Clothing model manufacturing method and device, computer storage medium, and electronic device
By acquiring the UV maps of the clothing model, tiling them, converting them into planar panels, rewiring and adjusting the topology, and combining UV map attribute transfer and seam welding, the problems of cumbersome and time-consuming operations in the clothing model production process are solved, and efficient clothing model generation is achieved.
Patent Information
- Application Number
- CN202210892440.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-07-27
- Publication Date
- 2026-02-13
- Estimated Expiration
- 2042-07-27
AI Technical Summary
The production process of clothing models in the existing technology is cumbersome and time-consuming, especially when creating low-poly topologies in 3D software, which requires reorganizing the wiring and wrapping the high-poly model, making the operation complicated.
By acquiring the UV maps of the clothing model and tiling them, converting them into planar panels, rewiring them, and importing them into next-generation 3D modeling software for topology and polygon count adjustment, and utilizing UV map attribute transfer and spatial position transfer, the production process of clothing models is simplified. Finally, seam vertex welding and high-poly detail sculpting are performed.
It simplifies the production process of clothing models, saves model production time, improves generation efficiency, and solves the problem of cumbersome operation.
Smart Images

Figure CN115186317B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] Embodiments of the present disclosure relate to the technical field of computer, and in particular, to a garment model making method and device, a computer storage medium and an electronic device. BACKGROUND
[0002] The making of a garment model is a very important model making link in character making. Due to the needs of animation, in addition to having a good model shape, the garment model also needs to have reasonable wiring and appropriate number of faces.
[0003] In the related art, the low-mode topology is usually performed on the made garment model. However, the low-mode topology needs to re-comb the wiring of the made garment model in the three-dimensional software, and needs to make a model for wrapping the high-mode for each face of the made garment model, which is tedious and time-consuming.
[0004] Therefore, it is necessary to provide a new garment model making method.
[0005] It should be noted that the information disclosed in the above background section is only used to strengthen the understanding of the background of the present disclosure, and therefore can include information that does not constitute prior art known to those of ordinary skill in the art. SUMMARY
[0006] The purpose of the present disclosure is to provide a garment model making method, a garment model making device, a computer readable storage medium and an electronic device, thereby at least partially overcoming the problem of tedious operation and long time consumption in making a garment model due to the limitations and defects of the related art.
[0007] According to one aspect of the present disclosure, a garment model making method is provided, comprising:
[0008] obtaining a first garment model, flattening the first garment model to obtain a UV map of the first garment model;
[0009] converting the first garment model to obtain a flat sheet of the first garment model, re-wiring the flat sheet to obtain a first flat sheet, and obtaining a target flat sheet through the first flat sheet and the UV map;
[0010] obtaining a target garment model through the target flat sheet and the first garment model.
[0011] In an exemplary embodiment of the present disclosure, the first garment model is a non-high-mode garment model or a high-mode garment model.
[0012] In an example embodiment of the present disclosure, the first garment model is converted to obtain planar patches of the first garment model, comprising:
[0013] In a three-dimensional garment making software, the first garment model is converted to obtain planar patches of the first garment model.
[0014] In an example embodiment of the present disclosure, after obtaining the planar patches of the first garment model, the garment model making method further comprises:
[0015] The planar patches of the first garment model are exported from the three-dimensional garment making software;
[0016] When the planar patches of the first garment model are exported, the planar patches are not merged, and the thickness of the planar patches is not set.
[0017] In an example embodiment of the present disclosure, the planar patches are rewired to obtain first planar patches, and target planar patches are obtained through the first planar patches and the UV map, comprising:
[0018] The planar patches of the first garment model are imported into a next-generation three-dimensional modeling software to determine the number of topological surfaces of the planar patches;
[0019] The planar patches are rewired through the number of topological surfaces by using the next-generation three-dimensional modeling software to obtain the first planar patches;
[0020] The target planar patches are obtained through the first planar patches and the UV map.
[0021] In an example embodiment of the present disclosure, the target planar patches are obtained through the first planar patches and the UV map, comprising:
[0022] It is judged whether the first planar patches have UV;
[0023] When the first planar patches have UV, the first planar patches are taken as the target planar patches;
[0024] When the first planar patches do not have UV, the UV map is exported from the three-dimensional garment making software and is imported into the next-generation three-dimensional modeling software;
[0025] The UV map is attribute-transferred by using spatial positions to obtain the target planar patches.
[0026] In an example embodiment of the present disclosure, the target garment model is obtained by the target flat sheet and the first garment model, comprising:
[0027] The first garment model and the target flat sheet are imported into a three-dimensional software;
[0028] The first garment model and the target flat sheet are subjected to spatial position transfer by using the attribute of UV overlap, to obtain a second garment model;
[0029] The second garment model is subjected to seam vertex welding to obtain the target garment model.
