Batch substrate immersion cleaning equipment

Abstract

A batch-type substrate immersion and edge cleaning device comprises a tank body, a lifting mechanism, a rotating mechanism, and an edge cleaning component. The tank body comprises a container for containing a solution and for accommodating a substrate carrier and the substrate in the substrate carrier. The lifting mechanism is arranged on the tank body and comprises a lifting seat for supporting the substrate carrier; the rotating mechanism is arranged on the lifting seat and comprises at least one rotating shaft for contacting the substrate and driving the substrate to rotate, the surface of the rotating shaft being provided with a plurality of grooves. The edge cleaning component comprises a brush bundle arranged on both sides of the outer surface of the groove and / or a rough portion arranged on the inner surface of the groove, the brush bundle and / or the rough portion being used to rub the edge of the substrate when the rotating shaft drives the substrate to rotate.

Description

Technical field

[0001] The present application relates to the technical field of wafer substrate cleaning, and in particular to a batch-type substrate immersion edge cleaning device, which combines a chemical immersion treatment method and a physical friction treatment method to improve the cleaning effect of the substrate and is used to solve the problem that adhesive remaining on the edge of the substrate cannot be completely removed. [Background Technology]

[0002] To reduce the package size of semiconductor devices, wafer thinning is a must during the semiconductor manufacturing process. Since wafers become thinner or warp after thinning, a substrate (e.g., glass, metal plate, silicon wafer) is often used as a wafer support carrier to temporarily bond the substrate to the wafer. This increases the wafer's mechanical strength and facilitates subsequent manufacturing processes.

[0003] The bonding of the wafer and the substrate requires the use of a bonding agent, such as a polymer adhesive. After the bonded substrate and wafer complete the subsequent manufacturing process, the temporarily bonded substrate and wafer need to be de-bonded. After the wafer and substrate are de-bonded, adhesive residue often occurs on the surface of the substrate. Since the substrate needs to be reused, the adhesive remaining on the surface of the substrate is usually removed by cleaning processes such as chemical soaking treatment and single wafer spin spray. However, the above-mentioned soaking treatment and single wafer spin spray cleaning methods cannot completely remove the adhesive remaining on the surface of the substrate, especially at the edge of the substrate where adhesive residue often occurs. [Summary of the invention]

[0004] Since existing substrate cleaning equipment cannot completely remove adhesive residues on the edges of substrates, this application proposes a batch-type substrate immersion edge cleaning equipment that can effectively remove adhesive residues on the edges of substrates. It not only removes residual adhesives on the substrate surface by chemical immersion treatment, but also removes adhesive residues on the edges of substrates by physical friction treatment, thereby solving the problem of subsequent reprocessing caused by residual adhesives on the edges of substrates.

[0005] To achieve the above objectives, the present application proposes a batch-type substrate immersion edge cleaning device, comprising:

[0006] A trough body, the trough body includes a containing tank for containing solution and accommodating a substrate carrier and a substrate in the substrate carrier; a lifting mechanism, arranged on the trough body, including a lifting seat for carrying the substrate carrier; a rotating mechanism, arranged on the lifting seat, the rotating mechanism including at least one rotating shaft for contacting with the substrate and driving the substrate to rotate, a plurality of grooves are provided on the surface of the rotating shaft along the axial direction of the rotating shaft, which are retracted toward the central axis of the rotating shaft, and the plurality of grooves are used to accommodate the edges of the substrate; and an edge washing component, including brush clusters arranged on both sides outside the grooves, the brush clusters are used to rub the edges of the substrate when the rotating shaft drives the substrate to rotate.

[0007] In a preferred embodiment, the lifting mechanism further includes a fixed seat and a lifting drive module, the fixed seat is fixedly arranged outside the tank body, the lifting drive module is movably arranged on the fixed seat, the lifting seat is fixedly arranged on the lifting drive module, and can be driven by the lifting drive module to rise to the outside of the containing tank relative to the tank body or fall to the inside of the containing tank relative to the tank body, and the lifting seat is used to support the substrate carrier and the substrate in the substrate carrier.

