Hybrid mask strip, method for manufacturing same, mask assembly, and organic light emitting display device

Abstract

The present invention discloses a hybrid mask strip, a manufacturing method thereof, a mask assembly including the hybrid mask strip, and an organic light emitting display device using the same. A hybrid mask strip according to an embodiment of the present invention includes: a structural mask strip having a plurality of openings formed in a first direction, and having a first bonding region disposed along a periphery of the openings, and stretching fixing portions disposed at both ends in the first direction to be fixed to a frame in a state where a tensile force is applied; and a monomer unit mask having a deposition region and a second bonding region, the deposition region corresponding to the opening, and the second bonding region disposed along a periphery of the deposition region and bonded to the first bonding region; each of the monomer unit masks can be individually bonded to the structural mask strip.

Description

Technical Field

[0001] The present invention relates to a hybrid mask bar and a method for manufacturing the same, a mask assembly including the hybrid mask bar, and an organic light emitting display device using the same. More specifically, the present invention relates to a hybrid mask bar for depositing a deposition material on a TFT glass, a method for manufacturing the same, a mask assembly including the hybrid mask bar, and an organic light emitting display device using the same. Background Art

[0002] In a display device, an organic light emitting device (OLED) has a wide viewing angle and excellent contrast, and in addition, has an advantage of a fast response speed. Accordingly, there is a tendency to gradually expand the use area of the organic light emitting device (OLED).

[0003] The electrodes and the intermediate layer including a light emitting layer of such an organic light emitting device (OLED) can be formed by various methods, and one of the methods is a deposition method.

[0004] In a high-resolution organic light emitting device (OLED) product among small and medium-sized organic light emitting device (OLED) products, the biggest manufacturing difficulty is an organic material deposition process, which is the core of manufacturing RGB pixels in the organic light emitting device (OLED) manufacturing process. Align the position of a fine metal mask (hereinafter, simply referred to as a mask), and a raw material of a deposited thin film forms a thin film of a desired pattern, wherein the fine metal mask has the same pattern as the pattern of the thin film to be formed on the TFT glass. Such a deposition process employs the following deposition method: heating an organic material in a deposition source located at the lower part of a chamber, sublimating the heated organic material, and depositing the organic material on the TFT glass through the mask located at the upper part.

[0005] In order to form a desired deposition pattern on the TFT glass, it is very important to closely adhere the mask and the TFT glass without a gap. For this purpose, it is necessary to strictly reproduce and fix the positional accuracy between a plurality of holes through which a deposition material on the mask passes. Currently, the thickness of the mask is 5 μm to 30 μm, which is very thin. If the mask is fixed without stretching, sinking occurs in the gravity direction, and thus it is difficult to accurately reproduce the positions of the holes. As a result, a gap is formed with the TFT glass in the deposition process, and finally, color mixing defects occur.

[0006] Accordingly, in order to maintain the flatness of the TFT glass, a tensile force needs to be applied to the mask plate to stretch and tighten the mask plate to a state where it maintains elastic force. To keep the mask plate tight, wing members for stretching are added at the edge positions of the mask plate, and a jig capable of applying a tensile force is used to clamp the wing member part to stretch the mask plate. Align the positions of the holes in the mask plate to be consistent with the patterns such as the thin film to be formed on the TFT glass, and then weld the overlapping part of the frame and the edge of the mask plate to fabricate the mask assembly.

[0007] In the case of an Active Matrix Organic Light Emitting Diode (AMOLED) panel, the size has reached half of that of the sixth generation for mass production, but the trend towards larger areas in the seventh and eighth generations is inevitable. This is because only by achieving such a larger area can large AMOLED panels be manufactured simultaneously through multi-face picking.

[0008] Recently, high-resolution display devices with large areas have been required in various electronic devices. In fact, smaller hole sizes and closer hole pitches are required to form Ultra High Definition (UHD) patterns. It is necessary to miniaturize the pixels for forming high-resolution patterns and have a very thin mask plate thickness to prevent shadowing, but with current commercial technologies, it is difficult to achieve a thickness below the predetermined thickness.

[0009] When fabricating a very thin mask plate for processing high-resolution and precise holes, the mask plate itself bends, and it is difficult to align the deposition position of the TFT glass and the hole position of the mask plate due to sagging in the direction of gravity. Moreover, it causes the problem of not being in close contact with the TFT mask plate during the deposition process. To improve this problem, it should be fixed to the frame by welding or the like in a state where the mask plate is tightly stretched.

[0010] In the case of mask plates for conventional TFT glass mother sheet sizes, currently, multiple mask plate strips are stretched and fixed to the frame, and a full mask assembly form is used. For mask plate strips, the commercialization level is 500 ppi to 600 ppi, and it is difficult to achieve a higher level due to technical limitations.

[0011] When stretching a mask plate strip with a thickness of 10 μm and a length of about 1,100 mm in the length direction to achieve half the size of the sixth generation, it is difficult to adjust the position accuracy, and there are problems such as tearing due to stretching or non-welding during welding and fixing. Moreover, there are the following technical limitations: Invar alloy is used as the material for the mask plate strip, and it is difficult to manufacture a mask plate strip with a thin thickness by the rolling method using Invar alloy, and the thickness accuracy is also reduced.

[0012] So far, mask bars have been fabricated by wet etching, and electroforming gold plating or laser processing methods, etc. have been tried to achieve thinning and then used for high-resolution precise hole processing. However, the shape of the conventional mask bars still leaves unsolved problems such as the size of the mask bars themselves and the difficulty of stretching and welding the thin film.

[0013] The deposited substances remaining during repeated deposition lead to a reduction in deposition efficiency, so cleaning several times and replacing the mask bars due to damage to the welding part have become necessary processes in the manufacture of organic light-emitting diode light-emitting devices. The conventional mask bars also have the problem that the entire mask bar needs to be replaced during maintenance. In addition, precise alignment of positions is required during such replacement, but there is also the problem that this is not easy.

[0014] Korean Patent Publication No. 10-0534580 is related to a deposition mask plate in which one or more pattern mask plates are individually fixed corresponding to the openings in a frame mask plate having one or more openings, but it does not disclose a structural mask bar that forms a plurality of openings in a first direction and has a first bonding region disposed along the periphery of the openings, and stretching fixing parts are disposed at both ends in the first direction to be fixed to the frame in a state where a stretching force is applied. When replacing each unit mask plate, there are the following problems: it will affect other unit mask plates and increase the number of mask plates for additional maintenance. Summary of the Invention

[0015] Problems to be Solved

[0016] One technical problem to be solved by the present invention is to provide a hybrid mask bar in which the conventional mask bar is made binary and integrated.

[0017] Another problem to be solved by the present invention is to provide a hybrid mask bar as follows: overcoming the manufacturing limitations of the conventional mask plate and the technical limitations of large-area mask plates, and improving the accuracy and mechanical strength of the mask plate.

[0018] Another problem to be solved by the present invention is to provide a hybrid mask bar as follows: enabling a high-resolution precise deposition pattern to be achieved even with a large-area mask plate.

[0019] Means for Solving the Problems

[0020] To solve the above technical problems, the present invention provides a hybrid mask bar.

[0021] A hybrid mask bar according to an embodiment of the present invention includes: a structural mask bar having a plurality of openings formed in a first direction and having a first bonding region disposed along the periphery of the openings, and stretching fixing portions disposed at both ends in the first direction to be fixed to a frame in a state where a stretching force is applied; and a monomer unit mask having a deposition region and a second bonding region, the deposition region corresponding to the opening, and the second bonding region being disposed along the periphery of the deposition region and bonded to the first bonding region; wherein each of the monomer unit masks can be individually bonded to the structural mask bar.

[0022] According to an embodiment, the structural mask bar may further include a reinforcing bar disposed on the back surface of the bonding surface with the monomer unit mask, thereby correcting the misalignment of the deposition region based on the TFT position of the TFT glass.

[0023] According to an embodiment, a plurality of the reinforcing bars are disposed and may be arranged side by side at intervals along the first direction.

[0024] According to an embodiment, the reinforcing bar may be composed of a vertical reinforcing wall surrounding the welding point between the monomer unit mask and the structural mask bar.

[0025] According to an embodiment, welding protrusions may be formed to protrude on the back surface of the bonding surface of the structural mask bar with the monomer unit mask.

[0026] According to an embodiment, the monomer unit mask may form a welding groove having a predetermined depth from the contact surface with the TFT glass.

[0027] According to an embodiment, welding protrusions may be formed to protrude on the base surface of the welding groove, and the upper end portion of the welding protrusion may be lower than the contact surface.

[0028] According to an embodiment, the monomer unit mask may have a coefficient of thermal expansion different from that of the structural mask bar.

[0029] According to an embodiment, the monomer unit mask may have a thickness different from that of the structural mask bar.

[0030] According to an embodiment, the deposition region includes position alignment holes for passing deposition materials; the position alignment holes align the position of the monomer unit mask based on the TFT position of the TFT glass and can determine the welding position of the monomer unit mask.

