Deploying optical layers in imprint lithography

Abstract

The present invention relates to configuring an optical layer in an imprint lithography process. An imprint lithography method for configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate to change the effective refractive index of the substrate; and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate so that the relative amount of light that can be transmitted through the substrate changes by a selected amount.

Description

[0001] This application is a divisional application of an application with an application date of October 19, 2018, PCT international application number of PCT / US2018 / 056644, Chinese national phase application number of 201880067545.0, and invention name of “Configuring an optical layer in an imprint lithography process”.

[0002] CROSS-REFERENCE TO RELATED APPLICATIONS

[0003] This application claims the benefit of the filing date of U.S. Provisional Application Serial No. 62 / 574,826, filed on October 20, 2017. The entire contents of U.S. Application Serial No. 62 / 574,826 are hereby incorporated by reference herein. Technical Field

[0004] The present invention relates to configuring optical layers in an imprint lithography process and, more particularly, to forming anti-reflective features on a substrate to adjust light transmission through the substrate. Background Art

[0005] Nanofabrication (e.g., nanoimprint lithography) is the manufacture of extremely small structures with features on the order of 100 nanometers or less. One application in which nanofabrication has had a significant impact is the processing of integrated circuits. The semiconductor processing industry continues to strive to increase production while increasing the number of circuits formed on a substrate per unit area of ​​the substrate. To this end, nanofabrication is becoming increasingly important for achieving desired results in the semiconductor processing industry. Nanofabrication provides greater process control capabilities while allowing for continued reductions in the minimum feature size of structures formed on a substrate. Other areas of development that have adopted nanofabrication include biotechnology, optical technology, mechanical systems, etc. In some examples, nanofabrication includes manufacturing structures on a substrate that are assembled to form an optical device. Summary of the invention

[0006] The present invention relates to the recognition that certain types of nanoscale features imprinted on a substrate can significantly improve the transmission of light (e.g., source light and world-side light) through the substrate. For example, anti-reflection (AR) patterns can be formed of nanoscale pillars, nanoscale holes, and nanoscale gratings that reduce light reflection losses at the substrate, thereby increasing light transmission through the substrate. Depending on the size, shape, aspect ratio, and spacing of the nanoscale features, patterned polymer films with a refractive index varying between 1.49 and 1.74 can be used to adjust the light transmission through the substrate to a desired level. In this regard, the AR pattern formed on the substrate can also provide a new effective refractive index for the substrate. Such features can be imprinted in ultra-thin films less than 150nm thick, thereby saving material usage and further allowing the use of stacked waveguides using thin imprinted layers on glass substrates. The total spacing and size of the imprinted nanoscale features is less than 300nm, so that the nanoscale features do not cause unwanted diffraction or light scattering as light propagates through each layer in a multi-color waveguide stack. Such embossed nanoscale features can also improve the transmission of world-side light through each layer, thereby enhancing the world-side objects observed through the user's eye (e.g., pupil). Such nanoscale features can also act as dummy fill areas around the edges of the waveguide pattern geometry, thereby enabling a smooth transition before the resist fluid is cured through a patterned area to another patterned area, as compared to curing through a patterned area to a blank unpatterned area. These nanoscale features are embossed with an extremely thin residual layer thickness of less than 100 nm, which allows the pattern to be transferred into any underlying material layer or directly into the substrate, thereby enhancing the anti-reflective properties of that layer or just the bare substrate itself.

[0007] One aspect of the invention features an imprint lithography method for configuring an optical layer. The imprint lithography method includes selecting one or more parameters of a nanolayer to be applied to a substrate to change the effective refractive index of the substrate; and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate so that the relative amount of light that can be transmitted through the substrate changes by a selected amount.

[0008] In some embodiments, the relative amount of light is a first relative amount of light, and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate includes changing a second relative amount of light reflected from a surface of the substrate.

[0009] In certain embodiments, the imprint lithography method further comprises selecting one or more of a shape, a size, and a material formulation of the nanolayer.

[0010] In some embodiments, the imprint lithography method further comprises imprinting a flat nanoimprint on the substrate.

[0011] In certain embodiments, the imprint lithography method further comprises imprinting a feature nanoimprint on the substrate.

[0012] In some embodiments, the imprint lithography method further comprises imprinting one or more anti-reflective (AR) features on the substrate.

[0013] In certain embodiments, the one or more AR features have a height in a range from about 10 nm to about 300 nm.

[0014] In some embodiments, the one or more AR features have a width in a range from about 10 nm to about 150 nm.

[0015] In certain embodiments, the imprint lithography method further includes distributing the one or more AR features at a pitch in a range of about 20 nm to about 200 nm.

[0016] In some embodiments, the imprint lithography method further includes forming a pillar on the substrate.

[0017] In certain embodiments, the imprint lithography method further includes forming a hole in the substrate.

[0018] In some embodiments, the imprint lithography method further includes forming one or both of a continuous grating and a discontinuous grating on the substrate.

[0019] In certain embodiments, the imprint lithography method further includes forming a functional pattern on a first side of the substrate; and imprinting the nanolayer along one or both of the first side of the substrate and a second side of the substrate opposite to the first side of the substrate.

[0020] In some embodiments, the imprint lithography method further comprises forming an array of AR features of the nanolayer along a specific direction relative to the functional pattern.

[0021] In certain embodiments, the imprint lithography method further includes forming the AR features of the nanolayer on the substrate to change the effective refractive index of the substrate based on the light propagation direction so that light transmitted through the substrate changes by the selected amount.

[0022] In some embodiments, the imprint lithography method further comprises applying a film coating on the substrate, and imprinting the nanolayer on top of the film coating.

[0023] In certain embodiments, the imprint lithography method further includes varying a relative amount of light capable of being transmitted through the substrate by about 0.5% to about 15%.

[0024] In some embodiments, the nanolayer is a first nanolayer, and the imprint lithography method further comprises imprinting a second nanolayer on top of the first nanolayer.

[0025] In some embodiments, the imprint lithography method further includes changing the effective refractive index to a first value based on the first nanolayer, and changing the effective refractive index to a second value based on the second nanolayer.

[0026] Another aspect of the invention features an optical layer that includes a substrate and a nanolayer imprinted on the substrate, the nanolayer determining an effective refractive index of the substrate such that the nanolayer affects a relative amount of light that can be transmitted through the substrate.

[0027] Another aspect of the invention features an optical device comprising a first optical layer and a second optical layer. The first optical layer comprises a first substrate and a nanolayer imprinted on the first substrate. The second optical layer comprises a second substrate and a functional pattern disposed along the second substrate. The nanolayer imprinted on the first substrate determines an effective refractive index of the first substrate such that the nanolayer increases a relative amount of light that can be transmitted through the first substrate to the second optical layer.

[0028] In some embodiments, the functional pattern disposed along the second substrate is a first functional pattern, and the optical device further includes a third optical layer including a third substrate and a second functional pattern disposed along the third substrate.

