Method, device and equipment for calibrating electron beam diaphragm and readable storage medium

Abstract

The application provides a method and device for calibrating an electron beam diaphragm, electronic equipment and a computer readable storage medium. The method for calibrating the electron beam diaphragm comprises: obtaining a target image; wherein the target image comprises a target object; performing image sharpness distribution detection on the target image to obtain a plurality of image sharpness scores of the target image; determining an image sharpness trend of the target image based on the plurality of image sharpness scores; determining a position of a center of an image sharpness contour based on the image sharpness trend; calculating an offset between the position of the center and a center position of the target image; wherein the offset represents an offset between the center of the electron beam and the center of the diaphragm; and controlling the electron beam to move based on the offset so that the offset is less than a preset offset. According to the embodiments of the application, the electron beam diaphragm can be calibrated more accurately so that the offset between the center of the electron beam and the center of the diaphragm is less than the preset offset.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing and detection, and in particular to a calibration method, device, electronic device and computer-readable storage medium for an electron beam stop. Background Art

[0002] In the semiconductor manufacturing process, the clarity of die image capture determines the reliability and accuracy of subsequent semiconductor yield inspection. A bare die, also known as a bare crystal, is a small, unpackaged integrated circuit made of semiconductor material.

[0003] By calibrating the electron beam aperture, a high-definition die image can be obtained, which is conducive to improving the accuracy of subsequent yield rates. Although the stable operating time of the machine has gradually increased with the advancement of hardware technology in recent years, image blurring cannot be avoided. This blurring is mostly caused by the electron beam center being offset by a large distance from the aperture center.

[0004] At present, in order to prevent the image from becoming blurred during the image acquisition process, the electron beam aperture is mainly calibrated by the Faraday cup method so that the offset between the electron beam center and the aperture center is less than a preset offset.

[0005] The Faraday cup method essentially involves repeatedly adjusting the relative position of the electron beam center and the aperture center. Specifically, the Faraday cup is used to repeatedly measure the current until the position at which the measured current is maximum is determined. This position coincides with the point where the electron beam center and the aperture center coincide, and also represents the clearest image.

[0006] While the Faraday cup method for calibrating the electron beam aperture is widely used, in practice it requires the human eye to observe the image clarity trend. Based on this trend, the relative position of the electron beam center and the aperture center must be repeatedly adjusted to find the optimal position for capturing the image. This process presents several challenges. First, the human eye's observation of the image clarity trend itself can have significant errors. Second, using the Faraday cup method to measure current is time-consuming and laborious, and its accuracy may not be entirely accurate. Because both steps involve errors, cumulative errors result, making the reliability of the so-called optimal capture position difficult to guarantee.

[0007] Therefore, how to calibrate the electron beam aperture more accurately is a technical problem that those skilled in the art urgently need to solve. Summary of the Invention

[0008] The embodiments of the present application provide a method, device, electronic device, and computer-readable storage medium for calibrating an electron beam stop, which can more accurately calibrate the electron beam stop so that the offset between the electron beam center and the stop center is less than a preset offset.

[0009] In a first aspect, an embodiment of the present application provides a method for calibrating an electron beam stop, comprising:

[0010] Acquire a target image; wherein the target image includes a target object;

[0011] Performing image clarity distribution detection on the target image to obtain multiple image clarity scores of the target image;

[0012] determining an image clarity trend of a target image based on the plurality of image clarity scores;

[0013] Based on the image clarity trend, determine the position of the center of the image clarity contour circle;

[0014] Calculating the offset between the position of the circle center and the center position of the target image; wherein the offset represents the offset between the center of the electron beam and the center of the aperture;

[0015] The electron beam is controlled to move based on the offset so that the offset is smaller than a preset offset.

[0016] Optionally, obtain the target image, including:

[0017] Photograph the target object in different directions to obtain the initial image corresponding to each direction;

[0018] Cutting out image blocks containing target objects from the multiple initial images respectively;

[0019] Multiple image blocks are distributed and arranged according to their corresponding directions to obtain the target image.

[0020] Optionally, an image clarity distribution test is performed on the target image to obtain multiple image clarity scores of the target image, including:

[0021] The image clarity distribution is detected on the image blocks captured at relative positions through a sliding window, and multiple pairs of image clarity scores are obtained.

