Charged Particle Source Module

Abstract

The present invention relates to a charged particle source module for generating and emitting a charged particle beam, comprising: a frame, comprising a first frame part, a second frame part, and one or more rigid support members arranged between the first frame part and the second frame part and rigidly connected to them, the frame comprising a mounting member, the mounting member being connected to the second frame part via a flexure connection; a charged particle source device for generating a charged particle beam, wherein the charged particle source device is arranged at the second frame part, comprising: an emitter device configured to emit charged particles; and electrodes for forming a charged particle beam from the charged particles emitted by the emitter device; and an electric power connection assembly arranged at the first frame part, the electric power connection assembly being rigidly connected to the first frame part, and the charged particle source device being rigidly connected to the second frame part, wherein the charged particle source device is electrically connected to the electric power connection assembly via electric wires.

Description

[0001] Related Applications Citations

[0002] This application is a divisional application of the invention patent application with international application number PCT / JP2018 / 015632, international application date April 10, 2018, date of entry into the Chinese national phase on November 12, 2019, Chinese national application number 201880031355.3, and invention name “Charged Particle Source Module”. Technical Field

[0003] The present invention relates to a charged particle source module for generating and emitting a charged particle beam, and also relates to an exposure system, a charged particle source device, a method for manufacturing a semiconductor device, and a method for inspecting a target having the charged particle source module. Background Art

[0004] A charged particle source is arranged for generating and emitting a charged particle beam which can be directed towards a surface or a target.A known charged particle source comprises a source cathode and a plurality of electrodes located downstream of the source cathode.

[0005] A charged particle source is known from WO 2015 / 101538 A1 of the applicant, wherein the source is applied in a lithography exposure system. The charged particle source comprises a cathode arrangement comprising: a thermionic cathode comprising an emitting portion provided with an emitting surface for emitting electrons and a reservoir for containing a material, wherein the material, when heated, releases particles with a reduced work function, which diffuse towards the emitting portion and are emitted at the emitting surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emitting surface of the cathode; and a heat source configured to heat the material stored in the reservoir.

[0006] Another charged particle source is known from Proc. Of SPIE Vol. 8680, 86800O-1 to -12, see FIGS. 6 , 7 and 8 .

[0007] In addition to being used in charged particle exposure systems such as charged particle lithography systems, known charged particle sources are also applied in charged particle inspection systems or microscopes. At least in these applications, the various components of the charged particle source must be accurately aligned relative to each other. In addition, connecting the various components of the charged particle source to the corresponding power supply arrangement is cumbersome and must be performed carefully so as not to disturb the alignment of the various components of the charged particle source relative to each other.

[0008] It is an object of the present invention to ameliorate or eliminate one or more disadvantages of the prior art, or to at least provide an alternative source of charged particles. Summary of the invention

[0009] According to a first aspect, the present invention provides a charged particle source module for generating and emitting a charged particle beam, comprising:

[0010] - a frame comprising a first rigid frame portion, a second rigid frame portion and one or more rigid support members arranged between and rigidly connected to said first frame portion and said second frame portion;

[0011] - a charged particle source device for generating a charged particle beam, wherein the charged particle source device is arranged at the second frame part; and

[0012] - an electrical connection assembly arranged at said first frame portion,

[0013] Wherein, the charged particle source device is electrically connected to the power connection component via an electric wire.

[0014] According to the first aspect of the present invention, the charged particle source device is arranged at the second frame portion and is electrically connected to the power connection assembly via an electric wire, the power connection assembly being arranged at the first frame portion.

[0015] Since the power connection assembly is arranged at the first frame part, a force applied to the power connection assembly, for example during connection of an external power source to the power connection assembly, will be introduced into the first frame part. The force introduced into the first frame part will be transferred from the first frame part to the second frame part via the rigid support member, thereby preventing the force from acting on the charged particle source device or its individual components. Thus, a strain relief arrangement is provided. Due to the strain relief arrangement, the alignment and relative position of the individual components of the charged particle source device relative to each other are maintained.

[0016] The charged particle source arrangement may be arranged for generating an electron beam.The charged particle source arrangement may comprise emitter means for emitting electrons, from which the electron beam is formed.

[0017] In addition, the use of the charged particle source module according to the present invention can provide a robust arrangement that reduces or ideally eliminates one or more external forces applied to the charged particle source device, for example during transportation of the source module, during installation of the source module into an exposure system, and during connection of an external power supply to the charged particle source module.

[0018] Furthermore, the power connection assembly provides a suitable substantially single connection terminal at which the charged particle source module can be connected to the required power and control conductors for controlling the functions of the charged particle source apparatus.

[0019] According to a second aspect, the present invention provides a charged particle source module for generating and emitting a charged particle beam, comprising:

[0020] - a frame comprising a first frame portion, a second frame portion and one or more rigid support members arranged between the first frame portion and the second frame portion;

[0021] - a charged particle source device for generating a charged particle beam, wherein the charged particle source device is arranged at the second frame part; and

[0022] - an electrical connection assembly arranged at said first frame portion,

[0023] wherein the charged particle source device is electrically connected to the power connection assembly via an electric wire,

[0024] The electrical wires include one or more electrical wires having a service ring.

[0025] In the context of the present patent application, a service loop must be understood as an additional length of wire, preferably provided in the form of a bend or a loop, which is included as a strain relief measure. Such a bend can, for example, be included as a portion of the wire, which extends in a bend in a direction substantially perpendicular to the direction of the one or more wires. During use, electricity flows through the one or more wires, thereby increasing the temperature of the one or more wires. The increase in temperature of the one or more wires causes thermal expansion of the one or more wires. The thermal expansion of the one or more wires will be absorbed by the service loop of the corresponding wire. Thereby, force is prevented from being applied to the charged particle source device due to the thermal expansion of the one or more wires.

[0026] In addition, in the case where a (small) part of the force applied to the power connection assembly is transmitted toward the charged particle source device via the power connection assembly, the force is absorbed by the service loop of the electric wire, thereby preventing the force from being applied to the charged particle source device.

[0027] In one embodiment, the frame comprises a mounting member, which is connected to the second frame part by a flexure connection, preferably, wherein the second frame part comprises a mounting plate, and each of the flexure connections comprises a connection lip provided at the periphery of the mounting plate, wherein each connection lip defines a slit between the mounting plate and the connection lip. The mounting member is intended to mount the charged particle source module to an exposure system or to a charged particle optical device of an exposure system. In operation, the charged particle source device generates and emits a charged particle beam directed toward the second frame part. It may happen that part of the charged particle beam or some of the charged particle beams directly or indirectly hits the second frame part, which causes the temperature of the second frame part to increase. Due to the temperature increase, the second frame part may be deformed in a substantially radial direction relative to the longitudinal center axis of the charged particle source module. The flex connection to the connecting lip and the slit enables the second frame portion to deform in a substantially radial direction relative to the longitudinal center axis of the charged particle source module, while the mounting structure remains in place and the charged particle source module remains aligned with the exposure system or with the charged particle optical device, preferably in a direction transverse to the longitudinal axis of the charged particle source module.

