Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus

Abstract

The present invention relates to an electrophotographic photosensitive member, a process cartridge, and an electrophotographic apparatus. The electrophotographic photosensitive member has: a cylindrical support body; and a photosensitive layer, wherein the support body has a surface formed of Al and / or an Al alloy, and the surface of the support body includes Al grains having (a) a plane having a {001} orientation of -15° or more and less than +15°, (b) a plane having a {101} orientation of -15° or more and less than +15°, and (g) a plane having a {111} orientation of -15° or more and less than +15°, the proportion of the area occupied by the Al grains having (g) with respect to the total area of the surface of the support body is 10% or less, and the proportion of the area occupied by either of the Al grains having (a) and the Al grains having (b) is 60% or more.

Description

Technical Field

[0001] The present invention relates to an electrophotographic photosensitive element, a processing box including the electrophotographic photosensitive element, and an electrophotographic apparatus including the electrophotographic photosensitive element. Background Technology

[0002] In recent years, the diversity of users of electronic photography equipment has progressed, and the demand for output images with higher image quality than before is increasing.

[0003] International Publication No. WO2019 / 077705 describes a technique for incorporating stress values ​​within a conductive support in the range of -30 to 5 MPa as a technique for improving image quality.

[0004] Japanese Patent Application Publication No. 2009-150958 describes a technique for heating an aluminum alloy component tube at 190°C to 550°C before cutting, as a technique to improve image quality from the point of view of precision.

[0005] Furthermore, Japanese Patent Application Publication No. 2017-111409 describes an Al alloy with a specific composition in which the average grain area is 3 to 100 μm. 2 The technology.

[0006] According to the inventor's research, the electrophotographic photosensitive components described in International Publication No. WO2019 / 077705, Japanese Patent Application Publication No. 2009-150958, and Japanese Patent Application Publication No. 2017-111409 have the problem that the outlines of points and lines forming the output image are easily blurred.

[0007] Therefore, one object of the present invention is to provide an electrophotographic photosensitive component capable of suppressing blurring of dots and lines that form the output image. Summary of the Invention

[0008] The above objectives are achieved by the following invention. Specifically, according to one aspect of the invention, the electrophotographic photosensitive component is an electrophotographic photosensitive component having a cylindrical support and a photosensitive layer, wherein...

[0009] The support has a surface formed of Al and / or an Al alloy, and

[0010] The surface of the support includes Al grains, which have

[0011] (α) A face having a {001} orientation greater than -15° and less than +15°.

[0012] (β) A face with a {101} orientation greater than -15° and less than +15°, and

[0013] (γ) A face having a {111} orientation greater than -15° and less than +15°.

[0014] The area occupied by Al grains with (γ) is less than 10% of the total area of ​​the surface of the support, and the area occupied by either Al grains with (α) or Al grains with (β) is more than 60%.

[0015] In addition, according to another aspect of the invention, the processing box integrates an electrophotographic photosensitive component and at least one unit selected from the group consisting of a charging unit, a developing unit, and a cleaning unit, and the processing box is detachably mounted to the body of the electrophotographic device.

[0016] Furthermore, according to another aspect of the present invention, the electrophotographic apparatus includes an electrophotographic photosensitive element, as well as a charging unit, an exposure unit, a developing unit, and a transfer unit.

[0017] Further features of the invention will become apparent from the following description of exemplary embodiments, with reference to the accompanying drawings. Attached Figure Description

[0018] Figure 1A , Figure 1B ,and Figure 1C A diagram showing the distribution of Al grains.

[0019] Figure 2 A diagram showing the measured locations of Al grains.

[0020] Figure 3 This figure illustrates an example of a schematic construction of an electrophotographic device having a processing box including an electrophotographic photosensitive element. Detailed Implementation

[0021] Preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0022] The present invention will now be described in detail with reference to preferred embodiments.

[0023] As a result of the inventors' research, it has been found that the techniques described in International Publication No. WO2019 / 077705, Japanese Patent Application Publication No. 2009-150958, and Japanese Patent Application Publication No. 2017-111409 have the potential to cause slight potential changes in the exposed areas of the electrophotographic photosensitive element due to minute resistance inhomogeneities in the conductive support. As a result, it is believed that blurring of the points forming the output image is likely to occur.

[0024] In order to solve the above-mentioned technical problems in the prior art, the inventors studied the crystal orientation of the surface of the aluminum support.

[0025] As a result of the above research, it has been found that the above technical problems can be solved by using the following electrophotographic photosensitive component according to the present invention.

[0026] That is, the electrophotographic photosensitive component according to the present invention is an electrophotographic photosensitive component having a cylindrical support and a photosensitive layer, wherein

[0027] The support has a surface formed of Al and / or an Al alloy, and

[0028] The surface of the support includes Al grains, which have

[0029] (α) A face having a {001} orientation greater than -15° and less than +15°.

[0030] (β) A face with a {101} orientation greater than -15° and less than +15°, and

[0031] (γ) A face having a {111} orientation greater than -15° and less than +15°.

[0032] The area occupied by Al grains with (γ) is less than 10% of the total area of ​​the surface of the support, and the area occupied by either Al grains with (α) or Al grains with (β) is more than 60%.

[0033] In this invention, for example, a {111} orientation with a deviation of -15° or more and less than +15° refers to a crystal plane in aluminum crystal that has a deviation of -15° or more and less than +15° from the {111} plane.

[0034] The inventors believe that the mechanism by which the present invention can solve the above-mentioned technical problems in the prior art is as follows.

[0035] Aluminum crystals generally have three orientations: {101}, {001}, and {111}. As described in "Koberunikusu" ([No. 28] Vol. 14 2005 OCT), for example, as... Figure 1A As shown, typically, grains with various crystal orientations are randomly distributed.

[0036] The inventors hypothesize that the ease of electron flow in a grain varies depending on the crystal orientation, and that grains with a {101} orientation with a face of -15° or higher and less than +15° and grains with a {001} orientation with a face of -15° or higher and less than +15° are more likely to allow electron flow than grains with a {111} orientation with a face of -15° or higher and less than +15°.

