A manufacturing method of an optical device based on high aspect ratio nanocolumns

Abstract

The embodiment of the present application discloses a method for manufacturing an optical device based on a nanocolumn with a high aspect ratio. For any nanocolumn in the optical device, the method includes: plating a first material on the end face of the substrate; etching a portion of the first material to obtain a target position for setting the nanocolumn, and plating a second material at the end face of the substrate where the first material is etched; plating a nanomaterial on the end face formed by the second material and the first material; etching the nanomaterial to retain the nanomaterial at the target position of the nanocolumn to obtain a nanocolumn, wherein the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10; plating a protective material on the portion where the nanomaterial is etched to support the nanocolumn. By plating two layers of material in sequence, the height of the nanocolumn is increased while keeping the width of the nanocolumn unchanged, thereby achieving the purpose of increasing the aspect ratio. In addition, plating a protective material around the nanocolumn to support the nanocolumn effectively solves the problem of the nanocolumn falling over.

Description

Technical Field

[0001] The embodiments of the present application relate to the field of semiconductor technology, and in particular to a method for manufacturing an optical device based on high aspect ratio nanorods. Background Art

[0002] Metasurface devices include a substrate and multiple nanopillars on the substrate surface. Through the different materials, different structures, and / or different arrangements between the multiple nanopillars, a variety of different optical functions can be achieved, such as chromatic aberration adjustment, imaging, and spectral regulation. Therefore, metasurface devices are often used in display devices and optical computing devices.

[0003] Conventional metasurface devices are subject to structural diffraction dispersion, a phenomenon in which light of different wavelengths is dispersed in different directions when passing through a metasurface. To address this, the conventional approach is to make the nanopillars on the surface of metasurface devices relatively tall to minimize the dispersion of incident light and achieve more complex optical functions.

[0004] However, if the nanocolumns are made taller without being widened, the aspect ratio of the nanocolumns (i.e., the ratio of the height of the nanocolumns to the width of the nanocolumns) will be too large. The manufacturing process of nanocolumns with too large an aspect ratio is more difficult, and nanocolumns with too large an aspect ratio are prone to collapse, affecting the use effect of the product. Summary of the Invention

[0005] The embodiments of the present application provide a method for manufacturing an optical device based on nanorods with a high aspect ratio, which can solve the problem that nanorods with an excessively large aspect ratio are prone to falling over.

[0006] In a first aspect, an embodiment of the present application provides a method for fabricating an optical device based on high aspect ratio nanopillars. For any nanopillar in the optical device, the method includes:

[0007] Plating a first material on the end surface of the substrate so that the first material covers the entire end surface of the substrate;

[0008] Etching a portion of the first material to obtain a target position for arranging the nanorods, and plating a second material on the end surface of the substrate where the first material is etched away, so that the second material has the same height as the first material;

[0009] Plating a nanomaterial on an end surface formed by the second material and the first material, so that the nanomaterial covers the entire end surface;

[0010] Etching the nanomaterial to retain the nanomaterial at a target position of the nanopillar to obtain a nanopillar, wherein the ratio of the height of the nanopillar to the width of the nanopillar is greater than or equal to 10;

[0011] Etch away a part of the nanomaterial and deposit a protective material to support the nanocolumns.

[0012] In an alternative design, when the first material is a nanomaterial, the second material is a protective material; or,

[0013] when the first material is a protective material, the second material is a nanomaterial.

[0014] In an alternative design, when the first material is a nanomaterial, etch away a part of the first material to obtain the target position for arranging the nanocolumns, and deposit a second material on the substrate end face where the first material is etched away, including:

[0015] Etch a part of the nanomaterial to the end face of the substrate, use the position where the other remaining part of the nanomaterial is located as the target position, and use the other remaining part of the nanomaterial as the first part of the nanocolumn.

[0016] Deposit a protective material on the substrate end face obtained by etching, and through chemical mechanical polishing and etching, make the height of the protective material the same as the height of the nanomaterial.

