Display device, display panel and manufacturing method thereof

Abstract

The present invention provides a display device, a display panel and a manufacturing method thereof, wherein the display panel comprises: a substrate, a multi-layer structure, a light emitting structure, a light direction adjustment structure and a photosensitive structure; the multi-layer structure is located on the substrate; the light emitting structure and the photosensitive structure are arranged side by side on a side of the multi-layer structure away from the substrate, and the light emitting structure is a top emitting structure; the light direction adjustment structure is located in the multi-layer structure, and the light direction adjustment structure is used to adjust the light emitting direction of the incident ambient light to be the same as the light emitting direction of the light emitting structure; the photosensitive structure is used to receive the light signal emitted by the light emitting structure and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure and reflected by the fingerprint. According to an embodiment of the present invention, the intensity of light reflected by the fingerprint and entering the photosensitive structure can be increased, the signal-to-noise ratio during fingerprint recognition can be improved, the ridge-to-valley voltage difference of the fingerprint can be increased, and the sensitivity of fingerprint recognition can be improved.

Description

Technical Field

[0001] The present invention relates to the technical field of display equipment, and in particular to a display device, a display panel and a manufacturing method thereof. Background Art

[0002] In recent years, with the continuous development of display technology, more and more display devices have adopted fingerprint recognition to achieve user privacy protection. When users operate display devices with fingerprint recognition function, they only need to touch the display screen with their fingers to realize permission verification, which is simple to operate.

[0003] When performing fingerprint recognition, the existing display panel with fingerprint recognition function needs to be equipped with a fingerprint sensor in the display panel. The light emitted by the light source is reflected by the finger and enters the fingerprint sensor. The fingerprint sensor recognizes the fingerprint according to the different reflected light intensities of the valleys and ridges of the fingerprint. However, based on the structure of the existing display panel, the sensitivity of fingerprint recognition is poor. Summary of the invention

[0004] The present invention provides a display device, a display panel and a manufacturing method thereof to solve the deficiencies in the related art.

[0005] To achieve the above objective, a first aspect of an embodiment of the present invention provides a display panel, including:

[0006] substrate;

[0007] a multilayer structure disposed on the substrate;

[0008] A light-emitting structure, located on a side of the multilayer structure away from the substrate; the light-emitting structure is a top-emitting structure;

[0009] a light direction adjustment structure, located in the multi-layer structure; the light direction adjustment structure is used to adjust the light emitting direction of the incident ambient light to be the same as the light emitting direction of the light emitting structure; and

[0010] The photosensitive structure is arranged side by side with the light-emitting structure on a side of the multilayer structure away from the substrate; the photosensitive structure is used to receive the light signal emitted by the light-emitting structure and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure and reflected by the fingerprint.

[0011] Optionally, the light direction adjustment structure includes a reflective layer and an optical adjustment layer; the reflective layer reflects ambient light passing through the optical adjustment layer; the optical adjustment layer is used to transmit ambient light and modulate the direction of reflected light reflected by the reflective layer.

[0012] Optionally, the reflective layer and the optical adjustment layer are stacked, the reflective layer is close to the substrate, and the optical adjustment layer is far away from the substrate.

[0013] Optionally, the surface of the optical adjustment layer away from the substrate is flat, convex curved, concave curved, or uneven.

[0014] Optionally, the reflective layer is made of metal molybdenum, metal silver or metal aluminum, and / or the optical adjustment layer is made of cholesteric liquid crystal material.

[0015] Optionally, the light emitting structure and the photosensitive structure are respectively located on two sides of the light direction adjusting structure.

[0016] Optionally, the light direction adjustment structure is disposed entirely or discontinuously on the plane where the substrate is located.

[0017] Optionally, the light-emitting structure is an organic light-emitting diode or an inorganic light-emitting diode, and / or the photosensitive structure is an organic photodiode or an inorganic photodiode.

[0018] Optionally, the multilayer structure includes a fingerprint recognition circuit, which includes a second type of transistor; the first electrode of the second type of transistor is connected to the anode of the photosensitive structure, the upper surface of the second electrode is provided with the light direction adjustment structure or the second electrode is a reflective layer in the light direction adjustment structure, the first electrode is one of the source and the drain, and the second electrode is the other of the source and the drain.

[0019] Optionally, the multilayer structure includes a pixel driving circuit, which includes a first type of transistor; the third electrode of the first type of transistor is connected to the anode of the light-emitting structure, the upper surface of the fourth electrode is provided with the light direction adjustment structure or the fourth electrode is a reflective layer in the light direction adjustment structure, the third electrode is one of the source and the drain, and the fourth electrode is the other of the source and the drain.

[0020] Optionally, the second type of transistor includes a gate and an interlayer insulating layer, the gate is close to the substrate, and the interlayer insulating layer is far away from the substrate; the light direction adjustment structure is located between the gate and the interlayer insulating layer.

