A microscope
By setting a movable target in the microscope, the dual-function use of the scanning electron beam is achieved, and the inefficiency and damage problems caused by multiple installations of samples in the prior art are solved, and efficient dual-function microscope detection is achieved.
Patent Information
- Application Number
- CN202010494563.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2020-06-03
- Publication Date
- 2025-04-18
- Estimated Expiration
- 2040-06-03
AI Technical Summary
In the prior art, samples need to be installed in scanning electron microscopes and nano-X-ray microscopes respectively, resulting in low detection efficiency and susceptible to damage to the sample.
A microscope is designed to realize the dual function of scanning electron beam by setting a movable target between the electron optical barrel and the sample stage: directly act on the sample for scanning electron microscope detection, or act on the target for X-rays for nano-X-ray microscope detection.
The sample is installed in one time, and the dual-function detection of scanning electron microscope and nano-X-ray microscope is completed, which improves the detection efficiency and reduces the risk of sample damage.
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Figure CN113764246B_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of electronic equipment, and in particular relates to a microscope. Background Art
[0002] Scanning electron microscope (SEM) uses a focused electron beam to scan samples. Through the interaction between the electron beam and the sample, it stimulates various physical information. This information is collected, amplified, and re-imaged to achieve the purpose of characterizing the microscopic morphology of the material. Scanning electron microscope is widely used in the field of observing the surface morphology of materials.
[0003] Nano-CT uses an X-ray beam to scan a layer of a certain thickness of a certain part of a sample. The detector receives the X-rays that pass through the layer, converts them into visible light, and then converts them into electrical signals through photoelectric conversion. After computer processing, a three-dimensional CT image is formed. The CT image can reflect the geometric information and structural information of the sample. The former includes the size, volume and spatial coordinates of each point of the sample, and the latter includes the material information of the sample such as attenuation value, density and porosity.
[0004] In the prior art, when the same sample needs to be detected by both a scanning electron microscope (SEM) and a nano-X-ray microscope (Nano-CT), the sample needs to be placed in the scanning electron microscope for detection, and then placed in the nano-X-ray microscope for detection. This process has low detection efficiency, and the sample is easily damaged when it is installed on the corresponding sample stage multiple times.
[0005] In view of this, the present invention is proposed. Summary of the invention
[0006] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide a microscope that can complete dual-function detection of the sample by a scanning electron microscope and by a nanometer X-ray microscope by installing the sample once.
[0007] In order to solve the above technical problems, the basic concept of the technical solution adopted by the present invention is: a microscope comprising:
[0008] An electron optical column for emitting a scanning electron beam;
[0009] A sample stage, used to place samples;
[0010] A target material is movably disposed between the electron optical lens barrel and the sample stage;
[0011] A driving mechanism drives the target to move between a first position and a second position, wherein the first position is the position where the electron beam acts on the sample, and the second position is the position where the electron beam acts on the target to generate X-rays that irradiate the sample.
[0012] Furthermore, it also includes a first deflection device, which is arranged between the electron optical lens barrel and the target material and is used to change the movement direction of the electron beam before it is incident on the target material.
[0013] Furthermore, it also includes a mounting seat, on which at least one mounting position is arranged, and each mounting position is used to install a different target material.
[0014] Furthermore, the first deflection device is connected to the mounting seat, and the mounting seat is connected to the driving mechanism.
[0015] In some optional embodiments, the mounting seat is provided with a cooling circuit for cooling the target material.
[0016] In some optional embodiments, an X-ray detector is disposed under the sample stage.
[0017] In some optional embodiments, a vacuum chamber is connected to the lower end of the electron optical lens barrel, the sample stage is located in the vacuum chamber, and the sample stage is arranged below the electron optical lens barrel.
[0018] Furthermore, the vacuum chamber is provided with a vacuum window corresponding to the bottom of the sample stage.
[0019] Furthermore, an X-ray detector is arranged below the vacuum window.
[0020] In some optional embodiments, the sample stage is connected to the vacuum chamber via a lifting mechanism, which is used to drive the sample stage to move up and down in the vacuum chamber.
