to a recessed region of the active material film 1 obtained by the first stamping process.

[0129] refer to Figure 3 and Figure 4D The second channel CH2 (S130) can be formed, for example, by any suitable process (such as stamping), such as performing a second stamping process on the active material film 1 to form the second channel CH2 (S130). The second stamping process may include pressing the bottom surface of the active material film 1 with a blade 30, such that the blade 30 is inserted into the active material film 1. The blade 30 can be inserted into the active material film 1 by alignment to extend in the first direction DR1. Therefore, the second channel CH2 can be formed in a shape extending in the first direction DR1. The second channel CH2 may refer to a recessed region of the active material film 1 obtained by the second stamping process.

[0130] The sum of the insertion depth of the blade 30 during the first stamping process and the insertion depth of the blade 30 during the second stamping process can be greater than the dimension (e.g., thickness) of the active material film 1 on the third-direction DR3. Therefore, the first channel CH1 and the second channel CH2 can intersect each other, for example, cross each other.

[0131] refer to Figure 3 and Figure 1 The active material membrane 1 can be sintered to form the active material structure 11 (S140).

[0132] If the width of the channel is small, the channel can be eliminated (e.g., disappear) when the active material film is sintered (S140). One embodiment of the active material film 1 may include a first channel CH1 and a second channel CH2 that intersect (e.g., cross each other) during sintering. The first channel CH1 and the second channel CH2 can increase the structural stability of the active material film 1. Therefore, even if the first channel CH1 and the second channel CH2 have a small width, the first channel CH1 and the second channel CH2 can be retained during the sintering process without being eliminated (e.g., lost).

[0133] Figure 5 This is a perspective view of the structure of the active material according to one embodiment. Figure 6A It is along Figure 5 A sectional view taken from line IV-IV'. Figure 6B It is along Figure 5 A cross-sectional view taken along line V-V'. For the sake of brevity, [the following is a simplified description]. Figure 5 , Figure 6A and Figure 6B The above references Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E Descriptions of parts that are essentially the same as those described can be omitted here.

[0134] refer to Figure 5 , Figure 6A and Figure 6B An active material structure 12 can be provided. The active material structure 12 may include a cathode active material structure, which is included in the cathode of the secondary battery. The active material structure 12 may include a lower active material line 102, a middle active material line 202, and an upper active material line 302.

[0135] The lower active material line 102, the intermediate active material line 202, and the upper active material line 302 can be a multilayer structure. An interface can be provided between the lower active material line 102 and the intermediate active material line 202. The interface between the lower active material line 102 and the intermediate active material line 202 can be coplanar with the upper surface of the lower active material line 102 exposed via the first channel CH1. For example, the interface between the lower active material line 102 and the intermediate active material line 202 can be at the same level as the upper surface of the lower active material line 102 exposed via the first channel CH1. An interface can be provided between the upper active material line 302 and the intermediate active material line 202. The interface between the upper active material line 302 and the intermediate active material line 202 can be coplanar with the bottom surface of the upper active material line 302 exposed via the second channel CH2. For example, the interface between the upper active material line 302 and the middle active material line 202 can be at the same level as the bottom surface of the upper active material line 302 exposed via the second channel CH2.

[0136] The lower active material line 102, the middle active material line 202, and the upper active material line 302 can each have a first sintering density, a second sintering density, and a third sintering density, respectively. The first sintering density can be less than the second sintering density. The third sintering density can be less than the second sintering density or substantially the same as the second sintering density. For example, when the third sintering density is less than the second sintering density, the third sintering density can be substantially the same as the first sintering density.

[0137] The lower active material line 102, the intermediate active material line 202, and the upper active material line 302 may each include a first active material, a second active material, and a third active material. For example, each of the first, second, and third active materials may include LCO, NCM, NCA, LMO, or LFP. In one example, the first, second, and third active materials may be the same. At least two of the first, second, and third active materials may be different from each other.

[0138] Due to the first channel CH1 and the second channel CH2, the active material structure 12 can exhibit high structural stability. Therefore, an active material structure 12 can be provided that enables the provision of a secondary battery with high energy density.

[0139] Figure 7 It shows the manufacturing process. Figure 5 , Figure 6A and Figure 6B The flowchart shows the method for determining the structure 12 of the active material. Figure 8A It is used for explanation Figure 7 A perspective view of the method for manufacturing active material structure 12. Figure 8B It is used for explanation Figure 7A perspective view of the method for manufacturing active material structure 12. Figure 8C It is used for explanation Figure 7 A perspective view of the method for manufacturing active material structure 12. For the sake of brevity, [the following is a description of the method]. Figure 7 , Figure 8A , Figure 8B and Figure 8C The above references Figure 3 , Figure 4A , Figure 4B , Figure 4C , Figure 4D as well as Figure 5 , Figure 6A and Figure 6B Descriptions of parts that are essentially the same as those described can be omitted here.

