Display substrate and display device

Abstract

The application discloses a display substrate and a display device. The display substrate comprises a substrate, the substrate has a display area, a punching area and a critical area arranged between the display area and the punching area. In a direction from the punching area to the display area, the critical area comprises a first isolation column area and a barrier wall arranged in sequence. The first isolation column area has at least one first isolation column. The first isolation column comprises a metal layer, and a sidewall of the metal layer on a side facing the punching area is at least partially covered by an insulating layer. Thus, the display effect is improved by reducing the occurrence of black spot defects in the display area through the arrangement of the insulating layer.

Description

Technical Field

[0001] This invention relates to the field of displays, and more specifically, to display substrates and display devices. Background Technology

[0002] As people increasingly demand higher screen-to-body ratios for electronic devices, current smart terminal products are developing towards full-screen display technology. Making openings in the display area to allow light to pass through for functional components such as cameras and fingerprint recognition is currently the mainstream trend in full-screen display technology. However, existing punch-hole screen electronic devices are prone to exhibiting black spots or defects in the display area around the punch-hole during product reliability testing, failing to meet user requirements.

[0003] Therefore, current display substrates and display devices still need improvement. Summary of the Invention

[0004] The present invention aims to at least alleviate or resolve at least one of the aforementioned problems to some extent.

[0005] In one aspect of the present invention, a display substrate is provided, comprising: a substrate having a display area, a perforated area, and a critical region disposed between the display area and the perforated area. In a direction from the perforated area toward the display area, the critical region includes a first isolation pillar area and a barrier wall arranged sequentially. The first isolation pillar area has at least one first isolation pillar, and the first isolation pillar includes a metal layer. The sidewall of the metal layer facing the perforated area is at least partially covered by an insulating layer. Therefore, the insulating layer reduces the occurrence of black spots in the display area, improving the display effect.

[0006] According to an embodiment of the present invention, the metal layer includes a first metal layer and a second metal layer stacked sequentially, wherein the thickness of the first metal layer is less than the thickness of the second metal layer, and the sidewall of the first metal layer facing the perforated area is at least partially covered by the insulating layer. This further improves the insulation effect of the insulating layer.

[0007] According to an embodiment of the present invention, the first isolation pillar area includes a plurality of first isolation pillars, wherein the sidewall of the first metal layer of the plurality of first isolation pillars facing the perforated area is covered by the insulating layer, and the insulating layer covers at least a portion of the sidewall of the first metal layer of the first isolation pillar facing the perforated area and the top surface connected to the sidewall. This further improves the insulation effect of the insulating layer.

[0008] According to an embodiment of the present invention, the first isolation pillar region has at least one first isolation pillar having a sidewall of the first metal layer that is not covered by the insulating layer facing the display area. This further improves the insulation effect of the insulating layer.

[0009] According to an embodiment of the present invention, in the direction from the perforated area to the display area, the critical region further includes a second isolation pillar area. The second isolation pillar area is located on the side of the barrier wall away from the first isolation pillar area. The second isolation pillar area includes at least one first isolation pillar, and the sidewall of the first metal layer of the first isolation pillar facing the perforated area is at least partially covered by the insulating layer. This further improves the insulation effect of the insulating layer.

[0010] According to an embodiment of the present invention, the second isolation pillar region includes a plurality of first isolation pillars, wherein the sidewall of the first metal layer of the plurality of first isolation pillars facing the perforated area is covered by the insulating layer, and the insulating layer covers at least a portion of the sidewall of the first metal layer facing the perforated area and the top surface connected to the sidewall. This further improves the insulation effect of the insulating layer.

[0011] According to an embodiment of the present invention, the second isolation pillar region has at least one of the first isolation pillars, which has a sidewall of the first metal layer not covered by the insulating layer facing the display area. This further improves the insulation effect of the insulating layer.