[0022] Optionally, based on multiple image clarity scores, determining an image clarity trend of the target image includes:

[0023] Based on the clarity scores of multiple pairs of images, clarity trend curves of multiple pairs of images are obtained respectively.

[0024] Optionally, based on the image clarity trend, determining the center position of the image clarity contour circle includes:

[0025] Perform curve fitting on each pair of image clarity trend curves and determine the location of the curve intersection respectively;

[0026] Determine the positions of multiple chords of the image clarity contour circle based on the multiple curve intersection points;

[0027] Based on the positions of multiple chords, determine the perpendicular bisector of each chord;

[0028] Based on the multiple perpendicular bisectors, determining the intersection points of the multiple perpendicular bisectors;

[0029] Calculate the average value of the intersection points of multiple perpendicular bisectors to determine the center position of the image clarity contour circle.

[0030] Optionally, calculate the offset between the center of the circle and the center of the target image, including:

[0031] The offset direction and offset distance between the position of the circle center and the center position of the target image are calculated; wherein the offset direction and offset distance represent the offset direction and offset distance between the electron beam center and the aperture center, respectively.

[0032] Optionally, controlling the movement of the electron beam based on the offset so that the offset is less than a preset offset includes:

[0033] Controlling the electron beam movement based on the offset direction and the offset distance so that the offset amount is equal to zero;

[0034] Here, an offset of zero indicates that the center of the electron beam and the center of the aperture completely coincide with each other.

[0035] In a second aspect, an embodiment of the present application provides a calibration device for an electron beam stop, comprising:

[0036] An image acquisition module is used to acquire a target image; wherein the target image includes a target object;

[0037] An image clarity distribution detection module is used to perform image clarity distribution detection on a target image and obtain multiple image clarity scores of the target image;

[0038] an image clarity trend determination module, configured to determine an image clarity trend of a target image based on a plurality of image clarity scores;

[0039] A circle center position determination module is used to determine the position of the center of the image clarity contour circle based on the image clarity trend;

[0040] An offset calculation module is used to calculate the offset between the position of the circle center and the center position of the target image; wherein the offset represents the offset between the center of the electron beam and the center of the aperture;

[0041] The electron beam movement control module is used to control the movement of the electron beam based on the offset so that the offset is smaller than a preset offset.

[0042] Optionally, the image acquisition module is used to: photograph the target object in different directions to obtain an initial image corresponding to each direction; capture image blocks containing the target object from multiple initial images; and distribute and arrange the multiple image blocks according to their corresponding directions to obtain the target image.

[0043] Optionally, the image clarity distribution detection module is used to: perform image clarity distribution detection on image blocks captured at relative positions through a sliding window to obtain multiple pairs of image clarity scores.

[0044] Optionally, the image clarity trend determination module is configured to obtain a plurality of pairs of image clarity trend curves based on a plurality of pairs of image clarity scores.

[0045] Optionally, a center position determination module is used to: perform curve fitting for each pair of image clarity trend curves to determine the positions of the curve intersections; determine the positions of multiple chords of the image clarity contour circle based on multiple curve intersections; determine the perpendicular bisectors of each chord based on the positions of the multiple chords; determine the intersection points of the multiple perpendicular bisectors based on the multiple perpendicular bisectors; calculate the average value of the intersection points of the multiple perpendicular bisectors to determine the position of the center of the image clarity contour circle.

[0046] Optionally, an offset calculation module is used to calculate the offset direction and offset distance between the position of the center of the circle and the center position of the target image; wherein the offset direction and offset distance respectively represent the offset direction and offset distance between the center of the electron beam and the center of the aperture.

[0047] Optionally, the electron beam movement control module is used to: control the electron beam movement based on the offset direction and the offset distance so that the offset is equal to zero; wherein the offset equal to zero indicates that the center of the electron beam and the center of the aperture completely coincide.

[0048] In a third aspect, an embodiment of the present application provides an electronic device, the electronic device comprising: a processor and a memory storing computer program instructions;

[0049] When the processor executes the computer program instructions, the method for calibrating the electron beam stop as shown in the first aspect is implemented.

[0050] In a fourth aspect, an embodiment of the present application provides a computer-readable storage medium having computer program instructions stored thereon. When the computer program instructions are executed by a processor, the calibration method of the electron beam stop as shown in the first aspect is implemented.

