A method and device for ultrasonic cleaning of cerium oxide

Abstract

The present invention relates to the technical field of ultrasonic cleaning machines, and specifically to a method and device for ultrasonically cleaning cerium oxide, wherein a cleaning agent is used to clean the cerium oxide remaining on an ultra-smooth surface, and the cleaning agent includes a main agent and an auxiliary agent; the main agent uses an acidic solvent, and the acidic solvent can react chemically with the surface of the component to dissolve the cerium oxide remaining on the surface; the auxiliary agent uses an alkaline suspending agent, and the alkaline suspending agent can prevent the cerium oxide from condensing again and preventing the regeneration of stains. During the entire cleaning process, the present invention can remove the cerium oxide residue on the ultra-smooth surface without damage, and the ultrasonic cleaning tank device can keep the Ph value and temperature of the cleaning agent in the optimal state at all times, so that the cleaning effect is optimal and the quality of the ultra-smooth surface can be improved.

Description

Technical Field

[0001] The invention relates to the technical field of ultrasonic cleaning machines, and in particular to a method and a device for ultrasonically cleaning cerium oxide. Background Art

[0002] In optical manufacturing, especially in the processing of ultra-precision optical components, difficult-to-handle cerium oxide abrasives will be left on the surface of ultra-smooth components, affecting the surface quality of the components. Cleaning is an indispensable step, mainly to improve the cleanliness of the component surface. At present, the cleaning of optical components mainly uses ultrasonic cleaning machines. Ultrasonic cleaning machines use ultrasonic generators to emit high-frequency oscillation signals, which are converted into high-frequency mechanical oscillations through transducers and propagated into the cleaning agent. The tiny bubbles in the cleaning agent vibrate under the action of ultrasonic waves. As the sound pressure increases, the bubbles grow rapidly and then suddenly close. When the bubbles close, shock waves are generated, forming a cavitation effect. Ultrasonic cleaning uses the cavitation effect of ultrasonic waves in the cleaning agent to clean away residual substances on the surface of the component.

[0003] Ultra-precision optical components are processed by asphalt and cerium oxide polishing. According to the processing mechanism, the surface of the component can be divided into a hydrolysis rheological layer, a defect layer, a deformation layer and a substrate from top to bottom. It can be seen that the ultra-smooth surface is not dense. Processing impurities exist in the hydrolysis rheological layer, which is at the top of the surface. Plastic scratches and micro cracks exist in the defect layer. If the hydrolysis rheological layer is destroyed, subsurface damage will be exposed, showing surface damage.

[0004] Existing ultrasonic cleaning devices rely on the cavitation effect during use. If used improperly, they can easily cause damage to the surface of components. As the ultrasonic cleaning time increases, the temperature rises, and the cleaning agent will also evaporate. If the temperature is too high or too low, the volatilization of substances in the cleaning agent will decrease, which will reduce the cleaning efficiency. Summary of the invention

[0005] The purpose of the present invention is to overcome the shortcomings of the prior art and propose a method and device for ultrasonic cleaning of cerium oxide, which can solve the problem that the existing ultrasonic cleaning device cannot clean the residual cerium oxide on the surface of the component without damage.

[0006] The technical solution adopted by the present invention to solve the technical problem is:

[0007] A method for ultrasonically cleaning cerium oxide, using a cleaning agent to clean the cerium oxide remaining on an ultra-smooth surface, the cleaning agent comprising a main agent and an auxiliary agent; the main agent using an acidic solvent, the acidic solvent can react chemically with the surface of a component to dissolve the cerium oxide remaining on the surface; the auxiliary agent using an alkaline suspending agent, the alkaline suspending agent can prevent the cerium oxide from re-condensing and preventing the regeneration of stains.

[0008] Furthermore, the proportion of the acidic solvent in the cleaning agent is 1%, and the proportion of the alkaline suspending agent is 4%.

[0009] Furthermore, the optimal Ph value of the cleaning agent is 6.8-7.2, such as a Ph value of 6.9, 7, 7.1, etc., which will not damage the surface.

[0010] Furthermore, the optimal cleaning temperature of the cleaning agent is 40°C-50°C.