[0037] In existing aluminum supports, grains with three crystal orientations exist randomly, and it is therefore believed that, although small, potential inhomogeneities are generated in the point-forming region, thereby causing ambiguity.

[0038] For example, such as Figure 1B and Figure 1C As shown, the surface of the aluminum support is formed in a state rich in grains with {101} orientation faces having a value of -15° to +15° or a value of -15° to +15° that are estimated to facilitate electron flow. As a result, it is believed that the current flowing through the surface of the aluminum support becomes more uniform, and small potential non-uniformities are improved, thereby reducing point blurring.

[0039] [Electronic photographic sensor]

[0040] The electrophotographic photosensitive component according to the present invention includes a cylindrical support and a photosensitive layer.

[0041] An example of a method for producing an electrophotographic photosensitive component according to the present invention includes preparing a coating liquid for the layers described below, coating the layers in a desired order, and a drying method. In this case, examples of coating methods for the coating liquid include dip coating, spray coating, inkjet coating, roller coating, die coating, doctor blade coating, curtain coating, wire rod coating, and ring coating. Of these, dip coating is preferred from the viewpoint of efficiency and productivity.

[0042] The support structure and each layer will be described below.

[0043] <Support Body>

[0044] The electrophotographic photosensitive component according to the present invention has a cylindrical support body, and the surface of the support body is formed of at least one selected from Al and Al alloys. Furthermore, the surface of the support body can be subjected to hot water treatment, sandblasting, or machining treatment.

[0045] (1) Crystal Orientation

[0046] In this invention, for example, the symbol for the crystal orientation of Al in the surface direction of the support surface, such as the {001} oriented plane, represents the crystal plane of Al with Miller indices. That is, the {001} oriented plane is a comprehensive expression of the Miller indices of any one of the lattice planes (001), (010), (100), (00-1), (0-10), and (-100).

[0047] In this invention, the surface of the support includes Al grains, which have the following characteristics:

[0048] (α) A surface having a {001} orientation greater than -15° and less than +15°;

[0049] (β) A face having a {101} orientation greater than -15° and less than +15°; and

[0050] (γ) A face having a {111} orientation greater than -15° and less than +15°.

[0051] The area occupied by Al grains with (γ) is less than 10% of the total area of ​​the support surface, and the area occupied by either Al grains with (α) or Al grains with (β) is more than 60%.

[0052] From the viewpoint of increasing the number of surfaces through which electrons can easily flow, the area occupied by either Al grains having (α) or Al grains having (β) is preferably 67% or more. Furthermore, the area occupied by either Al grains having (α) or Al grains having (β) is preferably 75% or more. In particular, the effect of the present invention can be better obtained when the area occupied by Al grains having (β) is 75% or more.

[0053] Furthermore, from the viewpoint of reducing the number of surfaces through which electrons have difficulty flowing, the proportion of the area occupied by Al grains having (γ) is preferably 5% or less.

[0054] (Method for measuring the crystal orientation of Al grains on the surface of a support)

[0055] In this invention, the crystal orientation of Al grains on the support surface can be measured, for example, as follows.

[0056] The surface of the support is treated by grinding or with an aqueous solution of sodium hydroxide, and the crystal orientation of the Al grains is measured at a point within 20 μm of the support surface prior to treatment. Crystal orientation is preferably measured using the SEM-EBSP method.

[0057] Measurements using the SEM-EBSP method were performed using a FE-SEM (Field Emission Scanning Electron Microscopy) equipped with an EBSP (Electron Backscattering Diffraction Pattern) detector. In this paper, the SEM-EBSP method is used to determine the crystal orientation and crystal system at the electron beam irradiation location by analyzing the Kikuchi pattern obtained from reflected electrons generated when the surface of a test piece is irradiated with an electron beam. Furthermore, the Kikuchi pattern refers to the pattern that appears behind the electron diffraction image as a pair of parallel black and white lines, bands, or an array when an electron beam strikes a crystal and is scattered and diffracted.

[0058] For example, a field emission scanning electron microscope (trade name: JSM-6500F, manufactured by JEOL Ltd.) can be used as a FE-SEM equipped with an EBSP detector.

[0059] (2) Area of ​​Al grains on the surface of the support

[0060] In this invention, the surface of the support includes Al grains, which have the following characteristics:

[0061] (α) A surface having a {001} orientation greater than -15° and less than +15°;

[0062] (β) A face having a {101} orientation greater than -15° and less than +15°; and

[0063] (γ) A face having a {111} orientation greater than -15° and less than +15°.

[0064] The area occupied by Al grains with (γ) is less than 10% of the total area of ​​the support surface, and the area occupied by either Al grains with (α) or Al grains with (β) is more than 60%.

[0065] The proportion of the area occupied by Al grains with the above crystal orientations can be determined as follows.

[0066] like Figure 2 As shown, positions corresponding to 1 / 8, 2 / 8, 3 / 8, 4 / 8, 5 / 8, 6 / 8, and 7 / 8 of the total length axially from any end of the support were determined. Furthermore, each position was divided into four circumferential sections at 90° intervals. A 100 μm square region was established at each of the 28 points where the axial and circumferential division lines intersect, such that the intersection of the axial and circumferential division lines is at the center, and crystal orientation was measured using SEM-EBSP. Then, for Al grains with (α), (β), and (γ) crystal orientations, the area occupied by each orientation was calculated, and the obtained value was divided by 10000 μm. 2 To determine the proportion of the area occupied by Al grains with each crystal orientation in each region. Finally, the average value of each value obtained from 28 regions was determined as the proportion of the area occupied by (α), (β), and (γ) of the support.

[0067] The area occupied by Al grains with each crystal orientation can be calculated using the accompanying software, or, for example, by hue mapping of the region of Al grains with each crystal orientation having a hue h in the HSV color space, with the range of (α) set to 0≤h<60 and 300≤h<360, the range of (β) set to 60≤h<180, and the range of (γ) set to 180≤h<300.