[0051] The electron beam aperture calibration method, device, electronic device, and computer-readable storage medium of the embodiments of the present application can more accurately calibrate the electron beam aperture so that the offset between the electron beam center and the aperture center is less than a preset offset.

[0052] The electron beam aperture calibration method includes: acquiring a target image; wherein the target image includes a target object; performing image clarity distribution detection on the target image to acquire multiple image clarity scores of the target image; determining an image clarity trend of the target image based on the multiple image clarity scores; determining a center position of an image clarity contour circle based on the image clarity trend; calculating an offset between a center position of the circle and a center position of the target image; wherein the offset represents an offset between a center of the electron beam and a center of the aperture; and controlling electron beam movement based on the offset so that the offset is less than a preset offset.

[0053] As can be seen, after determining the target image's image clarity trend, this method then determines the center of the image clarity contour circle based on this trend and then calculates the offset between the center of the circle and the center of the target image. Because this offset represents the offset between the electron beam center and the aperture center, calibration is performed based on this offset. Compared to the prior art Faraday cup method, this method effectively avoids the cumulative error associated with calibration using the Faraday cup method, improving the calibration accuracy of the electron beam aperture. Furthermore, compared to prior art methods, this method offers greater stability and eliminates the need for manual observation, thus facilitating accurate measurement of yield rates, enhancing production efficiency, and improving product quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0054] In order to more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the specific embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0055] Figure 1 1 is a flow chart of a method for calibrating an electron beam stop provided in one embodiment of the present application;

[0056] Figure 2 This is a schematic diagram of image acquisition and interception provided by an embodiment of the present application;

[0057] Figure 3 This is a schematic diagram of detecting image clarity using a sliding window provided by an embodiment of the present application;

[0058] Figure 4This is a schematic diagram of an image clarity trend curve provided by an embodiment of the present application;

[0059] Figure 5 Schematic diagram of image clarity contour circles provided by one embodiment of the present application;

[0060] Figure 6 1 is a schematic structural diagram of a calibration device for an electron beam stop provided in one embodiment of the present application;

[0061] Figure 7 This is a schematic diagram of the structure of an electronic device provided by an embodiment of the present application. DETAILED DESCRIPTION

[0062] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain the present application, rather than to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is merely to provide a better understanding of the present application by illustrating the examples of the present application.

[0063] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. In the absence of further limitations, the elements defined by the phrase "comprising..." do not exclude the presence of other identical elements in the process, method, article, or device comprising the elements.

[0064] As mentioned in the background section, the electron beam aperture is calibrated using the Faraday cup method in the prior art. While this method is widely used, in practice, it requires the human eye to observe the image clarity trend and repeatedly adjust the relative position of the electron beam center and the aperture center based on the image clarity trend to find the optimal image acquisition position. This process presents several problems. First, the human eye's observation of the image clarity trend itself is subject to significant error. Second, the Faraday cup method of measuring current is time-consuming and laborious, and its accuracy may not be entirely accurate. Because both steps are subject to error, cumulative errors occur, making it difficult to guarantee the reliability of the so-called optimal acquisition position.

[0065] In order to solve the problems in the prior art, the embodiments of the present application provide a method, device, electronic device and computer-readable storage medium for calibrating an electron beam stop. The following first introduces the method for calibrating an electron beam stop provided in the embodiments of the present application.

[0066] Figure 1 FIG. 1 is a flow chart showing a method for calibrating an electron beam stop according to an embodiment of the present application. Figure 1 As shown, the calibration method of the electron beam stop includes:

[0067] S101. Acquire a target image; wherein the target image includes a target object.

[0068] The target object may be a bare chip, which is not specifically limited.

[0069] In order to avoid the influence of image content on the image clarity score, in one embodiment, obtaining a target image includes:

[0070] (1) The target object is photographed in different directions to obtain the initial image corresponding to each direction.

[0071] The different directions can be spaced at the same angle or at different angles. Figure 2 As shown, the target object is photographed in different directions, and corresponding initial images in 9 directions are obtained.

[0072] (2) Image blocks containing the target object are respectively captured from multiple initial images.

[0073] (3) Arrange the multiple image blocks according to their corresponding directions to obtain the target image.

