A zero wastewater dual-power semiconductor-specific steel mesh cleaning equipment

By combining spray and ultrasonic cleaning dual power and traceability systems in semiconductor steel mesh cleaning equipment, the problems of poor cleaning effect and water consumption of existing equipment are solved, efficient and environmentally friendly steel mesh cleaning is achieved, and resource consumption is reduced. Easy to manage process parameters.

CN113976521BActive Publication Date: 2025-01-17SUZHOU ENSTAI METAL TECH CO LTD
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Patent Information

Application Number
CN202111431167.X
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2021-11-29
Publication Date
2025-01-17
Estimated Expiration
2041-11-29

AI Technical Summary

Technical Problem

The existing semiconductor steel mesh cleaning equipment has poor cleaning effect, water consuming and cannot trace the process parameters, which affects the service life of the steel mesh.

Method used

A special steel mesh cleaning equipment for zero wastewater dual power semiconductors is designed, combining spray cleaning and ultrasonic cleaning dual power, equipped with lifting mechanism, drying mechanism, liquid return mechanism, rinsing mechanism and traceability system to achieve rapid switching and efficient cleaning. Avoid damage to the steel mesh through the guide wheel.

Benefits of technology

It improves the cleaning effect, saves water resources, optimizes the environment, and facilitates parameter management through a traceability system, improving process analysis and economic benefits.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present invention relates to a zero-wastewater dual-power semiconductor-specific steel mesh cleaning equipment. The technical solution adopted is: a semiconductor-specific steel mesh cleaning equipment, including a casing, a box body, a spray cleaning mechanism, an ultrasonic cleaning mechanism, a steel mesh fixing bracket, a lifting mechanism, a drying mechanism, a liquid return mechanism and a rinsing mechanism. The present invention also discloses a cleaning liquid used in the above-mentioned cleaning equipment, which is prepared by mixing 70-90% deionized water and 10-30% alcohol ether organic solvent. The advantages of the present invention are: combining spray cleaning and ultrasonic cleaning dual power, when spray cleaning is required, the spray cleaning operation can be completed by turning on the spray mechanism and then cooperating with the lifting mechanism, and when ultrasonic cleaning is required, the lifting mechanism will cooperate with the ultrasonic cleaning mechanism to complete the ultrasonic cleaning work. The switching between spray cleaning and ultrasonic cleaning can be completed quickly and effectively, and at the same time, the compatibility problem of spray cleaning and ultrasonic cleaning dual power is well solved.
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Description

Technical Field

[0001] The present invention relates to a semiconductor-specific steel mesh cleaning device, in particular to a zero-wastewater dual-power semiconductor-specific steel mesh cleaning device. Background Art

[0002] Semiconductor steel mesh is mainly used in flux printing and ball planting before ball planting. During cleaning, the "flux printing steel mesh" before ball planting mainly cleans the flux residue, and the "ball planting steel mesh" mainly cleans the tin balls in the residual mesh holes. The existing semiconductor steel mesh cleaning equipment can only spray cleaning or ultrasonic cleaning, and the cleaning method is single; the existing semiconductor steel mesh cleaning equipment uses different liquids for cleaning and rinsing, and rinsing generally uses water, which will generate a lot of waste water; the existing semiconductor cleaning equipment will leave scars on the steel mesh surface after cleaning, and the cleaning effect is poor, which affects the use of the steel mesh; in addition, the existing cleaning equipment cannot be traced in the process parameters after cleaning the steel mesh. Therefore, a new technical solution should be provided to solve the above problems. Summary of the invention

[0003] The purpose of the present invention is to provide a zero-wastewater dual-power semiconductor special steel mesh cleaning equipment with good cleaning effect, high working efficiency, cost saving and environmental optimization in view of the shortcomings of the prior art.

