Adjusting structure for exposure apparatus and exposure apparatus

Abstract

The application discloses a kind of adjusting structure for exposure equipment and exposure equipment, wherein, adjusting structure for exposure equipment includes fixed plate, adjusting plate, first locking piece, fixed seat and second locking piece, fixed plate is suitable for being connected with the lithography pattern structure of exposure equipment;Adjusting plate is movably connected with fixed plate by plane adjusting piece, the relative position of fixed plate and adjusting plate is adjusted by plane adjusting piece, to adjust the flatness of lithography pattern structure;First locking piece is connected with fixed plate and adjusting plate respectively, whether the relative position of fixed plate and adjusting plate is fixed is controlled;Adjusting plate is rotatably connected with fixed seat by angle adjusting piece, the included angle between adjusting plate and fixed seat is adjusted by angle adjusting piece, to adjust the angle of lithography pattern structure;Second locking piece is connected with fixed seat and adjusting plate respectively, whether the relative position of fixed seat and adjusting plate is fixed is controlled.The adjusting structure of the application, device cost is low, debugging is simple, and debugging efficiency is high.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of exposure equipment, in particular to an adjusting structure for exposure equipment and exposure equipment. BACKGROUND

[0002] In the whole system of the exposure machine, the light path adjustment is a very important link, and its adjustment precision directly affects. In the light path adjustment process, it is usually necessary to adjust the DMD (Digital Micromirror Device) exposure system, so that it is confocal with the image plane of the projection objective, and at the same time, the angle and flatness of the DMD exposure system are adjusted, so that the angle between the projected image and the exposure motion direction reaches the design requirement, thereby improving the exposure quality. In the existing method for adjusting the angle and flatness of the DMD, a standard part such as an angle gauge slide is usually used to adjust the parameters of the DMD.

[0003] In the prior art, a single angle adjusting or flatness adjusting structure is used, and the structure is dispersed and difficult to debug. When a standard part such as an angle gauge slide is used for debugging, the cost of the standard part is relatively high, and the debugging efficiency is slow, and with the demand for close packing of the light head, the debugging difficulty is great. SUMMARY

[0004] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, one object of the present application is to provide an adjusting structure for exposure equipment, which can quickly adjust the flatness and angle value of a lithography pattern structure, has low cost, simple debugging and high debugging efficiency.

[0005] Another object of the present application is to provide an exposure equipment.

[0006] In order to achieve the above object, the adjusting structure for exposure equipment according to the first aspect of the present application comprises: a fixed plate adapted to be connected with a lithography pattern structure of the exposure equipment; an adjusting plate movably connected with the fixed plate through a flatness adjusting part, the flatness adjusting part adjusting the flatness of the lithography pattern structure by adjusting the relative position of the fixed plate and the adjusting plate; a first locking part connected with the fixed plate and the adjusting plate respectively, controlling whether the relative position of the fixed plate and the adjusting plate is fixed; a fixed seat, the adjusting plate being rotatably connected with the fixed seat through an angle adjusting part, the angle adjusting part adjusting the angle of the lithography pattern structure by adjusting the included angle between the adjusting plate and the fixed seat; and a second locking part connected with the fixed seat and the adjusting plate respectively, controlling whether the relative position of the fixed seat and the adjusting plate is fixed.

[0007] According to the adjusting structure for the exposure device provided in the embodiments of the present application, when the adjusting structure adjusts the angle and flatness of the photolithography pattern structure, the flatness of the fixing plate can be adjusted by adjusting the flatness adjusting member, thereby adjusting the flatness of the photolithography pattern structure, and the angle between the adjusting plate and the fixing base can be adjusted by adjusting the angle adjusting member, thereby adjusting the angle of the photolithography pattern structure, so that the flatness and angle adjusting functions of the photolithography pattern structure can be realized in a single component, the flatness and angle of the photolithography pattern structure can be quickly adjusted to the required index parameter value, and the adjusting efficiency can be improved. In addition, the adjusting structure for the exposure device provided in the present application is an integrated structure of flatness adjustment and angle adjustment, without the need to set a goniometer sliding table or other standard components, so that the machine table standard is reduced, the cost is low, the adjustment is convenient, the volume is small, and the space can be saved, which is beneficial to the close arrangement of the light heads.

[0008] In some embodiments of the present application, the fixing base is provided with an angle adjusting socket, a side of the adjusting plate facing the fixing base is provided with an angle adjusting plug, the angle adjusting plug is inserted into the angle adjusting socket, the angle adjusting member is a rotating shaft, the rotating shaft is fixedly connected with the angle adjusting plug and rotatably connected with the inner peripheral wall of the angle adjusting socket; wherein the inner peripheral wall of the angle adjusting socket limits the rotating stroke of the angle adjusting plug.

[0009] In some embodiments of the present application, the fixing plate, the adjusting plate and the fixing base are sequentially stacked, and the photolithography pattern structure is mounted on a side of the fixing plate facing away from the adjusting plate; the fixing base is provided with an arc-shaped hole, the adjusting plate is provided with a first through hole corresponding in position to the arc-shaped hole, the photolithography pattern structure is exposed from the arc-shaped hole, opposite sides of the first through hole are provided with arc-shaped blocks, outer peripheral surfaces of the arc-shaped blocks abut against inner peripheral walls of the arc-shaped hole, and central axes of the arc-shaped blocks coincide with a central axis of the arc-shaped hole; wherein the arc-shaped hole and the angle adjusting socket are arranged in a direction perpendicular to the central axis of the rotating shaft.

[0010] In some embodiments of the present application, the arc-shaped blocks are located on opposite sides of the first through hole in the extension direction of the central axis of the rotating shaft.

[0011] In some embodiments of the present application, the first locking member includes a plurality of first threaded members, the fixing base is provided with a plurality of circular threaded holes, the plurality of circular threaded holes are arranged in a circumferential direction of the arc-shaped hole, the adjusting plate is provided with a plurality of arc-shaped threaded holes, the plurality of arc-shaped threaded holes are arranged in a circumferential direction of the first through hole, and the plurality of first threaded members are threadedly connected with the plurality of circular threaded holes and the plurality of arc-shaped threaded holes in a one-to-one correspondence; wherein the central axis of each arc-shaped threaded hole coincides with the central axis of the arc-shaped block.

