A dust fixing method and apparatus

Abstract

The application discloses a dust fixing method and device, and relates to the technical field of semiconductors. The dust fixing method comprises the following steps: irradiating dust with laser through the optical film of a photomask, so as to fix the dust on the light shielding layer of the photomask. The dust fixing method provided by the application can conveniently and quickly complete effective treatment on the dust in the photomask, and does not affect the normal use of the photomask.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and more specifically, to a method and apparatus for fixing dust. Background Technology

[0002] A photomask, also known as a mask, consists of a light-transmitting substrate and a light-shielding layer on the substrate. The light-shielding layer defines the light-transmitting area through which light passes to form a pattern. To prevent contamination and extend the lifespan of the photomask, an optical film is usually applied to the effective area of ​​the photomask to ensure that the light-transmitting area is not contaminated.

[0003] After the photomask is made, dust may fall on the surface of the light-shielding layer inside the photomask. In order to prevent the dust from moving to the light-transmitting area and causing blockage, the optical film needs to be removed and the photomask needs to be cleaned again. The operation process is tedious and complicated. Summary of the Invention

[0004] The purpose of this invention is to provide a method for fixing dust, which can fix the dust inside the photomask onto the light-shielding layer without removing the optical film, preventing the dust from moving to the light-transmitting area, and the operation process is convenient and quick.

[0005] Another objective of this invention is to provide a dust fixing device that can fix dust inside the photomask onto the light-shielding layer without removing the optical film, preventing the dust from moving to the light-transmitting area, and the operation is convenient and quick.

[0006] This invention provides a technical solution:

[0007] A dust fixing method applied to a photomask, the dust fixing method comprising:

[0008] A laser is used to irradiate the dust through the optical film of the photomask, thereby fixing the dust onto the light-shielding layer of the photomask.

[0009] Furthermore, the step of using a laser to irradiate dust through the optical film of the photomask to fix the dust onto the light-shielding layer of the photomask includes:

[0010] The dust is irradiated a preset number of times at a preset frequency and a first preset duration, and the dust is irradiated for a second preset duration each time.

[0011] Furthermore, the preset frequency is in the range of 500nJ to 1500nJ.

[0012] Furthermore, the first preset duration is within the range of 1s to 2s.

[0013] Furthermore, the second preset duration is within the range of 0.5s to 1s.

[0014] Furthermore, the preset number of times is between 5 and 10.

[0015] Furthermore, the step of using a laser to irradiate dust through the optical film of the photomask to fix the dust onto the light-shielding layer of the photomask includes:

[0016] A laser is used to irradiate the dust at an angle perpendicular to the surface of the light-shielding layer where the dust is located, so that the dust is embedded in the light-shielding layer.

[0017] Furthermore, the step of using a laser to irradiate dust through the optical film of the photomask to fix the dust onto the light-shielding layer of the photomask further includes:

[0018] Obtain the particle size of the dust;

[0019] When the particle size of the dust is within a preset range, a laser is used to irradiate the dust through the optical film of the photomask to fix the dust onto the light-shielding layer of the photomask.

[0020] Furthermore, the preset range is 1μm to 10μm.

[0021] Embodiments of the present invention also provide a dust fixing device applied to a photomask, the dust fixing device comprising:

[0022] A laser irradiation module is used to emit a laser that passes through the optical film of the photomask to irradiate dust, thereby fixing the dust onto the light-shielding layer of the photomask.

[0023] Compared to existing technologies, the dust fixing method provided by this invention uses laser light to irradiate dust through an optical film, thereby pressing the dust into a light-shielding layer and fixing the dust on the light-shielding layer. This prevents the dust from moving to the light-transmitting area and achieves effective dust removal without disassembling the optical film. Therefore, the beneficial effects of the dust fixing method provided by this invention include: it can conveniently and quickly complete the effective removal of dust inside the photomask without affecting the normal use of the photomask. Attached Figure Description

[0024] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly described below. It should be understood that the following drawings only show some embodiments of the present invention and should not be considered as limiting the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 A flowchart illustrating a dust-fixing method provided in an embodiment of the present invention;

[0026] Figure 2This is a schematic diagram illustrating the dust fixing method provided in this embodiment for dust treatment in a practical application;

[0027] Figure 3 for Figure 1 A flowchart of a sub-step of step S100;

[0028] Figure 4 for Figure 1 Flowchart of another seed step in step S100;

[0029] Figure 5 for Figure 1 A flowchart of another sub-step in step S100;

[0030] Figure 6 A structural block diagram of a dust-fixing device provided in an embodiment of the present invention.