[0031] According to an embodiment, the deposition region may be subjected to hole processing by one of wet etching, electroforming gold plating, and laser processing.

[0032] A hybrid mask bar according to another embodiment of the present invention includes: a structural mask bar configured with a plurality of openings and stretching fixing parts, the openings corresponding to the deposition areas of individual unit masks in a first direction, and the stretching fixing parts being disposed at both ends in the first direction to be fixed to a frame in a state where a stretching force is applied; each of the individual unit masks can be individually coupled to the structural mask bar.

[0033] According to an embodiment, the structural mask bar may further include a reinforcing bar disposed on the back surface of the joint surface with the individual unit mask, and further correcting the misalignment of the deposition area based on the TFT position of the TFT glass.

[0034] To solve the above technical problems, the present invention provides a manufacturing method of a hybrid mask bar.

[0035] A manufacturing method of a hybrid mask bar according to an embodiment of the present invention includes: a step of stretching a structural mask bar in a first direction; a step of stretching an individual unit mask in the first direction or in the first direction and a second direction orthogonal to the first direction; a step of aligning the positions of the individual unit masks so that each opening of the structural mask bar corresponds to the deposition area of the individual unit mask; and a step of fixing the individual unit mask to the structural mask bar; wherein, in the step of stretching the individual unit mask and the step of fixing the individual unit mask, each of the individual unit masks can be individually stretched and fixed to the structural mask bar.

[0036] According to an embodiment, in the step of fixing the individual unit mask, when the individual unit mask is coupled to the structural mask bar by a laser beam irradiated from below, a welding protrusion can be formed to protrude below the structural mask bar.

[0037] According to an embodiment, in the step of fixing the individual unit mask, when the individual unit mask is coupled to the structural mask bar by a laser beam irradiated from above, a welding protrusion is formed to protrude on the bottom surface of the welding groove of the individual unit mask; the welding groove can form a step on one surface of the individual unit mask to form a predetermined depth from the contact surface with the TFT glass.

[0038] To solve the above technical problems, the present invention provides a mask assembly using a hybrid mask bar.

[0039] A mask assembly according to an embodiment of the present invention includes: a frame that forms an opening and has a third bonding region disposed along the periphery of the opening; and a plurality of hybrid mask bars whose both ends are fixed to the third bonding region in a state where a tensile force is applied in a first direction; wherein the hybrid mask bar can be formed by using the above-mentioned hybrid mask bar.

[0040] According to an embodiment, it may further include a support portion that is disposed between the frame and the hybrid mask bar in the first direction to support and fix the hybrid mask bar, and block the gap between adjacent hybrid mask bars.

[0041] In order to solve the above technical problems, the present invention provides an organic light-emitting display device formed by using a hybrid mask bar.

[0042] An organic light-emitting display device according to an embodiment of the present invention includes: a TFT glass; a plurality of thin-film transistors disposed on the TFT glass; a plurality of pixel electrodes electrically connected to the thin-film transistors; a deposition layer disposed on the pixel electrodes; and a counter electrode disposed on the deposition layer; at least one of the thin-film transistors, the pixel electrodes, the deposition layer, and the counter electrode can be formed by using the above-mentioned hybrid mask bar.

[0043] Effects of the Invention

[0044] According to an embodiment of the present invention, there is an advantage that the frame and the mask bar stretching system of the conventional mask bar method can be directly and flexibly used as the hybrid mask bar.

[0045] In addition, according to an embodiment of the present invention, the existing mask bar is binary-formed into a structural mask bar and a monomer unit mask, and furthermore, there are different manufacturing errors between the structural mask bar and the monomer unit mask. Therefore, there are advantages of improving the manufacturing convenience, saving the manufacturing cost, improving the productivity and quality.

[0046] In addition, according to an embodiment of the present invention, the existing mask bar is binary-formed into a structural mask bar and a monomer unit mask, and furthermore, the monomer unit mask can be made small and thin. Therefore, not only the conventional wet etching, but also electroforming gold plating or laser processing can be used for manufacturing. Therefore, there is an advantage that a display device can be manufactured through a high-resolution mask.

[0047] In addition, according to an embodiment of the present invention, a deposition region of a monomer unit mask plate with a thin thickness is formed according to the thickness difference between the structure mask plate strip and the monomer unit mask plate, enabling high-resolution hole processing, minimizing the shadow phenomenon, and forming a thick support structure mask plate strip to prevent breakage during stretching and welding, having the advantage of easily achieving a large-area organic light-emitting display device with high resolution.

[0048] In addition, according to an embodiment of the present invention, a thick structure mask plate strip is formed or a reinforcing strip is separately arranged, so that when the monomer unit mask plate with a tensile force applied is combined, the rib of the structure mask plate strip will not bend due to the tensile force, minimizing the position deformation of the monomer unit mask plate, having the advantage of realizing a large-area mask plate assembly.

[0049] In addition, according to an embodiment of the present invention, a thick structure mask plate strip is formed or a reinforcing strip is separately arranged, thereby improving the adhesion between the TFT glass and the hybrid mask plate strip, having the advantage of reducing the shadow phenomenon.

[0050] In addition, according to an embodiment of the present invention, the structure mask plate strip and the monomer unit mask plate have different coefficients of thermal expansion, thereby minimizing the displacement of the monomer unit mask plate caused by the heat applied in the manufacturing process of the hybrid mask plate strip and the mask plate assembly and the deposition process inside the deposition chamber.

[0051] In addition, according to an embodiment of the present invention, different thicknesses are formed between the structure mask plate strip and the monomer unit mask plate, so that a thin-film monomer unit mask plate can be realized compared with the existing mask plate strip, having the advantages of improving the productivity and reliability of generating a high-resolution precise deposition pattern for a large area.

[0052] In addition, according to an embodiment of the present invention, if a part of the monomer unit mask plates are replaced in a hybrid mask plate strip including multiple monomer unit mask plates, only the other monomer unit mask plates in one direction need to be considered, and the interference phenomenon with the monomer unit mask plates of the adjacent other hybrid mask plate strips does not need to be considered, so it has the advantage of being easy to maintain.

[0053] In addition, according to an embodiment of the present invention, welding protrusions are formed on the back surface of the contact surface with the TFT glass (i.e., the lower surface of the structure mask plate strip), so that the TFT glass is closely attached to the hybrid mask plate strip without floating, thus having the advantage of reducing deposition defects.

[0054] In addition, according to an embodiment of the present invention, a welding groove is formed to be recessed from the contact surface by a predetermined depth, a welding protrusion is formed on the base surface of the welding groove, and the upper end of the welding protrusion is lower than the contact surface. Furthermore, it is in close contact with the TFT glass on the contact surface with the TFT glass without floating phenomenon, so it has the advantage of reducing deposition defects.

[0055] In addition, according to an embodiment of the present invention, each monomer unit mask plate is realized in units, and thus a tensile force can be applied to the monomer unit mask plate not only in the first direction but also in the second direction. Therefore, it has the advantage of being able to more precisely control the total pitch of the mask plate. BRIEF DESCRIPTION OF THE DRAWINGS

[0056] Figure 1 It is a perspective view showing a hybrid mask plate strip according to a first embodiment of the present invention.

[0057] Figure 2 It is Figure 1 An enlarged sectional view taken along line A-A' of

[0058] Figure 3 It is a manufacturing process diagram showing a monomer unit mask plate obtained by stretching and joining a structural mask plate strip according to a first embodiment of the present invention.

[0059] Figure 4 It is a plan view showing a structural mask plate strip according to a first embodiment of the present invention.

[0060] Figure 5 It is a plan view showing a monomer unit mask plate according to a first embodiment of the present invention.

[0061] Figure 6 It is a perspective view showing a hybrid mask plate strip according to a second embodiment of the present invention.

[0062] Figure 7 It is Figure 6 An enlarged sectional view taken along line A-A' of

[0063] Figure 8 It is a manufacturing process diagram showing a monomer unit mask plate obtained by stretching and joining a structural mask plate strip according to a second embodiment of the present invention.

[0064] Figure 9a And Figure 9b It is a plan view showing a monomer unit mask plate according to a second embodiment of the present invention.

[0065] Figure 10 It is a perspective view showing a hybrid mask plate strip according to a third embodiment of the present invention.

[0066] Figure 11 It is Figure 10 A sectional view taken along line A-A' of

[0067] Figure 12 It is an enlarged sectional view of the A-A' part of the hybrid reticle bar joined by a laser beam irradiated from below, shown according to the third embodiment of the present invention.

[0068] Figure 13 It is a manufacturing process diagram of the monomer unit reticle obtained by stretching and joining the reticle bar of the structure according to the third embodiment of the present invention.

[0069] Figure 14 It is a bottom view of the reticle bar of the structure according to the third embodiment of the present invention.

[0070] Figures 15a to 15c It is a schematic diagram for explaining the function and effect of the reinforcing bar according to the third embodiment of the present invention.