[0140] refer to Figure 7 and Figure 8A An active material film 2 comprising an initial lower active material layer 102', an initial intermediate active material layer 202', and an initial upper active material layer 302' can be formed (S210). As an example, the above reference... Figure 4B The described casting method forms an active material film 2 by sequentially forming an initial intermediate active material layer 202' and an initial upper active material layer 302' on an initial lower active material layer 102'. The active material film 2 can be formed by laminating the initial lower active material layer 102', the initial intermediate active material layer 202', and the initial upper active material layer 302', which are formed via separate processes. For example, the initial lower active material layer 102', the initial intermediate active material layer 202', and the initial upper active material layer 302' can each be formed using a casting method.

[0141] refer to Figure 7 and Figure 8B The first channel CH1 can perform the above reference on the active material membrane 2. Figure 3 and Figure 4C The first stamping process described is used to form (S220). A blade 30 can be inserted into the active material membrane 2 to contact the upper surface of the initial lower active material layer 102'. Therefore, the upper surface of the initial lower active material layer 102' can be exposed via the first channel CH1.

[0142] refer to Figure 7 and Figure 8C The second channel CH2 can be applied to the active material membrane 2 as described above. Figure 3 and Figure 4CThe second stamping process described is used to form (S230). A blade 30 can be inserted into the active material film 2 to contact the bottom surface of the initial upper active material layer 302'. Therefore, the bottom surface of the initial upper active material layer 302' can be exposed via the second channel CH2.

[0143] refer to Figure 5 and Figure 7 The active material membrane 2 can be sintered to form the active material structure 12 (S240).

[0144] The active material membrane 2 of this embodiment includes a first channel CH1 and a second channel CH2 that intersect (e.g., cross each other) during sintering, thus exhibiting high structural stability. Therefore, even when the first channel CH1 and the second channel CH2 have small widths, the first channel CH1 and the second channel CH2 can be retained during the sintering process without being eliminated (e.g., lost).

[0145] Figure 9 This is a perspective view of the structure of the active material according to one embodiment. Figure 10A It is along Figure 9 A sectional view taken from line IV-IV'. Figure 10B It is along Figure 9 A cross-sectional view taken along line V-V'. For the sake of brevity, [the following is a simplified description]. Figure 9 , Figure 10A and Figure 10B The above references Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E as well as Figure 5 , Figure 6A and Figure 6B Descriptions of parts that are essentially the same as those described can be omitted here.

[0146] refer to Figure 9 , Figure 10A and Figure 10BAn active material structure 13 can be provided. The active material structure 13 may include a cathode active material structure included in the cathode of a secondary battery. The active material structure 13 may include a lower active material line 104, an intermediate active material line 204, and an upper active material line 304. A first channel CH1 may extend in a third direction DR3 to be recessed in the upper portion of the lower active material line 104. A step may exist between the upper surface 104t of the lower active material line 104 exposed via the first channel CH1 and the uppermost surface 104tm of the lower active material line 104. The upper surface 104t of the lower active material line 104 exposed via the first channel CH1 may be at a level lower than the uppermost surface 104tm of the lower active material line 104. The distance between the upper surface 104t of the lower active material line 104 exposed via the first channel CH1 and the bottom surface of the lower active material line 104 can be less than the distance between the uppermost surface 104tm and the bottom surface of the lower active material line 104.

[0147] The second channel CH2 can extend along the third direction DR3 to be recessed in the lower part of the upper active material line 304. A step may exist between the bottom surface 304b of the upper active material line 304 exposed via the second channel CH2 and the lowermost surface 304bm of the upper active material line 304. The bottom surface 304b of the upper active material line 304 exposed via the second channel CH2 may be at a level higher than the lowermost surface 304bm of the upper active material line 304. The distance between the bottom surface 304b of the upper active material line 304 exposed via the second channel CH2 and the upper surface of the upper active material line 304 may be less than the distance between the lowermost surface 304bm and the upper surface of the upper active material line 304.

[0148] Due to the first channel CH1 and the second channel CH2, the active material structure 13 of one embodiment can have high structural stability. Therefore, an active material structure 13 for providing a secondary battery with high energy density can be provided.

