A virtual graphics filling method and semiconductor device layout

Abstract

This invention discloses a virtual graphic filling method, which includes: obtaining an unfilled layout; calculating unfillable areas on the layout; if there are at least two unfillable areas on the layout, when the first boundary and / or the second boundary of two adjacent unfillable areas are not on the same straight line, adding a rectangular area between the two adjacent unfillable areas, the rectangular area serving as the newly added unfillable area.

Description

Technical Field

[0001] This invention relates to the field of integrated circuit design, and more specifically to a virtual graphic filling method and semiconductor device layout. Background Technology

[0002] In Dynamic Random Access Memory (DRAM) technology, the main capacitor cells are called cell arrays, and the area outside the capacitors is called the peripheral area. During the manufacturing process, for the same layer, the cell array area and the peripheral area require different processes. The process for the cell array area is more complex than that for the peripheral area, requiring more exposures and etching steps. During the intermediate exposure and etching processes, the peripheral area needs to be masked first, leaving only the cell array area exposed. To address the load effect problem during the etching of the cell array, virtual patterns are introduced.

[0003] Etching techniques include wet etching and dry etching. Dry etching is generally used for smaller, critical dimensions, and it typically employs plasma etching technology. Dry etching relies on chemically active free radicals generated by high-glow discharge to react with the material being etched, forming volatile products that continuously corrode the material. The etching load effect occurs because uneven pattern density distribution leads to slower etching rates in denser areas and faster rates in sparser areas, resulting in over-etching in sparse regions. This uneven pattern density distribution is typically addressed by using virtual pattern layers that fill the entire remaining space across a given span. Summary of the Invention

[0004] The purpose of this invention is to provide a virtual graphics filling method and a semiconductor device layout.

[0005] This application provides a virtual graphic filling method, including: obtaining an unfilled layout; calculating unfillable areas on the layout; if there are at least two unfillable areas on the layout, when the first boundary and / or the second boundary of two adjacent unfillable areas are not on the same straight line, adding a rectangular area between the two adjacent unfillable areas, the rectangular area serving as the newly added unfillable area.

[0006] Optionally, adding a rectangular region between two adjacent unfillable regions includes using the midline of the region between the two adjacent unfillable regions as the midline of the rectangular region.

[0007] Optionally, adding a rectangular region between two adjacent unfillable regions includes: adding a first height region to each of the first boundaries of the two adjacent unfillable regions; and adding a second height region to each of the second boundaries of the two adjacent unfillable regions.

[0008] Optionally, the height of the first height region and the height of the second height region are both the sum of the width of the virtual graphic and the spacing between the virtual graphics.

[0009] Optionally, the method further includes: comparing the boundary of the first height region newly added to the first boundary of the two adjacent unfillable regions; selecting the first height region away from the first boundary; and aligning one end of the rectangular region with the boundary of the first height region away from the first boundary.

[0010] Optionally, the method further includes: comparing the boundary of the second height region newly added at the second boundary of the two adjacent unfillable regions; selecting the second height region away from the second boundary; and aligning one end of the rectangular region with the boundary of the second height region away from the second boundary.

[0011] Optionally, the method further includes removing the first height region and the second height region.

[0012] Optionally, the method further includes: arranging virtual graphics along the first boundary and the second boundary of the unfillable region, the first boundary being opposite to the second boundary; extending the virtual graphics located at the first boundary and the second boundary along a first direction to the boundary of the fillable region, the first direction being parallel to the first boundary; arranging the virtual graphics at intervals in a second direction in the remaining space of the fillable region on the layout, the second direction being perpendicular to the first direction; and removing the virtual graphics that overlap with the unfillable region.

[0013] Optionally, arranging the virtual graphics at intervals in the remaining space of the fillable area on the map in the second direction includes arranging the virtual graphics at intervals according to a preset spacing in the second direction.

[0014] Optionally, the method further includes: removing virtual graphics that overlap with the rectangular region.

[0015] Optionally, the virtual graphic is a strip-shaped graphic.