[0074] like Figure 2 As shown in FIG, image blocks with the same image content are cut out from different positions of the 9 initial images. Figure 2The solid black frame part in is the image block, and these image blocks are distributed and arranged according to their corresponding directions.

[0075] S102: Perform image clarity distribution detection on the target image to obtain multiple image clarity scores of the target image.

[0076] S103: Determine the image clarity trend of the target image based on the multiple image clarity scores.

[0077] In order to more accurately perform image clarity distribution detection and determine the image clarity trend, in one embodiment, image clarity distribution detection is performed on a target image to obtain multiple image clarity scores of the target image, including:

[0078] The image clarity distribution is detected on the image blocks captured at relative positions through a sliding window, and multiple pairs of image clarity scores are obtained.

[0079] In one embodiment, determining the image clarity trend of the target image based on the plurality of image clarity scores includes:

[0080] Based on the clarity scores of multiple pairs of images, clarity trend curves of multiple pairs of images are obtained respectively.

[0081] Figure 3 FIG. 1 is a schematic diagram of a sliding window detecting image clarity provided by an embodiment of the present application. Figure 3 As shown in FIG, the image clarity detection is performed on the image blocks intercepted at relative positions by sliding the window, and 4 pairs of image clarity trend curves 1-9, 2-8, 3-7, and 4-6 are obtained. Among them, a pair of image clarity trend curves can be shown as Figure 4 shown.

[0082] S104: Determine the position of the center of the image definition contour circle based on the image definition trend.

[0083] In order to more accurately determine the position of the center of the image clarity contour circle, in one embodiment, determining the position of the center of the image clarity contour circle based on the image clarity trend includes:

[0084] (1) performing curve fitting on each pair of image clarity trend curves and determining the location of the curve intersection;

[0085] Continuing with the above example, curve fitting is performed on each pair of image clarity trend curves to find the location of the curve intersection (the intersection is the point with the same image clarity at the relative position), thereby obtaining the distance the sliding window moves.

[0086] (2) determining the locations of multiple chords of the image clarity contour circle based on the intersection points of the multiple curves;

[0087] (3) Based on the locations of the multiple chords, determine the perpendicular bisector of each chord;

[0088] (4) Based on the multiple perpendicular bisectors, determine the intersection of the multiple perpendicular bisectors;

[0089] (5) Calculate the average value of the intersection points of multiple perpendicular bisectors to determine the center position of the image clarity contour circle.

[0090] Using the above example, Figure 5 Schematic diagram of image clarity contour circles provided by an embodiment of the present application, such as Figure 5 As shown, the positions of the four chords of the image clarity contour circle in the image are calculated based on the intersection points of the curves, and the six intersection points of the perpendicular midlines of the four chords are obtained. The average value of the six intersection points is calculated to determine the position of the center of the image clarity contour circle. Figure 5 The dotted circle in the figure is the image clarity contour circle, the black solid line is the chord of the image clarity contour circle, the black dotted line is the perpendicular bisector of the chord, the white dot is the intersection of the perpendicular bisectors, and the black dot is the center of the image clarity contour circle.

[0091] S105 , calculating the offset between the position of the circle center and the center position of the target image; wherein the offset represents the offset between the center of the electron beam and the center of the aperture.

[0092] In order to more accurately calculate the offset between the position of the circle center and the center position of the target image, in one embodiment, calculating the offset between the position of the circle center and the center position of the target image includes:

[0093] The offset direction and offset distance between the position of the circle center and the center position of the target image are calculated; wherein the offset direction and offset distance represent the offset direction and offset distance between the electron beam center and the aperture center, respectively.

[0094] This embodiment calculates the offset direction and offset distance between the position of the circle center and the center position of the target image. Based on the offset direction and offset distance, the offset between the two can be calculated more accurately.

[0095] S106 , controlling the movement of the electron beam based on the offset so that the offset is smaller than a preset offset.

[0096] In order to more accurately control the movement of the electron beam, in one embodiment, controlling the movement of the electron beam based on the offset so that the offset is less than a preset offset includes:

[0097] Controlling the electron beam movement based on the offset direction and the offset distance so that the offset amount is equal to zero;

[0098] Here, an offset of zero indicates that the center of the electron beam and the center of the aperture completely coincide with each other.