[0012] In some embodiments of the present application, the arc-shaped hole is open on a side facing away from the angle adjustment socket.

[0013] In some embodiments of the present application, the fixed seat is provided with an external interface on a side of the angle adjustment socket facing away from the arc-shaped hole, the external interface being adapted to be connected with an imaging illumination module of the exposure device.

[0014] In some embodiments of the present application, the planar adjustment member comprises: floating connectors connected with the adjustment plate and the fixed plate respectively, the fixed plate being floatable relative to the adjustment plate through the floating connectors; a plurality of second threaded members, the fixed plate being provided with second through holes corresponding to the first through holes, the plurality of second threaded members being located on opposite sides of the second through holes, the fixed plate being provided with a plurality of first adjustment threaded holes, the plurality of second threaded members being threadedly connected with the plurality of first adjustment threaded holes one by one, each second threaded member being abutted on a side of the adjustment plate facing the fixed plate; and a third threaded member, the third threaded member not being located on the same line with at least two second threaded members, the adjustment plate being provided with a second adjustment threaded hole, the third threaded member being threadedly connected with the second adjustment threaded hole and abutted on a side of the fixed plate facing the adjustment plate.

[0015] In some embodiments of the present application, the floating connectors comprise a plurality of first floating connectors A, each first floating connector A comprising a first positioning threaded member and a first elastic member, each first threaded member comprising a first threaded column and a first positioning ring table connected with each other, the fixed plate being provided with a plurality of first positioning threaded holes, the adjustment plate being provided with a plurality of first connecting threaded holes, the plurality of first threaded members being connected with the plurality of first positioning threaded holes and the plurality of first connecting threaded holes one by one respectively, the plurality of first positioning ring tables being located on a side of the fixed plate facing away from the adjustment plate, the first elastic member being located between the first positioning ring table and the fixed plate.

[0016] In some embodiments of the present application, the first positioning threaded hole comprises a first section and a second section, the first section being located on a side of the second section facing the first positioning ring table, an inner diameter of the first section being larger than an inner diameter of the second section, the first threaded column being threadedly connected with the second section, and the first elastic member being inserted into the first section.

[0017] In some embodiments of the present application, the floating connector comprises a second floating connector, the second floating connector comprises a second positioning screw and a second elastic member, the second screw comprises a second screw column and a second positioning ring table connected to each other, the fixed plate is provided with a second connecting threaded hole, the adjusting plate is provided with a second positioning threaded hole, the second screw is connected with the second positioning threaded hole and the second connecting threaded hole respectively, the second positioning ring table is located on the side of the adjusting plate away from the fixed plate, and the second elastic member is located between the second positioning ring table and the adjusting plate.

[0018] In some embodiments of the present application, the second positioning threaded hole comprises a third section and a fourth section, the third section is located on the side of the fourth section facing the second positioning ring table, the inner diameter of the third section is larger than the inner diameter of the fourth section, the second screw column is threadedly connected with the fourth section, and the second elastic member is inserted into the third section.

[0019] In some embodiments of the present application, the side of the fixed plate facing the photolithography pattern structure is provided with a plurality of pressing blocks, and the plurality of pressing blocks are arranged at intervals along the circumference of the second through hole.

[0020] In some embodiments of the present application, the side of the fixed plate facing the photolithography pattern structure is provided with a plurality of fixed bosses, the plurality of fixed bosses are arranged at intervals along the circumference of the second through hole, at least two of the plurality of fixed bosses are provided with a positioning boss on the side facing the photolithography pattern structure, the photolithography pattern structure is provided with a plurality of fixing holes, the plurality of fixing holes are matched with the fixed bosses, and the inner circumferential wall of at least two of the plurality of fixing holes is provided with a positioning hole matched with the positioning boss.

[0021] In order to achieve the above-mentioned purpose, the second aspect of the present application provides an adjusting structure of an exposure device, comprising a photolithography pattern structure and the adjusting structure of the exposure device according to any one of claims 1-14.

[0022] According to the adjusting structure of the exposure device provided by the embodiments of the present application, when the adjusting structure of the exposure device of the above embodiments is used to adjust the angle and flatness of the photolithography pattern structure, by rotating the flatness adjusting member and the angle adjusting member, the flatness and angle adjusting functions of the photolithography pattern structure can be realized in a single component, the flatness and angle of the photolithography pattern structure can be quickly adjusted to the required index parameter value, the debugging efficiency can be improved, the standard parts such as the protractor slide can be cancelled, the machine standard can be reduced, compared with the existing adjusting device, the adjusting structure of the exposure device of the present application is an integrated structure of flatness adjustment and angle debugging, has small volume, is convenient to debug, can save space, and is conducive to the close arrangement of the light heads.

[0023] Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will become apparent to those skilled in the art upon examination of the following and / or can be learned by practice of the application. BRIEF DESCRIPTION OF DRAWINGS

[0024] The above and / or additional aspects and advantages of the present application will become apparent and be readily appreciated from the following description, including the appended drawings.

[0025] Figure 1 Schematic view of an adjusting structure for an exposure apparatus according to one embodiment of the present application;

[0026] Figure 2 Schematic view of a fixing seat according to one embodiment of the present application;

[0027] Figure 3 Schematic view of an adjusting plate according to one embodiment of the present application;

[0028] Figure 4 Schematic view of an adjusting plate according to another embodiment of the present application;

[0029] Figure 5 Schematic view of a fixing plate according to one embodiment of the present application;

[0030] Figure 6 Schematic view of a first floating connector according to one embodiment of the present application;

[0031] Figure 7 Schematic view of a DMD assembly according to one embodiment of the present application;

[0032] Figure 8 Block diagram of an adjusting structure for an exposure apparatus according to one embodiment of the present application.

[0033] REFERENCE NUMERALS:

[0034] Exposure apparatus 100;

[0035] Adjusting structure 10 for an exposure apparatus, lithographic pattern structure 20;

[0036] Fixing plate 1, adjusting plate 2, fixing seat 4, fixing member 201, fixing hole 202, recess 203;

[0037] First positioning threaded hole 11, second connecting threaded hole 12, second through hole 13, first adjusting threaded hole 14, pressing block 15, fixing boss 16, angle adjusting plug 21, first through hole 22, arc-shaped block 23, arc-shaped threaded hole 24, first connecting threaded hole 25, second positioning threaded hole 26, second adjusting threaded hole 27, angle adjusting socket 41, high-precision adjusting threaded hole 42, arc-shaped hole 43, circular threaded hole 44, external interface 45;

[0038] The first floating connector A, the first positioning screw A1, the first elastic member A2, the first threaded column P1, the first positioning ring table Q1, the first section p1, the second section q1, the third section m1, the fourth section n1, and the positioning boss x. DETAILED DESCRIPTION

[0039] The embodiments of the present application are described in detail below, and the embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present application are described in detail below.