[0021] After adopting the above technical scheme, the present invention has the following beneficial effects compared with the prior art.
[0022] The microscope provided by the present invention provides a movable target material between the electron optical lens barrel and the sample stage, and the scanning electron beam emitted by the electron optical lens barrel can selectively act directly on the sample, or act on the target material to generate X-rays, and the generated X-rays are irradiated on the sample. The sample is installed once, and the dual-function detection of the sample by the scanning electron microscope and the nanometer X-ray microscope is completed.
[0023] The specific implementation modes of the present invention are further described in detail below in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] The accompanying drawings are part of the present invention and are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention, but do not constitute an improper limitation of the present invention. Obviously, the drawings described below are only some embodiments. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. In the accompanying drawings:
[0025] Figure 1 is a schematic structural diagram of a microscope target provided by the present invention being located at a second position;
[0026] Figure 2 It is a schematic structural diagram of the microscope target provided by the present invention being located at a first position.
[0027] In the figure: 1, electron optical lens barrel; 101, electron source; 102, second deflection device; 103, objective lens system;
[0028] 2. Mounting seat; 3. Driving mechanism; 4. Cooling pipeline; 5. Vacuum chamber; 6. First deflection device; 7. Target material; 8. Sample; 9. Sample stage; 10. Lifting mechanism; 11. X-ray detector; 12. Vacuum window.
[0029] It should be noted that these drawings and textual descriptions are not intended to limit the conceptual scope of the present invention in any way, but are intended to illustrate the concept of the present invention for those skilled in the art by referring to specific embodiments. DETAILED DESCRIPTION
[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. The following embodiments are used to illustrate the present invention but are not used to limit the scope of the present invention.
[0031] In the description of the present invention, it should be noted that the directions or positional relationships indicated by terms such as “upper”, “lower”, “front”, “back”, “left”, “right”, “vertical”, “inside” and “outside” are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation on the present invention.
[0032] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0033] like Figure 1 to Figure 2 As shown, a microscope provided by the present invention includes an electron optical lens barrel 1, a sample stage 9, a target material 7, and a driving mechanism 3.
[0034] The electron optical lens barrel 1 is used to emit a scanning electron beam, the sample stage 9 is used to place a sample 8, the target material 7 is movably arranged between the electron optical lens barrel 1 and the sample stage 9, and the driving mechanism 3 drives the target material 7 to move between a first position and a second position, the first position is the position where the electron beam acts on the sample 8, and the second position is the position where the electron beam acts on the target material 7 to generate X-rays that irradiate the sample 8.
[0035] When the driving mechanism 3 drives the target 7 to move to the first position, the scanning electron beam emitted by the electron optical lens tube 1 can directly act on the sample 8, thereby realizing the detection of the sample 8 by the scanning electron microscope.
[0036] When the drive mechanism 3 drives the target 7 to move to the second position, the scanning electron beam emitted by the electron optical lens barrel 1 can act on the target 7 to generate X-rays, and the generated X-rays are irradiated on the sample 8. An X-ray detector 11 is arranged under the sample stage 9. The nanometer X-ray microscope detects the sample 8. The scanning electron beam emitted by the electron optical lens barrel 1 can generate a beam spot with a very small diameter, so the X-ray microscope reaches the nanometer level.
[0037] By arranging a movable target material 7 between the electron optical lens barrel 1 and the sample stage 9, the scanning electron beam emitted by the electron optical lens barrel 1 can selectively act directly on the sample 8, or act on the target material 7 to generate X-rays, and the generated X-rays are irradiated on the sample 8. The sample 8 is installed once, and the dual-function detection of the sample 8 by the scanning electron microscope and the detection of the sample 8 by the nano X-ray microscope is completed.
[0038] It should be noted that the first position is a position where the scanning electron beam emitted by the electron optical lens barrel 1 cannot act on the target 7 but can act on the sample 8 , and the second position is a position where the scanning electron beam emitted by the electron optical lens barrel 1 can act on the target 7 .