[0012] According to an embodiment of the present invention, the first metal layer of the first insulating post includes a first titanium metal layer, a first aluminum metal layer, and a second titanium metal layer stacked sequentially; the second metal layer of the first insulating post includes a third titanium metal layer, a second aluminum metal layer, and a fourth titanium metal layer stacked sequentially. The area of ​​the contact surface between the first aluminum metal layer and the first titanium metal layer is not less than the area of ​​the contact surface between the first aluminum metal layer and the second titanium metal layer; the area of ​​the contact surface between the second aluminum metal layer and the third titanium metal layer is not less than the area of ​​the contact surface between the second aluminum metal layer and the fourth titanium metal layer. This further improves the insulation effect of the insulating layer.

[0013] According to an embodiment of the present invention, a first source / drain metal layer, a passivation layer, and a second source / drain metal layer are sequentially stacked within the display area of ​​the substrate. The first metal layer of the first isolation pillar is formed from the first source / drain metal layer, the second metal layer of the first isolation pillar is formed from the second source / drain metal layer, and the insulating layer is formed from the passivation layer. This further improves the insulation effect of the insulating layer.

[0014] According to an embodiment of the present invention, the first isolation pillar region includes at least one second isolation pillar, and the second isolation pillar includes the second metal layer. This simplifies the substrate fabrication process.

[0015] According to an embodiment of the present invention, the second isolation pillar region includes at least one second isolation pillar, and the second isolation pillar includes the second metal layer. This simplifies the substrate fabrication process.

[0016] According to an embodiment of the present invention, the second metal layer of the second insulating post includes a third titanium metal layer, a second aluminum metal layer, and a fourth titanium metal layer stacked sequentially, wherein the area of ​​the contact surface between the second aluminum metal layer and the third titanium metal layer is not less than the area of ​​the contact surface between the second aluminum metal layer and the fourth titanium metal layer. This further improves the insulation effect of the insulating layer.

[0017] According to an embodiment of the present invention, a second source / drain metal layer is disposed in the display area of ​​the substrate, and the second metal layer of the second isolation pillar is formed by the second source / drain metal layer. This simplifies the substrate fabrication process.

[0018] In another aspect, the present invention provides a display device comprising the aforementioned display substrate. Thus, the display device possesses all the features and advantages of the aforementioned display substrate, which will not be repeated here. Attached Figure Description

[0019] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0020] Figure 1 A schematic diagram of the structure of a display substrate according to an embodiment of the present invention is shown;

[0021] Figure 2 A top view of a display substrate according to an embodiment of the present invention is shown;

[0022] Figure 3 A schematic diagram of a display substrate according to a comparative example is shown;

[0023] Figure 4 A schematic diagram of the structure of a display substrate according to yet another embodiment of the present invention is shown;

[0024] Figure 5 Showing Figure 7 A magnified view of the structure within the dashed box;

[0025] Figure 6 This shows a schematic diagram of the structure of a display substrate according to yet another embodiment of the present invention;

[0026] Figure 7 This shows a schematic diagram of the structure of a display substrate according to yet another embodiment of the present invention;

[0027] Figure 8 This shows a schematic diagram of the structure of a display substrate according to yet another embodiment of the present invention;

[0028] Figure 9 A schematic diagram of a GDSH black spot on a comparative display panel according to the present invention is shown.

[0029] Explanation of reference numerals in the attached figures:

[0030] 1: Display area; 2: Drilled area; 3: Critical region; 100: Substrate; 210: Barrier buffer layer; 220: First gate insulating layer; 221: First gate metal layer; 230: Second gate insulating layer; 231: Second gate metal layer; 240: Interlayer dielectric layer; 250: Gate insulating layer; 311: First titanium metal layer; 312: Second titanium metal layer; 313: Third titanium metal layer; 314: Fourth titanium metal layer; 321: First aluminum metal layer; 322: Second aluminum metal layer; 330: Barrier wall; 400: Insulating layer; 500: Cathode layer. Detailed Implementation

[0031] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0032] In one aspect of the invention, a display substrate is provided, with reference to... Figure 1 and Figure 2 The invention includes a substrate 100, which has a display area 1, a perforated area 2, and a critical region 3 disposed between the display area 1 and the perforated area 2. In the direction from the perforated area 2 towards the display area 1, the critical region 2 includes a first isolation pillar area and a barrier wall 340 arranged sequentially. The first isolation pillar area has at least one first isolation pillar, which includes a metal layer, and the sidewall of the metal layer facing the perforated area 2 is at least partially covered by an insulating layer. Therefore, based on conventional display substrate fabrication processes, without adding an additional mask, this invention effectively isolates the electrical signals in the display area in the critical region by having an insulating layer cover the sidewall of the original isolation pillar metal layer facing the perforated area, thus reducing the occurrence of black spot defects in the display area.

