Gradient frosting product and preparation method thereof

Abstract

The present application provides a gradient frosting product and a preparation method thereof. The preparation method of the gradient frosting product comprises: obtaining a master plate having a convex microstructure with a gradient arrangement, using the master plate to imprint an initial imprinting plate to obtain a target imprinting plate having a concave microstructure, wherein the concave microstructure is complementary to the convex microstructure with the gradient arrangement; using the target imprinting plate to imprint the nanoimprint material layer on the surface of the substrate and simultaneously photocuring it, and then demolding and etching to obtain a gradient frosting product having the convex microstructure with the gradient arrangement. The gradient frosting product is prepared using the preparation method of the gradient frosting product. The preparation method of the gradient frosting product provided in the present application has a convex microstructure, a special gradient visual effect, and is anti-glare and wear-resistant, so that the product can be freely customized, has a high yield, and the process is more environmentally friendly.

Description

Technical Field

[0001] The present application relates to the field of material surface treatment, and in particular to a gradient frosting product and a preparation method thereof. Background Art

[0002] Gradient frosting is popular among people due to its excellent decorative properties. For example, more and more mobile phones or tablets use gradient frosted glass as protective back covers, which greatly enhances the texture and fashionable aesthetics of the product.

[0003] Existing gradient frosting processes can be divided into two main categories: one is to achieve a gradient texture by designing a gradient frosting solution with a gradient concentration or a gradient reaction time; the other is to form a photosensitive layer with a gradient pattern on the substrate surface through UV lithography, and then transfer the gradient pattern to the substrate surface through sandblasting or a frosting solution process. The main drawbacks of the first method are: 1. The gradient pattern size cannot be customized; 2. It is difficult to achieve microstructures with a pattern size below 1μm or above 50μm, thus limiting the achievable gradient effect; 3. The gradient effect can only be changed along a predetermined direction. The main drawbacks of the second method are: 1. The photosensitive layer is prone to dropout and detachment during the frosting or sandblasting process, which affects product yield; 2. The frosting or sandblasting process cannot produce nanoscale microstructure patterns; 3. The exposure process is significantly more expensive than the nanoimprint process in terms of both machine cost and process steps.

[0004] Furthermore, both methods rely solely on chemical etching of the substrate surface, resulting in the fabrication of concave microstructures. These concave microstructures are prone to dirt accumulation at the pits, and the sharp edges of the concave surfaces are easily abraded, thus affecting the desired optical effect. Furthermore, both methods involve the use of wet chemical etching to etch and polish the substrate, requiring the use of large amounts of chemical solutions, which can be harmful to both operators and the environment. Summary of the Invention

[0005] The purpose of this application is to provide a gradient frosting product and a preparation method thereof to solve the above problems.

[0006] To achieve the above objectives, this application adopts the following technical solutions:

[0007] A method for preparing a gradient frosting product, comprising:

[0008] Obtaining a master having a convex microstructure arranged in a gradient pattern, and using the master to stamp an initial stamping plate to obtain a target stamping plate having a concave microstructure, wherein the concave microstructure is complementary to the convex microstructure arranged in a gradient pattern;

[0009] The target imprinting plate is used to imprint the nanoimprint material layer on the surface of the substrate and simultaneously photocured, and then demoulding and etching are performed to obtain a gradient frosted product having the convex microstructure with the gradient arrangement.

[0010] Preferably, the master is obtained by imprinting a first substrate using a master having the concave microstructure.

[0011] Preferably, the master plate is obtained by ultraviolet exposure, electron beam exposure or laser engraving of the second substrate;

[0012] Preferably, the first substrate and the second substrate are independently any one of glass, quartz, sapphire, polyimide film, ceramic material or metal.

[0013] Preferably, the initial embossing plate comprises a flexible substrate and a graphic layer provided on a surface of the flexible substrate;

[0014] Preferably, the flexible substrate comprises polyimide, and the graphic layer comprises polymethyl methacrylate;

[0015] Preferably, the thickness of the graphic layer is 1 μm-3 μm.

