Grating pitch measurement device and method
By combining the grating diffraction interference principle and phase shift theorem, using technologies such as dual-frequency laser and dual-frequency range-finding interferometer, high-precision automated measurement of grating distances is achieved, which solves the problem of human operation affecting accuracy, and improves detection efficiency and resolution.
CN115597511BActive Publication Date: 2025-04-18CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Patent Information
- Application Number
- CN202211343583.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-10-31
- Publication Date
- 2025-04-18
- Estimated Expiration
- 2042-10-31
AI Technical Summary
Technical Problem
The existing grating distance measurement methods have the problem of human operation affecting accuracy, and the system is complex in high-precision detection, making it difficult to achieve full-frame detection.
Method used
The grating distance is measured through components such as dual-frequency laser light source, dual-frequency ranging interferometer and polarization beam splitter, and automated detection is achieved.
Benefits of technology
It improves the accuracy and resolution of grating distance measurement, realizes full-frame detection, has a wide measurement range, and can meet the requirements of diffraction grating distance measurement in a large range.
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Figure CN115597511B_ABST
Abstract
The grating pitch measurement device and method of the present invention relate to the field of grating detection, and solve the problem of the influence of human operation on the accuracy and the complexity of the system during high-precision detection. The above problems are solved by combining the grating diffraction interference principle with the grating phase shift theorem, and the Littrow diffraction light phase interference of the symmetrical structure is adopted. When the grating moves one pitch, the phase of its diffracted light changes by one cycle, and the phase of the Littrow diffraction light interference of the symmetrical structure changes by two cycles. The difference frequency phase detection principle and high-power electronic subdivision technology are used to detect the diffraction light interference phase change, and then the dual-frequency laser ranging system is used to detect the grating movement distance. Through the rapid scanning of the high-precision two-dimensional workbench, the grating pitches of different line densities can be detected with high precision.
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Citation Information
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