[0028] Additionally, the mounting member connected to the second frame part by a flexure connection provides the possibility to mount the charged particle source module to a non-perfectly flat surface. Due to the mounting member in the flexure connection, a proper abutment of the charged particle source module to e.g. charged particle optics is established.

[0029] In one embodiment, the first frame part, the second frame part and / or the one or more rigid support members are made of non-ferrous material. Non-ferrous material has a non-magnetic property, which must be understood as non-magnetic and non-magnetizable. The advantage of this embodiment is that the charged particles in the charged particle beam generated by the charged particle source device are not affected by the frame or its components.

[0030] In one embodiment, the power connection assembly is rigidly connected to the first frame portion, and the charged particle source device is rigidly connected to the second frame portion. When the power connection assembly is rigidly connected to the first frame portion, the first frame portion and the power connection assembly are prevented from moving relative to each other, such as when a force applied to the power connection assembly is introduced into the first frame portion, a rotation around the longitudinal axis of the frame and / or a tilt relative to the longitudinal axis of the frame. Such movement may, for example, be harmful to the charged particle source device or the wires between the charged particle source device and the power connection assembly. For substantially the same reasons, the charged particle source device is rigidly connected to the second frame portion.

[0031] In one embodiment, the power connection assembly comprises a non-conductive connection plate arranged at the first frame portion of the frame, wherein the power connection assembly comprises one or more connectors. By using the non-conductive connection plate in combination with the connector, the power connection assembly enables an external power source to be connected to the power connection assembly to provide power to the charged particle source device while preventing the power from being applied to the frame.

[0032] In one embodiment, the one or more connectors extend through the non-conductive connection plate in a direction substantially parallel to the support member of the frame. As a result of the connectors extending substantially parallel to or parallel to the rigid support member, forces applied to the connectors during, for example, connection of an external power source to the connectors will be easily directed towards and into the support member, as the applied force continues in substantially the same direction as it is applied. Thus, the risk of any force being applied to the charged particle source device is reduced or, ideally, eliminated.

[0033] In one embodiment, the first frame portion comprises two substantially parallel plates, wherein the power connection assembly is fixed, preferably clamped between the two plates. Movement of the power connection assembly in a direction parallel to the support member will apply a harmful force to the charged particle source device or the wires between the charged particle source device and the power connection assembly. This harmful force causes the charged particle source device and / or its wires to be deformed unfavorably. By clamping the power connection assembly between the two plates, when a force is applied to the power connection assembly, the power connection assembly is prevented from moving in a direction substantially parallel to the support member or rotating in a direction substantially perpendicular to the support member around a rotation axis extending through the power connection assembly.

[0034] In one embodiment, the charged particle source device comprises an emitter device configured to emit charged particles and an electrode for forming a charged particle beam from the charged particles emitted by the emitter device, preferably, wherein the charged particle source device comprises two or more electrodes for forming a charged particle beam from the charged particles emitted by the emitter device, wherein the most downstream electrode of the two or more electrodes is preferably arranged at the second frame portion of the frame, wherein the most downstream electrode and the second frame portion are preferably formed as a single part. By using the most downstream electrode to shape the charged particle beam generated and emitted by the emitter device and fixing the charged particle source device to the second frame portion of the frame, the number of parts of the charged particle source module can be kept to a minimum.

[0035] In one embodiment, the emitter device and the electrode are connected to one or more non-conductive supports oriented substantially parallel to an optical axis defined by the emitter device and the electrode, wherein each of the one or more supports is connected to the periphery of the emitter device and to the periphery of the electrode, and wherein the one or more supports maintain the orientation and / or position of the emitter device and the electrode relative to each other, preferably, wherein at least one of the emitter device and the electrode is connected to the one or more supports by a flexure connection. The supports are provided for maintaining the orientation and / or position of the electrode and the emitter device relative to each other. During operation, the emitter device generates and emits a charged particle beam, which is shaped by the electrode. A portion or a plurality of individual charged particles of the charged particle beam from the emitter device may impinge on the electrode, which results in an increase in the temperature of the electrode. The increase in the temperature of the electrode may result in deformation, in particular expansion of the electrode. Because the electrode is connected to the supports, such deformation results in bending and / or warping of the electrode when no flexure connection is provided, thereby deforming the electric field formed between the electrode and the emitter device. The flexure connection enables the electrode to deform in a substantially radial direction relative to the longitudinal centre axis of the charged particle source device, while the support maintains its position and prevents warping and / or bending of the electrode. Furthermore, the electrode maintains its (intended) charged particle optical function.

[0036] In one embodiment, a plurality of said electrodes are provided. By means of a flexure connection provided at each electrode, the mutual orientation and / or position can be maintained. Thus, the charged particle optical function, such as a lens function, is maintained.

[0037] In one embodiment, at least one of the emitter device and the electrodes is rigidly connected to the one or more supports, preferably, wherein the most downstream electrode is rigidly connected to the one or more supports. The most downstream electrode is arranged at the second frame part and can be connected to the exposure system or its charged particle optical device during operation. The heat energy introduced by the charged particles impinging on the most downstream electrode and being absorbed by it is directed to the second frame part and / or the exposure system or its charged particle optical device. Optionally, the charged particle optical device is actively cooled. Therefore, the increase in the temperature of the most downstream electrode caused by the charged particles impinging on the most downstream electrode is offset.

[0038] In one embodiment, the transmitter device and the electrode include a plate-like electrode body, wherein the flexible connection includes a connection lip provided at the periphery of the plate-like electrode body, wherein the connection lip defines a slit between the connection lip and the plate-like electrode body. As explained above, due to the impact of charged particles on the electrode, the temperature of the electrode increases, which may cause the electrode to thermally expand radially outward relative to the longitudinal center axis of the frame. This thermal expansion of the electrode is achieved by the flexible connection with the connection lip and the slit defined by the connection lip. The inner end of the slit can be provided with a circular inner shape or a hole with a circular shape, the radius of which is greater than the distance between the lip and the electrode formed by the slit. In some embodiments, the slit also includes a bend. Likewise, the bend may include a circular inner shape. The circular inner shape may facilitate thermal expansion occurring in the radial direction.