[0039] Specifically, the electron optical lens barrel 1 is used to generate an electron beam and emit a scanning electron beam. The electron optical lens barrel 1 includes an electron source 101 , an electron acceleration structure, and an objective lens system 103 .
[0040] The electron source 101 is used to generate an electron beam. The electron acceleration structure is an anode, which is used to form an electric field along the electron beam emission direction to increase the movement speed of the electron beam. The objective lens system 103 is used to control the beam current size and the electron beam forward direction of the electron beam emitted by the electron source 101.
[0041] The objective lens system 103 includes an objective lens and a second deflection device 102. The objective lens can be a magnetic lens, an electric lens, or an electromagnetic compound lens. The second deflection device 102 can be a magnetic deflection device, or an electric deflection device. The second deflection device 102 is used to change the direction of motion of the electron beam emitted by the electron source 101, and can generate a scanning field with any deflection direction.
[0042] In some optional embodiments, since the electron beam acts on the target material 7 to generate X-rays, which will generate heat, and the electron beam acts on the target material 7 for a long time, high temperature will be generated in a local area at the point of action, which may easily cause damage to the target material 7. The electron optical lens barrel 1 includes a second deflection device 102. Since the second deflection device 102 acts on the electron beam to change the movement direction of the electron beam, the electron optical lens barrel 1 will emit a scanning electron beam, and the electron beam acts on the target material 7 by scanning to generate X-rays. The point of action of the electron beam on the target material 7 is constantly changing, which can avoid high temperature in a local area of the target material 7 and increase the service life of the target material 7.
[0043] The optical axis of the electron beam generated by the electron source 101 is the principal optical axis, and the angle between the electron beam and the principal optical axis before entering the target 7 is the incident angle.
[0044] The electron optical lens barrel 1 includes an objective lens, which is used to control the beam size of the electron beam. In order to ensure that the electron beam is incident on the target material 7 and generate more concentrated X-rays, the electron beam is focused by the objective lens so that the beam spot position of the electron beam acts on the target material 7.
[0045] Since the second deflection device 102 is arranged in front of the objective lens, when the distance between the target material 7 and the electron optical lens barrel 1 remains unchanged, and under the premise of ensuring that the beam spot position of the electron beam acts on the target material 7, the angle adjustment range of the incident angle is limited. If the incident angle is too large, the beam spot position of the electron beam will be above the target material 7, which will cause the generated X-rays to be unfocused. After irradiating the sample 8, the imaging aberration of the nano X-ray microscope on the sample 8 is large and unclear.
[0046] In order to overcome the above problems, ensure that the nano X-ray microscope images clearly and reduce aberrations, the microscope provided by the present invention also includes a first deflection device 6, which is arranged between the electron optical lens barrel 1 and the target material 7, and is used to change the movement direction of the electron beam incident on the target material 7. The first deflection device 6 can be a magnetic deflection device or an electric deflection device.
[0047] The electron optical lens barrel 1 emits a scanning electron beam, which passes through the first deflection device 6, and the first deflection device 6 changes the movement direction of the scanning electron beam before it is incident on the target material 7. Before the electron optical lens barrel 1 emits a scanning electron beam and the scanning electron beam is incident on the target material 7, the first deflection device 6 deflects and adjusts the scanning electron beam before it is incident on the target material 7. Under the premise of ensuring that the beam spot position of the electron beam acts on the target material 7, the angle of the incident angle can be adjusted in a wider range, and the scanning electron beam can be incident on the target material 7 at a larger incident angle, which is convenient for adjusting the scanning electron beam before it is incident on the target material 7, ensuring that the generated X-rays are concentrated, and after irradiating the sample 8, the nano X-ray microscope can clearly image the sample 8, and can reduce aberrations.
[0048] In some optional embodiments, the microscope provided by the present invention further includes a mounting base 2 , on which at least one mounting position is provided, and each mounting position is used to install a different target material 7 .