[0021] Optionally, the multilayer structure includes a passivation layer and a planarization layer, the passivation layer is close to the substrate, and the planarization layer is far away from the substrate; the light direction adjustment structure is located between the passivation layer and the planarization layer, or the planarization layer has a groove, and the light direction adjustment structure is located in the groove.

[0022] Optionally, the multilayer structure includes a buffer layer and an active layer, the buffer layer is close to the substrate, and the active layer is far away from the substrate; the light direction adjustment structure is located between the buffer layer and the active layer.

[0023] Optionally, the light-emitting structures and the photosensitive structures are distributed alternately.

[0024] Optionally, the display panel includes a fingerprint recognition area, and the photosensitive structure, the light direction adjustment structure and the light-emitting structure are located in the fingerprint recognition area; or the display panel includes a display area, and the photosensitive structure, the light direction adjustment structure and the light-emitting structure are located in the display area.

[0025] A second aspect of an embodiment of the present invention provides a method for manufacturing a display panel, comprising:

[0026] Providing a substrate, forming a multilayer structure on the substrate; forming a light direction adjustment structure when forming the multilayer structure, wherein the light direction adjustment structure is used to modulate the light emission direction of incident ambient light;

[0027] A light-emitting structure and a photosensitive structure are formed side by side on one side of the multilayer structure away from the substrate; the light-emitting structure is a top-emitting structure; the photosensitive structure is used to receive the light signal emitted by the light-emitting structure and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure and reflected by the fingerprint.

[0028] Optionally, the light direction adjustment structure includes a reflective layer and an optical adjustment layer that are stacked, the reflective layer is close to the substrate, and the optical adjustment layer is far away from the substrate; the reflective layer reflects ambient light that passes through the optical adjustment layer; the optical adjustment layer is used to transmit ambient light and modulate the direction of the reflected light reflected by the reflective layer.

[0029] Optionally, the reflective layer is made of metallic silver or metallic aluminum and is formed by a sputtering method; and / or the optical adjustment layer is made of a cholesteric liquid crystal material and is formed by a coating method.

[0030] Optionally, the light-emitting structure is an organic light-emitting diode or an inorganic light-emitting diode, and / or the photosensitive structure is an organic photodiode or an inorganic photodiode; the cathode of the light-emitting structure and the cathode of the photosensitive structure are formed in the same process, and the anode of the light-emitting structure and the anode of the photosensitive structure are formed in the same process;

[0031] And / or the multilayer structure includes a fingerprint recognition circuit and a pixel driving circuit; the fingerprint recognition circuit includes a second type of transistor, the first electrode of the second type of transistor is connected to the anode of the photosensitive structure, the upper surface of the second electrode is provided with the light direction adjustment structure or the second electrode is the reflective layer in the light direction adjustment structure, the first electrode is one of the source and the drain, and the second electrode is the other of the source and the drain; the pixel driving circuit includes a first type of transistor, the third electrode of the first type of transistor is connected to the anode of the light-emitting structure, the upper surface of the fourth electrode is provided with the light direction adjustment structure or the fourth electrode is the reflective layer in the light direction adjustment structure, the third electrode is one of the source and the drain, and the fourth electrode is the other of the source and the drain; the first type of transistor and the second type of transistor are formed in the same process.

[0032] A third aspect of the embodiments of the present invention provides a display device, comprising any one of the display panels described above.

[0033] The light direction adjustment structure can adjust the light direction of the incident ambient light to be the same as that of the light emitting structure, so that during fingerprint recognition, not only the light source is provided by the light emitting structure, but also the light intensity of the ambient light directed to the fingerprint is increased. This increases the intensity of the light reflected by the fingerprint and entering the photosensitive structure, improves the signal-to-noise ratio during fingerprint recognition, increases the ridge-valley voltage difference of the fingerprint, and improves the sensitivity of fingerprint recognition.

[0034] It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0036] Figure 1 is a schematic cross-sectional structural diagram of a display panel according to a first embodiment of the present invention;

[0037] Figure 2 yes Figure 1 The working principle diagram of the display panel in;

[0038] Figure 3 is a flow chart of a method for manufacturing a display panel according to a first embodiment of the present invention;

[0039] Figure 4 yes Figure 3 Schematic diagram of the intermediate structure corresponding to the process;

[0040] Figure 5 is a schematic cross-sectional structural diagram of a display panel according to a second embodiment of the present invention;

[0041] Figure 6 is a schematic cross-sectional structural diagram of a display panel according to a third embodiment of the present invention;

[0042] Figure 7 is a schematic cross-sectional structural diagram of a display panel according to a fourth embodiment of the present invention;

[0043] Figure 8 is a schematic cross-sectional structural diagram of a display panel according to a fifth embodiment of the present invention;

[0044] Fig. 9 is a schematic cross-sectional structural diagram of a display panel according to a sixth embodiment of the present invention;

[0045] Fig.10 FIG. 4 is a schematic cross-sectional structure diagram of a display panel according to a seventh embodiment of the present invention.