[0029] In some embodiments, the nanolayer imprinted on the first substrate is a first nanolayer, the effective refractive index of the first substrate is a first refractive index, the relative amount of light is a first relative amount of light, and the second optical layer includes a second nanolayer imprinted on the second substrate, the second nanolayer determines a second effective refractive index of the second substrate, so that the second nanolayer increases a second relative amount of light that can be transmitted through the second substrate to reach the third optical layer.

[0030] In some embodiments, the first nanolayer and the second nanolayer are configured such that a final amount of light transmitted through the first substrate and the second substrate to reach the third optical layer is approximately equal to an amount of light guided from a light source to the first nanolayer minus a first amount of light reflected from the first substrate minus a second amount of light reflected from the second substrate.

[0031] The details of one or more embodiments of the invention are set forth in the accompanying drawings and the description below. Other features, aspects, and advantages of the invention will be apparent from the description, drawings, and claims. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 is a diagram of an imprint lithography system.

[0033] Figure 2 Is Figure 1 Figure 1. Diagram of the patterned layer formed by the imprint lithography system.

[0034] Figure 3 is a top view of the optical layer.

[0035] Figure 4 yes Figure 3 Side view of the optical layer.

[0036] Figure 5 is a top view of the optical layer.

[0037] Figure 6 is a top view of the optical layer.

[0038] Figure 7 is a side view of the optical layer.

[0039] Figure 8 is a side view of the optical layer.

[0040] Fig. 9 is a side view of the optical layer.

[0041] Fig.10 SEM images (a) - (d) showing side views of various anti-reflection (AR) features are provided.

[0042] Fig.11 is a diagram showing the effect of a nanopattern applied directly atop a substrate.

[0043] Fig.12 is a diagram showing the effect of stacking a featured nanopattern on top of a substrate.

[0044] Fig.13 is a graph of light transmission through a substrate with various treatments applied to the substrate.

[0045] Fig.14 are diagrams showing a substrate with a nanoimprint grating applied in the same direction (a) and perpendicular direction (b) compared to the direction of the diffraction grating of the functional pattern on the substrate.

[0046] Fig.15 is a graph of light transmitted through a substrate with various treatments applied to the substrate.

[0047] Fig.16 is a graph of light transmitted through a WGP substrate with various treatments applied to the WGP substrate.

[0048] Fig.17 is a graph of refractive index for various substrate treatments.

[0049] Fig.18 is a diagram showing light transmission through a multilayer optic.

[0050] Fig.19 is a diagram showing a light source directed toward multiple layers of a waveguide eyepiece including a non-embossed AR film.

[0051] Fig. 20 is a diagram showing a light source directed toward multiple layers of a waveguide eyepiece including an imprinted AR nanolayer.

[0052] Fig.21 is a flow chart of an example method for configuring an optical layer in an imprint lithography process.

[0053] Like reference numbers in the various drawings indicate like elements.

[0054] In some instances, the diagrams shown in the drawings may not be drawn to scale. DETAILED DESCRIPTION

[0055] The imprint lithography process used to configure the optical layer is described below. The imprint lithography process involves forming a nanoscale surface relief pattern anti-reflection (AR) imprint on the substrate. This AR imprint is used to increase light transmission through the substrate to varying degrees, depending on various geometrical properties of the AR imprint.

[0056] Figure 1 An imprint lithography system 100 is shown, which can be operated to form a relief pattern on a top surface 103 of a substrate 101 (e.g., a wafer). The imprint lithography system 100 includes: a support assembly 102 that supports and transports the substrate 101; an imprint assembly 104 that forms a relief pattern on the top surface 103 of the substrate 101; a fluid dispenser 106 that deposits a polymerizable substance on the top surface 103 of the substrate 101; and a robot 108 that places the substrate 101 on the support assembly 102. The imprint lithography system 100 also includes one or more processors 128, which can run a computer-readable program stored in a memory, communicate with the support assembly 102, the imprint assembly 104, the fluid dispenser 106, and the robot 108, and are programmed to control the support assembly 102, the imprint assembly 104, the fluid dispenser 106, and the robot 108.

[0057] Substrate 101 is a substantially planar sheet, typically made of one or more materials including silicon, silicon dioxide, titanium dioxide, zirconium dioxide, aluminum oxide, sapphire, germanium, gallium arsenide (GaAs), silicon germanium alloy, indium phosphide (InP) or other example materials. Substrate 101 typically has a substantially circular or rectangular shape. Substrate 101 typically has a diameter in the range of about 50 mm to about 200 mm (e.g., about 65 mm, about 150 mm, or about 200 mm) or a length and width in the range of about 50 mm to about 200 mm (e.g., about 65 mm, about 150 mm, or about 200 mm). Substrate 101 typically has a thickness in the range of about 0.2 mm to about 1.0 mm. The thickness of substrate 101 is substantially uniform (e.g., constant) across substrate 101. The relief pattern is formed as a set of structural features (e.g., protrusions and depressions) of a polymerizable substance on the top surface 103 of substrate 101, which will be discussed in detail below.

[0058] The support assembly 102 includes: a chuck 110 that supports and fixes the substrate 101; an air bearing 112 that supports the chuck 110; and a base 114 that supports the air bearing 112. The base 114 is located in a fixed position, and the air bearing 112 can move in up to three directions (e.g., x, y, and z directions) to transport the chuck 110 (e.g., in some cases, the carrier substrate 101) to and from the robot 108, the fluid dispenser 106, and the imprint assembly 104. In some embodiments, the chuck 110 is a vacuum chuck, a pin chuck, a groove chuck, an electromagnetic chuck, or other types of chucks.

[0059] Still reference Figure 1, the imprint assembly 104 includes a flexible template 116 having a patterned surface defining a primary pattern by which a relief pattern is complementarily formed on the top surface 103 of the substrate 101. Thus, the patterned surface of the flexible template 116 includes structural features, such as protrusions and depressions. The imprint assembly 104 also includes a plurality of rollers 118, 120, 122 of various diameters that rotate to allow one or more portions of the flexible template 116 to move along the x-direction within a processing region 130 of the imprint lithography system 100, so that selected portions of the flexible template 116 are aligned (e.g., overlapped) with the substrate 101 along the processing region 130. One or more of the rollers 118, 120, 122 are movable individually or together along a vertical direction (e.g., z-direction) to change the vertical position of the flexible template 116 in the processing region 130 of the imprint assembly 104. Thus, the flexible template 116 can be pushed down onto the substrate 101 in the processing area 130 to form an imprint atop the substrate 101. The arrangement and number of rollers 118, 120, 122 can vary according to various design parameters of the imprint lithography system 100. In some embodiments, the flexible template 116 is coupled to (e.g., supported or secured by) a vacuum chuck, a pin chuck, a groove chuck, an electromagnetic chuck, or other type of chuck.

