An electron microscope sample preparation device and a preparation method

Abstract

The present invention provides an electron microscope sample preparation device and a preparation method. The preparation device includes: a processing chamber for accommodating a sample, the processing chamber forming a sealed space isolated from the external environment; a sample stage for carrying the sample during sample processing; a femtosecond laser module for performing femtosecond laser processing on the sample; and an ion gun module for performing ion processing on the sample. The electron microscope sample preparation method of the present invention first performs femtosecond laser processing on the sample, and then performs ion beam thinning processing, avoiding complex operations such as grinding and pitting in the prior art. The sample preparation can be completed on one device, reducing the number of devices and costs. Moreover, the sample remains in the processing chamber during processing without the need to transfer the sample between different devices, saving processes. Additionally, the sample is first roughly processed with a femtosecond laser and then finely processed with an ion beam, which can greatly shorten the sample preparation time.

Description

Technical Field

[0001] The present invention relates to the field of material analysis, particularly to the field of electron microscope sample preparation, and specifically to an electron microscope sample preparation device and method. Background Art

[0002] In the field of material analysis, it is usually necessary to observe and analyze a certain material sample with the aid of an electron microscope. Commonly used electron microscopes include a scanning electron microscope (SEM) and a transmission electron microscope (TEM).

[0003] For example, when analyzing the morphology of certain microscopic regions of ore materials, it is necessary to cut and polish a massive ore sample before further imaging with an electron microscope.

[0004] For another example, in the semiconductor device manufacturing process, with the development of semiconductor technology, the complexity and integration of integrated circuits have been continuously improved, and the device sizes integrated on a single chip have become smaller and smaller, posing new challenges to observation and analysis technologies. For example, the impact of defects on the yield and reliability of devices is increasing. Therefore, in order to avoid the occurrence of defects, an SEM can be used to observe semiconductors such as substrates to determine the presence and location of defects, while a TEM can be used to observe thin-film samples to obtain the planar position and planar morphology of defects.

[0005] Whether it is a massive sample or a thin-film sample, to meet the above requirements for observation with an electron microscope, after cutting out a sample block, it is first necessary to grind and polish the sample with a dedicated grinding device (such as a manual circular grinding disc or a grinding machine), and then use an ion beam to polish the sample. For some thin-film samples, in order to accelerate the process of ion beam polishing of the sample, a pit instrument is also needed to treat the sample surface and press pits on the sample surface. Even so, for hard samples such as ores and semiconductor devices, ion beam polishing often requires several hours or even dozens of hours of processing to obtain a sample with satisfactory imaging effects. A large amount of the staff's time is consumed in sample preparation and processing. Summary of the Invention

[0006] The present invention aims to provide an electron microscope sample preparation device and method to at least partially solve at least one of the above technical problems.

[0007] In a first aspect, to solve the above technical problems, the present invention provides an electron microscope sample preparation device, which includes:

[0008] A processing chamber for accommodating a sample, the processing chamber forming a sealed space isolated from the external environment;

[0009] A sample stage for holding a sample during the processing of the sample;

[0010] A femtosecond laser module for performing femtosecond laser processing on the sample;

[0011] An ion gun module for performing ion processing on the sample.

[0012] According to a preferred embodiment of the present invention, the processing chamber includes a main cavity and a main cavity cover plate, and the main cavity and the main cavity cover plate are sealingly fitted.

[0013] According to a preferred embodiment of the present invention, it further includes a sample preparation chamber, the sample preparation chamber includes a pre-pumping chamber and a pre-pumping chamber cover plate, the pre-pumping chamber cover plate can be switched between an open state and a closed state, the pre-pumping chamber is disposed adjacent to the main cavity, and the two are communicated through a through hole.

[0014] According to a preferred embodiment of the present invention, it further includes a sample delivery column, the sample stage is disposed at the front end of the sample delivery column, and the sample delivery column reciprocally moves through the through hole between the pre-pumping chamber and the main cavity to switch the sample between the preparation chamber and the sealed chamber.