[0016] This application also provides a semiconductor device layout, including: an unfillable region and a fillable region; virtual graphics are respectively arranged on a first boundary and a second boundary of the unfillable region, the first boundary being opposite to the second boundary; the virtual graphics arranged on the first boundary and the second boundary extend along a first direction to the boundary of the fillable region, the first direction being parallel to the first boundary; in the remaining space of the fillable region on the layout, the virtual graphics are arranged at intervals in a second direction, the second direction being perpendicular to the first direction; if there are at least two unfillable regions on the layout, when the first boundary and / or the second boundary of two adjacent unfillable regions are not on the same straight line, a rectangular region is arranged between the two adjacent unfillable regions, the rectangular region serving as a newly added unfillable region.

[0017] Optionally, the midline of the region between two adjacent unfillable regions is the midline of the rectangular region.

[0018] Optionally, at least two virtual graphics are arranged on the first and second boundaries of the unfillable region, extending along the first direction to the boundary of the fillable region.

[0019] Optionally, the virtual graphic arranged at one end of the first boundary and the second boundary maintains a minimum spacing with the first boundary and the second boundary, the minimum spacing being the minimum spacing that satisfies the manufacturing process conditions.

[0020] Optionally, the virtual graphic arranged at one end of the first boundary is attached to the unfillable area; the virtual graphic arranged at one end of the second boundary is attached to the unfillable area.

[0021] Optionally, the spacing between the virtual graphics arranged at intervals in the second direction is a preset spacing; the spacing between at least two virtual graphics arranged on the first boundary and the second boundary respectively is the preset spacing.

[0022] This application provides a virtual graphic filling method. When the first and / or second boundaries of two adjacent unfillable regions are not on the same straight line, a rectangular region is added between the two adjacent unfillable regions, and the rectangular region serves as the newly added unfillable region. The virtual graphics located at the first and second boundaries are arranged along a first direction to the boundary of the fillable region. In the remaining space of the fillable region on the layout, the virtual graphics are arranged at intervals in a second direction, and virtual graphics that overlap with the rectangular region are removed, so that the arranged virtual graphics are evenly distributed on the layout. Attached Figure Description

[0023] Figure 1 This is a schematic diagram showing that the boundaries of two adjacent unfillable regions are not on the same straight line according to an embodiment of this application.

[0024] Figure 2 This is a flowchart of a virtual graphic filling method according to an embodiment of this application;

[0025] Figure 3 This is a schematic diagram of adding a rectangular region between two adjacent unfillable regions according to an embodiment of this application;

[0026] Figure 4 This is a schematic diagram of a semiconductor device layout corresponding to the virtual graphics filling method according to an embodiment of this application;

[0027] Figure 5 This is a schematic diagram of filling virtual graphics according to an embodiment of this application.

[0028] Figure label:

[0029] 201: Unfillable area; 202: Virtual graphic; 203: Rectangular area; 204: Preset spacing; 205: First height area, second height area. Detailed Implementation

[0030] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to specific embodiments and the accompanying drawings. It should be understood that these descriptions are merely exemplary and not intended to limit the scope of the invention. Furthermore, descriptions of well-known structures and techniques are omitted in the following description to avoid unnecessarily obscuring the concept of the invention.

[0031] In existing technologies, filling virtual graphics involves first calculating the unfillable region 201, then filling the fillable region with a strip of virtual graphics 202 at intervals, and finally removing any overlap with the unfillable region 201. However, because the strip of virtual graphics 202 has a directionality (e.g., horizontal), while filling the unfillable region 201 with the virtual graphics 202 allows for minimal spacing on the left and right sides, a large, random gap will exist at the top and bottom edges of the unfillable region 201.