[0033] To facilitate understanding, the principle behind the aforementioned beneficial effects of the display substrate in this application will be explained below:

[0034] In this application, references Figure 9 The inventors discovered that, taking an OLED display panel product with a punch-hole area in the display area as an example, during the reliability test, the display panel will develop GDSH (Growing Dark Spot) defects after running for a period of time under test conditions of 60℃ / 90% humidity or 85℃ / 85% humidity. However, under the same test conditions, the display panel did not develop GDSH defects during the storage test (i.e., power-off test) for the same period of time.

[0035] Through compositional analysis of the various film layers in the display area, the inventors discovered that the CVD1 layer near the cathode in the cathode and encapsulation film layers (including the sequentially stacked CVD1, IJP, and CVD2 layers) contains elements not typically found in the cathode layer or the CVD1 layer itself, such as potassium ions and iodine ions. Extensive experimental research and theoretical analysis revealed that the polarizer contains potassium and iodine. Furthermore, the polarizer structure in conventional display areas has a cross-section in the perforated area. When the display panel undergoes reliability testing in a high-temperature and high-humidity environment, the chemical substances within the polarizer leak out from this cross-section and diffuse along the cut edge of the perforated area into the display substrate, from the critical region to the display area. Therefore, the potassium and iodine ions in the cathode and CVD layers likely leak from the cross-section of the polarizer in the perforated area. Further, taking a display panel as an example, the cathode of the reference panel is a common cathode. Figure 3 It is known that the cathode layer 500, which serves as the common cathode, is generally formed using a whole-layer vapor deposition process. Therefore, by setting a trapezoidal isolation pillar structure in the critical region, the light-emitting layer and the cathode layer 500 can be broken at the isolation pillar, thereby achieving the disconnection of the electrical signal in the display area in the critical region. Considering the phenomenon of GDSH black spot defects that occur after a display substrate with the above structure has been powered on for a period of time, the inventors have reasonably analyzed and concluded that since the isolation pillar structure is usually formed of metal, and the cathode layer 500 partially overlaps the isolation pillar, although the cathode layer 500 experiences discontinuous breakage at the isolation pillar due to the step difference, the isolation pillar is made of metal material. The isolation pillar generally includes a three-layer structure consisting of a titanium metal layer, an aluminum metal layer, and a titanium metal layer stacked sequentially. Among these, the aluminum layer has the best conductivity, and the cathode layer 500 overlaps the aluminum layer, so that the cathode layer in the entire critical region forms a complete cathode structure under the power-on state. Therefore, the cathode electrical signal transmitted from the display area to the perforated area is not disconnected in the critical region and can still be transmitted. Furthermore, due to the leakage of elements such as potassium and iodine from the polarizer's cross-section, in order to maintain charge balance, when K is present in the cathode layer and CVD1 layer... + I - In plasma, K is correspondingly + I -In areas where plasma exists, OH- ions accumulate to maintain positive charge neutralization. Therefore, leaked potassium, iodine, and other elements undergo electrochemical reactions with the CVD1 layer in the cathode layer and encapsulation film layer located in the critical region. Since the cathode and CVD1 undergo electrochemical reactions with potassium, iodine, and other elements together, the corrosion and aging of the cathode and CVD1 are accelerated. Ultimately, external moisture seeps into the encapsulation layer, causing it to absorb water and expand, resulting in cracks. This leads to the failure of the encapsulation layer, allowing external moisture to enter the display substrate and causing GDSH black spot defects in the display panel.