[0015] According to a preferred embodiment of the present invention, the sample stage is formed by a U-shaped notch machined on the sample delivery column, and the U-shaped notch opens upward.

[0016] According to a preferred embodiment of the present invention, the femtosecond laser module includes at least one femtosecond laser and at least one femtosecond laser driving mechanism for driving the femtosecond laser to a specified position.

[0017] According to a preferred embodiment of the present invention, the femtosecond laser turntable, the femtosecond laser turntable is annular and disposed on the main cavity cover plate, and the femtosecond laser turntable can rotate relative to the central axis of the femtosecond laser turntable; the femtosecond laser is disposed through the femtosecond laser turntable, and the femtosecond laser can move in a direction parallel to the central axis relative to the femtosecond laser turntable.

[0018] According to a preferred embodiment of the present invention, the ion gun module includes at least one ion gun and at least one ion gun driving mechanism for driving the ion gun to a specified position.

[0019] According to a preferred embodiment of the present invention, the ion gun module includes a first ion gun and a first ion gun turntable. The first ion gun turntable is annular and disposed inside the inner ring of the femtosecond laser turntable, and the first ion gun turntable is rotatable about the central axis; the first ion gun penetrates through the first ion gun turntable, and the first ion gun is movable relative to the first ion gun turntable in a direction parallel to the central axis.

[0020] According to a preferred embodiment of the present invention, the ion gun module further includes at least one second ion gun and at least one second ion gun turntable. The at least one second ion gun turntable is annular and disposed inside the inner ring of the first ion gun turntable, and the second ion gun turntable is rotatable about the central axis; the second ion gun penetrates through the second ion gun turntable, and the second ion gun is movable relative to the second ion gun turntable in a direction parallel to the central axis.

[0021] According to a preferred embodiment of the present invention, it further includes a vacuum pump group, which is disposed below the main cavity and communicates with the inside of the main cavity for evacuating the processing chamber.

[0022] In a second aspect, the present invention further provides a method for preparing an electron microscope sample, using the above-described equipment to prepare an electron microscope sample, including the following steps:

[0023] S201. Start the equipment and prepare the sample;

[0024] S202. Perform femtosecond laser processing on the sample;

[0025] S203. Perform ion beam thinning processing on the sample;

[0026] S204. Complete the processing and take out the sample.

[0027] According to a preferred embodiment of the present invention, the step S201 includes: first evacuating the processing chamber, then placing the sample on the sample stage, closing the pre-pumping chamber cover plate and evacuating the pre-pumping chamber; driving the sample feeding column to move forward horizontally to send the sample into the designated position in the processing chamber;

[0028] And / or, the step S204 includes: driving the sample feeding column to move backward horizontally to pull the sample back into the pre-pumping chamber, opening the pre-pumping chamber cover plate, and taking out the sample.

[0029] According to a preferred embodiment of the present invention, in the step 202, at least one femtosecond laser is turned on to perform laser processing on the sample; and / or, in the step 203, the first ion gun and / or at least one second ion gun is turned on to perform laser beam thinning processing on the sample.

[0030] In summary, the electron microscope sample preparation equipment and method of the present invention avoid complex operations such as grinding and pitting, and can complete the preparation of samples on one piece of equipment, reducing the number of equipment and the cost of preparing samples. First, femtosecond laser is used to roughly process the sample, and then ion beam is used for fine processing. The electron microscope sample preparation time using the patent solution is about one-half to one-fifth of the traditional method, which can greatly shorten the sample preparation time. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 is a front-side perspective view of the electron microscope sample preparation equipment according to the first embodiment of the present invention;

[0032] Figure 2 is a rear-side perspective view of the electron microscope sample preparation equipment according to the first embodiment of the present invention;

[0033] Figure 3 is a rear-side perspective view of the electron microscope sample preparation equipment with the main cavity cover removed according to the first embodiment of the present invention;

[0034] Figure 4 is a flow schematic diagram of the electron microscope sample preparation method according to the second embodiment of the present invention.