[0149] Figure 11 This is a perspective view of the structure of the active material according to one embodiment. Figure 12 yes Figure 11 An exploded perspective view of the structure of the active material. Figure 13A It is along Figure 12 A cross-sectional view taken from line I-I' of the active material structure. Figure 13B It is along Figure 12 A cross-sectional view taken from line II-II' of the active material structure. Figure 13C It is along Figure 12 The cross-sectional view taken from line III-III' of the active material structure. For the sake of brevity, [the text continues with further details about the cross-section]. Figure 11 , Figure 12 , Figure 13A , Figure 2B and Figure 13C The above references Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E as well as Figure 5 , Figure 6A and Figure 6B Descriptions of parts that are essentially the same as those described can be omitted here.

[0150] refer to Figure 11 , Figure 12 , Figure 13A , Figure 2B and Figure 13C An active material structure 14 can be provided. The active material structure 14 can be a cathode active material structure, which is included in the cathode of the secondary battery. The active material structure 14 may include a lower active material line 106, a middle active material line 206, and an upper active material line 306.

[0151] References above Figure 5 , Figure 6A and Figure 6B Depending on the description, the upper active material line 306 can be arranged in the fourth direction DR4 and the fifth direction DR5. The fourth direction DR4 and the fifth direction DR5 can intersect (e.g., intersect) the first direction DR1 and the second direction DR2, respectively, and intersect (e.g., perpendicular to the third direction DR3). The upper active material line 306 can extend in the third direction DR3.

[0152] Each of the first channels CH1 can be provided between upper active material lines 306 arranged along the fifth direction DR5. Each of the second channels CH2 can be provided between upper active material lines 306 arranged along the fourth direction DR4. The first channels CH1 and the second channels CH2 can extend between intermediate active material lines 206. The first channels CH1 can be provided between intermediate active material lines 206 arranged along the fifth direction DR5 to expose the upper surface of the lower active material line 106. The second channels CH2 can be provided between intermediate active material lines 206 arranged along the fourth direction DR4 to expose the upper surface of the lower active material line 106. The first channels CH1 and the second channels CH2 can intersect (e.g., cross) each other between the upper active material lines 306 and the intermediate active material lines 206.

[0153] Each of the third channel CH3 can be provided between the lower active material lines 106. The lower active material lines 106 and the third channel CH3 can be referenced above. Figure 5, Figure 6A and Figure 6B The lower active material line 102 and the second channel CH2 are substantially the same. The third channel CH3 may extend between the intermediate active material lines 206. The third channel CH3 may be provided between the intermediate active material lines 206 arranged along the second direction DR2 to expose the upper surface of the lower active material line 106.

[0154] The first channel CH1, the second channel CH2, and the third channel CH3 can intersect each other (e.g., cross each other) between the intermediate active material lines 206.

[0155] In one embodiment, the values ​​of the active material structure 14 can be as follows: The dimensions (e.g., thickness) of the active material structure 14 on the third-direction DR3 can be in the range of about 50 μm to about 1,000 μm, for example, in the range of about 100 μm to about 900 μm, about 200 μm to about 800 μm, or about 300 μm to about 700 μm. The width of each of the first to third channels CH1, CH2, and CH3 can be in the range of about 0.5 μm to about 10 μm, for example, in the range of about 1 μm to about 9 μm, about 2 μm to about 8 μm, or about 3 μm to about 7 μm. The depth of each of the first to third channels CH1, CH2, and CH3 can be in the range of about 50% to about 80% of the dimensions (e.g., thickness) of the active material structure 14 on the third-direction DR3, for example, in the range of about 55% to about 75% or about 60% to about 70%. The depths of the first to third channels CH1, CH2, and CH3 are measured on the third-direction DR3. The sum of the distances between the center point CP on the intermediate active material line 206 and the two channels adjacent to the center point CP can be referred to as the channel distance. For example, the two channels can refer to a first channel CH1 and a second channel CH2 that are adjacent to each other, a first channel CH1 and a third channel CH3 that are adjacent to each other, or a third channel CH3 and a second channel CH2 that are adjacent to each other. The channel distance can be in the range of about 1 μm to about 500 μm, for example, in the range of about 50 μm to about 450 μm, about 100 μm to about 400 μm, or about 150 μm to about 350 μm.

[0156] Due to the first to third channels CH1, CH2, and CH3, the active material structure 14 of one embodiment can exhibit high structural stability. Therefore, an active material structure 14 for providing a secondary battery with high energy density can be provided.