[0049] The target material 7 is installed on the mounting base 2, and a plurality of mounting positions are arranged on the mounting base 2, each of which can be installed with a target material 7, and the plurality of mounting positions can be installed with targets 7 of different thicknesses or targets 7 of different materials. When the scanning electron beam acts on the targets 7 of different thicknesses or targets 7 of different materials, the solid angles of the generated X-rays are different, and the intensities of the X-rays are different, so different X-rays can be generated to irradiate the sample 8.
[0050] The selection of the target material 7 is determined by the density of the sample 8. If the density of the sample 8 to be tested is high, the X-ray is required to have a high hardness and a high ability to penetrate objects, and an element with a high atomic number can be selected as the target material 7. If the density of the sample 8 to be tested is low and the internal structure is loose, the X-ray is required to have a low hardness and a low ability to penetrate objects, and an element with a low atomic number can be selected as the target material 7.
[0051] The optional target materials 7 include: gold, tungsten, silver, rhodium, chromium, nickel and other elements with higher atomic numbers.
[0052] The technicians in this field can select target materials 7 of different thicknesses or materials and install them in the corresponding installation positions according to actual needs. When a target material 7 is needed, the driving mechanism 3 is controlled to drive the required target material 7 to the second position. The scanning electron beam acts on the required target material 7 to generate the required X-rays to irradiate the sample 8.
[0053] Furthermore, the mounting seat 2 is provided with a cooling pipeline 4 for cooling the target material 7 .
[0054] The mounting seat 2 is provided with a cooling pipeline 4, in which coolant flows. The cooling pipeline 4 is provided with a liquid inlet and a liquid outlet. The coolant enters from the liquid inlet, takes away the heat of the target material 7 and flows out from the liquid outlet, thereby achieving heat dissipation for the target material 7 and increasing the service life of the target material 7.
[0055] The coolant may be a water-soluble coolant, or an emulsion, or an oil-based coolant, etc. Preferably, the coolant is water.
[0056] In some optional embodiments, the first deflection device 6 is connected to the mounting seat 2 , and the mounting seat 2 is connected to the driving mechanism 3 .
[0057] Specifically, the driving mechanism 3 may be a telescopic rod mechanism, or a hydraulic rod mechanism, a rotating mechanism, or other mechanical structures that can drive the mounting base 2 to move or rotate.
[0058] The first deflection device 6 is arranged on the mounting seat 2, the first deflection device 6 is connected to the mounting seat 2, and the driving mechanism 3 is connected to the mounting seat 2. Since the first deflection device 6 is connected to the mounting seat 2, when the driving mechanism 3 drives the mounting seat 2 to move, it also drives the first deflection device 6 to move together, so that the driving mechanism 3 drives the mounting seat 2 and the first deflection device 6 to move at the same time.
[0059] Optionally, this embodiment may include two driving mechanisms 3, the first driving mechanism is connected to the mounting base 2, the first driving mechanism alone drives the movement of the mounting base 2, and the second driving mechanism is connected to the first deflection device 6, the second driving mechanism alone drives the movement of the first deflection device 6.
[0060] Optionally, the first deflection device 6 is arranged on the mounting seat 2, the first deflection device 6 is connected to the mounting seat 2, and the driving mechanism 3 is connected to the first deflection device 6. Since the first deflection device 6 is connected to the mounting seat 2, when the driving mechanism 3 drives the first deflection device 6 to move, it also drives the mounting seat 2 to move together, so that the driving mechanism 3 simultaneously drives the mounting seat 2 and the first deflection device 6 to move.