[0039] In one embodiment, when the power connection assembly comprises a non-conductive connection plate arranged at the first frame part of the frame, wherein the power connection assembly comprises one or more connectors, the electric wires are peripherally connected to the electrodes and to the one or more connectors, and wherein the electric wires extend in a direction substantially parallel to the support member of the frame. Thus, the electric wires extend directly, in particular straightly, from the periphery of the electrode to the respective connector. Since the position of the connectors at the non-conductive connection plate is substantially determined by the periphery of the underlying electrode, the connectors can be placed away from each other. An advantage of this embodiment is that the connectors can be provided at a safe distance from each other, thereby preventing mutual electrical contact between the connectors.

[0040] In one embodiment, the wire is a flexible wire. In the context of the present patent application, the term "flexible" must be understood as being able to bend or be bent, but still having a certain degree of rigidity. In the case where the force is applied to the power connection assembly and a portion of the force is transferred to the flexible wire, the transferred force will be absorbed by the wire at least in part due to its flexibility. Since the flexible wire absorbs at least a portion of the force, the transferred force is prevented from acting on the various components of the charged particle source device. As a result, the alignment and relative position between the various components of the charged particle source device are maintained.

[0041] In one embodiment, when the first frame portion is a first rigid frame portion, the second frame portion is a second rigid frame portion, and the one or more rigid support members are rigidly connected to the first frame portion and the second frame portion, the flexible wires include one or more wires having a service loop.

[0042] According to a third aspect, the present invention provides an exposure system for emitting a charged particle beam towards a surface or a target, comprising:

[0043] - a charged particle source module for generating and emitting a charged particle beam according to the first aspect of the invention or according to the second aspect of the invention; and

[0044] - a charged particle optical device configured to receive a charged particle beam generated and emitted by a charged particle source module and to direct said charged particle beam towards said surface or said target,

[0045] Wherein the second frame portion of the frame is arranged at the charged particle optical device.

[0046] Since the power connection assembly is arranged at the first frame part and the second frame part is arranged at the charged particle optical device, the force applied to the power connection assembly, for example during the connection of an external power source to the power connection assembly, will be introduced into the first frame part. The force introduced into the first frame part will be transferred from the first frame part to the charged particle optical device via the rigid support member and the second frame part and absorbed by the charged particle optical device. Thereby, the force is prevented from acting on the charged particle source device and a strain relief arrangement is thus provided. The frame with the power connection assembly provides a force path between the power connection assembly and the second frame part, in particular between the power connection assembly and the charged particle optical device of the exposure tool.

[0047] In one embodiment, the charged particle optical arrangement comprises a collimator, wherein the charged particle source module is arranged at the collimator.

[0048] During operation of the exposure tool, charged particles originating from the charged particle source device may deviate from the generated charged particle beam and impact the charged particle source device or a portion of the frame. The kinetic energy of such deviated charged particles is absorbed by the charged particle source device or the portion of the frame, which eventually causes the temperature thereof to increase.

[0049] By arranging the second frame part on which the charged particle source device is arranged at the charged particle optical device, the heat energy absorbed by the second frame part or the part of the charged particle source device arranged on the second frame part will be implemented toward the charged particle optical device and enter it. The temperature of the second frame part or the part of the charged particle source device is thereby prevented from rising or significantly rising. Optionally, the charged particle optical device or a part thereof on which the charged particle source module is arranged can be actively cooled.

[0050] In one embodiment, the exposure system is selected from the group consisting of a lithography system, an inspection system or a microscopy system.

[0051] According to a fourth aspect, the present invention provides a charged particle source device for generating a charged particle beam, comprising:

[0052] - emitter means configured to emit charged particles;

[0053] - electrodes for forming a charged particle beam from said charged particles emitted by said emitter; and

[0054] - one or more non-conductive supports oriented substantially parallel to an optical axis defined by said emitter device and said electrode, wherein each of said one or more supports is connected to an outer periphery of said emitter device and an outer periphery of said electrode, and wherein said one or more supports maintain the orientation and / or position of said emitter device and said electrode relative to each other,

[0055] wherein the electrodes are connected to the one or more supports via flexible connectors,

[0056] wherein the electrodes and / or the transmitter device comprises one or more wire connectors for connecting wires,

[0057] Wherein, at least one of the one or more wire connectors is arranged on the flex connector.

[0058] The supports are arranged to maintain the emitter device and the electrode between the supports so as to maintain the orientation and / or position of the electrode and the emitter device relative to each other. During operation, the emitter device generates and emits charged particles such as electrons, which are formed into a charged particle beam by the electrode. A portion of the charged particle beam or charged particles from the emitter device may impact the electrode, which causes an increase in the temperature of the electrode. The increase in the temperature of the electrode may cause deformation, in particular expansion of the electrode. Since the electrode is located between the supports, in the absence of the flexure connection, such deformation will cause bending and / or warping of the electrode, thereby changing the orientation and / or position of the electrode relative to the emitter device. The changed orientation and / or position deforms the electric field formed between the emitter device and the electrode. The flexure connection enables the electrode to deform in a substantially radial direction relative to the longitudinal center axis of the charged particle source device, while preventing the electrode from warping and / or bending in a direction parallel to the longitudinal direction of the charged particle source device.

[0059] Furthermore, in practice, the wires for connecting the charged particle source device to an external power supply extend in a direction transverse to, for example, the main plane of the electrode. If the wires expand due to an increase in temperature, the expansion force(s) act on the electrode, which may result in a disturbance of the alignment of the electrode relative to the emitter device. By connecting the wires to the flexure connection, the flexure connection will absorb the expansion forces and direct these forces into the support.

[0060] It is noted that the charged particle source arrangement may be arranged for generating an electron beam, wherein the emitter arrangement is adapted to emit electrons from which the electron beam is formed.

[0061] In one embodiment, the one or more wire connectors are located at a portion of the flex connector, wherein the position and / or orientation of the flex connector relative to the support is substantially fixed. In another embodiment, at least one of the one or more wire connectors is arranged at a distal end of the connecting lip of the at least one flex connector, which is the free end of the connecting lip. Arranging the wire connector near / at the support helps maintain the alignment of the electrodes. In addition, by arranging the wire connector at the distal end, the risk of any expansion forces acting on the electrode caused by expansion of the wire can be further reduced or, ideally, prevented.

[0062] In one embodiment, the electrode comprises a plate-like electrode body having a beam aperture, which is centered relative to the optical axis. In another embodiment, the flexure connection comprises a connection lip provided at the periphery of the plate-like electrode body, wherein the connection lip defines a slit between the connection lip and the plate-like electrode body. If the electrode is not provided with one or more flexure connections, the temperature increase of the electrode due to the charged particles hitting the electrode will cause the electrode to thermally expand radially outward relative to the longitudinal center axis of the charged particle source device. This thermal expansion of the electrode is achieved by the one or more flexure connections with the connection lip and the slit defined by the connection lip, while the support remains in place and prevents the electrode from warping and / or bending. Thus, the (expected) orientation and / or position of the electrode and its charged particle optical function are maintained. The inner end of the slit can be provided with a circular internal shape or a hole with a circular shape, the radius of which is greater than the distance between the lip and the electrode formed by the slit. In some embodiments, the slit also includes a bend. Similarly, the bend can include a circular internal shape. The circular internal shape can contribute to thermal expansion occurring in the radial direction.