[0046] List of reference numerals:

[0047] Display panel 1, 2, 3, 4, 5, 6, 7 Substrate 10

[0048] Fingerprint recognition area 1a Multilayer structure 11

[0049] First active layer 111 Gate insulating layer GI

[0050] First gate 112 Interlayer insulating layer ILD

[0051] First source 113a First drain 113b

[0052] Second active layer 111' Second gate 112'

[0053] The second source 113a' and the second drain 113b'

[0054] Planarization layer PLN Passivation layer PVX

[0055] The first type of transistor T1 The second type of transistor T2

[0056] Light emitting structure 12 First anode 12a

[0057] First cathode 12b Light emitting material layer 12c

[0058] Light direction adjustment structure 13 Reflection layer 131

[0059] Optical adjustment layer 132 Photosensitive structure 14

[0060] Second anode 14a Second cathode 14b

[0061] Photosensitive material layer 14c Pixel definition layer PDL

[0062] Cover plate 15 Buffer layer BUF DETAILED DESCRIPTION

[0063] Exemplary embodiments will be described in detail herein, examples of which are shown in the accompanying drawings. When the following description refers to the drawings, the same numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present invention. Instead, they are merely examples of devices and methods consistent with some aspects of the present invention as detailed in the appended claims.

[0064] Figure 1 is a schematic cross-sectional structural diagram of a display panel according to a first embodiment of the present invention; Figure 2 yes Figure 1 The working principle diagram of the display panel in .

[0065] Reference Figure 1 and Figure 2 As shown, the display panel 1 includes:

[0066] Base 10;

[0067] A multilayer structure 11 is located on a substrate 10;

[0068] The light emitting structure 12 is located on a side of the multilayer structure 11 away from the substrate 10; the light emitting structure 12 is a top emission structure;

[0069] A light direction adjustment structure 13 is located in the multilayer structure 11; the light direction adjustment structure 13 is used to adjust the light emitting direction of the incident ambient light to be the same as the light emitting direction of the light emitting structure 12; and

[0070] The photosensitive structure 14 is arranged side by side with the light emitting structure 12 on a side of the multilayer structure 11 away from the substrate 10; the photosensitive structure 14 is used to receive the light signal emitted by the light emitting structure 12 and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure 13 and reflected by the fingerprint.

[0071] A packaging structure (not shown) and a cover plate 15 may be provided on the side of the photosensitive structure 14 and the light emitting structure 12 away from the substrate 10 .

[0072] The substrate 10 may be a flexible substrate or a hard substrate. The material of the flexible substrate may be polyimide, and the material of the hard substrate may be glass.

[0073] A buffer layer, a water vapor isolation layer, etc. may be provided on the polyimide and the glass.

[0074] In this embodiment, the display panel 1 includes a fingerprint recognition area 1a. Figure 1 Shown is a schematic diagram of the cross-sectional structure of the fingerprint identification area 1a.

[0075] Reference Figure 2 As shown, when the fingerprint identification area 1a performs the fingerprint identification function, the light emitting structure 12 plays a lighting role, which is used to illuminate the fingerprint. The light emitting structure 12 of the fingerprint identification area 1a can also perform a display function.

[0076] The light emitting structure 12 may include: a first anode 12a, a first cathode 12b, and a light emitting material layer 12c disposed between the first anode 12a and the first cathode 12b. The region of the light emitting material layer 12c is defined by the opening of the pixel definition layer PDL. The material of the light emitting material layer 12c may be an inorganic material or an organic material (OLED), and correspondingly, the light emitting structure 12 is an inorganic light emitting diode or an organic light emitting diode. The light emitting material layer 12c may be red, green or blue, or may be red, green, blue or yellow. The light emitting structures 12 of the three primary colors of red, green and blue or the four primary colors of red, green, blue and yellow are alternately distributed to form a light emitting unit. The first cathodes 12b of each light emitting structure 12 may be connected together. The material of the first anode 12a is a reflective material, such as metallic silver. The material of the first cathode 12b is a light-transmitting material or a semi-transmitting material, such as a mixture of metallic magnesium and metallic silver, or metallic aluminum. In other words, the light emitting structure 12 is a top emission structure.

[0077] The photosensitive structure 14 may include: a second anode 14a, a second cathode 14b, and a photosensitive material layer 14c disposed between the second anode 14a and the second cathode 14b. The area of ​​the photosensitive material layer 14c is defined by the opening of the pixel definition layer PDL. The photosensitive material layer 14c can convert an optical signal into an electrical signal. The material of the photosensitive material layer 14c can be an inorganic material or an organic material, and correspondingly, the photosensitive structure 14 is an inorganic photodiode or an organic photodiode. The photosensitive structure 14 may have multiple, and the second cathodes 14b of each photosensitive structure 14 may be connected together, and connected together with the first cathodes 12b of each light-emitting structure 12 to form a surface electrode. The material of the second anode 14a may be the same as that of the first anode 12a, and the material of the second cathode 14b may be the same as that of the first cathode 12b.