[0061] like Figure 1 to Figure 2As shown, a microscope provided by the present invention includes an electron optical lens barrel 1 from top to bottom, the lower end of the electron optical lens barrel 1 is connected to a vacuum chamber 5, and a sample stage 9 is located in the vacuum chamber 5, and the sample stage 9 is arranged below the electron optical lens barrel 1. Located in the vacuum chamber 5, a first deflection device 6 and a mounting seat 2 are arranged in sequence between the electron optical lens barrel 1 and the sample stage 9, a target material 7 is mounted on the mounting seat 2, the first deflection device 6 is connected to the mounting seat 2, and a driving mechanism 3 is connected to the mounting seat 2, and the driving mechanism 3 drives the mounting seat 2 and the first deflection device 6 to move at the same time, thereby driving the target material 7 to move between the first position and the second position. A vacuum window 12 is arranged below the vacuum chamber 5 corresponding to the sample stage 9. An X-ray detector 11 is arranged below the vacuum window 12. The sample stage 9 is connected to the vacuum chamber 5 through a lifting mechanism 10, which is used to drive the sample stage 9 to move up and down in the vacuum chamber 5.
[0062] like Figure 1 As shown, when the driving mechanism 3 drives the first deflection device 6 and the mounting seat 2, thereby driving the target material 7 to move to the second position, the function of the nano X-ray microscope to detect the sample 8 is realized.
[0063] Specifically, the electron beam generated by the electron source 101 increases its speed after passing through the electron acceleration structure. The electron beam accelerated by the electron acceleration structure moves downward after being focused and changed in direction by the objective lens system 103. The electron optical lens barrel 1 emits a scanning electron beam, which passes through the first deflection device 6. After the first deflection device 6 changes the direction of the scanning electron beam, it is incident on the target material 7. Under the premise of ensuring that the beam spot position of the electron beam acts on the target material 7, the first deflection device 6 can adjust the incident angle of the scanning electron beam incident on the target material 7 in a wide range. The electron beam is scanned to act on the target material 7 to generate X-rays. The point of action of the electron beam on the target material 7 is constantly changing, which can avoid high temperature in a local area of the target material 7 and increase the service life of the target material 7.
[0064] Optionally, the mounting seat 2 is provided with a cooling pipeline 4, in which coolant flows. The cooling pipeline 4 is provided with a liquid inlet and a liquid outlet. The coolant enters from the liquid inlet, takes away the heat of the target material 7 and flows out from the liquid outlet, thereby achieving heat dissipation for the target material 7 and increasing the service life of the target material 7.
[0065] The X-rays generated by the scanning electron beam acting on the target material 7 are irradiated on the sample 8 placed on the sample stage 9. The sample stage 9 is a hollow structure, which meets the requirements of supporting the sample 8 placed on the sample stage 9 and also meets the requirements of X-ray transmission. Preferably, the material of the sample stage 9 is aluminum, or metals with low atomic numbers such as magnesium.
[0066] Optionally, the X-ray detector 11 may be disposed in the vacuum chamber 5 , below the sample stage 9 .
[0067] Alternatively, the vacuum chamber 5 is provided with a vacuum window 12 corresponding to the lower portion of the sample stage 9. An X-ray detector 11 is provided below the vacuum window 12. The vacuum window 12 may be a beryllium window or a glass window.
[0068] The scanning electron beam emitted by the electron optical lens tube 1 can produce a beam spot with a very small diameter, so the X-ray microscope reaches the nanometer level, thus realizing the detection of the sample 8 by the nanometer X-ray microscope.
[0069] like Figure 2 As shown, when the driving mechanism 3 drives the first deflection device 6 and the mounting seat 2, thereby driving the target material 7 to move to the first position, the function of the scanning electron microscope to detect the sample 8 is realized.
[0070] Specifically, the electron beam generated by the electron source 101 increases its speed after passing through the electron acceleration structure. The electron beam accelerated by the electron acceleration structure moves downward after being focused and changed in direction by the objective lens system 103, and the scanning electron beam emitted by the electron optical lens barrel 1 acts on the sample 8. The electron beam acts on the sample 8 to generate secondary electrons, backscattered electrons, Auger electrons, cathode fluorescence 5 and X-rays, etc. The detection is performed through a corresponding electron detector or a photon detector, so as to realize the function of the scanning electron microscope to detect the sample 8.
[0071] Optionally, the sample stage 9 is connected to the vacuum chamber 5 via a lifting mechanism 10 to drive the sample stage 9 to move up and down in the vacuum chamber 5 .
