Lithography machine control system and control method

Abstract

The present invention provides a lithography machine control system and a control method. Among them, the lithography machine control system includes: an overall machine control system, an exposure system, a stage system, and a dose exposure control unit trigger system. The overall machine control system plans an exposure queue and sends the parameter information of the exposure queue to the exposure system and the stage system. The stage system moves to a specified position according to the parameter information of the exposure queue and outputs an exposure signal to the exposure system. The exposure system completes the exposure according to the parameter information of the exposure queue and outputs a movement signal to the stage system. The dose exposure control unit trigger system is used for information interaction between the exposure system and the stage system. By using the lithography machine control system, direct connection and intercommunication of information between the exposure system and the stage system can be achieved, reducing communication time, reducing the consumption time of exposure, improving the productivity of the lithography machine control system, and at the same time improving the reliability of the lithography machine control system.

Description

Technical Field

[0001] The present invention relates to the field of lithography technology, and particularly to a control system and a control method for a lithography machine. Background Art

[0002] A projection lithography machine is a device used to project the pattern on a mask onto the surface of a silicon wafer through a projection objective lens. The production process of a lithography machine is a series of extremely complex, expensive, and time-consuming lithography processes, and the lithography accuracy and productivity of the lithography machine directly determine the design and manufacture of the lithography equipment. With the increasing market demand for lithography productivity, it is necessary to optimize the entire exposure process of the lithography machine. Among them, the control method of the dose control unit is an important link affecting productivity.

[0003] The entire machine exposure process of the lithography machine mainly involves three units, namely, the entire machine control system, the exposure system, and the stage system. The exposure system is responsible for exposure dose control, the stage system is responsible for moving the exposure position and adjusting the posture to prepare for exposure, and the entire machine control system is responsible for coordinating the exposure system and the stage system. The exposure process is that after the entire machine control system triggers the stage system to move to the exposure position, the entire machine control system triggers the exposure system to expose according to the required dose. After the exposure is completed, the entire machine control system triggers the stage system to move to the next exposure position. After preparation, the entire machine control system triggers the exposure system to expose, and so on, until the exposure of the last exposure field is completed. Each exposure cycle requires the exposure system to communicate with the entire machine control system twice, and the stage system to communicate with the entire machine control system twice.

[0004] The dose control unit is an essential component for the exposure system. The dose control unit generally consists of a measurement unit, a processing unit, and an execution unit. The measurement unit measures the energy in the optical path and feeds it back to the processing unit. The processing unit calculates the exposure dose and controls the execution unit to achieve the required exposure dose on the silicon wafer surface. During the exposure process, the dose control unit needs to issue the execution time according to the timing of the entire machine control system of the lithography machine. For each exposure field, it needs to interact and feedback with the entire machine control system, and report the exposure result to the entire machine control system. However, the transmission of control information during the exposure process will increase the exposure time and reduce productivity. Summary of the Invention

[0005] The purpose of the present invention is to provide a control system and a control method for a lithography machine, so as to realize the direct connection and intercommunication of information between the exposure system and the stage system, save the information interaction between the exposure system and the stage system and the entire machine control system during the exposure process, reduce the communication time, improve the productivity of the lithography machine control system, and at the same time reduce the number of participating systems and improve the reliability of the lithography machine control system.

[0006] To achieve the above object and other objects, the present invention provides a lithography machine control system, including: an overall machine control system, an exposure system, a stage system, and a dose exposure control unit trigger system, wherein,

[0007] The overall machine control system plans an exposure queue and sends parameter information of the exposure queue to the exposure system and the stage system;

[0008] The dose exposure control unit trigger system is respectively connected to the stage system and the exposure system, and is used for information interaction between the exposure system and the stage system;

[0009] The stage system is connected to the overall machine control system. The stage system moves directly according to the parameter information of the exposure queue, or the stage system moves according to the parameter information of the exposure queue after being triggered by a movement signal output by the exposure system. After the stage system moves to a specified position, the stage system outputs an exposure signal, and the exposure signal reaches the exposure system through the dose exposure control unit trigger system;

[0010] The exposure system is connected to the overall machine control system. The exposure system performs exposure according to the parameter information of the exposure queue after being triggered by the exposure signal output by the stage system. After the exposure system completes exposure, the exposure system outputs a movement signal, and the movement signal reaches the stage system through the dose exposure control unit trigger system.

[0011] Optionally, in the lithography machine control system, the dose exposure control unit trigger system includes a motion control board, a dose control board, and an information transmission system. The dose control board is connected to the exposure system, the motion control board is connected to the stage system, and the information transmission system is respectively connected to the dose control board and the motion control board.