[0030] In an example embodiment of the present disclosure, the target garment model is obtained by the second garment model subjected to seam vertex welding, comprising:
[0031] When the first garment model is a non-high-mode garment model, the second garment model is subjected to seam vertex welding, and the layout in the second garment model is adjusted;
[0032] The second garment model with adjusted layout is imported into a next-generation three-dimensional modeling software, the second garment model with adjusted layout is added with thickness and hem, and high-mode detailed sculpture is performed to obtain the target garment model.
[0033] In an example embodiment of the present disclosure, the target garment model is obtained by the second garment model subjected to seam vertex welding, comprising:
[0034] When the first garment model is a high-mode garment model, the second garment model is subjected to seam vertex welding, and the layout in the second garment model is adjusted;
[0035] The second garment model with adjusted layout and the first garment model are subjected to model wrapping matching by using the projection function or the model wrapping function of the next-generation three-dimensional modeling software, to obtain the target garment model.
[0036] According to an aspect of the present disclosure, a garment model manufacturing device is provided, comprising:
[0037] A UV map acquisition module is configured to acquire a first garment model, tile the first garment model, and obtain a UV map of the first garment model;
[0038] A model conversion module is configured to convert the first garment model, obtain a flat sheet of the first garment model, and rewire the flat sheet to obtain a target flat sheet;
[0039] The target model generation module is used to obtain the target clothing model using the target planar plate and the first clothing model.
[0040] According to one aspect of this disclosure, a computer storage medium is provided having a computer program stored thereon, which, when executed by a processor, implements the clothing model making method described in any of the exemplary embodiments above.
[0041] According to one aspect of this disclosure, an electronic device is provided, comprising:
[0042] Processor; and
[0043] Memory for storing the executable instructions of the processor;
[0044] The processor is configured to execute the clothing model making method described in any of the above exemplary embodiments by executing the executable instructions.
[0045] This disclosure provides a method for creating a clothing model, which involves obtaining a first clothing model, tiling the first clothing model to obtain a UV map of the first clothing model, converting the first clothing model to obtain planar plates of the first clothing model, rewiring the planar plates to obtain a first planar plate, obtaining a target planar plate using the first planar plate and the UV map, and obtaining the target clothing model using the target planar plate and the first clothing model. On one hand, by obtaining the first clothing model, rewiring the planar plates of the first clothing model to obtain the first planar plate, obtaining the target planar plate using the first planar plate and the UV map of the first clothing model, and obtaining the target clothing model using the first clothing model and the target planar plate, this method solves the problem of cumbersome operations caused by low-poly topology of the created clothing model in related technologies, simplifies the clothing model creation process, and saves model creation time. On the other hand, after obtaining the planar plates of the first clothing model, only rewiring the planar plates is needed to obtain the first planar plate, and the target planar plate is obtained using the first planar plate, thus improving the generation efficiency of the target clothing model.
[0046] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit the invention. Attached Figure Description
[0047] The accompanying drawings, which are incorporated herein and form a part of the specification, illustrate embodiments consistent with the present application and, together with the description, further serve to explain the principles of the application. It is to be understood that the drawings are designed solely for purposes of illustration to be used in conjunction with the description in
[0048] Figure 1 A flowchart illustrating a method of garment modeling according to example embodiments of the present disclosure is schematically shown.
[0049] Figure 2 A schematic diagram illustrating a UV map of a first garment model according to example embodiments of the present disclosure is schematically shown.
[0050] Figure 3 A flowchart illustrating a method of garment modeling after obtaining planar panels of a first garment model according to example embodiments of the present disclosure is schematically shown.
[0051] Figure 4 A schematic diagram illustrating planar panels without thickness exported from a three-dimensional garment making software according to example embodiments of the present disclosure is schematically shown.
[0052] Figure 5 A flowchart illustrating a method of re-wiring planar panels to obtain first planar panels, and obtaining target planar panels from the first planar panels and a UV map according to example embodiments of the present disclosure is schematically shown.
[0053] Figure 6 A schematic diagram illustrating a first planar panel according to example embodiments of the present disclosure is schematically shown.
[0054] Figure 7 A flowchart illustrating a method of obtaining target planar panels from the first planar panels and a UV map after obtaining first planar panels according to example embodiments of the present disclosure is schematically shown.
[0055] Figure 8 A schematic diagram illustrating a target planar panel according to example embodiments of the present disclosure is schematically shown.
[0056] Figure 9 A flowchart illustrating a method of obtaining a target garment model from the target planar panels and the first garment model according to example embodiments of the present disclosure is schematically shown.
[0057] Figure 10 A flowchart illustrating a method of performing seam vertex welding on a second garment model to obtain a target garment model according to example embodiments of the present disclosure is schematically shown.
[0058] Figure 11A flow chart of a method of performing seam vertex welding on a second garment model to obtain a target garment model is shown schematically in accordance with an example embodiment of the present application.
[0059] Figure 12 A schematic diagram of a target garment model is shown schematically in accordance with an example embodiment of the present disclosure.
[0060] Figure 13 A flow chart of a garment model making method is shown schematically in accordance with an example embodiment of the present disclosure.
[0061] Figure 14 A block diagram of a garment model making apparatus is shown schematically in accordance with an example embodiment of the present application.