[0063] In one embodiment, a plurality of said electrodes are provided. By means of a flexure connection provided at each electrode, the mutual orientation and / or position can be maintained. Thus, the charged particle optical function, such as a lens function, is maintained.

[0064] In one embodiment, the charged particle source device comprises two or more electrodes for forming a charged particle beam from the charged particles emitted by the emitter device, wherein at least one of the two or more electrodes is rigidly connected to the one or more supports, preferably the most downstream electrode of the two or more electrodes is rigidly connected to the one or more supports. During use of the charged particle source device, the most downstream electrode is likely to be arranged on the charged particle optical device of the exposure system. Due to the arrangement, the thermal energy absorbed by the most downstream electrode is implemented towards the charged particle optical device and enters it, thereby minimizing or preventing any temperature increase of the most downstream electrode.

[0065] In one embodiment, the emitter device comprises a cathode for emitting the charged particles, wherein the cathode is received in a cathode carrier element, which is connected to the one or more supports by a flexure connection. In another embodiment, the cathode carrier element comprises a plate-like carrier body having a cathode aperture for receiving at least a portion of the cathode, preferably, wherein the flexure connection comprises a connection lip provided at the periphery of the plate-like carrier body, wherein the connection lip defines a slit between the connection lip and the plate-like carrier body. During operation of the charged particle source device, the temperature of the charged particle source device and / or the cathode carrier element may increase, which may lead to a deformation, in particular an expansion, of the plate-like carrier element in a radial direction. The flexure connection prevents the cathode carrier element from bending and / or warping in the longitudinal direction of the charged particle source device, as explained above with respect to the electrodes.

[0066] In one embodiment, the charged particle source device comprises: a frame, which comprises a first frame portion, a second frame portion, and one or more rigid support members arranged between the first frame portion and the second frame portion; and a power connection assembly, which is arranged at the first frame portion, wherein the charged particle source device is arranged at the second frame portion and is electrically connected to the connection assembly via a wire. During the connection of an external power source to the power connection assembly, a force is applied to the power connection assembly. Since the power connection assembly is arranged on the first frame portion, the force is introduced into the first frame portion. The force introduced into the first frame portion will be transferred from the first frame portion to the second frame portion via the rigid support member, thereby preventing the force from acting on the charged particle source device and providing a strain relief arrangement.

[0067] According to a fifth aspect, the present invention provides a charged particle source module according to the first or second aspect of the present invention, wherein the charged particle source device is the charged particle source device according to the fourth aspect of the present invention.

[0068] According to a sixth aspect, the present invention provides a method for manufacturing a semiconductor device by using a charged particle source module according to the first or second aspect of the present invention or by using a charged particle source device according to the fourth aspect of the present invention, the method comprising the following steps:

[0069] - placing a wafer downstream of the charged particle source module or the charged particle source device;

[0070] - processing the wafer, including projecting an image or pattern on the wafer by means of a charged particle beam generated and emitted by the charged particle source module or the charged particle source device; and

[0071] - performing subsequent steps to produce semiconductor devices from the processed wafer

[0072] Subsequent steps for manufacturing semiconductor devices from the processed wafers are known in the art of manufacturing semiconductor devices. For example, many of the subsequent steps are described in the applicant's US patent application serial number US2014 / 0176920A1.

[0073] According to a seventh aspect, the present invention provides a method for inspecting a target by means of a charged particle source module according to the first aspect or the second aspect of the present invention or by means of a charged particle source device according to the fourth aspect of the present invention, the method comprising the following steps:

[0074] - placing the target downstream of the charged particle source module or the charged particle source device;

[0075] - directing the charged particle beam generated and emitted by the charged particle source module or the charged particle source device towards the target;

[0076] - in response to said charged particle beam being directed towards said target, detecting charged particles transmitted, emitted and / or reflected by said target; and

[0077] - performing subsequent steps to examine the target using the data from the step of detecting charged particles.

[0078] Each of the various aspects and features described and shown in the description may be applied individually as far as possible. These individual aspects, in particular the aspects and features described in the attached dependent claims, may be the subject of divisional patent applications. BRIEF DESCRIPTION OF THE DRAWINGS

[0079] The invention will be explained on the basis of exemplary embodiments shown in the accompanying drawings, in which:

[0080] Figure 1 An example of an exposure apparatus having a charged particle source module is schematically shown.

[0081] Figure 2A An isometric view of a charged particle source device having an emitter device and electrodes is shown;

[0082] Figure 2B is an isometric view of the electrode;

[0083] Figure 3A shows an isometric view of a charged particle source module; and

[0084] Figure 3B Shows Figure 3A Cross-section of the charged particle source module along line IIIB. DETAILED DESCRIPTION

[0085] Figure 1 An example of an exposure system 100 with a charged particle source module 102 is schematically shown. The exposure system 100 includes a housing 101 in which the charged particle source module 102 is placed, which has a first frame portion 103 (e.g., a rigid frame portion), a second frame portion 104 (e.g., a rigid frame portion) and a rigid rod 105 arranged between the first frame portion 103 and the second frame portion 104 and rigidly connected thereto. The charged particle source module 102 includes a power connection assembly on the first frame portion 103, and a charged particle source device 106 arranged at the second frame portion 104 and electrically connected to the power connection assembly via a flexible wire 107. The charged particle source module 102 is arranged at a charged particle optical device 108 (such as a magnetic collimator or an electrostatic collimator). The charged particle optical device 108 is suitable for guiding the charged particle beam received from the charged particle source module along the optical axis OA toward a target 109. The charged particle source module 102, the charged particle optical device 108 and the target 109 are placed in the vacuum section 110 of the exposure system 100. The exposure system 100 can be one of a lithography system, an inspection system or a microscopy system. Figure 1 An exposure system 100 is schematically shown in FIG. 1 , and construction details of each known mentioned system are known in the relevant technical field.

[0086] For example, when the exposure system 100 is a lithography system, the lithography system may further include: a collimator for collimating the charged particle beam from the charged particle source module 102, an aperture array for generating individual sub-beams, and a deflector array (beam blanker array) having a plurality of deflectors, each of which is arranged to deflect an individual sub-beam. In addition, the exposure system 100 may include: a beam stop array having an aperture array, one aperture for each individual sub-beam; and a lens array having a lens array for focusing the charged particle sub-beams onto the target 109. The arrangement of the various parts of the lithography system is known in the relevant technical field. For example, an example of a lithography system is shown in the applicant's international patent application WO2009 / 127659 A2.