[0035] In the figure: 10 - main cavity, 100 - electron microscope sample preparation equipment, 11 - main cavity cover, 20 - femtosecond laser, 21 - femtosecond laser turntable, 30 - first ion gun, 31 - first ion gun turntable, 40 - second ion gun, 41 - second ion gun turntable, 50 - vacuum pump group, 60 - sample delivery column, 61 - sample stage, 70 - pre-pumping chamber, 71 - pre-pumping chamber cover, 80 - sample. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0036] The features and exemplary embodiments of various aspects of the present invention will be described in detail below. For the purpose of making the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only configured to explain the present invention and are not configured to limit the present invention. For those skilled in the art, the present invention can be implemented without some of these specific details. The following description of the embodiments is only provided to provide a better understanding of the present invention by showing examples of the present invention.

[0037] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements not only includes those elements, but also includes other elements not expressly listed, or elements inherent to such process, method, article or device. Without further limitation, the elements defined by the statement "comprising..." do not exclude the presence of additional identical elements in the process, method, article or device comprising the said elements. The terms "front", "front end", "front part", "front surface", "rear", "rear end", "rear part", "rear surface", "back surface" are only for the convenience of describing the relative positional relationship between components, and do not limit the meaning of the components.

[0038] Embodiment 1

[0039] Reference Figures 1 - 3 , Embodiment 1 of the present invention relates to an electron microscope sample preparation device, as Figures 1 - 3 shown, the main structure of the electron microscope sample preparation device 100 includes a main cavity 10, a main cavity cover 11, a femtosecond laser 20, a femtosecond laser turntable 21, a first ion gun 30, a first ion gun turntable 31, a second ion gun 40, a second ion gun turntable 41, a vacuum pump group 50, a sample feeding column 60, a sample stage 61, a pre-pumping chamber 70, and a pre-pumping chamber cover 71.

[0040] For the convenience of describing the relative positional relationship between components, one side of the main cavity cover 11 is defined as "front", and one side of the sample feeding column 60 is defined as "rear".

[0041] Among them, the main cavity 10 and the main cavity cover 11 form a closed processing chamber for accommodating the sample. The main cavity cover 11 is arranged in front of the main cavity 10, and the main cavity 10 is hermetically fitted with the main cavity cover 11. The main cavity 10 is closely arranged adjacent to the pre-pumping chamber 70, and a through hole is opened on the back surface of the main cavity 10. The pre-pumping chamber 70 is arranged at the position of the through hole, and the whole pre-pumping chamber can cover the through hole. The pre-pumping chamber 70 and the pre-pumping chamber cover 71 are buckled together to form a sample preparation chamber. The pre-pumping chamber cover 71 can be switched between the open and closed states. When opened, it is convenient for the sample 80 to be put in and taken out. When closed, the sample can be processed. Preferably, the pre-pumping chamber 70 is hermetically fitted with the pre-pumping chamber cover 71. Preferably, the pre-pumping chamber cover 71 is arranged on the top surface of the pre-pumping chamber 70. Of course, the pre-pumping chamber cover 71 can also be arranged on both sides of the pre-pumping chamber 70.

[0042] A through hole is provided on the front panel of the pre-pumping chamber 70, corresponding to and communicating with the through hole on the back surface of the main cavity 10, jointly forming a channel for the sample to move from the pre-pumping chamber 70 to the main cavity 10. A through hole is also provided on the rear panel of the pre-pumping chamber 70. The sample feeding column 60 can horizontally move through the through hole on the rear panel and the through hole on the front panel of the pre-pumping chamber 70 under the drive of a drive system (not shown in the figure). A sample stage 61 is provided at the front end of the sample feeding column 60, and the sample 80 can be placed on the sample stage 61. The sample feeding column 60 is used to transfer the sample 80 between the pre-pumping chamber 70 and the main cavity 10. Preferably, the sample stage 61 is formed by a U-shaped notch machined on the sample feeding column 60. The U-shaped notch opens upward, and the sample 80 can be placed into the U-shaped notch. Preferably, the sample feeding column 60 is in sealing fit with the through hole on the front panel and / or the through hole on the rear panel of the pre-pumping chamber 70.