[0062] Figure 15 An electronic device for implementing the garment model making method described above is shown schematically in accordance with an example embodiment of the present application. DETAILED DESCRIPTION
[0063] Example implementations will now be described more fully with reference to the accompanying drawings. Example implementations can be implemented in any
[0064] In addition, the drawings are only schematic and the dimensions of the various layers are not necessarily to scale with respect to one another. Like reference numerals designate corresponding parts throughout the drawings. Like reference numerals designate corresponding parts throughout the drawings. Individual features of the drawings can not be drawn to scale. In the drawings, like reference numerals refer to like parts throughout the various views. Some of the blocks in the drawings represent functional entities that can be implemented in software, or in one or more hardware modules or integrated circuits, or in different network and / or processor devices and / or microcontroller devices.
[0065] The example embodiment first provides a garment model making method, which can run on a device terminal, which can include a desktop computer, a portable computer, a smart phone, a tablet computer and the like. Of course, those skilled in the art can also run the method of the present application on other platforms according to needs, which is not specially limited in the example embodiment.
[0066] Reference Figure 1 As shown in the figure, the garment model making method can include the following steps:
[0067] Step S110. Obtain a first garment model, tile the first garment model to obtain a UV map of the first garment model;
[0068] Step S120. Convert the first garment model to obtain a planar patch of the first garment model, rewire the planar patch to obtain a first planar patch, and obtain a target planar patch through the first planar patch and the UV map;
[0069] Step S130. Obtain a target garment model through the target planar patch and the first garment model.
[0070] The garment model making method described above obtains a first garment model, tiles the first garment model to obtain a UV map of the first garment model, converts the first garment model to obtain a planar patch of the first garment model, rewires the planar patch to obtain a first planar patch, obtains a target planar patch through the first planar patch and the UV map, and obtains a target garment model through the target planar patch and the first garment model. On the one hand, the first garment model is obtained, the planar patch of the first garment model is rewired to obtain a first planar patch, the target planar patch is obtained through the first planar patch and the UV map of the first garment model, and the target garment model is obtained through the first garment model and the target planar patch, which solves the problem of complicated operation caused by low-mode topology of a made garment model in the related art, simplifies the garment model making process, and saves model making time. On the other hand, after obtaining the planar patch of the first garment model, only the planar patch needs to be rewired to obtain a first planar patch, and the target planar patch is obtained through the first planar patch, which improves the generation efficiency of the target garment model.
[0071] Next, each step involved in the garment model making method of the example embodiment of the present disclosure is explained and described in detail.
[0072] In step S110, a first garment model is obtained, and the first garment model is tiled to obtain a UV map of the first garment model.
[0073] The first garment model is a garment model made in a three-dimensional garment making software. The garment model can be a high-fidelity garment model or a non-high-fidelity garment model. The non-high-fidelity garment model can be a medium-fidelity garment model or a low-fidelity garment model, which is not limited in the embodiment.
[0074] In the embodiment, after the first garment model is obtained, the UV mapping of the first garment model can be performed by using the three-dimensional garment making software. In order to make the UV texture of the model be distributed on the canvas reasonably, the faces in the first garment model can be reasonably tiled on the two-dimensional canvas. The process is the UV tiling of the first garment model. The UV mapping can be generated by UV unfolding. The UV mapping is a planar representation of the surface of the three-dimensional first garment model. Each point in the UV mapping can be accurately mapped to the surface of the first garment model. Figure 2 The UV mapping of the first garment model obtained by performing the UV tiling on the first garment model is shown.
[0075] In step S120, the first garment model is converted to obtain the planar patches of the first garment model. The planar patches are rewired to obtain the first planar patches. The target planar patches are obtained by using the first planar patches and the UV mapping.
[0076] In the embodiment, after the first garment model is obtained, the first garment model is converted to obtain the planar patches of the first garment model, including:
[0077] In the three-dimensional garment making software, the first garment model is converted to obtain the planar patches of the first garment model.
[0078] Specifically, since the garment model is composed of a plurality of planar patches, after the first garment model is obtained, the first garment model can be converted in the three-dimensional garment making software to obtain the planar patches of the first garment model. The three-dimensional garment making software can be Marvelous Designer or Maya, which is not limited in the embodiment.
[0079] Further, as shown in Figure 3 After the planar patches of the first garment model are obtained, the garment model making method can further include steps S310 and S320:
[0080] In step S310, the planar patches of the first garment model are exported from the three-dimensional garment making software.
[0081] Step S320. When exporting the planar patches of the first garment model, no merging is performed on the planar patches, and no thickness is set for the planar patches.
[0082] In the following, step S310 and step S320 will be further explained and illustrated. Specifically, after the planar patches of the first garment model are converted in the three-dimensional garment making software, the planar patches of the first garment model can be exported from the three-dimensional garment making software. When exporting the planar patches of the first garment model, no merging is performed on the planar patches, and no thickness is set for the planar patches. After the planar patches are exported, the planar patches only need to be imported into the next-generation three-dimensional modeling software, and the planar patches are rewired by the next-generation three-dimensional modeling software, thereby saving computing resources. Figure 4 The planar patches exported from the three-dimensional garment making software are shown.