[0036] In this application, references Figure 1 ( Figure 7 (A magnified view of the structure within the dashed box) and Figure 4 The inventors have additionally placed an insulating layer (such as a passivation layer) on the sidewall of the isolation pillar in the critical region, which is part of the conventional manufacturing process of the display area. After the entire cathode layer 500 is deposited, due to the presence of the isolation pillar structure, the cathode layer 500 will still overlap on one side of the first isolation pillar. However, on the other side, due to the coverage of the insulating layer 400, the cathode layer 500 cannot overlap with the first titanium metal layer 311, the first aluminum metal layer 321, and the second titanium metal layer 312 in the first isolation pillar. Consequently, the electrical signal transmitted from the display area cathode layer 500 to the perforated area cathode layer 500 is interrupted at the isolation pillar in the critical region, thereby preventing leakage of K at the polarizer cross-section. + I- plasma undergoes an electrochemical reaction with the cathode and CVD1 film, thereby reducing the accelerated aging of the cathode and CVD1 film and the occurrence of GDSH defects in the display panel.

[0037] According to some embodiments of the present invention, reference Figure 6 , Figure 7 and Figure 8 By setting up the barrier wall 330, various film structures on the display panel can be supported and protected. For example, it can prevent the metal material layer from being corroded by external water vapor and other pollutants, block the flow range of the solution during the vapor deposition or encapsulation process, and prevent film cracks in the perforated area from being transmitted to the display area.

[0038] According to some embodiments of the present invention, the structure of the metal layer is not particularly limited. For example, the metal layer may include a first metal layer and a second metal layer stacked sequentially, wherein the thickness of the first metal layer may be less than the thickness of the second metal layer, and the sidewall of the first metal layer facing the perforated area is at least partially covered by an insulating layer.

[0039] According to some embodiments of the present invention, reference Figure 1The composition of the insulating layer is not particularly limited. For example, when a first source / drain metal layer, a passivation layer, and a second source / drain metal layer are sequentially stacked in the display area of ​​the substrate, the insulating layer can be formed from the passivation layer. This further improves the insulating effect of the insulating layer. Since the first metal layer and the second metal layer are formed using conventional first and second source / drain metal layer forming processes in the display area, the insulating layer 400 can be formed using the forming process of the passivation layer located between the first and second source / drain metal layers in the display area. That is, after the entire passivation layer is formed, only a protective adhesive needs to be applied to the sidewalls of the first metal layer during the conventional passivation layer patterning etching process using an etchant, preventing it from being etched by the etchant. This allows the passivation layer on the sidewalls of the first metal layer to be retained, thus achieving the function of an insulating layer. Therefore, without increasing the number of light shields, this achieves both reduced production costs and effective resolution of GDSH defects.

[0040] According to some embodiments of the present invention, reference Figure 1 The composition of the first metal layer and the second metal layer is not particularly limited. For example, when the display area of ​​the substrate is provided with a first source / drain metal layer, a passivation layer and a second source / drain metal layer stacked in sequence, the first metal layer of the first isolation pillar can be formed by the first source / drain metal layer, and the second metal layer of the first isolation pillar can be formed by the second source / drain metal layer.

[0041] According to other embodiments of the present invention, the structure of the first metal layer and the second metal layer of the first isolation pillar is not particularly limited, for example, referring to Figure 1The first metal layer includes a first titanium metal layer 311, a first aluminum metal layer 321, and a second titanium metal layer 312 stacked sequentially. The second metal layer of the first isolation pillar may include a third titanium metal layer 313, a second aluminum metal layer 322, and a fourth titanium metal layer 314 stacked sequentially. The contact area between the first aluminum metal layer 321 and the first titanium metal layer 311 is not less than the contact area between the first aluminum metal layer 321 and the second titanium metal layer 312; the contact area between the second aluminum metal layer 322 and the third titanium metal layer 313 is not less than the contact area between the second aluminum metal layer 322 and the fourth titanium metal layer 314. That is, the first aluminum metal layer 321 and the second aluminum metal layer 322 have a trapezoidal structure. Therefore, when the cathode layer 500 is deposited, the cathode layer will be broken at the aluminum metal layer on the side wall of the isolation pillar due to the step difference. Since the first metal layer and the second metal layer are formed using conventional first source-drain metal layer and second source-drain metal layer forming processes in the display area, the first isolation pillar can be fabricated without the need for additional light shields or process steps. Specifically, when the first metal layer and the second metal layer are formed using conventional first source-drain metal layer and second source-drain metal layer forming processes in the display area, the first aluminum metal layer of the first metal layer can be etched using the developing solution in the passivation layer patterning process to achieve the aforementioned trapezoidal structure, and the second aluminum metal layer of the second metal layer can be etched using the developing solution in the anodizing process to achieve the aforementioned trapezoidal structure.