[0071] Figure 16 It is a schematic diagram for explaining the bonding process of the reinforcing bar according to the third embodiment of the present invention.

[0072] Figure 17 It is a perspective view of the hybrid reticle bar according to the fourth embodiment of the present invention.

[0073] Figure 18 It is an enlarged sectional view of the A-A' part of the hybrid reticle bar joined by a laser beam irradiated from below, shown according to the fourth embodiment of the present invention.

[0074] Figure 19 It is a manufacturing process diagram of the monomer unit reticle obtained by stretching and joining the reticle bar of the structure according to the fourth embodiment of the present invention.

[0075] Figure 20 It is a bottom view of the reticle bar of the structure according to the fourth embodiment of the present invention.

[0076] Figure 21 It is a flowchart showing the manufacturing method of the hybrid reticle bar according to an embodiment of the present invention.

[0077] Figure 22 It is a perspective view showing the manufacturing process of the reticle assembly according to the first embodiment of the present invention.

[0078] Figure 23 It is Figure 22 The main sectional view of the B-B' part in

[0079] Figure 24 It is a perspective view showing the manufacturing process of the reticle assembly according to the second embodiment of the present invention.

[0080] Figure 25 It is a perspective view showing the manufacturing process of the reticle assembly according to the third embodiment of the present invention.

[0081] Figure 26 It is a perspective view showing the manufacturing process of a mask plate component according to a fourth embodiment of the present invention.

[0082] Figure 27 It is Figure 26 the main sectional view of the B-B' part in

[0083] Figure 28 It is a perspective view showing the manufacturing process of a mask plate component according to a fifth embodiment of the present invention.

[0084] Figure 29 It is a perspective view showing the manufacturing process of a mask plate component according to a sixth embodiment of the present invention.

[0085] Figure 30 It is a perspective view showing a frame according to an embodiment of the present invention.

[0086] Figure 31 It schematically shows using Figures 1 to 20 a hybrid mask plate bar to manufacture an organic light emitting display device.

[0087] (Explanation of reference numerals)

[0088] 1: Organic light emitting display device

[0089] 10: Mask plate component

[0090] 100: Hybrid mask plate bar

[0091] 110: Structural mask plate bar 111: Opening

[0092] 112: First bonding area 113: Tensile fixing part

[0093] 114a, 114b: Reinforcing bars 115: Welding protrusion

[0094] 120: Monomer unit mask plate 121: Deposition area

[0095] 122: Position alignment hole 123: Second bonding area

[0096] 124: Contact surface with TFT glass 125: Welding groove

[0097] 126: Welding protrusion

[0098] 200: Frame 210: Opening

[0099] 220: Third bonding area 230: Support part

[0100] t1: Thickness of the structural mask plate bar t2: Thickness of the monomer unit mask plate

[0101] t3: Step difference between the contact surface and the upper end of the welding protrusion Detailed implementation mode

[0102] To solve the above technical problems, the present invention provides a hybrid mask bar.

[0103] The hybrid mask bar of an embodiment of the present invention includes: a structural mask bar that forms a plurality of openings in a first direction and has a first bonding region disposed along the periphery of the openings, and stretching fixing portions disposed at both ends in the first direction to be fixed to a frame in a state where a tensile force is applied; and a monomer unit mask that has a deposition region and a second bonding region, the deposition region corresponding to the openings, and the second bonding region disposed along the periphery of the deposition region and bonded to the first bonding region; wherein each of the monomer unit masks can be individually bonded to the structural mask bar.

[0104] The hybrid mask bar of another embodiment of the present invention includes: a structural mask bar configured with a plurality of openings and stretching fixing portions, the openings corresponding to the deposition regions of each monomer unit mask in a first direction, and the stretching fixing portions disposed at both ends in the first direction to be fixed to a frame in a state where a tensile force is applied; and each of the monomer unit masks can be individually bonded to the structural mask bar.

[0105] The manufacturing method of the hybrid mask bar of an embodiment of the present invention includes: a structural mask bar stretching step of stretching a structural mask bar in a first direction; a monomer unit mask stretching step of stretching a monomer unit mask in the first direction or in the first direction and a second direction orthogonal to the first direction; a monomer unit mask alignment step of aligning the positions of the monomer unit masks so that each opening of the structural mask bar corresponds to the deposition region of the monomer unit mask; and a monomer unit mask fixing step of fixing the monomer unit masks to the structural mask bar; wherein, in the monomer unit mask stretching step and the monomer unit mask fixing step, each of the monomer unit masks can be individually stretched and fixed to the structural mask bar.

[0106] The mask assembly of an embodiment of the present invention includes: a frame that forms an opening and has a third bonding region disposed along the periphery of the opening; and a plurality of hybrid mask bars whose both ends are fixed to the third bonding region in a state where a tensile force is applied in a first direction; wherein the hybrid mask bar can be formed by using the above-mentioned hybrid mask bar.

[0107] To solve the above technical problems, the present invention provides an organic light-emitting display device formed by using a hybrid mask bar.

[0108] An organic light-emitting display device according to an embodiment of the present invention includes: a TFT glass; a plurality of thin film transistors disposed on the TFT glass; a plurality of pixel electrodes electrically connected to the thin film transistors; a deposition layer disposed on the pixel electrodes; and a counter electrode disposed on the deposition layer; at least one of the thin film transistors, the pixel electrodes, the deposition layer, and the counter electrode may be formed using the above-mentioned hybrid mask strip.

[0109] Execute the mode of the present invention

[0110] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the technical idea of the present invention is not limited to the embodiments described herein, but may also be embodied in other forms. On the contrary, the embodiments introduced herein are provided to make the disclosed content more thorough and complete and to more fully convey the idea of the present invention to those skilled in the art.

[0111] In this specification, when it is described that a certain member is located on another member, this means that it may be directly formed on the other member or a third member may be interposed between the two. In addition, in the drawings, the shapes and dimensions are exaggerated to effectively illustrate the technical content.

[0112] In addition, in various embodiments of this specification, terms such as first, second, and third are used to describe various members, but these members are not limited by these terms. These terms are only used to distinguish one member from other members. Accordingly, the first member described in a certain embodiment may also be described as the second member in another embodiment. Here, each of the embodiments described and exemplified also includes complementary embodiments. In addition, in this specification, “and / or” is used in the sense of including at least one of the members listed before and after.

[0113] In the specification, for a singular expression, unless clearly defined in the text, it includes a plural expression. In addition, terms such as “including” or “having” are used to specify the existence of features, numbers, steps, members, or combinations thereof described in the specification, and should not be construed as excluding the existence or increasing the possibility of one or more other features, numbers, steps, members, or combinations thereof. In addition, in this specification, “connection” is used in the sense of including both indirect connection and direct connection of multiple members.

[0114] In addition, in the following description of the present invention, when it is determined that the specific description of a related well-known function or structure makes the gist of the present invention unclear, its detailed description will be omitted.

[0115] Hereinafter, for the sake of convenience of explanation, it is assumed that the hybrid mask bar uses a horizontal deposition system, but it is not limited thereto. In the horizontal deposition system, the first direction refers to the length direction of the hybrid mask bar, i.e., the Y-axis of the orthogonal coordinate system, and the second direction refers to the width direction of the hybrid mask bar, i.e., the X-axis of the orthogonal coordinate system. In the Z-axis, a deposition source, a mask assembly including the hybrid mask bar, and a TFT glass as a deposition body are sequentially arranged in the vertical direction.

[0116] Hereinafter, the hybrid mask bar 100 of the first embodiment of the present invention will be described.

[0117] Figure 1 is a perspective view showing the hybrid mask bar 100 of the first embodiment of the present invention; Figure 2 is Figure 1 an enlarged cross-sectional view of the A-A' portion of Figure 3 is a manufacturing process diagram showing a monomer unit mask 120 stretch-bonded to a structural mask bar 110 in the first embodiment of the present invention; Figure 4 is a plan view showing the structural mask bar of the first embodiment of the present invention; Figure 5 is a plan view showing the monomer unit mask of the first embodiment of the present invention.

[0118] Referring to Figures 1 to 5 , the hybrid mask bar 100 of the first embodiment of the invention can be used in a deposition process for depositing a deposition material on a TFT glass (not shown). The substrate S can be a transparent material such as a glass material, a plastic material, or a metal material. In the present invention, a TFT glass (not shown) will be exemplified among various types of substrates S. However, the present invention is not limited thereto.

[0119] The hybrid mask bar 100 may include a structural mask bar 110 and a plurality of monomer unit masks 120. In the case of a horizontal deposition system, the hybrid mask bar 100 may have a structure in which the structural mask bar 110 and the monomer unit mask 120 thereon are stacked in the vertical direction. The hybrid mask bar 100 can be replaced in units of the monomer unit mask 120 or the structural mask bar 110 to be described later.