[0157] Figure 14 It is manufacturing Figure 11 , Figure 12 , Figure 13A , Figure 2B and Figure 13C The flowchart of the method for determining the structure of the active material 14. Figure 15A It is used for explanation Figure 14 A perspective view of the method for manufacturing active material structure 14. Figure 15B It is used for explanation Figure 14 A perspective view of the method for manufacturing active material structure 14. Figure 15C It is used for explanation Figure 14 A perspective view of the method for manufacturing the active material structure 14. For the sake of brevity, [the following is a description of the method]. Figure 14 , Figure 15A , Figure 15B and Figure 15C The above references Figure 3 , Figure 4A , Figure 4B , Figure 4C and Figure 4D as well as Figure 11 , Figure 12 , Figure 13A , Figure 13B and Figure 13C Descriptions of parts that are essentially the same as those described can be omitted here.

[0158] refer to Figure 14 An active material film 3 (S310) comprising an initial lower active material layer 106', an initial intermediate active material layer 206', and an initial upper active material layer 306' can be formed. As an example, the above reference... Figure 4B The described casting method forms an active material film 3 by sequentially forming an initial intermediate active material layer 206' and an initial upper active material layer 306' on an initial lower active material layer 106'. The active material film 3 can be formed by forming the initial lower active material layer 106', the initial intermediate active material layer 206', and the initial upper active material layer 306' via casting and then laminating the initial lower active material layer 106', the initial intermediate active material layer 206', and the initial upper active material layer 306'.

[0159] refer to Figure 14 and Figure 15A A first stamping process can be performed on the active material membrane 3 to form the first channel CH1 (S320). Except for the alignment direction of the blade 30, the first stamping process can be performed in accordance with the above-mentioned references. Figure 3 and Figure 4C The first stamping process described is basically the same. (And...) Figure 3 and Figure 4C As shown, the blade 30 can be aligned parallel to the fourth direction DR4. The blade 30 can be inserted into the active material membrane 3 to contact the upper surface of the initial lower active material layer 106'. Therefore, the first channel CH1 can be formed to expose the upper surface of the initial lower active material layer 106'.

[0160] refer to Figure 14 and Figure 15B A second stamping process can be performed on the active material membrane 3 to form a second channel CH2 (S330). Except for the alignment direction of the blade 30, the second stamping process can be performed in accordance with the above-mentioned references. Figure 3 and Figure 4C The first stamping process described is basically the same. (And...) Figure 3 and Figure 4C As shown, the blade 30 can be aligned parallel to the fifth direction DR5. The blade 30 can be inserted into the active material membrane 3 to contact the upper surface of the initial lower active material layer 106'. Therefore, the second channel CH2 can be formed to expose the upper surface of the initial lower active material layer 106'. The first channel CH1 and the second channel CH2 can be formed to intersect (e.g., cross) each other on the initial upper active material layer 306' and the initial intermediate active material layer 206'.

[0161] refer to Figure 14 and Figure 15C The third channel CH3 (S340) can be formed, for example, by any suitable process (such as stamping), and for example, a third stamping process can be performed on the active material membrane 3 to form the third channel CH3 (S340). The third stamping process can be related to the above reference. Figure 3 and Figure 4D The second stamping process described is essentially the same. The blade 30 can be aligned parallel to the first direction DR1. The blade 30 can be inserted into the active material film 3 to contact the bottom surface of the initial upper active material layer 306'. Therefore, the bottom surface of the initial upper active material layer 306' can be exposed via the third channel CH3.

[0162] refer to Figure 14 and Figure 11 The active material membrane 3 can be sintered to form the active material structure 14 (S350).

[0163] The active material membrane 3 of one embodiment of this invention includes a first channel CH1, a second channel CH2, and a third channel CH3 that intersect (e.g., cross each other) during sintering, thus exhibiting high structural stability. Therefore, even when the first channel CH1, the second channel CH2, and the third channel CH3 have small widths, the first to third channels CH1, CH2, and CH3 can be retained during the sintering process without being eliminated (e.g., lost).

[0164] Figure 16 This is a perspective view of an electrode structure according to one embodiment. For the sake of brevity, [the following is omitted as it is not part of the original text]. Figure 16 The above references Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E Descriptions of parts that are essentially the same as those described can be omitted here.

[0165] refer to Figure 16 An electrode structure 15 can be provided. The electrode structure 15 may include the cathode structure of a secondary battery. The electrode structure 15 may include a current collector layer 400 and an active material structure on the current collector layer 400. The active material structure may include a lower active material line 100, a middle active material line 200, and an upper active material line 300. The active material structure can be related to the above references. Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E Description Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E The active material structure is basically the same as that of 11. The active material structure may be basically the same as one of the active material structures 12, 13 and 14 mentioned above.