[0043] The femtosecond laser 20 and the femtosecond laser turntable 21 constitute a femtosecond laser module. The femtosecond laser 20 is arranged on the femtosecond laser turntable 21, and the femtosecond laser 20 passes through the femtosecond laser turntable 21, that is, the femtosecond laser 20 extends out from both sides of the femtosecond laser turntable 21. Under the drive of a drive system (not shown in the figure), the femtosecond laser 20 can move relative to the femtosecond laser turntable 21 in a direction parallel to the central axis. The femtosecond laser turntable 21 is arranged in a ring shape on the main cavity cover 11 and can rotate around the central axis of the femtosecond laser turntable 21 under the drive of a drive system (not shown in the figure). Furthermore, the femtosecond laser 20 rotates around the central axis as the femtosecond laser turntable 21 rotates. In summary, the femtosecond laser 20 can both move in a direction parallel to the central axis and rotate relative to the central axis, so that the femtosecond laser 20 can move / rotate to a specified position. The femtosecond laser turntable 21 constitutes a drive mechanism for driving the femtosecond laser to a specified position.

[0044] In addition, the drive mechanism can also be a robotic arm. The femtosecond laser 20 is arranged on the robotic arm, and under the drive of the robotic arm, the femtosecond laser 20 can move to a specified position.

[0045] The above-mentioned femtosecond laser 20 and its drive mechanism can be one set, or two or more sets. Multiple femtosecond lasers can improve the efficiency of laser processing of samples.

[0046] The first ion gun 30 and the first ion gun turntable 31 constitute the first ion gun module, the second ion gun 40 and the second ion gun turntable 41 constitute the second ion gun module, and the first ion gun module and the second ion gun module together constitute the ion gun module. The first ion gun turntable 31 and the second ion gun turntable 41 are annular and are arranged on the main cavity cover plate. The first ion gun 30 is arranged on the first ion gun turntable 31, and the first ion gun 30 is arranged on the first ion gun turntable 31, that is, the first ion gun 30 extends from both sides of the first ion gun turntable 31, and under the drive of the drive system (not shown in the figure), the first ion gun 30 can move relative to the first ion gun turntable 31 in a direction parallel to the central axis. The second ion gun 40 is arranged on the second ion gun turntable 41, and the second ion gun 40 is arranged on the second ion gun turntable 41, that is, the second ion gun 40 extends from both sides of the second ion gun turntable, and under the drive of the drive system (not shown in the figure), the second ion gun 40 can move relative to the second ion gun turntable 41 in a direction parallel to the central axis. The first ion gun turntable 31 is arranged in the inner circle of the femtosecond laser turntable 21, and the second ion gun turntable 41 is arranged in the inner circle of the first ion gun turntable 31. The first ion gun turntable 31 and the second ion gun turntable 41 can be rotated around the central axis by a driving system (not shown in the figure), and then the first ion gun 30 and the second ion gun 40 can be rotated around the central axis. In summary, the first ion gun 30 and the second ion gun 40 can be moved / rotated to a specified position.

[0047] Preferably, the second ion gun 40 and the second ion gun turntable 41 may be more than two sets, so as to further improve the efficiency of ion beam thinning of the sample.

[0048] The first ion gun turntable 31 and the second ion gun turntable 41 constitute a driving mechanism for driving the first ion gun and the second ion gun to designated positions.

[0049] In addition, the ion gun driving mechanism may also be a mechanical arm, on which the first ion gun 30 and at least one second ion gun 40 are disposed. Driven by the mechanical arm, the first ion gun 30 and at least one second ion gun 40 may move to a designated position.