[0068] In this invention, the average area of ​​Al grains on the surface of the support is preferably 5 μm. 2 The average area of ​​Al grains on the surface of the support can be determined as follows.

[0069] The same region as described above is observed, and the area of ​​each Al grain region specified by the observation is obtained. Then, all Al grains within the observed 100 μm square region and not spanning the 100 μm square region are taken as the total, and the average area of ​​the region occupied by the Al grains is calculated.

[0070] (3) Al alloy used as a support

[0071] From the viewpoint of controlling crystal orientation, the support is preferably, for example, a 3000 series Al alloy such as JIS A3003 alloy, or a 6000 series Al alloy such as JIS A6063 alloy. Specifically, JIS A3003 alloy is an Al alloy comprising less than 0.6% by mass of Si, less than 0.7% by mass of Fe, 0.05 to 0.2% by mass of Cu, 1.0 to 1.5% by mass of Mn, and less than 0.1% by mass of Zn. Similarly, JIS A6063 alloy is an Al alloy comprising less than 0.2% by mass of Si, less than 0.35% by mass of Fe, less than 0.1% by mass of Cu, less than 0.1% by mass of Mn, 0.45 to 0.9% by mass of Mg, less than 0.1% by mass of Cr, less than 0.1% by mass of Zn, and less than 0.1% by mass of Ti.

[0072] (4) Manufacturing method of support body

[0073] There are no particular restrictions on the production method of the support body, as long as it can produce a support body that meets the requirements of this invention.

[0074] Examples of methods for producing the support include methods comprising the following four steps.

[0075] • Prepare a specific Al alloy and perform hot extrusion to obtain a shaped article.

[0076] • Cold drawing of the shaped part

[0077] Annealing after cold drawing

[0078] • Machining surface after annealing

[0079] When crystal orientation is controlled by annealing, the crystal orientation can be controlled by adjusting the heating time, annealing temperature, holding time, and cooling time.

[0080] Specifically, setting the annealing temperature to 405 to 450°C causes recrystallization, resulting in the faces of grains with {101} and {001} orientations being on the surface. Therefore, the proportion of the surface area occupied by grains with {101} and {001} orientations on the support increases.

[0081] Furthermore, since the heating rate, holding time, and cooling rate vary, it is preferable to control the heating rate to 40°C / min or less, and preferably to control the cooling rate to 5°C / min or less, until the temperature of the support reaches 150°C.

[0082] The holding time is preferably more than 2 hours in order to allow sufficient recrystallization.

[0083] In addition, thermal history is important in controlling crystal orientation; therefore, it is preferable to anneal the products that have undergone hot extrusion and cold drawing.

[0084] <Conductive Layer>

[0085] In this invention, a conductive layer can be disposed on the support. The conductive layer can shield scratches and unevenness on the surface of the support and control light reflection on the surface of the support.

[0086] The conductive layer preferably comprises conductive particles and resin.

[0087] Examples of materials with conductive particles include metal oxides, metals, and carbon black.

[0088] Examples of metal oxides include zinc oxide, aluminum oxide, indium oxide, silicon oxide, zirconium oxide, tin oxide, titanium oxide, magnesium oxide, antimony oxide, and bismuth oxide. Examples of metals include aluminum, nickel, iron, nickel-chromium alloys, copper, zinc, and silver.

[0089] Preferably, metal oxides are used as conductive particles, and more particularly, titanium oxide, tin oxide, or zinc oxide are preferred.

[0090] When metal oxides are used as conductive particles, the surface of the metal oxide can be treated with, for example, a silane coupling agent, or the metal oxide can be doped with elements such as phosphorus or aluminum or their oxides.

[0091] Additionally, the conductive particles can be composed of a stack of coating layers comprising core particles and coated particles. Examples of core particles include titanium oxide, barium sulfate, and zinc oxide. Examples of coating layers include metal oxides such as tin oxide.

[0092] Furthermore, when metal oxides are used as conductive particles, their volume average particle size is preferably 1 to 500 nm, and more preferably 3 to 400 nm.

[0093] Examples of resins include polyester resins, polycarbonate resins, polyvinyl acetal resins, acrylic resins, silicone resins, epoxy resins, melamine resins, polyurethane resins, phenolic resins, and alkyd resins.

[0094] In addition, the conductive layer may further include, for example, silicone oil, resin particles, and masking agents such as titanium dioxide.

[0095] The thickness of the conductive layer is preferably 1 to 50 μm, and particularly preferably 3 to 40 μm.

[0096] The conductive layer can be formed by preparing a coating solution containing the aforementioned materials and solvents, forming a film, and drying the film. Examples of solvents used in the coating solution include alcohol-based solvents, sulfoxide-based solvents, ketone-based solvents, ether-based solvents, ester-based solvents, and aromatic hydrocarbon-based solvents. Examples of dispersion methods for dispersing conductive particles in the coating solution for the conductive layer include methods using paint mixers, sand mills, ball mills, and high-speed liquid impact dispersers.

[0097] <Undercoat>

[0098] In this invention, the primer layer can be applied to the support or the conductive layer. Applying the primer layer enhances the adhesion between layers and provides a charge injection barrier.

[0099] The primer layer preferably comprises a resin. Alternatively, the primer layer can be formed into a cured film by polymerizing a composition comprising monomers having polymerizable functional groups.

[0100] Examples of resins include polyester resins, polycarbonate resins, polyvinyl alcohol acetal resins, acrylic resins, epoxy resins, melamine resins, polyurethane resins, phenolic resins, polyvinylphenol resins, alkyd resins, polyvinyl alcohol resins, polyethylene oxide resins, polypropylene oxide resins, polyamide resins, polyamic acid resins, polyimide resins, polyamide-imide resins, and cellulose resins.