[0008] In a preferred embodiment, the rotating mechanism further includes a rotating drive module and a transmission assembly, wherein the transmission assembly is connected to the rotating drive module and can be driven by the rotating drive module to move, and the rotating shaft is connected to the transmission assembly and can be driven by the transmission assembly to rotate.

[0009] In a preferred embodiment, the batch substrate immersion edge cleaning equipment further includes a control module electrically connected to the lifting mechanism and the rotating mechanism, and controlling the lifting and lowering of the lifting mechanism and the rotation of the rotating mechanism.

[0010] In a preferred embodiment, the rotating mechanism includes two rotating shafts, which are arranged at intervals perpendicular to the arrangement direction of the substrates, and the distance between the two rotating shafts is between 1 / 4 and 2 / 3 of the diameter of the substrates.

[0011] In a preferred embodiment, the edge washing component further includes a rough portion disposed on a surface of the plurality of grooves, for rubbing an edge of the substrate when the rotating shaft drives the substrate to rotate.

[0012] In a preferred embodiment, the rough portion is a non-woven fabric composed of fibers.

[0013] In a preferred embodiment, the thickness of the non-woven fabric is between 1-5 mm.

[0014] In a preferred embodiment, the bristle cluster is inclined toward the groove, wherein an angle formed by the bristle cluster and the surface of the rotating shaft is between 15-75 degrees.

[0015] In a preferred embodiment, the length of the bristle cluster is 5-20 mm.

[0016] The present application further proposes a batch-type substrate immersion edge cleaning device, comprising:

[0017] A trough body, the trough body including a containing tank for containing a solution and for accommodating a substrate carrier and a substrate placed in the substrate carrier; a lifting mechanism, arranged on the trough body, including a lifting seat for carrying the substrate carrier; a rotating mechanism, arranged on the lifting seat, the rotating mechanism including at least one rotating shaft for contacting with the substrate and driving the substrate to rotate, a plurality of grooves are provided on the surface of the rotating shaft along the axial direction of the rotating shaft, which are inwardly contracted toward the central axis of the rotating shaft, and the plurality of grooves are used to accommodate the edges of the substrate; and an edge washing member, including a rough portion on the surface of the plurality of grooves, which is used to rub the edge of the substrate when the rotating shaft drives the substrate to rotate.

[0018] In a preferred embodiment, the rough portion is a non-woven fabric composed of fibers.

[0019] In a preferred embodiment, the lifting mechanism further includes a fixed seat and a lifting drive module, the fixed seat is fixedly arranged outside the tank body, the lifting drive module is movably arranged on the fixed seat, the lifting seat is fixedly arranged on the lifting drive module, and can be driven by the lifting drive module to rise to the outside of the containing tank relative to the tank body or fall to the inside of the containing tank relative to the tank body, and the lifting seat is used to support the substrate carrier and the substrate in the substrate carrier.

[0020] In a preferred embodiment, the rotating mechanism further includes a rotating drive module and a transmission assembly, wherein the transmission assembly is connected to the rotating drive module and can be driven by the rotating drive module to move, and the rotating shaft is connected to the transmission assembly and can be driven by the transmission assembly to rotate.

[0021] In a preferred embodiment, the batch substrate immersion edge cleaning equipment further includes a control module electrically connected to the lifting mechanism and the rotating mechanism, and controlling the lifting and lowering of the lifting mechanism and the rotation of the rotating mechanism.

Brief Description of the Drawings

[0022] Figure 1 Schematic diagram of temporary bonding and debonding between a wafer and a substrate according to an embodiment of the present application;

[0023] Figure 2 This is a three-dimensional appearance diagram of a batch-type substrate immersion and edge cleaning device according to an embodiment of the present application;

[0024] Figure 3 A three-dimensional cross-sectional view of a batch-type substrate immersion and edge cleaning device according to an embodiment of the present application;

[0025] Figure 4 This is a three-dimensional appearance diagram of the batch-type substrate immersion and edge cleaning equipment according to an embodiment of the present application, omitting the tank body and the lifting base;

[0026] Figure 5 A block diagram of the control module, lifting mechanism, and rotating mechanism of the batch substrate immersion and edge cleaning equipment according to an embodiment of the present application; and

[0027] Figure 6 Schematic diagram of the rotating shaft structure and edge cleaning components of the batch-type substrate immersion edge cleaning equipment according to an embodiment of the present application. [Specific implementation method]

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making any creative efforts shall fall within the scope of protection of this application.