[0016] Preferably, the conditions for using the master to stamp the initial stamping plate include:

[0017] The stamping temperature is 60℃-80℃, and the pressure is 6MPa-10MPa.

[0018] Preferably, using the target imprinting plate to imprint the nanoimprint material layer on the surface of the substrate comprises:

[0019] The rolling is performed under the conditions of a pressure of 5N / cm-25N / cm, a speed of 150mm / min-250mm / min, and an embossing roller gap of -0.5mm to 3mm.

[0020] Preferably, the conditions for light curing include:

[0021] The UV wavelength is 365nm and the energy is 500mJ / cm 2 -1500mJ / cm 2 , time is 5s-5min.

[0022] Preferably, the etching is performed by reactive ion etching.

[0023] Preferably, the etching further includes cleaning, and the cleaning includes:

[0024] Use an alkaline water-soluble stripping solution at a temperature of 55°C-85°C for 200s-400s to remove the residual nanoimprint material, and then rinse with deionized water.

[0025] The present application also provides a gradient frosting product, which is prepared using the preparation method of the gradient frosting product.

[0026] Compared with the prior art, the advantages of this application include:

[0027] The present application provides a method for preparing a gradient frosted product, by using a master having a gradient-arranged convex microstructure to imprint an initial imprinting plate to obtain a target imprinting plate having a concave microstructure complementary to the gradient-arranged convex microstructure, and then using the target imprinting plate to perform nanoimprinting, photocuring, demolding, and etching on a substrate to obtain a gradient frosted product having a gradient-arranged convex microstructure; the product has the same gradient-arranged convex microstructure as the master, and the microstructure size can be freely customized between 50nm and 100μm, and the gradient pattern is no longer limited to changing along a preset direction, which can achieve a more delicate appearance and different optical effects; by using reactive ion etching instead of sandblasting or frosting liquid process, the problem of photosensitive film layer shedding easily caused by processes such as sandblasting and polishing can be avoided, thereby improving product yield; the convex microstructure can avoid defects such as sharp edges and easy wear of the concave microstructure; the method avoids the use of chemical liquids such as frosting liquid and polishing liquid, which can reduce damage to operators and the environment and is relatively more environmentally friendly.

[0028] The gradient frosting product provided in this application has a convex microstructure with a gradient arrangement. The gradient pattern is no longer limited to changing along a preset direction. The appearance is more delicate and different optical effects can be obtained. The convex microstructure makes it wear-resistant and will not accumulate dirt. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope of the present application.

[0030] Figure 1 Schematic diagram of concave microstructure;

[0031] Figure 2 Schematic diagram of convex microstructure;

[0032] Figure 3 The design drawing of the gradient frosting product provided in Example 1;

[0033] Figure 4 This is a theoretical effect diagram of the gradient frosting product provided in Example 1;

[0034] Figure 5 This is a cross-sectional SEM image of the gradient frosting product provided in Example 1;

[0035] Figure 6 This is a high-magnification SEM image of the surface of the gradient frosting product provided in Example 1;

[0036] Figure 7 This is a low-magnification SEM image of the surface of the gradient frosting product provided in Example 1;

[0037] Figure 8 The design drawing of the gradient frosting product provided in Example 2;

[0038] Figure 9 This is a diagram showing the theoretical effect of the gradient frosting product provided in Example 2;

[0039] Figure 10 Surface SEM image of the product with concave microstructure provided in Comparative Example 1;

[0040] Figure 11 A cross-sectional SEM image of the product with a concave microstructure provided in Comparative Example 1;

[0041] Figure 12 A locally enlarged SEM image of the product with a concave microstructure provided in Comparative Example 1;

[0042] Figure 13 Schematic diagram of the 16-area partitioning of the etching equipment used in this application. DETAILED DESCRIPTION

[0043] As used herein:

[0044] "Prepared from" is synonymous with "comprising." As used herein, the terms "comprising," "including," "having," "containing," or any other variations thereof, are intended to cover a non-exclusive inclusion. For example, a composition, process, method, article, or apparatus that comprises the listed elements is not necessarily limited to only those elements but may include other elements not expressly listed or inherent to such composition, process, method, article, or apparatus.