[0101] Examples of polymerizable functional groups in monomers include isocyanate groups, terminal isocyanate groups, hydroxymethyl groups, alkylated hydroxymethyl groups, epoxy groups, metal alkoxide groups, hydroxyl groups, amino groups, carboxyl groups, thiol groups, carboxylic anhydride groups, and carbon-carbon double bond groups.

[0102] Furthermore, to improve electrical properties, the base coating may further comprise, for example, electron transport materials, metal oxides, metals, and conductive polymers. Among these, electron transport materials and metal oxides are preferred.

[0103] Examples of electron transport materials include quinone compounds, imide compounds, benzimidazole compounds, cyclopentadienyl compounds, fluorenone compounds, xanthones, benzophenone compounds, cyanovinyl compounds, halogenated aromatic compounds, thiophene compounds, and boron-containing compounds. The primer layer can be formed into a cured film by using an electron transport material with polymerizable functional groups as the electron transport material and copolymerizing the electron transport material with the aforementioned monomers with polymerizable functional groups.

[0104] Examples of metal oxides include indium tin oxide, tin oxide, indium oxide, titanium oxide, zinc oxide, aluminum oxide, and silicon dioxide. Examples of metals include gold, silver, and aluminum.

[0105] In addition, the base coat may contain additives.

[0106] The thickness of the base coating is preferably 0.1 to 50 μm, more preferably 0.2 to 40 μm, and particularly preferably 0.3 to 30 μm.

[0107] The primer layer can be formed by preparing a primer coating solution containing the above-mentioned materials and solvents, forming a film, and drying and / or curing the film. Examples of solvents used in the coating solution include alcohol solvents, ketone solvents, ether solvents, ester solvents, and aromatic hydrocarbon solvents.

[0108] <Photosensitive layer>

[0109] The photosensitive layer of an electrophotographic photosensitive component is mainly classified into (1) stacked photosensitive layer and (2) single-layer photosensitive layer. (1) Stacked photosensitive layer includes a charge generation layer containing charge generation material and a charge transport layer containing charge transport material. (2) Single-layer photosensitive layer includes a photosensitive layer containing both charge generation material and charge transport material.

[0110] (1) Layered photosensitive layer

[0111] A stacked photosensitive layer includes a charge generation layer and a charge transport layer.

[0112] (1-1) Charge generation layer

[0113] The charge-generating layer preferably comprises a charge-generating material and a resin.

[0114] Examples of charge-generating materials include azo pigments, perylene pigments, polycyclic quinone pigments, indigo pigments, and phthalocyanine pigments. Among these, azo pigments and phthalocyanine pigments are preferred. Of the phthalocyanine pigments, titanium dioxide phthalocyanine pigments, gallium chloride phthalocyanine pigments, and hydroxy gallium phthalocyanine pigments are preferred.

[0115] The content of charge-generating material in the charge-generating layer is preferably 40 to 85% by mass relative to the total mass of the charge-generating layer, and more preferably 60 to 80% by mass.

[0116] Examples of resins include polyester resins, polycarbonate resins, polyvinyl acetal resins, polyvinyl butyral resins, acrylic resins, silicone resins, epoxy resins, melamine resins, polyurethane resins, phenolic resins, polyvinyl alcohol resins, cellulose resins, polystyrene resins, polyvinyl acetate resins, and polyvinyl chloride resins. Among these, polyvinyl butyral resins are more preferred.

[0117] Furthermore, the charge-generating layer may further contain additives such as antioxidants and ultraviolet absorbers. Specific examples include hindered phenolic compounds, hindered amine compounds, sulfur compounds, phosphorus compounds, and benzophenone compounds.

[0118] The thickness of the charge generation layer is preferably 0.1 to 1 μm, and more preferably 0.15 to 0.4 μm.

[0119] The charge-generating layer can be formed by preparing a coating solution containing the above-described materials and solvents, forming a film, and drying the film. Examples of solvents used in the coating solution include alcohol-based solvents, sulfoxide-based solvents, ketone-based solvents, ether-based solvents, ester-based solvents, and aromatic hydrocarbon-based solvents.

[0120] (1-2) Charge transport layer

[0121] The charge transport layer preferably comprises a charge transport material and a resin.

[0122] Examples of charge transport materials include polycyclic aromatic compounds, heterocyclic compounds, hydrazone compounds, styryl compounds, enamine compounds, benzidine compounds, triarylamine compounds, and resins having groups derived from these materials. Among these, triarylamine compounds and benzidine compounds are preferred.

[0123] The content of charge transport material in the charge transport layer is preferably 25 to 70% by mass relative to the total mass of the charge transport layer, and more preferably 30 to 55% by mass.

[0124] Examples of resins include polyester resins, polycarbonate resins, acrylic resins, and polystyrene resins. Polycarbonate resins and polyester resins are preferred. Polyester resins are particularly preferred.

[0125] The content ratio (mass ratio) between charge transport material and resin is preferably 4:10 to 20:10, more preferably 5:10 to 12:10.

[0126] In addition, the charge transport layer may contain additives such as antioxidants, UV absorbers, plasticizers, leveling agents, slip-improving agents, and abrasion resistance enhancers. Specific examples include hindered phenolic compounds, hindered amine compounds, sulfur compounds, phosphorus compounds, benzophenone compounds, siloxane-modified resins, silicone oils, fluoropolymer particles, polystyrene resin particles, polyethylene resin particles, silica particles, alumina particles, and boron nitride particles.

[0127] The thickness of the charge transport layer is preferably 5 to 50 μm, more preferably 8 to 40 μm, and particularly preferably 10 to 30 μm.

[0128] The charge transport layer can be formed by preparing a coating solution containing the above-described materials and solvents, forming a film, and drying the film. Examples of solvents used in the coating solution include alcohol-based solvents, ketone-based solvents, ether-based solvents, ester-based solvents, and aromatic hydrocarbon-based solvents. Among these solvents, ether-based solvents or aromatic hydrocarbon-based solvents are preferred.