[0083] When the planar patches are obtained, the planar patches are rewired to obtain first planar patches, and the target planar patches are obtained by the first planar patches and UV maps, which can include steps S510-S530: Figure 5
[0084] Step S510. The planar patches of the first garment model are imported into the next-generation three-dimensional modeling software, and the number of topological surfaces of the planar patches is determined.
[0085] Step S520. The planar patches are rewired by the next-generation three-dimensional modeling software through the number of topological surfaces to obtain the first planar patches.
[0086] Step S530. The target planar patches are obtained by the first planar patches and the UV maps.
[0087] The following will further explain and illustrate steps S510-S530. Specifically, firstly, the planar panels of the first garment model exported from the 3D garment creation software are imported into the next-generation 3D modeling software. After importing the planar panels into the next-generation 3D modeling software, the number of topological faces of the planar panels is determined according to the requirements of the target garment model. Once the number of topological faces is determined, the planar panels can be rewired using the next-generation 3D modeling software based on the number of topological faces to obtain the first planar panel. Finally, based on the first planar panel obtained by rewired routing, the target planar panel is obtained using the UV mapping of the first planar panel and the first garment model. Specifically, when the first garment model is a high-poly garment model, the number of topological faces of the planar panels can be reduced based on the number of topological faces of the planar panels imported into the next-generation 3D modeling software; when the first garment model is a non-high-poly garment model, the number of topological faces of the planar panels can be increased based on the number of topological faces of the planar panels imported into the next-generation 3D modeling software. Figure 6 The diagram shows the first planar board obtained by rewiring the planar board.
[0088] Further reference Figure 7 As shown, after obtaining the first planar plate, the target planar plate is obtained through the first planar plate and the UV mapping, which may include steps S710-S740:
[0089] Step S710. Determine whether the first planar plate contains UV rays;
[0090] Step S720. When the first planar plate contains UV, the first planar plate is used as the target planar plate;
[0091] Step S730. When the first planar plate does not contain UVs, export the UV map from the 3D clothing manufacturing software and import the UV map into the next-generation 3D modeling software;
[0092] Step S740. Use spatial location to transfer the attributes of the UV map to obtain the target planar plate.
[0093] The following will be further explained and described the step S710-step S740. Specifically, when the first plane sheet is obtained, it can be judged whether the first plane sheet has UV, when the first plane sheet has UV, the first plane sheet can be determined as the target plane sheet; but when the first plane sheet after rewiring without UV, the UV map of the first garment model can be exported in the three-dimensional garment making software, and the exported UV map is imported into the next-generation three-dimensional modeling software, in the next-generation three-dimensional modeling software, the spatial position of the first garment model and the first plane sheet is used to perform attribute transmission on the UV map, that is, the imported UV map and the first plane sheet are overlapped to obtain the target plane sheet. Figure 8 The generated target plane sheet is shown.
[0094] In the present example embodiment, after the plane sheet is imported into the next-generation three-dimensional modeling software, the rewiring of the plane sheet is automatically realized by the next-generation three-dimensional modeling software to obtain the first plane sheet, which avoids the problem that in the related art, when the garment model in the three-dimensional garment making software is imported into the next-generation three-dimensional modeling software for wiring, the subsequent high-fashion garment model surface is not smooth and cannot be further produced due to unreasonable wiring; after the first plane sheet is obtained, the UV map of the first garment model is transmitted by the spatial position of the first garment model and the first plane sheet to obtain the target plane sheet, which improves the generation efficiency of the target sheet.
[0095] In step S130, the target garment model is obtained by the target plane sheet and the first garment model.
[0096] In the present example embodiment, after the target plane sheet is obtained, the target garment model is obtained by the target plane sheet and the first garment model, which can include steps S910-S930 as shown in Figure 9
[0097] Step S910. The first garment model and the target plane sheet are imported into the three-dimensional software;
[0098] Step S920. The spatial position of the first garment model and the target plane sheet is transmitted by the attribute of UV overlap to obtain the second garment model;
[0099] Step S930. The second garment model is welded by seam vertex to obtain the target garment model.
[0100] The following will be further explained and described the step S910-step S930. Specifically, when the target plane sheet is obtained, the target plane sheet is exported from the next generation three-dimensional modeling software, and the first garment model is exported from the three-dimensional garment making software; then, the exported target plane sheet and the exported first garment model are imported into the three-dimensional software again, and the first garment model and the target plane sheet are transmitted in space position by using the attribute of UV overlap, to obtain the second garment model, which is a low-mode garment model with rewiring; finally, since the second garment model is spliced from the target plane sheet, the second garment model can be welded at the seam vertex of the target plane sheet to obtain the target garment model. The three-dimensional software can be 3dmax or Maya, and the three-dimensional software is not limited in the example embodiment.