[0040] The embodiments of the present application are described in detail below, and the embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present application are described in detail below. Figures 1-7 The adjusting structure for an exposure apparatus according to an embodiment of the present application is described.

[0041] In some embodiments of the present application, as Figure 1 shown in FIG. 1, which is a schematic diagram of an adjusting structure for an exposure apparatus according to an embodiment of the present application. The adjusting structure for an exposure apparatus 10 includes a fixed plate 1, an adjusting plate 2, a first locking member, a fixed seat 4, and a second locking member. Figure 1 The first locking member and the second locking member are not shown in FIG. 1.

[0042] The fixed plate 1 is adapted to be connected with a lithography pattern structure 20 of an exposure apparatus.

[0043] The lithography pattern structure 20 can be a structure for setting a lithography pattern on a mask by a conventional exposure apparatus, and can also be a DMD component for digitally generating a lithography pattern on a DMD by an exposure apparatus. The fixed plate 1 is used to fix the lithography pattern structure 20. Specifically, taking the lithography pattern structure 20 as the DMD component as an example, the lithography pattern structure 20 of the present application can further include a fixing member for fixing DMD components. The DMD components are first fixed on the fixing member, and then the fixing member is fixed with the fixed plate 1, so as to connect the lithography pattern structure 20 with the fixed plate 1.

[0044] The adjusting plate 2 is movably connected with the fixed plate 1 through a planar adjusting member. The planar adjusting member adjusts the relative positions of the fixed plate 1 and the adjusting plate 2, so as to adjust the planarity of the lithography pattern structure 20.

[0045] The plane adjusting member can be a screw or the like. According to the principle of defining a plane by three points, at least three position points are selected on the fixed plate 1 and the adjusting plate 2, respectively, to set the plane adjusting member. For example, two position points are symmetrically arranged on the two sides of the fixed plate 1 and the adjusting plate 2, and the third position point is arranged at one end of the fixed plate 1 and the adjusting plate 2 and is not in a straight line with the two position points. When adjusting the flatness of the lithography pattern structure 20, the plane adjusting members on the two sides of the fixed plate 1 and the adjusting plate 2 are adjusted to adjust the flatness tilt angle of the lithography pattern structure 20, that is, to adjust the flatness of the left and right sides of the lithography pattern structure 20. Then, the plane adjusting member at one end of the fixed plate 1 and the adjusting plate 2 is adjusted to adjust the flatness of the front and back sides of the lithography pattern structure 20. After the adjustment is completed, the plane adjusting members are adjusted to lock the adjusting plate 2 and the fixed plate 1, so as to fix the relative positions of the fixed plate 1 and the adjusting plate 2, thereby preventing the lithography pattern structure 20 from floating up and down after the flatness of the lithography pattern structure 20 is adjusted.

[0046] By movably connecting the adjusting plate 2 and the fixed plate 1 by the plane adjusting member, the flatness of the left and right ends and the front and back ends of the lithography pattern structure 20 can be adjusted, the flatness adjustment function of the lithography pattern structure 20 can be realized in a single assembly, and the flatness of the lithography pattern structure 20 can be quickly adjusted to the required index parameter value by a simple adjustment method, thereby improving the adjustment efficiency.

[0047] The first locking member is connected with the fixed plate 1 and the adjusting plate 2, respectively, to control whether the relative positions of the fixed plate 1 and the adjusting plate 2 are fixed. The first locking member can be a plurality of locking members, for example, a locking screw, which can be used to fix the fixed plate 3 and the adjusting plate 2. Specifically, after the relative positions of the fixed plate 1 and the adjusting plate 2 are adjusted by the plane adjusting member to adjust the flatness of the lithography pattern structure 20 to the target flatness, the positions of the lithography pattern structure 20, the fixed plate 1 and the adjusting plate 2 can be fixed by the first locking member, and the three are locked to prevent the lithography pattern structure 20 from floating up and down after being adjusted.

[0048] The adjusting plate 2 is rotatably connected with the fixed seat 4 by the angle adjusting member. The angle adjusting member adjusts the included angle between the adjusting plate 2 and the fixed seat 4 to adjust the angle of the lithography pattern structure 20.

[0049] Wherein, it can be understood that the angle between the adjusting plate 2 and the fixed seat 4 can be adjusted when the adjusting plate 2 is rotatably connected with the fixed seat 4, so that one end of the adjusting plate 2 can be rotatably connected with one end of the fixed seat 4, and the adjusting plate 2 can be rotated with the fixed position as the axis to adjust the angle between the adjusting plate 2 and the fixed seat 4. The angle adjusting piece, as a workpiece for adjusting the angle between the adjusting plate 2 and the fixed seat 4, can be used as a rotating shaft to achieve the purpose of adjusting the angle of the photolithography pattern structure 20 by adjusting the angle between the adjusting plate 2 and the fixed seat 4.

[0050] Based on the above, by rotatably connecting the adjusting plate 2 and the fixed seat 4 through the angle adjusting piece, and by using the principle of fixed-axis rotation, the planar inclination angle of the photolithography pattern structure 20 can be adjusted, and the angle adjustment function of the inclination angle of the photolithography pattern structure 20 can be realized in a single component. The planarity of the photolithography pattern structure 20 can be quickly adjusted to the required index parameter value by using a simple adjustment method, and the adjustment efficiency is improved.

[0051] The second locking piece is connected with the fixed seat 4 and the adjusting plate 2 respectively, and controls whether the relative position of the fixed seat 4 and the adjusting plate 2 is fixed. The second locking piece can be multiple, for example, a stop screw can be used to fix the fixed seat 4 and the adjusting plate 2. Specifically, after the angle between the adjusting plate 2 and the fixed seat 4 is adjusted by the angle adjusting piece to adjust the angle of the photolithography pattern structure 20 to the target angle, the positions of the fixed seat 4 and the adjusting plate 2 can be fixed by the second locking piece, and the two are locked to avoid the change of the angle of the photolithography pattern structure 20 after the angle is adjusted.