[0017] In an alternative design, when the first material is a protective material, etch away a part of the first material to obtain the target position for arranging the nanocolumns, and deposit a second material on the substrate end face where the first material is etched away, including:

[0018] Etch a part of the protective material to the end face of the substrate to obtain a columnar space, and use the position where the columnar space is located as the target position.

[0019] Deposit a nanomaterial in the columnar space to make the nanomaterial completely fill the columnar space, and use the nanomaterial filled in the columnar space as the first part of the nanocolumn; through chemical mechanical polishing and etching, make the height of the protective material the same as the height of the nanomaterial.

[0020] In an alternative design, etch the nanomaterial to retain the nanomaterial at the target position of the nanocolumn, including:

[0021] Etch the nanomaterial outside the target position to the end face formed by the second material and the first material, and retain the nanomaterial at the target position to obtain the second part of the nanocolumn.

[0022] In an alternative design, the first part of the nanocolumn and the second part of the nanocolumn are stacked in a direction perpendicular to the substrate end face to obtain the nanocolumn.

[0023] In an alternative design, the nanomaterials of the first part of the nanocolumn are different from those of the second part of the nanocolumn, or

[0024] the nanomaterials of different nanocolumns in the optical device are different.

[0025] In an alternative design, the protective material plated on the end face of the substrate is different from the protective material plated on the end face formed by the second material and the first material, or

[0026] the protective materials around different nanocolumns in the optical device are different.

[0027] In an alternative design, the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10, including:

[0028] taking the sum of the height of the first part of the nanocolumn and the height of the second part of the nanocolumn as the height of the nanocolumn;

[0029] taking the diameter of the columnar space or the width of the nanomaterial remaining on the end face of the substrate as the width of the nanocolumn;

[0030] the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10.

[0031] In an alternative design, the heights and / or widths of different nanocolumns in the optical device are different.

[0032] The present application provides a method for fabricating an optical device based on high aspect ratio nanocolumns. For any nanocolumn in the optical device, the method includes: plating a first material on the end face of a substrate so that the first material covers the entire end face of the substrate; etching part of the first material to obtain a target position for setting the nanocolumn, and plating a second material at the end face of the substrate where the first material has been etched away so that the second material has the same height as the first material; plating a nanomaterial on the end face formed by the second material and the first material so that the nanomaterial covers the entire end face; etching the nanomaterial to retain the nanomaterial at the target position of the nanocolumn, obtaining a nanocolumn, where the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10; plating a protective material on the part where the nanomaterial has been etched away to support the nanocolumn. By first plating a first layer of material on the end face of the substrate and then plating a second layer of material on the end face of the first layer of material, the height of the nanocolumn is increased while keeping the width of the nanocolumn unchanged, thereby increasing the aspect ratio of the nanocolumn. In addition, by filling a protective material around the nanocolumn, the nanocolumn is supported to prevent it from toppling. Description of the Drawings

[0033] To more clearly illustrate the technical solution of the present application, the accompanying drawings required for use in the embodiments will be briefly introduced below. Obviously, for those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0034] Figure 1 It is a flowchart of a method for fabricating an optical device based on high aspect ratio nanocolumns provided by an embodiment of the present application;

[0035] Figure 2 It is a flowchart of a second exemplary method for fabricating an optical device based on high aspect ratio nanocolumns provided by an embodiment of the present application;

[0036] Figure 3 It is a flowchart of a third exemplary method for fabricating an optical device based on high aspect ratio nanocolumns provided by an embodiment of the present application. Specific embodiments

[0037] Next, the technical solution of the embodiments of the present application will be described in conjunction with the accompanying drawings in the embodiments of the present application.

[0038] The terms used in the following embodiments of the present application are only for the purpose of describing specific embodiments and are not intended to limit the present application. As used in the specification and appended claims of the present application, the singular forms "a", "an", "the", "above-mentioned", "said", and "this" are also intended to include the plural forms, unless clearly indicated to the contrary in the context. It should also be understood that although the terms first, second, etc. may be used in the following embodiments to describe a certain type of object, the object should not be limited to these terms. These terms are only used to distinguish specific objects of this type of object. For example, the terms first, second, etc. may be used in the following embodiments to describe materials, but the materials should not be limited to these terms. These terms are only used to distinguish different materials. The same applies to other types of objects that may be described by the terms first, second, etc. in the following embodiments, and will not be elaborated here.