[0060] In operation of the imprint lithography system 100, the flexible template 116 and the substrate 101 are aligned at desired vertical and lateral positions by the rollers 118, 120, 122 and the air bearing 112, respectively. Such positioning defines a volume 124 between the flexible template 116 and the substrate 101 within the processing region 130. Once a polymerizable substance is deposited on the top surface 103 of the substrate 101 by the fluid dispenser 106, the volume 124 can be filled with the polymerizable substance, and then the chuck 110 (e.g., carrying the substrate 101) 106 is moved to the processing region 130 by the air bearing 112. Thus, both the flexible template 116 and the top surface 103 of the substrate 101 can contact the polymerizable substance in the processing region 130 of the imprint lithography system 100. Exemplary polymerizable materials may be formulated from one or more materials, such as isobornyl acrylate, n-hexyl acrylate, ethylene glycol diacrylate, 2-hydroxy-2-methyl-1-phenyl-propane-1-one, acrylate (2-methyl-2-ethyl-1,3-dioxolan-4-yl) methyl ester, hexanediol diacrylate, 2-methyl-1-[4-(methylthio)phenyl]-2-(4-morpholinyl)-1-propanone, diphenyl(2,4,6-trimethylbenzoyl)-phosphine oxide, 2-hydroxy-2-methyl-1-phenyl-1-propanone, and various surfactants. Exemplary techniques for depositing the polymerizable material on the substrate 101 by the fluid dispenser 106 include dripping, spin coating, dip coating, slot die, blade coating, micro-gravure, screen printing, chemical vapor deposition (CVD), physical vapor deposition (PVD), thin film deposition, thick film deposition, and other techniques. In some examples, the polymerizable material is deposited atop substrate 101 in the form of a plurality of droplets.

[0061] The printing system 104 includes an energy source 126 that directs energy (e.g., broadband ultraviolet radiation) toward a polymerizable substance atop the substrate 101 within the processing region 130. The energy emitted from the energy source 126 causes the polymerizable substance to cure and / or cross-link, thereby forming a patterned layer that conforms to the shape of the portion of the flexible template 116 that was in contact with the polymerizable substance in the processing region 130.

[0062] Figure 2 An example patterned layer 105 formed on a substrate 101 by an imprint lithography system 100 is shown. The patterned layer 105 includes a residual layer 107 and a plurality of features including protrusions 109 extending from the residual layer 107 and recesses 111 formed by adjacent protrusions 109 and the residual layer 107 .

[0063] Although the imprint lithography system 100 is described and shown as a roll-to-plate or plate-to-roll system, imprint lithography systems having different configurations may also be used to produce the example patterned layer 105 and the example patterns discussed below. Such an imprint lithography system may have a roll-to-roll or plate-to-plate configuration.

[0064] In some embodiments, a substrate (e.g., substrate 101 of imprint lithography system 100) is processed (e.g., imprinted on one or both sides, provided with additional features, and / or cut to shape) to form an optical layer of an optical device. For example, a nanolayer can be imprinted on a substrate to enhance the optical properties of the substrate, such as increasing or decreasing the substrate's transmittance to light having a particular wavelength and / or enhancing the birefringence of the substrate. Example optical devices include optical films (e.g., wire grid polarizer (WGP) films) with high transmittance (e.g., greater than 42%) and high extinction ratio (ER) (e.g., greater than 1000) used in display applications (e.g., liquid crystal display (LCD) applications), touch screen display applications (e.g., touch sensors), and to increase the intensity of light transmitted from either side of the optical film, such as in wearable eyepieces, optical sensors, or optical films.

[0065] Figure 3 and Figure 4A top view and a side view of an optical layer 200 are shown, respectively, and the optical layer 200 includes a substrate 202 having an upper side 204 and a lower side 206. The optical layer 200 also includes a functional pattern 208 imprinted on the upper side 204 of the substrate 202, an AR pattern 210 imprinted on the upper side 204 of the substrate 202, a film coating 212 disposed on the lower side 206 of the substrate 202, and an AR pattern 214 imprinted on the film coating 212. The substrate 202 can be laser cut from a larger substrate (e.g., substrate 101) and is provided as a layer of transparent or translucent plastic (e.g., flexible material) or glass (e.g., rigid material) made of one or more organic or inorganic materials according to the various material formulations described above with respect to the substrate 101. The substrate 202 may have a length of about 10 mm to about 150 mm (e.g., about 50 mm), a width of about 10 mm to about 150 mm (e.g., about 50 mm), and a thickness of about 0.1 mm to about 10.0 mm (e.g., about 0.3 mm). The substrate 202 has a relatively high refractive index in the range of about 1.6 to about 1.9 (e.g., about 1.8). Assuming that the substrate 202 is surrounded by air (i.e., n=1), the substrate 202 has a transmittance (e.g., a portion of light incident on the substrate 202 and passing through the substrate 202) in the range of about 80.00% to about 95.00% (e.g., about 91.84%), and thus has a reflectivity (e.g., a portion of light incident on the substrate 202 and reflected back from the substrate 202) of about 5.00% to about 20.00% (e.g., about 8.16%).

[0066] The functional pattern 208 is imprinted along the inner region 216 of the substrate 202 (e.g., via the imprint lithography system 100). The functional pattern 208 is a waveguide pattern formed by a plurality of diffraction gratings that provide the basic working function of the optical layer 200. The diffraction grating has a size in the range of about 10 nm to about 600 nm. The diffraction grating is configured to project light having a wavelength in a specific range and focus a virtual image at a specific depth plane. The focused light, together with the focused light projected through the proximal optical layer, forms a multi-color virtual image on one or more depth planes. The transmitted light may be red light having a wavelength in the range of about 560 nm to about 640 nm (e.g., about 625 nm), green light having a wavelength in the range of about 490 nm to about 570 nm (e.g., about 530 nm), or blue light having a wavelength in the range of about 390 nm to about 470 nm (e.g., about 455 nm). The diffraction grating may include various combinations and arrangements of protrusions and depressions (e.g., such as protrusions 109 and depressions 111) that together provide a desired optical effect. The diffraction grating includes an in-coupling grating, and may form an orthogonal pupil expander region and an exit pupil expander region. The functional pattern 208 has a total length of about 10 mm to about 150 mm, and a total width of about 10 mm to about 150 mm.

[0067] The film coating 212 is also disposed along the interior region 216 of the substrate 202. The film coating 212 can provide various properties or functions to the substrate 202, such as wear resistance, improved surface hydrophobicity, color filtering, and brightness enhancement. Example film coatings 212 include zirconium dioxide-based hard coatings for chemical barrier coatings and increased hydrophobicity, and titanium dioxide and silicon dioxide hard coatings for wear resistance and as inorganic-based anti-reflective films. The film coating 212 can be applied to the substrate 202 via techniques such as lamination, slot die coating, physical vapor deposition, evaporation, sputtering, and chemical vapor deposition.