[0072] In order to maintain a high resolution of the scanning electron microscope and ensure the imaging effect of the scanning electron microscope function, the lifting mechanism 10 can drive the sample stage 9 to move up and down in the vacuum chamber 5. Thus, the sample 8 placed on the sample stage 9 is driven to move up and down in the vacuum chamber 5. Thus, the distance between the sample 8 and the electron optical lens barrel 1 can be controlled, that is, the working distance of the scanning electron microscope can be controlled.
[0073] In detail, the lifting mechanism 10 can be a telescopic rod mechanism, or a hydraulic rod mechanism, or other mechanical structures that can drive the sample stage 9 to rise and fall.
[0074] The microscope provided by the present invention, by arranging a movable target material 7 between the electron optical lens barrel 1 and the sample stage 9, the scanning electron beam emitted by the electron optical lens barrel 1 can selectively act directly on the sample 8, or act on the target material 7 to generate X-rays, and the generated X-rays are irradiated on the sample 8. The sample 8 is installed once, and the dual-function detection of the scanning electron microscope on the sample 8 and the nanometer X-ray microscope on the sample 8 are completed. In addition, the electron beam acts on the target material 7 by scanning to generate X-rays, and the point of action of the electron beam on the target material 7 is constantly changing, which can avoid high temperature in the local area of the target material 7 and increase the service life of the target material 7.
[0075] The above is only a preferred embodiment of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed as a preferred embodiment, it is not used to limit the present invention. Any technician familiar with this patent can make some changes or modify the technical contents suggested above into equivalent embodiments without departing from the scope of the technical solution of the present invention. However, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of the solution of the present invention.
Claims
1. A microscope, characterized in that: include: An electron optical column for emitting a scanning electron beam; A sample stage, used to place samples; A target material, at least one of which is movably disposed between the electron optical lens barrel and the sample stage; A driving mechanism, wherein the driving mechanism drives the target to move and switch between a first position and a second position, wherein the first position is a position where the electron beam directly acts on the sample, and the first position of the target is spaced apart from the position of the sample stage in a horizontal direction, and the second position is a position where the electron beam acts on the target to generate X-rays that irradiate the sample, and the first position and the second position are spaced apart in a horizontal direction; A mounting seat, wherein at least one mounting position is provided on the mounting seat, and each mounting position is used to mount a different target material; a first deflection device, the first deflection device is connected to the mounting seat, and the mounting seat is connected to the driving mechanism; the first deflection device is arranged between the electron optical lens barrel and the target material, and is used to change the movement direction of the electron beam incident on the target material when the mounting seat is in the second position, and adjust the incident angle of the scanning electron beam incident on the target material; The electron optical lens barrel includes an objective lens and a second deflection device, wherein the second deflection device is arranged between the objective lens and the first deflection device, the objective lens is used to control the beam size of the electron beam, and the second deflection device is used to change the movement direction of the electron beam emitted by the electron source, so as to change the incident angle of the electron beam on the sample when the mounting seat is in the first position, and make the point of action of the electron beam on the target material constantly change when the mounting seat is in the second position, thereby extending the service life of the target material.
2. The microscope according to claim 1, characterized in that: The mounting seat is provided with a cooling pipeline for cooling the target material.
3. The microscope according to claim 1, characterized in that: An X-ray detector is arranged below the sample stage.
4. The microscope according to claim 1 or 2, characterized in that: The lower end of the electron optical lens barrel is connected with a vacuum chamber, the sample stage is located in the vacuum chamber, and the sample stage is arranged below the electron optical lens barrel.
5. The microscope according to claim 4, characterized in that: The vacuum chamber is provided with a vacuum window corresponding to the lower portion of the sample stage.
6. The microscope according to claim 5, characterized in that: An X-ray detector is arranged below the vacuum window.
7. The microscope according to claim 4, characterized in that: The sample stage is connected to the vacuum chamber via a lifting mechanism, which is used to drive the sample stage to move up and down in the vacuum chamber.
Citation Information
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