[0166] A current collector layer 400 may be provided on the bottom surface of the lower active material line 100. For example, the current collector layer 400 may be in direct contact with the bottom surface of the lower active material line 100. The upper surface of the current collector layer 400 may be exposed via a second channel CH2. The upper surface of the current collector layer 400 may face the bottom surface of the upper active material line 300, and the second channel CH2 is therein.

[0167] The current collector layer 400 may include a cathode current collector material. The current collector layer 400 may include a conductive material. For example, the current collector layer 400 may include at least one of copper (Cu), gold (Au), platinum (Pt), silver (Ag), zinc (Zn), aluminum (Al), magnesium (Mg), titanium (Ti), iron (Fe), cobalt (Co), nickel (Ni), germanium (Ge), indium (In), and lead (Pd).

[0168] One embodiment of the electrode structure 15 may include an active material structure that exhibits high structural stability due to the first channel CH1 and the second channel CH2. Therefore, an electrode structure 15 for providing a secondary battery with high energy density can be provided.

[0169] Figure 17 This is a conceptual diagram of a secondary battery according to one embodiment. For the sake of brevity, [the following is omitted]. Figure 17 The above references Figure 1 , Figure 2A , Figure 2B , Figure 2C , Figure 2D and Figure 2E Descriptions of parts that are essentially the same as those described can be omitted here.

[0170] refer to Figure 17 It can provide a secondary battery 1000. The secondary battery 1000 may include a pair of sub-secondary batteries 1510 and 1520. The secondary battery 1000 may include one sub-secondary battery or three or more sub-secondary batteries.

[0171] A pair of secondary batteries 1510 and 1520 may include lower electrode structures 1110 and 1120, upper electrode structures 1210 and 1220, and separators 1310 and 1320. Each of the lower electrode structures 1110 and 1120 may be a cathode structure. Each of the upper electrode structures 1210 and 1220 may be an anode structure.

[0172] Each of the lower electrode structures 1110 and 1120 can be an electrode structure including one of the above-described active material structures 11, 12, 13, and 14. For example, each of the lower electrode structures 1110 and 1120 can be related to the above-mentioned references. Figure 16 The electrode structure described is basically the same as 15.

[0173] The upper electrode structures 1210 and 1220 can be provided as separate from the lower electrode structures 1110 and 1210. Each of the upper electrode structures 1210 and 1220 may include an anode current collector layer (not shown) and an anode active material structure (not shown).

[0174] The anode current collector layer may include a conductive material. For example, the anode current collector layer may include at least one of copper foil, nickel foil, stainless steel foil, titanium foil, nickel foam, copper foam, and a polymer substrate coated with a conductive metal.

[0175] The anode active material structure may include the cathode active material. For example, the anode active material structure may include a composition comprising materials for reversibly inserting / deintercalating lithium ions, lithium metal, lithium metal alloys, materials for doping and dedoping lithium, transition metal oxides, etc. The anode active material structure may also include binders, conductive materials, and / or thickeners. The anode active material structure may include pores.

[0176] Separators 1310 and 1320 may be provided between the lower electrode structure 1110 and the upper electrode structure 1210, and between the lower electrode structure 1120 and the upper electrode structure 1220, respectively. Separators 1310 and 1320 can separate the lower electrode structures 1110 and 1120 from the upper electrode structures 1210 and 1220 and provide channels for lithium ions. Separators 1310 and 1320 may have low resistance to ion migration of the electrolyte and excellent electrolyte hygroscopic capacity. For example, separators 1310 and 1320 may comprise at least one of glass fiber, polyester, polyethylene (“PE”), polypropylene (“PP”), and polytetrafluoroethylene (“PTFE”). For example, separators 1310 and 1320 may be in a nonwoven or woven form. For example, separators 1310 and 1320 may be covered with a cover film comprising a ceramic component or polymer material, thus exhibiting excellent heat resistance or mechanical strength. The partition 1310 can have a single-layer or multi-layer structure.

[0177] The lower electrode structures 1110 and 1120, the upper electrode structures 1210 and 1220, and the partitions 1310 and 1320 can be surrounded by a housing (not shown). The housing can have various shapes as needed.

[0178] An electrolyte (not shown) can be provided within the casing. Therefore, the channels in the active material structures of the lower electrode structures 1110 and 1120 can be filled with the electrolyte. The pores in the anode active material structures of the upper electrode structures 1210 and 1220 can be filled with the electrolyte.

[0179] One embodiment of the secondary battery 1000 may include lower electrode structures 1110 and 1120, which include active material structures with high structural stability due to the first channel CH1 and the second channel CH2. Therefore, a secondary battery 1000 with high energy density can be provided.