[0068] The AR pattern 210 is imprinted (e.g., via the imprint lithography system 100) along the inner region 216 of the substrate 202 and around the functional pattern 208. The AR pattern 210 has a length of about 0.5 mm to about 150 mm, and a width of about 0.5 mm to about 150 mm. The AR pattern 214 is imprinted (e.g., via the imprint lithography system 100) on the entire film coating 212. The AR pattern 214 has a length of about 0.5 mm to about 150 mm, and a width of about 0.5 mm to about 150 mm. The AR patterns 210, 214 include nanoscale AR features that can be distributed anywhere within the AR patterns 210, 214 in various numbers, arrangements, shapes, sizes, and orientations. The AR features within the AR pattern 210 can seamlessly abut the nearest diffraction grating of the functional pattern 208, or be positioned at least 5 μm away from the nearest diffraction grating of the functional pattern 208. The size, arrangement, and shape of the AR features may be designed to increase light transmission (eg, reduce surface reflections) on the side of the substrate 202 where the AR pattern 210 , 214 is imprinted.

[0069] although Figure 3 and Figure 4 A specific embodiment of the optical layer 200 is shown, but the optical layer may also include other arrangements of functional patterns, AR patterns, and film coatings. For example, Figure 5 A top view of an optical layer 500 including a substrate 202 and a functional pattern 208 of the optical layer 200, and an AR pattern 510 is shown. The functional pattern 208 is embossed atop the upper side 204 of the substrate 202, as in the optical layer 200. The AR pattern 510 is also embossed atop the upper side 204 of the substrate 202, and is substantially similar in construction and function to the AR pattern 210, except that the AR pattern 510 extends across the interior region 216 to the peripheral edge 218 of the substrate 202.

[0070] In another example embodiment, Figure 6 A top view of an optical layer 600 including a substrate 202 and a functional pattern 208 of the optical layer 200, and an AR pattern 610 is shown. The functional pattern 208 is embossed atop the upper side 204 of the substrate 202, as in the optical layer 200. The AR pattern 610 is also embossed atop the upper side 204 of the substrate 202, and is substantially similar in structure and function to the AR pattern 210, except that the AR pattern 610 is provided as two separate areas 640, 642 that surround separate portions of the functional pattern 208.

[0071] In another example embodiment, Figure 7A side view of an optical layer 700 is shown, which includes the substrate 202, the functional pattern 208 of the optical layer 200, and the AR pattern 214 of the optical layer 200, but excludes the AR pattern 210 and the film coating 212. In the example optical layer 700, the AR pattern 214 is embossed directly on the underside 206 of the substrate 202.

[0072] In another example embodiment, Figure 8 A side view of an optical layer 800 is shown, which includes the substrate 202 , the functional pattern 208 of the optical layer 200 , the AR pattern 210 of the optical layer 200 , and the film coating 212 of the optical layer 200 , but does not include the AR pattern 214 .

[0073] In another example embodiment, Fig. 9 A side view of an optical layer 900 is shown, which includes a substrate 202, a functional pattern 208 of the optical layer 200, an AR pattern 210 of the optical layer 200, and an AR pattern 214 of the optical layer 200, but does not include a film coating 212. In the example optical layer 900, the AR pattern 214 is directly imprinted on the underside 206 of the substrate 202. In other embodiments, the optical layer may include functional patterns and AR patterns having other shapes and / or arrangements not shown in the example optical layers 200, 500, 600, 700, 800, 900.

[0074] Fig.10Scanning electron microscope (SEM) images (a) to (d) of example AR features that can form AR patterns 210, 214 are provided. For example, SEM image (a) shows an AR feature formed as a freestanding isolated protrusion such as a column 300. The shape of the column 300 can be a cylinder, a polygonal prism, a cone, a tetrahedron, or a truncated cone. The column 300 has a height of about 10nm to about 300nm, a width of about 10nm to about 150nm, and a spacing of less than about 200nm (e.g., the distance between corresponding points on adjacent similar elements). SEM image (b) shows an AR feature formed as a hole 302. The shape of the hole 302 can be a cylinder, a polygonal prism, a cone, a tetrahedron, or a truncated cone. The hole 302 has a depth of about 10nm to about 300nm, a width of about 10nm to about 150nm, and a spacing of less than about 200nm. The columns 300 and holes 302 may be distributed in a hexagonal close-packed array or a square-packed array. SEM image (c) shows AR features formed as gratings 304 (e.g., elongated horizontal strips with a length greater than the maximum width and maximum height). In a plane orthogonal to the direction of the grating 304, the cross-sectional shape of the grating 204 may be rectangular, truncated conical, elliptical, or triangular. The grating 304 has a height of about 10 nm to about 300 nm, a width of about 10 nm to about 150 nm, and a spacing of less than about 200 nm. SEM image (d) shows AR features formed as discontinuous or short gratings or rods 306. In a plane orthogonal to the direction of the longer dimension axis, the cross-sectional shape of these features may be rectangular, truncated conical, elliptical, or triangular. Feature 306 has a height of about 10 nm to about 300 nm, a width of about 10 nm to about 150 nm, a length greater than about 5 μm, and a spacing of less than about 200 nm. Generally, the AR features of the AR patterns 210 , 214 may have a height in a range of about 30 nm to about 300 nm, may have a width in a range of about 20 nm to about 100 nm, and may be distributed at a pitch in a range of about 50 nm to about 200 nm.

[0075] Fig.11 The effect of an AR nanolayer applied, for example, directly atop a substrate (e.g., substrate 202 or another substrate used to form an optical layer in an imprint lithography process) according to a process such as nanoimprint lithography, photolithography, dry or wet etching, coating, stripping, or lamination is shown. sLight passing through the second medium will be reflected at the interface of the first and second media according to the reflectivity R given by Equation 1, and transmitted through the second medium according to the transmittance T given by Equation 2 (neglecting losses caused by absorption, scattering, etc.). The optimal refractive index n1 of the intermediate layer between the first and second media can be approximated from the refractive indices of the first and second media according to Equation 3 to produce low reflection losses at the interface. For example, Equation 1 is a general equation for reflection losses at a single interface (e.g., a flat interface) with a given refractive index. Nanofeatures etched into such a substrate will change the refractive index of the surface, thereby changing the reflection losses. Therefore, in a general estimate, a single layer above a flat surface for reducing reflection losses has a general refractive index given by Equation 3.

[0076]

[0077] T=1-R (2)

[0078]

[0079] For example, as shown in Figure (a), a wave propagates through air (n0 = 1.0) and directly impacts the substrate (n s =1.8) is about 8.16% (R s-0 =0.0816) is reflected from the substrate, while about 91.84% (T=0.9184) of the incident light is transmitted to the substrate. For light propagating through air and incident on the substrate, the optimal refractive index n1 of the intermediate layer at the interface is about 1.34.