[0039] The embodiments of the present application provide a method for fabricating an optical device based on high aspect ratio nanocolumns, which can fabricate high aspect ratio nanocolumns and is not prone to lodging.

[0040] The following introduces the method for fabricating an optical device based on high aspect ratio nanocolumns involved in the embodiments of the present application through several implementation manners.

[0041] As Figure 1 shown, Figure 1Schematically shows a method 100 for fabricating an optical device based on high aspect ratio nanocolumns (hereinafter referred to as method 100). For any nanocolumn in the optical device, method 100 includes the following steps:

[0042] Step S101, deposit a first material on the end face of the substrate such that the first material covers the entire end face of the substrate.

[0043] Step S102, etch part of the first material to obtain the target position for setting the nanocolumn, and deposit a second material on the end face of the substrate where the first material has been etched away such that the second material has the same height as the first material.

[0044] Step S103, deposit a nanomaterial on the end face formed by the second material and the first material such that the nanomaterial covers the entire end face.

[0045] Step S104, etch the nanomaterial to retain the nanomaterial at the target position of the nanocolumn, obtaining a nanocolumn, and the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10.

[0046] Step S105, deposit a protective material on the part where the nanomaterial has been etched away to support the nanocolumn.

[0047] In some optional embodiments, when the first material is a nanomaterial, the second material is a protective material; or, when the first material is a protective material, the second material is a nanomaterial.

[0048] For ease of understanding, method 100 is described in detail below with examples.

[0049] As Figure 2 shown, an exemplary method 200 for fabricating an optical device based on high aspect ratio nanocolumns provided by an embodiment of the present application (hereinafter referred to as method 200) is, for example, an exemplary implementation of method 100 when the first material is a nanomaterial.

[0050] Method 200 includes the following steps:

[0051] Step S201, deposit a first nanomaterial on the end face of the substrate such that the first nanomaterial covers the entire end face of the substrate.

[0052] Step S202, etch part of the first nanomaterial to the end face of the substrate, take the position where the other remaining part of the first nanomaterial is located as the target position, and take the other remaining part of the first nanomaterial as the first part of the nanocolumn.

[0053] Step S203, deposit a first protective material on the etched end face of the substrate, such that the height of the first protective material is the same as the height of the first nanomaterial.

[0054] Step S204, deposit a second nanomaterial on the end face formed by the first nanomaterial and the first protective material, such that the second nanomaterial covers the entire end face.

[0055] Step S205, etch the second nanomaterial outside the target position to the end face formed by the first nanomaterial and the first protective material, and retain the second nanomaterial at the target position to obtain the second part of the nanocolumn.

[0056] Step S206, deposit a second protective material on the part where the second nanomaterial has been etched away to support the nanocolumn.

[0057] In this embodiment, as Figure 2 shown, first deposit a first nanomaterial on the end face of the substrate, such that the first nanomaterial covers the entire end face of the substrate; deposit a photoresist on the surface of the first nanomaterial, and perform photolithography according to the preset position of the nanocolumn, only retaining the photoresist at the top of the nanocolumn; etch the first nanomaterial according to the position of the photoresist, and the retained first nanomaterial is the first part of the nanocolumn. At the same time, the position where the first nanomaterial is retained is the target position of the nanocolumn; deposit a first protective material on the remaining end face of the substrate. After chemical mechanical polishing and etching, the height of the first protective material is the same as the height of the first nanomaterial, i.e., the first part of the nanocolumn; then, deposit a second nanomaterial on the end face formed by the first nanomaterial and the first protective material; deposit a photoresist on the surface of the second nanomaterial, etch according to the target position of the nanocolumn, and retain the second nanomaterial at the target position as the second part of the nanocolumn; finally, deposit a second protective material on the end face formed by the first nanomaterial and the first protective material to support the nanocolumn so that it will not fall down. The photoresist part can be replaced by a photoresist plus an antireflection layer and a hard mask material, and the function is the same as transferring the photolithography pattern to the nanomaterial layer.