[0087] For example, when the exposure system 100 is an electron microscope system, the microscope system may further include an optical system arranged to direct the electron beam from the charged particle source module 102 toward a plurality of electron lenses, which are arranged to focus the electron beam onto the surface of the target 109. The exposure system 100 may be provided with one or more deflectors for scanning the electron beam on the surface of the target 109. The exposure system 100 may be provided with a sensor that may detect scattered electrons, secondary electrons and / or generated light from the target 109.

[0088] Figure 2A An example of a charged particle source device 1 is shown, which may correspond to Figure 1 Charged particle source device 106. The charged particle source device 1 comprises an emitter device 2, which is provided for emitting charged particles in an emission direction towards a surface or a target (such as a wafer). The charged particle source device 1 comprises a plurality of electrodes 11-14, also referred to as shaping electrodes, downstream of the emitter device 2, which are configured to extract the charged particles emitted by the emitter device 2 and form the charged particles into a charged particle beam. The emitter device 2 and the electrodes 11-14 are connected to and held between supports, such as glass rods 4, which are configured to maintain the emitter device 2 and the electrodes 11-14 in a desired position and orientation relative to each other. Each support is connected to each of the emitter device 2 and the electrodes 11-14. The emitter device 2 and the electrodes 11-14 can be connected to an external power supply, not shown, via an electric wire 5 having a service loop 6. These service loops can be provided as U-shaped elbows, extending substantially perpendicularly to the extension direction of the electric wire, such as Figure 2A In the figure. Figure 2A In the embodiment, not all wires are shown. However, it should be understood that each electrode is connected to at least one wire.

[0089] Alternatively, the service loop may be provided as a complete loop formed by rotating the wire a full 360°. Note that less energy is required to deform a service loop formed as a U-bend than a service loop formed as a complete loop.

[0090] like Figure 2A As shown in FIG. 1 , the transmitter device 2 includes a transmitter body 15. A first filament connector 16 and a second filament connector 17 are connected to the transmitter body 15, wherein both the first and second filament connectors 16 and 17 are connected to the wire 5 to connect the transmitter device 2 to an external power source. Figure 2A As shown in the figure, the emitter device 2 comprises a carrier element 18 attached to a plate-like carrier body 10, which comprises an emitter aperture that allows at least a charged particle beam (such as an electron beam) emitted from the emitter device 2 to pass. The plate-like carrier body 10 is provided with electrical wires for connecting the plate-like carrier body 10 to an external power source not shown. Therefore, the plate-like carrier body 10 can also be regarded as an electrode.

[0091] The emitter device 2 may comprise a single cathode for emitting a charged particle beam, such as a thermionic cathode heated by a filament, or a series arrangement of thermionic cathodes heated by another cathode. For a detailed description of the construction and operation of the emitter device 2 with a series arrangement, reference is made to the applicant's international patent application WO 2015 / 101538A1, which is incorporated herein by reference in its entirety. Note that other kinds of emitter devices are also possible.

[0092] like Figure 2A and Figure 2B As shown in , each of the electrodes 11-14 and the plate-like carrier body 10 includes a plate-like electrode body 60, whereby each plate-like electrode body 60 includes a beam aperture 61 that allows a charged particle beam B to pass through. The diameter of each subsequent beam aperture 61 of each electrode 11-14 increases with each subsequent beam aperture 61 in a downstream direction (also referred to as an optical axis) parallel to the longitudinal direction L of the charged particle source device 1, and therefore, a divergent charged particle beam can be generated and emitted by the charged particle source device 1.

[0093] The electrodes 11 - 13 located upstream of the most downstream electrode 14 and downstream of the emitter device 2 comprise one or two electrical connection elements 62 for electrically connecting each electrode 11 - 13 to an external power source not shown. Figure 2B Only one electrode 11 is shown, the remaining electrodes 12-13 differ from the shown electrode 11 in the position of the electrical connection elements 62. One or two connection elements 62 of each electrode 11-13 are configured so that two electrical wires are connected to each of the electrodes 11-13, respectively.

[0094] like Figure 2BAs shown in FIG. 1 , a flexure connector 65 is provided at the periphery of the electrode body 60, and the flexure connector 65 is provided for connecting the electrodes 11-13 and the carrier body 10 to the glass rod 4. Each flexure connector 65 includes a connection lip 66 provided at the periphery of the electrode body 60, which protrudes a little in its radial direction and extends in its peripheral direction. The connection lips 66 are evenly distributed on the periphery of the electrode body 60. Each connection lip 66 has a first lip 67 and a second lip 68, wherein the first lip 67 is connected to the electrode body 60 at one end and connected to the second lip 68 at the other end. Each connection lip 66 defines a slit 69 between the connection lip 66 and the periphery of the electrode body 60. From Figure 2B As can be seen in the figure, the inner end 69a of the slit 69 has a circular inner shape. In the case where the slit 69 includes a bend 69b, as in the illustrated embodiment, the bend also includes a circular inner shape. The circular inner shape can help to absorb thermal expansion that occurs in the radial direction. The second lip 68 of each connecting lip 66 includes a connecting element 70, which is occupied in one of the glass rods 4 to rigidly connect the flexure connection 65 to the glass rod 4, so that the electrodes 11-13 and the carrier body 10 can expand in the radial direction due to an increase in temperature, while the thermal expansion is absorbed by the slit 69. In the illustrated embodiment, the most downstream electrode 14 does not have such a flexure connection 65. As shown Figure 2A As shown in FIG. 1 , an electrical connection element 62 may be provided on one of the flexure connections 65 of one or more of the electrodes 11 - 13 .

[0095] The most downstream electrode 14 also includes a connection element (not shown) similar to the connection element 70 of the electrodes 11-13. The connection element extends radially outward from the electrode body 60 of the most downstream electrode 14 to rigidly connect the most downstream electrode 14 to the glass rod 4. Figure 2A As shown in the figure, the electrode body 60 of the most downstream electrode 14 includes a plate-shaped connecting protrusion 63 extending radially outward, in which an opening 64 is provided. The plate-shaped connecting protrusion 63 can be used to connect and / or align the charged particle source device 1 to an exposure system or its charged particle optical device not shown by a positive closure.

[0096] like Figure 2A As shown in , the glass rod 4 extends beyond the most downstream electrode 14 in a direction parallel to the longitudinal direction, so that the lower end of the glass rod 4 can help to align the charged particle source device 1 relative to the exposure system or its charged particle optical device, and the charged particle source device 1 can be arranged on the charged particle optical device.