[0080] As shown in Figure (b), applying a flat nanoimprint 316 with a thickness of less than 100nm and a bulk refractive index of 1.52 (n = 1.52) to the substrate causes a first amount of incident light (i.e., 4.26%) to be reflected at the interface between the air and the flat nanoimprint 16, and causes a second amount of incident light (i.e., 0.71%) to be reflected at the interface between the flat nanoimprint 316 and the substrate. The reflected light amounts can be summed to obtain a total light reflection loss of 4.97%. Therefore, light propagating through material 316 first requires a refractive index of about 1.23 at the air-material interface, and applying the flat nanoimprint 316 to the substrate has reduced the reflectivity and increased the transmittance of the substrate 202 by 3.19%. As shown in Figure (c), applying a characterized nanoimprint 318 (e.g., n=1.25) to a substrate causes a first amount of incident light (i.e., 1.23%) to be reflected at the interface between air and the characterized nanoimprint 318, and causes a second amount of incident light (i.e., 0.65%) to be reflected at the interface between the characterized nanoimprint 318 and the substrate. The reflected light amounts can be summed to obtain a total light reflection loss of 1.89%. Therefore, applying the characterized nanoimprint layer 318 to the substrate has reduced the reflectivity and increased the transmittance of the substrate by about 3%. Typically, AR features (such as those of the characterized nanoimprint 318) have an interface with air that has a refractive index in the range of about 1.24 to about 1.34.

[0081] Table 1 describes the measured refractive index of the film-air interface of various film stacking architectures and the improved transmittance at a wavelength of 590nm, which include nano-feature AR patterns. For example, a blank film with a thickness of 100nm and a material refractive index of 1.52 on a transparent glass substrate with a refractive index of 1.78 increases the transmission through the interface by 4.25% compared to the interface from the bare glass surface to the air. Compared to bare glass with a refractive index of 1.78, when a blank film with a higher refractive index of 1.65 (rather than a refractive index of 1.52) with a similar 100nm thickness is used, the reflection loss is higher and the net increase is lower, at 1.96%. However, compared to the bare glass-air interface, when the film is stacked in a manner where the lowest refractive index is located at the top facing the air and the highest refractive index of 1.65 is located at the glass interface with a refractive index of 1.78, the reflection loss is lower and the transmittance is increased by 5.09%. If nano features are prepared with these material refractive indices to reduce the effective refractive index to a better level, it can be greatly improved.

[0082] By patterning a single material (refractive index of 1.52) with a square array of nanofeatures (such as pillars of 50nm width, 100nm height, and 100nm pitch) with very thin (<50nm) residual layer thickness (interconnecting the material film for nanofeatures of the same material), the effective refractive index at the nanofeature material-air interface now becomes 1.28, further improving the transmission by 7.71% compared to the bare glass-air interface. Similarly, if the material refractive index is 1.65, the effective refractive index at the nanofeature material-air interface now becomes 1.32, thereby improving the transmission by 7.02% compared to the bare glass-air interface. Such embodiments are Fig.12 , where low index material (eg, 1.52) AR nanofeatures 318a are imprinted on higher index material (eg, 1.65) AR nanofeatures 318b that are flush with the surface of high index glass 1.78.

[0083]

[0084] Table 1: Measured refractive index of film-air interface for various film stack architectures.

[0085] By further combining these two nanofeatured embossed films with the same nanopattern, wherein the lower refractive index material (1.52) film with nanofeatures is exposed to air, and the residual layer of the nanopatterned higher refractive index material (1.65) film contacts the glass surface (1.78), so that the residual layer thickness of the lower refractive index (1.52) film covers the nanofeatures of the higher refractive index material (1.65), the effective refractive index at the material-air interface is still 1.28, but because the refractive index gradually changes during the process of light propagation through until the glass interface, the stack as a whole has a higher transmittance to light of 590nm wavelength. For example, Fig.13 a shows the enhanced transmission across the visible wavelength spectrum. Fig.13 b to 13e also show films with a film thickness less than 130 nm and having pillars (see Fig.13 b, 13c and 13e) and holes (see Fig.13 d) Example of a near-optimally patterned nanofeatured film surface geometry that is comparable to a standard antireflection multilayer film that can be hundreds of nanometers long with high and low refractive index film coatings (see Fig.13 f) Create contrast.

[0086] Fig.14A diagram (a) showing a substrate 400 with a nanoimprint grating 402 (blue) is shown, wherein the nanoimprint grating 402 (blue) is applied in the same direction as a diffraction grating 404 (grey) of a functional pattern (wire grid polarizer) on the substrate. The nanoimprint grating 402 and the diffraction grating 404 are located on opposite sides of the substrate 400. Fig.14 Also shown is a diagram (b) showing a substrate 400 with a nanoimprint grating 402 (blue) applied across a diffraction grating 404 (grey) of a functional pattern (e.g., at a 90 degree angle to the diffraction grating 404 of the functional pattern). The nanoimprint grating 402 and the diffraction grating 404 are located on opposite sides of the substrate 400.

[0087] Fig.15 A graph plotting light transmitted through a substrate with and without an AR nanofeature film is shown. A grating-type AR nanofeature imprint is applied to the back side of a WGP substrate, where the grating of the AR imprint is orthogonal to the grating direction of the wire grid polarizer. As shown, applying a nanoimprint grating in a direction that intersects the diffraction grating direction increases the transmission of light up to about 650nm wavelengths, while reducing the transmission of light greater than about 650nm wavelengths. The results show weak birefringence properties when grating-type AR nanofeatures are used and these features are applied in a direction orthogonal to the polarized light that presents the WGP pattern when the light encounters the AR grating. Such features can reduce the polarized light transmitted at higher wavelengths in such applications. This effect does not occur when hole-type or pillar-type AR nanofeatures are used.

[0088] Fig.16 The effect of applying and not applying grating-type AR nanofeatures along the WGP functional grating direction is shown. The results show that grating-type AR nanofeature imprinting along the WGP improves light transmission overall over the visible spectrum.

[0089] The weak birefringence characteristics exhibited by the grating-type AR nanofeature film are also Fig.17 The graph in Figure 2 shows that the effective surface refractive index of the grating-type AR nanofeature changes from 1.25 (across the grating) to about 1.32 (along the grating) based on the grating orientation relative to the incident linearly polarized light (provided by the ellipsometer) during the refractive index measurement (which would otherwise measure the refractive index of the material as 1.52 if a blank imprint was performed).

[0090] Fig.18An embodiment of an AR pattern applied to an optical layer of a multi-layer wearable eyepiece 1300 is shown, wherein the AR pattern allows more light to propagate from the projection system to the input coupling diffraction grating 1302 as the light propagates through the multiple layers of the eyepiece. The AR pattern around the exit pupil diffraction grating 1304 allows more world side light to enter the user's eye and reduces unwanted reflections or glare that would otherwise be caused by the high reflectivity of the high refractive index bare glass surface in air.