[0052] The adjusting structure 10 for the exposure device provided in the embodiment of the present application can adjust the planarity of the fixed plate 1 by adjusting the planar adjusting piece when the adjusting structure adjusts the angle and the planarity of the photolithography pattern structure 20, and then the planarity of the photolithography pattern structure 20 is adjusted. In addition, the angle between the adjusting plate 2 and the fixed seat 4 is adjusted by adjusting the angle adjusting piece, and then the angle of the photolithography pattern structure 20 is adjusted. The planarity and the angle adjustment function of the photolithography pattern structure can be realized in a single component, the planarity and the angle of the photolithography pattern structure can be quickly adjusted to the required index parameter value, and the adjustment efficiency can be improved. In addition, the adjusting structure 10 for the exposure device of the present application is a planarity adjustment and angle adjustment integrated structure, and does not need to be provided with a goniometer slide and other standard parts, so that the machine standard is reduced, the cost is low, the adjustment is convenient, the volume is small, the space can be saved, and the close arrangement of the light heads is beneficial.

[0053] In some embodiments of the present application, the fixing plate 1, the adjusting plate 2 and the fixing base 4 are sequentially stacked, and the photoetching pattern structure 20 is installed on the side of the fixing plate 1 facing away from the adjusting plate 2. The fixing base 4 is located at the lowermost layer, and the adjusting plate 2, the fixing plate 1 and the photoetching pattern structure 20 are sequentially arranged upwards.

[0054] Specifically, the adjusting plate 2 can be combined with the fixing base 4 in the following manners. Figures 2-4 The fixing base 4 and the adjusting plate 2 and the cooperation therebetween in the embodiments of the present application are understood. Figure 2 A schematic diagram of the fixing base according to one embodiment of the present application; Figure 3 A schematic diagram of the adjusting plate according to one embodiment of the present application; Figure 4 A schematic diagram of the adjusting plate according to another embodiment of the present application, wherein Figure 4 The side of the adjusting plate 2 shown in FIG. 2 is the side of the adjusting plate 2 facing the fixing base 4.

[0055] As shown in FIG. 3, the fixing base 4 is provided with an angle adjusting socket 41 which is approximately rectangular or rounded rectangular in shape and penetrates the fixing base 4. Figure 2 As shown in FIG. 4, the side of the adjusting plate 2 facing the fixing base 4 is provided with an angle adjusting plug 21 which is approximately rectangular or rounded rectangular in shape and protrudes from the adjusting plate 24. When the fixing base 4 and the adjusting plate 2 are cooperatively arranged, the side of the adjusting plate 2 provided with the angle adjusting plug 21 cooperates with the fixing base, the angle adjusting plug 21 is inserted into the angle adjusting socket 41, and the size of the angle adjusting plug 21 can be set to be smaller than the size of the angle adjusting socket 41. Figure 3 Figure 4 As shown in FIG. 5, the angle adjusting plug 21 is fixedly connected with a rotating shaft, and the rotating shaft is rotatably connected with the inner circumferential wall of the angle adjusting socket 41. Specifically, the angle adjusting plug 21 can be a high-precision adjusting screw.

[0056] As shown in FIG. 6, the angle adjusting plug 21 is fixedly connected with a rotating shaft, and the rotating shaft is rotatably connected with the inner circumferential wall of the angle adjusting socket 41. Specifically, the angle adjusting plug 21 can be a high-precision adjusting screw.

[0057] As shown in FIG. 7, the angle adjusting plug 21 is fixedly connected with a rotating shaft, and the rotating shaft is rotatably connected with the inner circumferential wall of the angle adjusting socket 41. Specifically, the angle adjusting plug 21 can be a high-precision adjusting screw. Figure 2 ​It can be known that two high-precision adjusting screw holes 42 are arranged on both sides of the angle adjusting socket 41 in the fixing seat 4, and the two high-precision adjusting screw holes 42 respectively penetrate the inner circumferential wall on both sides of the angle adjusting socket 41 and the two side walls of the fixing seat 2. One end of the two high-precision adjusting screws is fixedly connected with both ends of the angle adjusting block 21 in the two high-precision adjusting screw holes 42, and the other end of the two high-precision adjusting screws is located at the two high-precision adjusting screw holes 42 on the two side walls of the fixing seat 2, and the adjusting function can be realized through the other end of the two high-precision adjusting screws. Specifically, when the included angle between the adjusting plate 2 and the fixing seat 4 needs to be adjusted, the two high-precision adjusting screws can be directly adjusted from the positions of the two high-precision adjusting screw holes 42 on the two side walls of the fixing seat 2, the screw rotation can drive the angle adjusting block 21 in the angle adjusting socket 41 to rotate around the angle adjusting part as the shaft, at this time, the fixing seat 4 is fixed, and the adjusting plate 2 rotates as a whole around the angle adjusting part as the shaft, so that the included angle between the adjusting plate 2 and the fixing seat 4 is adjusted.

[0058] The inner circumferential wall of the angle adjusting socket 41 limits the rotation stroke of the angle adjusting block 21. It can be understood that since the size of the angle adjusting block 21 is smaller than the size of the angle adjusting socket 41, the rotation stroke of the angle adjusting block 21 can be controlled, thereby limiting the adjustment range of the adjusting plate 2.

[0059] Based on the above, the fixing seat 4 and the adjusting plate 2 of the embodiment of the application use the principle of fixed-axis rotation, and the angle adjusting block 21 on the adjusting plate 2 is adjusted left and right to accurately adjust the angle of the photolithography pattern structure 20. The angle adjustment function of the photolithography pattern structure 20 can be realized in a single component, the angle of the photolithography pattern structure 20 can be quickly adjusted to the required index parameter value through the screwing mode, and the debugging efficiency is improved.

[0060] In some embodiments, as shown in Figure 2 The fixing seat 4 is provided with an arc-shaped hole 43, the inside of the arc-shaped hole 43 is hollow, and the edge is circular or arc-shaped structure. The arc-shaped hole 43 and the angle adjusting socket 41 are arranged in a direction perpendicular to the central axis of the rotation shaft.