[0099] This embodiment controls the movement of the electron beam according to the offset direction and offset distance, and can more accurately control the movement of the electron beam so that the offset amount is less than a preset offset amount. Preferably, when the offset amount is zero, the center of the electron beam and the center of the aperture completely coincide.

[0100] In summary, the electron beam aperture calibration method provided in this application effectively avoids the cumulative error generated by the Faraday cup method during the calibration process, thereby improving the calibration accuracy of the electron beam aperture. Furthermore, compared to existing technologies, this method offers greater stability and eliminates the need for manual observation, thereby facilitating accurate measurement of yield rates, enhancing production efficiency, and improving product quality.

[0101] Figure 6 FIG. 1 is a schematic diagram of a structure of a calibration device for an electron beam stop provided in one embodiment of the present application. Figure 6 As shown, the calibration device of the electron beam stop comprises:

[0102] The image acquisition module 601 is used to acquire a target image, wherein the target image includes a target object;

[0103] An image clarity distribution detection module 602 is configured to perform image clarity distribution detection on a target image and obtain multiple image clarity scores of the target image;

[0104] An image clarity trend determining module 603 is configured to determine an image clarity trend of a target image based on a plurality of image clarity scores;

[0105] A circle center position determination module 604 is used to determine the position of the center of the image clarity contour circle based on the image clarity trend;

[0106] An offset calculation module 605 is used to calculate the offset between the position of the circle center and the center position of the target image; wherein the offset represents the offset between the center of the electron beam and the center of the aperture;

[0107] The electron beam movement control module 606 is configured to control the movement of the electron beam based on the offset so that the offset is smaller than a preset offset.

[0108] In one embodiment, the image acquisition module 601 is used to: photograph the target object in different directions to obtain an initial image corresponding to each direction; capture image blocks containing the target object from the multiple initial images; and distribute and arrange the multiple image blocks according to their corresponding directions to obtain the target image.

[0109] In one embodiment, the image clarity distribution detection module 602 is configured to perform image clarity distribution detection on image blocks captured at relative positions using a sliding window to obtain multiple pairs of image clarity scores.

[0110] In one embodiment, the image clarity trend determining module 603 is configured to obtain a plurality of pairs of image clarity trend curves based on a plurality of pairs of image clarity scores.

[0111] In one embodiment, the center position determination module 604 is used to: perform curve fitting for each pair of image clarity trend curves to determine the positions of the curve intersections; determine the positions of multiple chords of the image clarity contour circle based on multiple curve intersections; determine the perpendicular bisectors of each chord based on the positions of the multiple chords; determine the intersection points of the multiple perpendicular bisectors based on the multiple perpendicular bisectors; and calculate the average value of the intersection points of the multiple perpendicular bisectors to determine the position of the center of the image clarity contour circle.

[0112] In one embodiment, the offset calculation module 605 is used to calculate the offset direction and offset distance between the position of the circle center and the center position of the target image; wherein the offset direction and offset distance respectively represent the offset direction and offset distance between the electron beam center and the aperture center.

[0113] In one embodiment, the electron beam movement control module 606 is configured to control the movement of the electron beam based on the offset direction and the offset distance so that the offset is equal to zero; wherein the offset equal to zero indicates that the center of the electron beam and the center of the aperture completely coincide with each other.

[0114] Figure 6 Each module in the device shown has the function of realizing Figure 1 The functions of each step in the embodiment can achieve the corresponding technical effects, which will not be described in detail here for the sake of brevity.

[0115] Figure 7 A schematic structural diagram of an electronic device provided in an embodiment of the present application is shown.

[0116] The electronic device may include a processor 701 and a memory 702 storing computer program instructions.

[0117] Specifically, the processor 701 may include a central processing unit (CPU), or an application-specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0118] The memory 702 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 702 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive, or a combination of two or more of these. Where appropriate, the memory 702 may include removable or non-removable (or fixed) media. Where appropriate, the memory 702 may be inside or outside the electronic device. In certain embodiments, the memory 702 may be a non-volatile solid-state memory.

[0119] In one embodiment, the memory 702 may be a read-only memory (ROM). In one embodiment, the ROM may be a mask-programmable ROM, a programmable ROM (PROM), an erasable PROM (EPROM), an electrically erasable PROM (EEPROM), an electrically rewritable ROM (EAROM), or a flash memory, or a combination of two or more of these.