[0129] (2) Single-layer photosensitive layer

[0130] A single-layer photosensitive layer can be formed by preparing a coating solution containing a charge-generating material, a charge-transporting material, a resin, and a solvent, forming a film, and then drying the film. Examples of charge-generating materials, charge-transporting materials, and resins are the same as those in “(1) Layered photosensitive layers” above.

[0131] <Protective Layer>

[0132] In this invention, a protective layer can be formed on the photosensitive layer. Forming a protective layer improves durability.

[0133] The protective layer preferably comprises conductive particles and / or charge transport materials, and resin.

[0134] Examples of conductive particles include particles of metal oxides such as titanium oxide, zinc oxide, tin oxide, and indium oxide.

[0135] Examples of charge transport materials include polycyclic aromatic compounds, heterocyclic compounds, hydrazone compounds, styryl compounds, enamine compounds, benzidine compounds, triarylamine compounds, and resins having groups derived from these materials. Among these, triarylamine compounds and benzidine compounds are preferred.

[0136] Examples of resins include polyester resins, acrylic resins, phenoxy resins, polycarbonate resins, polystyrene resins, phenolic resins, melamine resins, and epoxy resins. Among these, polycarbonate resins, polyester resins, and acrylic resins are preferred.

[0137] Alternatively, the protective layer can be formed into a cured film by polymerizing a composition containing monomers with polymerizable functional groups. Examples of reactions in this case include thermal polymerization, photopolymerization, and radiation polymerization. Examples of polymerizable functional groups in monomers include acrylate and methacrylate groups. Materials with charge transport capabilities can be used as monomers with polymerizable functional groups.

[0138] The protective layer may contain additives such as antioxidants, UV absorbers, plasticizers, leveling agents, slip-improving agents, and abrasion resistance enhancers. Specific examples include hindered phenolic compounds, hindered amine compounds, sulfur compounds, phosphorus compounds, benzophenone compounds, siloxane-modified resins, silicone oils, fluoropolymer particles, polystyrene resin particles, polyethylene resin particles, silica particles, alumina particles, and boron nitride particles.

[0139] The thickness of the protective layer is preferably 0.5 to 10 μm, and more preferably 1 to 7 μm.

[0140] The protective layer can be formed by preparing a coating solution containing the above-described materials and solvents, forming a film, and drying and / or curing the film. Examples of solvents used in the coating solution include alcohol solvents, ketone solvents, ether solvents, sulfoxide solvents, ester solvents, and aromatic hydrocarbon solvents.

[0141] [Processing box and electrophotographic equipment]

[0142] According to the invention, the processing box integrally supports the aforementioned electrophotographic photosensitive component and at least one unit selected from the group consisting of a charging unit, a developing unit, and a cleaning unit, and the processing box is detachably mounted on the main body of the electrophotographic device.

[0143] In addition, the electrophotographic apparatus according to the present invention includes the above-described electrophotographic photosensitive component, and at least one unit selected from the group consisting of a charging unit, an exposure unit, a developing unit, and a transfer unit.

[0144] Figure 3 An example of a schematic configuration of an electrophotographic device is shown, including a processing box containing an electrophotographic photosensitive element.

[0145] The cylindrical electrophotographic photosensitive element 1 is driven to rotate around axis 2 at a predetermined circumferential speed in the direction of the arrow. The surface of the electrophotographic photosensitive element 1 is charged to a predetermined positive or negative potential through charging unit 3.

[0146] The accompanying drawings illustrate a roller charging method using a roller-type charging component; however, charging methods such as corona charging, proximity charging, or injection charging can also be used.

[0147] Exposure light 4 from an exposure unit (not shown) irradiates the charged surface of the electrophotographic photosensitive member 1, forming an electrostatic latent image corresponding to the target image information. Toner contained in a developing unit 5 develops the electrostatic latent image formed on the surface of the electrophotographic photosensitive member 1, forming a toner image on the surface of the electrophotographic photosensitive member 1. The toner image formed on the surface of the electrophotographic photosensitive member 1 is transferred to a transfer material 7 via a transfer unit 6. The transfer material 7 with the transferred toner image is conveyed to a fixing unit 8 for fixing the toner image and printing it onto the exterior of the electrophotographic device.

[0148] Electrophotographic equipment may include a cleaning unit 9 for removing, for example, toner residues remaining on the surface of the electrophotographic photosensitive element 1 after transfer. Alternatively, a so-called cleanerless system may be used, in which residues are removed by means of, for example, a developing unit 5, without the need for a separate cleaning unit 9.

[0149] Electrophotographic equipment may have a static removal mechanism that uses pre-exposure light 10 from a pre-exposure unit (not shown) to remove static electricity from the surface of the electrophotographic photosensitive member 1. Additionally, in order to detachably mount the processing cartridge 11 according to the invention to the main body of the electrophotographic equipment, a guide unit 12, such as a guide rail, may be provided.

[0150] The electrophotographic photosensitive component according to the present invention can be used in laser beam printers, LED printers, copiers, fax machines, and multifunction printers.

[0151] The present invention can provide an electrophotographic photosensitive component capable of suppressing blurring of points that form the output image.

[0152] [Example]

[0153] The present invention will now be described in more detail with reference to embodiments and comparative examples. The invention is by no means limited to the following embodiments, but is permitted to follow their spirit. In the following description of the embodiments, unless otherwise stated, "parts" are based on mass.

[0154] [Production of the support structure]

[0155] The support body is manufactured using the following methods.

[0156] (Production example of support body A-1)

[0157] Cold drawing was performed on the extruded tube made of JIS A 3003 alloy formed by hot extrusion to obtain a drawn tube with an outer diameter of 30.8 mm, an inner diameter of 28.5 mm, and a length of 370 mm.

[0158] Then, the drawn tube is placed in an electric furnace and heated at a rate of 5°C / min, then held at 450°C for 2.5 hours, followed by cooling at 2°C / min until the drawn tube reaches 150°C, and then removed from the electric furnace after 24 hours.