[0058] In this embodiment, by decomposing the high aspect ratio nanocolumn into two sections for separate fabrication, the fabrication process is simplified, and a nanocolumn with a large aspect ratio can be fabricated completely. At the same time, a protective material is filled to protect the nanocolumn from falling down easily.

[0059] Figure 2 The fabrication method shown is only an optional fabrication method of the embodiment of the present invention, and does not constitute a limitation on the fabrication method of the optical device based on the high aspect ratio nanocolumn in the embodiments of the present application. In other embodiments, the technical solution of the present invention also provides other fabrication methods.

[0060] For example, asFigure 3 As shown in Figure 3 , an exemplary method 300 for fabricating an optical device based on high aspect ratio nanocolumns (hereinafter referred to as method 300) is provided in an embodiment of the present application. Method 300 is, for example, an exemplary implementation of method 100 when the first material is a protective material.

[0061] Method 300 includes the following steps:

[0062] Step S301: Deposit a first protective material on the end face of the substrate so that the first protective material covers the entire end face of the substrate.

[0063] Step S302: Etch a part of the first protective material to the end face of the substrate to obtain a columnar space, and take the position where the columnar space is located as the target position.

[0064] Step S303: Deposit a first nanomaterial in the columnar space so that the first nanomaterial completely fills the columnar space, and take the first nanomaterial filled in the columnar space as the first part of the nanocolumn. After chemical mechanical polishing and etching, make the height of the protective material the same as the height of the nanomaterial.

[0065] Step S304: Deposit a second nanomaterial on the end face formed by the first nanomaterial and the first protective material so that the second nanomaterial covers the entire end face.

[0066] Step S305: Etch the second nanomaterial outside the target position to the end face formed by the first nanomaterial and the first protective material, and retain the second nanomaterial at the target position to obtain the second part of the nanocolumn.

[0067] Step S306: Deposit a second protective material on the part where the second nanomaterial is etched away to support the nanocolumn.

[0068] In this embodiment, as Figure 3As shown, first deposit a first protective material on the end face of the substrate so that the first protective material covers the entire end face of the substrate; according to the preset positions of the nanocolumns, deposit photoresist on the surface of the first protective material and perform photolithography; according to the preset positions of the nanocolumns, etch the first protective material, and the resulting columnar space is the target position where the nanocolumns are located; fill the columnar space with a first nanomaterial so that the nanomaterial is completely filled without gaps, and the first nanomaterial filled into the columnar space is the first part of the nanocolumn; through chemical mechanical polishing and etching, make the height of the protective material the same as the height of the nanomaterial. Deposit a second nanomaterial on the end face formed by the first nanomaterial and the first protective material; deposit photoresist on the surface of the second nanomaterial, and etch according to the target positions of the nanocolumns, and the remaining second nanomaterial is the second part of the nanocolumn. The first part and the second part are connected and combined to form the nanocolumn; finally, deposit a second protective material on the end face formed by the first nanomaterial and the first protective material to support the nanocolumn.

[0069] In some other embodiments, when the first nanomaterial and the second nanomaterial are the same material, the operations in the above step S303 and the operations in the above step S304 can be carried out simultaneously. The operations of filling the holes and depositing the second layer of nanomaterial are completed in one step, which simplifies the manufacturing steps, can also manufacture nanocolumns with a high aspect ratio, and at the same time ensures the mechanical stability of the nanocolumns. The protective material is used to support and prevent the nanocolumns from toppling.

[0070] It can be understood that the method 200 is only a schematic description of an embodiment of the present invention and does not constitute a limitation on the embodiments of the present application. In other embodiments, there may be other manufacturing methods.

[0071] In some embodiments of the present invention, the first part of the nanocolumn and the second part of the nanocolumn are stacked in a direction perpendicular to the end face of the substrate to obtain the nanocolumn. They may also not be stacked.

[0072] In this embodiment, the projections of the first part of the nanocolumn and the second part of the nanocolumn in a direction perpendicular to the end face of the substrate coincide, that is, the upper end of the first part of the column body is connected to the lower end of the second part of the column body, forming the entire nanocolumn.