[0101] Further, referring to Figure 10 The second garment model is welded at the seam vertex to obtain the target garment model, which can include steps S1010 and S1020:
[0102] Step S1010. When the first garment model is a non-high-mode garment model, the second garment model is welded at the seam vertex, and the wiring in the second garment model is adjusted;
[0103] Step S1020. The second garment model with adjusted wiring is imported into the next generation three-dimensional modeling software, the second garment model with adjusted wiring is added with thickness and edge, and high-mode detail sculpture is performed to obtain the target garment model.
[0104] The following will be further explained and described the step S1010, step S1020. Specifically, when the first garment model is a non-high-mode garment model, the second garment model with rewiring is welded at the seam vertex, and the wiring of the second garment model welded at the seam vertex is arranged, and after the wiring is arranged, the second garment model with arranged wiring is imported into the next generation three-dimensional modeling software, the second garment model with arranged wiring is added with edge and thickness in the next generation three-dimensional modeling software, the level of the second garment model is determined, high-mode detail sculpture is performed on the second garment model according to the level of the second garment model, and the target garment model is obtained.
[0105] Referring to Figure 11 The second garment model is welded at the seam vertex to obtain the target garment model, which can include steps S1110 and S1120:
[0106] Step S1110. When the first garment model is a high garment model, performing seam vertex welding on the second garment model, and adjusting the cloth line in the second garment model;
[0107] Step S1120. Performing model wrapping matching on the second garment model with adjusted cloth line and the first garment model through the projection function or the model wrapping function of the next-generation three-dimensional modeling software to obtain the target garment model.
[0108] In the following, step S11110 and step S1120 will be further explained and described. Specifically, when the first garment model is a high garment model, the seam vertices of the target planar sheet constituting the second garment model are welded, and the cloth line of the second garment model after seam vertex welding is arranged. After the cloth line is arranged, the second garment model with arranged cloth line is imported into the next-generation three-dimensional modeling software, and model wrapping matching is performed on the second garment model with arranged cloth line and the first garment model through the projection function or the model wrapping function of the next-generation three-dimensional modeling software to obtain the target garment model. Figure 12 The generated target garment model is shown.
[0109] The garment model making method provided by the example embodiments of the present disclosure has at least the following advantages. On the one hand, a first garment model is obtained, the planar sheet of the first garment model is re-wired to obtain a first planar sheet, and a target planar sheet is obtained through the first planar sheet and the UV map of the first garment model. The target garment model is obtained through the first garment model and the target planar sheet, which solves the problem in the related art that the operation is complicated due to low-mode topology on the made garment model, simplifies the garment model making process, and saves model making time. On the other hand, after the planar sheet of the first garment model is obtained, only the planar sheet needs to be re-wired to obtain a first planar sheet, and a target planar sheet is obtained through the first planar sheet, which improves the generation efficiency of the target garment model.
[0110] In the following, the garment model making method provided by the example embodiments of the present disclosure will be further explained and described. Figure 13 The garment model making method provided by the example embodiments of the present disclosure will be further explained and described. Specifically, the garment model making method can include the following steps:
[0111] Step S1310. A first garment model made in a three-dimensional garment making software is obtained, and the first garment model is UV unfolded to obtain a UV map;
[0112] Step S1312. The first garment model is converted in the three-dimensional garment making software to obtain a planar sheet;
[0113] Step S1314. The planar panel is exported from the three-dimensional garment making software, and the exported planar panel is imported into the next-generation three-dimensional modeling software to determine the number of topological surfaces of the planar panel.
[0114] Step S1316. In the next-generation three-dimensional modeling software, the planar panel is rewired through the number of topological surfaces of the planar panel to obtain a first planar panel.
[0115] Step S1318. When it is determined that the first planar panel does not have UV, the UV map of the first garment model is imported into the next-generation three-dimensional modeling software, and attribute transfer is performed on the UV map by using the spatial position to obtain a target planar panel.
[0116] Step S1320. The first garment model and the target planar panel are imported into the three-dimensional software, and spatial position transfer is performed on the first garment model and the target panel by using the attribute of UV overlap to obtain a second garment model.
[0117] Step S1322. The fixed-point seams of the second garment model are welded, the wiring is arranged, and the second garment model with the arranged wiring is imported into the next-generation three-dimensional modeling software.
[0118] Step S1324. It is determined whether the first garment model is a high-mesh garment model.
[0119] Step S1326. When the first garment model is a high-mesh garment model, the second garment model with the arranged wiring is matched with the first garment model by using the projection function or the model wrapping function of the next-generation three-dimensional modeling software to obtain a target garment model.
[0120] Step S1328. When the first garment model is a non-high-mesh garment model, the second garment model is increased in thickness and hemmed by using the next-generation three-dimensional modeling software, and high-mesh detail sculpture is performed to obtain a target garment model.
[0121] The example embodiments of the present disclosure also provide a garment model making device, as shown in Figure 14 which can include a UV map acquisition module 1410, a model conversion module 1420, and a target model generation module 1430. Among them:
[0122] The UV map acquisition module 1410 is configured to acquire a first garment model, tile the first garment model, and obtain a UV map of the first garment model.