[0159] After annealing, the surface is mirror polished to obtain "Support A-1" with an outer diameter of 30.5 mm, an inner diameter of 28.5 mm, and a length of 370 mm. The production conditions of Support A-1 are shown in Table 1.

[0160] Elemental analysis of the drawn tubes used revealed that they were Al alloys comprising 0.16% by mass Si, 0.2% by mass Fe, 0.08% by mass Cu, 1.3% by mass Mn, and 0.02% by mass Zn.

[0161] (Production examples of supports A-2 to A-14)

[0162] Except for using the same drawn tube and changing the annealing conditions as shown in Table 1 in the production example of support body A-1, the support body is produced in the same manner as in the production example of support body A-1. The obtained support bodies are referred to as "support bodies A-2 to A-14". The production conditions of support bodies A-2 to A-14 are shown in Table 1.

[0163] (Production example of support body A-15)

[0164] Cold drawing was performed on the extruded tube made of JIS A 6063 alloy formed by hot extrusion to obtain a drawn tube with an outer diameter of 30.8 mm, an inner diameter of 28.5 mm, and a length of 370 mm.

[0165] Then, the drawn tube is placed in an electric furnace and heated at a rate of 5°C / min, and then held at 450°C for 5.0 hours. It is then cooled at a rate of 5°C / min until the drawn tube reaches 150°C, and then removed from the electric furnace after 24 hours.

[0166] After annealing, the surface is mirror polished to obtain "Support A-15" with an outer diameter of 30.5 mm, an inner diameter of 28.5 mm, and a length of 370 mm. The production conditions for Support A-15 are shown in Table 1.

[0167] Elemental analysis of the drawn tubes used revealed that they were Al alloys comprising 0.5% by mass Si, 0.3% by mass Fe, 0.07% by mass Cu, less than 0.08% by mass Mn, 0.7% by mass Mg, 0.04 to 0.35% by mass Cr, less than 0.08% by mass Zn, and 0.06% by mass Ti.

[0168] (Production example of support body A-16)

[0169] Cold drawing was performed on the extruded tube made of JIS A 3003 alloy formed by hot extrusion to obtain a drawn tube with an outer diameter of 30.8 mm, an inner diameter of 28.5 mm, and a length of 370 mm.

[0170] Then, the drawn tube is placed in an electric furnace and heated at a rate of 5°C / min, then held at 450°C for 2.5 hours, and then cooled at 5°C / min until the drawn tube reaches 150°C, and then removed from the electric furnace after 24 hours.

[0171] After annealing, the surface is mirror polished to obtain "Support A-16" with an outer diameter of 30.5 mm, an inner diameter of 28.5 mm, and a length of 370 mm. The production conditions for Support A-16 are shown in Table 1.

[0172] Elemental analysis of the drawn tubes used revealed that they were Al alloys comprising 0.5% by mass Si, 0.6% by mass Fe, 0.15% by mass Cu, 1.2% by mass Mn, and 0.8% by mass Zn.

[0173] (Production example of support body B-1)

[0174] Cold drawing was performed on the extruded tube made of JIS A 6063 alloy formed by hot extrusion to obtain a drawn tube with an outer diameter of 30.8 mm, an inner diameter of 28.5 mm, and a length of 370 mm.

[0175] Then, the drawn tube is placed in an electric furnace and heated at a rate of 5°C / min, then held at 450°C for 2.5 hours, and then cooled at 5°C / min until the drawn tube reaches 150°C, and then removed from the electric furnace after 24 hours.

[0176] After annealing, the surface is mirror polished to obtain "Support B-1" with an outer diameter of 30.5 mm, an inner diameter of 28.5 mm, and a length of 370 mm. The production conditions of Support B-1 are shown in Table 1.

[0177] Elemental analysis of the drawn tubes used revealed that they were Al alloys comprising 0.5% by mass Si, 0.3% by mass Fe, 0.07% by mass Cu, less than 0.08% by mass Mn, 0.7% by mass Mg, 0.04 to 0.35% by mass Cr, less than 0.08% by mass Zn, and 0.06% by mass Ti.

[0178] (Production examples of supports B-2 to B-14)

[0179] Except for using the same drawn tube and changing the annealing conditions as shown in Table 1 in the production example of support body B-1, the support body is produced in the same manner as in the production example of support body B-1. The obtained support bodies are referred to as "support bodies B-2 to B-14". The production conditions of support bodies B-2 to B-14 are shown in Table 1.

[0180] (Production example of support body B-15)

[0181] Except for changing the annealing conditions as shown in Table 1 in the production example of support body A-1, the support body is produced in the same manner as in the production example of support body A-1. The obtained support body is referred to as "support body B-15". The production conditions of support body B-15 are shown in Table 1.

[0182] (Production examples of supports C-1 to C-10)

[0183] Except for changing the annealing conditions as shown in Table 1 in the production example of support body A-1, the support body is produced in the same manner as in the production example of support body A-1. The obtained support bodies are referred to as "support bodies C-1 to C-10". The production conditions of support bodies C-1 to C-10 are shown in Table 1.

[0184] (Production examples of support bodies C-11 to C-12)

[0185] Drawing tubes, constructed from an Al-Mg alloy containing 2.5% by mass of magnesium and having an outer diameter of 30.8 mm, an inner diameter of 28.5 mm, and a length of 370 mm, were annealed under the conditions shown in Table 1. After annealing, the surfaces were mirror-polished to obtain "Support C-11 and Support C-12," each with an outer diameter of 30.5 mm, an inner diameter of 28.5 mm, and a length of 370 mm. The production conditions for Support C-11 and Support C-12 are shown in Table 1.

[0186] (Production examples of support bodies D-1 to D-10)

[0187] Except for changing the annealing conditions as shown in Table 1 in the production example of support body B-1, the support body is produced in the same manner as in the production example of support body B-1. The obtained support bodies are referred to as "support bodies D-1 to D-10". The production conditions of support bodies D-1 to D-10 are shown in Table 1.