[0042] According to some embodiments of the present invention, reference Figure 1 and Figure 2 In the direction from the punched area 2 towards the display area 1, the critical region 3 further includes a second isolation pillar region. The second isolation pillar region is located on the side of the barrier wall 330 away from the first isolation pillar region. The second isolation pillar region includes at least one first isolation pillar, and the sidewall of the first metal layer of the first isolation pillar facing the punched area is at least partially covered by an insulating layer. Therefore, based on conventional display substrate fabrication processes, without adding an additional mask, this invention, by having an insulating layer cover the sidewall of the first metal layer of the original first isolation pillar facing the punched area, further effectively isolates the electrical signals in the display area in the critical region, reducing the occurrence of black spot defects in the display area.

[0043] For ease of understanding, please refer to Figure 6 , Figure 7 and Figure 8 The following explanation uses the right side of barrier wall 330 as the first isolation zone and the left side of barrier wall 330 as the second isolation zone.

[0044] It should be noted that the number of isolation columns in the first and second isolation column areas is not particularly limited. For example, the first isolation column area can have only one first isolation column, one first isolation column and multiple second isolation columns, multiple first isolation columns and one second isolation column, or multiple first isolation columns and multiple second isolation columns. In the same case, the second isolation column area can have only one first isolation column, one first isolation column and multiple second isolation columns, multiple first isolation columns and one second isolation column, multiple first isolation columns and multiple second isolation columns, or only one second isolation column. The number of first isolation columns in the first isolation column area can be greater than, less than, or equal to the number of first isolation columns in the second isolation column area; the number of second isolation columns in the first isolation column area can be greater than, less than, or equal to the number of second isolation columns in the second isolation column area. For example, the spacing between adjacent first isolation posts, adjacent second isolation posts, or adjacent first isolation posts and second isolation posts is not particularly restricted. Adjacent isolation posts can have the same spacing or different spacings. Those skilled in the art can choose according to the actual situation.

[0045] According to some embodiments of the present invention, the number of first isolation pillars in the first isolation pillar region is not particularly limited, for example, referring to Figure 4 and Figure 8 The first isolation pillar region may include multiple first isolation pillars. The sidewalls of the first metal layer of the multiple first isolation pillars facing the perforation area are covered by an insulating layer. The insulating layer covers at least a portion of the sidewalls of the first metal layer of the first isolation pillars facing the perforation area and the top surface connected to the sidewalls. Due to limitations in process precision, it is difficult to maintain a perfect match between the height of the insulating layer on the sidewalls of the first isolation pillars and the height of the first metal layer. To ensure complete coverage of the sidewalls of the first metal layer of the first isolation pillars by the insulating layer, a higher insulating layer can be formed during the deposition process, thereby ensuring complete coverage of the sidewalls of the first metal layer of the first isolation pillars.

[0046] According to some embodiments of the present invention, when the height of the insulating layer is too high to completely cover both sidewalls of the first metal layer of the first isolation pillar, the first aluminum metal layer of the first metal layer cannot be etched to form a trapezoidal structure using the developing liquid in the etching process of the passivation layer. Furthermore, the insulating layer 400 does not have a structure that allows the cathode layer 500 to form a step and break. The subsequently formed cathode layer 500 cannot break at the sidewall of the first metal layer facing the display area, and then climbs along the passivation layer to the second metal layer, overlapping with it. This results in a situation similar to the overlap between the cathode layer and the first metal layer. In this case, even with the insulating layer 400, the electrical signal transmission of the cathode layer 500 cannot be interrupted in the critical region. (Reference) Figure 1 and Figure 4 The first isolation pillar area has at least one first isolation pillar, which has a sidewall of a first metal layer not covered by the insulating layer 400 facing the display area, thereby causing the cathode layer 500 to be disconnected in the critical region, and in combination with the arrangement of the insulating layer 400, the electrical signal transmitted from the display area to the punched area is disconnected in the critical region.

