Electromagnetic wave reflection structure and method for manufacturing the same

Abstract

The present invention provides an electromagnetic wave reflection structure that reduces the costs of deployment and maintenance. The present invention also provides a manufacturing method of an electromagnetic wave reflection structure, comprising the following steps: presetting an operating frequency of an electromagnetic wave, a reflection wave pointing angle, an incident wave pointing angle, and an incident distance; obtaining a phase distribution of an electromagnetic wave reflection structure of the electromagnetic wave reflection structure according to the operating frequency, the reflection wave pointing angle, the incident wave pointing angle, and the incident distance; and corresponding a reflection unit phase curve of the reflection unit at the operating frequency according to the phase distribution of the electromagnetic wave reflection structure, so as to arrange the plurality of reflection units on a substrate.

Description

Technical Field

[0001] The present invention relates to an electromagnetic wave reflection structure and a manufacturing method thereof, and particularly to an electromagnetic wave reflection structure and a manufacturing method thereof which are manufactured by calculating a phase distribution of the electromagnetic wave reflection structure and arranging a plurality of reflection units. Background Art

[0002] In a mobile communication system, due to the short wavelength and high loss of electromagnetic waves, as well as the shielding of buildings, trees, furniture, signs, etc., communication dead zones, dark areas, or areas with weak signals often occur. The existing solution is to add base stations (Base Stations) or amplifiers (Amplifiers). Therefore, when building base stations, closely building thousands of small base stations or amplifiers will become a large project that costs a huge amount of money and a large amount of manpower, and also consumes a considerable amount of electricity. The subsequent maintenance project is even more time-consuming and laborious, and even causes psychological pressure on the residents living near the base stations. Summary of the Invention

[0003] Therefore, a first object of the present invention is to provide an electromagnetic wave reflection structure that reduces the cost of construction and maintenance.

[0004] Thus, the electromagnetic wave reflection structure of the present invention is used to reflect a reflected wave pointing angle after an electromagnetic wave from an electromagnetic wave source is incident at an incident wave pointing angle, wherein the electromagnetic wave has an operating frequency, and the electromagnetic wave reflection structure includes a substrate and a plurality of reflection units.

[0005] The substrate includes a surface, and the surface defines a reference point. The plurality of reflection units are arranged on the surface. A reflection phase shift of the i-th reflection unit among the plurality of reflection units is related to a coordinate position of the i-th reflection unit relative to the reference point, a wave number of the operating frequency, the reflected wave pointing angle, and an incident distance of the electromagnetic wave source to the i-th reflection unit. The size of the i-th reflection unit among the plurality of reflection units is related to the reflection phase shift of the i-th reflection unit on the substrate and a reflection phase of any reflection unit at the operating frequency.

[0006] A second object of the present invention is to provide an electromagnetic wave reflection structure that reduces the cost of construction and maintenance.

[0007] Thus, the electromagnetic wave reflection structure of the present invention is used to reflect a plurality of reflected wave pointing angles after a plurality of electromagnetic waves from a plurality of electromagnetic wave sources are incident at a plurality of incident wave pointing angles, wherein each electromagnetic wave has an operating frequency, and the electromagnetic wave reflection structure includes a substrate and a plurality of reflection units.

[0008] The substrate includes a surface, and the surface defines a reference point. The plurality of reflection units are disposed on the surface. Among them, a combined reflection phase shift of the i-th reflection unit among the plurality of reflection units is associated with phasor superposition of a plurality of reflection phase shifts of the i-th reflection unit corresponding to the plurality of electromagnetic waves. Each reflection phase shift of the i-th reflection unit is associated with a coordinate position of the i-th reflection unit relative to the reference point, an operating frequency wave number, a reflection wave pointing angle, and an incident distance of one of the electromagnetic wave sources to the i-th reflection unit. The size of the i-th reflection unit among the plurality of reflection units is associated with the combined reflection phase shift of the i-th reflection unit on the substrate and a reflection phase of any reflection unit at the operating frequency.

[0009] A third object of the present invention is to provide a reflection unit with a wide bandwidth and various sizes applicable.

[0010] Thus, the reflection unit of the present invention includes two first metal sheets and two second metal sheets.

[0011] Each first metal sheet is in a horseshoe shape. The plurality of first metal sheets are arranged opposite to each other to form a rectangle, and there is a first spacing between the plurality of first metal sheets. Each second metal sheet is in a rectangular shape. The plurality of second metal sheets are arranged adjacent to each other among the plurality of first metal sheets, and the plurality of second metal sheets maintain a second spacing.

[0012] A fourth object of the present invention is to provide an electromagnetic wave reflection structure that reduces the costs of deployment and maintenance.

[0013] Thus, the electromagnetic wave reflection structure of the present invention is used to reflect an electromagnetic wave from an electromagnetic wave source at an incident wave pointing angle into a plurality of reflection wave pointing angles. The electromagnetic wave has an operating frequency. The electromagnetic wave reflection structure includes a substrate and a plurality of reflection units.

[0014] The substrate includes a surface, and the surface defines a reference point. The plurality of reflection units are disposed on the surface. Among them, a combined reflection phase shift of the i-th reflection unit among the plurality of reflection units is associated with phasor superposition of a plurality of reflection phase shifts of the i-th reflection unit corresponding to the electromagnetic wave. Each reflection phase shift of the i-th reflection unit is associated with a coordinate position of the i-th reflection unit relative to the reference point, an operating frequency wave number, a reflection wave pointing angle, and an incident distance of the electromagnetic wave source to the i-th reflection unit. The size of the i-th reflection unit among the plurality of reflection units is associated with the combined reflection phase shift of the i-th reflection unit on the substrate and a reflection phase of any reflection unit at the operating frequency.

[0015] A fifth object of the present invention is to provide a manufacturing method of an electromagnetic wave reflection structure that reduces the costs of deployment and maintenance.

[0016] Thus, the manufacturing method of the electromagnetic wave reflection structure of the present invention includes the following steps.

[0017] Preset an operating frequency, an incident wave pointing angle, and an incident distance corresponding to each of multiple electromagnetic waves, preset multiple reflection wave pointing angles of the multiple electromagnetic wave reflections, obtain an electromagnetic wave reflection structure phase distribution of an electromagnetic wave reflection structure according to the operating frequency, one of the reflection wave pointing angles, the incident wave pointing angle, and the incident distance of each electromagnetic wave, convert the electromagnetic wave reflection structure phase distributions of the multiple electromagnetic wave reflection structures corresponding to different reflection wave pointing angles of the multiple electromagnetic waves into multiple electromagnetic wave reflection structure phasor distributions respectively, perform phasor superposition on the multiple electromagnetic wave reflection structure phasor distributions and then obtain a synthesized electromagnetic wave reflection structure phase distribution through a conversion, and obtain a reflection unit phase curve of a reflection unit at the operating frequency according to the synthesized electromagnetic wave reflection structure phase distribution, so as to arrange the multiple reflection units on a substrate.

[0018] The sixth object of the present invention is to provide a manufacturing method of an electromagnetic wave reflection structure that reduces the costs of deployment and maintenance.

[0019] Thus, the manufacturing method of the electromagnetic wave reflection structure of the present invention includes the following steps.