[0012] Optionally, in the lithography machine control system, the information transmission system includes: an exposure dose control unit opto-coupler drive circuit, an exposure dose control unit opto-coupler receiving circuit, an exposure dose control unit status board, a stage opto-coupler drive circuit, a stage opto-coupler receiving circuit, and a stage status board. Among them, the movement signal output by the exposure system is transmitted to the exposure dose control unit status board, and sequentially passes through the exposure dose control unit opto-coupler drive circuit and the stage opto-coupler receiving circuit to the stage status board; the exposure signal output by the stage system is transmitted to the stage status board, and sequentially passes through the stage opto-coupler drive circuit and the exposure dose control unit opto-coupler receiving circuit to the exposure dose control unit status board.

[0013] Optionally, in the lithography machine control system, after the exposure system completes the exposure, the exposure system also outputs the exposure result to the overall machine control system.

[0014] Optionally, in the lithography machine control system, the exposure queue includes at least one exposure field of view, and each exposure field of view corresponds to a parameter information.

[0015] Optionally, in the lithography machine control system, each parameter information includes exposure dose information and position information of the exposure field of view. The overall machine control system issues the exposure dose information of the exposure queue to the exposure system, and issues the position information of the exposure field of view of the exposure queue to the stage system.

[0016] Optionally, in the lithography machine control system, the exposure system includes an exposure drive, exposure firmware, and exposure hardware, where

[0017] The exposure drive is respectively connected to the overall machine control system and the exposure firmware, and is used for information interaction between the exposure firmware and the overall machine control system;

[0018] The exposure firmware is respectively connected to the exposure hardware and the dose exposure control unit trigger system. After receiving the exposure signal output by the stage system, the exposure firmware controls the exposure hardware to perform exposure according to the parameter information of the exposure queue issued by the overall machine control system. After the exposure hardware completes the exposure, the exposure firmware receives the exposure result feedback by the exposure hardware and outputs a movement signal.

[0019] Optionally, in the lithography machine control system, the stage system includes a stage drive, stage firmware, and stage hardware, where

[0020] The stage drive is respectively connected to the overall machine control system and the stage firmware, and is used for information interaction between the stage firmware and the overall machine control system;

[0021] The stage firmware is respectively connected to the stage hardware and the dose exposure control unit trigger system. The stage firmware directly controls the stage hardware to move according to the parameter information of the exposure queue issued by the overall machine control system, or, after the stage receives the movement signal output by the exposure system, the stage controls the stage hardware to move according to the parameter information of the exposure queue issued by the overall machine control system. After the stage hardware moves to the specified position, the stage firmware receives the movement result feedback by the stage hardware and outputs an exposure signal.

[0022] Optionally, in the lithography machine control system, a dose control unit is provided in the exposure hardware. The dose control unit includes a measurement unit, a processing unit, and an execution unit. Among them,

[0023] The measurement unit is used to measure the energy in the optical path of the exposure system and feed the measurement result back to the processing unit;

[0024] The processing unit is coupled to the measurement unit. The processing unit calculates the exposure dose according to the measurement result and outputs a control signal according to the exposure dose;

[0025] The execution unit is coupled to the processing unit. The execution unit adjusts the size of the exposure area according to the control signal to achieve the exposure dose required for substrate exposure.

[0026] Optionally, in the lithography machine control system, the whole machine control system is connected to the exposure system and the stage system through Ethernet or through an industrial field bus.

[0027] To achieve the above object and other related objects, the present invention also provides a lithography machine control method, including:

[0028] Step S1: Initialize the exposure system and the stage system;

[0029] Step S2: Plan an exposure queue through the whole machine control system, and send the first m parameter information in the exposure queue to the exposure system and the stage system. Each parameter information includes the position information of the exposure field and the exposure dose information, and m≥1;

[0030] Step S3: Take out the first parameter information in the stage system, and the stage system moves according to the position information of the exposure field in the first parameter information. After the stage system moves to the specified position, the stage system outputs an exposure signal, and the exposure signal is triggered to the exposure system through the dose exposure control unit;

[0031] Step S4: When the exposure system receives the exposure signal, the exposure system is triggered, so that the exposure system performs exposure according to the exposure dose information in the first parameter information. After the exposure system completes the exposure, the exposure system feeds back the exposure result to the whole machine control system and outputs a movement signal, and the movement signal is triggered to the stage system through the dose exposure control unit;