[0029] Please refer to Figure 1 , Figure 1 (a) is a schematic diagram showing a wafer 91 being temporarily bonded to a substrate 90 through an adhesive 99 after the wafer thinning process according to an embodiment of the present application. Figure 1 (b) is a schematic diagram showing adhesive 99 remaining at the edge of the substrate 90 after the wafer 91 and the substrate 90 are de-bonded.

[0030] Please refer to Figure 2 、 Figure 3 and Figure 6 In the embodiment of the present application, the substrate 90 is placed in a tank 100 of the batch substrate immersion cleaning equipment proposed in the present application for cleaning. The tank 100 contains 5% ammonia hydroxide or other cleaning chemicals.

[0031] The batch substrate immersion edge cleaning equipment includes: a trough body 10, which includes a containing tank 100; a lifting mechanism 20, which is arranged on the trough body 10, and includes a lifting seat 25, and the lifting seat 25 is used to carry the substrate carrier 30 (such as a wafer boat); a rotating mechanism 40, which is arranged on the lifting seat 25, and the rotating mechanism 40 includes at least one rotating shaft 45, which is used to contact the substrate 90 and drive the substrate 90 to rotate. On the surface of the rotating shaft 45, a plurality of grooves 451 are provided along the axial direction of the rotating shaft 45, which are inwardly contracted toward the central axis of the rotating shaft 45, and the plurality of grooves 451 are used to accommodate the edges of the substrate 90; and a side cleaning component, including brush clumps 452 arranged on both sides of the groove 451, and the brush clumps 452 are used to rub the edges of the substrate 90 when the rotating shaft 45 drives the substrate 90 to rotate.

[0032] like Figure 6 As shown, the bristle cluster 452 is inclined toward the groove 451 , wherein the angle formed by the bristle cluster 452 and the surface of the rotating shaft 45 is approximately 30 degrees, and the length of the bristle cluster 452 is 10 mm.

[0033] Continuing with the above, the edge cleaning member further includes a roughened portion 453 disposed on the surface of the plurality of grooves 451 for rubbing the edge of the substrate 90 when the rotating shaft 45 rotates the substrate 90. The roughened portion 453 is preferably a non-woven fabric made of fibers having a thickness of 1.5 mm.

[0034] The lifting mechanism 20 further includes a fixed base 21 and a lifting drive module 24. The fixed base 21 is fixedly disposed outside the tank body 10. The lifting drive module 24 is movably disposed on the fixed base 21. The lifting base 25 is fixedly disposed on the lifting drive module 24 and can be driven by the lifting drive module 24 to rise relative to the tank body 10 to the outside of the container 100 or descend relative to the tank body 10 to the inside of the container 100. The lifting base 25 is used to support the substrate carrier 30 and the substrate 90 in the substrate carrier 30.

[0035] Please refer to Figure 3 and Figure 4In a preferred embodiment, the lift drive module 24 is a hydraulic / pneumatic cylinder with a retractable actuator rod 241 mounted on the hydraulic / pneumatic cylinder. The actuator rod 241 is connected to the lift base 25. Furthermore, the hydraulic / pneumatic cylinder is connected to an external hydraulic / pneumatic pressure source to drive the actuator rod 241 to extend and retract. The lift base 25 has a vertical plate 251, with a horizontal support plate 253 formed at its bottom to support the substrate carrier 30.

[0036] The fixed base 21 is provided with two slide rails 22, and the lifting base 25 is provided with two sliders 23. The two sliders 23 are slidably coupled to the two slide rails 22. The configuration of the slide rails 22 and the sliders 23 enables the lifting base 25 to move vertically stably.