[0020] Preset an operating frequency, multiple reflection wave pointing angles, an incident wave pointing angle, and an incident distance corresponding to an electromagnetic wave, obtain respective electromagnetic wave reflection structure phase distributions of multiple electromagnetic wave reflection structures according to the operating frequency, the multiple reflection wave pointing angles, the incident wave pointing angle, and the incident distance of the electromagnetic wave, convert the electromagnetic wave reflection structure phase distributions of the multiple electromagnetic wave reflection structures into multiple electromagnetic wave reflection structure phasor distributions respectively, perform phasor superposition on the multiple electromagnetic wave reflection structure phasor distributions, and then obtain a synthesized electromagnetic wave reflection structure phase distribution through a conversion, and obtain a reflection unit phase curve of a reflection unit at the operating frequency according to the synthesized electromagnetic wave reflection structure phase distribution, so as to arrange the multiple reflection units on a substrate.

[0021] The seventh object of the present invention is to provide an electromagnetic wave reflection structure that reduces the costs of deployment and maintenance.

[0022] Thus, the electromagnetic wave reflection structure of the present invention is used to reflect multiple electromagnetic waves from multiple electromagnetic wave sources with multiple incident wave pointing angles into a single reflected wave pointing angle. Each electromagnetic wave has an operating frequency. The electromagnetic wave reflection structure includes a substrate and multiple reflection units. The substrate includes a surface, and the surface defines a reference point. The multiple reflection units are disposed on the surface. It is characterized in that a combined reflection phase shift of the i-th reflection unit among the multiple reflection units is obtained by phasor superposition of multiple reflection phase shifts corresponding to multiple incident distances of different electromagnetic wave sources of the i-th reflection unit. Each reflection phase shift of the i-th reflection unit is related to a coordinate position of the i-th reflection unit relative to the reference point, a wave number of the operating frequency, the reflected wave pointing angle, and an incident distance of one of the electromagnetic wave sources to the i-th reflection unit. The size of the i-th reflection unit among the multiple reflection units is related to the combined reflection phase shift of the i-th reflection unit on the substrate and a reflection phase of any reflection unit at the operating frequency.

[0023] The following effects can be achieved according to the above technical features:

[0024] 1. The manufacturing and deployment processes of the electromagnetic wave reflection structure cost less. The electromagnetic wave reflection structure does not consume power, so it does not require special maintenance and is energy-saving.

[0025] 2. The electromagnetic wave reflection structure does not consume power and can reflect the electromagnetic wave to the dead corner of communication to make the electromagnetic wave signal good. There is no radiation of the electromagnetic wave when not in use, and it is in a thin plate form, occupying a small space and being compatible with the decoration of the surrounding buildings.

[0026] 3. Due to the structure of the reflection unit, the phase curve of the reflection unit is smooth and the slope is not zero. Therefore, the sizes within the size range corresponding to the operating frequency of the reflection unit can all be used. Moreover, the structures of the multiple reflection units in different frequency bands present an equidistant pattern in the phase curves of the multiple reflection units. Thus, the reflection unit can be applied in a wide frequency band.

[0027] 4. By obtaining the phase distribution of the combined electromagnetic wave reflection structure, an electromagnetic wave reflection structure with single-beam incidence and multi-beam reflection, or multi-beam incidence and multi-beam reflection, or multi-beam incidence and single-beam reflection can be manufactured, making the application more extensive.

[0028] 5. By mixing and arranging the multiple reflection units with different structures on the substrate, the energy intensity of the side lobes can be more effectively reduced, making the reflection at the set reflected wave pointing angle achieve better directivity. Description of the Drawings

[0029] Figure 1 ​is a flowchart showing the process of a first embodiment of the manufacturing method of the electromagnetic wave reflection structure of the present invention.

[0030] Figure 2 is a schematic diagram showing the structure of a reflection unit of the first embodiment.

[0031] Figure 3 is a three-dimensional view showing the structure of the reflection unit of the first embodiment established using a simulation software.

[0032] Figure 4 is a simulation diagram showing the phase curves of multiple reflection units at the 27 GHz, 28 GHz, and 29 GHz frequency bands.

[0033] Figure 5 is a simulation diagram showing the phase curves of multiple reflection units when the incident wave pointing angles are 0 degrees, 10 degrees, 20 degrees, 30 degrees, 40 degrees, and 50 degrees respectively.

[0034] Figure 6 is a schematic diagram showing a feed antenna emitting an electromagnetic wave to an electromagnetic wave reflection structure.

[0035] Figure 7 is a simulation diagram showing the phase distribution of an electromagnetic wave reflection structure.

[0036] Figure 8 is a simulation diagram showing the phase distribution of the electromagnetic wave reflection structure after principal value processing.

[0037] Figure 9 is a schematic diagram showing the state of the manufactured electromagnetic wave reflection structure when the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is -30 degrees.

[0038] Figure 10 is a simulation diagram showing the three-dimensional field pattern of the electromagnetic wave reflection structure.

[0039] Figure 11 is a simulation diagram showing the two-dimensional field pattern of the electromagnetic wave reflection structure.

[0040] Figure 12 is a measurement and simulation diagram showing the variation of the gain of the electromagnetic wave reflection structure with the reflected wave pointing angle.

[0041] Figure 13 is a schematic diagram showing the state of the manufactured electromagnetic wave reflection structure when the incident wave pointing angle is 30 degrees and the reflected wave pointing angle is -15 degrees.

[0042] ​​​​​​​​​​​​​Figure 14 is a measurement and simulation diagram showing the variation of the gain of the electromagnetic wave reflection structure with the pointing angle of the reflected wave.

[0043] Figure 15 is a schematic diagram showing the state of the manufactured electromagnetic wave reflection structure when the pointing angle of the incident wave is 30 degrees and the pointing angle of the reflected wave is -45 degrees.

[0044] Figure 16 is a measurement and simulation diagram showing the variation of the gain of the electromagnetic wave reflection structure with the pointing angle of the reflected wave.

[0045] Figure 17 is a simulation diagram showing the state of the manufactured electromagnetic wave reflection structure when the pointing angle of the incident wave is 0 degrees and the pointing angle of the reflected wave is -45 degrees.

[0046] Figure 18 is a simulation diagram showing the variation of the gain of the electromagnetic wave reflection structure with the pointing angle of the reflected wave.

[0047] Figure 19 is a simulation diagram showing the state of the manufactured electromagnetic wave reflection structure when the pointing angle of the incident wave is 0 degrees and the pointing angle of the reflected wave is -60 degrees.

[0048] Figure 20 is a simulation diagram showing the variation of the gain of the electromagnetic wave reflection structure with the pointing angle of the reflected wave.

[0049] Figure 21 is a flowchart showing the process of a second embodiment of the manufacturing method of the electromagnetic wave reflection structure of the present invention.

[0050] Figure 22 is a simulation diagram showing the processing of the phase distribution of the electromagnetic wave reflection structure through the principal value processing.

[0051] Figure 23 is a schematic diagram showing the state of the manufactured electromagnetic wave reflection structure when the pointing angle of the incident wave is 0 degrees and the pointing angles of the multiple reflected waves are 30 degrees and -30 degrees respectively.

[0052] Figure 24 is a measurement and simulation diagram showing the variation of the gain of the electromagnetic wave reflection structure with the pointing angle of the reflected wave.

[0053] Figure 25 is a three-dimensional diagram showing the structure of a second reflection unit established using the simulation software.