[0032] Step S5: When the mobile station system receives the mobile signal, the mobile station system is triggered, so that the mobile station system moves according to the position information of the exposure field in the next parameter information. When the mobile station system moves to the specified position, the mobile station system outputs an exposure signal;

[0033] Step S6: While the mobile station system receives the mobile signal, the whole machine control system receives the exposure result and issues the first parameter information in the parameter information that has not been issued in the exposure queue to the exposure system and the mobile station system;

[0034] Step S7: When the exposure system receives the exposure signal, the exposure system is triggered, so that the exposure system exposes according to the exposure dose information in the next parameter information. After the exposure system completes the exposure, the exposure system feeds back the exposure result to the whole machine control system and outputs a mobile signal, and the mobile signal reaches the mobile station system through the dose exposure control unit trigger system;

[0035] Step S8: Repeat Step S5 to Step S7 until the exposure is completed.

[0036] Optionally, in the lithography machine control method, the exposure queue includes at least one exposure field, and each exposure field corresponds to a parameter information.

[0037] In the lithography machine control system provided by the present invention, by adding a dose exposure control unit trigger system between the exposure system and the mobile station system, the logic optimization in the exposure process is realized. The exposure result of the exposure system and the movement result of the mobile station each time no longer need to be fed back to the whole machine control system for centralized control and scheduling, realizing the direct connection and intercommunication of information between the exposure system and the mobile station system, reducing the communication time, reducing the consumption time of exposure, improving the productivity of the lithography machine control system, while reducing the number of participating systems, reducing costs, and improving the reliability of the lithography machine control system.

[0038] In the lithography machine control method provided by the present invention, the dose exposure control unit trigger system plus the exposure queue planned by the whole machine control system parallelize the communication between the whole machine control system and the exposure system and the mobile station system in a queue manner, so that the data issuance and feedback do not affect the exposure main process, further improving the productivity of the lithography machine control system. Description of the Drawings

[0039] Figure 1 is a structural block diagram of a lithography machine control system;

[0040] Figure 2 is a structural block diagram of the lithography machine control system in an embodiment of the present invention;

[0041] Figure 3 It is a schematic diagram of an exposure queue in an embodiment of the present invention;

[0042] Figure 4 It is a structural block diagram of a dose exposure control unit trigger system in an embodiment of the present invention;

[0043] Figure 5 It is a structural block diagram of a signal transmission system in an embodiment of the present invention;

[0044] Figure 6 It is a schematic diagram of a lithography machine control method in an embodiment of the present invention. Specific Embodiments

[0045] The following further elaborates on the lithography machine control system and control method proposed by the present invention in conjunction with the accompanying drawings and specific embodiments. According to the following description, the advantages and features of the present invention will be clearer. It should be noted that the accompanying drawings are all in a very simplified form and use non-precise scales, only for conveniently and clearly assisting in explaining the purpose of the embodiments of the present invention.

[0046] Refer to Figure 1 , the lithography machine control system of the prior art consists of an overall machine control system, an exposure system, and a stage system. The overall machine control system, such as a host computer, is responsible for coordinating the exposure system and the stage system. Both the exposure system and the stage system are composed of a driver, firmware, and hardware. The driver is responsible for the interaction between the firmware and the host computer, and the firmware communicates directly with the hardware. From the perspective of execution efficiency, the execution efficiency of the firmware is the highest. For example, the exposure system includes an exposure driver, exposure firmware, and exposure hardware, which is responsible for exposure dose control. The stage system includes a stage driver, stage firmware, and stage hardware, which is responsible for moving the exposure position and adjusting the posture to prepare for exposure.

[0047] In the exposure process, after the overall machine control system triggers the stage to move to the exposure position, the overall machine control system triggers the exposure system to expose according to the required dose. After the exposure is completed, the overall machine control system triggers the stage system to move to the next exposure position. After preparation, the overall machine control system triggers the exposure system to expose, and so on, until the exposure of the last exposure field is completed. Each exposure cycle requires the exposure system to communicate with the overall machine control system twice and the stage system to communicate with the overall machine control system twice, increasing the exposure time and reducing the production rate.

[0048] In order to achieve direct connection and intercommunication of information between the exposure system and the stage system, save communication time, reduce the consumption time of exposure, improve the production rate of the lithography control system, at the same time reduce the number of participating systems, reduce costs, and improve the reliability of the lithography machine control system, the present invention provides a lithography machine control system.

[0049] Refer to Figure 2 , the lithography machine control system provided by the present invention includes: an overall machine control system, an exposure system, a stage system, and a dose exposure control unit trigger system.