[0123] The model conversion module 1420 is configured to convert the first garment model to obtain a planar panel of the first garment model, and rewire the planar panel to obtain a target planar panel.
[0124] The target model generation module 1430 is configured to obtain the target garment model by the target planar sheet and the first garment model.
[0125] The specific details of the modules in the garment model making device have been described in detail in the corresponding garment model making method, and thus will not be described here again.
[0126] In an exemplary embodiment of the present disclosure, the first garment model is a non-high-fitting garment model or a high-fitting garment model.
[0127] In an exemplary embodiment of the present disclosure, the conversion of the first garment model to obtain the planar sheet of the first garment model comprises:
[0128] In the three-dimensional garment making software, the first garment model is converted to obtain the planar sheet of the first garment model.
[0129] In an exemplary embodiment of the present disclosure, after obtaining the planar sheet of the first garment model, the garment model making method further comprises:
[0130] The planar sheet of the first garment model is exported from the three-dimensional garment making software;
[0131] When the planar sheet of the first garment model is exported, the planar sheet is not merged, and the thickness of the planar sheet is not set.
[0132] In an exemplary embodiment of the present disclosure, the rewiring of the planar sheet to obtain the first planar sheet, and the obtaining of the target planar sheet by the first planar sheet and the UV map comprises:
[0133] The planar sheet of the first garment model is imported into the next-generation three-dimensional modeling software, and the number of topological surfaces of the planar sheet is determined;
[0134] The number of topological surfaces is used to rewire the planar sheet by the next-generation three-dimensional modeling software to obtain the first planar sheet;
[0135] The target planar sheet is obtained by the first planar sheet and the UV map.
[0136] In an exemplary embodiment of the present disclosure, the target planar sheet is obtained by the first planar sheet and the UV map, comprising:
[0137] It is judged whether the first planar sheet has UV or not;
[0138] when the first flat panel piece has UV, taking the first flat panel piece as the target flat panel piece;
[0139] when the first flat panel piece does not have UV, exporting the UV map from the three-dimensional clothing making software and importing the UV map into the next-generation three-dimensional modeling software;
[0140] performing attribute transfer on the UV map by using spatial positions to obtain the target flat panel piece.
[0141] In an exemplary embodiment of the present disclosure, the target clothing model is obtained by the target flat panel piece and the first clothing model, comprising:
[0142] importing the first clothing model and the target flat panel piece into three-dimensional software;
[0143] performing spatial position transfer on the first clothing model and the target flat panel piece by using the attribute of UV overlap to obtain a second clothing model;
[0144] performing seam vertex welding on the second clothing model to obtain the target clothing model.
[0145] In an exemplary embodiment of the present disclosure, the target clothing model is obtained by performing seam vertex welding on the second clothing model, comprising:
[0146] when the first clothing model is a non-high-mode clothing model, performing seam vertex welding on the second clothing model and adjusting the cloth line in the second clothing model;
[0147] importing the second clothing model with adjusted cloth line into next-generation three-dimensional modeling software, adding thickness and hem to the second clothing model with adjusted cloth line, and performing high-mode detail sculpture to obtain the target clothing model.
[0148] In an exemplary embodiment of the present disclosure, the target clothing model is obtained by performing seam vertex welding on the second clothing model, comprising:
[0149] when the first clothing model is a high-mode clothing model, performing seam vertex welding on the second clothing model and adjusting the cloth line in the second clothing model;
[0150] performing model wrapping matching on the second clothing model with adjusted cloth line and the first clothing model by using the projection function or the model wrapping function of the next-generation three-dimensional modeling software to obtain the target clothing model.
[0151] It should be noted that although several modules or units of the devices for action execution are mentioned in the above detailed description, such division is not mandatory. Indeed, features and functionalities of two or more modules or units described above can be embodied in one module or unit according to embodiments of the present application. Conversely, features and functionalities of one module or unit described above can be further divided into several modules or units.
[0152] Furthermore, although the various steps of the methods in the present application are described in a particular order in the figures, this is not required or implied as to the order of the steps or the necessity of performing all of the steps to achieve the desired result. Additionally or alternatively, certain steps can be omitted, multiple steps can be combined into one step, one step can be broken into multiple steps, etc.
[0153] In exemplary embodiments of the present application, an electronic device capable of implementing the above method is also provided.
[0154] Those skilled in the art can understand that various aspects of the present application can be implemented as a system, a method or a program product. Therefore, various aspects of the present application can be embodied as a whole hardware embodiment, a whole software embodiment (including firmware, microcode, etc.), or an embodiment combining hardware and software aspects, which can be collectively referred to as "circuitry", "module" or "system" herein.
[0155] The electronic device 1500 according to this embodiment of the present application will be described below with reference to Figure 15 Figure 15 The electronic device 1500 shown is merely an example and should not impose any limitation on the function and scope of use of embodiments of the present application.