[0061] As shown in Figure 3 Or Figure 4 The adjusting plate 2 is provided with a first through hole 22 corresponding to the position of the arc-shaped hole 43, wherein the first through hole 22 can be a rectangular structure, and the size of the first through hole 22 is greater than or equal to the size of the photolithography pattern structure 20. The photolithography pattern structure 20 is exposed from the arc-shaped hole 43, and the light can pass through the first through hole 22.

[0062] In some embodiments of the present application, the first through hole 22 is provided with arc-shaped blocks 23 on opposite sides, specifically, the arc-shaped blocks 23 are located on opposite sides of the first through hole 22 in the extension direction of the central axis of the rotating shaft. The arc-shaped blocks 23 on the two sides are correspondingly arranged, and the center of the first through hole 22 between the arc-shaped blocks 23 serves as the center of the circle on which the two arc-shaped blocks 23 are located. When the fixing seat 4 and the adjusting plate 2 are both arranged in cooperation, the side of the adjusting plate 2 provided with the arc-shaped block 23 cooperates with one end of the fixing seat 4 provided with the arc-shaped hole 43, the outer peripheral surface of the arc-shaped block 23 abuts against the inner peripheral wall of the arc-shaped hole 43, and the central axis of the arc-shaped block 23 coincides with the central axis of the arc-shaped hole 43, at this time, the angle adjusting plug 21 falls into the angle adjusting socket 41.

[0063] In addition, one side of the arc-shaped hole 43 away from the angle adjusting socket 41 is open. It can be understood that the inner periphery of the arc-shaped hole 43 is used to cooperate with the outer periphery of the arc-shaped block 23, and the circles on which the arc-shaped hole 43 and the arc-shaped block 23 are located are concentric circles, thereby, the outer peripheral surface of the arc-shaped block 23 can abut against the inner peripheral wall of the arc-shaped hole 43, and it is not necessary to arrange the arc-shaped hole 43 as a whole circumferential structure, which can save materials, and when it is necessary to install a workpiece on the position corresponding to the arc-shaped hole 43 on the side of the adjusting plate 2 facing the fixing seat 4, the open side of the arc-shaped hole 43 can play a role of avoiding.

[0064] In some embodiments of the present application, the first locking member includes a plurality of first threaded members.

[0065] As shown in Figure 2 , the fixing seat 4 is provided with a plurality of circular threaded holes 44, and the plurality of circular threaded holes 44 are arranged in intervals along the circumferential direction of the arc-shaped hole 43, wherein the plurality of circular threaded holes 44 can be two, and the two circular threaded holes 44 are respectively arranged at positions close to the angle adjusting socket 41 on the two sides of the arc-shaped hole 43.

[0066] In addition, as shown in Figure 3 or Figure 4 , the adjusting plate 2 is provided with a plurality of arc-shaped threaded holes 24, and the plurality of arc-shaped threaded holes 24 are arranged in intervals along the circumferential direction of the first through hole 22, wherein the plurality of arc-shaped threaded holes 24 can also be two, and the two arc-shaped threaded holes 24 are respectively arranged at positions close to the angle adjusting plug 21 on the two sides of the arc-shaped block 23. Wherein, the central axis of each arc-shaped threaded hole 24 coincides with the central axis of the arc-shaped block 23.

[0067] Specifically, when the adjusting plate 2 and the fixing seat 4 are matched, the positions of the two arc-shaped threaded holes 24 and the two circular threaded holes 44 correspond to each other, and the plurality of first threaded members are threadedly connected with the plurality of circular threaded holes 44 and the plurality of arc-shaped threaded holes 24 one by one. The plurality of first threaded members, that is, the first locking members, can be screws, and the plurality of circular threaded holes 44 are fixed and stopped by the plurality of first threaded members after being adjusted to the required angle under the cooperation of the fixing seat 1. Specifically, the plurality of first threaded members can be two, and the two first threaded members are used to lock the two arc-shaped threaded holes 24 and the two circular threaded holes 44 to achieve fixed and stopped.

[0068] More specifically, when adjusting the angle of the photolithography pattern structure 20, the adjusting plate 2 is moved away from one end of the angle adjusting plug-in block 21 by rotating the angle adjusting member 1, so that the angle adjusting member 1 is opened at a certain included angle compared to one end of the arc-shaped hole 43 of the fixing seat 3, and the relative position between the fixing seat 4 and the adjusting plate 2 is adjusted to achieve the adjustment of the flatness of the photolithography pattern structure 20. When it is determined that the angle of the photolithography pattern structure 20 reaches the required target angle, the two first threaded members are used to lock the two arc-shaped threaded holes 24 and the two circular threaded holes 44 at this time to achieve the fixed and stopped of the adjusting plate 2 and the fixing seat 4, thereby completing the process of adjusting the angle of the photolithography pattern structure 20.

[0069] In some other embodiments of the present application, as shown in Figure 2 The fixing seat 4 is provided with an external interface 45 located on the side of the angle adjusting socket 41 away from the arc-shaped hole 43, and the external interface 45 is adapted to be connected with an imaging and illumination module of an exposure device.

[0070] In some embodiments of the present application, the flatness adjusting member can be adjusted according to Figures 3-5 The structure and installation state of the flatness adjusting member of the embodiments of the present application are understood, wherein, Figure 5 The fixing plate according to an embodiment of the present application is shown in the schematic view.

[0071] The flatness adjusting member includes a floating connecting member. The floating connecting member is connected with the adjusting plate 2 and the fixing plate 1 respectively, and the fixing plate 1 is floating relative to the adjusting plate 2 through the floating connecting member.

[0072] Specifically, as shown in Figure 6 The first floating connecting member A according to an embodiment of the present application is shown in the schematic view. The floating connecting member includes a plurality of first floating connecting members A, and the plurality of first floating connecting members A can be two. Each first floating connecting member A includes a first positioning threaded member A1 and a first elastic member A2, and the first elastic member A2 can include a spring, Figure 6The first elastic member A2 shown in FIG. 1 is exemplified as a spring. Each first positioning screw A1 comprises a first threaded column P1 and a first positioning ring table Q1 connected to each other, wherein, as shown in FIG. Figure 6 When the first positioning screw A1 and the first elastic member A2 are matched, the first elastic member A2 is sleeved on the first threaded column P1, and one end of the first elastic member A2 abuts against the end of the first positioning ring table Q1 facing the first threaded column P1.