[0031] Icons: 10-substrate; 20-optical film; 30-light-shielding layer; 40-dust; 100-dust fixing device; 110-laser irradiation module; 120-detection module; 130-positioning module. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0033] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0034] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0035] In the description of this invention, it should be understood that the terms "upper," "lower," "inner," "outer," "left," "right," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this invention is in use, or the orientation or positional relationship commonly understood by those skilled in the art. They are only used to facilitate the description of this invention and to simplify the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0036] Furthermore, the terms "first," "second," etc., are used only to distinguish descriptions and should not be interpreted as indicating or implying relative importance.

[0037] In the description of this invention, it should also be noted that, unless otherwise explicitly specified and limited, terms such as "set" and "connection" should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0038] The specific embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0039] Example

[0040] Please refer to the following: Figure 1 and Figure 2 , Figure 1 The diagram shown is a flowchart of the dust fixing method provided in this embodiment. Figure 2 The diagram illustrates the practical application of the dust-fixing method provided in this embodiment to treat dust 40. This dust-fixing method is applied to a photomask. When dust 40 is present inside the photomask, it can fix the dust 40 onto the light-shielding layer 30 through the optical film 20, preventing the dust 40 from obstructing the light-transmitting area. The dust-fixing method includes the following steps:

[0041] In step S100, a laser is used to irradiate the dust 40 through the optical film 20 of the photomask to fix the dust 40 onto the light-shielding layer 30 of the photomask.

[0042] In this embodiment, a low-energy spot laser is used to irradiate the dust 40, embedding the dust 40 into the light-shielding layer 30, which can be made of metallic chromium or a Mosi film. This fixes the dust 40 outside the light-transmitting area, preventing it from moving into the light-transmitting area during subsequent transportation or use and thus blocking it, ensuring the normal use of the photomask. Irradiating the dust 40 with a low-energy laser also avoids damaging the optical film 20.

[0043] As can be seen, in practical applications, when dust 40 is found on the light-shielding layer 30, it is not necessary to remove the optical film 20 for cleaning to effectively remove the dust 40, making the operation convenient and quick.

[0044] Furthermore, it is understandable that if the inspection finds that the dust 40 is already on the substrate 10 corresponding to the light-transmitting area, the dust 40 can also be irradiated with a low-energy laser to move the dust 40 to the light-shielding layer 30, and then the dust 40 can be further embedded into the light-shielding layer 30.

[0045] Please see Figure 3 , Figure 3 The diagram shown is a flowchart of one sub-step of step S100. Step S100 may include:

[0046] Sub-step S101: Irradiate the dust with a laser at a preset frequency and a first preset duration for 40 preset times, and irradiate the dust with a single laser irradiation for 40 second preset durations.

[0047] In this embodiment, the dust 40 is irradiated by laser in a point-by-point manner. The laser frequency of each point-by-point laser is controlled within the range of 500nJ to 1500nJ, the interval between two adjacent points-by-point lasers is controlled within the range of 1s to 2s, the irradiation time of a single point-by-point laser on the dust 40 is controlled within the range of 0.5s to 1s, and the preset number of times is controlled between 5 and 10 times to ensure that the dust 40 can be embedded in the light-shielding layer 30.

[0048] Please see Figure 4 , Figure 4 The diagram shown is a flowchart of another sub-step of step S100. Step S100 may also include:

[0049] In sub-step S102, a laser is used to irradiate the dust 40 at an angle perpendicular to the surface of the light-shielding layer 30 where the dust 40 is located, so that the dust 40 is embedded in the light-shielding layer 30.

[0050] In order to prevent the dust 40 from moving irregularly under laser irradiation and to ensure that the dust 40 can be quickly embedded into the light-shielding layer 30, in this embodiment, the dust 40 is irradiated at an angle perpendicular to the surface of the light-shielding layer 30 where the dust 40 is located, thereby quickly pressing the dust 40 into the light-shielding layer 30.