[0050] The overall machine control system plans an exposure queue and sends the parameter information of the exposure queue to the exposure system and the stage system. Refer to Figure 3 , the exposure queue includes at least one exposure field of view, and each exposure field of view corresponds to a parameter information. Each parameter information includes exposure dose information and position information of the exposure field of view. The overall machine control system sends the exposure dose information of the exposure queue to the exposure system and sends the position information of the exposure field of view of the exposure queue to the stage system. In Figure 3 , the first exposure field of view in the queue is the exposure field of view 1, and its corresponding parameter information is parameter information 1; the second exposure field of view is the exposure field of view 2, and its corresponding parameter information is parameter information 2;......; the nth exposure field of view is the exposure field of view n, and its corresponding parameter information is parameter information n.

[0051] The overall machine control system can be a host computer, which is connected to the exposure system and the stage system through Ethernet or through an industrial field bus. The host computer can use a workstation or an industrial control PC, and applications such as Unix or Windwos operating systems.

[0052] Continue to refer to Figure 2, the mobile station system moves directly according to the parameter information of the exposure queue, or the mobile station system moves according to the parameter information of the exposure queue after being triggered by the movement signal output by the exposure system. After the mobile station system moves to the specified position, the mobile station system outputs an exposure signal, and the exposure signal is sent to the exposure system through the dose exposure control unit trigger system. The mobile station system includes a mobile station drive, mobile station firmware, and mobile station hardware. Among them, the mobile station drive is respectively connected to the whole machine control system and the mobile station firmware, and is used for information interaction between the mobile station firmware and the whole machine control system; the mobile station firmware is respectively connected to the mobile station hardware and the dose exposure control unit trigger system. The mobile station firmware directly controls the mobile station hardware to move according to the parameter information of the exposure queue issued by the whole machine control system, or after the mobile station is triggered by the movement signal output by the exposure system, the mobile station firmware controls the mobile station hardware to move according to the parameter information of the exposure queue issued by the whole machine control system. After the mobile station hardware moves to the specified position, the mobile station firmware receives the movement result fed back by the mobile station hardware and outputs an exposure signal. The mobile station drive, mobile station firmware, and mobile station hardware inside the mobile station system can be interconnected with each other in the form of an internal bus for real-time internal information exchange. For example, the internal bus form is such as PCI, VME, Compact PCI, VXI, PXI, PC104, GPIB, USB, etc.

[0053] After being triggered by the exposure signal output by the mobile station system, the exposure system performs exposure according to the parameter information of the exposure queue. After the exposure system completes the exposure, the exposure system outputs a mobile signal, and the mobile signal is sent to the mobile station system through the dose exposure control unit trigger system. The exposure system includes an exposure driver, exposure firmware, and exposure hardware. Among them, the exposure driver is respectively connected to the whole machine control system and the exposure firmware, and is used for information interaction between the exposure firmware and the whole machine control system; the exposure firmware is respectively connected to the exposure hardware and the dose exposure control unit trigger system. After being triggered by the exposure signal output by the mobile station system, the exposure firmware controls the exposure hardware to perform exposure according to the parameter information of the exposure queue sent by the whole machine control system. After the exposure hardware completes the exposure, the exposure firmware receives the exposure result fed back by the exposure hardware and outputs a mobile signal. A dose control unit is provided in the exposure hardware. The dose control unit includes a measurement unit, a processing unit, and an execution unit. Among them, the measurement unit is used to measure the energy in the optical path of the exposure system and feed the measurement result back to the processing unit; the processing unit is coupled to the measurement unit, and the processing unit calculates the exposure dose according to the measurement result and outputs a control signal according to the exposure dose; the execution unit is coupled to the processing unit, and the execution unit adjusts the size of the exposure area according to the control signal to achieve the exposure dose required for substrate exposure. After the exposure system completes the exposure, the exposure system also outputs the exposure result to the whole machine control system. The exposure driver, exposure firmware, and exposure hardware inside the exposure system can be connected to each other in the form of an internal bus for real-time internal information exchange. For example, the internal bus form is such as PCI, VME, Compact PCI, VXI, PXI, PC104, GPIB, USB, etc.

[0054] The dose exposure control unit trigger system is respectively connected to the mobile station system and the exposure system, and is used for information interaction between the exposure system and the mobile station system. Specifically, the dose exposure control unit trigger system is respectively connected to the mobile station firmware and the exposure firmware, directly reducing the information transfer that originally required the participation of the exposure driver, mobile station driver, and whole machine control system in the prior art to the information transfer between the exposure firmware and the mobile station firmware, and using a more efficient firmware interface signal system, greatly reducing the communication time.