[0078] Reference Figure 1 and Figure 2 As shown, in this embodiment, a pixel driving circuit is disposed between the first anode 12a and the substrate 10. The pixel driving circuit includes a plurality of first-type transistors T1. The first anode 12a is electrically connected to a first drain 113b of a first-type transistor T1.

[0079] In a direction away from the substrate 10, the first type of transistor T1 may include: a first active layer 111, a gate insulating layer GI, a first gate 112, an interlayer insulating layer ILD, a first source 113a and a first drain 113b. In other words, the first type of transistor T1 is a top gate structure. In other embodiments, the first type of transistor T1 may also be a bottom gate structure.

[0080] Reference Figure 1 and Figure 2 As shown, in this embodiment, a fingerprint recognition circuit is disposed between the second anode 14a and the substrate 10. The fingerprint recognition circuit includes a plurality of second-type transistors T2. The second anode 14a is electrically connected to a second drain 113b' of a second-type transistor T2.

[0081] In the direction away from the substrate 10, the second type transistor T2 may include: a second active layer 111', a gate insulating layer GI, a second gate 112', an interlayer insulating layer ILD, a second source 113a' and a second drain 113b'. In other words, the second type transistor T2 is a top gate structure. In other embodiments, the second type transistor T2 may also be a bottom gate structure.

[0082] A light direction adjustment structure 13 is disposed on the side of the first source electrode 113a and the second source electrode 113a' away from the substrate 10. In this embodiment, the light direction adjustment structure 13 includes a reflective layer 131 and an optical adjustment layer 132 stacked, wherein the reflective layer 131 is close to the substrate 10, and the optical adjustment layer 132 is away from the substrate 10. The reflective layer 131 is used to reflect ambient light passing through the optical adjustment layer 132; the optical adjustment layer 132 is used to transmit ambient light and modulate the direction of the reflected light reflected by the reflective layer 131.

[0083] Specifically, refer to Figure 2 As shown, the ambient light within the dotted angle range can transmit the optical adjustment layer 132, and after the transmitted ambient light is reflected by the reflective layer 131, the angle of the emitted light is deflected after passing through the optical adjustment layer 132 and is within the maximum light emission angle of the light emitting structure 12. The material of the optical adjustment layer 132 that can achieve the above function can be a cholesteric liquid crystal material.

[0084] The reflective layer 131 may be made of metal molybdenum, metal silver or metal aluminum.

[0085] In this embodiment, the light direction adjustment structure 13 is relatively close to the upper surface of the cover plate 15 , which can reduce the optical path of the ambient light in the display panel 1 and reduce the light intensity loss.

[0086] A planarization layer PLN is disposed on a side of the light direction adjustment structure 13 , the first drain electrode 113 b , the second drain electrode 113 b ′ and the interlayer insulating layer ILD away from the substrate 10 .

[0087] In this embodiment, the multilayer structure 11 includes: a first active layer 111, a second active layer 111', a gate insulating layer GI, a first gate 112, a second gate 112', an interlayer insulating layer ILD, a first source 113a, a first drain 113b, a second source 113a', a second drain 113b' and a planarization layer PLN.

[0088] In other embodiments, the pixel driving circuit may be omitted between the first anode 12 a and the substrate 10 .

[0089] In this embodiment, the light direction adjustment structure 13 is intermittently arranged on the plane where the substrate 10 is located, and the light emitting structure 12 and the photosensitive structure 14 are respectively located on both sides of the light direction adjustment structure 13. In other embodiments, the light direction adjustment structure 13 and the photosensitive structure 14 can be respectively located on both sides of the light emitting structure 12, and the light direction adjustment structure 13 can also be arranged in the frame area surrounding the display area.

[0090] The light-emitting structures 12 and the photosensitive structures 14 may be arranged alternately, or a plurality of light-emitting structures 12 may be arranged successively and then one photosensitive structure 14 may be arranged.

[0091] Reference Figure 2 As shown, the working principle of the display panel 1 is as follows: 1) When the fingerprint recognition area 1a performs the fingerprint recognition function, the light emitting structure 12 illuminates the fingerprint, and the light signal carrying the fingerprint information after reflection is received by the photosensitive structure 14; 2) The ambient light is transmitted into the light direction adjustment structure 13, and the light output direction is adjusted to be the same as the light output direction of the light emitting structure 12, that is, it is within the maximum light output angle of the light emitting structure 12, and can also illuminate the fingerprint, and the light signal carrying the fingerprint information after reflection is also received by the photosensitive structure 14. 2) Compared with 1), the intensity of the light reflected by the fingerprint entering the photosensitive structure 14 is increased, thereby improving the signal-to-noise ratio during fingerprint recognition, increasing the ridge-valley voltage difference of the fingerprint, and improving the sensitivity of fingerprint recognition.

