An ion soft deposition device

Abstract

The present invention relates to the technical field of compound characterization, and particularly to an ion soft deposition device. The device includes a soft deposition cavity, an ion collimating lens group and a transmission base which are arranged in the soft deposition cavity from top to bottom. A through hole coaxial with the collimating lens group is provided at the top of the soft deposition cavity, and the through hole is used for introducing deposited ions. The transmission base can move horizontally, and a soft deposition target and an MCP fluorescence screen are arranged on the transmission base. The MCP fluorescence screen is used for beam spot imaging of deposited ions, and the soft deposition target is used for deposition of deposited ions. The present invention controls the ion deposition energy through ion deceleration, performs ion visualization imaging through the MCP fluorescence screen, reduces the beam spot and improves the deposition efficiency per unit area, and can assist in preparing a mass spectrometer to achieve more efficient sample preparation.

Description

Technical Field

[0001] The present invention relates to the technical field of compound characterization, and particularly to an ion soft deposition device. Background Art

[0002] Preparation mass spectrometry (pMS) is a high-purity molecular preparation technology. Especially with the proposal of the ion soft landing technology, pMS can be used in the preparation fields of biological macromolecules or synthetic macromolecules, having broad application prospects. Before deposition, ions are in high-speed motion. How to effectively reduce the ion kinetic energy, and while reducing deposition fragmentation, ensure the best deposition efficiency of ions per unit time is one of the core problems of preparation mass spectrometry. Among them, the design of the ion soft deposition device is crucial.

[0003] Through the retrieval of patents and papers, the relevant patents involving ion soft deposition or soft landing are as follows: 1. COOKs and Ouyang Zheng disclosed a system and method for preparing biological or other molecular arrays in 2003. It converts biological molecules into gas-phase ions, separates them based on mass / charge ratio and / or mobility, and collects the separated ions. The system includes a multi-electrospray ion source for generating an ionized sample stream, which is introduced into a linear ion trap for separation. The separated sample is deposited on a point of the substrate through a focusing lens. This patent mainly focuses on introducing the overall preparation method and does not elaborate on how to efficiently achieve soft deposition in the design of the ion soft deposition device. Summary of the Invention

[0004] Aiming at the above problems, the purpose of the present invention is to propose an ion soft deposition solution, which combines an ion deceleration lens and an MCP fluorescence screen imaging system with soft deposition to improve the ion soft deposition efficiency.

[0005] To achieve this purpose, the present invention adopts the following technical solutions:

[0006] The present invention provides an ion soft deposition device, including a soft deposition cavity, an ion collimating lens group and a transmission base arranged in the soft deposition cavity from top to bottom. A through hole coaxial with the collimating lens group is provided at the top of the soft deposition cavity, and the through hole is used for introducing deposited ions; the transmission base can move horizontally, and a soft deposition target and an MCP fluorescence screen are arranged on the transmission base. The MCP fluorescence screen is used for beam spot imaging of the deposited ions; the soft deposition target is used for depositing ions.

[0007] Two square grooves are arranged on the top of the transmission base along the X direction. The soft deposition target and the MCP fluorescence screen are respectively placed in the two square grooves, and the upper surfaces of the soft deposition target and the MCP fluorescence screen are on the same plane.

[0008] The drive base is a rectangular metal block, and the drive base is connected to the ground potential or grounded through a wire.

[0009] The drive base is connected to a drive rod arranged in the X direction. The drive rod penetrates the side wall of the soft deposition cavity, and the drive rod can slide relative to the side wall of the soft deposition cavity in the X direction.

[0010] The soft deposition target is a conductive metal with a circular flat plate structure;

[0011] The soft deposition target is connected to a galvanometer through a wire, and the galvanometer is used to detect the deposition current; the galvanometer is connected to a DC high-voltage power supply through a wire, and the DC high-voltage power supply is used to provide a deceleration voltage.

[0012] A metal grid is provided on the top of the drive base.

[0013] The material of the metal grid is stainless steel or a material with a conductive coating on the surface.

[0014] The ion collimating lens group includes a deflection lens and a single lens arranged from top to bottom.

[0015] The single lens is composed of three concentric and coaxially arranged circular ring electrodes; the deflection lens is composed of four 1 / 4 circular ring electrodes symmetrically arranged with the same center.

[0016] The soft deposition cavity provides a vacuum environment of 1×10

[0017] ,

[0016] ,

[0015] ,

[0020] , Figure 1 , , , , , , -3 , , ,

[0019] , ,

[0018] Pa.