[0180] This disclosure can provide an active material structure with high structural stability.

[0181] This disclosure can provide an electrode structure and a secondary battery with high energy density.

[0182] This disclosure provides a method for manufacturing active material structures with high structural stability.

[0183] However, the effects are not limited to this.

[0184] It should be understood that the embodiments described herein are to be considered in a descriptive sense only and not for limiting purposes. The description of features or aspects within each embodiment should generally be considered applicable to other similar features or aspects in other embodiments. Although one or more embodiments have been described with reference to the accompanying drawings, those skilled in the art will understand that various changes in form and detail may be made therein without departing from the spirit and scope defined by the appended claims.

[0185] This application claims priority and benefit to Korean Patent Application No. 10-2019-0178164, filed on December 30, 2019, with the Korean Intellectual Property Office, the entire contents of which are incorporated herein by reference.

Claims

1. An active material structure, comprising: A first active material line arranged in a first direction; A second active material line is arranged in a second direction intersecting the first direction; An intermediate active material line is provided in a third direction intersecting the first and second directions, between the first and second active material lines, the intermediate active material line being provided in the overlapping region of the first and second active material lines. A first channel extends in the second direction between the first active material lines and between the intermediate active material lines; as well as The second channel extends in the first direction between the second active material lines and between the intermediate active material lines. The first active material line and the second active material line are electrically connected through the intermediate active material line. The sum of the depth of the first channel measured in the direction of the third party and the depth of the second channel measured in the direction of the third party is greater than the thickness of the active material structure measured in the direction of the third party.

2. The active material structure according to claim 1, wherein the length of the intermediate active material line measured in the first direction is equal to the width of the intermediate active material line measured in the second direction.

3. The active material structure according to claim 1, wherein... The intermediate active material line includes: The first pair of intermediate active material lines adjacent to each other in the first direction, and The second pair of intermediate active material lines that are adjacent to each other in the second direction; as well as The distance between the first pair of intermediate active material lines in the first direction is equal to the distance between the second pair of intermediate active material lines in the second direction.

4. The active material structure according to claim 1, wherein the intermediate active material line extends upward in the third party.

5. The active material structure according to claim 1, wherein... The first active material line extends in the second direction, and The second active material line extends in the first direction.

6. The active material structure according to claim 1, wherein... The second active material line has a length measured in the third direction, and The intermediate active material line has a width measured in the direction of the third party. The width of the intermediate active material line is greater than the length of the second active material line.

7. The active material structure according to claim 6, wherein... The first active material line has a thickness measured in the direction of the third party. The width of the intermediate active material line is greater than the thickness of the first active material line.

8. The active material structure according to claim 7, wherein the length of the second active material line is equal to the thickness of the first active material line.

9. The active material structure according to claim 1, wherein... The second active material line has a first sintering density. The intermediate active material wire has a second sintering density, and The first active material line has a third sintering density. The first sintering density, the second sintering density, and the third sintering density are equal.

10. The active material structure according to claim 1, wherein... The second active material line has a first sintering density. The intermediate active material wire has a second sintering density, and The first active material line has a third sintering density. The second sintering density is greater than the first sintering density and the third sintering density.

11. The active material structure according to claim 10, wherein the first sintering density and the third sintering density are equal.

12. The active material structure according to claim 1, wherein... The second active material line has a first sintering density. The intermediate active material wire has a second sintering density, and The first active material line has a third sintering density. The first sintering density is less than the second sintering density and the third sintering density.

13. The active material structure according to claim 12, wherein the second sintering density and the third sintering density are equal.

14. The active material structure according to claim 1, wherein... The second active material line includes the first active material. The intermediate active material line includes a second active material, and The first active material line includes a third active material. The first active material, the second active material, and the third active material are the same.

15. The active material structure according to claim 1, wherein... The second active material line includes the first active material. The intermediate active material line includes a second active material, and The first active material line includes a third active material. At least two of the first active material, the second active material, and the third active material are different.

16. The active material structure according to claim 1, wherein... The side surface of the intermediate active material line includes at least one of the (101) surface and the {hk0} surface. Where h and k each represent an integer greater than or equal to 1 and are identical.

17. The active material structure according to claim 16, wherein the side surface of the second active material line includes at least one of the (101) surface and the {hk0} surface.

18. The active material structure according to claim 17, wherein the side surface of the first active material line includes at least one of the (101) surface and the {hk0} surface.