[0091] Fig.19 and 20 An example stack 1100, 1200 of a waveguide eyepiece using a light source having a red wavelength of 625 nm (a), a green wavelength of 530 nm (b), and a blue wavelength of 455 nm (c) located on one side of the stack 1100, 1200 is shown, respectively. The stack 1100, 1200 includes six layers 1101a to 1101f, 1201a to 1201f (e.g., layers of red, blue, or green) located at different depths to which the light must propagate. Each of the layers 1101a to 1101f of the stack 1100 includes a substrate 1102, a blank imprinted layer 1104 (e.g., reference 1104) surrounding an area of ​​an input coupling grating (ICG), and a plurality of layers 1102a to 1101f (e.g., reference 1104). Figure 6 1200) and a non-embossed AR nanolayer 1106. Each of the layers 1201a to 1201f of the stack 1200 includes a substrate 1202, a blank embossed layer 1204 surrounding the ICG region, and an embossed AR nanolayer 1206. As shown, only about 81.7% of the light intensity reaches the last red layer 1101f of the stack 1100 (i.e., with a flat AR nanolayer 1106), while about 95.6% of the light intensity reaches the last red layer 1201f of the stack 1200 (i.e., with an embossed AR nanolayer 1206), so the embossed AR nanolayer 1206 provides an absolute light intensity improvement of 13.9%.

[0092] Fig.21A flow chart of an example method 1000 for configuring an optical layer (e.g., optical layer 200, 500, 600, 700, 800, 900) in an imprint lithography process is shown. One or more parameters of a nanolayer (e.g., nanoimprint 210, 214, 316, 318, 510, 610) to be applied to a substrate (e.g., substrate 202, 400) to change the effective refractive index of the substrate (e.g., a material-air interface on the substrate) are selected (1002). In some examples, the one or more parameters include one or more of a shape, size, and material formulation of the nanolayer. The nanolayer is imprinted on a substrate (e.g., upper side 204 or lower side 206 of substrate 202) to change the effective refractive index of the substrate such that the relative amount of light that can be transmitted through the substrate is changed by a selected amount (1004). For example, the effective refractive index of a bare substrate without any applied coating or nanoimprint can be equal to the actual bulk refractive index of the substrate. In some examples, applying the nanolayer changes the effective refractive index from the actual bulk refractive index to a new effective refractive index. In some embodiments, imprinting the nanolayer on the substrate to change the effective refractive index of the substrate includes changing a second relative amount of light reflected from a surface of the substrate.

[0093] In some embodiments, the nanolayer is a flat nanoimprint (e.g., nanoimprint 316). In some embodiments, the nanolayer is a characterized nanoimprint (e.g., nanoimprint 318). In some embodiments, the nanopattern includes AR features (e.g., columns, holes, and / or gratings). In some examples, the AR features have a height in the range of about 10nm to about 300nm. In some examples, the AR features have a width in the range of about 10nm to about 150nm. In some examples, the AR features are distributed at a pitch in the range of about 20nm to about 200nm. In some embodiments, the imprinted nanolayer includes forming a column (e.g., column 300, 306, 308) on a substrate. In some embodiments, the imprinted nanolayer includes forming a hole 302 on a substrate. In some embodiments, the imprinted nanolayer includes forming one or both of a continuous grating and a discontinuous grating (e.g., grating 314, 402) on a substrate.

[0094] In some embodiments, the method further includes forming a functional pattern on a first side of the substrate and imprinting a nanolayer along one or both of the first side of the substrate and a second side of the substrate opposite to the first side of the substrate. In some examples, imprinting the nanolayer includes forming AR features of the nanolayer along a specific direction relative to the functional pattern. In some examples, imprinting the nanolayer includes forming AR features along a direction perpendicular to the diffraction grating of the functional pattern. In some embodiments, the method further includes applying a film coating (e.g., film coating 212) to the substrate and imprinting the nanolayer on top of the film coating.

[0095] In some embodiments, the method further includes changing the relative amount of light transmitted through the substrate by about 0.5% to about 15%. In some embodiments, the nanopattern is a first nanolayer, and the method further includes imprinting a second nanolayer atop the first nanolayer. In some embodiments, the method further includes changing the effective refractive index to a first value based on the first nanolayer, and changing the effective refractive index to a second value based on the second nanolayer.

[0096] Advantageously, method 1000 can be used to produce an AR pattern that can reduce the surface reflection of the substrate by about 1% to about 10%. For a plastic substrate, such an AR pattern can increase the transmittance of the substrate to greater than about 98%, and for a glass substrate, increase the transmittance of the substrate to up to about 99%. The AR pattern can also provide a new effective refractive index in the range of about 1.2 to about 1.4 to the substrate, thereby increasing the light transmission through the substrate. In addition, the AR pattern discussed herein can introduce birefringence to reduce or increase the refraction of certain wavelengths of light transmitted through the substrate. In some embodiments, if it is necessary to modulate the phase of light propagating within and through the substrate, weak birefringence can be advantageous. In addition, at the specified size of the AR nano pattern 214 and the functional diffraction pattern 208, the AR nano pattern 214 does not diffract light like the functional diffraction pattern 208. Therefore, the AR nano pattern 214 does not interfere with the diffraction optical device of the optical device. In addition, the AR nano pattern 214 provides a non-stick surface that can maintain a certain predetermined gap when two adjacent substrate layers should be pushed toward each other.

[0097] Although it has been assumed that the substrates discussed herein have a refractive index of about 1.78 to about 1.8, other substrates that may be used in the optical devices discussed herein may have a refractive index in the range of about 1.45 to about 2.4.

[0098] Although multiple embodiments have been described for illustrative purposes, the above description is not intended to limit the scope of the invention, which is defined by the scope of the appended claims. There are and will be other examples, modifications and combinations within the scope of the following claims.

Claims

1. A method comprising: forming a first optical layer, wherein forming the first optical layer comprises: imprinting a first nanolayer on a first substrate, and forming a first functional pattern along the first substrate, so that the first nanolayer at least partially surrounds the first functional pattern; forming a second optical layer, wherein forming the second optical layer comprises: imprinting a second nanolayer on a second substrate, and forming a second functional pattern along the second substrate so that the second nanolayer at least partially surrounds the second functional pattern; and forming a third optical layer, wherein forming the third optical layer comprises: imprinting a third nanolayer on a third substrate, and forming a third functional pattern along the third substrate, so that the third nanolayer at least partially surrounds the third functional pattern; The first nanolayer printed on the first substrate determines a first effective refractive index of the first substrate, so that the first nanolayer increases a first relative amount of light that can be transmitted through the first substrate to reach the second optical layer. 2 . The method of claim 1 , wherein the second nanolayer determines a second effective refractive index of the second substrate such that the second nanolayer increases a second relative amount of light that can be transmitted through the second substrate to the third optical layer.

3. The method according to claim 2, further comprising: The first nanolayer and the second nanolayer are configured so that a final amount of light transmitted through the first substrate and the second substrate to the third optical layer is equal to an amount of light guided from a source to the first nanolayer minus a first amount of light reflected from the first substrate and minus a second amount of light reflected from the second substrate.