[0092] In other embodiments, the display panel 1 includes a display area, and the photosensitive structure 14, the light direction adjustment structure and the light emitting structure 12 may be located in the display area. In other words, the display panel 1 may be used for full-screen fingerprint recognition.

[0093] for Figure 1 and Figure 2 The display panel 1 in the embodiment 1 of the present invention also provides a manufacturing method. Figure 3 It is a flowchart of the production method. Figure 4 yes Figure 3 Schematic diagram of the intermediate structure corresponding to the process.

[0094] First, refer to Figure 3 Step S1 in Figure 4 As shown, a substrate 10 is provided, and a multilayer structure 11 is formed on the substrate 10; when the multilayer structure 11 is formed, a light direction adjustment structure 13 is formed, and the light direction adjustment structure 13 is used to modulate the light emitting direction of the incident ambient light.

[0095] The substrate 10 may be a flexible substrate or a hard substrate. The material of the flexible substrate may be polyimide, and the material of the hard substrate may be glass.

[0096] A buffer layer, a water vapor isolation layer, etc. may be provided on the polyimide and the glass.

[0097] In this embodiment, step S1 may specifically include steps S11 to S17.

[0098] Step S11: forming an active material layer on the entire surface of the substrate 10; patterning the active material layer, forming a first active layer 111 in the first type transistor region, and forming a second active layer 111' in the second type transistor region.

[0099] Step S12 : forming a gate insulating layer GI on the substrate 10 and the entire surface of the first active layer 111 and the second active layer 111 ′ away from the substrate 10 .

[0100] Step S13: forming a first metal layer on the entire surface of the gate insulating layer GI away from the substrate 10; patterning the first metal layer, forming a first gate 112 in the first type transistor region, and forming a second gate 112' in the second type transistor region.

[0101] Step S14 : forming an interlayer dielectric layer ILD on the entire surface of the first gate 112 , the second gate 112 ′ and the gate insulating layer 112 away from the substrate 10 .

[0102] Step S15: forming vias in the interlayer dielectric layer ILD and the gate insulating layer GI to expose the first source region and the first drain region of the first active layer 111 and the second source region and the second drain region of the second active layer 111′ respectively; filling the vias and forming a first source 113a, a first drain 113b, a second source 113a′ and a second drain 113b′ on the side of the interlayer dielectric layer ILD away from the substrate 10.

[0103] The first source 113 a , the first drain 113 b , the second source 113 a ′ and the second drain 113 b ′ may be formed by patterning and sputtering the second metal layer on the interlayer dielectric layer ILD; or may be formed by electroplating.

[0104] The first type of transistor T1 and the second type of transistor T2 are formed in the same process, the process is relatively simple and has high mass productivity.

[0105] Step S16: forming a light direction adjustment structure 13 on the side of the first source electrode 113a and the second source electrode 113a' away from the substrate 10. In this embodiment, the light direction adjustment structure 13 includes a stacked reflective layer 131 and an optical adjustment layer 132. The reflective layer 131 can be made of metal molybdenum, metal silver or metal aluminum and is formed by sputtering. The reflective layer 131 can be patterned in the same process as the second metal layer.

[0106] The optical adjustment layer 132 may be made of a cholesteric liquid crystal material and formed by a coating method.

[0107] Step S17 : forming a planarization layer PLN on the entire surface of the light direction adjustment structure 13 , the first drain electrode 113 b , the second drain electrode 113 b ′ and the interlayer insulating layer ILD away from the substrate 10 .

[0108] In this embodiment, the multilayer structure 11 includes: a first active layer 111, a second active layer 111', a gate insulating layer GI, a first gate 112, a second gate 112', an interlayer insulating layer ILD, a first source 113a, a first drain 113b, a second source 113a', a second drain 113b' and a planarization layer PLN.

[0109] In other embodiments, the pixel driving circuit may be omitted between the first anode 12 a and the substrate 10 , or at least one of the first type transistor T1 and the second type transistor T2 may be a bottom gate structure.

[0110] Next, refer to Figure 2 Step S2 in Figure 1 As shown, a light-emitting structure 12 and a photosensitive structure 14 are formed side by side on the side of the multilayer structure 11 away from the substrate 10; the light-emitting structure 12 is a top-emitting structure; the photosensitive structure 14 is used to receive the light signal emitted by the light-emitting structure 12 and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure 13 and reflected by the fingerprint.

[0111] In this embodiment, step S2 may specifically include steps S21 to S24.

[0112] Step S21: forming a via hole in the planarization layer PLN to expose the first drain electrode 113 b and the second drain electrode 113 b ′; filling the via hole and forming the first anode 12 a and the second anode 14 a .