[0045] The conjunction "consisting of" excludes any unspecified element, step, or component. If used in a claim, this phrase renders the claim closed, excluding materials other than those described, except for conventional impurities associated therewith. When the phrase "consisting of" appears in a clause of the body of a claim, rather than immediately following the subject matter, it limits only the elements described in that clause; other elements are not excluded from the claim as a whole.

[0046] When an amount, concentration, or other value or parameter is expressed as a range, a preferred range, or a range defined by a series of upper preferred values ​​and lower preferred values, this should be understood as specifically disclosing all ranges formed by any pairing of any range upper limit or preferred value with any range lower limit or preferred value, regardless of whether the range is disclosed alone. For example, when a range of "1 to 5" is disclosed, the described range should be interpreted as including the range "1 to 4", "1 to 3", "1 to 2", "1 to 2 and 4 to 5", "1 to 3 and 5", etc. When a numerical range is described herein, unless otherwise stated, the range is intended to include its end values ​​and all integers and fractions within the range.

[0047] In these examples, parts and percentages are by mass unless otherwise indicated.

[0048] "Parts by mass" refers to the basic unit of measurement used to express the mass ratio of multiple components. One part can represent any unit of mass, such as 1g or 2.689g. If we say that the mass of component A is a parts and the mass of component B is b parts, this means the ratio of the mass of component A to the mass of component B is a:b. Alternatively, we could say that the mass of component A is aK and the mass of component B is bK (K is an arbitrary number representing a multiplication factor). It's important to note that, unlike parts by mass, the sum of the mass of all components is not limited to 100 parts.

[0049] "And / or" is used to indicate that one or both of the stated situations may occur, for example, A and / or B includes (A and B) and (A or B).

[0050] A method for preparing a gradient frosting product, comprising:

[0051] Obtaining a master having a convex microstructure arranged in a gradient pattern, and using the master to stamp an initial stamping plate to obtain a target stamping plate having a concave microstructure, wherein the concave microstructure is complementary to the convex microstructure arranged in a gradient pattern;

[0052] The target imprinting plate is used to imprint the nanoimprint material layer on the surface of the substrate and simultaneously photocured, and then demoulding and etching are performed to obtain a gradient frosted product having the convex microstructure with the gradient arrangement.

[0053] In this application, the gradient direction can be any direction on the process area plane, and is not limited to the type of change direction. It can be gradient along a single direction or along multiple directions, and the gradient direction can be a straight line or a curve. The microstructure pattern can be a regular array shape or an irregular shape.

[0054] It should be noted that if Figure 1As shown in the figure, concave microstructures generally have sharp corners, which are not only easy to wear but also easy to accumulate dirt, affecting their optical effects. Figure 2 As shown, there are no sharp corners and the aforementioned problems will not exist.

[0055] In an optional embodiment, the master is obtained by using a master having the concave microstructure to imprint a first substrate.

[0056] Sandblasting + chemical polishing, electron beam exposure, laser etching, etc. can be used, but no matter which method is used, it is difficult to prepare a convex microstructure master. Therefore, a master is obtained by imprinting the first substrate with a master having a concave microstructure.

[0057] In an optional embodiment, the master plate is obtained by ultraviolet exposure, electron beam exposure or laser engraving of the second substrate;

[0058] In an optional embodiment, the first substrate and the second substrate are independently any one of glass, quartz, sapphire, polyimide film, ceramic material or metal.