[0047] According to some embodiments of the present invention, the number of first isolation pillars in the second isolation pillar region is not particularly limited, for example, referring to Figure 8 The second isolation pillar region may include multiple first isolation pillars. The sidewalls of the first metal layer of the multiple first isolation pillars facing the perforation area are covered by an insulating layer. The insulating layer covers at least a portion of the sidewalls of the first metal layer facing the perforation area and the top surface connected to the sidewalls. Due to limitations in process precision, it is difficult to keep the height of the insulating layer on the sidewalls of the first isolation pillars completely consistent with the height of the first metal layer. To ensure that the insulating layer completely covers the sidewalls of the first metal layer of the first isolation pillars, an insulating layer with a relatively high height can be formed during the deposition of the insulating layer, thereby ensuring that the sidewalls of the first metal layer of the first isolation pillars are completely covered by the insulating layer.

[0048] According to some embodiments of the present invention, when the height of the insulating layer is too high to completely cover both sidewalls of the first metal layer of the first isolation pillar, the first aluminum metal layer of the first metal layer cannot be etched to form a trapezoidal structure using the developing liquid in the etching process of the passivation layer. Furthermore, the insulating layer 400 does not have a structure that allows the cathode layer 500 to form a step and break. The subsequently formed cathode layer 500 cannot break at the sidewall of the first metal layer facing the display area, and then climbs along the passivation layer to the second metal layer, overlapping with it. This results in a situation similar to the overlap between the cathode layer and the first metal layer. In this case, even with the insulating layer 400, the electrical signal transmission of the cathode layer 500 cannot be interrupted in the critical region. (Reference) Figure 1 and Figure 4The second isolation pillar area has at least one first isolation pillar, which has a sidewall of a first metal layer not covered by the insulating layer 400 facing the display area, thereby causing the cathode layer 500 to be disconnected in the critical region, and in combination with the arrangement of the insulating layer 400, the electrical signal transmitted from the display area to the punched area is disconnected in the critical region.

[0049] According to some embodiments of the present invention, reference Figure 6 Since the electrical signal is transmitted from the cathode layer of the display area to the cathode layer of the perforated area, it is preferable to provide an insulating layer 400 on the sidewall of the first isolation pillar in the first isolation area. For example, an insulating layer 400 may be provided on the sidewall of the first metal layer of the first isolation pillar closest to the perforated area, thereby achieving the disconnection of the electrical signal transmission of the cathode layer at a position far from the cathode layer of the display area. Further, refer to... Figure 7 and Figure 8 To reduce the uncertainties caused by setting an insulating layer only on the sidewall of the first metal layer of the first isolation pillar in the first isolation pillar region, such as insufficient thickness of the insulating layer deposited on the sidewall of the first metal layer of the first isolation pillar in the first isolation pillar region, or deviation in the placement of the protective adhesive during the passivation layer development process, a first isolation pillar with the first metal layer covered by an insulating layer facing the drilling area can be set in the second isolation pillar region. Alternatively, multiple first isolation pillars with the first metal layer covered by an insulating layer facing the drilling area can be set in both the first and second isolation pillar regions. Thus, by setting multiple insulating layers, the disconnection of the cathode layer electrical signal transmission in the critical region can be further realized.

[0050] According to some embodiments of the present invention, the structure of the second isolation column is not particularly limited, for example, referring to Figure 5 The second metal layer of the second isolation pillar includes a third titanium metal layer 313, a second aluminum metal layer 322, and a fourth titanium metal layer 314 stacked sequentially, wherein the area of ​​the contact surface between the second aluminum metal layer 322 and the third titanium metal layer 313 is not less than the area of ​​the contact surface between the second aluminum metal layer 322 and the fourth titanium metal layer 314. Therefore, when the cathode layer 500 is deposited, the cathode layer will be discontinuous at the second aluminum metal layer on the sidewall of the second metal layer of the second isolation pillar due to a step difference.

