A crystalline silicon cell regeneration furnace

Abstract

The present invention discloses a polysilicon cell regeneration furnace, which relates to the technical field of solar cell production equipment. The regeneration furnace includes a furnace body, a feed inlet and a discharge outlet arranged on both sides of the furnace body. A reaction chamber is opened in the furnace body, and a conveying track running across the reaction chamber is arranged in the reaction chamber. A conveying seat is arranged in the furnace body and is slidably connected to the conveying track. A hollow storage rack is arranged on the conveying seat; A conveying member is arranged in the furnace body for inputting the wafers from the feed inlet into the conveying seat or outputting the wafers from the conveying seat; The regeneration furnace positions and conveys the battery wafers through the hollow conveying seat. When the wafers enter the furnace body, they are located on the conveying seat. Several connection points on the conveying seat adsorb the corresponding points on one side of the battery wafers to fix and position them. When the wafers react in the regeneration furnace, their bottom surfaces are always in a relatively complete contact state, which can avoid poor passivation effect caused by the wafers adhering to the furnace belt, thereby improving the production quality of solar wafers.

Description

Technical Field

[0001] The present invention relates to the technical field of solar cell production equipment, and particularly to a crystalline silicon cell regeneration furnace. Background Art

[0002] The utilization of solar photoelectricity has been the fastest-growing and most dynamic research field in recent years and is one of the most prominent projects. For this reason, people have developed and manufactured solar cells.

[0003] Among silicon-based solar cells, monocrystalline silicon solar cells have the highest conversion efficiency and the most mature technology. High-performance monocrystalline silicon cells are based on high-quality monocrystalline silicon materials and related mature processing technologies. The battery process of monocrystalline silicon is nearly mature. In the production of batteries, technologies such as surface texturing, emitter passivation, and zone doping are generally adopted.

[0004] After the sintering of crystalline silicon cells is completed, it is necessary to passivate the defects in the battery body. The existing methods mainly reduce the efficiency attenuation of solar cells from aspects such as reducing the damage of the dielectric film, reducing metal impurities, and reducing initial attenuation B-O defect bodies.

[0005] Regarding the initial attenuation B-O defect body, it is mainly solved by the photoinduced regeneration technology. The hydrogen in the dielectric film is used to excite and passivate the B-O defect body or other impurities in the battery body. That is, the battery needs to pass through a light source regeneration furnace, and the photoinduced regeneration technology is used to passivate the defects and impurities in the battery body.

[0006] At present, Chinese Patent No. CN111146308A discloses a light source regeneration furnace and method for reducing the efficiency attenuation of PERC double-sided cells, including a furnace body, a furnace belt arranged in the furnace body, and a light source. The furnace body includes a first temperature zone, a second temperature zone, and a third temperature zone. The furnace belt passes through the first temperature zone, the second temperature zone, and the third temperature zone. The light source includes an upper light source and a lower light source. The upper light source is arranged above the furnace belt, and the lower light source is arranged below the furnace belt. The area above the furnace belt in the furnace body is the upper temperature zone, and the area below the furnace belt is the lower temperature zone. The light intensity in the lower temperature zone is less than that in the upper temperature zone.

[0007] This kind of regeneration furnace can effectively reduce the efficiency attenuation of PERC double-sided cells. However, when this kind of regeneration furnace transports battery wafers, it is transported through the furnace belt. One side of the wafer is placed in contact with the furnace belt. When reacting in the regeneration furnace, the passivation effect of the side of the wafer in contact with the furnace belt on defects is poor. Summary of the Invention

[0008] In view of the above technical problems, the present invention overcomes the shortcomings of the prior art and provides a crystalline silicon cell regeneration furnace.

[0009] To solve the above technical problems, the present invention provides a crystalline silicon cell regeneration furnace.

[0010] Technical effect: The battery wafers are positioned and conveyed by a hollow conveyor seat. When the wafers enter the furnace body, they are located on the conveyor seat. Several connection points on the conveyor seat adsorb the corresponding points on one side of the battery wafers to fix and position them. When the wafers react in the regeneration furnace, their bottom surfaces are always in a relatively complete contact state, which can avoid the poor passivation effect caused by the wafers adhering to the furnace belt, thereby improving the production quality of solar wafers.