[0050] Of course, only one set of the first ion gun module and the second ion gun module can be selected according to needs, such as when preparing non-sheet samples, and when processing sheet samples requires processing both sides at the same time, or when preparing non-sheet samples but in order to increase the processing speed, two or more sets of ion gun modules can be selected.

[0051] Preferably, the rotation axes of the femtosecond laser turntable 21 , the first ion gun turntable 31 , and the second ion gun turntable 41 are the same central axis.

[0052] The vacuum pump set 50 is arranged below the main cavity 10 and is connected to the inside of the main cavity 10, and is used to evacuate the inside of the main cavity 10, so as to realize the processing of the sample in a vacuum environment. Of course, according to the design requirements, the vacuum pump set 50 can also be arranged in other positions of the main cavity 10. The vacuum pump set 50 is also used to evacuate the pre-pumping chamber 70.

[0053] In addition, the electron microscope sample preparation equipment described above also includes a measurement system for measuring the physical performance parameters of the sample and the system; a drive system for moving the sample column, sample stage, femtosecond laser and femtosecond laser turntable, ion gun and ion gun turntable according to the user's needs; a gas path system for supplying gas to the system according to the user's needs; a power supply system for providing the required power for the ion gun, femtosecond laser and other required components; a control and interaction system for realizing human-computer interaction and information acquisition and control of each device; other systems, other optical and lighting components for supporting the operation and use of the system; a structure system for supporting and protecting the above-mentioned systems. The above systems are not the focus of the present invention, so they will not be described in detail.

[0054] Embodiment 2

[0055] Reference Figure 4 , Embodiment 2 of the present invention relates to a method for preparing an electron microscope sample. This method uses the above-mentioned electron microscope sample preparation equipment 100 to process the sample 80. As Figure 4 shown, this method includes the following steps:

[0056] S201. Start the equipment 100 and prepare the sample 80

[0057] Before starting the processing, that is, evacuate the processing chamber through the vacuum pump set 50 and maintain a high vacuum degree.

[0058] First, pull the sample column 60 backward so that the sample stage 61 is placed in the pre-pumping chamber 70. Open the pre-pumping chamber cover plate 71, and place the sample 80 on the sample stage 61; close the pre-pumping chamber cover plate 71 and ensure that the pre-pumping chamber cover plate 71 is sealed with the pre-pumping chamber 70; evacuate the pre-pumping chamber 70.

[0059] The drive system drives the sample column 60 (together with the sample stage 61 and the sample 80) to move forward horizontally through the through holes of the main cavity 10 and the pre-pumping chamber 70, and pushes the sample 80 into the designated position in the main cavity 10 through the sample column 60.

[0060] S202. Perform femtosecond laser processing on the sample 80

[0061] Start the drive system, move and rotate the femtosecond laser 20 to the specified position and angle, start the femtosecond laser 20 to perform femtosecond laser processing on the sample 80. When the sample 80 reaches the required processing shape and requirements, stop the femtosecond processing, and the femtosecond laser 20 retracts to the initial position.

[0062] S203. Perform ion beam thinning processing on the sample 80

[0063] Move and rotate the first ion gun 30 and / or the second ion gun 40 to the specified position and angle through the drive system, and the first ion gun 30 and / or the second ion gun 40 perform ion beam thinning on the sample 80. After the sample 80 reaches the target effect, stop the ion beam thinning processing, and the first ion gun 30 and / or the second ion gun 40 retract to the initial position.

[0064] S204. Finish processing and take out the sample 80

[0065] The drive system drives the sample delivery column 60 (together with the sample stage 61 and the sample 80) to move horizontally backward, pulls the sample back into the pre-pumping chamber 70, opens the cover plate 71 of the pre-pumping chamber, takes out the sample 80, and completes the processing operation of the sample 80.

[0066] In this embodiment, in step 202, at least one femtosecond laser can be turned on to perform laser processing on the sample. Turning on two or more femtosecond lasers simultaneously can improve the efficiency of laser processing.