[0054] Figure 26 ​​​​​​​​​​​​is an analog diagram illustrating multiple phase curves of the structure of the second reflection unit at the 27 GHz, 28 GHz, and 29 GHz frequency bands.

[0055] Figure 27 is a schematic diagram illustrating the fabricated first electromagnetic wave reflection structure in the state when the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is 30 degrees.

[0056] Figure 28 is a schematic diagram illustrating the fabricated second electromagnetic wave reflection structure in the state when the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is 30 degrees.

[0057] Figure 29 is a measurement diagram illustrating the change of the gain and the reflected wave pointing angle of the first embodiment, the first electromagnetic wave reflection structure, and the second electromagnetic wave reflection structure when the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is 30 degrees.

[0058] Figure 30 is an analog diagram illustrating a phase curve of the second reflection unit at the 13.325 GHz frequency band.

[0059] Figure 31 is a three-dimensional diagram illustrating the structure of a third reflection unit established using the simulation software.

[0060] Figure 32 is an analog diagram illustrating a phase curve of the third reflection unit at the 24 GHz frequency band.

[0061] Figure 33 is a three-dimensional diagram illustrating the structure of a fourth reflection unit established using the simulation software.

[0062] Figure 34 is an analog diagram illustrating a phase curve of the fourth reflection unit at the 10 GHz frequency band.

[0063] Figure 35 is a three-dimensional diagram illustrating the structure of a fifth reflection unit established using the simulation software.

[0064] Figure 36 is an analog diagram illustrating a phase curve of the fifth reflection unit at the 28 GHz frequency band.

[0065] Figure 37 is a three-dimensional diagram illustrating the structure of a sixth reflection unit established using the simulation software.

[0066] Figure 38 is an analog diagram illustrating a phase curve of the sixth reflection unit at the 28 GHz frequency band.​​​​​​​​​​​​

[0067] Figure 39 is an analog diagram showing the phase curves of multiple reflection units of a first reflection unit in the frequency bands of 3.4 GHz, 3.5 GHz, and 3.6 GHz.

[0068] Figure 40 is a schematic diagram showing the state of the electromagnetic wave reflection structure manufactured in the 3.5 GHz frequency band when the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is -30 degrees.

[0069] Figure 41 is an analog diagram showing the variation of the gain of the electromagnetic wave reflection structure and the reflected wave pointing angle in the 3.5 GHz frequency band.

[0070] Figure 42 is an analog diagram showing the phase curves of multiple reflection units of the first reflection unit in the frequency bands of 13 GHz, 14 GHz, and 15 GHz.

[0071] List of reference numerals: S01: preset parameter step; S02: step of obtaining the phase curve of the reflection unit; S03: step of obtaining the phase distribution of the electromagnetic wave reflection structure; S04: step of translating the principal value of the phase; S05: setting arrangement step; S06: step of obtaining the phase distribution of the synthesized electromagnetic wave reflection structure; 1: substrate; 2: reflection unit; 21: first metal sheet; 211: extension section; 212: turning section; 22: second metal sheet; 23: first spacing; 24: second spacing; 3: feeding antenna; L: dimension; W: width of the turning section; P: width of the first spacing; S: width of the second spacing; A: length of the extension section; B: length of the turning section; D: width of the second metal sheet; (xi, yi): coordinate position of the i-th reflection unit relative to the reference point; (θB, ΦB): reflected wave pointing angle; di: incident distance of the center of the incident electromagnetic wave to the i-th reflection unit; (xF, yF, zF): spatial coordinates of the electromagnetic wave source relative to the reference point; (θF, ΦF): incident wave pointing angle; 2a: second reflection unit; 2b: third reflection unit; 2c: fourth reflection unit; 2d: fifth reflection unit; 2e: sixth reflection unit. Detailed implementation manners

[0072] Combining the above technical features, the main effects of the electromagnetic wave reflection structure and its manufacturing method of the present invention will be clearly presented in the following embodiments.

[0073] Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

[0074] Refer to Figures 1 to 3 ​​​​, a first embodiment of the manufacturing method of the electromagnetic wave reflection structure of the present invention includes a preset parameter step S01, a step S02 of obtaining the phase curve of the reflection unit, a step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure, a phase principal value translation step S04, and an arrangement setting step S05. An electromagnetic wave reflection structure obtained by the manufacturing method of the electromagnetic wave reflection structure includes a substrate 1 and a plurality of reflection units 2.

[0075] Refer to Figure 2 , Figure 3 and Figure 9 , the plurality of reflection units 2 are arranged on the substrate 1. The substrate 1 is generally rectangular. In this example, the substrate 1 is a glass-reinforced hydrocarbon and ceramic laminate of high-frequency microwave board material, and the thickness is 1.524 mm. The electromagnetic wave reflection structure further includes a metal layer, and the metal layer is arranged at the bottom of the substrate 1. Each reflection unit 2 includes two first metal sheets 21 and two second metal sheets 22. Each first metal sheet 21 is in a horseshoe shape and includes an extension section 211 and two turning sections 212. The plurality of turning sections 212 are respectively connected to both sides of the extension section 211 and extend in a direction perpendicular to the extension section 211. The widths W of the extension section 211 and the turning sections 212 of each first metal sheet 21 are substantially the same. The plurality of first metal sheets 21 are arranged opposite to each other to form a rectangle, and there is a first spacing 23 between the plurality of first metal sheets 21. Each second metal sheet 21 is in a rectangle. The plurality of second metal sheets 22 are arranged adjacent to each other in the rectangle formed by the plurality of first metal sheets 21, and the plurality of second metal sheets maintain a second spacing 24. Wherein, the size L of each reflection unit 2 is the length of any one of the second metal sheets 22. When the width P of the first spacing 23, the width S of the second spacing 24, the width W of any one of the turning sections 212, and the distance between any one of the second metal sheets 22 and the adjacent plurality of first metal sheets 21 are twice the width W of any one of the turning sections 212 are all fixed, the length A of any one of the extension sections 211 is substantially equal to the length of each second metal sheet 22 plus six times the width W of any one of the turning sections 212. The length B of each turning section 212 is substantially equal to half of the length A of any one of the extension sections 211 minus the width P of the first spacing 23. The width D of each second metal sheet 22 is substantially equal to half of the length of each second metal sheet 22 which is the size L minus the width S of the second spacing 24. It should be added that the above "substantially equal to" covers a range of 5% manufacturing error.

[0076] Refer to Figures 3 to 5, a model is established using an electromagnetic simulation software. The model is to set one of the reflection units 2 on the substrate 1 that matches its size. From the phase curves of each reflection unit 2 at the frequencies of 27 GHz, 28 GHz, and 29 GHz, it can be seen that within the range of the size of each reflection unit 2 from 0.5 mm to 3.8 mm, the multiple reflection unit phase curves show an equidistant pattern, and the multiple curves are smooth and the slopes are non-zero. Therefore, each reflection unit has a broadband width of at least 3 GHz, and when the incident angle of an electromagnetic wave ranges from 0 degrees to 50 degrees, the slopes of the multiple curves are non-zero. Therefore, any size within the range of 0.5 mm to 3.8 mm of each reflection unit 2 can correspond to a reflection phase.