[0120] The structural mask bar 110

[0121] Referring to Figures 1 to 5 , Figures 22 to 25, the mask bar 110 of the first embodiment of the present invention can keep the total pitch of the manufacturing tolerances of the monomer unit mask 120 to be described later constant. The mask bar 110 for structure is fixed to the frame 200 in a state where a tensile force is applied and can support the monomer unit mask 120. A plurality of openings 111 can be formed in the mask bar 110 for structure in a first direction. In addition, the mask bar 110 for structure can have a first bonding region 112 and a tensile fixing portion 113. Further, a welding protrusion 115 can also be included.

[0122] Refer back to Figures 2 to 5 , the opening 111 can expose the deposition region 121 of the monomer unit mask 120 in the Z direction. The opening 111 can be in a shape that penetrates vertically. The plurality of openings 111 are spaced from each other by a distance equivalent to that of a rib. The opening 111 can be formed in a size and shape corresponding to the deposition region 121 of the monomer unit mask 120. One opening 111 can correspond to each monomer unit mask 120. Each opening 111 can be symmetrically arranged along the first direction. The opening 111 can be machined with a lower precision than the deposition region 121 of the monomer unit mask 120.

[0123] For the convenience of manufacturing and processing, the opening 111 has a quadrilateral shape, but it does not necessarily have to be quadrilateral, such as in cases where the sizes are different or irregular. In addition, the opening frame surrounding the opening 111 can have an inclined surface that becomes narrower in the Z+ direction to improve the surface take-up rate according to the predetermined thickness of the mask bar 110 for structure of the first embodiment.

[0124] Refer back to Figure 4 and Figure 5 , the first bonding region 112 can provide a region for supporting the monomer unit mask 120 and bonding to the second bonding region 123 of the monomer unit mask 120. The first bonding region 112 can be arranged along the periphery of the opening 111. The first bonding region 112 can be in surface contact with the second bonding region 123 to be described later and support the monomer unit mask 120. The mask bar 110 for structure and the monomer unit mask 120 can be bonded by welding between the first bonding region 112 and the second bonding region 123. The first bonding region 112 can have a quadrilateral shape. The first bonding region 112 of one embodiment can have different widths in the first direction and the second direction respectively.

[0125] Refer back to Figure 4, the stretching fixing part 113 can be the area where both ends of the edge of the structural mask plate strip 110 protrude and extend. The stretching fixing part 113 can be the area clamped by clamping devices (not shown) arranged at both ends in the first direction to apply a stretching force to the structural mask plate strip 110. The area clamped by the clamping devices (not shown) in the stretching fixing part 113 can have a wing shape symmetrical to each other at the edges. The stretching fixing part 113 can include the area welded by the laser beam of a laser welding machine (not shown), where the laser welding machine is arranged in the upper part in the Z direction. The stretching fixing part 113 can be fixed to the frame 200 by welding in the state of applying a stretching force.

[0126] In this case, in order to stretch the structural mask plate strip 110, clamping devices (not shown) can be respectively arranged in the stretching fixing part 113. The clamping devices (not shown) apply a stretching force to the stretching fixing part 113 in the first direction, and then can be fixed to the frame 200 in the state of pulling and tightening the structural mask plate strip 110. The stretching fixing part 113 can include a fixing area combined with the frame 200. At this time, it can be fixed to the frame 200 by methods such as welding.

[0127] Refer back to Figure 2 and Figure 3 , in order to improve the adhesion between the single-unit mask plate 120 and the TFT glass (not shown), the welding protrusions 115 can protrude and be formed on the lower surface of the structural mask plate strip 110, that is, the back surface of the joint surface of the structural mask plate strip 110 with the single-unit mask plate 120. For this purpose, when the structural mask plate strip 110 is combined with the single-unit mask plate 120, it can be as shown in Figure 2 and Figure 3 The laser beam is irradiated from the back surface, that is, the lower surface of the joint surface of the single-unit mask plate 120 in the Z+ direction. The welding protrusions 115 can be formed at the welding points. In this case, the welding points refer to the areas where the welding protrusions 115 are formed by the laser beam to combine each single-unit mask plate 120 and the structural mask plate strip 110. A plurality of welding protrusions 115 can be arranged at the welding points at a predetermined interval.

[0128] The laser welding device (not shown) can be arranged at the lower part of the structural mask plate strip 110. The welding protrusions 115 can be formed on the back surface of the joint surface with the single-unit mask plate 120 by the laser beam irradiated from the laser welding device (not shown). Accordingly, no unevenness formed by separate welding is generated on the contact surface 124 of the TFT glass of the single-unit mask plate 120 facing the TFT glass (not shown). Accordingly, even if the welding process is performed, the TFT glass (not shown) and the hybrid mask plate strip 100 can be closely attached to each other during the deposition process without floating, so the shadow phenomenon can be minimized.

[0129] Refer back toFigure 1 and Figure 3 、 Figure 4 The mask bar 110 for structure can be a strip having a predetermined length formed in a first direction. The mask bar 110 for structure can be fabricated with a manufacturing error lower than that of the single-unit mask 120. In addition, the mask bar 110 for structure can be fabricated with a manufacturing error lower than that of the conventional mask bar. The width, shape, size, etc. of the mask bar 110 for structure can be symmetric with each other to apply a uniform tensile force to the single-unit mask 120. The mask bar 110 for structure can be a metal material containing a steel component that exerts an attractive force on the magnet.

[0130] The mask bar 110 for structure can have magnetism. Accordingly, when the hybrid mask bar 100 is adhered to the TFT glass (not shown), an attractive force is generated in the Z+ direction on the hybrid mask bar 100 by the magnetic body disposed above, thereby improving the adhesion between the TFT glass (not shown) and the hybrid mask bar 100.

[0131] The mask bar 110 for structure according to an embodiment can have a coefficient of thermal expansion different from that of the single-unit mask 120. More specifically, the mask bar 110 for structure can have a relatively low coefficient of thermal expansion compared to the single-unit mask 120. Accordingly, since the coefficient of thermal expansion of the mask bar 110 for structure is small, deformation caused by heat generated in the deposition process can be minimized.

[0132] According to an embodiment, the mask bar 110 for structure can have a thickness different from that of the single-unit mask 120. More specifically, the mask bar 110 for structure can have a thickness greater than a predetermined thickness relative to the single-unit mask 120. Different from the single-unit mask 120, the thickness of the mask bar 110 for structure is relatively increased, thereby not only preventing misalignment during stretching and welding, but also preventing breakage caused by stretching and welding. The mask bar 110 for structure can have a thickness of 100 μm to 200 μm.

[0133] The single-unit mask 120, which is another structure of the hybrid mask bar 100, will be described.

[0134] Single-unit mask 120

[0135] Referring to Figures 1 to 5 , in the deposition process step of the single-unit mask 120, a substance is deposited through the deposition region 121 on the TFT glass (not shown) to obtain a desired pattern film (such as a metal layer or an organic light-emitting layer). As Figure 5 shown, the single-unit mask 120 can include a deposition region 121 and a second bonding region 123. Further, it can also include position alignment holes 122.

[0136] Re-reference Figures 1 to 3 , the monomer unit mask 120 can be separately combined with the structural mask strip 110 individually. In this case, each monomer unit mask 120 can be arranged in the first direction intermittently with respect to each other on the structural mask strip 110. That is, the plurality of monomer unit masks 120 can be joined to the structural mask strip 110 in a state where they are spaced apart from each other in the first direction by a distance equivalent to the pitch of ribs. The monomer unit mask 120 can have a plate-like thin film shape. The monomer unit mask 120 can have a thickness of 5 μm to 25 μm. One side of the monomer unit mask 120 is in contact with the surface of the TFT glass (not shown), and the other side is joined to the structural mask strip 110 and can be supported. According to an embodiment, in a horizontal deposition system, the monomer unit mask 120 can be arranged above the structural mask strip 110 in the Z direction.

[0137] Re-reference Figure 1 and Figure 2 、 Figure 5 , the deposition region 121 can be composed of a plurality of pattern holes through which deposition material passes. The deposition region 121 can have a position, size, and shape corresponding to the opening 111. The deposition region 121 can have a region smaller than the opening 111 in the first direction and the second direction. The opening 111 of the structural mask strip 110 is larger than the deposition region 121, but can be smaller than the monomer unit mask 120. The deposition region 121 is shown with a plurality of holes arranged, but in addition to this, the deposition region 121 can also have a plurality of slot shapes. The deposition region 121 can include position alignment holes 122.

[0138] The deposition region 121 can be hole-machined by one of wet etching, electroforming gold plating, and laser processing. That is, the monomer unit mask 120 can be made small and thin, and thus has the advantage that the monomer unit mask 120 with an accurate deposition region 121 can be processed by wet etching, electroforming gold plating, or laser processing.

[0139] Re-reference Figure 5 , the second bonding region 123 can provide a region for bonding to the structural mask strip 110. The second bonding region 123 can be arranged along the periphery of the deposition region 121. The second bonding region 123 can be a region other than the deposition region 121 in the monomer unit mask 120. Re-reference Figures 3 to 5 , the second bonding region 123 can be a region in surface contact with the first bonding region 112.