[0059] In an optional embodiment, the initial embossing plate includes a flexible substrate and a graphic layer provided on a surface of the flexible substrate;

[0060] In an optional embodiment, the flexible substrate comprises polyimide, and the graphic layer comprises polymethyl methacrylate;

[0061] In an optional embodiment, the thickness of the graphic layer is 1 μm-3 μm.

[0062] Optionally, the thickness of the graphic layer may be 1 μm, 2 μm, 3 μm, or any value between 1 μm and 3 μm.

[0063] In an optional embodiment, the conditions for using the master to stamp the initial stamping plate include:

[0064] The stamping temperature is 60℃-80℃, and the pressure is 6MPa-10MPa.

[0065] Optionally, the stamping temperature may be 60° C., 70° C., 80° C. or any value between 60° C. and 80° C., and the pressure may be 6 MPa, 7 MPa, 8 MPa, 9 MPa, 10 MPa or any value between 6 MPa and 10 MPa.

[0066] In an optional embodiment, using the target imprint plate to imprint the nanoimprint material layer on the surface of the substrate comprises:

[0067] Rolling is performed under the conditions of a pressure of 5N / cm-25N / cm, a speed of 150mm / min-250mm / min, and an embossing roller gap of -0.5mm to 3mm (the roller is made of rubber material and can be deformed. When there is extrusion deformation, the embossing roller gap can be negative).

[0068] Optionally, the pressure can be 5N / cm, 10N / cm, 15N / cm, 20N / cm, 25N / cm or any value between 5N / cm-25N / cm, the speed can be 150mm / min, 200mm / min, 250mm / min or any value between 150mm / min-250mm / min, and the embossing roller gap can be -0.5mm, -0.1mm, 0mm, 0.5mm, 1mm, 2mm, 3mm or any value between -0.5mm and 3mm.

[0069] In an optional embodiment, the conditions for photocuring include:

[0070] The UV wavelength is 365nm and the energy is 500mJ / cm 2 -1500mJ / cm 2 , time is 5s-5min.

[0071] Optionally, the energy can be 500 mJ / cm 2 、1000mJ / cm 2 、1500mJ / cm 2 or 500mJ / cm 2 -1500mJ / cm 2 The time can be 5s, 10s, 20s, 30s, 40s, 50s, 60s, 2min, 3min, 4min, 5min or 5s-5min.

[0072] In an optional embodiment, the etching is performed by reactive ion etching.

[0073] Compared to sandblasting or frosting processes, reactive ion etching can precisely control the etching rate and directionality, thereby improving etching accuracy and ultimately achieving the target optical effect through etching alone. Therefore, chemical polishing is no longer required after reactive ion etching, which can reduce the use of chemical agents.

[0074] In an optional embodiment, the etching further includes cleaning, and the cleaning includes:

[0075] Use an alkaline water-soluble stripping solution at a temperature of 55°C-85°C for 200s-400s to remove the residual nanoimprint material, and then rinse with deionized water.

[0076] Optionally, in the conditions for removing residual nanoimprint material, the temperature can be 55°C, 60°C, 65°C, 70°C, 75°C, 80°C, 85°C or any value between 55°C and 85°C, and the time can be 200s, 250s, 300s, 350s, 400s or any value between 200s and 400s.

[0077] The present application also provides a gradient frosting product, which is prepared using the preparation method of the gradient frosting product.

[0078] The gradient frosted product referred to in this application can be used as components for electronic products such as mobile phones, tablets, personal computers, car displays or wearable devices.

[0079] The embodiments of the present application will be described in detail below in conjunction with specific examples, but it will be understood by those skilled in the art that the following examples are merely illustrative of the present application and should not be considered as limiting the scope of the present application. In the examples, if specific conditions are not specified, the conditions are carried out according to conventional conditions or manufacturer recommendations. The reagents or instruments used are not specified by the manufacturer and are conventional products that can be purchased commercially.