[0077] Refer to Figure 1 , in the preset parameter step S01, an operating frequency, a reflection angle of the reflected wave, an incident angle of the incident wave, and an incident distance of the electromagnetic wave are preset. In this example, the reflection angle of the reflected wave is the angle between a normal vector of the electromagnetic wave reflection structure and the reflected electromagnetic wave, and the incident angle of the incident wave is the angle between a normal vector of the electromagnetic wave reflection structure and the incident electromagnetic wave. When the incident angle of the incident wave is 0 degrees, the reflection angle of the reflected wave can be between -60 degrees and 60 degrees. In this example, the reflection angle of the reflected wave is -30 degrees, and the operating frequency is the electromagnetic wave of 5G mobile communication, and the frequency band is 28 GHz for illustration, but not limited thereto.

[0078] Refer to Figure 1 , Figure 3 and Figure 4 , in the step S02 of obtaining the phase curve of the reflection unit, the model of the reflection unit 2 set on the substrate 1 that matches its size is established using the electromagnetic simulation software, and a phase distribution of the model is simulated according to the incident angle of the incident wave and the operating frequency, and the phase curve of any reflection unit 2 is obtained. Among them, the reflection phase of any reflection unit phase curve changes with the size L.

[0079] Refer to Figure 1 , Figure 6 and Figure 7 , in the step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure, a phase distribution of the electromagnetic wave reflection structure is obtained according to the operating frequency, the reflection angle of the reflected wave, the incident angle of the incident wave, and the incident distance. Substitute the operating frequency, the reflection angle of the reflected wave, the incident angle of the incident wave, and the incident distance into the following formula.

[0080] ΦR(xi,yi)=k[di-(xicosΦB+yisinΦB)sinθB]±2Nπ (1)

[0081] di = [(xF - xi)2 + (yF - yi)2 + zF2]0.5 (2)

[0082] cooperate Figure 6 It can be known that (xi, yi) is a coordinate position of the ith reflection unit 2 in the coordinates relative to a reference point, ΦR(xi, yi) is a reflection phase shift of the ith reflection unit 2 in the coordinates, k is an operating frequency wave number, (θB, ΦB) is the pointing angle of the reflected wave and is a spherical coordinate angle, di is the incident distance of the center of the incident electromagnetic wave to the ith reflection unit, (xF, yF, zF) is a space coordinate of the electromagnetic wave source relative to the reference point, (θF, ΦF) is the pointing angle of the incident wave and is also the spherical coordinate angle, and 2Nπ is a phase period multiple. In the design process of this example, the pointing angle ΦB of the incident wave is first set to 0, and the electromagnetic wave reflection structure is arranged in the air, and the operating frequency wave number is set to the operating frequency wave number in vacuum, where Figure 6 a feeding antenna 3 is used to represent the electromagnetic wave source.

[0083] Obtain the phase distribution of the electromagnetic wave reflection structure according to the above formula.

[0084] Refer to Figure 4 、 Figure 7 and Figure 8 , in the phase principal value translation step S04( Figure 1 ), for the phase curve of the reflection unit of the phase distribution of the electromagnetic wave reflection structure corresponding to any reflection unit 2 in the 28 GHz frequency band, the detailed method is to perform a principal value processing on the multiple reflection phase shifts of the phase distribution of the electromagnetic wave reflection structure according to a phase period interval. The principal value processing is to take a principal value of each reflection phase shift within the phase period interval, that is, subtract the phase period multiple from each reflection phase shift and retain the principal value within the phase period interval. In this example, the phase period interval is -180 degrees to 180 degrees. Then, translate the phase distribution of the electromagnetic wave reflection structure after the principal value processing to the range of the size corresponding to the range of the reflection phase of any reflection unit 2 at the operating frequency. For example, if the multiple reflection phase shifts of the phase distribution of the electromagnetic wave reflection structure after the principal value processing are between -180 degrees and 180 degrees, translate them to the range of the reflection phase of any reflection unit 2 from -460 degrees to -100 degrees, and then correspond to the range of the size L. Where Figure 8 one color of each block in corresponds to one of the sizes L of any reflection unit.

[0085] Refer to Figure 4 、 Figure 8 and Figure 9 , in the setting and arrangement step S05( Figure 1In [the reference], according to the phase distribution of the electromagnetic wave reflection structure, for any reflection unit, the phase curve of this reflection unit at the operating frequency is used to set the multiple reflection units 2 on the substrate 1. That is, according to the phase distribution of the electromagnetic wave reflection structure after the principal value processing, it is translated to the range of sizes corresponding to the range of the reflection phase of any reflection unit 2 at the operating frequency, and the multiple reflection units 2 with different sizes L are arranged on the substrate 1.

[0086] Refer to Figure 10 and Figure 11 , which are respectively a three-dimensional field pattern diagram and a two-dimensional cross-sectional field pattern diagram simulated by the electromagnetic simulation software for the electromagnetic wave reflection structure designed according to the above steps. It can be seen from the diagrams that when the pointing angle of the reflected wave is -30 degrees, there is good gain, that is, the electromagnetic wave reflection structure can achieve a good reflection effect when the pointing angle of the reflected wave is -30 degrees.

[0087] Refer to Figure 12 , which is the change of the gain and the pointing angle of the reflected wave for the implementation and simulation of the electromagnetic wave reflection structure designed according to the above steps. It can be seen from the diagrams that both the measured results and the simulation have good gain when the pointing angle of the reflected wave is -30 degrees at the frequency band of 28 GHz, and the simulation results are very close to the measured results of the implementation.

[0088] Refer to Figure 13 and Figure 14 , according to the above steps, the state of the electromagnetic wave reflection structure is designed at the frequency band of 28 GHz when the pointing angle of the incident wave is 30 degrees and the pointing angle of the reflected wave is -15 degrees, and the change of its gain and the pointing angle of the reflected wave for the implementation and simulation. It can be seen from the diagrams that there is good gain when the pointing angle of the reflected wave is -15 degrees, and the simulation results are also very close to the measured results of the implementation.

[0089] Refer to Figure 15 and Figure 16 , according to the above steps, the state of the electromagnetic wave reflection structure is designed at the frequency band of 28 GHz when the pointing angle of the incident wave is 30 degrees and the pointing angle of the reflected wave is -45 degrees, and the change of its gain and the pointing angle of the reflected wave for the implementation and simulation. It can be seen from the diagrams that there is good gain when the pointing angle of the reflected wave is -45 degrees, and the simulation results are also very close to the measured results of the implementation.

[0090] Refer to Figure 17 and Figure 18 , according to the above steps, the state of the electromagnetic wave reflection structure is designed at the frequency band of 28 GHz when the pointing angle of the incident wave is 0 degrees and the pointing angle of the reflected wave is -45 degrees, and the change of its simulated gain and the pointing angle of the reflected wave. It can be seen from the diagrams that there is good gain when the pointing angle of the reflected wave is -45 degrees.

[0091] Refer to Figure 19 and Figure 20 , according to the above steps, an electromagnetic wave reflection structure pattern at a frequency band of 28 GHz is designed, where the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is -60 degrees, and the variation of its simulated gain with the reflected wave pointing angle. It can be seen from the figure that there is good gain when the reflected wave pointing angle is -60 degrees.