[0004] To achieve the above object, the present invention provides the following technical solutions:

[0005] A zero-wastewater dual-power semiconductor special steel mesh cleaning equipment, comprising a casing, a box body, a spray cleaning mechanism arranged inside the casing, an ultrasonic cleaning mechanism, a steel mesh fixing bracket, a lifting mechanism, a drying mechanism, a liquid return mechanism and a rinsing mechanism,

[0006] The spray cleaning mechanism includes a spray cleaning chamber arranged at the upper part of the box body, a spray pipe horizontally fixed on both sides of the lower part of the spray cleaning chamber, a cleaning liquid tank arranged inside the casing for placing cleaning liquid, a cleaning liquid filter and a cleaning pump, the liquid inlet pipe of the cleaning pump is connected to the cleaning liquid tank, the liquid outlet pipe of the cleaning pump is connected to the liquid inlet pipe of the cleaning liquid filter, the liquid outlet pipe of the cleaning liquid filter is connected to the spray pipe, and a plurality of spray heads with adjustable angles are arranged at intervals on the spray pipe;

[0007] The ultrasonic cleaning mechanism includes an ultrasonic cleaning chamber arranged at the lower part of the box body and connected to the spray cleaning chamber, an ultrasonic generator, a plurality of ultrasonic transducers are installed on the transducer vibration plate at equal intervals, and the transducer vibration plate and the ultrasonic generator are fixedly installed on the corresponding cavity wall of the ultrasonic cleaning chamber.

[0008] The lifting mechanism is a screw slider type lifting mechanism, which is vertically installed on the inner side plate of the box body, and the steel mesh fixing bracket is installed and fixed on the slider of the lifting mechanism, and the lifting mechanism can drive the steel mesh fixing bracket to move up and down in the spray cleaning chamber and the ultrasonic cleaning chamber; the steel mesh fixing bracket includes a vertical fixing column, on which a first fixing block, a second fixing block and a third fixing block are arranged in sequence from top to bottom, the first fixing block and the third fixing block are respectively arranged at the upper end and the lower end of the vertical fixing column, and the first fixing block and the third fixing block are fixedly connected to the vertical fixing column, the second fixing block is arranged on the vertical fixing column between the first fixing block and the third fixing block, the second fixing block is movably connected to the vertical fixing column, and guide support frames are respectively provided on the sides of the second fixing block and the third fixing block, the guide support frames include two horizontal guide support frames and two inclined guide support frames, the two horizontal guide support frames are parallel and spaced apart and arranged on the outsides of the two inclined guide support frames, and the ends of the two inclined guide support frames are respectively fixedly connected to the ends of the horizontal guide support frames at corresponding positions;

[0009] The drying mechanism includes a hot air blower arranged inside the housing and two strip-shaped air knives horizontally fixed on the two side walls of the lower part of the spray cleaning chamber, and the air outlet pipe of the hot air blower is connected to the air inlet of the strip-shaped air knife;

[0010] The liquid return mechanism comprises a liquid return pump, the liquid inlet pipe of the liquid return pump is connected to the ultrasonic cleaning chamber, and the liquid outlet pipe of the liquid return pump is connected to the cleaning liquid tank;

[0011] The rinsing mechanism includes a rinsing liquid tank, a rinsing liquid filter and a rinsing pump arranged inside the casing for placing rinsing liquid, the liquid inlet pipe of the rinsing pump is connected to the rinsing liquid tank, the liquid outlet pipe of the rinsing pump is connected to the liquid inlet pipe of the rinsing liquid filter, and the liquid outlet pipe of the rinsing liquid filter is connected to the spray pipe.

[0012] Further technical solutions:

[0013] The zero-wastewater dual-power semiconductor-specific steel mesh cleaning equipment of the present invention also includes a control system and a traceability system. The control system includes an operation interface, a power control module, a pneumatic control module, a data processing module and an expansion module; the traceability system includes an information acquisition module, a data processing module, a coding module, a steel mesh number login module, an information query module, and a traceability storage / extraction module.

[0014] Preferably,

[0015] A plurality of horizontal guide wheels are arranged at intervals on the two horizontal guide support frames, and the horizontal guide wheels are fixed on each horizontal guide support frame through a fixing column.