[0067] In step S203, when it is necessary to process both sides of a flaky sample, the first ion gun 30 and at least one second ion gun 40 can be turned on simultaneously to perform ion beam thinning processing on both sides of the sample respectively; or to improve the processing efficiency, the first ion gun 30 and at least one second ion gun 40 can also be turned on simultaneously to perform ion beam thinning processing on different positions of the sample, and the two ion guns can also be turned on simultaneously to perform ion beam thinning processing on the same position of the sample. Of course, only the first ion gun 30 or the second ion gun 40 can also be turned on to perform ion beam thinning processing.

[0068] In summary, the electron microscope sample preparation equipment and preparation method disclosed in the above embodiments of the present invention avoid complex operations such as grinding and pitting in the prior art, can complete the preparation of samples on one device, reduce the number of devices, and lower the cost of preparing samples; and the sample is always in the processing chamber during the processing process, without the need to transfer the sample between different devices, saving the process; and first use femtosecond laser to perform rough processing on the sample, and then use ion beam to perform fine processing. The preparation time of the electron microscope sample is about one-half to one-fifth of the preparation time of the traditional method, which can greatly shorten the sample preparation time.

[0069] It should be clear that the present invention is not limited to the specific structures and processes described above and shown in the figures. For the sake of brevity, detailed descriptions of known methods are omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present invention is not limited to the specific steps described and shown. Those skilled in the art can make various changes, modifications, and additions, or change the order between steps after understanding the spirit of the present invention.

[0070] It should also be noted that the exemplary embodiments mentioned in the present invention describe some methods or systems based on a series of steps or devices. However, the present invention is not limited to the order of the above steps. That is to say, the steps can be executed in the order mentioned in the embodiments, can be different from the order in the embodiments, or several steps can be executed simultaneously.

[0071] As described above, the above are only specific embodiments of the present invention. Those skilled in the art can clearly understand that for the convenience and brevity of description, the specific working processes of the above-described systems, modules, and units can refer to the corresponding processes in the foregoing method embodiments and will not be repeated here. It should be understood that the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention can easily think of various equivalent modifications or substitutions, and these modifications or substitutions should all be covered within the protection scope of the present invention.

Claims

1. An electron microscope sample preparation device, characterized in that, The device includes: A processing chamber for accommodating a sample. The processing chamber is an enclosed processing chamber in the enclosed space formed by the main cavity and the main cavity cover plate, isolated from the external environment. The main cavity cover plate is arranged in front of the main cavity. A pre-pumping chamber is arranged adjacent to the main cavity. The pre-pumping chamber is communicated with the main cavity through a through hole, including: a through hole is opened on the back surface of the main cavity, and the pre-pumping chamber is arranged at the position of the through hole on the back surface of the main cavity. The pre-pumping chamber entirely covers the through hole on the back surface of the main cavity and is buckled with the top pre-pumping chamber cover plate to form a sample preparation chamber. The pre-pumping chamber cover plate switches between the open and closed states and is in sealing cooperation with the pre-pumping chamber. A through hole is also opened on the rear panel of the pre-pumping chamber. The sample feeding column horizontally reciprocates through the through hole on the rear panel of the pre-pumping chamber and the through hole on the front panel of the pre-pumping chamber under the drive of the drive system. The sample feeding column conveys the sample between the sample preparation chamber and the enclosed processing chamber, and the sample feeding column is in sealing cooperation with the through hole on the front panel of the pre-pumping chamber and / or the through hole on the rear panel of the pre-pumping chamber; A sample stage for carrying the sample during the process of processing the sample, arranged at the front end of the sample feeding column; A femtosecond laser module for performing femtosecond laser processing on the sample, including: at least one femtosecond laser and at least one femtosecond laser driving mechanism for driving the femtosecond laser to a specified position. The femtosecond laser driving mechanism includes a robotic arm or a femtosecond laser turntable arranged in a ring on the main cavity cover plate; An ion gun module for performing ion processing on the sample, including: a first ion gun and a first ion gun turntable, a second ion gun and a second ion gun turntable. The first ion gun turntable and the second ion gun turntable constitute an ion gun driving mechanism for driving the first ion gun and the second ion gun to a specified position. The first ion gun turntable and the second ion gun turntable are circular rings and are arranged on the main cavity cover plate.