[0113] The material of the second anode 14 a can be the same as that of the first anode 12 a , both of which are reflective materials, such as metallic silver.

[0114] Step S22: forming a pixel definition layer PDL on the entire surface of the first anode 12a, the second anode 14a and the planarization layer PLN away from the substrate 10; forming a plurality of openings in the pixel definition layer PDL to expose partial areas of the first anode 12a and the second anode 14a respectively.

[0115] Step S23: evaporating a light-emitting material layer to form a light-emitting material layer 12c in the opening exposing the first anode 12a; evaporating a photosensitive material layer to form a photosensitive material layer 14c in the opening exposing the second anode 14a.

[0116] Step S24: Vapor-deposit a cathode material layer on the entire surface. The cathode material layer is a light-transmitting material or a semi-light-transmitting material, such as a mixture of metal magnesium and metal silver, or metal aluminum. In other words, the light-emitting structure 12 is a top-emitting structure.

[0117] In other embodiments, the light emitting structure 12 and the photosensitive structure 14 may be other structures capable of realizing light emitting functions and photosensitive functions.

[0118] Subsequently, a packaging structure may be formed on the side of the photosensitive structure 14 and the light-emitting structure 12 away from the substrate 10 , and a cover plate 15 may be disposed on the packaging structure.

[0119] Figure 5 FIG. 4 is a schematic cross-sectional structural diagram of a display panel according to a second embodiment of the present invention.

[0120] Reference Figure 5 As shown, the display panel 2 and the manufacturing method thereof of this embodiment are Figure 1 The difference between the display panel 1 and the manufacturing method thereof is that the reflective layer 131 is omitted, and the first source electrode 113 a and the second source electrode 113 a ′ serve as the reflective layer 131 .

[0121] Except for the above differences, the display panel 2 and the manufacturing method thereof of the second embodiment can refer to the corresponding structure and the manufacturing steps of the display panel 1 of the first embodiment.

[0122] Figure 6 FIG. 4 is a schematic cross-sectional structural diagram of a display panel according to a third embodiment of the present invention.

[0123] Reference Figure 6 As shown, the display panel 3 and the manufacturing method thereof of this embodiment are Figure 5 The difference between the display panel 2 and the manufacturing method thereof is that the surface of the optical adjustment layer 132 away from the substrate 10 is an upward convex arc surface.

[0124] In other embodiments, the surface of the optical adjustment layer 132 away from the substrate 10 may also be a concave curved surface or an uneven surface.

[0125] Compared to the plane, the above structure can further deflect the angle of the light emitted after passing through the optical adjustment layer 132, increase the intensity of the ambient light directed toward the fingerprint, and thus increase the intensity of the light reflected by the fingerprint and entering the photosensitive structure 14.

[0126] The uneven surface of the optical adjustment layer 132 away from the substrate 10 can be realized by the uneven upper surface of the reflective layer 131. The reflective layer 131 in this embodiment is the first source 113a and the second source 113a'. The uneven upper surface of the reflective layer 131 can reflect ambient light within a larger angle range into the optical adjustment layer 132, increasing the intensity of light reflected by the fingerprint and entering the photosensitive structure 14.

[0127] Except for the above differences, the display panel 3 and the manufacturing method thereof of the third embodiment may refer to the corresponding structures and process steps of the display panels 1 and 2 of the first and second embodiments.

[0128] Figure 7 FIG. 4 is a schematic cross-sectional structure diagram of a display panel according to a fourth embodiment of the present invention.

[0129] Reference Figure 7 As shown, the display panel 4 and the manufacturing method thereof of this embodiment are Figure 1 , Figure 5 , Figure 6 The differences between the display panels 1, 2, 3 and their manufacturing methods are that: a passivation layer PVX is arranged on the side of the first source 113a, the first drain 113b, the second source 113a', the second drain 113b' and the interlayer insulating layer ILD away from the substrate 10; a light direction adjustment structure 13 is arranged on the side of the passivation layer PVX away from the substrate 10; and a planarization layer PLN is arranged on the side of the light direction adjustment structure 13 and the passivation layer PVX away from the substrate 10.

[0130] In this embodiment, the distance between the light direction adjustment structure 13 and the upper surface of the cover plate 15 is further shortened, which can further reduce the optical path of the ambient light in the display panel 4 and reduce the light intensity loss.

[0131] Except for the above differences, the display panel 4 and the manufacturing method thereof of the fourth embodiment may refer to the corresponding structures and process steps of the display panels 1, 2, 3 of the first to third embodiments.

[0132] Figure 8 is a schematic cross-sectional structure diagram of a display panel according to a fifth embodiment of the present invention.

[0133] Reference Figure 8 As shown, the display panel 5 and the manufacturing method thereof of this embodiment are Figure 7 The difference between the display panel 4 and the manufacturing method thereof is that the planarization layer PLN has a groove, and the light direction adjustment structure 13 is located in the groove.