[0011] A further limited technical solution of the present invention is: A crystalline silicon cell regeneration furnace includes a furnace body, a feed inlet and a discharge outlet provided on both sides of the furnace body. A reaction chamber is provided in the furnace body, and in the reaction chamber is provided

[0012] a conveying track, which runs across the reaction chamber and has two parallel ones, with both ends respectively connected to the feed inlet and the discharge outlet;

[0013] a conveyor seat, which is slidably connected to the conveying track. A hollow storage rack is provided on the conveyor seat for placing wafers, and several equally spaced suction cups are provided on the storage rack for adsorbing and fixing the wafers;

[0014] a transfer member, which is provided on both sides of the conveyor seat for inputting wafers from the feed inlet into the conveyor seat or outputting wafers from the conveyor seat;

[0015] a storage rack, which is located outside the furnace body near the discharge outlet. The storage rack is arranged corresponding to the conveyor seat for carrying the wafers output from the conveyor seat, and the height of the storage rack decreases as the number of wafers increases.

[0016] Further, the transfer member includes a transfer plate slidably connected to the side of the conveyor seat through a sliding member. Several suction cups arranged in an array are correspondingly provided on the transfer plate for adsorbing and sliding the wafers to a designated position. The sliding member includes a sliding block slidably connected to the side of the conveyor seat, and the end of the sliding block is fixed to the transfer plate.

[0017] For the above-mentioned crystalline silicon cell regeneration furnace, the sliding member includes a sliding frame fixed to the side of the conveyor seat. A sliding block is fixed to one side of the sliding block, and the sliding block is slidably connected to the sliding frame. The sliding member includes a sliding motor provided on the sliding frame. A movable lead screw is provided on the output shaft of the sliding motor, and the movable lead screw penetrates through the sliding block and is threadedly connected thereto.

[0018] For the above-mentioned crystalline silicon cell regeneration furnace, a conveying slot is provided at the bottom of the conveyor seat corresponding to the conveying track. The conveying track is embedded in the conveying slot. A conveying wheel is rotatably connected in the conveying slot, and the side of the conveying wheel abuts against the conveying track. A guide wheel is provided on the inner side of the conveying slot, and the guide wheel abuts against the side of the conveying track.

[0019] The aforementioned crystalline silicon battery regeneration furnace has a micro motor on the conveying seat, a driving gear on the output shaft of the micro motor, an intermediate shaft between the conveying wheels on both sides of the bottom of the conveying seat, a driven gear coaxially fixed on the intermediate shaft, and the driving gear and the driven gear mesh with each other.

[0020] The aforementioned crystalline silicon battery regeneration furnace, the storage rack includes a storage plate for placing wafers, and a wheel frame with rollers, a lifting member is provided between the storage plate and the wheel frame, the lifting member includes two sets of scissor-type lifting rods arranged parallel to each other, one end of the scissor-type lifting rod is slidably connected to the wheel frame, and the other end is hinged to the wheel frame and the storage plate respectively.

[0021] The aforementioned crystalline silicon battery regeneration furnace, the lifting part includes a servo motor arranged in the middle position of the wheel frame, a lifting screw is provided on the output shaft of the servo motor, a movable block slidingly connected to the wheel frame is provided at the bottom of the wheel frame, the movable block is fixed to the sliding end of the scissors-type lifting rod by a connecting rod, and the lifting screw penetrates the movable block and is threadedly connected to it.