[0055] Refer to Figure 4, the dose exposure control unit trigger system includes a motion control board, a dose control board, and an information transmission system. The dose control board is connected to the exposure system, the motion control board is connected to the mobile stage system, and the information transmission system is respectively connected to the dose control board and the motion control board. The dose control board can achieve internal dose control of the exposure system according to the trigger signal, feedback the dose control result, and output a movement signal. The motion control board can achieve position movement according to the trigger signal, and after the movement is completed, feedback a completion signal. The signal transmission system can achieve information transfer between the dose control board and the motion control board. The mobile stage system and the exposure system perform information transfer and subsystem state switching through the dose exposure control unit trigger system.

[0056] Refer to Figure 5 , the information transmission system includes: an exposure dose control unit optocoupler drive circuit, an exposure dose control unit optocoupler receiving circuit, an exposure dose control unit status board PAC, a mobile stage optocoupler drive circuit, a mobile stage optocoupler receiving circuit, and a mobile stage status board PAC. Among them, the movement signal output by the exposure system is transmitted to the exposure dose control unit status board PAC, and sequentially passes through the exposure dose control unit optocoupler drive circuit and the mobile stage optocoupler receiving circuit to the mobile stage status board PAC, and triggers the motion control board, so that the mobile stage system moves according to the parameter information of the exposure queue issued by the whole machine control system; the exposure signal output by the mobile stage system is transmitted to the mobile stage status board PAC, and sequentially passes through the mobile stage optocoupler drive circuit and the exposure dose control unit optocoupler receiving circuit to the exposure dose control unit status board PAC, and triggers the dose control board, so that the exposure system performs exposure according to the parameter information of the exposure queue issued by the whole machine control system. The present invention analyzes the necessary exposure interfaces in the exposure process of the lithography machine, processes the serial process in parallel, and uses a more efficient firmware interface signal system, reducing the communication events of the drive and the whole machine control system, and improving the exposure yield.

[0057] The dose exposure control unit trigger system reduces the in-chip exposure consumption time through a streamlined in-chip exposure communication method, effectively improves the exposure efficiency, and increases the yield. In the exposure process of the prior art, the single-step exposure time is 320 ms, while through the dose exposure control unit trigger system in this embodiment, the single-step exposure time can be reduced to 260 ms, that is, the exposure time is increased by 20%.

[0058] In the lithography machine control system provided by the present invention, by adding a dose exposure control unit trigger system between the exposure system and the stage system, logical optimization during the exposure process is achieved. The exposure result of the exposure system and the movement result of the stage no longer need to be fed back to the overall machine control system for centering control scheduling. Information direct connection and intercommunication between the exposure system and the stage system are realized, reducing communication time, decreasing the consumption time of exposure, improving the productivity of the lithography machine control system, while reducing the number of participating systems, lowering costs, and enhancing the reliability of the lithography machine control system.

[0059] In addition, the present invention also provides a lithography machine control method, which can be realized by adopting the lithography machine control system provided by the present invention.

[0060] The lithography machine control method includes:

[0061] Step S1: Initialize the exposure system and the stage system;

[0062] Step S2: Plan an exposure queue through the overall machine control system, and send the first m parameter information in the exposure queue to the exposure system and the stage system. Each parameter information includes the position information of the exposure field and the exposure dose information, and m≥1;

[0063] Step S3: Take out the first parameter information in the stage system, and the stage system moves according to the position information of the exposure field in the first parameter information. After the stage system moves to the specified position, the stage system outputs an exposure signal, and the exposure signal reaches the exposure system through the dose exposure control unit trigger system;

[0064] Step S4: When the exposure system receives the exposure signal, the exposure system is triggered, so that the exposure system performs exposure according to the exposure dose information of the first parameter information. After the exposure system completes the exposure, the exposure system feeds back the exposure result to the overall machine control system and outputs a movement signal, and the movement signal reaches the stage system through the dose exposure control unit trigger system;

[0065] Step S5: When the stage system receives the movement signal, the stage system is triggered, so that the stage system moves according to the position information of the exposure field in the next parameter information. When the stage system moves to the specified position, the stage system outputs an exposure signal;

[0066] Step S6: While the mobile station system receives the mobile signal, the whole machine control system receives the exposure result, and issues the first parameter information in the parameter information that has not been issued in the exposure queue to the exposure system and the mobile station system;

[0067] Step S7: When the exposure system receives the exposure signal, the exposure system is triggered, so that the exposure system performs exposure according to the exposure dose information of the next parameter information. After the exposure system completes the exposure, the exposure system feeds back the exposure result to the whole machine control system, and outputs a mobile signal, and the mobile signal is sent to the mobile station system through the dose exposure control unit trigger system;

[0068] Step S8: Repeat Step S5 to Step S7 until the exposure is completed.