[0016] A vertical guide wheel is arranged between the two horizontal guide support frames, and the vertical guide wheel is fixed between the two horizontal guide support frames through a fixing column.

[0017] The present invention provides a zero-wastewater dual-power semiconductor-specific steel mesh cleaning device, which has the following advantages over the prior art:

[0018] The invention provides a zero wastewater dual-power semiconductor-specific steel mesh cleaning equipment, which combines spray cleaning and ultrasonic cleaning dual power. When spray cleaning is required, the spray mechanism is turned on and the lifting mechanism is used to complete the spray cleaning operation. When ultrasonic cleaning is required, the lifting mechanism moves the steel mesh to the bottom and then cooperates with the ultrasonic cleaning mechanism to complete the ultrasonic cleaning work. The switch between spray cleaning and ultrasonic cleaning can be completed quickly and effectively, and the compatibility problem of spray cleaning and ultrasonic cleaning dual power is well solved.

[0019] The present invention provides a zero-wastewater dual-power semiconductor-specific steel mesh cleaning equipment, which is equipped with a traceability system. Workers can easily find the cleaning parameters of each product, facilitate process and data analysis, and provide convenience for product research and development.

[0020] 3. The present invention provides a steel mesh fixing bracket for a zero wastewater dual-power semiconductor special steel mesh cleaning equipment. Since horizontal guide wheels and vertical guide wheels are respectively provided on the horizontal guide support frame, when the steel mesh is placed, the guide wheels are installed to guide and control the direction of the steel mesh entering and exiting, and the steel mesh surface will not contact any part of the bracket, thereby avoiding damage to the steel mesh, which is beneficial to reducing the enterprise's resource consumption and improving the enterprise's economic benefits. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0022] Figure 1 It is a schematic diagram of the external structure of the present invention.

[0023] Figure 2 for Figure 1 Schematic diagram of the rear view structure with the casing removed.

[0024] Figure 3 for Figure 1 Schematic diagram of the side view structure with the casing removed.

[0025] Figure 4 for Figure 1Schematic diagram of the front structure with the casing removed.

[0026] Figure 5 This is a schematic diagram of the front structure of the spray cleaning chamber.

[0027] Figure 6 It is a schematic diagram of the installation structure of the steel mesh fixing bracket and the lifting mechanism.

[0028] Figure 7 This is a schematic diagram of the steel mesh fixing bracket structure.

[0029] Figure 8 for Figure 5 A magnified view of the structure at A.

[0030] In the above figures: 1, housing, 2, box, 3, spray cleaning mechanism, 3-1, spray cleaning chamber, 3-2, cleaning liquid tank, 3-3, cleaning liquid filter, 3-4, cleaning pump, 3-5, spray head, 3-6, spray pipe, 4, ultrasonic cleaning mechanism, 4-1, ultrasonic cleaning chamber, 4-2, ultrasonic generator, 4-3, ultrasonic transducer, 4-4, transducer vibration plate, 5, steel mesh fixing bracket, 5-1, vertical fixing column, 5-2, first fixing block, 5 -3, second fixed block, 5-4, third fixed block, 5-5, guide support frame, 5-51, horizontal guide support frame, 5-52, inclined guide support frame, 5-6, horizontal guide wheel, 5-7, vertical guide wheel, 5-8, fixed column, 6, lifting mechanism, 7, drying mechanism, 7-1, hot air blower, 7-2, strip air knife, 8, liquid return mechanism, 8-1, liquid return pump, 9, rinsing mechanism, 9-1, rinsing liquid tank, 9-2, rinsing liquid filter, 9-3, rinsing pump. DETAILED DESCRIPTION

[0031] To make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be described in detail below. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other implementation methods obtained by ordinary technicians in this field without creative work belong to the scope of protection of the present invention.