[0017] The advantages and beneficial effects of the present invention are as follows: The present invention ingeniously combines an ion deceleration lens and an MCP fluorescence screen imaging system with soft deposition. On the one hand, the ion deposition energy is controlled by ion deceleration, and on the other hand, ion visualization imaging is performed through the MCP fluorescence screen, reducing the beam spot and improving the deposition efficiency per unit area. The present invention can assist in the preparation of mass spectrometry to achieve more efficient sample preparation, and has broad application prospects in the field of mass spectrometry structure characterization of biological macromolecules, synthetic macromolecules, etc. Description of the Drawings

[0018] The drawings further illustrate the present invention, but the content in the drawings does not constitute any limitation to the present invention.

[0019] Figure 1 is an overall structural schematic diagram of an ion soft deposition device in an embodiment of the present invention;

[0020] In the figure: 1 is a deposited ion, 2 is a soft deposition cavity, 3 is a drive base, 4 is a drive rod, 5 is a soft deposition target, 6 is a galvanometer, 7 is a DC high-voltage power supply, 8 is an MCP fluorescence screen, 9 is a ground potential, 10 is a metal grid, 11 is an ion collimating lens group, and 12 is a through hole. Detailed Embodiments

[0021] It should be noted that, without conflict, the embodiments in the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0022] To make the objectives, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part rather than all of the embodiments of the present invention. The description of at least one exemplary embodiment below is actually only illustrative and in no way limits the present invention and its application or use. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts fall within the scope of protection of the present invention.

[0023] In the description of the present invention, it should be understood that the orientation or positional relationships indicated by orientation words such as "front, rear, upper, lower, left, right", "lateral, vertical, perpendicular, horizontal" and "top, bottom", etc. are usually based on the orientation or positional relationships shown in the accompanying drawings. It is only for the convenience of describing the present invention and simplifying the description. Without contrary description, these orientation words do not indicate and imply that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation. Therefore, it cannot be understood as a limitation on the scope of protection of the present invention: the orientation words "inside, outside" refer to the inside and outside relative to the contour of each component itself.

[0024] As Figure 1 shown, an ion soft deposition device is provided in an embodiment of the present invention, which includes a soft deposition cavity 2, an ion collimating lens group 11 and a transmission base 3 arranged in the soft deposition cavity 2 from top to bottom. A through hole 12 coaxial with the collimating lens group 11 is provided at the top of the soft deposition cavity 2, and the through hole 12 is used for introducing deposited ions 1; the transmission base 3 can move horizontally, and a soft deposition target 5 and an MCP fluorescence screen 8 are provided on the transmission base 3. The MCP fluorescence screen 8 is used for beam spot imaging of the deposited ions 1; the soft deposition target 5 is used for deposition of the deposited ions 1.

[0025] In an embodiment of the present invention, two square grooves are arranged on the top of the transmission base 3 along the X direction. The soft deposition target 5 and the MCP fluorescence screen 8 are respectively placed in the two square grooves. The upper surfaces of the soft deposition target 5 and the MCP fluorescence screen 8 are on the same plane and parallel to the upper surface of the transmission base 3.

[0026] Specifically, the transmission base 3 is a rectangular parallelepiped-shaped metal block, and the transmission base 3 is connected to the ground potential 9 through a wire or grounded

[0027] Further, in the embodiments of the present invention, the transmission base 3 is connected to a transmission rod 4 arranged along the X direction. The transmission rod 4 penetrates through the side wall of the soft deposition cavity 2 and is slidably and sealingly connected. The transmission rod 4 can slide relative to the side wall of the soft deposition cavity 2 along the X direction, so as to move the soft deposition target 5 or the MCP phosphor screen 8 below the ion collimating lens group 11.

[0028] In the embodiments of the present invention, the soft deposition target 5 is a conductive metal with a circular flat plate structure; the soft deposition target 5 is connected to a galvanometer 6 through a wire, and the galvanometer 6 is used to detect the deposition current; the galvanometer 6 is connected to a DC high-voltage power supply 7 through a wire, and the DC high-voltage power supply 7 is used to provide a deceleration voltage.

[0029] Further, in the embodiments of the present invention, a metal grid 10 is provided on the top of the transmission base 3.

[0030] Specifically, the material of the metal grid 10 is stainless steel or a material with a conductive coating on the surface. Preferably, the material of the metal grid 10 is 316L stainless steel.