[0092] Refer to Figure 21 and Twenty-two Figure, a second embodiment of the manufacturing method of the electromagnetic wave reflection structure of the present invention. To meet more complex environmental requirements, such as when there is only one signal source incident in a similar area but there are two communication dead zones in the environment. At this time, the electromagnetic wave reflection structure with single-beam incidence and multi-beam reflection can achieve the ability to eliminate two communication blind spots and improve the signal coverage rate with a single structure. The second embodiment is similar to the first embodiment, except that the manufacturing method of the electromagnetic wave reflection structure further includes a step S06 of obtaining the phase distribution of the synthetic electromagnetic wave reflection structure, and the step S06 of obtaining the phase distribution of the synthetic electromagnetic wave reflection structure is between the step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure and the step S04 of phase principal value translation.

[0093] In the preset parameter step S01, preset the operating frequency of the electromagnetic wave, multiple reflected wave pointing angles, the incident wave pointing angle, and the incident distance corresponding to the electromagnetic wave. In this example, preset the electromagnetic wave to be in the 28 GHz frequency band, two reflected wave pointing angles, one of the reflected wave pointing angles is 30 degrees, the other reflected wave pointing angle is -30 degrees, the incident wave pointing angle is 0 degrees, and the incident distance is infinite.

[0094] In the step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure, obtain the phase distribution of the electromagnetic wave reflection structure of each electromagnetic wave reflection structure according to the operating frequency of the electromagnetic wave, each reflected wave pointing angle, the incident wave pointing angle, and the incident distance. Substitute each reflected wave pointing angle, the incident wave pointing angle, the incident distance, and the space coordinates of the electromagnetic wave source relative to the reference point into formulas (1) and (2).

[0095] In the step S06 of obtaining the phase distribution of the synthetic electromagnetic wave reflection structure, convert the phase distributions of the electromagnetic wave reflection structures of the multiple electromagnetic wave reflection structures into multiple electromagnetic wave reflection structure phasor distributions respectively, perform a phasor superposition on the multiple electromagnetic wave reflection structure phasor distributions, and then obtain a synthetic electromagnetic wave reflection structure phase distribution through a conversion, where the conversion is to convert a synthesized phasor form into a phase form through mathematics. Therefore, the synthetic electromagnetic wave reflection structure phase distribution has the effect of shaping the reflected multi-beams.

[0096] In the principal value translation step S04 of the phase, according to the phase distribution of the synthetic electromagnetic wave reflection structure corresponding to the phase curve of any reflection unit 2 at the operating frequency, that is, after the principal value processing of the multiple synthetic reflection phase shifts of the phase distribution of the synthetic electromagnetic wave reflection structure according to the phase period interval, as Figure 22 shown, then translate the phase distribution of the synthetic electromagnetic wave reflection structure after the principal value processing to the range of the size corresponding to the range of the reflection phase of any reflection unit 2 at the operating frequency.

[0097] In the setting and arranging step S05, according to the multiple synthetic reflection phase shifts of the phase distribution of the synthetic electromagnetic wave reflection structure, respectively corresponding to the phase curve of any reflection unit 2 at the operating frequency, so as to set the multiple reflection units 2 on the substrate 1, as Figure 23 shown.

[0098] It should be added that if the multiple electromagnetic wave reflection structure phase distributions with two reflection wave pointing angles of 30 degrees and -30 degrees respectively are obtained from the first embodiment and have been subjected to the principal value processing, and then through the step S06 of obtaining the synthetic electromagnetic wave reflection structure phase distribution, the phase distributions of the electromagnetic wave reflection structures of the multiple electromagnetic wave reflection structures are respectively converted into the phasor distributions of the multiple electromagnetic wave reflection structures, then the phasor superposition is performed, and then through the conversion, the synthetic electromagnetic wave reflection structure phase distribution can also be obtained, that is, the order of the original step S06 of obtaining the synthetic electromagnetic wave reflection structure phase distribution and the principal value translation step S04 of the phase is reversed.

[0099] It should be further added that directly combining the multiple electromagnetic wave reflection structures corresponding to multiple different reflection wave pointing angles can also achieve the effect that when an electromagnetic wave is incident, there are reflections at the multiple reflection wave pointing angles corresponding to the combined multiple electromagnetic wave reflection structures respectively.

[0100] Referring to Figure 24 , for the changes in the gain and reflection wave pointing angle of the implementation and simulation of the electromagnetic wave reflection structure designed according to the above steps, it can be seen from the figure that the measured results and the simulation have good gains at the multiple reflection wave pointing angles of 30 degrees and -30 degrees in the frequency band of 28 GHz, and the simulation results are very close to the measured results of the implementation.

[0101] In addition, if there are multiple signal sources incident in close proximity but there are multiple communication dead zones, then the electromagnetic wave reflection structure with multi-beam incidence and multi-beam reflection can achieve the ability to eliminate multiple communication blind spots of different signal sources and improve the signal coverage rate with a single structure. The number of the multiple signal sources does not need to be the same as the number of the multiple communication dead zones. In this case, in the step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure, according to the operating frequency, the incident wave pointing angle, and the incident distance of each electromagnetic wave corresponding to different ones of the multiple reflected wave pointing angles, the multiple phase distributions of the electromagnetic wave reflection structure of each of the multiple electromagnetic wave reflection structures are obtained. Substitute each incident wave pointing angle, each incident distance, and the spatial coordinates of each electromagnetic wave source relative to the reference point corresponding to one of the reflected wave pointing angles into formulas (1) and (2) to obtain one of the phase distributions of the electromagnetic wave reflection structure. Then, in the step S06 of obtaining the phase distribution of the synthesized electromagnetic wave reflection structure, it is substantially the same as the process of the second embodiment, and the phase distribution of the synthesized electromagnetic wave reflection structure is obtained. Therefore, the phase distribution of the synthesized electromagnetic wave reflection structure has the effect of multi-beam incidence and multi-beam reflection.

[0102] Furthermore, if there are multiple signal sources incident in close proximity and there is only one communication dead zone, then the electromagnetic wave reflection structure with multi-beam incidence and single-beam reflection can achieve the ability to eliminate one communication blind spot of different signal sources and improve the signal coverage rate with a single structure. In this case, in the step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure, according to the operating frequency, the incident wave pointing angle, the incident distance, and the reflected wave pointing angle of each electromagnetic wave, the phase distribution of the electromagnetic wave reflection structure of the electromagnetic wave reflection structure is obtained. Substitute each incident wave pointing angle, each incident distance, the spatial coordinates of each electromagnetic wave source relative to the reference point, and the reflected wave pointing angle into formulas (1) and (2). Then, in the step S06 of obtaining the phase distribution of the synthesized electromagnetic wave reflection structure, it is substantially the same as the process of the second embodiment, and the phase distribution of the synthesized electromagnetic wave reflection structure is obtained. Therefore, the phase distribution of the synthesized electromagnetic wave reflection structure has the effect of multi-beam incidence and single-beam reflection.

[0103] It should be further noted that referring to Figure 25 and Figure 26 , the electromagnetic wave reflection structure of this case can also be applied to other existing reflection units. For the convenience of description below, the original reflection unit 2 is denoted as a first reflection unit. Figure 25The existing reflection unit shown is represented as a second reflection unit 2a, which includes two concentrically spaced circular metal sheets. When corresponding to the operating frequencies of 27 GHz, 28 GHz, 29 GHz and the incident wave pointing angle of 0 degrees, from the phase curve of the second reflection unit 2a, it can be seen that the second reflection unit 2a corresponds to a reflection phase that can be changed by the outer radius of a circular metal sheet with the size of the innermost circle. The applicable size range of the second reflection unit 2a is from 0.6 mm to 1.4 mm.