[0140] The second bonding region 123 can be supported by the first bonding region 112. The bonding structure between the first bonding region 112 and the second bonding region 123 can be welded using a mask bar 110 and a monomer unit mask 120. The second bonding region 123 can have a quadrilateral shape. In one embodiment, the second bonding region 123 has different widths in the first direction and the second direction, respectively.

[0141] Referring back Figure 5 , the position alignment hole 122 can be formed by holes selected from the R, G, and B pixels of an organic light-emitting display (OLED) for allowing deposition materials to pass through. In addition, the position alignment hole 122 can be a reference for aligning the position of the monomer unit mask 120 based on the TFT positions of a TFT glass (not shown). The position alignment hole 122 can determine the welding position of the monomer unit mask 120. Since the position alignment holes 122 of the monomer unit mask 120 correspond to the TFT positions of the TFT glass (not shown), the positions of the respective monomer unit masks 120 can be aligned based on the absolute coordinate values of the TFT positions.

[0142] According to one embodiment, the monomer unit mask 120 can have a different coefficient of thermal expansion from that of the mask bar 110 for the structure. More specifically, the monomer unit mask 120 can have a relatively high coefficient of thermal expansion compared to the mask bar 110 for the structure. Accordingly, when a tensile force is applied to the mask bar 110 for the structure in the first direction, the deformation applied to the mask bar 110 for the structure by the monomer unit mask 120 can be relatively less. Accordingly, the change in the position of the monomer unit mask 120 having a large coefficient of thermal expansion can be minimized while the mask bar 110 for the structure supports each monomer unit mask 120.

[0143] According to one embodiment, the monomer unit mask 120 can have a different thickness from that of the mask bar 110 for the structure. More specifically, the monomer unit mask 120 can have a relatively thin thickness (t2 < t1) compared to the mask bar 110 for the structure. Accordingly, a greater tensile force can be applied to stretch the mask bar 110 for the structure, and the sinking of the mask bar 110 for the structure can be relatively reduced compared to the monomer unit mask 120. As a result, since the mask bar 110 for the structure supports each monomer unit mask 120, the phenomenon of the monomer unit mask 120 sinking due to its own weight can also be minimized. In this case, the monomer unit mask 120 can have a thickness of 5 μm to 25 μm.

[0144] Hereinafter, the hybrid mask bar 100 of the second embodiment of the present invention will be described centering on the differences from the hybrid mask bar 100 of the first embodiment of the present invention. The omitted description can be replaced by the content of the hybrid mask bar 100 of the first embodiment described above Figures 1 to 5 The description of the hybrid mask bar 100 of the first embodiment described above.

[0145] The hybrid reticle bar 100 of the second embodiment of the present invention may have the following characteristics: When the structural reticle bar 110 is combined with the monomer unit reticle 120, a laser beam is irradiated from above, and a welding protrusion 126 is formed on the bottom surface of the welding groove 125 of the monomer unit reticle 120.

[0146] Figure 6 is a perspective view showing the hybrid reticle bar of the second embodiment of the present invention; Figure 7 is Figure 6 an enlarged cross-sectional view of the A-A' portion of Figure 8 is a manufacturing process diagram showing the monomer unit reticle obtained by stretching and joining the structural reticle bar in the second embodiment of the present invention; Figure 9a and Figure 9b is a plan view showing the monomer unit reticle of the second embodiment of the present invention.

[0147] The monomer unit reticle 120

[0148] As Figures 6 to 9b shown, the monomer unit reticle 120 of the second embodiment may form a welding groove 125.

[0149] In the case where the monomer unit reticle 120 of the second embodiment has a greater thickness than the monomer unit reticle 120 of the first embodiment. That is, even if the monomer unit reticle 120 of the second embodiment forms a welding groove 125, it may have a thickness greater than a predetermined thickness such that the durability of the monomer unit reticle 120 is not affected.

[0150] Referring back to Figure 7 and Figure 8 , the welding groove 125 can prevent a gap from being formed between the monomer unit reticle 120 and the TFT glass (not shown) due to the welding protrusion 126 formed by welding when the monomer unit reticle 120 and the structural reticle bar 110 are combined. That is, the welding groove 125 may be configured such that the monomer unit reticle 120 and the TFT glass (not shown) can be closely attached without a gap even when welded by irradiating a laser beam from above. The welding groove 125 may form a step of a predetermined depth from the contact surface 124 with the TFT glass, which is one surface of the monomer unit reticle 120.

[0151] As Figure 7 shown, the welding groove 125 has a predetermined depth from the contact surface 124 with the TFT glass and may be an area where the welding protrusion 126 to be formed later is to be formed. As Figures 9a to 9b shown, the welding groove 125 having a step may be formed in various shapes on the upper part of the contact surface 124 with the TFT glass (not shown).

[0152] Referring backFigure 7 , the welding protrusion 126 may protrude and be formed on the bottom surface of the welding groove 125. In order to improve the adhesion between the single-unit mask plate 120 and the TFT glass (not shown), the upper end of the welding protrusion 126 may be lower than the contact surface 124 with the TFT glass. The contact surface 124 with the TFT glass is provided in the Z+ direction which is about t3 different from the upper end of the welding protrusion 126 in the Z direction.

[0153] Hereinafter, the hybrid mask plate strip 100 of the third embodiment of the present invention will be described centering on the differences from the hybrid mask plate strip 100 of the first embodiment of the present invention. The omitted description may be replaced by the content of the hybrid mask plate strip 100 of the first embodiment described above. Figures 1 to 5 The content of the hybrid mask plate strip 100 of the first embodiment described above can be substituted.

[0154] The hybrid mask plate strip 100 of the third embodiment of the present invention is characterized in that the structural mask plate strip 110 is provided with a reinforcing strip 114a.

[0155] Figure 10 is a perspective view showing the hybrid mask plate strip 100 of the third embodiment of the present invention; Figure 11 is Figure 10 the sectional view taken along A-A' of Figure 12 is an enlarged sectional view of the A-A' part of the hybrid mask plate strip 100 joined by a laser beam irradiated from below according to the third embodiment of the present invention; Figure 13 is a manufacturing process diagram showing the single-unit mask plate 120 stretch-joined to the structural mask plate strip 110 in the third embodiment of the present invention; Figure 14 is a bottom view showing the structural mask plate strip 110 of the third embodiment of the present invention; Figures 15a to 15c is a schematic diagram for explaining the effect of the reinforcing strip in the third embodiment of the present invention; Figure 16 is a schematic diagram for explaining the bonding process of the reinforcing strip in the third embodiment of the present invention.

[0156] The structural mask plate strip 110

[0157] Referring to Figures 10 to 16 , the structural mask plate strip 110 of the third embodiment of the present invention may have a first bonding area 112 and a stretch fixing part 113. Further, it may also include a reinforcing strip 114a and a welding protrusion 115.

[0158] According to the third embodiment, the structural mask plate strip 110 and the monomer unit mask plate 120 may have different thicknesses from each other. More specifically, the structural mask plate strip 110 may have a thickness relatively greater than a predetermined thickness compared to the monomer unit mask plate 120. Different from the monomer unit mask plate 120, forming the structural mask plate strip 110 to have a greater thickness can not only prevent misalignment during stretching and welding, but also prevent breakage caused by stretching and welding. The structural mask plate strip 110 may have a thickness of 30 μm to 100 μm.

[0159] Referring back to Figure 11 and Figure 12 、 Figure 14 , the reinforcing strip 114a can correct the misalignment of the monomer unit mask plate 120 (in particular, the deposition region 121) to be described later. Thus, the deposition region 121 can have coordinate values corresponding to the TFT positions of the TFT glass (not shown). The reinforcing strip 114a can be disposed on the back surface of the joint surface of the monomer unit mask plate 120. A plurality of reinforcing strips 114a are arranged and can be arranged side by side at intervals along the first direction. The reinforcing strip 114a can have a thickness greater than a predetermined thickness to correct the misalignment of the monomer unit mask plate 120.

[0160] The reinforcing strip 114a can have a predetermined strength to prevent bending when combined with the monomer unit mask plate 120. The reinforcing strip 114a can be made of a low-weight material to prevent sagging due to its own weight in the Z direction. Preferably, the reinforcing strip 114a can be a metal material containing a steel component that has an attractive force on a magnet.

[0161] The structural mask plate strip 110 and the reinforcing strip 114a are magnetic. Thus, when the hybrid mask plate strip 100 is attached to the TFT glass (not shown), an attractive force is generated on the hybrid mask plate strip 100 in the Z+ direction by the magnet disposed above, thereby improving the adhesion between the TFT glass (not shown) and the hybrid mask plate strip 100.