[0032] As the first embodiment of the present invention, the present invention is a zero-wastewater dual-power semiconductor special steel mesh cleaning equipment, including a casing 1, a box body 2, a spray cleaning mechanism 3 arranged inside the casing 1, an ultrasonic cleaning mechanism 4, a steel mesh fixing bracket 5, a lifting mechanism 6, a drying mechanism 7, a liquid return mechanism 8 and a rinsing mechanism 9. A movable observation window is provided on the upper front side of the casing 1, and movable inspection doors are provided on the side and lower part of the shell. In this embodiment, the spray cleaning mechanism 3 includes a spray cleaning chamber 3-1 arranged on the upper part of the box body 2, a spray pipe 3-6 horizontally fixed on both sides of the lower part of the spray cleaning chamber, a cleaning liquid tank 3-2 for placing cleaning liquid arranged inside the casing 1, and a cleaning liquid filter 3-3 and And a cleaning pump 3-4, the liquid inlet pipe of the cleaning pump 3-4 is connected to the cleaning liquid tank 3-2, the liquid outlet pipe of the cleaning pump 3-4 is connected to the liquid inlet pipe of the cleaning liquid filter 3-3, the liquid outlet pipe of the cleaning liquid filter is connected to the spray pipe 3-6, and a plurality of spray heads 3-5 with adjustable angles are arranged at intervals on the spray pipe; the rinsing mechanism 9 includes a rinsing liquid tank 9-1 for placing rinsing liquid, a rinsing liquid filter 9-2 and a rinsing pump 9-3 arranged inside the casing 1, the liquid inlet pipe of the rinsing pump 9-3 is connected to the rinsing liquid tank 9-1, the liquid outlet pipe of the rinsing pump 9-3 is connected to the liquid inlet pipe of the rinsing liquid filter 9-2, and the liquid outlet pipe of the rinsing liquid filter 9-2 is connected to the spray pipe 3-6. Figure 2 As shown, the cleaning liquid tank 3-2 and the rinsing liquid tank 9-1 are arranged side by side at the bottom of the shell, and an automatic liquid replenishing barrel is provided thereon for replenishing the cleaning liquid and the rinsing liquid. The cleaning liquid inside the cleaning liquid tank 3-2 is pumped into the cleaning liquid filter 3-3 through the cleaning pump 3-4 for filtration, and then enters the spray pipe 3-6 on both sides of the lower part of the spray cleaning chamber for cleaning the steel mesh; the rinsing liquid inside the rinsing liquid tank 9-1 is pumped into the rinsing liquid filter 9-2 through the rinsing pump 9-3 for filtration, and then enters the spray pipe 3-6 on both sides of the lower part of the spray cleaning chamber for rinsing the steel mesh.

[0033] The ultrasonic cleaning mechanism 4 includes an ultrasonic cleaning chamber 4-1 and an ultrasonic generator 4-2, which are arranged at the lower part of the box body 2 and connected to the spray cleaning chamber 3-1. A plurality of ultrasonic transducers 4-3 are installed on the transducer vibration plate 4-4 at equal intervals. The transducer vibration plate 4-4 and the ultrasonic generator 4-2 are fixedly installed on the corresponding cavity walls of the ultrasonic cleaning chamber 4-1. When ultrasonic cleaning is performed, the cleaning liquid in the cleaning liquid tank 3-2 is pumped into the ultrasonic cleaning chamber 4-1 through the return liquid pump 8-1. The ultrasonic transducer drives the transducer vibration plate to vibrate at a high frequency, and then drives the cleaning liquid to vibrate at a high frequency, and contacts with the solder paste or other contaminants on the surface of the steel mesh, thereby completing the cleaning of the steel mesh.

[0034] As can be seen from the above, this special steel mesh cleaning equipment includes a dual power system of spray cleaning and ultrasonic cleaning. When spray cleaning is required, the spray device is turned on, and the spray cleaning operation can be completed in conjunction with the control of the lifting mechanism. When ultrasonic cleaning is required, the lifting mechanism 6 moves the steel mesh to the bottom and then cooperates with the ultrasonic cleaning system to complete the ultrasonic cleaning work. The switch between spray cleaning and ultrasonic cleaning can be completed quickly and effectively, and the compatibility problem of the dual power of spray cleaning and ultrasonic cleaning is well solved.