[0022] The beneficial effects of the present invention are:

[0023] (1) In the present invention, after the wafer enters the regeneration furnace, the conveyor seat first stays at the feed port position, and the conveyor member on one side of the conveyor seat can move to the wafer position, drive the wafer to move, and convey the wafer to the conveyor seat. At this time, the conveyor seat moves along the conveying track to enter the regeneration furnace. Since the conveyor seat is hollow, the wafer is located in the regeneration furnace and can react well to both sides of the wafer, thereby avoiding poor passivation effect on one side of the wafer. After completion, the conveyor seat moves to the other side of the conveying track, and the conveyor member takes the wafer from the conveyor seat and places it on the storage rack. After the wafers are stacked on the storage rack, the stacking height is lowered by the corresponding height each time, so that the height of the conveyor member transmission can be the same;

[0024] (2) In the present invention, the sliding motor drives the movable lead screw to rotate, and the sliding block can be driven to slide under the action of the thread, thereby linking the sliding frame and the corresponding conveying plate to move. When the conveying plate moves to the corresponding position of the wafer, the wafer can be adsorbed by the suction cup, thereby improving the firmness of the wafer connection and preventing damage to the wafer;

[0025] (3) In the present invention, the micro motor at the bottom of the conveying seat can drive the driving gear to rotate, and the driven gear and the intermediate shaft to rotate. Since the conveying wheels are arranged on both sides of the intermediate shaft, the conveying wheels can be driven to rotate, so that the conveying seat moves on the conveying track, and the guide wheel is arranged to guide the conveying seat, so that the conveying seat is clamped on the conveying track to ensure the overall stability of the conveying seat;

[0026] (4) In the present invention, after the wafer is placed on the storage plate, the scissor-type lifting rod can be lowered accordingly. The scissor-type lifting rod mainly adjusts the support height through the control of the servo motor and the lifting screw, which can improve the accuracy of the support height adjustment;

[0027] (5) In the present invention, the battery wafers are positioned and conveyed through a hollow conveyor base. When the wafers enter the furnace body, they are located on the conveyor base. Several connection points on the conveyor base adsorb the corresponding points on one side of the battery wafers to fix and position them. When the wafers react in the regeneration furnace, their bottom surfaces are always in a relatively complete contact state, which can avoid poor passivation effect caused by the wafers sticking to the furnace belt, thereby improving the production quality of solar wafers. Description of the Drawings

[0028] Figure 1 It is a structural diagram of Embodiment 1;

[0029] Figure 2 It is a partial sectional view of Embodiment 1;

[0030] Figure 3 It is a schematic diagram of the conveyor and the conveyor base in Embodiment 1;

[0031] Figure 4 It is a structural diagram of the storage rack in Embodiment 1.

[0032] Wherein: 1, furnace body; 11, feed inlet; 12, discharge outlet; 13, reaction chamber; 14, conveying track; 2, conveyor base; 21, conveying card slot; 22, conveying wheel; 23, guiding wheel; 24, micro motor; 25, driving gear; 26, storage rack; 27, driven gear; 3, conveyor; 31, conveyor plate; 32, sliding block; 33, sliding frame; 34, sliding block; 35, sliding motor; 36, movable lead screw; 4, suction cup; 5, storage rack; 51, storage plate; 52, wheel rack; 6, lifting member; 61, scissor lift rod; 62, servo motor; 63, movable block; 64, lifting lead screw. Detailed Embodiments

[0033] A crystalline silicon battery regeneration furnace provided in this embodiment has a structure as Figures 1-4 shown, including a furnace body 1, a feed inlet 11 and a discharge outlet 12 provided on both sides of the furnace body 1. A reaction chamber 13 is opened in the furnace body 1. A conveying track 14 is provided in the reaction chamber 13, running across the reaction chamber 13, with two parallel ones, and both ends are respectively connected to the feed inlet 11 and the discharge outlet 12; a conveyor base 2, slidably connected to the conveying track 14. The conveyor base 2 is provided with a hollow storage rack 26 for placing wafers. The storage rack 26 is provided with several suction cups 4 arranged at equal distances for adsorbing and fixing the wafers;

[0034] The transfer member 3 is provided on both sides of the conveying base 2 and is used to input the wafers from the feeding port 11 into the conveying base 2 or output the wafers from the conveying base 2; the storage rack 5 is located outside the furnace body 1 near the discharging port 12. The storage rack 5 is arranged corresponding to the conveying base 2 and is used to carry the wafers output from the conveying base 2. Moreover, the height of the storage rack 5 decreases as the number of wafers increases.