[0156] As Figure 15 shown, the electronic device 1500 is in the form of a general computing device. The components of the electronic device 1500 can include, but are not limited to, the at least one processing unit 1510 described above, the at least one storage unit 1520 described above, a bus 1530 connecting different system components (including the storage unit 1520 and the processing unit 1510), and a display unit 1540.
[0157] The storage unit stores program code that can be executed by the processing unit 1510, so that the processing unit 1510 performs the steps according to various exemplary embodiments of the present application described in the "Exemplary Method" section of the present specification. For example, the processing unit 1510 can perform the steps described in the "Exemplary Method" section of the present specification, such as Figure 1 The step S110 shown in the middle: obtaining a first garment model, tiling the first garment model to obtain a UV map of the first garment model; S120: converting the first garment model to obtain a planar patch of the first garment model, rewiring the planar patch to obtain a first planar patch, and obtaining a target planar patch through the first planar patch and the UV map; S130: obtaining the target garment model through the target planar patch and the first garment model.
[0158] The storage unit 1520 can include a readable medium in the form of volatile storage such as random access memory (RAM) 15201 and / or cache memory 15202, and also can include a non-volatile storage such as read-only memory (ROM) 15203.
[0159] The storage unit 1520 also can include a program / utility 15204 having a set (at least one) of program modules 15205 such as an operating system, one or more application programs, other program modules, and program data, each of which gives the electronic device 1500 some of its functionality, either alone or in combination with
[0160] The bus 1530 can represent one or more of several types of bus structures, including a storage bus or bus controller, a peripheral bus, a graphics acceleration port, a processor or local bus using any of a variety of bus structures, and the like.
[0161] The electronic device 1500 also can communicate with one or more external devices 1600 such as a keyboard or pointing device, a Bluetooth device, etc., one or more devices that enable a user to interact with the electronic device 1500, and / or one or more devices that enable the electronic device 1500 to communicate with one or more other computing devices. Such communication can occur via an input / output (I / O) interface 1550. Still yet, the electronic device 1500 can communicate with one or more networks such as a local area network (LAN), a general wide area network (WAN), and / or a public network such as the Internet, via a network adapter 1560. As depicted, the network adapter 1560 can communicate with the other components of the electronic device 1500 via the bus 1530. It should be understood that, although not shown explicitly, other hardware and / or software components could also be used, such as a microcode, a device driver, a redundant processing unit, an external disk drive array, a RAID system, a tape drive, and data archival storage system, etc.
[0162] Those skilled in the art can clearly understand that the example embodiments described in the specification can be implemented by software, or by software in combination with necessary hardware. Therefore, the technical solutions according to the embodiments of the present application can be embodied in the form of a software product. The software product can be stored in a non-volatile storage medium (which can be a CD-ROM, a USB, a mobile hard disk, or the like) or a network, and includes a number of instructions to enable a computing device (which can be a personal computer, a server, a terminal device, or a network device, etc.) to perform the methods according to the embodiments of the present application.
[0163] In the example embodiments of the present application, a computer readable storage medium is also provided, which stores a program product capable of implementing the above-mentioned method of the specification. In some possible embodiments, various aspects of the present application can also be implemented in the form of a program product, which includes program codes for causing a terminal device to perform the steps according to various example embodiments of the present application described in the above-mentioned “example method” section of the specification when the program product is run on the terminal device.
[0164] The program product for implementing the above-mentioned method according to the embodiments of the present application can adopt a portable compact disc read-only memory (CD-ROM) and include program codes, and can be run on a terminal device, such as a personal computer. However, the program product of the present application is not limited to this, and in this document, the readable storage medium can be any tangible medium containing or storing a program, which can be used by or in combination with an instruction execution system, device, or apparatus.
[0165] The program product can adopt any combination of one or more readable media. The readable medium can be a readable signal medium or a readable storage medium. The readable storage medium may, for example, be but is not limited to an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device, or apparatus, or any combination of the above. More specific examples (non-exhaustive list) of the readable storage medium include an electrical connection having one or more wires, a portable disc, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the above.
[0166] A computer readable signal medium can include a propagated data signal with computer readable program code embodied therein, for example, in baseband or as part of a carrier wave. Such a propagated signal can take any of a variety of forms, including, but not limited to, electro-magnetic, optical, or any suitable combination thereof. A computer readable signal medium can be any computer readable medium that can be
[0167] Program code embodied on a computer readable medium can be transmitted using any appropriate medium, including but not limited to wireless, wireline, optical fiber cable, RF, etc., or any suitable combination of the foregoing.
[0168] Computer program code for carrying out operations for aspects of the present application can be written in any combination of one or more programming languages, including an object oriented programming language such as Java, C++ or the like, and conventional procedural programming languages, such as the "C" programming language or similar programming languages. The program code can execute entirely on the user's computing device, partly on the user's computing device, as a stand-alone software package, partly on the user's computing device and partly on a remote computing device or entirely on the remote computing device or server. In the latter scenario, the remote computing device can be connected to the user's computing device through any type of network, including a local area network (LAN) or a wide area network (WAN), or the connection can be made to an external computing device, such as through the Internet using an Internet Service Provider. The application program code can be downloaded to the user's computing device from an external computing device or server through any type of network, including a local area network, a wide area network, or the Internet using a browser or other applet -executing software. Alternatively, the program code can be downloaded to the user's computing device from the computing device or server using any other mechanism deemed suitable by those of ordinary skill in the art, including a device having a set top box, such as a set top box coupled to a television in a hotel room, an Internet enabled cellular telephone, etc.