[0097] Figure 3A An example of a charged particle source module 200 is shown, which may correspond to Figure 1Charged particle source module 102. Charged particle source module 200 includes a frame having a first frame portion 201, a second frame portion 202 and a rigid support member in the form of a rigid rod 203, the rigid support member being arranged between the first frame portion 201 and the second frame portion 202. Different parts of the frame can be made of non-magnetic material or non-ferrous material, such as a material including titanium. Charged particle source module 200 also includes a charged particle source device 204 having an electric wire 206, which is arranged at the second frame portion 202. In order to describe the charged particle source module 200, it is specified that the charged particle source device 204 corresponds to the charged particle source device 1 as described above. The charged particle source module 200 also includes an electric power connection component 207, wherein the charged particle source device 204 is electrically connected to the electric power connection component 207 via the electric wire 206.

[0098] like Figure 3A and Figure 3B As shown in FIG. 2 , the power connection assembly 207 includes a non-conductive circular support plate 208 disposed on the first frame portion 201. The support plate 208 may be made of, for example, The support plate 208 has fixing recesses 209 provided in the upper and lower surfaces of the support plate 208 and intended for arranging the support plate 208 on the first frame portion 201. The fixing recesses 209 are provided at the periphery of the support plate 208 and are evenly distributed along the circumference thereof. The power connection assembly 207 further includes an electrical connector 210 for electrically connecting the wire 206 to an external power source not shown, the electrical connector 210 extending through the support plate 208 in a direction substantially parallel to the rigid rod 203. Figure 3B As best shown in FIG. 2 , the electrical connectors 210 are received within the connector openings 211 of the support plate 208 , thereby providing a seal, particularly a glass seal 212 , between an inner edge of each connector opening 211 and the electrical connector 210 received within the corresponding connector opening 211 .

[0099] like Figure 3B As schematically shown in FIG. 2 , when a force F1 is applied to one or more electrical connectors 210 of the power connection assembly 207, thereby applying a force to the plane V, a force F2 is applied to the rigid rod 203 through the first frame portion 201. As schematically indicated by the force path F3, the forces F1, F2 are directed to and into the rigid rod 203. Via the rigid rod 203, the force is directed to and into the second frame portion 202, via which the force can be transmitted, for example, to an exposure system or its charged particle optical device, on which the charged particle source module 200 can be arranged. A stress relief arrangement is thereby achieved.

[0100] like Figure 3A and Figure 3B As shown in , the first frame part 201 includes two substantially parallel annular plates 220, 221, which are made of non-ferrous materials, such as materials including titanium. On the inner periphery, each annular plate 220, 221 has a fixing protrusion 223 extending radially inward, and the fixing protrusion 223 is evenly distributed on the inner periphery of the annular plates 220, 221. The fixing protrusion 223 is provided for clamping the support plate 208 therebetween. In the clamped configuration, the fixing protrusion 223 of the lower annular plate 220 is received in the fixing recess 209 at the lower surface of the support plate 208, and the fixing protrusion 223 of the upper annular plate 220 is received in the fixing recess 209 at the upper surface of the support plate 208.

[0101] The annular plates 220, 221 include attachment apertures adapted to receive attachment screws or bolts 227 and / or a rejuvenation provided at the upper end of the rigid rod 203, such that the annular plates 220, 221 are connected to each other. Figure 3B As shown in FIG. 2 , a spacer 229 is provided between the upper annular plate 220 and the lower annular plate 221, which is suitable for receiving the attachment screws or bolts 227 and / or providing a regeneration portion at the upper end of the rigid rod 203. The thickness of the spacer 229 is slightly less than the thickness of the support plate 208.

[0102] like Figure 3A As shown in FIG. 1 , the second frame portion 202 includes an annular mounting plate 240, which is made of a non-ferrous material, such as a material including titanium. On the inner periphery, the annular mounting plate 240 includes a plate-like connecting protrusion 242 extending radially inward. The plate-like connecting protrusion 242 is provided with an aperture 243, which can be configured to receive, for example, a pin or other fixing means. Figure 3B As shown in , the upper side of the plate-shaped connecting protrusion 63 of the electrode 14 is connected to the lower side of the plate-shaped connecting protrusion 242 of the second frame part 202, so that the electrode 14 is arranged between the second frame part 202 and the exposure tool or its charged particle optical device. The longitudinal axis of the charged particle source device 204 preferably coincides with the longitudinal axis of the frame. Therefore, when the charged particle source module 200 is arranged in the exposure system or its charged particle optical device, the charged particle source device 204 is positioned on a plane substantially perpendicular to its longitudinal axis.

[0103] Note that in another embodiment, the most downstream electrode 14 and the annular mounting plate 240 may be formed as a single part.

[0104] The annular mounting plate 240 includes a mounting member including a fixed aperture 245, which is configured to receive a fixing bolt or screw 246 for fixing the charged particle source module 200 to an exposure system or its charged particle optical system. Each fixed aperture 245 is arranged in a connecting lip 244 of a flexure connector. Each connecting lip 244 is provided near the periphery of the annular mounting plate 240 and extends in the peripheral direction thereof. The connecting lips 244 are evenly distributed on the periphery of the annular mounting plate 240. Each connecting lip 244 defines a slit 247 between the connecting lip 244 and the rest of the annular mounting plate 240. Thus, tilting of the charged particle source module 200 is avoided when the charged particle source module 200 is arranged to the exposure system or its charged particle optical device.

[0105] It should be noted that the attachment aperture 224 in the first frame portion 201 is provided in line with the fixing aperture 245 and the fixing bolt or screw 246 received therein, such that the fixing bolt or screw 246 is accessible by a tool via the attachment aperture 224 .

[0106] Note that the rigid rod 203 is rigidly connected to the second frame part 202, in particular the annular mounting plate 240 of the second frame part, for example by welding.

[0107] It should be understood that the above description is included to illustrate the operation of the preferred embodiment and is not meant to limit the scope of the invention. From the above discussion, many variations will be apparent to those skilled in the art, but will still be encompassed by the scope of the invention.

[0108] Some exemplary embodiments of the present disclosure are provided below.

[0109] 1. A charged particle source module for generating and emitting a charged particle beam, comprising:

[0110] - a frame comprising a first frame portion, a second frame portion and one or more rigid support members arranged between the first frame portion and the second frame portion;

[0111] - a charged particle source device for generating a charged particle beam, wherein the charged particle source device is arranged at the second frame part; and

[0112] - an electrical connection assembly arranged at said first frame portion,

[0113] The charged particle source device is electrically connected to the power connection component via an electric wire.

[0114] 2. A charged particle source module according to sentence 1, wherein the first frame portion includes a first rigid frame portion, the second frame portion includes a second rigid frame portion, and the one or more rigid support members are rigidly connected to the first rigid frame portion and the second rigid frame portion.