[0069] Refer to Figure 6 , the whole machine control system is preferably a host computer. When m = 2, the specific process of the lithography machine control method is as follows:

[0070] In Steps S1 and S2, the initialization of the exposure system and the mobile station system is completed, and the host computer plans the exposure queue. The host computer issues the first 2 parameter information in the exposure queue to the exposure system and the mobile station system. See Process ①. Process ① means that the host computer issues the first parameter information and the second parameter information in the exposure queue to the exposure system and the mobile station system.

[0071] In Step S3, the mobile stage drive receives the first parameter information and the second parameter information, and presses down the first parameter information and the second parameter information to the mobile stage firmware; the exposure drive receives the first parameter information and the second parameter information, and presses down the first parameter information and the second parameter information to the exposure stage firmware. See Process ②. Process ② means that the mobile stage drive presses down the first parameter information and the second parameter information in the exposure queue to the mobile stage firmware, and the exposure drive presses down the first parameter information and the second parameter information in the exposure queue to the exposure firmware.

[0072] Retrieve the first parameter information in the mobile station firmware, and control the movement of the mobile station hardware according to the position information of the exposure field in the first parameter information. After the mobile station hardware moves to the specified position, the mobile station hardware feeds back the movement result to the mobile station firmware. After receiving the feedback movement result, the mobile station firmware sends an exposure signal, and the exposure signal is transmitted to the dose exposure control unit trigger system and finally transmitted to the exposure firmware. See processes ③, ④, ⑤, and ⑥ for details. Process ③ represents the movement of the mobile station hardware according to the position information of the exposure field in the first parameter information; process ④ represents the mobile station hardware feeding back the movement result to the mobile station firmware; process ⑤ represents the mobile station firmware sending the exposure signal to the dose exposure control unit trigger system; process ⑥ represents the exposure firmware receiving the exposure signal.

[0073] In step S4, when the exposure firmware receives the exposure signal, the exposure system is triggered. Retrieve the first parameter information in the exposure firmware, and control the exposure of the exposure hardware according to the exposure dose information in the first parameter information. After the exposure hardware completes the exposure, the exposure hardware feeds back the exposure result to the exposure firmware. See processes ⑦ and ⑧ for details. Process ⑦ represents the exposure of the exposure hardware according to the exposure dose information in the first parameter information in the exposure queue; process ⑧ represents the exposure hardware feeding back the exposure result to the exposure firmware.

[0074] After receiving the exposure result, the exposure firmware will send a movement signal, and the movement signal is transmitted to the dose exposure control unit trigger system and finally transmitted to the mobile station firmware. See processes ⑨ and ⑩ for details. Process ⑨ represents the exposure firmware sending the movement signal to the dose exposure control unit trigger system; process ⑩ represents the mobile station firmware receiving the movement signal.

[0075] In step S5, when the mobile station firmware receives the movement signal, the mobile station system is triggered, causing the mobile station hardware to move according to the position information of the exposure field in the second parameter information. When the mobile station hardware moves to the specified position, the mobile station hardware feeds back the movement result to the mobile station firmware, and the mobile station firmware outputs an exposure signal. See process The process represents the movement of the mobile station hardware according to the position information of the exposure field in the second parameter information.

[0076] In step S6, when the exposure firmware sends a movement signal after receiving the exposure result, the exposure firmware also transmits the exposure result to the host computer via the exposure drive. That is, when the mobile station firmware receives the movement signal, the host computer receives the exposure result and issues the third parameter information in the exposure queue to the exposure system and the mobile station system. Refer to the process and The process represents that the exposure firmware sends the exposure result to the exposure drive; the process represents that the exposure drive sends the exposure result to the host computer; the process represents that the host computer issues the third parameter information in the exposure queue. The process and occurs simultaneously with processes ⑨, ⑩, and That is, the queue planning is completed in the host computer. Using the inter-field exposure time, the exposure queue is issued without occupying the exposure main line, and this queue planning does not affect the overall machine production rate.

[0077] In step S7, when the exposure firmware receives the exposure signal, the exposure system is triggered, the second parameter information in the exposure firmware is taken out, and the exposure hardware is controlled to expose according to the exposure dose information in the second parameter information. After the exposure hardware completes the exposure, the exposure hardware feeds back the exposure result to the exposure firmware.