[0162] As Figure 16 shown, the reinforcing strip 114a can be welded and joined to the structural mask plate strip 110 by a laser beam irradiated by a laser welding machine (not shown), and the laser welding machine is disposed on the back surface of the joint surface of the structural mask plate strip 110 (i.e., the lower part of the structural mask plate strip 110).

[0163] The reinforcing strip 114a of the first embodiment can be a reinforcing wall. The reinforcing wall can be composed of vertical walls surrounding the welding points. In order to avoid interference with the welding points used for welding with the monomer unit mask plate 120, welding protrusions can be formed at a predetermined interval along the reinforcing wall under the reinforcing wall.

[0164] The welding points can provide a bonding area through welding for bonding the monomer unit mask 120 to the structural mask bar 110. That is, when a laser beam is irradiated below the structural mask bar 110 (i.e., the back of the bonding surface with the monomer unit mask 120), the area of the welding points can be excluded to improve the bonding force between the structural mask bar 110 and the monomer unit mask 120.

[0165] When a tensile force is applied to the structural mask bar 110 in the first direction, the tensile force is only applied to the edge in the first direction to make it taut, while no tensile force is applied to the ribs disposed only in the second direction in the area between the edges.

[0166] Figure 15b and Figure 15c are diagrams showing stretching, aligning, and welding each monomer unit mask 120 at the first and second openings 111 of each structural mask bar 110 assuming that there is no reinforcing bar 114a in the structural mask bar 110.

[0167] The second opening 111 of the structural mask bar 110 can bond the monomer unit mask 120 to which a tensile force is applied in the first direction or in the first and second directions. At this time, especially if the tensile force applied to the monomer unit mask 120 in the first direction is released while bonding, then as Figure 15b shown, the ribs that do not transmit the tensile force can be deformed in the (-) direction of the first direction.

[0168] As Figure 15c shown, when the monomer unit mask 120 to which a tensile force is applied in the first direction or in the first and second directions is bonded to the first opening 111 of the structural mask bar 110, the tensile force applied to the monomer unit mask 120 is released while bonding, and the ribs except for the edge in the first direction can be deformed in the (+) direction of the first direction, which is the opposite direction of Figure 15b .

[0169] Accordingly, as Figure 15a shown, the function of the reinforcing bar 114a is as follows: supporting the ribs of the structural mask, and thus not deforming the ribs of the structural mask bar regardless of whether a tensile force is applied when each monomer unit mask 120 to which a tensile force is applied is bonded to the structural mask bar 110.

[0170] As Figure 11 and Figure 12 、 Figure 16As shown, the welding protrusion 115 can be formed at the welding point in the inner region of the reinforcing wall. By disposing the welding protrusion 115 inside the reinforcing strip 114a, not only can the bonding strength between the structural mask plate strip 110 and the reinforcing strip 114a be improved, but also the bonding strength between the structural mask plate strip 110 and the single-unit mask plate 120 can be improved.

[0171] The welding protrusion 115 can be formed at the welding point inside the reinforcing strip 114a by a laser welding device (not shown) disposed below the structural mask plate strip 110.

[0172] Hereinafter, the hybrid mask plate strip 100 of the fourth embodiment of the present invention will be described centering on the differences from the hybrid mask plate strip 100 of the second and third embodiments of the present invention. The omitted description can be replaced by the content of the hybrid mask plate strip 100 of the first to third embodiments described above. Figures 1 to 16 The description can be replaced by the content of the hybrid mask plate strip 100 of the first to third embodiments described above.

[0173] The hybrid mask plate strip 100 of the fourth embodiment of the present invention is characterized in that the structural mask plate strip 110 is provided with a reinforcing strip 114b.

[0174] Figure 17 FIG. is a perspective view showing the hybrid mask plate strip of the fourth embodiment of the present invention; Figure 18 FIG. is an enlarged sectional view taken along line A-A' of the hybrid mask plate strip joined by a laser beam irradiated from below according to the fourth embodiment of the present invention; Figure 19 FIG. is a manufacturing process diagram showing a single-unit mask plate stretched and joined to the structural mask plate strip in the fourth embodiment of the present invention; Figure 20 FIG. is a bottom view showing the structural mask plate strip of the fourth embodiment of the present invention.

[0175] Structural mask plate strip 110

[0176] As Figures 17 to 20 shown, the reinforcing strip 114b of the fourth embodiment is formed in the shape of a rectangular parallelepiped and may have a predetermined thickness and width corresponding to the ribs of the structural mask plate strip 110. The structural mask plate strip 110 of the fourth embodiment can form a welding protrusion 126 on the back surface of the bonding surface with the single-unit mask plate 120 to be combined with the reinforcing strip 114b. In this case, the reinforcing strip 114b and the structural mask plate strip 110 can be combined by a laser beam disposed below the reinforcing strip 114b.

[0177] Single-unit mask plate 120

[0178] Again, as Figures 17 to 20 shown, the single-unit mask plate 120 of the fourth embodiment can form a welding groove 125.

[0179] The single-unit mask plate 120 of the fourth embodiment has a thickness greater than that of the single-unit mask plate 120 of the first or third embodiment. That is, the single-unit mask plate 120 of the fourth embodiment has a thickness equal to or greater than a predetermined thickness, and even if the welding groove 125 is formed, it does not affect the durability of the single-unit mask plate 120.

[0180] The welding groove 125 can prevent a gap from being formed between the single-unit mask plate 120 and the TFT glass (not shown) due to the welding protrusion 126 formed by welding when the single-unit mask plate 120 and the structural mask plate strip 110 are combined. That is, the welding groove 125 can be in close contact with the single-unit mask plate 120 and the TFT glass (not shown) during the deposition process when welded by a laser beam irradiated from above, without forming a gap between the two. The welding groove 125 can form a step with a predetermined depth from the contact surface 124 with the TFT glass, which is one side of the single-unit mask plate 120.

[0181] Hereinafter, with reference to Figure 2 、 Figure 3 、 Figure 7 、 Figure 8 、 Figure 12 、 Figure 13 、 Figure 18 、 Figure 19 a method for manufacturing the hybrid mask plate strip 100 according to an embodiment of the present invention will be described.

[0182] Figure 21 is a flowchart showing a method for manufacturing a hybrid mask plate strip according to an embodiment of the present invention.

[0183] As Figure 21 shown, the method for manufacturing the hybrid mask plate strip 100 may include: a structural mask plate strip stretching step s10, a single-unit mask plate stretching step s20, a single-unit mask plate alignment step s30, and a single-unit mask plate fixing step s40.

[0184] In the structural mask plate strip stretching step s10, the structural mask plate strip 110 can be stretched in the first direction by using a clamping device (not shown). In a state where each stretching fixing portion 113 in the structural mask plate strip 110 is clamped by the clamping device (not shown), they are stretched in opposite directions to each other, and thus a tensile force can be applied to the structural mask plate strip 110.

[0185] In the single-unit mask stretching step S20, the single-unit mask 120 can be stretched in the first direction or the first direction and the second direction. In the single-unit mask stretching step S30, a single-unit mask fixture (not shown) can apply a stretching force to each single-unit mask 120. That is, in a state where the single-unit mask fixture (not shown) supports one side of the single-unit mask 120 in the vertical direction, the single-unit mask 120 can be stretched in the first direction or the first direction and the second direction.

[0186] In Figure 3 and Figure 8 、 Figure 13 、 Figure 19 it is exemplified that the single-unit mask 120 is stretched in the first direction in a state where the single-unit mask fixture (not shown) supports one side of the single-unit mask 120 in the vertical direction.

[0187] In the single-unit mask alignment step S30, in order to make the deposition region 121 of the single-unit mask 120 correspond to the opening 111 of the structural mask strip 110, the single-unit mask 120 is moved, and the position of the single-unit mask 120 can be aligned with the TFT position of the TFT glass (not shown).

[0188] More specifically, in the single-unit mask alignment step S30, in order to make the deposition region 121 correspond to the opening 111, the single-unit mask fixture (not shown) can move each single-unit mask 120. That is, in order to make it correspond to the opening 111 in a state where the single-unit mask fixture (not shown) applies a stretching force to support the single-unit mask 120, the first position alignment can be performed.

[0189] In the single-unit mask alignment step S30, in order to perform the second position alignment, the second position alignment can be performed using a camera (not shown). The camera (not shown) can be located below the hybrid mask strip 100. That is, using the camera (not shown), it can be confirmed whether the center of the position alignment hole 122 coincides with the center of the TFT position of the TFT glass (not shown), and whether the error range is within 1 μm. By finely adjusting the position of the single-unit mask fixture (not shown) in the first direction or the second direction, the single-unit mask 120 can be second-position aligned with the TFT position of the TFT glass (not shown).

[0190] In the monomer unit mask fixing step s40, the monomer unit mask 120 can be fixed to the mask strip 110 for the structure. The monomer unit mask jig (not shown) is moved in the Z-direction, and bonding can be performed after the second bonding region 123 is installed in the first bonding region 112. In this case, bonding can be performed by welding. While the monomer unit mask 120 is pressed against the mask strip 110 for the structure by the monomer unit mask jig (not shown), welding protrusions 115 or welding protrusions 126 are formed in the first bonding region 112 and the second bonding region 123 by a laser welding machine (not shown), and bonding can be performed.