[0080] Example 1

[0081] The present application provides a gradient frosted glass, the preparation method of which is as follows:

[0082] 1. Use drawing software such as L-Edit to design a microstructure pattern with a gradient effect. The gradient process is continuous and the transition is natural. Then, a master plate of a concave microstructure with a gradient effect is made on a glass substrate by UV exposure. The specific shape is as follows: Figure 3 As shown:

[0083] In the area 1 with a radius of 5 cm from the lower left corner of the glass, there is a microstructure with a pattern size of 400nm-800nm, and the pitch of the microstructure pattern unit is 100nm-200nm;

[0084] In area 2 with a radius of 5-10 cm from the lower left corner, there is a microstructure with a pattern size of 800nm-1200nm, and the pitch of the microstructure pattern units is 400nm-600nm;

[0085] In the area 3 with a radius of 10-15 cm from the lower left corner, there is a microstructure with a pattern size of 1200 nm to 4 μm, and the pitch of the microstructure pattern units is 600 nm to 800 nm;

[0086] In the area 4 with a radius of 15-20 cm from the lower left corner, there is a microstructure with a pattern size of 4μm-10μm, and the spacing between the microstructure pattern units is 800nm-1000nm.

[0087] 2. Using the above original plate, a mother plate having a convex microstructure that is a mirror image of the concave microstructure is prepared by embossing.

[0088] 3. Use the prepared master plate to prepare a flexible target embossing plate by hot embossing.

[0089] A 3μm-thick layer of PPMA (polymethyl methacrylate) was coated on a transparent flexible polyimide substrate to create an initial embossing plate. The master plate prepared in step 2 was then used to create a flexible target embossing plate using a hot embossing process at a temperature of 60°C and a pressure of 10 MPa. This target embossing plate can be reused multiple times.

[0090] 4. Coating and embossing:

[0091] The nanoimprint material was sprayed on the surface of the glass substrate, and the concave microstructure pattern on the target imprint plate was transferred to the nanoimprint material using the prepared flexible target imprint plate. The nanoimprint material was rolled under the conditions of a pressure of 5N / cm-25N / cm, a speed of 150mm / min-250mm / min, and a gap of -0.5mm-3mm. During the rolling process, a wavelength of 365nm and an energy of 500mJ / cm 2 -1500mJ / cm 2 The embossing material is cured by UV light for 5 seconds to 5 minutes. Finally, the rolled embossing coating is cured by UV light with a wavelength of 365 nm and demolded under a pressure of 5 N / cm.

[0092] 5. Reactive ion etching:

[0093] Before starting the RF power and introducing the process gas, the vacuum degree of the reaction chamber is 5×10 -4 Pa, under the conditions of He flow rate of 110Sccm, CHF3 flow rate of 200Sccm, and CF4 flow rate of 100Sccm, the chamber pressure is maintained at 0.5Pa, the upper electrode power is 9000w, and the lower electrode power is 11000w, reactive ion etching is performed, and the etching end point is determined by EPD (etching end point detection) software.

[0094] 6. Stripping and cleaning: Use alkaline water-soluble stripping solution at a temperature of 75°C for 300s to remove the residual anti-etching layer, rinse with deionized water, and blow dry with an air knife to obtain a microstructure pattern with a gradient anti-glare on the surface of the substrate. The theoretical macroscopic effect is as follows: Figure 4 The cross-section SEM image of the product is shown as follows. Figure 5 As shown, the surface high magnification SEM image is as follows Figure 6 As shown, the surface low magnification SEM image is as follows Figure 7 shown.

[0095] The optical data of the obtained product are shown in Table 1 below:

[0096] Table 1 Optical data and roughness

[0097]

[0098] Note: Sq: Root mean square height, equivalent to the standard deviation of height, one of the roughness characterization indicators; Sa: The average value of the absolute value of the height of all points in the test plane, one of the roughness characterization indicators.