[0115] 3. A charged particle source module according to sentence 1 or 2, wherein the frame includes a mounting member, which is connected to the second frame part via a flexible connector, preferably, wherein the second frame part includes a mounting plate, and each of the flexible connectors includes: a connecting lip arranged at the periphery of the mounting plate, wherein each connecting lip defines a slit between the mounting plate and the connecting lip.

[0116] 4. A charged particle source module according to any of the preceding sentences, wherein the first frame portion, the second frame portion and / or the one or more rigid support members are made of a non-ferrous material.

[0117] 5. The charged particle source module according to any of the preceding sentences, wherein the power connection assembly is rigidly connected to the first frame part and the charged particle source device is rigidly connected to the second frame part.

[0118] 6. A charged particle source module according to any of the preceding sentences, wherein the power connection assembly comprises a non-conductive connection plate arranged at the first frame portion of the frame, wherein the power connection assembly comprises one or more connectors.

[0119] 7. A charged particle source module according to sentence 6, wherein the one or more connectors extend through the non-conductive connection plate in a direction substantially parallel to the support member of the frame.

[0120] 8. A charged particle source module according to sentence 6 or 7, wherein the first frame part comprises two substantially parallel plates, wherein the power connection assembly is fixed between the two plates, preferably clamped between the two plates.

[0121] 9. A charged particle source module according to any one of the preceding sentences, wherein the charged particle source device comprises: an emitter device configured to emit charged particles; and an electrode for forming a charged particle beam from the charged particles emitted by the emitter device, preferably, wherein the charged particle source device comprises two or more electrodes for forming a charged particle beam from the charged particles emitted by the emitter device, wherein the most downstream electrode of the two or more electrodes is preferably arranged at the second frame portion of the frame, wherein the most downstream electrode and the second frame portion are preferably formed as a single part.

[0122] 10. A charged particle source module according to sentence 9, wherein the emitter device and the electrode are connected to one or more non-conductive supports oriented substantially parallel to an optical axis defined by the emitter device and the electrode, wherein each of the one or more supports is connected to the periphery of the emitter device and to the periphery of the electrode, and wherein the one or more supports maintain the orientation and / or position of the emitter device and the electrode relative to each other, preferably, wherein at least one of the emitter device and the electrode is connected to the one or more supports via a flexible connection.

[0123] 11. A charged particle source module according to sentence 10, wherein at least one of the emitter device and the electrode is rigidly connected to the one or more supports, preferably, wherein the most downstream electrode is rigidly connected to the one or more supports.

[0124] 12. A charged particle source module according to sentence 10 or 11, wherein the emitter device and the electrode include a plate-like electrode body, wherein the flexible connector includes a connecting lip arranged at the periphery of the plate-like electrode body, wherein the connecting lip defines a slit between the connecting lip and the plate-like electrode body.

[0125] 13. A charged particle source module according to any one of sentences 9 to 13 when subordinate to sentence 6, wherein the wire is connected to the periphery of the electrode and to the one or more connectors, and wherein the wire extends in a direction substantially parallel to the support member of the frame.

[0126] 14. A charged particle source module according to any one of the preceding sentences, wherein the electric wire is a flexible electric wire.

[0127] 15. A charged particle source module according to any of the preceding sentences, wherein the electrical wires comprise one or more electrical wires having a service ring.

[0128] 16. An exposure system for emitting a charged particle beam toward a surface or target, comprising:

[0129] - a charged particle source module for generating and emitting a charged particle beam according to any of the preceding sentences; and

[0130] - a charged particle optical device configured to receive a charged particle beam generated and emitted by the charged particle source module and to direct the charged particle beam towards the surface or the target,

[0131] Wherein the second frame portion of the frame is arranged at the charged particle optical device.

[0132] 17. The exposure system according to sentence 16, wherein the charged particle optical device comprises a collimator, wherein the charged particle source module is arranged at the collimator.

[0133] 18. The exposure system according to sentence 16 or 17, wherein the exposure system is selected from the group consisting of a lithography system, an inspection system or a microscopy system.

[0134] 19. A charged particle source device for generating a charged particle beam, comprising:

[0135] - an emitter device configured to emit charged particles;

[0136] - electrodes for forming a charged particle beam from the charged particles emitted by the emitter device; and

[0137] - one or more non-conductive supports oriented substantially parallel to an optical axis defined by said emitter device and said electrode, wherein each of said one or more supports is connected to an outer periphery of said emitter device and to an outer periphery of said electrode, and wherein said one or more supports maintain the orientation and / or position of said emitter device and said electrode relative to each other,

[0138] The electrodes are connected to the one or more supports via flexible connections.

[0139] 20. The charged particle source device according to sentence 19,

[0140] Wherein the electrode and / or the transmitter device comprises one or more wire connections for connecting wires, wherein at least one of the one or more wire connections is arranged on the flexure connection.

[0141] 21. A charged particle source device according to sentence 20, wherein the one or more wire connections are located at a portion of the flexure connection, and the position and / or orientation of the flexure connection relative to the support member is basically fixed at the portion of the flexure connection.

[0142] 22. A charged particle source device according to sentence 20 or 21, wherein the at least one of the one or more wire connections is arranged on a distal end of the connection lip of the flex connection.

[0143] 23. A charged particle source device according to any one of sentences 19 to 22, wherein the electrode comprises a plate-shaped electrode body having a beam aperture, the beam aperture being centered relative to the optical axis.

[0144] 24. A charged particle source device according to sentence 23, wherein the flexure connection comprises a connection lip provided at an outer periphery of the plate-like electrode body, wherein the connection lip defines a slit between the connection lip and the plate-like electrode body.

[0145] 25. A charged particle source device according to any one of the preceding sentences 19 to 24, wherein the charged particle source device comprises two or more electrodes for forming a charged particle beam from the charged particles emitted by the emitter device, wherein at least one of the two or more electrodes is rigidly connected to the one or more supports, preferably, wherein the most downstream electrode of the two or more electrodes is rigidly connected to the one or more supports.

[0146] 26. A charged particle source device according to any one of sentences 19 to 25, wherein the emitter device comprises a cathode for emitting the charged particles, wherein the cathode is received in a cathode supporting element, and the cathode supporting element is connected to the one or more supports via a flexure connection.

[0147] 27. A charged particle source device according to sentence 26, wherein the cathode supporting element comprises a plate-like supporting body having a cathode aperture, wherein the cathode aperture is used to receive at least a portion of the cathode, preferably wherein the flexible connector comprises a connecting lip arranged at the periphery of the plate-like supporting body, wherein the connecting lip defines a slit between the connecting lip and the plate-like supporting body.

[0148] 28. The charged particle source device according to any one of the aforementioned sentences 19-27 further includes a frame, which includes a first frame part, a second frame part and one or more rigid support members arranged between the first frame part and the second frame part, and an electric connection assembly arranged on the first frame part, wherein the charged particle source device is arranged on the second frame part and is electrically connected to the electric connection assembly via an electric wire.