[0032] Figure 1 This is a diagram illustrating that the boundaries of two adjacent unfillable regions are not on the same straight line. (See reference) Figure 1If there are at least two unfillable regions 201 on the layout, and the boundaries of two adjacent unfillable regions 201 are not on the same straight line, the virtual graphics 202 arranged on the boundaries of the two adjacent unfillable regions 201 are also not on the same straight line. The virtual graphics 202 arranged on the boundaries of the two adjacent unfillable regions 201 are staggered, resulting in uneven distribution of the virtual graphics 202. This application adds a rectangular region 203 between two adjacent unfillable regions and removes the virtual graphics that overlap with the rectangular region 203 to ensure that the arranged virtual graphics 202 are evenly distributed on the layout.

[0033] This application provides a method for filling virtual graphics. Figure 2 Flowchart of the method for filling virtual graphics, see reference. Figure 2 The method includes the following steps:

[0034] S101, Get the unfilled layout.

[0035] The unfilled map includes an unfillable region 201, and the area surrounding the unfillable region 201 is an fillable region.

[0036] S102, calculates the unfillable area on the layout.

[0037] Calculate the unfillable region 201 on the layout. The unfillable region 201 can be a rectangle. Calculate the length and / or width of the unfillable region 201.

[0038] S103, if there are at least two unfillable regions on the layout, when the first boundary and / or second boundary of two adjacent unfillable regions are not on the same straight line, a rectangular region is added between the two adjacent unfillable regions, and the rectangular region is used as the newly added unfillable region.

[0039] Figure 3 For an illustration of adding a rectangular region between two adjacent unfillable regions, refer to... Figure 3 When the first and / or second boundaries of two adjacent unfillable regions 201 are not on the same straight line, a rectangular region 203 is added between the two adjacent unfillable regions 201. The rectangular region 203 serves as the newly added unfillable region. This avoids... Figure 1 The virtual graphics 202 arranged on the boundaries of two adjacent unfillable regions 201 are not on the same straight line, and the virtual graphics 202 arranged on the boundaries of two adjacent unfillable regions 201 are arranged in an alternating manner. Figure 4 This is a schematic diagram of a semiconductor device layout corresponding to the virtual graphics filling method provided in the embodiments of this application, with reference to... Figure 4A rectangular region 203 is added between two adjacent unfillable regions 201. The rectangular region 203 is also an unfillable region. As a newly added unfillable region, the rectangular region 203 is used to center-truncate the virtual graphics 202 arranged around the two adjacent unfillable regions 201 that are not on the same straight line, thus avoiding the uneven staggered arrangement of the virtual graphics 202 arranged around the two adjacent unfillable regions 201.

[0040] Optionally, the first boundary can be the upper boundary of the unfillable region 201, and the second boundary can be the lower boundary of the unfillable region 201.

[0041] Optionally, adding a rectangular region between two adjacent unfillable regions includes using the midline of the region between the two adjacent unfillable regions as the midline of the rectangular region.

[0042] Optionally, adding a rectangular region between two adjacent unfillable regions includes: adding a first height region to the first boundary of each of the two adjacent unfillable regions; and adding a second height region to the second boundary of each of the two adjacent unfillable regions.

[0043] Optionally, refer to Figure 3 The first height region 205 and the second height region 205 newly added at the first and second boundaries of two adjacent unfillable regions are rectangular in shape.

[0044] Optionally, refer to Figure 4 The height of the first height region and the height of the second height region are both the sum of the width of the virtual graphic 202 and the spacing between the virtual graphics, i.e., the preset spacing 204.

[0045] The spacing between virtual graphics can be a preset spacing of 204. The height of the first height region and the height of the second height region are both the sum of the width of the virtual graphic 202 and the spacing between the virtual graphics, i.e., the preset spacing of 204.

[0046] In some embodiments, the method further includes: comparing the boundary of the first height region 205 newly added at the first boundary of the two adjacent unfillable regions 201; selecting the first height region 205 away from the first boundary; and aligning one end of the rectangular region 203 with the boundary of the first height region 205 away from the first boundary.

[0047] Optionally, the heights of the newly added first height regions 205 at the first boundaries of the two adjacent unfillable regions 201 are compared; the higher first height region 205 is selected; one end of the rectangular region 203 is aligned with the boundary of the higher first height region 205.