[0035] As Figures 2-4 shown in the figure, the transfer member 3 includes a transfer plate 31 slidably connected to the side of the conveying base 2 through a sliding member. A number of suction cups 4 are correspondingly arranged on the transfer plate 31 in an array for adsorbing and sliding the wafers to a designated position. The sliding member includes a sliding block 32 slidably connected to the side of the conveying base 2, and the end of the sliding block 32 is fixed to the transfer plate 31.

[0036] As Figures 2-4 shown in the figure, the sliding member includes a sliding frame 33 fixed to the side of the conveying base 2. A sliding block 34 is fixed to one side of the sliding block 32, and the sliding block 34 is slidably connected to the sliding frame 33. The sliding member includes a sliding motor 35 arranged on the sliding frame 33. An active lead screw 36 is provided on the output shaft of the sliding motor 35, and the active lead screw 36 penetrates through the sliding block 34 and is threadedly connected thereto.

[0037] As Figures 2-4 shown in the figure, a conveying slot 21 is provided at the bottom of the conveying base 2 corresponding to the conveying track 14. The conveying track 14 is embedded in the conveying slot 21. A conveying wheel 22 is rotatably connected in the conveying slot 21, and the side of the conveying wheel 22 abuts against the conveying track 14. A guide wheel 23 is provided on the inner side of the conveying slot 21, and the guide wheel 23 abuts against the side of the conveying track 14. A micro motor 24 is provided on the conveying base 2. A driving gear 25 is provided on the output shaft of the micro motor 24. An intermediate shaft is provided between the conveying wheels 22 on both sides of the bottom of the conveying base 2, and a driven gear 27 is coaxially fixed on the intermediate shaft. The driving gear 25 and the driven gear 27 are meshed with each other.

[0038] As Figures 2-4 shown in the figure, the storage rack 5 includes a storage plate 51 for placing wafers and a wheel rack 52 with rollers. A lifting member 6 is provided between the storage plate 51 and the wheel rack 52. The lifting member 6 includes two groups of scissor-type lifting rods 61 arranged in parallel. One end of the scissor-type lifting rods 61 is slidably connected to the wheel rack 52, and the other ends are respectively hinged to the wheel rack 52 and the storage plate 51. The lifting member 6 includes a servo motor 62 arranged at the middle position of the wheel rack 52. A lifting lead screw 64 is provided on the output shaft of the servo motor 62. A movable block 63 slidably connected to the wheel rack 52 is provided at the bottom of the wheel rack 52. The movable block 63 is fixed to the sliding end of the scissor-type lifting rods 61 through a connecting rod. The lifting lead screw 64 penetrates through the movable block 63 and is threadedly connected thereto.

[0039] After the wafer enters the regeneration furnace, the conveying base 2 first stays at the position of the feeding port 11. The conveying member 3 on one side of the conveying base 2 can move to the position of the wafer, drive the wafer to move, and convey the wafer onto the conveying base 2. At this time, the conveying base 2 moves into the regeneration furnace along the conveying track 14. Since the conveying base 2 is hollowly arranged, the wafer located in the regeneration furnace can react well with both sides of the wafer, avoiding poor passivation effect on one side of the wafer. After completion, the conveying base 2 moves to the other side of the conveying track 14, and the conveying member 3 removes the wafer from the conveying base 2 and places it on the storage rack 5. After stacking wafers on the storage rack 5, each stacking descends by a corresponding height, which can make the height of the wafers conveyed by the conveying member 3 the same.

[0040] In the present invention, the battery wafer is positioned and conveyed by a hollowly arranged conveying base. When the wafer enters the furnace body 1, it is located on the conveying base. Several connection points on the conveying base adsorb the corresponding points on one side of the battery wafer to fix and position it. When the wafer reacts in the regeneration furnace, its bottom surface is always in a relatively complete contact state, which can avoid poor passivation effect caused by the wafer sticking to the furnace belt, thereby improving the production quality of solar wafers.