[0120] The processor 701 reads and executes computer program instructions stored in the memory 702 to implement any one of the electron beam stop calibration methods in the above embodiments.

[0121] In one example, the electronic device may further include a communication interface 703 and a bus 710. Figure 7 As shown, the processor 701, the memory 702, and the communication interface 703 are connected via a bus 710 and communicate with each other.

[0122] The communication interface 703 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0123] Bus 710 comprises hardware, software or both, couples the parts of electronic equipment to each other.For example, and not limitation, bus can comprise accelerated graphics port (AGP) or other graphics bus, enhanced industry standard architecture (EISA) bus, front side bus (FSB), hypertransport (HT) interconnection, industry standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations.In suitable cases, bus 710 can comprise one or more buses.Although the present application embodiment describes and shows specific bus, the application considers any suitable bus or interconnection.

[0124] In addition, in conjunction with the electron beam stop calibration method in the above-mentioned embodiments, embodiments of the present application may provide a computer-readable storage medium for implementation. The computer-readable storage medium stores computer program instructions; when the computer program instructions are executed by a processor, any of the electron beam stop calibration methods in the above-mentioned embodiments is implemented.

[0125] It should be understood that the present application is not limited to the specific configurations and processes described above and illustrated in the figures. For the sake of brevity, a detailed description of known methods is omitted here. In the above embodiments, several specific steps are described and illustrated as examples. However, the method process of the present application is not limited to the specific steps described and illustrated. Those skilled in the art can make various changes, modifications, and additions, or change the order of the steps after understanding the spirit of the present application.

[0126] The functional modules shown in the above-described block diagram can be implemented as hardware, software, firmware or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in unit, a function card or the like. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. The program or code segment can be stored in a machine-readable medium, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable medium" can include any medium that can store or transmit information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROMs, flash memories, erasable ROMs (EROMs), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. The code segment can be downloaded via a computer network such as the Internet, an intranet, etc.

[0127] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or systems based on a series of steps or devices. However, this application is not limited to the order of the above steps. In other words, the steps can be performed in the order mentioned in the embodiments, or in a different order, or several steps can be performed simultaneously.

[0128] Aspects of the present application have been described above with reference to the flowcharts and / or block diagrams of the methods, devices (systems) and computer program products according to the embodiments of the present application. It should be understood that each box in the flowchart and / or block diagram and the combination of each box in the flowchart and / or block diagram can be implemented by computer program instructions. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer or other programmable data processing device to produce a machine so that these instructions executed via the processor of the computer or other programmable data processing device enable the implementation of the function / action specified in one or more boxes of the flowchart and / or block diagram. This processor can be, but is not limited to, a general-purpose processor, a special-purpose processor, a special application processor or a field programmable logic circuit. It is also understood that each box in the block diagram and / or the flowchart and the combination of the boxes in the block diagram and / or the flowchart can also be implemented by the dedicated hardware that performs the specified function or action, or can be implemented by the combination of dedicated hardware and computer instructions.

[0129] The above description is only a specific embodiment of the present application. Those skilled in the art will clearly understand that for the convenience and brevity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the scope of protection of the present application is not limited thereto. Any person skilled in the art can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present application, and these modifications or replacements should be included in the scope of protection of the present application.

Claims

1. A method for calibrating an electron beam stop, characterized in that: include: Acquire a target image; wherein the target image includes a target object; Performing image clarity distribution detection on image blocks including the target object intercepted at relative positions in the target image using a sliding window to obtain multiple pairs of image clarity scores of the target image; Based on the plurality of pairs of image clarity scores, obtaining a plurality of pairs of image clarity trend curves respectively to determine the image clarity trend of the target image; By performing curve fitting on each pair of the image clarity trend curves, the positions of the curve intersections are determined respectively; based on the plurality of curve intersections, the positions of a plurality of chords of the image clarity contour circle are determined; and based on the positions of the plurality of chords of the image clarity contour circle, the position of the center of the image clarity contour circle is determined; Calculating an offset between the position of the circle center and the center position of the target image; wherein the offset represents an offset between the center of the electron beam and the center of the aperture; The electron beam is controlled to move based on the offset so that the offset is smaller than a preset offset.