[0048] In some embodiments, the method further includes: comparing the boundary of the second height region 205 newly added at the second boundary of the two adjacent unfillable regions 201; selecting the second height region 205 away from the second boundary; and aligning one end of the rectangular region 203 with the boundary of the second height region 205 away from the second boundary.

[0049] Optionally, the heights of the newly added second height regions 205 at the second boundaries of the two adjacent unfillable regions 201 are compared; the lower second height region 205 is selected; one end of the rectangular region 203 is aligned with the boundary of the lower second height region 205.

[0050] Optionally, the method further includes removing the first height region 205 and the second height region 205.

[0051] Optionally, the first height region 205 and the second height region 205 newly added at the first and second boundaries of the unfillable region 201 are removed. (See reference) Figure 4 After removing the first height region 205 and the second height region 205, the rectangular region 203 centered and truncated the virtual graphic 202.

[0052] Optionally, Figure 5 This is a schematic diagram of filling virtual graphics, for reference. Figure 5 After adding a rectangular region between two adjacent unfillable regions, the method further includes: arranging virtual graphics 202 along a first boundary and a second boundary of the unfillable region 201, the first boundary being opposite to the second boundary; extending the virtual graphics 202 located at the first boundary and the second boundary along a first direction to the boundary of the fillable region, the first direction being parallel to the first boundary; arranging the virtual graphics 202 at intervals in a second direction in the remaining space of the fillable region on the layout, the second direction being perpendicular to the first direction; and removing the virtual graphics 202 that overlap with the unfillable region 201. This ensures that the virtual graphics 202 to the boundary of the unfillable region 201 have a minimum interval, thereby making the graphic density distribution more uniform and reducing the etching load effect during manufacturing.

[0053] Optionally, before extending the virtual graphics 202 located at the first boundary and the second boundary along the first direction to the boundary of the fillable area, the method includes: arranging 1-2 virtual graphics 202 at one end of the first boundary of the unfillable area 201; and arranging 1-2 virtual graphics 202 at one end of the second boundary of the unfillable area 201.

[0054] Optionally, arranging 1-2 virtual graphics 202 at one end of the first boundary of the unfillable region 201 includes: arranging 1-2 virtual graphics 202 of the same length as the first boundary at one end of the first boundary with a minimum spacing, wherein the minimum spacing is the minimum spacing required to meet the manufacturing process conditions. Arranging 1-2 virtual graphics 202 at one end of the second boundary of the unfillable region 201 includes: arranging 1-2 virtual graphics 202 of the same length as the second boundary at one end of the second boundary with a minimum spacing, wherein the minimum spacing is the minimum spacing required to meet the manufacturing process conditions.

[0055] Optionally, the first direction can be parallel to the upper boundary of the unfillable region 201, and the first direction can be horizontal. Virtual graphics 202 extending horizontally along the first boundary to the boundary of the fillable region, and virtual graphics 202 extending horizontally along the second boundary to the boundary of the fillable region. Assuming the first direction is horizontal, the second direction can be vertical. Virtual graphics 202 are arranged at intervals in the remaining space of the fillable region in the direction perpendicular to the second direction.

[0056] Optionally, in the remaining space of the fillable area on the map, the virtual graphics 202 are arranged at intervals in the second direction, wherein the second direction is perpendicular to the first direction, including: arranging the virtual graphics 202 at intervals of a preset spacing 204 in the second direction.

[0057] Optionally, the virtual graphics 202 that overlap with the rectangular area 203 are removed.

[0058] Optionally, the virtual graphic 202 may be a strip graphic.

[0059] This application provides a virtual graphic filling method. When the first boundary and / or second boundary of two adjacent unfillable regions are not on the same straight line, a rectangular region is added between the two adjacent unfillable regions. The rectangular region serves as the newly added unfillable region. The virtual graphic located at the first boundary and the second boundary is arranged along a first direction to the boundary of the fillable region. In the remaining space of the fillable region on the layout, the virtual graphic is arranged at intervals in a second direction. The virtual graphic overlapping with the rectangular region is removed, which avoids the uneven staggered arrangement of the virtual graphic 202 arranged at the boundary of the two adjacent unfillable regions, so that the arranged virtual graphic is evenly distributed on the layout.