[0073] As shown in FIG. Figure 5 The fixing plate 1 is provided with a plurality of first positioning threaded holes 11, wherein the plurality of first positioning threaded holes 11 can be two, and the two first positioning threaded holes 11 are respectively arranged on the two sides of the fixing plate 1 and symmetrically arranged.

[0074] In some embodiments, the first positioning threaded hole 11 comprises a first section p1 and a second section q1, the inner diameter of the first section p1 is greater than the inner diameter of the second section q1, that is, the first positioning threaded hole 11 is characterized by a coaxial stepped hole, the first section p1 is used to fix the position of the first elastic member A2, and the second section q1 is used to connect the first positioning screw A1.

[0075] As shown in FIG. Figure 3 or Figure 4 The adjusting plate 2 is provided with a plurality of first connecting threaded holes 25, and the plurality of first connecting threaded holes 25 can be two, and the two first connecting threaded holes 25 are respectively arranged on the two sides of the adjusting plate 2 and symmetrically arranged.

[0076] Specifically, the cooperation of the fixing plate 1 and the adjusting plate 2 of the embodiment of the present application can be understood in combination with Figure 3 , Figure 4 and Figure 5 When the fixing plate 1 and the adjusting plate 2 are matched, the plurality of first threaded members are respectively and one-to-one connected with the plurality of first positioning threaded holes 11 and the plurality of first connecting threaded holes 25, and the plurality of first floating connecting members A are used to floatingly connect the plurality of first positioning threaded holes 11 and the plurality of first connecting threaded holes 25. Wherein, the plurality of first positioning ring tables Q1 are located on the side of the fixing plate 1 away from the adjusting plate 2, and the first elastic member A2 is located between the first positioning ring table Q1 and the fixing plate 1.

[0077] More specifically, when the fixing plate 1 and the adjusting plate 2 are fixed by the first floating connector A, the first segment p1 of the first positioning threaded hole 11 in the fixing plate 1 is located on the side of the second segment q1 facing the first positioning ring table Q1, the first threaded column P1 is threadedly connected with the second segment q1, and the first elastic member A2 is inserted into the first segment p1, that is, one end of the first elastic member A2 abuts against the end of the first positioning ring table Q1 facing the first threaded column P1, and the other end of the first elastic member A2 abuts against the junction between the first segment p1 and the second segment q1. It can be understood that, since the first elastic member A2 is elastic, when the fixing plate 1 and the adjusting plate 2 are fixed, the relative positions between the two can be adaptively adjusted by changing the force for compressing the first elastic member A2, so as to realize the floating connection of the two.

[0078] In some embodiments of the present application, the floating connector comprises a second floating connector, and the second floating connector comprises a second positioning threaded member and a second elastic member. The second positioning threaded member comprises a second threaded column and a second positioning ring table connected with each other. The structure of the second floating connector is the same as that of the first floating connector A, and the second positioning threaded member and the second elastic member can be combined with the second connection threaded hole 12 and the second positioning threaded hole 26 of the fixing plate 1 and the adjusting plate 2 respectively. Figure 6 The specific structure of the second floating connector and the cooperation between the second positioning threaded member and the second elastic member in the embodiments of the present application can be understood in combination with the above embodiments.

[0079] As shown in Figure 5 , the fixing plate 1 is provided with a second connection threaded hole 12, and the second connection threaded hole 12 can be arranged at one end of the fixing plate 1. As shown in Figure 3 or Figure 4 , the adjusting plate 2 is provided with a second positioning threaded hole 26, and the second positioning threaded hole 26 can be arranged at one end of the adjusting plate 2.

[0080] In some embodiments, the second positioning threaded hole 26 comprises a third segment m1 and a fourth segment n1, and the inner diameter of the third segment m1 is greater than the inner diameter of the fourth segment n1, that is, the second positioning threaded hole 26 is characterized by a coaxial stepped hole, the third segment m1 is used for fixing the position of the second elastic member, and the fourth segment n1 is used for connecting the second positioning threaded member.

[0081] Specifically, the cooperation of the fixing plate 1 and the adjusting plate 2 in the embodiments of the present application can be understood in combination with Figure 3 , Figure 4 and Figure 5 . When the fixing plate 1 and the adjusting plate 2 are cooperatively arranged, the second positioning threaded member is connected with the second positioning threaded hole 26 and the second connection threaded hole 12 respectively, and the second floating connector is used to floatingly connect the second positioning threaded hole 26 and the second connection threaded hole 12. Wherein, the second positioning ring table is located on the side of the adjusting plate 2 facing away from the fixing plate 1, and the second elastic member is located between the second positioning ring table and the adjusting plate 2.

[0082] More specifically, when the fixed plate 1 and the adjusting plate 2 are fixed by the second floating connector, the third segment m1 of the second positioning threaded hole 26 in the adjusting plate 2 is located on the side of the fourth segment n1 facing the second positioning ring platform. The second threaded post is threadedly connected to the fourth segment n1, and the second elastic member is inserted into the third segment m1. That is, one end of the second elastic member abuts against the end of the second positioning ring platform facing the second threaded post, and the other end of the second elastic member abuts against the junction of the interior of the third segment m1 and the fourth segment n1. It can be understood that, because the second elastic member is elastic, when the fixed plate 1 and the adjusting plate 2 are fixed, the relative position between them can be adjusted by changing the force compressing the second elastic member, thereby achieving a floating connection between them.

[0083] In some embodiments, the planar adjustment member further includes a plurality of second threaded members and a third threaded member. The plurality of second threaded members can be two in number, and the plurality of second and third threaded members can have the same structure, all employing high-precision locking screws. It is understood that the plurality of second and third threaded members can be used to fix the relative position of the fixed plate 1 and the adjusting plate 2 after the floating connector has been adjusted, thereby preventing the photolithographic pattern structure 20 from floating up and down after leveling.

[0084] like Figure 5 As shown, the fixing plate 1 has a second through hole 13 corresponding to the position of the first through hole 22. Multiple second positioning threaded parts are located on opposite sides of the second through hole 13. The fixing plate 1 has multiple first adjusting threaded holes 14, wherein there can be two of each first adjusting threaded hole 14. The multiple second positioning threaded parts are threadedly connected to the multiple first adjusting threaded holes 14 in a one-to-one correspondence, and each second positioning threaded part abuts against the side of the adjusting plate 2 facing the fixing plate 1.