[0134] Except for the above differences, the display panel 5 and the manufacturing method thereof of the fifth embodiment may refer to the corresponding structures and process steps of the display panels 1, 2, 3, 4 of the first to fourth embodiments.

[0135] Fig. 9 FIG. 4 is a schematic cross-sectional structural diagram of a display panel according to a sixth embodiment of the present invention.

[0136] Reference Fig. 9 As shown, the display panel 6 and the manufacturing method thereof of this embodiment are similar to Figure 1 , Figures 5 to 8The difference between the display panels 1, 2, 3, 4, 5 and the manufacturing method thereof is that the light direction adjustment structure 13 is located between the first gate electrode 112 and the interlayer insulating layer ILD, and between the second gate electrode 112' and the interlayer insulating layer ILD.

[0137] Except for the above differences, the display panel 6 and the manufacturing method thereof of the sixth embodiment may refer to the corresponding structures and process steps of the display panels 1, 2, 3, 4, 5 of the first to fifth embodiments.

[0138] Fig.10 FIG. 4 is a schematic cross-sectional structure diagram of a display panel according to a seventh embodiment of the present invention.

[0139] Reference Fig.10 As shown, the display panel 7 and the manufacturing method thereof of this embodiment are similar to Figure 1 , Figures 5 to 9 The difference between the display panels 1, 2, 3, 4, 5, 6 and the manufacturing method thereof is that the light direction adjustment structure 13 is entirely disposed between the buffer layer BUF and the first active layer 111 and the second active layer 111'.

[0140] In addition to the above differences, the display panel 7 and the manufacturing method thereof of the seventh embodiment may refer to the corresponding structures and process steps of the display panels 1, 2, 3, 4, 5, 6 of the first to sixth embodiments.

[0141] Based on the above display panels 1, 2, 3, 4, 5, 6, and 7, an embodiment of the present invention further provides a display device comprising any of the above display panels 1, 2, 3, 4, 5, 6, and 7. The display device may be any product or component having a display function and a fingerprint recognition function, such as a mobile phone, a tablet computer, a television, a laptop computer, an electronic paper, a digital photo frame, and a navigator.

[0142] It should be noted that in the accompanying drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. It is also understood that when an element or layer is referred to as being "on" another element or layer, it may be directly on the other element, or there may be an intermediate layer. In addition, it is understood that when an element or layer is referred to as being "under" another element or layer, it may be directly under the other element, or there may be more than one intermediate layer or element. In addition, it is also understood that when a layer or element is referred to as being "between" two layers or two elements, it may be the only layer between the two layers or two elements, or there may also be more than one intermediate layer or element. Similar reference numerals throughout the text indicate similar elements.

[0143] In the present invention, the terms “first” and “second” are used for descriptive purposes only and should not be understood as indicating or implying relative importance.

[0144] Those skilled in the art will readily appreciate other embodiments of the present invention after considering the specification and practicing the disclosure disclosed herein. The present invention is intended to cover any variations, uses or adaptations of the present invention that follow the general principles of the present invention and include common knowledge or customary techniques in the art that are not disclosed by the present invention. The description and examples are to be considered exemplary only, and the true scope and spirit of the present invention are indicated by the following claims.

[0145] It should be understood that the present invention is not limited to the exact construction that has been described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the present invention is limited only by the appended claims.

Claims

1. A display panel, characterized in that: include: substrate; a multilayer structure disposed on the substrate; A light emitting structure, located on a side of the multilayer structure away from the substrate; The light emitting structure is a top emission structure; a light direction adjustment structure, located in the multi-layer structure; the light direction adjustment structure is used to adjust the light exit direction of the incident ambient light to the direction toward the light exit surface of the display panel; the light direction adjustment structure includes a reflective layer and an optical adjustment layer; the reflective layer reflects the ambient light passing through the optical adjustment layer; the optical adjustment layer is used to transmit the ambient light and modulate the direction of the reflected light reflected by the reflective layer; the reflective layer and the optical adjustment layer are stacked, the reflective layer is close to the substrate, and the optical adjustment layer is far away from the substrate; as well as The photosensitive structure is arranged side by side with the light-emitting structure on a side of the multilayer structure away from the substrate; the photosensitive structure is used to receive the light signal emitted by the light-emitting structure and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure and reflected by the fingerprint.

2. The display panel according to claim 1, characterized in that: The surface of the optical adjustment layer away from the substrate is flat, convex, concave or uneven.

3. The display panel according to claim 1, characterized in that: The reflective layer is made of metal molybdenum, metal silver or metal aluminum, and / or the optical adjustment layer is made of cholesteric liquid crystal material.

4. The display panel according to claim 1, characterized in that: The light emitting structure and the light sensing structure are respectively located on two sides of the light direction adjusting structure.

5. The display panel according to claim 1, characterized in that: The light direction adjustment structure is disposed entirely or discontinuously on the plane where the substrate is located.