[0104] Refer to Figure 27 and Figure 28 , which are set as a first electromagnetic wave reflection structure and a second electromagnetic wave reflection structure. The first electromagnetic wave reflection structure is that on one half of the substrate 1, the multiple reflection units 2 of this case are arranged, and on the other half, the multiple second reflection units 2a are arranged. The second electromagnetic wave reflection structure is that on the substrate 1, the multiple reflection units 2 of this case and the multiple second reflection units 2a are mixedly arranged.

[0105] Refer to Figure 29 , when the incident wave pointing angle is 0 degrees and the reflected wave pointing angle is -30 degrees, comparing the change of the gain and the reflected wave pointing angle between the first embodiment of this case and the first electromagnetic wave reflection structure and the second electromagnetic wave reflection structure. It can be seen from the figure that all three have good gain when the reflected wave pointing angle is -30 degrees. It should be particularly noted that compared with the electromagnetic wave reflection structure, the first electromagnetic wave reflection structure and the second electromagnetic wave reflection structure can more effectively reduce the energy intensity of the side lobes, making the reflection directivity better at the set reflected wave pointing angle. Therefore, arranging the mixed multiple reflection units 2 and the multiple second reflection units 2a on the substrate 1 can more effectively reduce the energy intensity of the side lobes, making the reflection at the set reflected wave pointing angle achieve better directivity. Even more, the multiple reflection units 2 and the multiple second reflection units 2a arranged on the substrate 1 can also adjust the installation position on the substrate 1 and the structure of the selected multiple reflection units 2 according to the reflection ratio of each reflection unit 2 and each second reflection unit 2a, so as to more effectively reduce the energy intensity of the side lobes.

[0106] Refer to Figure 30 , changing the size of the second reflection unit 2a can also be applied to the operating frequency of 13.325 GHz. In addition, another existing third reflection unit 2b presents a state of three rectangular metal sheets arranged at intervals as Figure 31 shown, and the phase curve of the third reflection unit 2b at the operating frequency of 24 GHz is as Figure 32As shown, the third reflection unit 2b can be applied to the operating frequency of 24 GHz. The third reflection unit 2b corresponds to a long side of a rectangular metal sheet with a medium size whose reflection phase can vary. Another existing fourth reflection unit 2c presents the form of a rectangular metal sheet as Figure 33 shown. The phase curve of the fourth reflection unit 2c at the operating frequency of 10 GHz is as Figure 34 shown. The fourth reflection unit 2c can be applied to the operating frequency of 10 GHz. The fourth reflection unit 2c corresponds to a short side of the rectangular metal sheet whose reflection phase can vary. Another existing fifth reflection unit 2d presents the form of a horseshoe-shaped metal sheet and two L-shaped metal sheets surrounding a square metal sheet at intervals as Figure 35 shown. The phase curve of the fifth reflection unit 2d at the operating frequency of 28 GHz is as Figure 36 shown. The fifth reflection unit 2d can be applied to the operating frequency of 28 GHz. The fifth reflection unit 2d corresponds to a side length of the square metal sheet whose reflection phase can vary. Another existing sixth reflection unit 2e presents the form of a square ring metal sheet surrounding a square metal sheet as Figure 37 shown. The phase curve of the sixth reflection unit 2e at the operating frequency of 28 GHz is as Figure 38 shown. The sixth reflection unit 2e can be applied to the operating frequency of 28 GHz. The sixth reflection unit 2e corresponds to a side length of the square metal sheet whose reflection phase can vary. Therefore, the electromagnetic wave reflection structure of this case can apply the second reflection unit 2a, the third reflection structure 2b, the fourth reflection structure 2c, the fifth reflection structure 2d, the sixth reflection structure 2e and their equivalent structures as described above. In addition, the multiple reflection units arranged on the substrate 1 include any combination of two or more of the first reflection unit, the second reflection unit 2a, the third reflection unit 2b, the fourth reflection unit 2c, the fifth reflection unit 2d, and the sixth reflection unit 2e. The arrangement of the mixed multiple reflection units can more effectively reduce the energy intensity of the side lobes and achieve better directivity for the reflection at the set reflection wave pointing angle.

[0107] Refer to Figures 39 to 41 , by changing the sizes of the multiple reflection units 2, that is, the sizes of the multiple first reflection units, the electromagnetic wave reflection structure can also be designed at 3.5 GHz. Among them, the operating frequency is 3.5 GHz, the reflection wave pointing angle is -30 degrees, the incident wave pointing angle is 0 degrees, and the incident distance is 60 cm. The reflection unit phase curves of any reflection unit 2 at 3.4 GHz, 3.5 GHz, and 3.6 GHz are as Figure 39 shown. The designed electromagnetic wave reflection structure is as Figure 40As shown, the simulated gain of the electromagnetic wave reflection structure varies with the change of the pointing angle of the reflected wave. It can be seen from the diagram that at a frequency of 3.5 GHz, the reflected wave has good gain when the pointing angle is -30 degrees, as Figure 41 shown. In addition, the electromagnetic wave reflection structure can also be designed at 14 GHz. Among them, the state of the phase curve of any reflection unit 2 at 13 GHz, 14 GHz, and 15 GHz is as Figure 42 shown.

[0108] In summary, through the preset parameter step S01, the step S02 of obtaining the phase curve of the reflection unit, the step S03 of obtaining the phase distribution of the electromagnetic wave reflection structure, the step S04 of translating the principal value of the phase, and the step S05 of setting the arrangement, the electromagnetic wave reflection structure with single-beam incidence and single-beam reflection can be manufactured. The manufacturing and deployment processes cost less. The electromagnetic wave reflection structure does not consume power, so it does not require special maintenance and is energy-saving. It can reflect the electromagnetic wave to the dead corner of communication to make the signal of the electromagnetic wave good. There is no radiation generated by the electromagnetic wave when it is not in use, which makes the nearby residents feel at ease. Moreover, it is in the form of a thin plate, occupies a small space and is compatible with the decoration of the environmental building. It is indeed another choice to solve the problem of poor electromagnetic wave transmission. Among them, through the structure of any reflection unit 2, the phase curve of the reflection unit is made smooth and the slope is not zero, so the sizes of any reflection unit 2 within the size range corresponding to the operating frequency can be used. Also, the phase curves of the multiple reflection units of any reflection unit 2 at different frequencies show an equidistant state, so any reflection unit 2 can be applied in a wide frequency band. More preferably, by adding the step S06 of obtaining the phase distribution of the synthetic electromagnetic wave reflection structure, the electromagnetic wave reflection structure with single-beam incidence and multi-beam reflection, or the electromagnetic wave reflection structure with single-beam incidence and multi-beam reflection, or the electromagnetic wave reflection structure with multi-beam incidence and multi-beam reflection can be manufactured, making the application more extensive. Also, by mixing and setting the multiple reflection units with different structures on the substrate 1, the energy intensity of the side lobes can be more effectively reduced, so that the reflection at the set pointing angle of the reflected wave has better directivity.