[0149] 29. The charged particle source module according to any one of sentences 1 to 15, wherein the charged particle source device is the charged particle source device according to any one of sentences 19-28.

[0150] 30. A method for manufacturing a semiconductor device by using the charged particle source module according to any one of the short sentences 1 to 15 or the charged particle source device according to any one of the short sentences 19 to 28, the method comprising the following steps:

[0151] - placing a wafer downstream of the charged particle source module or the charged particle source device;

[0152] - processing the wafer, including projecting an image or pattern on the wafer by means of a charged particle beam generated and emitted by the charged particle source module or the charged particle source device; and

[0153] - performing subsequent steps in order to produce semiconductor devices from the processed wafer.

[0154] 31. A method for inspecting a target by means of a charged particle source module according to any one of clauses 1 to 15 or a charged particle source device according to any one of clauses 19 to 28, the method comprising the following steps:

[0155] - placing the target downstream of the charged particle source module or the charged particle source device;

[0156] - directing the charged particle beam generated and emitted by the charged particle source module or the charged particle source device towards the target;

[0157] - in response to said charged particle beam being directed towards said target, detecting charged particles transmitted, emitted and / or reflected by said target; and

[0158] - performing subsequent steps in order to examine said target using the data from the step of detecting charged particles.

Claims

1. A charged particle source module for generating and emitting a charged particle beam, comprising: a frame comprising a first frame part, a second frame part and one or more rigid support members arranged between the first frame part and the second frame part and rigidly connected to the first frame part and the second frame part, the frame comprising a fastening member connected to the second frame part by a flexure connection and used to fix the charged particle source module to a charged particle optical system for receiving the charged particle beam; - a charged particle source device for generating a charged particle beam, wherein the charged particle source device is arranged at the second frame part, the charged particle source device comprising: an emitter device, the emitter device being configured to emit charged particles; and electrodes for forming a charged particle beam from the charged particles emitted by the emitter device; and - an electric power connection assembly arranged at the first frame part, the electric power connection assembly being rigidly connected to the first frame part, and the charged particle source arrangement being rigidly connected to the second frame part, wherein the charged particle source device is electrically connected to the power connection assembly via an electric wire, and Wherein the second frame portion comprises an annular mounting plate, each of the flexure connectors comprises a connecting lip disposed at an outer periphery of the annular mounting plate, and a fixing aperture is defined in the connecting lip to receive the fastening member.

2. A charged particle source module for generating and emitting a charged particle beam, comprising: a frame comprising a first frame part, a second frame part and one or more rigid support members arranged between the first frame part and the second frame part, the frame comprising a fastening member connected to the second frame part by a flexure connection and used to fix the charged particle source module to a charged particle optical system for receiving the charged particle beam; - a charged particle source device for generating a charged particle beam, wherein the charged particle source device is arranged at the second frame part, the charged particle source device comprising: an emitter device, the emitter device being configured to emit charged particles; and electrodes for forming a charged particle beam from the charged particles emitted by the emitter device; and - an electric power connection assembly arranged at the first frame part, the electric power connection assembly being rigidly connected to the first frame part, and the charged particle source arrangement being rigidly connected to the second frame part, wherein the charged particle source device is electrically connected to the power connection assembly via an electric wire; and Wherein the second frame portion comprises an annular mounting plate, each of the flexure connectors comprises a connecting lip disposed at an outer periphery of the annular mounting plate, and a fixing aperture is defined in the connecting lip to receive the fastening member. 3 . The charged particle source module according to claim 1 , wherein each of the connecting lips defines a slit between the annular mounting plate and the connecting lip.

4. A charged particle source module according to claim 1 or 2, wherein the first frame part, the second frame part and / or the one or more rigid support members are made of non-ferrous material.

5. A charged particle source module according to claim 1 or 2, wherein the power connection assembly comprises a non-conductive connection plate arranged at the first frame portion of the frame, wherein the power connection assembly comprises one or more connectors. 6 . The charged particle source module of claim 5 , wherein the one or more connectors extend through the non-conductive connection plate in a direction parallel to the support member of the frame. 7 . The charged particle source module according to claim 1 , wherein the first frame portion comprises two parallel plates, wherein the power connection assembly is fixed between the two parallel plates.

8. The charged particle source module of claim 7, wherein the power connection assembly is clamped between the two parallel plates.

9. The charged particle source module according to claim 1 or 2, wherein the charged particle source device comprises two or more electrodes for forming a charged particle beam from the charged particles emitted by the emitter device. 10 . The charged particle source module according to claim 9 , wherein a most downstream electrode of the two or more electrodes is arranged at the second frame portion of the frame. 11 . The charged particle source module according to claim 10 , wherein the most downstream electrode and the second frame portion are formed as a single part.

12. A charged particle source module according to claim 1 or 2, wherein the emitter device and the electrode are connected to one or more non-conductive supports oriented parallel to an optical axis defined by the emitter device and the electrode, wherein each of the one or more supports is connected to the periphery of the emitter device and to the periphery of the electrode, and wherein the one or more supports maintain the orientation and / or position of the emitter device and the electrode relative to each other.

13. A charged particle source module according to claim 12, wherein at least one of the emitter arrangement and the electrode is connected to the one or more supports by a flexure connection.

14. A charged particle source module according to claim 13, wherein at least one of the emitter arrangement and the electrode is rigidly connected to the one or more supports. 15 . The charged particle source module according to claim 14 , wherein the charged particle source device comprises two or more electrodes, a most downstream electrode of the two or more electrodes being rigidly connected to the one or more supports.

16. A charged particle source module according to any one of claims 13 to 15, wherein the emitter device and the electrode include a plate-like electrode body, wherein the flexible connector includes a connecting lip arranged at the periphery of the plate-like electrode body, wherein the connecting lip defines a slit between the connecting lip and the plate-like electrode body.

17. A charged particle source module according to claim 1 or 2, wherein the power connection assembly includes a non-conductive connection plate arranged at the first frame portion of the frame, wherein the power connection assembly includes one or more connectors, the wires are connected to the periphery of the electrode and to the one or more connectors, and wherein the wires extend in a direction parallel to the support member of the frame.

18. The charged particle source module according to claim 1 or 2, wherein the electric wires comprise one or more electric wires having a service loop and / or the electric wires are flexible electric wires.

19. An exposure system for emitting a charged particle beam toward a surface or target, comprising: - A charged particle source module for generating and emitting a charged particle beam according to any one of claims 1 to 18; and - a charged particle optical device configured to receive a charged particle beam generated and emitted by the charged particle source module and to direct the charged particle beam towards the surface or the target, Wherein the second frame portion of the frame is arranged at the charged particle optical device.

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