[0051] Please see Figure 5 , Figure 5 The diagram shown is another sub-step flowchart of step S100. Step S100 may also include:

[0052] Sub-step S103: Obtain the particle size of dust 40.

[0053] In sub-step S104, when the particle size of dust 40 is within a preset range, a laser is used to irradiate dust 40 through the optical film 20 of the photomask to fix dust 40 onto the light-shielding layer 30 of the photomask.

[0054] In practice, to ensure effective fixation of dust 40, the dust fixation method provided in this embodiment is mainly targeted at dust 40 within a specific particle size range. Preferably, in this embodiment, the preset range is 1μm to 10μm.

[0055] In practical applications, when dust 40 is detected inside the photomask, the particle size of the dust 40 is first obtained through a measuring device, and it is determined whether the dust fixing method provided in this embodiment should be used to process the dust 40 based on the particle size. If the detected dust 40 particle size is in the range of 1μm to 10μm, the dust 40 is irradiated with laser at intervals to quickly embed the dust 40 into the light-shielding layer 30.

[0056] In addition, to better implement the aforementioned dust-fixing method, this embodiment also provides a dust-fixing device 100. Please refer to [link to relevant documentation]. Figure 6 , Figure 6 The diagram shown is a structural block diagram of the dust fixing device 100.

[0057] The dust fixing device 100 provided in this embodiment includes a laser irradiation module 110, a detection module 120, and a positioning module 130. The detection module 120 is used to detect whether there is dust 40 inside the photomask. The positioning module 130 is used to adjust the laser irradiation module 110 so that the emission direction of the laser irradiation module 110 is aligned with the dust 40 when the detection module 120 detects the presence of dust 40 inside the photomask. The laser irradiation module 110 is used to emit laser light through the optical film 20 of the photomask to irradiate the dust 40, thereby fixing the dust 40 onto the light-shielding layer 30 of the photomask.

[0058] It is understood that the laser irradiation module 110 is used to perform step S100 and its various sub-steps of the aforementioned dust fixing method.

[0059] Furthermore, in some embodiments, the detection module 120 can also obtain the particle size of the dust 40, and the laser irradiation module 110 can also adaptively adjust the preset frequency of the laser, the first preset duration of the interval between two adjacent shots, the second preset duration of the laser duration for each shot, and the preset number of shots to irradiate the dust 40 according to the particle size of the dust 40 obtained by the detection module 120, so as to obtain the best fixing effect.

[0060] In summary, the dust fixing method and dust fixing device 100 provided in this embodiment can fix the dust 40 inside the photomask to the light-shielding layer 30 without disassembling the optical film 20, preventing the dust 40 from moving to the light-transmitting area. The operation process is convenient and quick, and does not affect the normal use of the photomask.

[0061] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A dust-fixing method applied to a photomask, characterized by, The dust fixing method includes: A laser is used to irradiate the dust through the optical film of the photomask, thereby fixing the dust onto the light-shielding layer of the photomask; The step of using a laser to irradiate dust through the optical film of the photomask to fix the dust onto the light-shielding layer of the photomask includes: Obtain the particle size of the dust; When the particle size of the dust is within 1μm to 10μm, the dust is irradiated 5 to 10 times with a laser of 500 nJ to 1500 nJ at intervals of 1s to 2s, with each irradiation lasting 0.5s to 1s. The irradiation direction is perpendicular to the surface of the light-shielding layer where the dust is located, so that the dust is embedded in the light-shielding layer.

2. A dust fixing device applied to a photomask, characterized in that, The dust-fixing device includes: A laser irradiation module is used to emit a laser that passes through the optical film of the photomask to irradiate the dust, thereby fixing the dust onto the light-shielding layer of the photomask. A detection module is used to obtain the particle size of the dust. The laser irradiation module is also used to irradiate the dust 5 to 10 times with a laser of 500 nJ to 1500 nJ at intervals of 1s to 2s when the particle size of the dust is within 1μm to 10μm, with each irradiation lasting 0.5s to 1s and the irradiation direction being perpendicular to the surface of the light-shielding layer where the dust is located, so that the dust is embedded in the light-shielding layer.

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