[0085] Furthermore, the third threaded component is not located on the same straight line as at least two second positioning threaded components. The adjusting plate 2 is provided with a second adjusting threaded hole 27. The third threaded component is threadedly connected to the second adjusting threaded hole 27 and abuts against the side of the fixing plate 1 facing the adjusting plate 2.

[0086] Based on the above, by setting multiple first floating connectors (preferably two) and second floating connectors, and using the principle of defining a plane by three points, the left-right flatness of the photolithographic pattern structure 20 can be adjusted through multiple second threaded parts and multiple first floating connectors, and the front-back flatness of the photolithographic pattern structure 20 can be adjusted through third threaded parts and second floating connectors. After adjustment, it is locked. This allows for the adjustment of the flatness of the photolithographic pattern structure 20 within a single component. The flatness of the photolithographic pattern structure 20 can be quickly adjusted to the required parameter values ​​by twisting, improving adjustment efficiency.

[0087] In some embodiments of the present application, as shown in Figure 5 The side of the fixed plate 1 facing the photoetching pattern structure 20 is provided with a plurality of pressing blocks 15, which are arranged along the circumference of the second through hole 13. Among them, the photoetching pattern structure 20 is provided with grooves 203 matched with the plurality of pressing blocks 15. When the photoetching pattern structure 20 is fixed on the fixed plate 1, the plurality of pressing blocks 15 are matched with the plurality of grooves 203, and the plurality of pressing blocks 15 are used to lock and press the photoetching pattern structure 20.

[0088] In some embodiments of the present application, as shown in Figure 5 The side of the fixed plate 1 facing the photoetching pattern structure 20 is provided with a plurality of fixed bosses 16, which are arranged along the circumference of the second through hole 13. The side of at least two of the plurality of fixed bosses 16 facing the photoetching pattern structure 20 is provided with a positioning boss x.

[0089] Specifically, the photoetching pattern structure 20 is taken as an example of a DMD assembly. As shown in Figure 7 It is a schematic diagram of the DMD assembly according to an embodiment of the present application, wherein the present application includes a photoetching pattern structure 20 and a fixing piece 201 for fixing the DMD assembly, and the photoetching pattern structure 20 is provided with a plurality of fixing holes 202. As shown in Figure 7 The plurality of fixing holes 202 can be four, as shown in Figure 6 The fixed bosses 16 in the fixed plate 1 can also be four, and the positions are respectively matched with the four fixing holes 202. Figure 7 As shown in Figure 6 The fixed bosses 16 in the fixed plate 1 are matched with the fixing holes 202, and the inner circumferential wall of at least two of the plurality of fixing holes 202 is provided with a positioning hole matched with the positioning boss x.

[0090] And, as shown in Figure 3 And Figure 4 The adjusting plate 1 is provided with a plurality of connecting holes 28, which can be four, and the positions are respectively matched with the four fixing holes 202. Figure 7 As shown in Figure 6 The fixed bosses 16 in the fixed plate 1 are matched with the fixing holes 202, and the inner circumferential wall of at least two of the plurality of fixing holes 202 is provided with a positioning hole matched with the positioning boss x.

[0091] Based on the above, when the photolithography pattern structure 20 is fixed with the fixing plate 1 and the adjusting plate 2, the four fixing holes 202 in the photolithography pattern structure 20 can be matched with the fixing boss 16 in the fixing plate 1 and the four connecting holes 28 in the adjusting plate 2, and the positions of the three structures are fixed through the second locking member through the corresponding matched fixing hole 202, fixing boss 16 and connecting hole 28. After the flatness is debugged, the positions of the three structures can be locked.

[0092] In some embodiments of the present application, as shown in Figure 8 The adjusting structure 100 of the exposure device according to an embodiment of the present application is shown in the block diagram, wherein the adjusting structure 100 of the exposure device includes the photolithography pattern structure 20 and the adjusting structure 10 for the exposure device of any one of the above embodiments.

[0093] According to the adjusting structure 100 of the exposure device disclosed by the embodiment of the present application, when the adjusting structure 10 for the exposure device of the above embodiment is used to adjust the angle and flatness of the photolithography pattern structure 20, the flatness and angle adjustment functions of the photolithography pattern structure 20 can be realized in a single component by rotating the flatness adjusting member and the angle adjusting member, the flatness and angle of the photolithography pattern structure 20 can be quickly debugged to the required index parameter value, the debugging efficiency can be improved, the standard parts such as the protractor slide can be cancelled, the machine standard can be reduced, the space can be saved compared with the existing adjusting device, and the close arrangement of the light heads is beneficial.

[0094] The other constitutions and operations of the adjusting structure 100 of the exposure device, the photolithography pattern structure 20 and the adjusting structure 10 for the exposure device according to the embodiment of the present application are known to those skilled in the art, and will not be described in detail here.

[0095] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "illustrative embodiment", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily mean the same embodiment or example.

[0096] Although the embodiments of the present application have been shown and described, those skilled in the art can understand that various changes, modifications, replacements and variations can be made to the embodiments without departing from the principles and purposes of the present application, and the scope of the present application is defined by the claims and their equivalents.

Claims

1. An adjustment structure for an exposure apparatus, characterized by, The application relates to a fixing plate, an adjusting plate, a first locking piece, a fixing base, a second locking piece and a plane adjusting piece. The fixing plate is suitable for being connected with a photoetching pattern structure of an exposure device. The adjusting plate is movably connected with the fixing plate through a plane adjusting piece. The plane adjusting piece adjusts the flatness of the photoetching pattern structure by adjusting the relative position of the fixing plate and the adjusting plate. The first locking piece is connected with the fixing plate and the adjusting plate respectively. The first locking piece controls whether the relative position of the fixing plate and the adjusting plate is fixed.

2. The adjustment structure for an exposure apparatus according to claim 1, wherein The adjusting plate is rotatably connected with the fixing base through an angle adjusting piece. The angle adjusting piece adjusts the angle of the photoetching pattern structure by adjusting the included angle between the adjusting plate and the fixing base.

3. The adjustment structure for an exposure apparatus according to claim 2, wherein The second locking piece is connected with the fixing base and the adjusting plate respectively. The second locking piece controls whether the relative position of the fixing base and the adjusting plate is fixed. The fixing base is provided with an angle adjusting socket.