[0035] The lifting mechanism 6 is a screw slider type lifting mechanism, which is vertically installed on the inner panel of the box body 2, and the steel mesh fixing bracket 5 is fixed on the slider of the lifting mechanism 6. The lifting mechanism 6 can drive the steel mesh fixing bracket 5 to move up and down in the spray cleaning chamber 3-1 and the ultrasonic cleaning chamber 4-1. In this embodiment, the lifting mechanism mainly includes a driving motor, a screw, a slider, a transmission gear, etc. Since it is an existing mechanism and its specific structure is not within the scope of patent protection required by the present invention, it is not described in detail. It is only necessary to know that the lifting mechanism 6 can drive the steel mesh fixing bracket 5 installed thereon to move up and down inside the box body. In this embodiment, the steel mesh fixing bracket 5 includes a vertical fixing column 5-1, on which a first fixing block 5-2, a second fixing block 5-3 and a third fixing block 5-4 are arranged in sequence from top to bottom. The first fixing block 5-2 and the third fixing block 5-4 are respectively arranged at the upper end and the lower end of the vertical fixing column 5-1, and the first fixing block 5-2 and the third fixing block 5-4 are fixedly connected to the vertical fixing column 5-1. The second fixing block 5-3 is arranged on the vertical fixing column 5-1 between the first fixing block 5-2 and the third fixing block 5-4, and the second fixing block 5-3 is fixed to the vertical fixing column 5 -1 movable connection, guide support frames 5-5 are respectively provided on the sides of the second fixed block 5-3 and the third fixed block 5-4, and the guide support frames 5-5 include two horizontal guide support frames 5-51 and two inclined guide support frames 5-52, the two horizontal guide support frames 5-51 are parallel and spaced apart on the outsides of the two inclined guide support frames 5-52, and the ends of the two inclined guide support frames 5-52 are respectively fixedly connected with the ends of the horizontal guide support frames 5-51 at the corresponding positions; the steel mesh fixing bracket 5 is mainly used to fix the steel mesh and prevent the steel mesh from being damaged during the cleaning process.

[0036] The drying mechanism 7 includes a hot air blower 7-1 disposed inside the housing and two strip-shaped air knives 7-2 horizontally fixed on the two side walls of the lower part of the spray cleaning chamber. The air outlet pipe of the hot air blower 7-1 is connected to the air inlet of the strip-shaped air knife 7-2. In this embodiment, the drying mechanism 7 cooperates with the lifting mechanism 6 to dry the cleaning liquid on the steel mesh;

[0037] The liquid return mechanism 8 includes a liquid return pump 8-1, the liquid inlet pipe of the liquid return pump 8-1 is connected to the ultrasonic cleaning chamber 4-1, and the liquid outlet pipe of the liquid return pump 8-1 is connected to the cleaning liquid tank 3-2. In this embodiment, the liquid return pump 8-1 is used to pump the cleaning liquid inside the cleaning liquid tank 3-2 into the ultrasonic cleaning chamber 4-1 on the one hand, and is used to filter the used cleaning liquid in the ultrasonic cleaning chamber 4-1 and pump it into the cleaning liquid tank 3-2 on the other hand.

[0038] Preferably, as the second embodiment of the present invention, this embodiment is a further improvement of the first embodiment. A zero wastewater dual-power semiconductor special steel mesh cleaning equipment of the present invention also includes a control system and a traceability system. The control system includes an operation interface, a power control module, a pneumatic control module, a data processing module, and an expansion module; the traceability system includes an information acquisition module, a data processing module, a coding module, a steel mesh number login module, an information query module, and a traceability storage / extraction module. In this embodiment, due to the addition of a traceability system, the staff can easily find each product cleaning parameter, which is convenient for process and data analysis and provides convenience for product research and development.