[0169] Moreover, the above-described figures are merely illustrative for the processes included in the method according to the exemplary embodiments of the present application, and are not intended to limit the present application. It is readily understood that the processes shown in the above-described figures do not indicate or limit the time sequence of the processes. In addition, it is readily understood that the processes can be executed synchronously or asynchronously, for example, in a plurality of modules.
[0170] Other embodiments of the application will be apparent to those skilled in the art from consideration of the specification and practice of the application disclosed herein. It is intended that the specification and examples be considered as exemplary only, with the true scope and spirit of the application being indicated by the following claims.
Claims
1. A method of making a garment pattern, characterized by, The method comprises the following steps: obtaining a first garment model, tiling the first garment model to obtain a UV map of the first garment model; wherein the first garment model is a non-high-form garment model or a high-form garment model; converting the first garment model to obtain a planar sheet of the first garment model, rewiring the planar sheet to obtain a first planar sheet, and determining whether the first planar sheet contains UV; when the first planar sheet contains UV, taking the first planar sheet as a target planar sheet; when the first planar sheet does not contain UV, exporting the UV map from a three-dimensional garment making software and importing the UV map into a next-generation three-dimensional modeling software; and performing attribute transfer on the UV map by using spatial positions to obtain a target planar sheet; importing the first garment model and the target planar sheet into a three-dimensional software; and performing spatial position transfer on the first garment model and the target planar sheet by using the attribute of UV overlap to obtain a second garment model; when the first garment model is a non-high-form garment model, performing joint vertex welding on the second garment model, adjusting the wiring in the second garment model, importing the second garment model with adjusted wiring into a next-generation three-dimensional modeling software, adding thickness and edge allowance to the second garment model with adjusted wiring, and performing high-form detail sculpture to obtain a target garment model; when the first garment model is a high-form garment model, performing joint vertex welding on the second garment model and adjusting the wiring in the second garment model; and performing model wrapping matching on the second garment model with adjusted wiring and the first garment model by using a projection function or a model wrapping function of the next-generation three-dimensional modeling software to obtain a target garment model.
2. The method of creating a garment pattern according to claim 1, wherein, The method further comprises the following steps after obtaining the planar sheet of the first garment model: exporting the planar sheet of the first garment model from the three-dimensional garment making software; 3. The method of creating a garment pattern according to claim 2, wherein, when exporting the planar sheet of the first garment model, not merging the planar sheet and not setting the thickness of the planar sheet. The method further comprises the following steps after obtaining the planar sheet of the first garment model: importing the planar sheet of the first garment model into a next-generation three-dimensional modeling software and determining the number of topological surfaces of the planar sheet; 4. The method of creating a garment pattern according to claim 1, wherein, rewiring the planar sheet by using the next-generation three-dimensional modeling software and the number of topological surfaces to obtain a first planar sheet. The method comprises the following steps: a UV map obtaining module is configured to obtain a first garment model, tile the first garment model to obtain a UV map of the first garment model; wherein the first garment model is a non-high-form garment model or a high-form garment model; 5. A garment model making device, characterized by, The model conversion module is configured to convert the first garment model to obtain a planar sheet of the first garment model, rewire the planar sheet to obtain a first planar sheet, and determine whether the first planar sheet has a UV; when the first planar sheet has the UV, the first planar sheet is taken as a target planar sheet; when the first planar sheet does not have the UV, the UV map is exported from the three-dimensional garment making software and imported into the next-generation three-dimensional modeling software; and the UV map is subjected to attribute transfer by using spatial positions to obtain a target planar sheet. The target model generation module is configured to import the first garment model and the target planar sheet into the three-dimensional software, and perform spatial position transfer on the first garment model and the target planar sheet by using the attribute of UV overlap to obtain a second garment model. When the first garment model is a non-high-mode garment model, the second garment model is subjected to seam vertex welding, and the wiring in the second garment model is adjusted; the second garment model with the adjusted wiring is imported into the next-generation three-dimensional modeling software, the second garment model with the adjusted wiring is added with thickness and hem, and high-mode detail sculpture is performed to obtain a target garment model. When the first garment model is a high-mode garment model, the second garment model is subjected to seam vertex welding, and the wiring in the second garment model is adjusted; the second garment model with the adjusted wiring and the first garment model are subjected to model wrapping matching by using a projection function or a model wrapping function of the next-generation three-dimensional modeling software to obtain a target garment model.
6. A computer storage medium having stored thereon a computer program, characterized in that The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4.
7. An electronic device, comprising: The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1-4. The computer program is executed by the processor to implement the garment model making method of any one of claims 1
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