[0099] Example 2

[0100] The present application provides a gradient frosted glass, the preparation method of which is as follows:

[0101] 1. Use drawing software such as L-Edit to design a microstructure pattern with a gradient effect. The gradient process is continuous and the transition is natural. Then, a master plate of a concave microstructure with a gradient effect is made on a glass substrate by UV exposure. The specific shape is as follows: Figure 8 As shown:

[0102] In the area 2cm to the left and right and 4cm above and below the center of the glass, there is a microstructure with a pattern size of 200nm-600nm, and the pitch of the microstructure pattern unit is 100nm-200nm;

[0103] In the area 2-4cm to the left and right and 4-8cm above and below the center of the glass, there is a microstructure with a pattern size of 600nm-1200nm, and the pitch between the microstructure pattern units is 300nm-400nm;

[0104] In the area 4-6cm to the left and right and 8-12cm above and below the center of the glass, there is a microstructure with a pattern size of 3μm-10μm, and the pitch of the microstructure pattern unit is 600nm-700nm;

[0105] In the area 6-8 cm to the left and right and 12-16 cm above and below the center of the glass, there is a microstructure with a pattern size of 15μm-30μm, and the pitch between the microstructure pattern units is 700nm-900nm.

[0106] 2. Using the above original plate, a mother plate having a convex microstructure that is a mirror image of the concave microstructure is prepared by embossing.

[0107] 3. Use the prepared master plate to prepare a flexible target embossing plate by hot embossing.

[0108] A 3μm-thick layer of PPMA (polymethyl methacrylate) was coated on a transparent flexible polyimide substrate to create an initial embossing plate. The master plate prepared in step 2 was then used to create a flexible target embossing plate using a hot embossing process at a temperature of 60°C and a pressure of 10 MPa. This target embossing plate can be reused multiple times.

[0109] 4. Coating and embossing:

[0110] The nanoimprint material was sprayed on the surface of the glass substrate, and the concave microstructure pattern on the target imprint plate was transferred to the nanoimprint material using the prepared flexible target imprint plate. The nanoimprint material was rolled under the conditions of a pressure of 5N / cm-25N / cm, a speed of 150mm / min-250mm / min, and a gap of -0.5mm-3mm. During the rolling process, a wavelength of 365nm and an energy of 500mJ / cm 2 -1500mJ / cm 2 The embossing material is cured by UV light for 5 seconds to 5 minutes. Finally, the rolled embossing coating is cured by UV light with a wavelength of 365 nm and demolded under a pressure of 5 N / cm.

[0111] 5. Reactive ion etching:

[0112] Before starting the RF power and introducing the process gas, the vacuum degree of the reaction chamber is 5×10 -4 Pa, under the conditions of He flow rate of 110Sccm, CHF3 flow rate of 200Sccm, and CF4 flow rate of 100Sccm, the chamber pressure is maintained at 0.5Pa, the upper electrode power is 9000W, and the lower electrode power is 11000W, reactive ion etching is performed, and the etching end point is determined by EPD software.

[0113] 6. Stripping and cleaning: Use alkaline water-soluble stripping solution at a temperature of 75°C for 300s to remove the residual anti-etching layer, rinse with deionized water, and blow dry with an air knife to obtain a microstructure pattern with a gradient anti-glare on the surface of the substrate. The theoretical macroscopic effect is as follows: Figure 9 shown.

[0114] The optical data of the obtained product are shown in Table 2 below:

[0115] Table 2 Optical data and roughness

[0116]

[0117] Comparative Example 1

[0118] The difference from Example 1 is that the master is directly coated, embossed and etched to finally obtain a product with a concave microstructure. Figure 10 、 Figure 11 and Figure 12 As shown in the figure, the microstructure unit is surrounded by sharp corners and is easily worn.

[0119] According to the method of Example 1 and the method of Comparative Example 1, a concave microstructure product and a convex microstructure product were obtained respectively. The optical data and wear resistance data (the selected test area is the same) are shown in Table 3 below:

[0120] Table 3 Optical data, roughness and mass wear

[0121]

[0122] Note: The wear mass is the mass caused by friction during 1000 revolutions.