[0037] The rotating mechanism 40 is disposed on the lifting base 25 of the lifting mechanism 20 and includes a rotating drive module 41 , a transmission assembly, and a set of rotating shafts 45 . The rotating drive module 41 is fixedly disposed on the lifting base 25 .

[0038] The rotating mechanism 40 also includes a rotating drive module 41 and a transmission assembly (not shown). The transmission assembly is connected to the rotating drive module 41 and can be driven by the rotating drive module 41 to move. The rotating shaft 45 is connected to the transmission assembly and can be driven by the transmission assembly to rotate.

[0039] The rotation driving module 41 is a driving motor having a driving shaft.

[0040] The transmission assembly is connected to the rotation drive module 41 and can be driven by the rotation drive module 41. The rotation shaft 45 is disposed on the lifting base 25, connected to the transmission assembly, and can be rotated by the transmission assembly. In a preferred embodiment, the transmission assembly includes a vertical transmission rod 42 and a horizontal transmission shaft 43. The vertical transmission rod 42 is rotatably disposed through the vertical plate 251 and meshes with the drive shaft. The horizontal transmission shaft 43 meshes with the vertical transmission rod 42.

[0041] like Figure 3 As shown, in a preferred embodiment, there are two rotating shafts 45 for simultaneously driving the base plate 90 to rotate when the rotating shafts 45 rotate. The two rotating shafts 45 are engaged with the horizontal transmission shaft 43.

[0042] like Figure 4As shown, the drive shaft and the vertical transmission rod 42 are meshed with each other through two bevel gears 400; the vertical transmission rod 42 and the horizontal transmission shaft 43 are meshed with each other through two bevel gears 400; the horizontal transmission shaft 43 and each of the horizontal rotation drive rods 45 are meshed with each other through two gears 430 and 450.

[0043] Please refer to Figure 5 The control module 70 is electrically connected to the lifting mechanism 20 and the rotating mechanism 40 to control the lifting and lowering of the lifting mechanism 20 and the rotation of the rotating mechanism 40. In a preferred embodiment, the main control module 70 is a computer having a central processing unit, a memory, a storage, an input interface, and an output interface. The storage contains a main control software. The computer executes the main control software to automatically or under user control to drive the lifting mechanism 20 and / or the rotating mechanism 40 to lift and / or rotate the substrate 90.

[0044] This application utilizes the aforementioned technical means to clean wafer substrates using a combination of chemical immersion treatment and physical friction treatment. As the rotating shaft 45 rotates, driving the substrate 90 in rotation, the bristle cluster 452 and the roughened portion 453 clean the edge of the substrate 90 through friction, effectively removing residual adhesive from the substrate edge. This reduces rework, thereby improving production efficiency and lowering production costs.

[0045] In summary, although the present invention has been disclosed above with preferred embodiments, the above preferred embodiments are not intended to limit the present application. Ordinary technicians in this field can make various changes and modifications without departing from the spirit and scope of the present application. Therefore, the scope of protection of the present application shall be based on the scope defined by the claims.

Claims

1. A batch type substrate immersion edge cleaning device, comprising: A tank body, comprising a container for containing a solution and accommodating a substrate carrier and a substrate in the substrate carrier; a lifting mechanism, disposed on the tank body, comprising a lifting seat, the lifting seat being used to carry the substrate carrier; a rotating mechanism disposed on the lifting base, the rotating mechanism comprising at least one rotating shaft for contacting the substrate and driving the substrate to rotate, a plurality of grooves being provided on a surface of the rotating shaft along an axial direction of the rotating shaft and contracting inwardly toward a central axis of the rotating shaft, the plurality of grooves being used to accommodate edges of the substrate; and A side washing component includes brush clumps arranged on both sides outside the groove, and the brush clumps are used to rub the edge of the substrate when the rotating shaft drives the substrate to rotate.