[0039] Preferably, as the third embodiment of the present invention, this embodiment is a further improvement on the first embodiment, and a plurality of horizontal guide wheels 5-6 are arranged at intervals on the two horizontal guide support frames 5-51, and the horizontal guide wheels 5-6 are fixed to each horizontal guide support frame 5-51 through a fixing column 5-8. A vertical guide wheel 5-7 is arranged between the two horizontal guide support frames 5-51, and the vertical guide wheel 5-7 is fixed between the two horizontal guide support frames 5-51 through a fixing column 5-8. In this embodiment, when the steel mesh is placed on the steel mesh fixing bracket, due to the arrangement of the horizontal guide wheels 5-6 and the vertical guide wheels 5-7, the direction of the steel mesh in and out can be guided and controlled, and the steel mesh surface will not contact any part of the bracket, thereby avoiding damage to the steel mesh, which is beneficial to reducing the resource consumption of the enterprise and improving the economic benefits of the enterprise.

[0040] The zero-wastewater dual-power semiconductor-specific steel mesh cleaning equipment of the present invention has the following cleaning process when cleaning the steel mesh:

[0041] The following is a general process, which can be adjusted (add steps or adjust the order)

[0042] 1) Pre-cleaning: The system controls the cleaning liquid in the cleaning liquid tank to spray and clean the steel mesh through the spray cleaning mechanism and the lifting mechanism.

[0043] 2) Ultrasonic cleaning: The system controls the lifting mechanism, and the cleaning liquid in the cleaning liquid tank is supplied to the ultrasonic cleaning chamber to perform ultrasonic cleaning on the steel mesh.

[0044] 3) Spray cleaning: The system controls the cleaning liquid in the cleaning liquid tank to spray clean the steel mesh through the spray cleaning mechanism and lifting mechanism.

[0045] 4) Drainage: The system controls the drying mechanism and the lifting mechanism to blow dry the cleaning liquid on the steel mesh after spray cleaning.

[0046] 5) Spray rinsing: The system controls the rinsing liquid in the rinsing liquid tank to spray and rinse the steel mesh through the spray cleaning mechanism and lifting mechanism.

[0047] 6) Drying: The system controls the drying mechanism and lifting mechanism to blow dry the cleaning liquid on the steel mesh after spray rinsing.