[0123] From the comparison results in Table 3, it can be seen that the optical data and roughness results of the two are not much different, but the mass wear of the convex microstructure is better than that of the concave microstructure.

[0124] It should be noted that when using reactive ion etching to produce gradient anti-glare patterns, the loading effect during the etching process must be overcome. This is because the gradient pattern means that the pattern size and density in different areas will be different, which will lead to uneven gas consumption in local areas during the etching process, and ultimately result in etching deviation. To overcome the loading effect, this solution mainly adopts the following solutions for improvement:

[0125] 1. When designing the original pattern, scale the structure size of some densely packed areas by a certain ratio. Depending on the density of the pre-scaled area, control the scaling ratio to 0.6-1.5. When the pattern is dense, the effective gas is consumed quickly, and the size and depth of the etched pattern will become smaller. Scaling the pattern to a larger scale can effectively compensate for the deviation in the etching result; otherwise, reduce the scale.

[0126] 2. When designing the master pattern, add some invalid pattern designs in some sparse pattern areas to increase the etching gas consumption in this area and achieve overall balance.

[0127] The etching equipment has 16 areas where power can be adjusted separately, so that the etching effect of different areas can be controlled more accurately, such as Figure 13 shown.

[0128] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some or all of the technical features therein. These modifications or replacements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present application.

[0129] Furthermore, those skilled in the art will appreciate that although some embodiments herein include certain features included in other embodiments but not others, combinations of features from different embodiments are intended to be within the scope of this application and to form distinct embodiments. For example, in the claims above, any of the claimed embodiments may be used in any combination. The information disclosed in this background section is intended solely to enhance understanding of the overall background of this application and should not be construed as an admission or any implication that such information constitutes prior art known to those skilled in the art.

Claims

1. A method for preparing a gradient frosting product, characterized in that: include: Using a master having a concave microstructure to emboss a first substrate to obtain a master having a convex microstructure arranged in a gradient pattern, and using the master to emboss an initial embossing plate to obtain a target embossing plate having the concave microstructure, wherein the concave microstructure is complementary to the convex microstructure arranged in a gradient pattern; the conditions for using the master to emboss the initial embossing plate include: an embossing temperature of 60° C. to 80° C. and a pressure of 6 MPa to 10 MPa; Using the target embossing plate to emboss the nanoimprint material layer on the surface of the substrate and simultaneously performing photocuring, and then demolding and etching to obtain a gradient frosted product having the gradient-arranged convex microstructure; using the target embossing plate to emboss the nanoimprint material layer on the surface of the substrate, comprising: rolling under conditions of a pressure of 5 N / cm-25 N / cm, a speed of 150 mm / min-250 mm / min, and an embossing roller gap of -0.5 mm to 3 mm; The master plate is obtained by ultraviolet exposure, electron beam exposure or laser engraving of the second substrate; The first substrate and the second substrate are each independently any one of glass, quartz, sapphire, polyimide film, ceramic material or metal; The initial embossing plate includes a flexible substrate and a graphic layer arranged on the surface of the flexible substrate; The flexible substrate comprises polyimide, and the pattern layer comprises polymethyl methacrylate.

2. The preparation method according to claim 1, characterized in that The thickness of the graphic layer is 1 μm-3 μm.

3. The preparation method according to claim 1, characterized in that The conditions for the light curing include: The UV wavelength is 365nm and the energy is 500mJ / cm 2 -1500mJ / cm 2 , time is 5s-5min.

4. The preparation method according to claim 1, characterized in that The etching is performed by reactive ion etching.

5. The preparation method according to any one of claims 1 to 4, characterized in that The etching process is followed by cleaning, which includes: Use an alkaline water-soluble stripping solution at a temperature of 55°C-85°C for 200s-400s to remove the residual nanoimprint material, and then rinse with deionized water.

6. A gradient frosting product, characterized in that: The product is prepared using the method for preparing the gradient frosting product according to any one of claims 1 to 5.

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