2. The electron beam stop calibration method according to claim 1, characterized in that: The acquiring of the target image comprises: photographing the target object in different directions to obtain an initial image corresponding to each direction; intercepting image blocks containing the target object from each of the plurality of initial images; The plurality of image blocks are distributed and arranged according to their corresponding directions to obtain the target image.

3. The electron beam stop calibration method according to claim 1 or 2, characterized in that: The determining the position of the center of the image clarity contour circle based on the positions of the multiple chords of the image clarity contour circle includes: Based on the positions of the plurality of chords, determining the perpendicular bisector of each chord; Based on the plurality of perpendicular bisectors, determining an intersection point of the plurality of perpendicular bisectors; The average value of the intersection points of the plurality of perpendicular bisectors is calculated to determine the position of the center of the image clarity contour circle.

4. The electron beam stop calibration method according to claim 1, wherein: The calculating the offset between the position of the circle center and the center position of the target image includes: Calculate the offset direction and offset distance between the position of the circle center and the center position of the target image; wherein the offset direction and the offset distance respectively represent the offset direction and offset distance between the electron beam center and the aperture center.

5. The electron beam stop calibration method according to claim 4, characterized in that: The controlling the movement of the electron beam based on the offset so that the offset is less than a preset offset includes: controlling the movement of the electron beam based on the offset direction and the offset distance so that the offset amount is equal to zero; The offset being zero represents that the center of the electron beam and the center of the aperture completely coincide with each other.

6. A calibration device for an electron beam stop, characterized in that: include: An image acquisition module, configured to acquire a target image; wherein the target image includes a target object; an image clarity distribution detection module, configured to perform image clarity distribution detection on image blocks including a target object intercepted at relative positions in the target image through a sliding window, and obtain multiple pairs of image clarity scores of the target image; an image clarity trend determination module, configured to obtain a plurality of pairs of image clarity trend curves based on a plurality of pairs of image clarity scores, so as to determine the image clarity trend of the target image; a circle center position determination module, configured to determine the positions of the curve intersections by performing curve fitting on each pair of the image clarity trend curves, determine the positions of multiple chords of the image clarity contour circle based on the multiple curve intersections, and determine the position of the center of the image clarity contour circle based on the positions of the multiple chords of the image clarity contour circle; An offset calculation module, configured to calculate an offset between the position of the circle center and the center of the target image; wherein the offset represents an offset between the center of the electron beam and the center of the aperture; The electron beam movement control module is configured to control the movement of the electron beam based on the offset so that the offset is smaller than a preset offset.

7. The electron beam stop calibration device according to claim 6, characterized in that: The image acquisition module is used to: photograph the target object in different directions to obtain an initial image corresponding to each direction; intercept image blocks containing the target object from the multiple initial images; and distribute and arrange the multiple image blocks according to their corresponding directions to obtain the target image.

8. The electron beam stop calibration device according to claim 6 or 7, characterized in that: The center position determination module is used to: determine the perpendicular bisector of each chord based on the positions of the multiple chords; determine the intersection of the multiple perpendicular bisectors based on the multiple perpendicular bisectors; calculate the average value of the intersection of the multiple perpendicular bisectors to determine the position of the center of the image clarity contour circle.

9. The electron beam stop calibration device according to claim 6, characterized in that: The offset calculation module is used to calculate the offset direction and offset distance between the position of the center of the circle and the center position of the target image; wherein the offset direction and the offset distance respectively represent the offset direction and offset distance between the center of the electron beam and the center of the aperture.

10. The calibration device for an electron beam stop according to claim 9, characterized in that: The electron beam movement control module is used to: control the movement of the electron beam based on the offset direction and the offset distance so that the offset is equal to zero; wherein, the offset equal to zero indicates that the center of the electron beam and the center of the aperture completely coincide.

11. An electronic device, characterized in that: The electronic device includes: a processor and a memory storing computer program instructions; When the processor executes the computer program instructions, the method for calibrating the electron beam stop according to any one of claims 1 to 5 is implemented.

12. A computer-readable storage medium, characterized in that The computer-readable storage medium stores computer program instructions, and when the computer program instructions are executed by a processor, the method for calibrating an electron beam stop according to any one of claims 1 to 5 is implemented.

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