[0041] In addition to the above embodiments, the present invention may have other embodiments. Any technical solutions formed by equivalent substitution or equivalent transformation fall within the protection scope required by the present invention.

Claims

1. A crystalline silicon cell regeneration furnace, comprising a furnace body (1), a feed inlet (11) and a discharge outlet (12) provided on both sides of the furnace body (1), characterized in that: A reaction chamber (13) is provided inside the furnace body (1), and in the reaction chamber (13) there is a conveying track (14) which traverses the reaction chamber (13) and has two mutually parallel ones, with both ends respectively connected to the feed inlet (11) and the discharge outlet (12); a conveying seat (2) which is slidably connected to the conveying track (14). A hollow storage rack (26) is provided on the conveying seat (2) for placing wafers. A number of equally spaced suction cups (4) are provided on the storage rack (26) for adsorbing and fixing the wafers; a transfer member (3) which is provided on both sides of the conveying seat (2) for inputting wafers from the feed inlet (11) into the conveying seat (2) or outputting wafers from the conveying seat (2); a storage rack (5) which is located outside the furnace body (1) near the discharge outlet (12). The storage rack (5) is arranged corresponding to the conveying seat (2) for carrying the wafers output from the conveying seat (2), and the height of the storage rack (5) decreases as the number of wafers increases; At the bottom of the conveying seat (2), a conveying slot (21) is provided corresponding to the conveying track (14). The conveying track (14) is embedded in the conveying slot (21). A conveying wheel (22) is rotatably connected in the conveying slot (21), and the side of the conveying wheel (22) abuts against the conveying track (14). A guiding wheel (23) is provided on the inner side of the conveying slot (21), and the guiding wheel (23) abuts against the side of the conveying track (14); A micro motor (24) is provided on the conveying seat (2). A driving gear (25) is provided on the output shaft of the micro motor (24). An intermediate shaft is provided between the conveying wheels (22) on both sides at the bottom of the conveying seat (2), and a driven gear (27) is coaxially fixed on the intermediate shaft. The driving gear (25) meshes with the driven gear (27).

2. The regenerative furnace for crystalline silicon cells according to claim 1, wherein: The transfer member (3) includes a transfer plate (31) slidably connected to the side of the conveying seat (2) through a sliding member. A number of suction cups (4) arranged in an array are correspondingly provided on the transfer plate (31) for adsorbing and sliding the wafers to a specified position. The sliding member includes a sliding block (32) slidably connected to the side of the conveying seat (2), and the end of the sliding block (32) is fixed to the transfer plate (31).

3. The regenerative furnace for crystalline silicon cells according to claim 2, wherein: The sliding member includes a sliding frame (33) fixed to the side of the conveying seat (2). A sliding block (34) is fixed to one side of the sliding block (32), and the sliding block (34) is slidably connected to the sliding frame (33). The sliding member includes a sliding motor (35) provided on the sliding frame (33). A movable lead screw (36) is provided on the output shaft of the sliding motor (35), and the movable lead screw (36) penetrates through the sliding block (34) and is threadedly connected thereto.

4. A crystalline silicon cell regeneration furnace according to claim 1, characterized in that: The storage rack (5) includes a storage plate (51) for placing wafers and a wheel rack (52) with rollers. A lifting member (6) is provided between the storage plate (51) and the wheel rack (52). The lifting member (6) includes two groups of mutually parallel scissor-type lifting rods (61). One end of the scissor-type lifting rods (61) is slidably connected to the wheel rack (52), and the other ends are respectively hinged to the wheel rack (52) and the storage plate (51).

5. A regenerative furnace for crystalline silicon cells according to claim 4, characterized in that: The lifting member (6) includes a servo motor (62) provided at the middle position of the wheel frame (52). A lifting lead screw (64) is provided on the output shaft of the servo motor (62). A movable block (63) is provided at the bottom of the wheel frame (52) and is slidably connected to the wheel frame (52). The movable block (63) is fixed to the sliding end of the scissor lift rod (61) through a connecting rod. The lifting lead screw (64) penetrates through the movable block (63) and is threadedly connected thereto.

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