[0109] Based on the description of the above embodiments, the operation, use, and effects of the present invention can be fully understood. However, the above embodiments are only the preferred embodiments of the present invention, and the scope of the present invention cannot be limited thereby. That is, simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the content of the invention description all fall within the scope covered by the present invention.

Claims

1. An electromagnetic wave reflection structure for reflecting an electromagnetic wave from an electromagnetic wave source with an incident wave pointing angle to a reflected wave pointing angle after incidence, wherein the electromagnetic wave has an operating frequency, the electromagnetic wave reflection structure includes a substrate and a plurality of reflection units, the substrate includes a surface, and the surface defines a reference point, and the plurality of reflection units are arranged on the surface, and is characterized in that, A reflection phase shift of the i-th reflection unit among the multiple reflection units is associated with a coordinate position of the i-th reflection unit relative to the reference point, an operating frequency wave number, a reflection wave pointing angle, and an incident distance of the electromagnetic wave source to the i-th reflection unit. A size of the i-th reflection unit among the multiple reflection units is associated with the reflection phase shift of the i-th reflection unit on the substrate and a reflection phase of any reflection unit at the operating frequency. Wherein the multiple reflection units include a combination of any two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The first reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged oppositely to form a rectangle, and there is a first spacing between the two first metal sheets. Each second metal sheet is in a rectangle. The two second metal sheets are arranged adjacently in the two first metal sheets, and the two second metal sheets maintain a second spacing. The second reflection unit includes two concentrically spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

2. The electromagnetic wave reflection structure according to claim 1, wherein The reflection phase shift of the i-th reflection unit on the substrate and the incident distance of the electromagnetic wave source to the i-th reflection unit are obtained by the following formula: Φ R (x i , y i ) = k[d i -(x i cosΦ B + y i sinΦ B )sinθ B ± 2Nπ (1) d i = [(x F - x i ) 2 + (y F - y i ) 2 + z F 2 0.5 (2)​ where, (x i , y i ) is the coordinate position of the i-th reflection unit relative to the reference point, Φ R (x i , y i ) is the reflection phase shift of the i-th reflection unit, k is the wavenumber of the operating frequency, (θ B , Φ B ) is the pointing angle of the reflected wave, d i is the incident distance of the electromagnetic wave source to the i-th reflection unit, (x F , y F , z F ) is a spatial coordinate where the electromagnetic wave source is located relative to the reference point, and 2Nπ is a multiple of the phase period.

3. The electromagnetic wave reflection structure according to claim 1, wherein Each first metal sheet includes an extension section and two turning sections. The multiple turning sections are respectively connected to both sides of the extension section and extend in a direction perpendicular to the extension section. The length of the extension section of any first metal sheet is substantially equal to the length of each second metal sheet plus six times the width of any turning section. The length of each turning section is substantially equal to half of the length of any extension section minus the first spacing. The width of each second metal sheet is substantially equal to half of the length of each second metal sheet minus the second spacing.

4. An electromagnetic wave reflection structure for reflecting a plurality of electromagnetic waves from a plurality of electromagnetic wave sources with a plurality of incident wave pointing angles into a plurality of reflected wave pointing angles, wherein the plurality of electromagnetic waves have an operating frequency, the electromagnetic wave reflection structure includes a substrate and a plurality of reflection units, the substrate includes a surface, and the surface defines a reference point, the plurality of reflection units are disposed on the surface, and is characterized in that, A combined reflection phase shift of the i-th reflection unit among the multiple reflection units is associated with a phasor superposition of multiple incident distances of different electromagnetic wave sources to the i-th reflection unit and multiple reflection phase shifts corresponding to the multiple reflection wave pointing angles. Each reflection phase shift of the i-th reflection unit is associated with a coordinate position of the i-th reflection unit relative to the reference point, an operating frequency wave number, one of the reflection wave pointing angles, and the incident distance of one of the electromagnetic wave sources to the i-th reflection unit. A size of the i-th reflection unit among the multiple reflection units is associated with the combined reflection phase shift of the i-th reflection unit on the substrate and a reflection phase of any reflection unit at the operating frequency. Wherein the multiple reflection units include any combination of two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The first reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged opposite to each other to form a rectangle, and there is a first distance between the two first metal sheets. Each second metal sheet is in a rectangle shape. The two second metal sheets are arranged adjacent to each other in the two first metal sheets, and the two second metal sheets maintain a second distance. The second reflection unit includes two concentrically spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

5. The electromagnetic wave reflection structure according to claim 4, characterized in that, The reflection phase shift of the i-th reflection unit on each substrate and the incident distance of each electromagnetic wave source to the i-th reflection unit are obtained by the following formula: Φ R (x i , y i ) = k[d i -(x i cosΦ B + y i sinΦ B )sinθ B ± 2Nπ (1) d i = [(x F - x i ) 2 + (y F - y i ) 2 + z F 2 0.5 (2)​ where (x i , y i ) is the coordinate position of the i-th reflection unit relative to the reference point, Φ R (x i , y i ) is the reflection phase shift of each reflection of the i-th reflection unit, k is an operating frequency wave number, (θ B , Φ B ) is the pointing angle of each reflected wave, d i is the incident distance of each electromagnetic wave source to the i-th reflection unit, (x F , y F , z F ) is the spatial coordinate of each electromagnetic wave source relative to the reference point, and 2Nπ is a phase period multiple.

6. The electromagnetic wave reflection structure according to claim 4, characterized in that, Each first metal sheet includes an extension section and two turning sections. The multiple turning sections are respectively connected to both sides of the extension section and extend in a direction perpendicular to the extension section. The length of the extension section of any one of the first metal sheets is substantially equal to the length of each second metal sheet plus six times the width of any one of the turning sections. The length of each turning section is substantially equal to half of the length of any one of the extension sections minus the first distance. The width of each second metal sheet is substantially equal to half of the length of each second metal sheet minus the second distance.

7. A reflection unit, characterized in that, The reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged opposite to each other to form a rectangle, and there is a first distance between the two first metal sheets. Each second metal sheet is in a rectangle shape. The two second metal sheets are arranged adjacent to each other in the two first metal sheets, and the two second metal sheets maintain a second distance. Wherein the reflection unit includes any combination of two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The second reflection unit includes two concentrically spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

8. The reflective unit according to claim 7, wherein Each first metal sheet includes an extension section and two turning sections. The multiple turning sections are respectively connected to both sides of the extension section and extend in a direction perpendicular to the extension section. The length of the extension section of any one first metal sheet is substantially equal to the length of each second metal sheet plus six times the width of any one turning section. The length of each turning section is substantially equal to one half of the length of any one extension section minus the first spacing. The width of each second metal sheet is substantially equal to one half of the length of each second metal sheet minus the second spacing.