[0011] This embodiment also provides another technical solution:

[0012] An ultrasonic cleaning tank device is used for ultrasonic cleaning of cerium oxide, and its structure includes a cleaning tank, a solvent storage device, a Ph control module and a temperature control module; the inner wall of the cleaning tank is provided with two solvent storage devices, which are respectively used to hold an acidic solvent and an alkaline suspension agent, and the bottom of the solvent storage device is provided with a solvent outlet; the Ph control module is used to control the Ph of the cleaning agent, and the temperature control module is used to control the temperature of the cleaning agent. When the Ph value exceeds the optimal limit value, the control system controls the Ph control module to automatically add an acidic solvent or an alkaline suspension agent to keep the Ph value in the optimal range; when the temperature exceeds the optimal limit value, the control system controls the temperature control module to control the temperature of the cleaning agent to always keep it in the optimal state.

[0013] Furthermore, the Ph control module includes a Ph detection electrode and a relay arranged on the cleaning tank. The Ph detection electrode is fixed in the cleaning tank and contacts the cleaning agent. When the Ph value exceeds the limit value, the relay is closed, the solvent outlet of the solvent storage device is opened, and solvent is started to be added into the cleaning tank. When the Ph value returns to the limit value, the relay is disconnected, the solvent outlet opening is closed, and solvent addition is stopped.

[0014] Furthermore, the temperature control module includes a heater and a temperature sensor. The heater is fixed at the bottom of the cleaning tank, and the temperature sensor is fixed at the lower end of the inner wall of the cleaning tank. When the temperature is lower than the minimum limit temperature, the heater starts heating, and when the temperature is higher than the maximum limit temperature, the ultrasonic cleaning is suspended.

[0015] Technical effects of the present invention:

[0016] Compared with the prior art, the ultrasonic cleaning method of the present invention can remove the cerium oxide residue on the ultra-smooth surface without damage during the entire cleaning process. The ultrasonic cleaning tank device can keep the Ph value and temperature of the cleaning agent at the optimal state at all times, so that the cleaning effect is optimal and the quality of the ultra-smooth surface can be improved. The entire cleaning process of the present invention can achieve a good cleaning effect on the optical lens with only one cleaning agent; the present invention uses a mixed solution of an acidic solvent and an alkaline suspension to clean the optical element, which is neutral, and the cleaning of the optical element is non-destructive cleaning, and will not cause damage to the surface, solving the problem that only using an acidic solvent for cleaning will expose the sub-surface damage of the element and cause surface damage. The cleaning solvent, the alkaline solvent used is an alkaline suspension, which can prevent the cerium oxide from condensing again and prevent the regeneration of stains. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a flow chart of the method for ultrasonic cleaning of cerium oxide of the present invention;

[0018] Figure 2 It is a schematic diagram of the structural principle of the ultrasonic cleaning tank device of the present invention.

[0019] In the figure, 1. Ph detection electrode; 2. solvent storage device; 3. solvent outlet; 4. relay; 5. temperature sensor; 6. heater; 7. cleaning tank. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical solution and advantages of the embodiments of the present invention more clear, the technical solution in the embodiments of the present invention is clearly and completely described below in conjunction with the accompanying drawings.

[0021] Embodiment 1:

[0022] like Figure 1-2 As shown, the present embodiment relates to a method for ultrasonically cleaning cerium oxide, which uses a cleaning agent to clean the cerium oxide remaining on the ultra-smooth surface, comprising the following steps:

[0023] (1) Preparation of cleaning agent: A 1% acidic solvent and a 4% alkaline suspending agent are mixed to obtain a cleaning agent with a pH of 7.

[0024] (2) Place the optical component to be cleaned into the cleaning agent and start cleaning while detecting the Ph value and temperature;

[0025] (3) When the Ph value exceeds the set maximum threshold value (Ph>7.2), the solvent storage device 2 starts to add acidic solvent into the cleaning tank 7; when the Ph value exceeds the set minimum threshold value (Ph<6.8), the solvent storage device 2 starts to add alkaline suspending agent into the cleaning tank 7 until the Ph value returns to 6.8-7.2; when the temperature exceeds the set maximum threshold value (T>50°C), the work is suspended and cooling begins; when the temperature exceeds the set minimum threshold value (T<40°C), heating begins until the temperature returns to 40°C-50°C.