4. The method according to claim 1, further comprising: The first optical layer, the second optical layer, and the third optical layer are stacked such that the first nanolayer, the second nanolayer, and the third nanolayer overlap. 5 . The method of claim 1 , wherein imprinting the first nanolayer on the first substrate comprises changing an amount of first light reflected from a surface of the first substrate.

6. The method according to claim 1, further comprising: One or more of a shape, a size, and a material formulation of at least one of the first nanolayer, the second nanolayer, or the third nanolayer is selected.

7. The method of claim 1, further comprising at least one of the following: imprinting a flat nano-imprint on the first substrate, imprinting a characteristic nanomark on the first substrate, or One or more anti-reflective (AR) features are imprinted on the first substrate.

8. The method of claim 1, further comprising forming posts on the first substrate.

9. The method of claim 1, further comprising forming a hole in the first substrate.

10. The method of claim 1, further comprising forming at least one of a continuous grating or a discontinuous grating on the first substrate.

11. The method according to claim 1, further comprising: forming the first functional pattern on the first side of the first substrate; as well as The first nanolayer is imprinted along at least one of the first side of the first substrate or a second side of the first substrate opposite to the first side of the first substrate.

12. The method according to claim 1, further comprising: applying a film coating to the first substrate; as well as The first nanolayer is imprinted on top of the membrane coating.

13. The method according to claim 1, further comprising: The first relative amount of light capable of being transmitted through the first substrate is changed by 0.5% to 15%.

14. The method according to claim 1, further comprising: imprinting a fourth nanolayer on top of the first nanolayer, The fourth nanolayer changes the first relative amount of light that can be transmitted through the first substrate to reach the second optical layer.

15. An optical layer, comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on and adjacent to at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on and adjacent to the first side of the substrate, The first anti-reflective nanolayer at least partially surrounds at least some of the one or more functional patterns along the first side of the substrate without overlapping with the one or more functional layers.

16. The optical layer according to claim 15, wherein: The first anti-reflective nanolayer at least partially surrounds a subset of the one or more functional patterns along the first side of the substrate.

17. The optical layer according to claim 15, wherein: The first anti-reflective nanolayer at least partially surrounds each of the one or more functional patterns along the first side of the substrate.

18. The optical layer according to claim 15, wherein: The one or more anti-reflective nano-layers include a second anti-reflective nano-layer disposed on the second side of the substrate.

19. The optical layer according to claim 18, wherein: The second anti-reflective nanolayer is adjacent to the second side of the substrate.

20. The optical layer according to claim 15, wherein: There is no anti-reflective nanolayer on the second side of the substrate.

21. An optical layer, comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on the second side of the substrate; and A film coating is disposed between the second side of the substrate and the first anti-reflective nanolayer.

22. An optical layer, comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on the second side of the substrate; and wherein the one or more functional patterns include a plurality of diffraction gratings disposed on the first side of the substrate, and The first anti-reflective nanolayer includes a plurality of nano-imprinted gratings disposed on the second side of the substrate.

23. The optical layer according to claim 22, wherein: Each of the plurality of diffraction gratings and the first anti-reflective nano-layer extends along a common direction.

24. The optical layer according to claim 22, wherein: Each of the plurality of diffraction gratings extends along a first direction, and wherein the first anti-reflective nano-layer extends along a second direction different from the first direction.

25. An optical layer, comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, The one or more functional patterns include a first functional pattern, a second functional pattern and a third functional pattern, and wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on the first side of the substrate, and The first anti-reflective nanolayer at least partially surrounds each of the first functional pattern, the second functional pattern, and the third functional pattern along the first side of the substrate.

26. An optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, The one or more functional patterns include a first functional pattern, a second functional pattern and a third functional pattern, and wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer and a second anti-reflective nano-layer disposed on the first side of the substrate, wherein the first anti-reflective nanolayer at least partially surrounds the first functional pattern along the first side of the substrate, and The second anti-reflective nanolayer at least partially surrounds the second functional pattern along the first side of the substrate.

27. An optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on and adjacent to at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, Wherein, the one or more anti-reflective nanolayers include: a first anti-reflective nanolayer adjacent to the first side of the substrate, and a second anti-reflection nanolayer adjacent to the first anti-reflection nanolayer, wherein the first anti-reflection nanolayer comprises a first material having a first refractive index, wherein the second anti-reflection nanolayer comprises a second material having a second refractive index, wherein the substrate comprises a third material having a third refractive index, wherein the first refractive index is greater than the second refractive index, and Wherein, the third refractive index is greater than the first refractive index.

28. A method for manufacturing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; providing one or more functional patterns on the first side of the substrate; as well as disposing one or more anti-reflective nanolayers on and adjacent to at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on and adjacent to the first side of the substrate, The first anti-reflective nanolayer is disposed on the first side of the substrate such that the first anti-reflective nanolayer at least partially surrounds at least some of the one or more functional patterns along the first side of the substrate without overlapping the one or more functional layers.

29. A method for manufacturing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; providing one or more functional patterns on the first side of the substrate; providing one or more anti-reflective nanolayers on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on the second side of the substrate; and A film coating is disposed between the second side of the substrate and the first anti-reflective nanolayer.

30. A method for manufacturing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; providing one or more functional patterns on the first side of the substrate; providing one or more anti-reflective nanolayers on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on the second side of the substrate, wherein the one or more functional patterns include a plurality of diffraction gratings disposed on the first side of the substrate, and The first anti-reflective nanolayer includes a plurality of nano-imprinted gratings disposed on the second side of the substrate.

31. A method for manufacturing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; providing one or more functional patterns on the first side of the substrate; providing one or more anti-reflective nanolayers on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, The one or more functional patterns include a first functional pattern, a second functional pattern and a third functional pattern, and wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer disposed on the first side of the substrate, and The first anti-reflective nanolayer is disposed on the first side of the substrate, such that the first anti-reflective nanolayer at least partially surrounds each of the first functional pattern, the second functional pattern, and the third functional pattern along the first side of the substrate.

32. A method for manufacturing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; providing one or more functional patterns on the first side of the substrate; providing one or more anti-reflective nanolayers on at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, The one or more functional patterns include a first functional pattern, a second functional pattern and a third functional pattern, and wherein the one or more anti-reflective nano-layers include a first anti-reflective nano-layer and a second anti-reflective nano-layer disposed on the first side of the substrate, wherein the first anti-reflective nanolayer is disposed on the first side of the substrate, such that the first anti-reflective nanolayer at least partially surrounds the first functional pattern along the first side of the substrate, and The second anti-reflective nanolayer is disposed on the first side of the substrate, such that the second anti-reflective nanolayer at least partially surrounds the second functional pattern along the first side of the substrate.