[0191] That is, in the monomer unit mask alignment step s30, the position of the monomer unit mask 120 is aligned in the first direction or the first direction and the second direction; in the monomer unit mask fixing step s40, the position is aligned in the Z-direction, and thus the positions of the respective monomer unit masks 120 can be aligned.

[0192] As Figure 2 and Figure 3 、 Figure 12 and Figure 13 As shown, in the monomer unit mask fixing step s40 of the first or third embodiment, when the monomer unit mask 120 is bonded to the mask strip 110 for the structure by a laser beam irradiated from below, welding protrusions 115 can be formed to protrude from the lower surface of the mask strip 110 for the structure.

[0193] As Figure 7 and Figure 8 、 Figure 18 、 Figure 19 As shown, in the monomer unit mask fixing step s40 of the second or fourth embodiment, when the monomer unit mask 120 is bonded to the mask strip 110 for the structure by a laser beam irradiated from above, welding protrusions 126 can be formed to protrude from the base surface of the welding groove 125. At this time, the welding groove 125 forms a step of a predetermined depth from the contact surface 124 with the TFT glass in one surface of the monomer unit mask 120.

[0194] Hereinafter, the mask assembly 10 including the hybrid mask strip 100 will be described.

[0195] Figure 22 is a perspective view showing the manufacturing process of the mask assembly according to the first embodiment of the present invention; Figure 23 is Figure 22 the main sectional view of the B - B' part in Figure 24 is a perspective view showing the manufacturing process of the mask assembly according to the second embodiment of the present invention; Figure 25 is a perspective view showing the manufacturing process of the mask assembly according to the third embodiment of the present invention; Figure 26is a perspective view showing a manufacturing process of a mask plate component according to a fourth embodiment of the present invention; Figure 27 is Figure 26 a main cross-sectional view of the B-B' portion in Figure 28 is a perspective view showing a manufacturing process of a mask plate component according to a fifth embodiment of the present invention; Figure 29 is a perspective view showing a manufacturing process of a mask plate component according to a sixth embodiment of the present invention; Figure 30 is a perspective view showing a frame according to an embodiment of the present invention.

[0196] Mask plate component 10

[0197] Referring to Figures 22 to 29 , the mask plate component 10 can provide a deposition pattern so that a deposition material can be deposited at a specific position on a TFT glass (not shown) in a deposition process. The mask plate component 10 may include a frame 200 and a hybrid mask plate bar 100.

[0198] Frame 200

[0199] Referring to Figures 22 to 30 , a frame 200 according to an embodiment of the present invention can support the hybrid mask plate bar 100. The frame 200 may form an opening 210 at the center. In addition, the frame 200 may have a third bonding region 220. The frame 200 may be made of a metal material with high rigidity to prevent deformation due to a compressive force acting in the stretching direction of the hybrid mask plate bar 100. The frame 200 has a predetermined thickness and may have a quadrilateral shape.

[0200] Referring back to Figures 22 to 30 , the opening 210 can expose the hybrid mask plate bar 100 in the Z direction. The opening 210 may be a vertically penetrating shape. The opening 210 may form a region larger than each deposition region 121 in the first direction and the second direction to prevent interference of each deposition region 121 of each hybrid mask plate bar 100 in the Z direction. Accordingly, the opening 210 can be processed with low precision. For the convenience of manufacturing and processing, the opening 210 may have a quadrilateral shape.

[0201] Referring back to Figures 22 to 30 , the third bonding region 220 forms a shape surrounding the opening 210, supports one side of the hybrid mask plate bar 100, and can provide a bonding region with the hybrid mask plate bar 100. The bonding region of the hybrid mask plate bar may include a region that is in surface contact and bonded to both ends (i.e., the stretching fixing portions 113) of the hybrid mask plate bar 100 in the first direction. A plurality of support grooves can be formed in the third bonding region 220 in a second direction that intersects the bonding region of the hybrid mask plate bar. A pair of support grooves can be formed side by side in the first direction. The support grooves at both ends can accommodate the support portions 230.

[0202] Re-reference Figures 22 to 30 The support portion 230 supports the ribs of the hybrid reticle bar 100 and can prevent the sinking of the hybrid reticle bar 100. Further, the gaps between adjacent hybrid reticle bars 100 can be blocked.

[0203] The support portion 230 can support the edges of the respective ribs arranged side by side with the hybrid reticle bar 100. The support portion 230 can be interposed between the frame 200 and the hybrid reticle bar 100. The support portion 230 can be arranged in the first direction. One end and the other end of the support portion 230 can be inserted into the mutually facing support grooves. The height of the support portion 230 can be the same as the thickness forming the support grooves. Accordingly, the support portion 230 and the third bonding region 220 support the hybrid reticle bar 100 in the Z direction at the same height.

[0204] The support portion 230 can have a trapezoidal shape with a width that becomes wider in the Z+ direction so as not to interfere with the movement path of the substances sublimated in the deposition process.

[0205] Hybrid reticle bar 100

[0206] For the omitted descriptions, reference is made to the relevant descriptions of the hybrid reticle bar 100 of the first to fourth embodiments of the present invention described above. Figures 1 to 20 in the relevant descriptions of the hybrid reticle bar 100 of the first to fourth embodiments of the present invention described above.

[0207] In a state where a tensile force is applied to the hybrid reticle bar 100 in the first direction, the tensile fixing portion 113 can be fixed to the third bonding region 220. The hybrid reticle bar 100 can be fixed to the frame 200 through the tensile fixing portion 113 of the structural mask bar 110. The hybrid reticle bar 100 can be welded to the frame 200 by a laser beam of a laser welding machine (not shown) arranged in the Z direction above.

[0208] Hereinafter, the bonding structure between the frame 200 and the hybrid reticle bar 100 in the reticle assembly 10 will be described.

[0209] As Figure 22 、 Figure 23 、 Figure 26 and Figure 27 shown, in the reticle assemblies 10 of the first embodiment and the fourth embodiment of the present invention, the aligned hybrid reticle bars 100 can be fixed to the frame 200.

[0210] The hybrid reticle bar 100 can be manufactured by aligning the tensile single-unit mask 120 with the structural mask bar 110 and then fixing them.

[0211] The alignable hybrid mask bar 100 is further subjected to a tensile force on the stretching fixing part 113 by a clamping device (not shown) so that the deposition area 121 reaches the TFT position of the TFT glass (not shown). The aligned hybrid mask bar 100 is moved in the Z direction and can be installed in the third joint area 220 of the frame 200. The hybrid mask bar 100 can be welded and joined to the frame 200 by the laser beam of a laser welding machine (not shown) arranged in the upper part in the Z direction.

[0212] As Figure 24 and Figure 25 , Figure 28 , Figure 29 shown, for the mask assemblies 10 of the second, third, fifth, and sixth embodiments of the present invention, the mask bar 110 for the alignment structure of the frame 200 is fixed, and then the monomer unit mask 120 can be fixed while being aligned with the mask bar 110 for the structure. Figure 24 and Figure 28 Or Figure 25 and Figure 29 show the differences in the welding directions when the monomer unit mask 120 is joined to the mask bar 110 for the structure. For the mask assemblies 10 of the second and fifth embodiments of the present invention shown in Figure 24 and Figure 28 , the welding of the monomer unit mask 120 to the mask bar 110 for the structure is performed on the upper side; for the mask assemblies 10 of the third and sixth embodiments of the present invention shown in Figure 25 and Figure 29 , the welding of the monomer unit mask 120 to the mask bar 110 for the structure is performed on the lower side.

[0213] As Figure 24 and Figure 28 of the present invention, the manufacturing method of the mask assemblies 10 of the second and fifth embodiments is as follows.

[0214] The mask bar 110 for the structure can be aligned, and then a clamping device (not shown) applies a tensile force to the stretching fixing part 113 so that all the opening parts 111 of the mask bar 110 for the structure enter the opening part 210 of the frame 200. The aligned mask bar 110 for the structure is moved in the Z direction and can be installed in the third joint area 220 of the frame 200. The mask bar 110 for the structure can be welded and joined to the frame 200 by the laser beam of a laser welding machine (not shown) arranged in the upper part in the Z direction.

[0215] While a monomer unit mask clamp (not shown) supports one side of the monomer unit mask 120 in the vertical direction, a tensile force is applied in the first direction or the first direction and the second direction so that the deposition area 121 reaches the opening part 111 of the mask bar 110 for the structure.

[0216] By welding the first bonding region 112 of the mask strip 110 for laser welding structure, which is arranged in the Z direction at the upper part (not shown), and the second bonding region 123 of the single-unit mask 120 with a laser beam of a laser welding machine (not shown), the mask strip 110 for structure can be bonded to each single-unit mask 120. In this case, the welding protrusion 126 can be formed inside the welding groove 125 in the contact surface 124 with the TFT glass of the single-unit mask 120.