[0078] Repeat steps S5 to S7 until the exposure is completed.

[0079] In summary, the lithography machine control method provided by the present invention realizes the logic optimization in the exposure process. The exposure result and the mobile station movement result each time no longer need to be fed back to the overall machine control system for centering control scheduling, realizing the direct connection and intercommunication of information between the exposure system and the mobile station system, saving the information interaction between the exposure system and the overall machine control system, and the information interaction between the mobile station system and the overall machine control system, saving communication time, reducing the exposure time, and improving the production rate of the lithography control system. At the same time, the number of participating systems is reduced, the cost is reduced, and the reliability of the system is improved. Moreover, the exposure process implemented at the firmware layer of the present invention is serial, greatly reducing the communication time between the drive and the overall machine control system, and making the communication in the overall machine control system, the exposure drive, and the mobile station drive parallel with the exposure main process through the queue method, so that the data issuance and feedback do not affect the exposure main process, further improving the production rate of the lithography control system.

[0080] It will be understood that although the present invention has been disclosed above in preferred embodiments, the above embodiments are not intended to limit the present invention. For any person skilled in the art, without departing from the scope of the technical solution of the present invention, many possible variations and modifications can be made to the technical solution of the present invention by using the technical content disclosed above, or it can be modified into equivalent embodiments with equivalent changes. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical essence of the present invention without departing from the content of the technical solution of the present invention still fall within the scope of protection of the technical solution of the present invention.

[0081] Moreover, it should also be understood that the present invention is not limited to the specific methods, compounds, materials, manufacturing techniques, uses and applications described herein, and they can vary. It should also be understood that the terms described herein are only used to describe specific embodiments and not to limit the scope of the present invention. It must be noted that the singular forms "a", "an" and "the" used herein and in the appended claims include plural references unless the context clearly dictates otherwise. Thus, for example, reference to "a step" or "a device" means reference to one or more steps or devices and may include sub-steps and sub-devices. All conjunctions used should be understood in their broadest sense. Thus, the word "or" should be understood to have the definition of logical "or" rather than the definition of logical "exclusive or" unless the context clearly dictates otherwise. The structures described herein will be understood to also refer to functional equivalents of the structures. Language that may be interpreted as approximate should be so understood unless the context clearly dictates otherwise.

Claims

1. A lithography machine control system, characterized in that, Including: The whole machine control system, the exposure system, the mobile station system, and the dose exposure control unit triggering system. Among them, The whole machine control system plans the exposure queue and sends the parameter information of the exposure queue to the exposure system and the mobile station system; The dose exposure control unit triggering system is respectively connected to the mobile station system and the exposure system, and is used for information interaction between the exposure system and the mobile station system; the dose exposure control unit triggering system includes a motion control board, a dose control board, and an information transmission system. The dose control board is connected to the exposure system, the motion control board is connected to the mobile station system, and the information transmission system is respectively connected to the dose control board and the motion control board; the information transmission system includes: an exposure dose control unit optocoupler drive circuit, an exposure dose control unit optocoupler receiving circuit, an exposure dose control unit status board, a mobile station optocoupler drive circuit, a mobile station optocoupler receiving circuit, and a mobile station status board. Among them, the mobile signal output by the exposure system is transmitted to the exposure dose control unit status board, and then sequentially passes through the exposure dose control unit optocoupler drive circuit and the mobile station optocoupler receiving circuit to the mobile station status board; the exposure signal output by the mobile station system is transmitted to the mobile station status board, and then sequentially passes through the mobile station optocoupler drive circuit and the exposure dose control unit optocoupler receiving circuit to the exposure dose control unit status board; The mobile station system is connected to the whole machine control system. The mobile station system moves directly according to the parameter information of the exposure queue, or the mobile station system is triggered by the mobile signal output by the exposure system and then moves according to the parameter information of the exposure queue. After the mobile station system moves to the specified position, the mobile station system outputs an exposure signal, and the exposure signal passes through the dose exposure control unit triggering system to the exposure system; The exposure system is connected to the whole machine control system. The exposure system is triggered by the exposure signal output by the mobile station system and then exposes according to the parameter information of the exposure queue. After the exposure system completes the exposure, the exposure system outputs a mobile signal, and the mobile signal passes through the dose exposure control unit triggering system to the mobile station system.

2. The lithography machine control system according to claim 1, characterized in that, After the exposure system completes the exposure, the exposure system also outputs the exposure result to the whole machine control system.