19. The active material structure according to claim 18, wherein... The first active material line includes a first surface and a second surface that are opposite to each other. The second active material line includes a third surface and a fourth surface that are opposite to each other. The third surface is located between the second surface and the fourth surface. The second surface lies between the first surface and the third surface, and The first surface, the second surface, the third surface, and the fourth surface include a (003) surface. in, When analyzed by X-ray diffraction using CuKα rays, the intensities of the peak corresponding to the (003) plane, the peak corresponding to the (101) plane, and the peak corresponding to the {hk0} plane satisfy the following relationship: (B+C) / A≥2.7, Where A represents the intensity of the peak corresponding to the (003) plane, B represents the intensity of the peak corresponding to the (101) plane, and C represents the intensity of the peak corresponding to the {hk0} plane.

20. An active material structure, comprising: The first active material layer is on top of the second active material layer; An intermediate active material layer between the second active material layer and the first active material layer; A first channel extends along a second direction in the first active material layer and the intermediate active material layer; as well as The second channel extends in the second active material layer and the intermediate active material layer along a first direction intersecting the second direction. The first channel and the second channel intersect each other in the intermediate active material layer. The sum of the depth of the first channel measured in a third direction intersecting the first and second directions and the depth of the second channel measured in the third direction is greater than the thickness of the active material structure measured in the third direction.

21. The active material structure according to claim 20, wherein... The first active material layer includes a first surface and a second surface that are opposite to each other. The second active material layer includes a third surface and a fourth surface that are opposite to each other. The third surface is located between the second surface and the fourth surface. The second surface lies between the first surface and the third surface. The first channel extends from the first surface of the first active material layer to the third surface of the second active material layer, thereby exposing the third surface of the second active material layer. The second channel extends from the fourth surface of the second active material layer to the second surface of the first active material layer, thereby exposing the second surface of the first active material layer.

22. The active material structure according to claim 21, wherein... The first channel extends into the second active material layer, and The active material structure includes a step between the third surface of the second active material layer exposed via the first channel and the surface of the second active material layer adjacent to the first active material layer.

23. The active material structure according to claim 22, wherein... The second channel extends into the first active material layer, and The active material structure includes a step between the second surface of the first active material layer exposed via the second channel and the surface of the first active material layer adjacent to the second active material layer.

24. The active material structure according to claim 20, further comprising a third channel extending in the first active material layer and the intermediate active material layer, the third channel extending upward in the third layer. The third channel intersects with the first and second channels in the intermediate active material layer.

25. The active material structure according to claim 24, wherein the first channel and the third channel intersect each other in the first active material layer.

26. An electrode structure comprising: Current collector layer; as well as The active material structure on the current collector layer, in The active material structure includes a first part and a second part. The second portion of the active material structure is located between the first portion of the active material structure and the current collector layer. The second part of the active material structure includes a first surface and a second surface that are opposite to each other. The first surface is located between the first portion of the active material structure and the second surface. The current collector layer includes a third surface and a fourth surface that are opposite to each other. The third surface is located between the active material structure and the fourth surface. The active material structure includes: The second channel extends in a first direction parallel to the third surface of the current collector layer; as well as The first channel intersects the second channel and extends in a second direction parallel to the third surface of the current collector layer. The third surface of the current collector layer is exposed via the second channel, and The first surface of the second portion of the active material structure is exposed via the first channel. The sum of the depth of the first channel measured in a third direction intersecting the first and second directions and the depth of the second channel measured in the third direction is greater than the thickness of the active material structure measured in the third direction.

27. The electrode structure according to claim 26, wherein... The second portion of the active material structure includes a second active material line extending in the first direction. The second channel is provided between the lines of the second active material.

28. The electrode structure according to claim 26, wherein The first portion of the active material structure includes a first surface and a second surface that are opposite to each other. The second surface of the first portion of the active material structure is between the first surface of the first portion of the active material structure and the second portion of the active material structure. The first channel passes through the first portion of the active material structure, and The second surface of the first portion of the active material structure is exposed via the second channel.

29. The electrode structure according to claim 28, wherein The first portion of the active material structure includes a first active material line extending in the second direction. The first channel is provided between the first active material lines.

30. The electrode structure according to claim 26, wherein The depth of the first channel, measured in the third direction upwards, is 50% to 80% of the thickness of the active material structure, measured in the third direction upwards, wherein the third direction is perpendicular to the third surface of the current collector layer. The depth of the second channel, measured upwards by the third party, is 50% to 80% of the thickness of the active material structure. The thickness of the active material structure is in the range of 50 micrometers to 1,000 micrometers.