2. The electron microscope sample preparation device according to claim 1, characterized in that The main cavity and the main cavity cover plate are in sealing cooperation.

3. The electron microscope sample preparation device according to claim 1, characterized in that, The pre-pumping chamber is communicated with the main cavity through a through hole, and further includes: a through hole is opened on the front panel of the pre-pumping chamber and corresponds to and communicates with the through hole on the back surface of the main cavity, jointly forming a channel for the sample to move from the pre-pumping chamber to the main cavity.

4. The electron microscope sample preparation device according to claim 1, characterized in that The sample feeding column conveys the sample between the sample preparation chamber and the enclosed processing chamber, including: switching the sample between the pre-pumping chamber and the main cavity.

5. The electron microscope sample preparation device according to claim 1, characterized in that, The sample stage is formed by a U-shaped notch processed on the sample feeding column. The U-shaped notch opens upward for placing the sample.

6. The electron microscope sample preparation device according to claim 1, characterized in that The femtosecond laser turntable includes: the femtosecond laser turntable rotates relative to the central axis of the femtosecond laser turntable under the drive of the drive system.

7. The electron microscope sample preparation device according to claim 6, characterized in that, It further includes: The femtosecond laser is arranged on the femtosecond laser turntable. The femtosecond laser can move both in the direction parallel to the central axis and rotate relative to the central axis with respect to the femtosecond laser turntable, so that the femtosecond laser can move / rotate to a specified position.

8. The electron microscope sample preparation device according to claim 1, characterized in that, The ion gun module includes a first ion gun module and a second ion gun module.

9. The electron microscope sample preparation device according to claim 8, wherein, The first ion gun module specifically includes: a first ion gun and a first ion gun turntable. The first ion gun turntable is circular and arranged on the inner circle of the femtosecond laser turntable, and the first ion gun turntable rotates around the central axis; the first ion gun is arranged on the first ion gun turntable, and the first ion gun moves in the direction parallel to the central axis with respect to the first ion gun turntable.

10. The electron microscope sample preparation device according to claim 9, characterized in that, The second ion gun module specifically includes: at least one second ion gun and at least one second ion gun turntable. The second ion gun turntable is annular and disposed within the inner ring of the first ion gun turntable, and the second ion gun turntable is rotatable about the central axis; the second ion gun is inserted through the second ion gun turntable, and the second ion gun is movable relative to the second ion gun turntable in a direction parallel to the central axis.

11. The electron microscope sample preparation device according to claim 1, characterized in that, It further includes a vacuum pump group, which is disposed below the main cavity and communicated with the inside of the main cavity for evacuating the processing chamber.

12. A method for preparing an electron microscope sample, which uses the device described in any one of claims 1-11 above to prepare the electron microscope sample, characterized in that, It includes the following steps: S201. Start the equipment and prepare the sample; S202. Perform femtosecond laser processing on the sample; S203. Perform ion beam thinning processing on the sample; S204. Complete the processing and take out the sample.

13. The method for preparing an electron microscope sample according to claim 12, wherein The step S201 includes: first evacuating the processing chamber, then placing the sample on the sample stage, closing the pre-pumping chamber cover plate and evacuating the pre-pumping chamber; driving the sample delivery column to move forward horizontally to send the sample into the designated position in the processing chamber; and / or, the step S204 includes: driving the sample delivery column to move backward horizontally to pull the sample back into the pre-pumping chamber, opening the pre-pumping chamber cover plate, and taking out the sample.

14. The method for preparing an electron microscope sample according to claim 12, wherein In the step 202, turn on at least one femtosecond laser to perform laser processing on the sample; and / or, in the step 203, turn on the first ion gun and / or at least one second ion gun to perform ion beam thinning processing on the sample.

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