[0060] Figure 4 This application provides a schematic diagram of a semiconductor device layout, as shown in another aspect of the application. Figure 4The semiconductor device layout includes: an unfillable region 201 and a fillable region; virtual graphics 202 are respectively arranged on the first and second boundaries of the unfillable region 201, with the first boundary opposite to the second boundary; the virtual graphics 202 arranged on the first and second boundaries extend along a first direction to the boundary of the fillable region, the first direction being parallel to the first boundary; in the remaining space of the fillable region on the layout, the virtual graphics 202 are arranged at intervals in a second direction, the second direction being perpendicular to the first direction; if there are at least two unfillable regions 201 on the layout, when the first boundary and / or the second boundary of two adjacent unfillable regions 201 are not on the same straight line, a rectangular region 203 is arranged between the two adjacent unfillable regions 201, the rectangular region 203 serving as a newly added unfillable region.

[0061] In some embodiments, the midline of the region between two adjacent unfillable regions is the midline of the rectangular region.

[0062] In some embodiments, at least two virtual graphics 202 are arranged on the first boundary and the second boundary of the unfillable region 201, extending along the first direction to the boundary of the fillable region.

[0063] In some embodiments, the virtual graphic 202 arranged at one end of the first boundary and the second boundary maintains a minimum spacing with respect to the first boundary and the second boundary, the minimum spacing being a minimum spacing that satisfies the manufacturing process conditions.

[0064] In some embodiments, the virtual graphic 202 arranged at one end of the first boundary is attached to the unfillable area 201; the virtual graphic 202 arranged at one end of the second boundary is attached to the unfillable area 201.

[0065] In some embodiments, the spacing between the virtual graphics 202 arranged at intervals in the second direction in the remaining space of the fillable area on the layout is a preset spacing 204; the spacing between at least two virtual graphics 202 arranged on the first boundary and the second boundary respectively is a preset spacing 204.

[0066] In a semiconductor device layout provided in this application, a rectangular region 203 is arranged between two adjacent non-fillable regions 201. The rectangular region 203 is used to center-truncate the virtual graphics 202 arranged around the two adjacent non-fillable regions 201 that are not on the same straight line. This avoids the uneven staggered arrangement of the virtual graphics 202 arranged around the two adjacent non-fillable regions 201 when the first boundary and / or the second boundary of the two adjacent non-fillable regions 201 are not on the same straight line, and ensures that the arranged virtual graphics 202 are evenly distributed on the layout.

[0067] It should be understood that the specific embodiments described above are merely illustrative or explanatory of the principles of the invention and do not constitute a limitation thereof. Therefore, any modifications, equivalent substitutions, improvements, etc., made without departing from the spirit and scope of the invention should be included within the protection scope of the invention. Furthermore, the appended claims are intended to cover all variations and modifications falling within the scope and boundaries of the appended claims, or equivalent forms of such scope and boundaries.

[0068] The above description does not provide detailed explanations of the technical aspects of each layer's patterning and etching. However, those skilled in the art should understand that various methods existing in the prior art can be used to form layers and regions of the desired shape. Furthermore, to form the same structure, those skilled in the art can also design methods that are not entirely identical to those described above.

[0069] The above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations. However, obvious variations or modifications derived therefrom are still within the scope of protection of this invention.

Claims

1. A method for filling virtual graphics, characterized in that, include: Get the unfilled layout; Calculate the unfillable regions on the layout; If there are at least two unfillable regions on the map, and the unfillable regions are rectangular, when the first boundaries of two adjacent unfillable regions are not on the same straight line, or the second boundaries of two adjacent unfillable regions are not on the same straight line, a rectangular region is added between the two adjacent unfillable regions, and the rectangular region is the newly added unfillable region; wherein, the first boundary is the upper boundary of the unfillable region, and the second boundary is the lower boundary of the unfillable region. Virtual graphics are arranged along the first and second boundaries of the unfillable region, with the first boundary and the second boundary being opposite to each other. The virtual graphic located at the first boundary and the second boundary is arranged along a first direction to the boundary of the fillable area, wherein the first direction is parallel to the first boundary; The virtual graphics are arranged at intervals in the remaining space of the fillable area on the map in a second direction, which is perpendicular to the first direction; Remove the virtual graphics that overlap with the unfillable area.