[0217] Figure 25 and Figure 29 The manufacturing method of the mask assembly 10 of the third embodiment and the sixth embodiment of the present invention shown is as follows.

[0218] The mask strip 110 for structure can be aligned, and then a clamping device (not shown) applies a tensile force to the stretching fixing part 113 so that all the opening parts 111 of the mask strip 110 for structure enter into the opening part 210 of the frame 200. The aligned mask strip 110 for structure can be moved in the Z direction and installed in the third bonding region 220 of the frame 200. The mask strip 110 for structure can be welded and bonded to the frame 200 with a laser beam of a laser welding machine (not shown) arranged in the Z direction at the upper part.

[0219] While a single-unit mask jig (not shown) supports one side of the single-unit mask 120 in the vertical direction, applying a tensile force in the first direction or the first direction and the second direction can make the deposition region 121 reach the opening part 111 of the mask strip 110 for structure.

[0220] By welding the first bonding region 112 of the mask strip 110 for structure and the second bonding region 123 of the single-unit mask 120 with a laser beam of a laser welding machine (not shown) arranged in the Z direction at the upper part, each single-unit mask 120 can be bonded to the mask strip 110 for structure. In this case, the welding protrusion 115 can be formed on the back of the bonding surface of the single-unit mask in the mask strip 110 for structure.

[0221] Another embodiment of the organic light-emitting display device 1 of the present invention manufactured by using the above-mentioned hybrid mask strip 100 is described as follows.

[0222] Figure 31 is a schematic cross-sectional view of the organic light-emitting display device 1 manufactured by using Figures 1 to 20 the hybrid mask strip.

[0223] Referring to Figure 31 , various components of the organic light-emitting display device 1 can be formed on the substrate S. In this case, the substrate S can also be the substrate itself or a cut part of the substrate.

[0224] Common layers such as the buffer layer 1100, the gate insulating film 1300, and the interlayer insulating film 1500 may be formed on the front surface of the substrate S. Further, a patterned semiconductor layer 1200 including a communication region 1210, a source electrode contact region 1220, and a source electrode contact region 1230 may also be formed. The gate electrode 1400, the source electrode 1600, and the drain electrode 1700, which are components of the thin film transistor TFT, may be formed together with such a patterned semiconductor layer 1200.

[0225] In addition, a protective film 1800 covering such a thin film transistor TFT and a planarization film 1900 located on the protective film 1800 and having a substantially flat upper surface may be formed on the front surface of the substrate S. An OLED may be disposed on such a planarization film 1900, and the OLED includes a patterned pixel electrode 2100, a counter electrode 2300, and an intermediate layer 2200. The counter electrode 2300 substantially corresponds to the front surface of the substrate S, and the intermediate layer 2200 has a multilayer structure and is interposed between the pixel electrode 2100 and the counter electrode 2300 and includes a light emitting layer. Of course, the intermediate layer 2200 is different from that shown. A part thereof may be a common layer substantially corresponding to the front surface of the substrate S, and another part of the layer may be a patterned layer corresponding to the pixel electrode 2100. The pixel electrode 2100 may be electrically connected to the thin film transistor TFT through a via hole. Of course, a pixel defining layer 2000 may be formed on the planarization film 1900 to substantially correspond to the front surface of the substrate S, and the pixel defining layer 2000 covers the edge of the pixel electrode 2100 and has an opening defining each pixel region.

[0226] In the case of the organic light emitting display device 1 described above, at least a part of each component may be formed by using the hybrid mask strip of the above embodiment or the manufacturing method of the hybrid mask strip.

[0227] The intermediate layer 2200 may be formed by using the hybrid mask strip of the above embodiment or the mask assembly. For example, the intermediate layer 2200 may include a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EML), an electron transport layer (ETL), an electron injection layer (EIL), etc., which may be formed by using the hybrid mask strip of the above embodiment or the manufacturing method of the hybrid mask strip.

[0228] The present invention has been described in detail using preferred embodiments, but the scope of the present invention is not limited to specific embodiments and should be construed by the claims. In addition, those skilled in the art should understand that various modifications and variations can be made without departing from the scope of the present invention.

Claims

1. A hybrid mask bar, comprising: A mask bar for structure, forming a plurality of openings in a first direction, having a first bonding region disposed along the periphery of the openings, and having ribs to separate the respective openings, and having stretching fixing parts disposed at both ends in the first direction to be independently disposed on a frame in a state where a stretching force is applied; And A monomer unit mask, having a deposition region and a second bonding region, the deposition region corresponding to the openings, the second bonding region being disposed along the periphery of the deposition region and bonding to the first bonding region; Wherein, each of the monomer unit masks is independently bonded to the upper surface of the mask bar for structure, By irradiating a laser beam from the lower part of the hybrid mask bar, a welding protrusion protruding from the lower surface of the mask bar for structure is formed, The lower surface of the mask bar for structure is the back surface of the bonding surface with the monomer unit mask, The mask bar for structure is further supported by a support part when disposed on the frame, the support part being inserted into a support groove formed in the frame, The mask bar for structure further includes a reinforcing bar, The reinforcing bar is disposed on the back surface of the bonding surface with the monomer unit mask, and further corrects the misalignment of the deposition region based on the TFT position of the TFT glass, The length of the reinforcing bar is equal to the interval between the support parts, and by being inserted between a plurality of support parts disposed in the support groove formed in the frame, the position deformation is minimized.

2. A hybrid mask bar, comprising: A mask bar for structure, forming a plurality of openings in a first direction, having a first bonding region disposed along the periphery of the openings, and having ribs to separate the respective openings, and having stretching fixing parts disposed at both ends in the first direction to be independently disposed on a frame in a state where a stretching force is applied; And A monomer unit mask, having a deposition region and a second bonding region, the deposition region corresponding to the openings, the second bonding region being disposed along the periphery of the deposition region and bonding to the first bonding region; Wherein, each of the monomer unit masks is independently bonded to the upper surface of the mask bar for structure, The upper surface of the monomer unit mask is the contact surface with the TFT glass, and a welding groove having a predetermined depth and a step is formed on the upper surface of the monomer unit mask, By irradiating a laser beam from the upper part of the hybrid mask bar, a welding protrusion is convexly formed on the base surface of the welding groove, The upper end of the welding protrusion is lower than the contact surface with the TFT glass, The mask bar for structure is further supported by a support part when disposed on the frame, the support part being inserted into a support groove formed in the frame, The mask bar for structure further includes a reinforcing bar, The reinforcing bar is disposed on the back surface of the bonding surface with the monomer unit mask, and further corrects the misalignment of the deposition region based on the TFT position of the TFT glass, The length of the reinforcing bar is equal to the interval between the support parts, and by being inserted between a plurality of support parts disposed in the support groove formed in the frame, the position deformation is minimized.

3. The hybrid reticle bar according to claim 1 or 2, wherein, a plurality of the reinforcing bars are provided and arranged side by side at intervals in the first direction.

4. The hybrid reticle bar according to claim 3, wherein, the reinforcing bar is constituted by a reinforcing wall in the vertical direction surrounding a welding point between the monomer unit reticle and the structural reticle bar.

5. The hybrid reticle bar according to claim 1 or 2, wherein, the monomer unit reticle has a coefficient of thermal expansion different from that of the structural reticle bar.

6. The hybrid reticle bar according to claim 1 or 2, wherein, the monomer unit reticle has a thickness different from that of the structural reticle bar.

7. The hybrid reticle bar according to claim 1 or 2, wherein, the deposition area includes position alignment holes through which deposition material passes; the position alignment holes align the position of the monomer unit reticle based on the TFT position of the TFT glass, and determine the welding position of the monomer unit reticle.

8. The hybrid reticle bar according to claim 1 or 2, wherein, the deposition area is subjected to hole processing by one of wet etching, electroforming gold plating, and laser processing.

9. A reticle assembly, comprising: a frame, forming an opening and having a third bonding area disposed along the periphery of the opening; and a plurality of hybrid reticle bars, both ends of which are fixed to the third bonding area in a state where a tensile force is applied in the first direction; wherein, the plurality of hybrid reticle bars are formed by using the hybrid reticle bar according to any one of claims 1 to 8.

10. The reticle assembly according to claim 9, further comprising: a support portion, which is disposed between the frame and the hybrid reticle bar in the first direction to support and fix the hybrid reticle bar, and block a gap between adjacent hybrid reticle bars.

11. An organic light emitting display device, comprising: a TFT glass; a plurality of thin film transistors disposed on the TFT glass; a plurality of pixel electrodes electrically connected to the thin film transistors; a deposition layer disposed on the pixel electrodes; and a counter electrode disposed on the deposition layer; wherein, at least one of the thin film transistors, the pixel electrodes, the deposition layer, and the counter electrode is formed by using the hybrid reticle bar according to any one of claims 1 to 8.

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