6. The display panel according to any one of claims 1 to 5, characterized in that: The light emitting structure is an organic light emitting diode or an inorganic light emitting diode, and / or the light sensing structure is an organic photodiode or an inorganic photodiode.

7. The display panel according to claim 6, characterized in that: The multilayer structure includes a fingerprint recognition circuit, which includes a second type of transistor; the first electrode of the second type of transistor is connected to the anode of the photosensitive structure, the upper surface of the second electrode is provided with the light direction adjustment structure or the second electrode is a reflective layer in the light direction adjustment structure, the first electrode is one of the source and the drain, and the second electrode is the other of the source and the drain.

8. The display panel according to claim 6, characterized in that: The multilayer structure includes a pixel driving circuit, which includes a first type of transistor; the third electrode of the first type of transistor is connected to the anode of the light-emitting structure, the upper surface of the fourth electrode is provided with the light direction adjustment structure or the fourth electrode is a reflective layer in the light direction adjustment structure, the third electrode is one of the source and the drain, and the fourth electrode is the other of the source and the drain.

9. The display panel according to claim 7, characterized in that: The second type of transistor includes a gate and an interlayer insulating layer, the gate is close to the substrate, and the interlayer insulating layer is far away from the substrate; the light direction adjustment structure is located between the gate and the interlayer insulating layer.

10. The display panel according to claim 1, characterized in that: The multilayer structure includes a passivation layer and a planarization layer, wherein the passivation layer is close to the substrate and the planarization layer is far away from the substrate; the light direction adjustment structure is located between the passivation layer and the planarization layer, or the planarization layer has a groove and the light direction adjustment structure is located in the groove.

11. The display panel according to claim 1, characterized in that: The multi-layer structure comprises a buffer layer and an active layer, wherein the buffer layer is close to the substrate and the active layer is far away from the substrate; the light direction adjustment structure is located between the buffer layer and the active layer.

12. The display panel according to claim 1, characterized in that: The light emitting structures and the light sensing structures are distributed alternately.

13. The display panel according to claim 1, characterized in that: The display panel includes a fingerprint recognition area, and the photosensitive structure, the light direction adjustment structure and the light emitting structure are located in the fingerprint recognition area; or the display panel includes a display area, and the photosensitive structure, the light direction adjustment structure and the light emitting structure are located in the display area.

14. A method for manufacturing a display panel, characterized in that: include: A substrate is provided, and a multilayer structure is formed on the substrate; a light direction adjustment structure is formed when the multilayer structure is formed, and the light direction adjustment structure is used to adjust the light exit direction of the incident ambient light to the direction toward the light exit surface of the display panel; the light direction adjustment structure includes a reflective layer and an optical adjustment layer stacked, the reflective layer is close to the substrate, and the optical adjustment layer is far away from the substrate; the reflective layer reflects the ambient light passing through the optical adjustment layer; the optical adjustment layer is used to transmit the ambient light and modulate the direction of the reflected light reflected by the reflective layer; A light-emitting structure and a photosensitive structure are formed side by side on one side of the multilayer structure away from the substrate; the light-emitting structure is a top-emitting structure; the photosensitive structure is used to receive the light signal emitted by the light-emitting structure and reflected by the fingerprint and the light signal emitted by the light direction adjustment structure and reflected by the fingerprint.

15. The method for manufacturing a display panel according to claim 14, characterized in that: The reflective layer is made of metallic silver or metallic aluminum and is formed by a sputtering method; and / or the optical adjustment layer is made of a cholesteric liquid crystal material and is formed by a coating method.

16. The method for manufacturing a display panel according to any one of claims 14 to 15, characterized in that: The light-emitting structure is an organic light-emitting diode or an inorganic light-emitting diode, and / or the photosensitive structure is an organic photodiode or an inorganic photodiode; the cathode of the light-emitting structure and the cathode of the photosensitive structure are formed in the same process, and the anode of the light-emitting structure and the anode of the photosensitive structure are formed in the same process; And / or the multilayer structure includes a fingerprint recognition circuit and a pixel driving circuit; the fingerprint recognition circuit includes a second type of transistor, the first electrode of the second type of transistor is connected to the anode of the photosensitive structure, the upper surface of the second electrode is provided with the light direction adjustment structure or the second electrode is the reflective layer in the light direction adjustment structure, the first electrode is one of the source and the drain, and the second electrode is the other of the source and the drain; the pixel driving circuit includes a first type of transistor, the third electrode of the first type of transistor is connected to the anode of the light-emitting structure, the upper surface of the fourth electrode is provided with the light direction adjustment structure or the fourth electrode is the reflective layer in the light direction adjustment structure, the third electrode is one of the source and the drain, and the fourth electrode is the other of the source and the drain; the first type of transistor and the second type of transistor are formed in the same process.

17. A display device, characterized in that: A display panel comprising any one of claims 1 to 13.

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