9. An electromagnetic wave reflection structure is configured to reflect an electromagnetic wave from an electromagnetic wave source with an incident wave pointing angle into multiple reflected wave pointing angles. The electromagnetic wave has an operating frequency. The electromagnetic wave reflection structure includes a substrate and multiple reflection units. The substrate includes a surface, and the surface defines a reference point. The multiple reflection units are disposed on the surface, and is characterized in that, The combined reflection phase shift of the i-th reflection unit among the multiple reflection units is associated with the phasor superposition of the multiple reflection phase shifts corresponding to the multiple reflection wave pointing angles of the i-th reflection unit. Each reflection phase shift of the i-th reflection unit is associated with a coordinate position of the i-th reflection unit relative to the reference point, an operating frequency wave number, one of the reflection wave pointing angles, and an incident distance of the electromagnetic wave source to the i-th reflection unit. The size of the i-th reflection unit among the multiple reflection units is associated with the combined reflection phase shift of the i-th reflection unit on the substrate and the reflection phase of any one reflection unit at the operating frequency. Wherein the multiple reflection units include a combination of any two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The first reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged oppositely to form a rectangle, and there is a first spacing between the two first metal sheets. Each second metal sheet is in a rectangle shape. The two second metal sheets are arranged adjacent to each other among the two first metal sheets, and the two second metal sheets maintain a second spacing. The second reflection unit includes two concentrically spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

10. A manufacturing method of an electromagnetic wave reflection structure, characterized in that, The manufacturing method of the electromagnetic wave reflection structure includes: Presetting a pointing angle of an incident wave corresponding to each of the multiple electromagnetic waves, and an incident distance, presetting an operating frequency of the multiple electromagnetic waves, and presetting the multiple reflection wave pointing angles; Obtaining multiple electromagnetic wave reflection structure phase distributions corresponding to different reflection wave pointing angles for each electromagnetic wave according to the pointing angle of the incident wave, the incident distance, the operating frequency, and the multiple reflection wave pointing angles of each electromagnetic wave; Converting the multiple electromagnetic wave reflection structure phase distributions of each electromagnetic wave into corresponding multiple electromagnetic wave reflection structure phasor distributions, and performing phasor superposition on the multiple electromagnetic wave reflection structure phasor distributions of the multiple electromagnetic waves, and then obtaining a combined electromagnetic wave reflection structure phase distribution through a conversion; and According to the phase distribution of the synthetic electromagnetic wave reflection structure and the phase curve of a reflection unit at the operating frequency, the multiple reflection units are arranged on a substrate. Among them, the multiple reflection units include any combination of two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The first reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged opposite to each other to form a rectangle, and there is a first spacing between the two first metal sheets. Each second metal sheet is in a rectangular shape. The two second metal sheets are arranged adjacent to each other in the two first metal sheets, and the two second metal sheets maintain a second spacing. The second reflection unit includes two concentric and spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

11. The manufacturing method of the electromagnetic wave reflection structure according to claim 10, characterized in that, Each electromagnetic wave reflection structure phase distribution is obtained by substituting the operating frequency, one of the reflection wave pointing angles, the incident wave pointing angle, and the incident distance into the following formula: Φ R (x i , y i )=k[d i -(x i cosΦ B +y i sinΦ B )sinθ B ±2Nπ (1) d i = [(x F - x i ) 2 + (y F - y i ) 2 + z F 2 0.5 (2)​ where (x i , y i ) is the coordinate position of the i-th reflection unit among the multiple reflection units relative to a reference point, Φ R (x i , y i ) is the reflection phase shift of the i-th reflection unit, k is the wavenumber of an operating frequency, (θ B , Φ B ) is the pointing angle of the reflected wave, d i is the incident distance of the center of the incident electromagnetic wave to the i-th reflection unit, (x F , y F , z F ) is the spatial coordinate of a source of the electromagnetic wave relative to the reference point, and 2Nπ is a multiple of the phase period; The electromagnetic wave reflection structure phase distribution is obtained according to the above formula.

12. The manufacturing method of the electromagnetic wave reflection structure according to claim 10, characterized in that, The multiple synthetic reflection phase shifts of the synthetic electromagnetic wave reflection structure phase distribution are subjected to a principal value processing according to a phase period interval. The principal value processing is to subtract the phase period multiple from each synthetic reflection phase shift and retain a principal value within the phase period interval, and then translate the synthetic electromagnetic wave reflection structure phase distribution after the principal value processing to a size range corresponding to the range of a reflection phase of any reflection unit at the operating frequency, so as to arrange the multiple reflection units of different sizes on the substrate.

13. A manufacturing method of an electromagnetic wave reflection structure, characterized in that The manufacturing method of the electromagnetic wave reflection structure includes: Presetting an operating frequency, an incident wave pointing angle, and an incident distance corresponding to an electromagnetic wave, and presetting multiple reflection wave pointing angles; Obtaining multiple electromagnetic wave reflection structure phase distributions corresponding to different reflection angles of the electromagnetic wave according to the operating frequency of the electromagnetic wave, the multiple reflection wave pointing angles, the incident wave pointing angle, and the incident distance; Converting the multiple electromagnetic wave reflection structure phase distributions into corresponding multiple electromagnetic wave reflection structure phasor distributions, performing phasor superposition on the multiple electromagnetic wave reflection structure phasor distributions, and then obtaining a synthetic electromagnetic wave reflection structure phase distribution through a conversion; and According to the synthetic electromagnetic wave reflection structure phase distribution corresponding to the phase curve of a reflection unit at the operating frequency, arranging the multiple reflection units on a substrate. Among the multiple reflection units, it includes any combination of two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The first reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged opposite to each other to form a rectangle, and there is a first spacing between the two first metal sheets. Each second metal sheet is in a rectangular shape. The two second metal sheets are arranged adjacent to each other among the two first metal sheets, and the two second metal sheets maintain a second spacing. The second reflection unit includes two concentric and spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

14. An electromagnetic wave reflection structure is configured to reflect a plurality of electromagnetic waves from a plurality of electromagnetic wave sources with a plurality of incident wave pointing angles into a reflected wave pointing angle. Each electromagnetic wave has an operating frequency. The electromagnetic wave reflection structure includes a substrate and a plurality of reflection units. The substrate includes a surface, and the surface defines a reference point. The plurality of reflection units are disposed on the surface, and is characterized in that, The combined reflection phase shift of the i-th reflection unit among the multiple reflection units is related to the phasor superposition of multiple reflection phase shifts corresponding to multiple incident distances of different electromagnetic wave sources of the i-th reflection unit. Each reflection phase shift of the i-th reflection unit is related to a coordinate position of the i-th reflection unit relative to the reference point, an operating frequency wave number, the pointing angle of the reflected wave, and the incident distance of one of the electromagnetic wave sources to the i-th reflection unit. The size of the i-th reflection unit among the multiple reflection units is related to the combined reflection phase shift of the i-th reflection unit on the substrate and the reflection phase of any reflection unit at the operating frequency. Among the multiple reflection units, it includes any combination of two or more of a first reflection unit, a second reflection unit, a third reflection unit, a fourth reflection unit, a fifth reflection unit, and a sixth reflection unit. The first reflection unit includes two first metal sheets and two second metal sheets. Each first metal sheet is in a horseshoe shape. The two first metal sheets are arranged opposite to each other to form a rectangle, and there is a first spacing between the two first metal sheets. Each second metal sheet is in a rectangular shape. The two second metal sheets are arranged adjacent to each other among the two first metal sheets, and the two second metal sheets maintain a second spacing. The second reflection unit includes two concentric and spaced circular ring metal sheets. The third reflection unit includes three rectangular metal sheets arranged at intervals. The fourth reflection unit includes a rectangular metal sheet. The fifth reflection unit includes a horseshoe-shaped metal sheet and two L-shaped metal sheets spaced around a square metal sheet. The sixth reflection unit includes a square ring metal sheet surrounding a square metal sheet.

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