[0048] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. A zero wastewater dual-power semiconductor special steel mesh cleaning equipment, characterized by: The invention comprises a casing (1), a box body (2), a spray cleaning mechanism (3) arranged inside the casing (1), an ultrasonic cleaning mechanism (4), a steel mesh fixing bracket (5), a lifting mechanism (6), a drying mechanism (7), a liquid return mechanism (8) and a rinsing mechanism (9), The spray cleaning mechanism (3) comprises a spray cleaning chamber (3-1) arranged at the upper part of the housing (2), a spray pipe (3-6) fixed horizontally on both sides of the lower part of the spray cleaning chamber, a cleaning liquid tank (3-2) arranged inside the housing (1) for storing cleaning liquid, a cleaning liquid filter (3-3) and a cleaning pump (3-4), wherein the liquid inlet pipe of the cleaning pump (3-4) is connected to the cleaning liquid tank (3-2), the liquid outlet pipe of the cleaning pump (3-4) is connected to the liquid inlet pipe of the cleaning liquid filter (3-3), the liquid outlet pipe of the cleaning liquid filter (3-3) is connected to the spray pipe (3-6), and a plurality of spray heads (3-5) with adjustable angles are arranged at intervals on the spray pipe; The ultrasonic cleaning mechanism (4) comprises an ultrasonic cleaning chamber (4-1) arranged at the lower part of the box body (2) and connected to the spray cleaning chamber (3-1), an ultrasonic generator (4-2), a plurality of ultrasonic transducers (4-3) mounted at equal intervals on a transducer vibration plate (4-4), and the transducer vibration plate (4-4) and the ultrasonic generator (4-2) are fixedly mounted on corresponding cavity walls of the ultrasonic cleaning chamber (4-1). The lifting mechanism (6) is a screw slider type lifting mechanism, which is vertically mounted on the inner side plate of the box body (2); the steel mesh fixing bracket (5) is mounted and fixed on the slider of the lifting mechanism (6); the lifting mechanism (6) can drive the steel mesh fixing bracket (5) to move up and down in the spray cleaning chamber (3-1) and the ultrasonic cleaning chamber (4-1); the steel mesh fixing bracket (5) comprises a vertical fixing column (5-1), on which a first fixing block (5-2), a second fixing block (5-3) and a third fixing block (5-4) are arranged in sequence from top to bottom; the first fixing block (5-2) and the third fixing block (5-4) are respectively arranged at the upper end and the lower end of the vertical fixing column (5-1), and the first fixing block (5-2) and the third fixing block (5-4) are connected to the vertical fixing column (5-1) ), the second fixing block (5-3) is arranged on a vertical fixing column (5-1) between the first fixing block (5-2) and the third fixing block (5-4), the second fixing block (5-3) is movably connected to the vertical fixing column (5-1), and guide support frames (5-5) are respectively arranged on the sides of the second fixing block (5-3) and the third fixing block (5-4), the guide support frames (5-5) include two horizontal guide support frames (5-51) and two inclined guide support frames (5-52), the two horizontal guide support frames (5-51) are arranged in parallel and at intervals on the outsides of the two inclined guide support frames (5-52), and the ends of the two inclined guide support frames (5-52) are respectively fixedly connected to the ends of the horizontal guide support frames (5-51) at corresponding positions; The drying mechanism (7) comprises a hot air blower (7-1) arranged inside the housing and two strip-shaped air knives (7-2) horizontally fixed on two side walls of the lower part of the spray cleaning chamber, and the air outlet pipe of the hot air blower (7-1) is connected to the air inlet of the strip-shaped air knives (7-2); The liquid return mechanism (8) comprises a liquid return pump (8-1), the liquid inlet pipe of the liquid return pump (8-1) being connected to the ultrasonic cleaning chamber (4-1), and the liquid outlet pipe of the liquid return pump (8-1) being connected to the cleaning liquid tank (3-2); The rinsing mechanism (9) comprises a rinsing liquid tank (9-1) for storing rinsing liquid, a rinsing liquid filter (9-2) and a rinsing pump (9-3) arranged inside the housing (1); a liquid inlet pipe of the rinsing pump (9-3) is connected to the rinsing liquid tank (9-1); a liquid outlet pipe of the rinsing pump (9-3) is connected to a liquid inlet pipe of the rinsing liquid filter (9-2); and a liquid outlet pipe of the rinsing liquid filter (9-2) is connected to a spray pipe (3-6).

2. According to claim 1, a zero wastewater dual-power semiconductor special steel mesh cleaning equipment is characterized by: It also includes a control system, which includes an operation interface, a power control module, a pneumatic control module, a data processing module and an expansion module.

3. According to claim 1, a zero wastewater dual-power semiconductor special steel mesh cleaning equipment is characterized by: A plurality of horizontal guide wheels (5-6) are arranged at intervals on the two horizontal guide support frames (5-51); the horizontal guide wheels (5-6) are fixed to each horizontal guide support frame (5-51) via a fixing column (5-8).

4. According to claim 2, a zero wastewater dual-power semiconductor special steel mesh cleaning equipment is characterized by: It also includes a traceability system, which includes an information collection module, a data processing module, a coding module, a steel mesh number login module, an information query module, and a traceability storage / extraction module.

5. According to claim 3, a zero wastewater dual-power semiconductor special steel mesh cleaning equipment is characterized by: A vertical guide wheel (5-7) is provided between the two horizontal guide support frames (5-51), and the vertical guide wheel (5-7) is fixed between the two horizontal guide support frames (5-51) via a fixing column (5-8).

Citation Information

Patent Citations

  • Water-based environment-friendly neutral cleaning solution

    CN110724604A

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    CN216323707U