4. The adjustment structure for an exposure apparatus according to claim 3, wherein The side of the adjusting plate facing the fixing base is provided with an angle adjusting plug.

5. The adjustment structure for an exposure apparatus according to claim 3, wherein The angle adjusting plug is inserted into the angle adjusting socket. The angle adjusting piece is a rotating shaft.

6. The adjustment structure for an exposure apparatus according to claim 3, wherein The rotating shaft is fixedly connected with the angle adjusting plug and rotatably connected with the inner peripheral wall of the angle adjusting socket.

7. The adjustment structure for an exposure apparatus according to claim 3, wherein The inner peripheral wall of the angle adjusting socket limits the rotating stroke of the angle adjusting plug.

8. The adjustment structure for an exposure apparatus according to claim 3, wherein The fixing plate, the adjusting plate and the fixing base are sequentially stacked. The photoetching pattern structure is mounted on the side of the fixing plate away from the adjusting plate. The fixing base is provided with an arc-shaped hole. The adjusting plate is provided with a first through hole corresponding to the position of the arc-shaped hole. The photoetching pattern structure is exposed from the arc-shaped hole. The opposite sides of the first through hole are provided with arc-shaped blocks. The outer peripheral surface of the arc-shaped block abuts against the inner peripheral wall of the arc-shaped hole. The central axis of the arc-shaped block coincides with the central axis of the arc-shaped hole. The arc-shaped hole and the angle adjusting socket are arranged in a direction perpendicular to the central axis of the rotating shaft. The arc-shaped blocks are located on the opposite sides of the first through hole in the extension direction of the central axis of the rotating shaft. The first locking piece comprises a plurality of first threaded pieces. The fixing base is provided with a plurality of circular threaded holes. The circular threaded holes are arranged in the circumferential direction of the arc-shaped hole. The adjusting plate is provided with a plurality of arc-shaped threaded holes. The arc-shaped threaded holes are arranged in the circumferential direction of the first through hole. The first threaded pieces are threadedly connected with the circular threaded holes and the arc-shaped threaded holes one by one. The central axis of each arc-shaped threaded hole coincides with the central axis of the arc-shaped block. The side of the arc-shaped hole away from the angle adjusting socket is open. The fixing base is provided with an external interface. The external interface is located on the side of the angle adjusting socket away from the arc-shaped hole. The external interface is suitable for being connected with an imaging illumination module of the exposure device. The plane adjusting piece comprises a floating connecting piece. The floating connecting piece is connected with the adjusting plate and the fixing plate respectively. The fixing plate is floatable relative to the adjusting plate through the floating connecting piece. The fixing plate has a plurality of second threaded parts, the fixing plate has a second through hole corresponding to the position of the first through hole, the plurality of second threaded parts are located on opposite sides of the second through hole, the fixing plate has a plurality of first adjusting threaded holes, the plurality of second threaded parts are threadedly connected to the plurality of first adjusting threaded holes one by one, and each second threaded part abuts against the side of the adjusting plate facing the fixing plate. The third threaded component is not located on the same straight line as at least two of the second threaded components. The adjusting plate is provided with a second adjusting threaded hole. The third threaded component is threadedly connected to the second adjusting threaded hole and abuts against the side of the fixing plate facing the adjusting plate.

9. The adjustment structure for an exposure apparatus according to claim 8, wherein The floating connector includes a plurality of first floating connectors A, each of the first floating connectors A including a first positioning threaded component and a first elastic component. Each first positioning threaded component includes a first threaded post and a first positioning ring platform connected to each other. The fixed plate is provided with a plurality of first positioning threaded holes, and the adjusting plate is provided with a plurality of first connecting threaded holes. The plurality of first positioning threaded components are respectively connected to the plurality of first positioning threaded holes and the plurality of first connecting threaded holes in a one-to-one correspondence. The plurality of first positioning ring platforms are located on the side of the fixed plate opposite to the adjusting plate, and the first elastic component is located between the first positioning ring platform and the fixed plate.

10. The adjustment structure for an exposure apparatus according to claim 9, wherein The first positioning threaded hole includes a first section and a second section. The first section is located on the side of the second section facing the first positioning ring platform. The inner diameter of the first section is larger than the inner diameter of the second section. The first threaded post is threadedly connected to the second section. The first elastic element is inserted into the first section.

11. The adjustment structure for an exposure apparatus according to claim 8, wherein The floating connector includes a second floating connector, which includes a second positioning threaded component and a second elastic component. The second positioning threaded component includes a second threaded post and a second positioning ring platform connected to each other. The fixed plate is provided with a second connecting threaded hole, and the adjusting plate is provided with a second positioning threaded hole. The second positioning threaded component is connected to the second positioning threaded hole and the second connecting threaded hole respectively. The second positioning ring platform is located on the side of the adjusting plate opposite to the fixed plate, and the second elastic component is located between the second positioning ring platform and the adjusting plate.

12. The adjustment structure for an exposure apparatus according to claim 11, wherein The second positioning threaded hole includes a third section and a fourth section. The third section is located on the side of the fourth section facing the second positioning ring platform. The inner diameter of the third section is larger than the inner diameter of the fourth section. The second threaded post is threadedly connected to the fourth section, and the second elastic element is inserted into the third section.

13. The adjustment structure for an exposure apparatus according to any one of claims 8-12, characterized in that, The fixing plate has a plurality of clamping blocks on the side facing the photolithographic pattern structure, and the plurality of clamping blocks are arranged at circumferential intervals along the second through hole.

14. The adjustment structure for an exposure apparatus according to any one of claims 8-12, characterized in that, A plurality of fixing bosses of the fixing plate on the side facing the photoetching pattern structure are arranged at intervals along the circumference of the second through hole, at least two of the plurality of fixing bosses are provided with a positioning boss on the side facing the photoetching pattern structure, the photoetching pattern structure is provided with a plurality of fixing holes, the plurality of fixing holes are matched with the fixing bosses, and the inner circumferential wall of at least two of the plurality of fixing holes is provided with a positioning hole matched with the positioning boss.

15. An adjustment structure for an exposure apparatus, characterized in that, The exposure apparatus comprises a photoetching pattern structure and an adjusting structure according to any one of claims 1-14.

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