[0073] In some embodiments of the present invention, the nanomaterials of the first part of the nanocolumn and the nanomaterials of the second part of the nanocolumn are different, or,

[0074] the nanomaterials of the multiple nanocolumns in the optical device are different.

[0075] In this embodiment, the nanomaterials of the first part and the second part of the nanorod can be the same or different, that is, the above-mentioned first nanomaterial and second nanomaterial can be the same or different. When the first nanomaterial and the second nanomaterial are the same, as Figure 2 , Figure 3 shown, the whole nanorod is composed of the same material, and the nanomaterials contained in multiple nanorods in the optical device are different, that is, the nanomaterials of different nanorods are different. Of course, according to the different functions designed for the nanorods, different materials can be selected for the nanomaterial of the first part and the nanomaterial of the second part to meet the optical functions of the optical device. In this case, an antireflection film can be deposited at the interface of the two materials to increase the mechanical stability of the connection.

[0076] In some embodiments of the present invention, the protective material deposited on the end face of the substrate is different from the protective material deposited on the end face formed by the second material and the first material, or

[0077] the protective materials around different nanorods in the optical device are different.

[0078] In this embodiment, the protective material deposited on the end face of the substrate and the protective material deposited on the end face formed by the second material and the first material can be the same or different. The protective material deposited on the end face of the substrate is the first protective material, and the protective material deposited on the end face formed by the first protective material and the first nanomaterial is the second protective material. When the first protective material and the second protective material are the same, as Figure 2 , Figure 3 shown, the two layers of protective materials around the same nanorod are the same material, and the protective materials between multiple nanorods in the optical device are different. Or, the protective material around a nanorod includes two types, that is, the first protective material and the second protective material are different. Since different types of materials have different effects on light processing, the required protective material can be selected according to the function of the optical device.

[0079] In some embodiments of the present invention, the ratio of the height of the nanorod to the width of the nanorod is greater than or equal to 10, including:

[0080] The sum of the height of the first part and the height of the second part of the nanorod is used as the height of the nanorod;

[0081] The diameter of the columnar space or the width of the nanomaterial remaining on the end face of the substrate is used as the width of the nanorod;

[0082] The ratio of the height of the nanorod to the width of the nanorod is greater than or equal to 10.

[0083] In this embodiment, the nanocolumns are composed of a first part and a second part. The widths of the two parts can be different, and the heights can also be different. The sum of the heights of the first part and the second part is the overall height of the nanocolumn. The minimum width between the width of the first part and the width of the second part, or the width of the first part is equal to the width of the entire nanocolumn. The ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10. Based on this, multiple nanocolumns that meet the aspect ratio requirements are used to form an optical device, and such an optical device can achieve more complex optical functions.

[0084] The nanocolumns can have the same total height or different total heights among different ones. That is to say, between different layers, the structural patterns of the nanocolumns can be different. There can be nanocolumns or no nanocolumns at the same position. The nanocolumns can also be selected in shapes and combinations such as circular, elliptical, rectangular, square, polygonal, etc.

[0085] Although a two-layer structure is used in the embodiment, a multi-layer structure can be used in actual use.

[0086] Due to the problem of lithography alignment accuracy in the semiconductor process, there is a horizontal relative displacement between the first and second part columns during actual manufacturing, as Figure 2 and Figure 3 shown.

[0087] In summary, for the method for manufacturing an optical device based on high-aspect-ratio nanocolumns according to the embodiment of the present application, by constructing two layers of nanocolumns, the height of the nanocolumns is increased, and while the width remains unchanged, the aspect ratio of the nanocolumns is increased. In addition, a protective material is filled around the nanocolumns to support the nanocolumns, effectively solving the problem of nanocolumn collapse.

[0088] Although the optional embodiments of the present application have been described, those skilled in the art can make additional changes and modifications once they learn the basic creative concepts. Therefore, the appended claims are intended to be construed to include the preferred embodiments as well as all changes and modifications falling within the scope of the present application.

