A multi-layer waveguide grating antenna based on staggered etching for optical phased array and its preparation method
By adopting a multi-layer structure design with interleaved etching in the waveguide grating antenna, the problems of low emission efficiency and low direction in the prior art are solved, high directionality and long effective emission length are achieved, and the detection distance and emission efficiency of the optical phased array are improved.
Patent Information
- Application Number
- CN202210680007.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-06-16
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2042-06-16
AI Technical Summary
The existing waveguide grating antennas have low emission efficiency in optical phased arrays, resulting in limited detection distance and insufficient directionality, which affects the emission efficiency of the emission grating.
Using a multi-layer structure waveguide grating antenna based on interleaving etching, the depth and waveguide layer thickness are optimized by interleaving the depth and shallow trenches in the second waveguide layer, combining the multi-layer structure and asymmetric design to improve the directionality and effective emission length.
It achieves high directionality and centimeter-level effective emission length, improves the emission efficiency of the grating, extends the detection distance, and supports the implementation of high-power output devices.