2. The method according to claim 1, characterized in that, Adding a rectangular region between two adjacent unfillable regions includes: The midline of the region between the two adjacent unfillable regions is taken as the midline of the rectangular region.

3. The method according to claim 2, characterized in that, Adding a rectangular region between two adjacent unfillable regions includes: A first height region is added to the first boundary of each of the two adjacent unfillable regions; A second height region is added to the second boundary of each of the two adjacent unfillable regions.

4. The method according to claim 3, characterized in that, The height of the first height region and the height of the second height region are both the sum of the width of the virtual graphic and the spacing between the virtual graphics.

5. The method according to claim 3, characterized in that, The method further includes: Compare the boundary of the newly added first height region to the first boundary of the two adjacent unfillable regions; Select a first altitude region that is far from the first boundary; One end of the rectangular region is flush with the boundary of the first height region that is far from the first boundary.

6. The method according to claim 3, characterized in that, The method further includes: Compare the boundary of the second height region added to the second boundary of the two adjacent unfillable regions; Select a second altitude region that is far from the second boundary; One end of the rectangular region is flush with the boundary of the second height region that is far from the second boundary.

7. The method according to claim 3, characterized in that, The method further includes: Remove the first height region and the second height region.

8. The method according to claim 1, characterized in that, The remaining space of the fillable area on the map, in which the virtual graphics are arranged at intervals in the second direction, includes: The virtual graphics are arranged at preset intervals in the second direction.

9. The method according to claim 1, characterized in that, The method further includes: Remove any virtual graphics that overlap with the rectangular area.

10. The method according to claim 1, characterized in that, The virtual graphic is in the shape of a strip.

11. A semiconductor device layout, characterized in that, include: Unfillable and fillable regions; The first and second boundaries of the unfillable area are respectively arranged with virtual graphics, and the first boundary is opposite to the second boundary. The virtual graphic arranged on the first boundary and the second boundary extends along a first direction to the boundary of the fillable area, the first direction being parallel to the first boundary; The virtual graphics are arranged at intervals in the remaining space of the fillable area on the map in a second direction, which is perpendicular to the first direction; If there are at least two unfillable regions on the map, and the unfillable regions are rectangular, when the first boundaries of two adjacent unfillable regions are not on the same straight line, or the second boundaries of two adjacent unfillable regions are not on the same straight line, a rectangular region is arranged between the two adjacent unfillable regions, and the rectangular region is a newly added unfillable region; wherein, the first boundary is the upper boundary of the unfillable region, and the second boundary is the lower boundary of the unfillable region.

12. The layout according to claim 11, characterized in that, The midline of the region between two adjacent unfillable regions is the midline of the rectangular region.

13. The layout according to claim 11, characterized in that, At least two virtual graphics are arranged on the first and second boundaries of the unfillable region, extending along the first direction to the boundary of the fillable region.

14. The layout according to claim 11, characterized in that, The virtual graphic arranged at one end of the first boundary and the second boundary maintains a minimum spacing with the first boundary and the second boundary, the minimum spacing being the minimum spacing that satisfies the manufacturing process conditions.

15. The layout according to claim 11, characterized in that, The virtual graphic arranged at one end of the first boundary fits into the unfillable area; The virtual graphic arranged at one end of the second boundary fits into the unfillable area.

16. The layout according to claim 11, characterized in that, The spacing between the virtual graphics arranged at intervals in the second direction is a preset spacing; The spacing between at least two virtual graphics arranged on the first boundary and the second boundary is the preset spacing.

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