33. A method for manufacturing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; providing one or more functional patterns on the first side of the substrate; disposing one or more anti-reflective nanolayers on and adjacent to at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers affect a relative amount of light that can be transmitted through the substrate, Wherein providing the one or more anti-reflective nano-layers comprises: disposing a first anti-reflective nano-layer such that the first anti-reflective nano-layer abuts the first side of the substrate, and Disposing a second anti-reflection nanolayer so that the second anti-reflection nanolayer is adjacent to the first anti-reflection nanolayer, wherein the first anti-reflection nanolayer comprises a first material having a first refractive index, wherein the second anti-reflection nanolayer comprises a second material having a second refractive index, wherein the substrate comprises a third material having a third refractive index, wherein the first refractive index is greater than the second refractive index, and Wherein, the third refractive index is greater than the first refractive index.

34. An optical layer comprising: a substrate having a first side and a second side opposite the first side; a first layer disposed on the first side of the substrate, the first layer being an imprinted nanolayer, the imprinted nanolayer being configured as an antireflection layer and having an effective refractive index different from a refractive index of the substrate, the imprinted nanolayer comprising a plurality of nanoimprinted gratings disposed on the first side of the substrate; a second layer disposed on the second side of the substrate, the second layer comprising a functional pattern imprinted on a surface of the second layer, the structure of the functional pattern being different from that of the imprinted nanolayer, the functional pattern comprising a plurality of diffraction gratings disposed on the second side of the substrate, There is no anti-reflective nanolayer disposed on the second side of the substrate.

35. The optical layer according to claim 34, wherein: The imprinted nanolayer is directly imprinted on the first side of the substrate.

36. The optical layer according to claim 34, wherein: There is no film coating on the first side of the substrate.

37. The optical layer according to claim 34, wherein: The plurality of nanoimprint gratings extend in a first direction along the first side of the substrate, and The plurality of diffraction gratings extend in the first direction along the second side of the substrate.

38. The optical layer according to claim 34, wherein: The plurality of nanoimprint gratings extend in a first direction along the first side of the substrate, wherein the plurality of diffraction gratings extend in a second direction along the second side of the substrate, and The first direction is orthogonal to the second direction.

39. A system comprising: A plurality of optical layers arranged in a stack, Wherein, each of the optical layers comprises: a substrate having a first side and a second side opposite the first side; a first layer disposed on the first side of the substrate, the first layer being an imprinted nanolayer, the imprinted nanolayer being configured as an antireflection layer and having an effective refractive index different from a refractive index of the substrate, the imprinted nanolayer comprising a plurality of nanoimprinted gratings disposed on the first side of the substrate; a second layer disposed on the second side of the substrate, the second layer comprising a functional pattern imprinted on a surface of the second layer, the structure of the functional pattern being different from that of the imprinted nanolayer, the functional pattern comprising a plurality of diffraction gratings disposed on the second side of the substrate, There is no anti-reflective nano-layer disposed on the second side of the substrate.

40. The system of claim 39, wherein: Each of the optical layers is configured to receive light from a light source and project at least a portion of the received light to an eye of a user.

41. The system of claim 39, wherein: Each of the optical layers is configured to receive ambient light and transmit at least a portion of the received ambient light to an eye of a user.

42. The system of claim 39, wherein: The system includes six of the optical layers arranged in the stack.

43. The system of claim 42, wherein: The plurality of optical layers comprises: a first optical layer and a second optical layer corresponding to a first color, a third optical layer and a fourth optical layer corresponding to a second color different from the first color, and The fifth optical layer and the sixth optical layer correspond to a third color different from the first color and the second color.

44. The system of claim 43, wherein: The first optical layer, the second optical layer, the third optical layer, the fourth optical layer, the fifth optical layer, and the sixth optical layer are sequentially arranged in the stack.

45. The system of claim 44, wherein: Each of the first color, the second color, and the third color is selected from red, green, and blue.

46. ​​A method comprising: providing a substrate having a first side and a second side opposite the first side; Disposing a first layer on the first side of the substrate, the first layer being an imprinted nanolayer, the imprinted nanolayer being configured as an antireflection layer and having an effective refractive index different from a refractive index of the substrate, the imprinted nanolayer comprising a plurality of nanoimprinted gratings disposed on the first side of the substrate; Disposing a second layer on the second side of the substrate, the second layer comprising a functional pattern imprinted on a surface of the second layer, the structure of the functional pattern being different from that of the imprinted nanolayer, the functional pattern comprising a plurality of diffraction gratings disposed on the second side of the substrate; as well as Providing an anti-reflective nano-layer on the second side of the substrate is avoided.

47. The method of claim 46, wherein: Providing the first layer on the first side of the substrate includes directly imprinting the nanolayer on the first side of the substrate.

48. The method of claim 46, further comprising: Disposing a film coating on the first side of the substrate is avoided.

49. The method of claim 46, wherein: The plurality of nanoimprint gratings extend in a first direction along the first side of the substrate, and The plurality of diffraction gratings extend in the first direction along the second side of the substrate.

50. The method of claim 46, wherein: The plurality of nanoimprint gratings extend in a first direction along the first side of the substrate, wherein the plurality of diffraction gratings extend in a second direction along the second side of the substrate, and The first direction is orthogonal to the second direction.

51. A method comprising: A plurality of optical layers is obtained, wherein each of the optical layers comprises: a substrate having a first side and a second side opposite the first side; a first layer disposed on the first side of the substrate, the first layer being an imprinted nanolayer, the imprinted nanolayer being configured as an antireflection layer and having an effective refractive index different from a refractive index of the substrate, the imprinted nanolayer comprising a plurality of nanoimprinted gratings disposed on the first side of the substrate; a second layer disposed on the second side of the substrate, the second layer comprising a functional pattern imprinted on a surface of the second layer, the structure of the functional pattern being different from the imprinted nanolayer, wherein there is no anti-reflective nanolayer disposed on the second side of the substrate, the functional pattern comprising a plurality of diffraction gratings disposed on the second side of the substrate; and The plurality of optical layers are arranged in a stack.

52. The method of claim 51 further comprising: Each of the optical layers is configured to receive light from a light source and project at least a portion of the received light to an eye of a user.

53. The method of claim 51 further comprising: Each of the optical layers is configured to receive ambient light and transmit at least a portion of the received ambient light to an eye of a user.

54. The method of claim 51, wherein: Arranging the plurality of optical layers in the stack includes arranging six of the optical layers in the stack.

55. The method of claim 54, wherein: The plurality of optical layers comprises: a first optical layer and a second optical layer corresponding to a first color, a third optical layer and a fourth optical layer corresponding to a second color different from the first color, and The fifth optical layer and the sixth optical layer correspond to a third color different from the first color and the second color.

56. The method of claim 55, wherein: Arranging the plurality of optical layers in the stack includes sequentially arranging the first optical layer, the second optical layer, the third optical layer, the fourth optical layer, the fifth optical layer, and the sixth optical layer in the stack.

57. The method of claim 56, wherein: Each of the first color, the second color, and the third color is selected from red, green, and blue.

Images