3. The lithography machine control system according to claim 1, characterized in that, The exposure queue includes at least one exposure field of view, and each exposure field of view corresponds to a parameter information.

4. The lithography machine control system according to claim 3, characterized in that, The parameter information corresponding to each exposure field of view includes exposure dose information and the position information of the exposure field of view. The whole machine control system sends the exposure dose information of the exposure queue to the exposure system and sends the position information of the exposure field of view of the exposure queue to the mobile station system.

5. The lithography machine control system according to claim 1, characterized in that, The exposure system includes an exposure drive, exposure firmware, and exposure hardware. Among them, The exposure drive is respectively connected to the whole machine control system and the exposure firmware, and is used for information interaction between the exposure firmware and the whole machine control system; The exposure firmware is respectively connected to the exposure hardware and the dose exposure control unit trigger system. After receiving the exposure signal output by the mobile station system, the exposure firmware controls the exposure hardware to perform exposure according to the parameter information of the exposure queue issued by the whole machine control system. After the exposure hardware completes the exposure, the exposure firmware receives the exposure result fed back by the exposure hardware and outputs a movement signal.

6. The lithography machine control system according to claim 1, characterized in that, The mobile station system includes a mobile station driver, mobile station firmware, and mobile station hardware, where the mobile station driver is respectively connected to the whole machine control system and the mobile station firmware, and is used for information interaction between the mobile station firmware and the whole machine control system; the mobile station firmware is respectively connected to the mobile station hardware and the dose exposure control unit trigger system. The mobile station firmware directly controls the mobile station hardware to move according to the parameter information of the exposure queue issued by the whole machine control system. Alternatively, after the mobile station receives the movement signal output by the exposure system, it controls the mobile station hardware to move according to the parameter information of the exposure queue issued by the whole machine control system. After the mobile station hardware moves to the specified position, the mobile station firmware receives the movement result fed back by the mobile station hardware and outputs an exposure signal.

7. The lithography machine control system according to claim 5, characterized in that, A dose control unit is provided in the exposure hardware. The dose control unit includes a measurement unit, a processing unit, and an execution unit, where the measurement unit is used to measure the energy in the optical path of the exposure system and feed back the measurement result to the processing unit; the processing unit is coupled to the measurement unit. The processing unit calculates the exposure dose according to the measurement result and outputs a control signal according to the exposure dose; the execution unit is coupled to the processing unit. The execution unit adjusts the size of the exposure area according to the control signal to achieve the exposure dose required for substrate exposure.

8. The lithography machine control system according to claim 1, characterized in that, The whole machine control system is connected to the exposure system and the mobile station system through Ethernet or through an industrial field bus.

9. A lithography machine control method, characterized in that, Including: Step S1: Initialize the exposure system and the mobile station system; Step S2: Plan an exposure queue through the whole machine control system, and issue the first m parameter information in the exposure queue to the exposure system and the mobile station system. Each parameter information includes the position information of the exposure field of view and the exposure dose information, and m≥1; Step S3: Take out the first parameter information in the mobile station system, and the mobile station system moves according to the position information of the exposure field of view in the first parameter information. After the mobile station system moves to the specified position, the mobile station system outputs an exposure signal, and the exposure signal reaches the exposure system through the dose exposure control unit trigger system; Step S4: When the exposure system receives the exposure signal, the exposure system is triggered, so that the exposure system performs exposure according to the exposure dose information in the first parameter information. After the exposure system completes the exposure, the exposure system feeds back the exposure result to the whole machine control system and outputs a movement signal, and the movement signal is sent to the mobile station system through the dose exposure control unit trigger system; Step S5: When the mobile station system receives the movement signal, the mobile station system is triggered, so that the mobile station system moves according to the position information of the exposure field of view in the next parameter information. When the mobile station system moves to the designated position, the mobile station system outputs an exposure signal; Step S6: While the mobile station system receives the movement signal, the whole machine control system receives the exposure result and issues the first parameter information in the parameter information that has not been issued in the exposure queue to the exposure system and the mobile station system; Step S7: When the exposure system receives the exposure signal, the exposure system is triggered, so that the exposure system performs exposure according to the exposure dose information in the next parameter information. After the exposure system completes the exposure, the exposure system feeds back the exposure result to the whole machine control system and outputs a movement signal, and the movement signal is sent to the mobile station system through the dose exposure control unit trigger system; Step S8: Repeat Step S5 to Step S7 until the exposure is completed.

10. The lithography machine control method according to claim 9, characterized in that, The exposure queue includes at least one exposure field of view, and each exposure field of view corresponds to a parameter information.

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