[0051] According to some embodiments of the present invention, when the number of first isolation pillars in the first isolation pillar region and the second isolation pillar region is sufficient to achieve the effect of a cathode layer in the critical disconnection region, in order to simplify the fabrication process and reduce the process cost, the other isolation pillars in the first isolation pillar region and the second isolation pillar region can adopt a simpler structure, thereby simplifying the process flow. For example, the first isolation pillar region may further include a second isolation pillar, which may only include a second metal layer. Similarly, the second isolation pillar region may also include at least one second isolation pillar, which may include a second metal layer. Specifically, when a second source / drain metal layer is provided in the display area of ​​the substrate, the second metal layer can be formed by using the conventional second source / drain metal layer forming process of the display area, and the second aluminum metal layer of the second metal layer can be etched by the developing solution in the subsequent anode forming process to make it have the aforementioned trapezoidal structure.

[0052] According to some embodiments of the present invention, reference Figure 5 and Figure 8 When the critical region on the substrate 100 is provided with a barrier buffer layer 210, a first gate insulating layer 220, a second gate insulating layer 230 and an interlayer dielectric layer 240 stacked sequentially, the substrate 100 of the first isolation pillar region may further include: a first gate metal layer 221, which is located between the barrier buffer layer 210 and the first gate insulating layer 220; and a second gate metal layer 231, which is located between the first gate insulating layer 220 and the second gate insulating layer 230. When the substrate 100 of the first isolation pillar region further includes a first gate metal layer 221 and a second gate metal layer 231, the distance between the top of the second isolation pillar and the upper surface of the interlayer dielectric layer 240 is greater than when the substrate only includes a barrier buffer layer 210, a first gate insulating layer 220, a second gate insulating layer 230 and an interlayer dielectric layer 240. Therefore, the height difference when the cathode layer 500 is deposited is greater, and the cathode layer 500 is more likely to break on the sidewall of the second isolation pillar due to the step difference. This allows for better utilization of the insulating layer to achieve the effect of disconnecting the cathode layer electrical signal transmission in the critical region.

[0053] In another aspect, the present invention provides a display device comprising the aforementioned display substrate. Thus, the display device possesses all the features and advantages of the aforementioned display substrate, which will not be repeated here.

[0054] Unless otherwise stated, all technical terms used in this invention have the same meaning as commonly understood by one of ordinary skill in the art. All patents and publications related to this invention are incorporated herein by reference in their entirety. The terms "comprising" or "including" are open-ended expressions, meaning they include what is specified in this invention but do not exclude other aspects. In this invention, all figures disclosed herein, whether or not the words "about" or "approximately" are used, are approximate values. The numerical value of each figure may vary by less than 10% or by a difference that is considered reasonable by one of ordinary skill in the art, such as 1%, 2%, 3%, 4%, or 5%.

[0055] In the description of this invention, it should be understood that the terms "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0056] In the description of this invention, "first feature" and "second feature" may include one or more of the features.

[0057] In the description of this invention, "a plurality of" means two or more.

[0058] In the description of this invention, the first feature being "above" or "below" the second feature may include the first and second features being in direct contact, or it may include the first and second features not being in direct contact but being in contact through another feature between them.

[0059] In the description of this invention, the terms "above," "over," and "on top" for the first feature and the second feature include the first feature being directly above or diagonally above the second feature, or simply indicating that the first feature is at a higher horizontal level than the second feature.

[0060] In the description of this specification, references to terms such as "one embodiment," "another embodiment," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment is included in at least one embodiment of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples, without contradiction. Additionally, it should be noted that in this specification, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features.