[0089] The above-described specific embodiments further elaborate on the purpose, technical solution, and beneficial effects of the present application. It should be understood that the above description is only the specific embodiments of the present application and is not used to limit the protection scope of the present application. Any modifications, equivalent replacements, improvements, etc. made on the basis of the technical solution of the present application should be included within the protection scope of the present invention.

Claims

1. A manufacturing method of an optical device based on high aspect ratio nanocolumns, characterized in that, For any one of the nanocolumns in the optical device, the method includes: Depositing a first material on the end face of the substrate such that the first material covers the entire end face of the substrate; Etching part of the first material to obtain a target position for setting the nanocolumn, and depositing a second material on the end face of the substrate where the first material has been etched away such that the height of the second material is the same as that of the first material; Depositing a nanomaterial on the end face formed by the second material and the first material such that the nanomaterial covers the entire end face; Etching the nanomaterial to retain the nanomaterial at the target position of the nanocolumn to obtain a nanocolumn, wherein the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10. Among them, the first material or the second material at the target position forms the first part of the nanocolumn, the nanomaterial at the target position forms the second part of the nanocolumn, the nanomaterial of the first part is different from the nanomaterial of the second part, and an antireflection film is deposited at the interface between the first part and the second part; Depositing a protective material on the part where the nanomaterial has been etched away to support the nanocolumn.

2. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 1, wherein when the first material is a nanomaterial, the second material is a protective material; or when the first material is a protective material, the second material is a nanomaterial.

3. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 2, wherein, When the first material is a nanomaterial, etching part of the first material to obtain a target position for setting the nanocolumn, and depositing a second material on the end face of the substrate where the first material has been etched away, includes: Etching part of the nanomaterial to the end face of the substrate, taking the position where the other part of the nanomaterial is retained as the target position, and taking the other part of the nanomaterial retained as the first part of the nanocolumn; Depositing a protective material on the end face of the substrate obtained by etching, and through chemical mechanical polishing and etching, making the height of the protective material the same as the height of the nanomaterial.

4. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 2, characterized in that, When the first material is a protective material, etching part of the first material to obtain a target position for setting the nanocolumn, and depositing a second material on the end face of the substrate where the first material has been etched away, includes: Etching part of the protective material to the end face of the substrate to obtain a columnar space, and taking the position of the columnar space as the target position; Depositing a nanomaterial in the columnar space such that the nanomaterial completely fills the columnar space, and taking the nanomaterial filled in the columnar space as the first part of the nanocolumn; Through chemical mechanical polishing and etching, making the height of the protective material the same as the height of the nanomaterial.

5. The method for fabricating an optical device based on high aspect ratio nanocolumns as claimed in claim 3 or 4, wherein Etching the nanomaterial to retain the nanomaterial at the target position of the nanocolumn, includes: Etching the nanomaterial outside the target position to the end face formed by the second material and the first material, and retaining the nanomaterial at the target position to obtain the second part of the nanocolumn.

6. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 5, characterized in that, The first part of the nanocolumn and the second part of the nanocolumn are stacked in a direction perpendicular to the end face of the substrate to obtain the nanocolumn.

7. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 5, wherein The nanomaterials of different nanocolumns in the optical device are different.

8. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 5, wherein The protective material plated on the end face of the substrate is different from the protective material plated on the end face formed by the second material and the first material, or The protective materials around different nanocolumns in the optical device are different.

9. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 6, wherein The first material is a nanomaterial, and the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10, including: Taking the sum of the height of the first part of the nanocolumn and the height of the second part of the nanocolumn as the height of the nanocolumn; Taking the width of the nanomaterial remaining on the end face of the substrate as the width of the nanocolumn; The ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10.

10. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 6, wherein, The first material is a protective material, and the ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10, including: Taking the sum of the height of the first part of the nanocolumn and the height of the second part of the nanocolumn as the height of the nanocolumn; Taking the diameter of the columnar space as the width of the nanocolumn; The ratio of the height of the nanocolumn to the width of the nanocolumn is greater than or equal to 10.

11. The method for fabricating an optical device based on high aspect ratio nanocolumns according to claim 1, characterized in that, For different nanocolumns in the optical device, the height and / or width are different.

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