[0026] Embodiment 2:

[0027] An ultrasonic cleaning tank device involved in this embodiment is applied to the method for ultrasonic cleaning of cerium oxide described in Example 1, and its structure includes a cleaning tank 7, a solvent storage container 2, a Ph control module and a temperature control module; two solvent storage containers 2 are provided on the inner wall of the cleaning tank 7, which are respectively used to hold an acidic solvent and an alkaline suspension agent, and a solvent outlet 3 is provided at the bottom of the solvent storage container 2; the Ph control module is used to control the Ph of the cleaning agent, and includes a Ph detection electrode 1 and a relay 4 provided on the cleaning tank 7, and the Ph detection electrode 1 is fixed in the cleaning tank 7 to contact with the cleaning agent; the temperature control module is used to control the temperature of the cleaning agent, and includes a heater 6 and a temperature sensor 5, and the heater 6 is fixed at the bottom of the cleaning tank 7, and the temperature sensor 5 is fixed at the lower end of the inner wall of the cleaning tank 7. When the Ph value exceeds the limit value, the control system controls the Ph control module to close the relay 4, open the solvent outlet 3 of the solvent storage device 2, and start adding solvent to the cleaning tank 7. When the Ph value returns to the limit value, the relay 4 is disconnected, the solvent outlet 3 is closed, and the solvent addition is stopped, so that the acidic solvent or alkaline suspending agent is automatically added to keep the Ph value in the optimal range. When the temperature is lower than the minimum limit temperature, the heater 6 starts heating, and when the temperature is higher than the maximum limit temperature, the ultrasonic cleaning is suspended. The temperature control module is controlled by the control system to keep the temperature of the cleaning agent at the optimal state.

[0028] During the entire cleaning process of the present invention, the cleaning agent can remove the cerium oxide residue on the ultra-smooth surface without damage. The device keeps the Ph and temperature of the cleaning agent in an optimal state at all times, so that the cleaning effect is optimal, and the quality of the ultra-smooth surface can be improved. It plays an extremely important role in the processing of ultra-precision optical components.

[0029] The above-mentioned specific implementation modes are only specific cases of the present invention. The patent protection scope of the present invention includes but is not limited to the above-mentioned specific implementation modes. Any appropriate changes or modifications made thereto by any ordinary technician in the technical field in accordance with the claims of the present invention shall fall within the patent protection scope of the present invention.

Claims

1. A method for ultrasonically cleaning cerium oxide, using a cleaning agent to clean the cerium oxide remaining on the ultra-smooth surface of an optical component, characterized in that: The cleaning agent includes a main agent and an auxiliary agent; the main agent is an acidic solvent, which can react chemically with the surface of the optical element to dissolve the cerium oxide remaining on the surface; the auxiliary agent is an alkaline suspending agent, which can prevent the cerium oxide from condensing again and preventing the regeneration of stains; The cerium oxide remaining on the ultra-smooth surface is cleaned by a cleaning agent, including the following steps: (1) preparing a cleaning agent: mixing an acidic solvent with a ratio of 1% and an alkaline suspending agent with a ratio of 4% to obtain a cleaning agent with a Ph of 7; (2) Place the optical component to be cleaned into the cleaning agent and start cleaning while detecting the Ph value and temperature; (3) When the Ph value exceeds the set maximum threshold, that is, Ph>7.2, the solvent storage device starts to add acidic solvent into the cleaning tank; when the Ph value exceeds the set minimum threshold, that is, Ph<6.8, the solvent storage device starts to add alkaline suspending agent into the cleaning tank until the Ph value returns to 6.8-7.2; when the temperature exceeds the set maximum threshold, that is, T>50°C, the work is suspended and cooling begins; when the temperature exceeds the set minimum threshold, that is, T<40°C, heating begins until the temperature returns to 40°C-50°C.

2. An ultrasonic cleaning tank device, used to implement the method for ultrasonic cleaning of cerium oxide as claimed in claim 1, characterized in that: It comprises a cleaning tank (7), a solvent storage container (2), a Ph control module and a temperature control module; the inner wall of the cleaning tank (7) is provided with two solvent storage containers (2) for respectively containing an acidic solvent and an alkaline suspending agent, and the bottom of the solvent storage container (2) is provided with a solvent outlet (3); the Ph control module is used to control the Ph of the cleaning agent, and the temperature control module is used to control the temperature of the cleaning agent.

3. The ultrasonic cleaning tank device according to claim 2, characterized in that: The Ph control module comprises a Ph detection electrode (1) and a relay (4) arranged on the cleaning tank (7); the Ph detection electrode (1) is fixed in the cleaning tank (7) and in contact with the cleaning agent.

4. The ultrasonic cleaning tank device according to claim 2, characterized in that: The temperature control module comprises a heater (6) and a temperature sensor (5); the heater (6) is fixed to the bottom of the cleaning tank (7); and the temperature sensor (5) is fixed to the lower end of the inner wall of the cleaning tank (7).

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