[0188] [Table 1]

[0189]

[0190]

[0191] <Production of Electrophotographic Photosensitive Components>

[0192] (Production example of photosensitive component A-1)

[0193] Support A-1 was ultrasonically washed in an alkaline solution with a pH of 10.5, then washed with pure water, and finally immersed in hot water at 95°C for 60 seconds. The resulting support was used as a support.

[0194] Then, 100 parts of zinc oxide particles (specific surface area: 19 m²) were used as metal oxides. 2 / g, powder resistivity: 3.6×10 6 The zinc oxide granules were stirred and mixed with 500 parts of toluene (Ω·cm), and 0.8 parts of silane coupling agent were added. The mixture was stirred for 6 hours. The silane coupling agent used was N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane (trade name: KBM602, manufactured by Shin-Etsu Chemical Co., Ltd.). Subsequently, the toluene was distilled off under reduced pressure, and the mixture was heated and dried at 130°C for 6 hours to obtain surface-treated zinc oxide particles.

[0195] Then, prepare the following materials.

[0196] • 15 parts of butyral resin (trade name: BM-1, manufactured by Sekisui Chemical Co., Ltd.) as a polyol resin

[0197] • 15 parts of capped isocyanate (trade name: SUMIDUR 3175, manufactured by Sumika Bayer Urethane Co., Ltd.)

[0198] These were dissolved in a mixed solution of 73.5 parts methyl ethyl ketone and 73.5 parts 1-butanol. 80.8 parts surface-treated zinc oxide particles and 0.8 parts 2,3,4-trihydroxybenzophenone (manufactured by Tokyo Chemical Industry Co., Ltd.) were added to this solution, and the mixture was dispersed for 3 hours at atmospheric temperature of 23°C ± 3°C using a sand mill with glass beads of 0.8 mm in diameter.

[0199] Then, prepare the following materials.

[0200] • 0.01 parts silicone oil (trade name: SH28PA, manufactured by Dow Corning Toray Silicone Co., Ltd.)

[0201] • 5.6 parts cross-linked polymethyl methacrylate (PMMA) particles (trade name: TECHPOLYMER SSX-102, manufactured by Sekisui Plastics Co., Ltd., average primary particle size 2.5 μm)

[0202] These are added to the dispersed solution and stirred to prepare the coating solution for the primer layer.

[0203] The primer layer was applied to the support by immersion coating liquid, and the resulting film was dried at 160°C for 40 minutes to form a primer layer with a film thickness of 18 μm.

[0204] Then, prepare the following materials.

[0205] • A crystalline form of gallium phthalocyanine crystal (charge-generating material) exhibiting peaks at Bragg angles of 7.4° and 28.1° at 2θ±0.2° in characteristic X-ray diffraction of 20 CuKα samples.

[0206] • 0.2 parts of a calixarene compound represented by the following formula (A):

[0207]

[0208] • 10 parts polyvinyl butyral (trade name: S-LEC BX-1, manufactured by Sekisui Chemical Co., Ltd.)

[0209] 600 parts cyclohexanone

[0210] These were placed in a sand mill using glass beads with a diameter of 1 mm and dispersed for 4 hours. Subsequently, 700 parts of ethyl acetate were added to prepare a coating solution for the charge generation layer. The charge generation layer was then coated onto the primer layer using the coating solution, and the resulting film was dried at 80°C for 15 minutes to form a charge generation layer with a thickness of 0.17 μm.

[0211] Then, prepare the following materials.

[0212] • 30 parts of the compound (charge transport material) represented by formula (B) below

[0213] • 60 parts of a compound (charge transport material) represented by the following formula (C)

[0214] • 10 parts of a compound (charge transport material) represented by the following formula (D)

[0215]

[0216] • 100 parts polycarbonate resin (trade name: Iupilon Z400, bisphenol Z-type polycarbonate, manufactured by Mitsubishi Engineering-Plastics Corporation)

[0217] • 0.02 parts of polycarbonate represented by the following formula (E) (viscosity-average molecular weight Mv: 20000):

[0218]

[0219] These were dissolved in a mixed solvent of 600 parts xylene and 200 parts dimethoxymethane to prepare a coating solution for the charge transport layer. The charge transport layer was then coated onto the charge generation layer with the coating solution to form a film, and the resulting film was dried at 100°C for 30 minutes to form a charge transport layer with a thickness of 18 μm.

[0220] Then, a mixed solvent of 20 parts of 1,1,2,2,3,3,4-heptafluorocyclopentane (trade name: Zeorora H, manufactured by Zeon Corporation) / 20 parts of 1-propanol was filtered through a polytetrafluoroethylene filter (trade name: PF-040, manufactured by Advantec Toyo Kaisha, Ltd.).

[0221] In addition, prepare the following materials.

[0222] • 90 portions of the hole transport compound represented by the following formula (F):

[0223]

[0224] · 70 parts of 1,1,2,2,3,3,4-heptafluorocyclopentane

[0225] 70 parts of 1-propanol

[0226] These were added to a mixed solvent. The solution was then filtered through a polytetrafluoroethylene filter (trade name: PF-040, manufactured by Advantec Toyo Kaisha, Ltd.) to prepare a coating solution for the second charge transport layer (protective layer). This second charge transport layer coating solution was applied onto the charge transport layer, and the resulting film was dried in atmosphere at 50°C for 6 minutes. Subsequently, the film was irradiated with an electron beam for 1.6 seconds in nitrogen atmosphere while the support (irradiated object) rotated at 200 rpm, under conditions of an accelerating voltage of 70 kV and an absorbed dose of 8000 Gy. The film was then heated in nitrogen atmosphere by increasing the temperature from 25°C to 125°C over 30 seconds. The oxygen concentration in the atmosphere during electron beam irradiation and subsequent heating was 15 ppm. Finally, the film was heat-treated in atmosphere at 100°C for 30 minutes to form a second charge transport layer (protective layer) with electron beam curing and a film thickness of 5 μm.