2. In the batch-type substrate immersion and edge washing equipment as described in claim 1, the lifting mechanism further comprises a fixed seat and a lifting drive module, the fixed seat is fixedly arranged outside the tank body, the lifting drive module is movably arranged on the fixed seat, the lifting seat is fixedly arranged on the lifting drive module, and is driven by the lifting drive module to rise to the outside of the containing tank relative to the tank body or fall to the inside of the containing tank relative to the tank body, and the lifting seat is used to support the substrate carrier and the substrate in the substrate carrier.

3. The batch substrate immersion edge washing equipment as described in claim 2, wherein the rotating mechanism further includes a rotating drive module and a transmission assembly, the transmission assembly is connected to the rotating drive module and is driven by the rotating drive module to move, and the rotating shaft is connected to the transmission assembly and is driven by the transmission assembly to rotate.

4. The batch substrate immersion edge cleaning equipment according to claim 3 further includes a control module, which is electrically connected to the lifting mechanism and the rotating mechanism, and controls the lifting and lowering of the lifting mechanism and the rotation of the rotating mechanism.

5. The batch substrate immersion edge cleaning device as described in claim 1, wherein the rotating mechanism includes two rotating shafts, the two rotating shafts are arranged at intervals perpendicular to the arrangement direction of the substrates, and the distance between the two rotating shafts is between 1 / 4 and 2 / 3 of the diameter of the substrate.

6. The batch-type substrate immersion edge cleaning device according to claim 1, wherein the edge cleaning component further comprises a rough portion on the surface of the plurality of grooves, for rubbing the edge of the substrate when the rotating shaft drives the substrate to rotate.

7. The batch-type substrate immersion edge cleaning device according to claim 6, wherein the rough portion is a non-woven fabric composed of fibers.

8. The batch-type substrate immersion edge cleaning equipment according to claim 7, wherein the thickness of the non-woven fabric is between 1-5 mm.

9. The batch-type substrate immersion edge cleaning device according to claim 1, wherein the bristle clusters are inclined toward the groove, and wherein the angle formed by the bristle clusters and the surface of the rotating shaft is between 15-75 degrees.

10. The batch-type substrate immersion edge cleaning device according to claim 1, wherein the length of the brush bristle cluster is 5-20 mm.

11. A batch type substrate immersion edge cleaning device, comprising: A tank body, comprising a container for containing a solution and accommodating a substrate carrier and a substrate placed in the substrate carrier; a lifting mechanism, disposed on the tank body, comprising a lifting seat, the lifting seat being used to carry the substrate carrier; a rotating mechanism disposed on the lifting base, the rotating mechanism comprising at least one rotating shaft for contacting the substrate and driving the substrate to rotate, a plurality of grooves being provided on a surface of the rotating shaft along an axial direction of the rotating shaft and contracting inwardly toward a central axis of the rotating shaft, the plurality of grooves being used to accommodate edges of the substrate; and An edge washing component includes a rough portion on a surface arranged in the plurality of grooves, and is used for rubbing the edge of the substrate when the rotating shaft drives the substrate to rotate.

12. The batch-type substrate immersion edge cleaning device according to claim 11, wherein the rough portion is a non-woven fabric composed of fibers.

13. In the batch-type substrate immersion and edge washing equipment as described in claim 12, the lifting mechanism further includes a fixed seat and a lifting drive module, the fixed seat is fixedly arranged outside the tank body, the lifting drive module is movably arranged on the fixed seat, the lifting seat is fixedly arranged on the lifting drive module, and is driven by the lifting drive module to rise to the outside of the container relative to the tank body or fall to the inside of the container relative to the tank body, and the lifting seat is used to support the substrate carrier and the substrate in the substrate carrier.

14. The batch substrate immersion edge washing equipment as described in claim 13, wherein the rotating mechanism further includes a rotating drive module and a transmission assembly, the transmission assembly is connected to the rotating drive module and is driven by the rotating drive module to move, and the rotating shaft is connected to the transmission assembly and is driven by the transmission assembly to rotate.

15. The batch type substrate immersion cleaning device according to claim 14 further comprises a control module, wherein the control module is electrically connected to the lifting mechanism and the rotating mechanism, and The lifting and lowering of the lifting mechanism and the rotation of the rotating mechanism are controlled.

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