[0061] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A display substrate, characterized in that, include: A substrate having a display area, a perforated area, and a critical region disposed between the display area and the perforated area, wherein, in a direction from the perforated area to the display area, the critical region includes a first isolation pillar area and a barrier wall arranged sequentially, the first isolation pillar area having at least one first isolation pillar, the first isolation pillar including a metal layer, and the sidewall of the metal layer facing the perforated area being at least partially covered by an insulating layer, so that the electrical signal transmitted from the cathode layer of the display area to the cathode layer of the perforated area is disconnected at the first isolation pillar in the critical region; The metal layer includes a first metal layer and a second metal layer stacked sequentially, the thickness of the first metal layer is less than the thickness of the second metal layer, and the sidewall of the first metal layer facing the perforated area is at least partially covered by the insulating layer.

2. The display substrate according to claim 1, characterized in that, The first isolation pillar area includes a plurality of first isolation pillars, wherein the sidewall of the first metal layer of the plurality of first isolation pillars facing the perforated area is covered by the insulating layer, and the insulating layer covers at least a portion of the sidewall of the first metal layer of the first isolation pillar facing the perforated area and the top surface connected to the sidewall.

3. The display substrate according to claim 2, characterized in that, The first isolation pillar area has at least one first isolation pillar, which has a sidewall of the first metal layer that is not covered by the insulating layer facing the side of the display area.

4. The display substrate according to claim 1, characterized in that, In the direction from the perforated area to the display area, the critical region further includes a second isolation pillar area, the second isolation pillar area being located on the side of the barrier wall away from the first isolation pillar area, the second isolation pillar area including at least one first isolation pillar, the sidewall of the first metal layer of the first isolation pillar facing the perforated area having at least a portion covered by the insulating layer.

5. The display substrate according to claim 4, characterized in that, The second isolation pillar area includes a plurality of first isolation pillars, wherein the sidewall of the first metal layer of the plurality of first isolation pillars facing the perforated area is covered by the insulating layer, and the insulating layer covers at least a portion of the sidewall of the first metal layer facing the perforated area and the top surface connected to the sidewall.

6. The display substrate according to claim 5, characterized in that, The second isolation pillar area has at least one of the first isolation pillars, which has the sidewall of the first metal layer that is not covered by the insulating layer facing the side of the display area.

7. The display substrate according to any one of claims 1-6, characterized in that, The first metal layer of the first isolation pillar includes a first titanium metal layer, a first aluminum metal layer, and a second titanium metal layer stacked sequentially. The second metal layer of the first isolation pillar includes a third titanium metal layer, a second aluminum metal layer, and a fourth titanium metal layer stacked sequentially. The area of ​​the contact surface between the first aluminum metal layer and the first titanium metal layer is not less than the area of ​​the contact surface between the first aluminum metal layer and the second titanium metal layer; the area of ​​the contact surface between the second aluminum metal layer and the third titanium metal layer is not less than the area of ​​the contact surface between the second aluminum metal layer and the fourth titanium metal layer.

8. The display substrate according to any one of claims 1-6, characterized in that, The substrate has a first source / drain metal layer, a passivation layer, and a second source / drain metal layer stacked sequentially in the display area. The first metal layer of the first isolation pillar is formed by the first source / drain metal layer, the second metal layer of the first isolation pillar is formed by the second source / drain metal layer, and the insulating layer is formed by the passivation layer.

9. The display substrate according to claim 1, characterized in that, The first isolation pillar region includes at least one second isolation pillar, and the second isolation pillar includes the second metal layer.

10. The display substrate according to claim 1, characterized in that, The second isolation pillar region includes at least one second isolation pillar, and the second isolation pillar includes the second metal layer.

11. The display substrate according to claim 9 or 10, characterized in that, The second metal layer of the second isolation column includes a third titanium metal layer, a second aluminum metal layer and a fourth titanium metal layer stacked in sequence, wherein the area of ​​the contact surface between the second aluminum metal layer and the third titanium metal layer is not less than the area of ​​the contact surface between the second aluminum metal layer and the fourth titanium metal layer.

12. The display substrate according to claim 9 or 10, characterized in that, A second source / drain metal layer is disposed in the display area of ​​the substrate, and the second metal layer of the second isolation pillar is formed by the second source / drain metal layer.

13. A display device, characterized in that, The display device includes the display substrate according to any one of claims 1-12.

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