31. The electrode structure according to claim 26, wherein... The width of the second channel, measured in the second direction, is in the range of 0.5 micrometers to 10 micrometers. The width of the first channel, measured in the first direction, is in the range of 0.5 micrometers to 10 micrometers. The distance between a pair of adjacent first channels ranges from 1 micrometer to 500 micrometers, and The distance between a pair of adjacent second channels ranges from 1 micrometer to 500 micrometers.

32. The electrode structure of claim 26 further includes a third channel, the third channel intersecting the first channel and the second channel and extending upward on the third surface parallel to the current collector layer. The first surface of the second portion of the active material structure is exposed via the third channel.

33. The electrode structure of claim 26, wherein the first channel and the second channel intersect each other between the second portion of the active material structure and the first portion of the active material structure.

34. A secondary battery, comprising: The first electrode structure on the second electrode structure; as well as A partition between the second electrode structure and the first electrode structure The second electrode structure includes an active material structure, wherein the active material structure includes: A first active material line arranged in a first direction; A second active material line is arranged in a second direction intersecting the first direction; An intermediate active material line is provided in a third-direction orientation intersecting the first and second directions between the first and second active material lines, the intermediate active material line being provided in the overlapping region of the first and second active material lines. A first channel extends in the second direction between the first active material lines and between the intermediate active material lines; and The second channel extends in the first direction between the second active material lines and between the intermediate active material lines. The first active material line and the second active material line are electrically connected through the intermediate active material line. The sum of the depth of the first channel measured in the direction of the third party and the depth of the second channel measured in the direction of the third party is greater than the thickness of the active material structure measured in the direction of the third party.

35. The secondary battery of claim 34, wherein the second electrode structure further comprises a current collector layer provided on the opposite side of the intermediate active material line, and the second active material line therebetween.

36. The secondary battery according to claim 34, in The first active material line includes a first surface and a second surface that are opposite to each other. The second active material line includes a third surface and a fourth surface that are opposite to each other. The third surface is located between the second surface and the fourth surface. The second surface lies between the first surface and the third surface. The first channel extends between the intermediate active material lines, thereby exposing the third surface. The second channel extends between the intermediate active material lines, thereby exposing the second surface, and The first channel and the second channel intersect each other between the intermediate active material lines.

37. The secondary battery of claim 36, further comprising an electrolyte in the first channel and the second channel.

38. A method for manufacturing an active material structure, the method comprising: Provide active material membranes; A first channel is formed in the active material membrane, and the first channel is arranged in a first direction; A second channel is formed in the active material film, and the second channel is arranged in a second direction intersecting the first direction; as well as Sintering the active material film, The first channel includes a recessed region of the active material film, the recessed region being recessed from the first surface of the active material film to a first depth. The second channel includes a recessed region of the active material film, the recessed region being recessed from a second surface of the active material film to a second depth, the second surface of the active material film being opposite to the first surface of the active material film, and The sum of the first depth and the second depth is greater than the thickness of the active material film measured in a third direction, which intersects the first direction and the second direction.

39. The method of claim 38, wherein The formation of the first channel includes pressing the first surface of the active material film with a first mold, such that the first mold is inserted into the active material film, and The formation of the second channel includes pressing the second surface of the active material film with a second mold, such that the second mold is inserted into the active material film.

40. The method of claim 38, wherein The active material membrane includes: Formation of the initial second active material layer; An initial intermediate active material layer is formed on the initial second active material layer; as well as An initial first active material layer is formed on the initial intermediate active material layer.

41. The method of claim 40, wherein The first depth is equal to the sum of the thickness of the initial intermediate active material layer measured in the third direction and the thickness of the initial first active material layer measured in the third direction, and The second depth is equal to the sum of the thickness of the initial intermediate active material layer measured upwards from the third party and the thickness of the initial second active material layer.

42. The method of claim 40, wherein The first depth is greater than the sum of the thickness of the initial intermediate active material layer measured in the third direction and the thickness of the initial first active material layer measured in the third direction, and The second depth is greater than the sum of the thickness of the initial intermediate active material layer and the thickness of the initial second active material layer as measured in the third direction.

43. The method of claim 38, further comprising: A binder is provided in the active material film prior to sintering; as well as The adhesive is removed from the active material film during sintering.

44. The method of claim 38, further comprising forming a third channel in the active material film, the third channel being arranged in a third direction intersecting the first direction and the second direction. The third channel includes a recessed region of the active material film, the recessed region being recessed from the first surface of the active material film to a third depth.

45. A method for manufacturing an active material structure according to any one of claims 1 to 25, the method comprising: An active material, comprising electrode active material, binder, and solvent slurry, is applied onto a conveyor belt; Dry the active material slurry to form an active material film; as well as A mold is pressed into the surface of the active material membrane to create the active material structure.

Images