[0227] Then, linear grooves were formed on the surface of the protective layer using a polishing pad (trade name: GC3000, manufactured by Richen Corundum Co., Ltd.). The feed rate of the polishing pad was 40 mm / min, the workpiece rotation speed was 240 rpm, and the pressure of the polishing pad on the workpiece was 7.5 N / m. 2 The feed direction of the polishing disc is the same as the rotation direction of the workpiece. Additionally, a support roller with an outer diameter of 40 cm and an Asker C hardness of 40 is used. Under these conditions, linear grooves are formed on the outer circumferential surface of the workpiece within 10 seconds.

[0228] Thus, photosensitive component A-1 is produced.

[0229] (Production examples of photosensitive components A-2 to A-16, B-1 to B-15, C-1 to C-12, and D-1 to D-10)

[0230] Except for using the support shown in Table 2, the electrophotographic photosensitive element is produced in the same manner as that in photosensitive element A-1. The obtained electrophotographic photosensitive elements are referred to as "photosensitive elements A-2 to A-16, photosensitive elements B-1 to B-15, photosensitive elements C-1 to C-12, and photosensitive elements D-1 to D-10".

[0231] [evaluate]

[0232] Prepare photosensitive component A-1 and install it into the cyan stage of an electrophotographic device (copier) (trade name: imagePRESS C910, manufactured by Canon Inc.) used as an evaluation device, and perform image evaluation as follows.

[0233] The cyan platform of the above evaluation equipment was installed in an environment of 23℃ / 50%RH, and the following conditions were set.

[0234] Paper: GFC-081 (81.0g / m³) 2 , Canon Marketing Japan Inc.)

[0235] V-contrast: 300V (DC voltage through the developer carrier) DC The charged voltage V of the electrostatic latent image carrier D (and laser power to adjust)

[0236] Evaluation image: An image with a dot and a spaced vertical line set on an A4 sheet of paper.

[0237] The blur value (a numerical value representing how blurred a line is, as defined by ISO 13660) was used as an evaluation metric for point reproducibility. The blur value was measured using a personal IAS (Image Analysis System, manufactured by Quality Engineering Associates Inc.). The obtained blur values ​​were evaluated according to the following criteria. These results are shown in Table 2.

[0238] A: The fuzzy value is less than 33μm

[0239] B: Blur value less than 35μm

[0240] C: Blur value is greater than 35μm and less than 38μm

[0241] D: Blur value is greater than 38μm and less than 41μm

[0242] E: Blur value is greater than 41μm and less than 45μm

[0243] Positions corresponding to 1 / 8, 2 / 8, 3 / 8, 4 / 8, 5 / 8, 6 / 8, and 7 / 8 of the total axial length from either end of the support were determined. Furthermore, each position was divided into four circumferential sections at 90° intervals. At each of the 28 points where the axial and circumferential dividing lines intersect, a 10 mm square segment was cut, such that the intersection of the axial and circumferential dividing lines was centered. The protective layer was removed with a polishing disc, and then the photosensitive layer was removed using methyl ethyl ketone. The surface of the support was then exposed and mirror-polished. The sample was then immersed in an aqueous sodium hydroxide solution for 1 minute to obtain a sample for crystal orientation observation. The surface center of the obtained sample, i.e., a 100 μm square region centered on the intersection of the axial and circumferential dividing lines of the support, was observed using SEM-EBSP, and the ratio of the area occupied by Al grains with each crystal orientation to the average area of ​​the Al grains was calculated. These results are shown in Table 2.

[0244] [Table 2]

[0245]

[0246]

[0247] Although the invention has been described with reference to exemplary embodiments, it should be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the appended claims should be interpreted in the broadest sense to cover all such modifications and equivalent structures and functions.

Claims

1. An electrophotographic photosensitive component, characterized in that, It includes: A cylindrical support; and photosensitive layer, in which The support has a surface formed of Al alloy. The support body is: Al alloys containing Cu in an amount of 0.05 to 0.2% by mass and Mn in an amount of 1.0 to 1.5% by mass; or Al alloys containing 0.2 to 0.6% by mass of Si and 0.45 to 0.9% by mass of Mg, and The surface of the support includes Al grains, and the Al grains have... (α) A face having a {001} orientation greater than -15° and less than +15°. (β) A face with a {101} orientation greater than -15° and less than +15°, and (γ) A face having a {111} orientation greater than -15° and less than +15°. The area occupied by Al grains having (γ) is less than 10% of the total area of ​​the surface of the support, and the area occupied by either Al grains having (α) or Al grains having (β) is more than 60%.

2. The electrophotographic photosensitive component according to claim 1, wherein the area occupied by the Al grains having (β) is 67% or more of the total area of ​​the surface of the support.

3. The electrophotographic photosensitive component according to claim 1, wherein the area occupied by the Al grains having (β) is 75% or more in proportion to the total area of ​​the surface of the support.

4. The electrophotographic photosensitive component according to claim 1, wherein the area occupied by the Al grains having (α) is 67% or more of the total area of ​​the surface of the support.

5. The electrophotographic photosensitive component according to claim 1, wherein the area occupied by the Al grains having (α) is 75% or more of the total area of ​​the surface of the support.

6. The electrophotographic photosensitive component according to any one of claims 1 to 5, wherein the area occupied by the Al grains having (γ) is less than 5% of the total area of ​​the surface of the support.

7. The electrophotographic photosensitive component according to any one of claims 1 to 5, wherein the average area of ​​Al grains on the surface of the support is 5 μm. 2 above.

8. A processing box, characterized in that, Its integrated support comprises an electrophotographic photosensitive component according to any one of claims 1 to 7 and at least one unit selected from the group consisting of a charging unit, a developing unit and a cleaning unit, and the processing box is detachably mounted to the body of the electrophotographic device.

9. An electrophotographic device, characterized in that, It includes: Electrophotographic photosensitive component according to any one of claims 1 to 7; Charging unit; Exposure unit; Developing unit; and transfer unit.

Images