[0031] In the embodiments of the present invention, the ion collimating lens group 11 includes a deflection lens and a singlet lens arranged from top to bottom. The singlet lens is composed of three concentric and coaxial ring electrodes arranged at intervals; the deflection lens is composed of four 1 / 4 ring electrodes symmetrically arranged with the same center. They are parallel, spaced, and coaxial, and have the functions of ion convergence and angle adjustment.

[0032] In the embodiments of the present invention, taking the right direction as the X direction and the upward direction as the Y direction, as Figure 1 shown; the soft deposition cavity 2 is a hollow cavity, and the top through hole 12 is a circular hole. The soft deposition cavity 2 is used to provide a vacuum environment of 1×10 -3 Pa. The DC high-voltage power supply 7 is a precision DC power supply; the galvanometer 6 is a picoammeter.

[0033] Further, during operation, the transmission base 3 is translated to the left by sliding the transmission rod 4. At this time, the MCP phosphor screen 8 is placed directly below the ion collimating lens group 11, and the ion beam 1 can be spot imaged, so as to assist the ion collimating lens group 11 in tuning the intensity and spot size of the ion beam 1; after the tuning is completed, the transmission base 3 is translated to the right by sliding the transmission rod 4. At this time, the soft deposition target 5 is placed directly below the ion collimating lens group 11, and a reverse electric field is applied to the soft deposition target 5 through the DC high-voltage power supply 7, so as to control the ion deposition rate, and the deposition ion current is recorded by the galvanometer 6, and then the number of deposited molecules is calculated.

[0034] Preferably, the DC high-voltage power supply 7 selects a spellman MPS series power module; the galvanometer is a Keithley picoammeter.

[0035] The present invention provides an ion soft deposition device that operates under a vacuum of 1×10-3Pa and can be used for efficient, non-destructive ion deposition in various preparative mass spectrometry applications. The present invention cleverly combines soft deposition with an ion deceleration lens and an MCP fluorescent screen imaging system. This device controls ion deposition energy through ion deceleration, while visualizing ions through the MCP fluorescent screen, minimizing beam spot size and improving deposition efficiency per unit area. This device can assist in more efficient sample preparation for preparative mass spectrometry and has broad application prospects in the field of preparative mass spectrometry structural characterization of biological and synthetic macromolecules.

[0036] The technical principle of the present invention is described above in conjunction with specific embodiments. These descriptions are only for explaining the principle of the present invention and cannot be interpreted as limiting the scope of protection of the present invention in any way. Based on the explanations herein, those skilled in the art can associate other specific embodiments of the present invention without creative work, and these equivalent variations or substitutions are all included in the scope defined by the claims of this application.

[0037] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. An ion soft deposition device, characterized in that, It includes a soft deposition cavity (2), an ion collimating lens group (11) and a transmission base (3) which are arranged in the soft deposition cavity (2) from top to bottom. A through hole (12) coaxial with the collimating lens group (11) is provided at the top of the soft deposition cavity (2), and the through hole (12) is used for introducing deposited ions (1); the transmission base (3) can move horizontally, and a soft deposition target (5) and an MCP phosphor screen (8) are provided on the transmission base (3), and the MCP phosphor screen (8) is used for beam spot imaging of the deposited ions (1); the soft deposition target (5) is used for depositing the deposited ions (1). The soft deposition target (5) is a conductive metal with a circular flat plate structure; the soft deposition target (5) is connected to a galvanometer (6) through a wire, and the galvanometer (6) is used for detecting the deposition current. The ion collimating lens group (11) includes a deflection lens and a singlet lens arranged from top to bottom. The singlet lens is composed of three sequentially spaced and coaxially arranged ring electrodes; the deflection lens is composed of four 1 / 4 ring electrodes symmetrically arranged concentrically.

2. The ion soft deposition device according to claim 1, wherein Two square grooves are arranged on the top of the transmission base (3) along the X direction, the soft deposition target (5) and the MCP phosphor screen (8) are respectively placed in the two square grooves, and the upper surfaces of the soft deposition target (5) and the MCP phosphor screen (8) are on the same plane.

3. The ion soft deposition device according to claim 2, wherein, The transmission base (3) is a rectangular parallelepiped-shaped metal block, and the transmission base (3) is connected to the ground potential (9) through a wire or grounded.

4. The ion soft deposition device according to claim 2, characterized in that, The transmission base (3) is connected to a transmission rod (4) arranged along the X direction, the transmission rod (4) penetrates the side wall of the soft deposition cavity (2), and the transmission rod (4) can slide relative to the side wall of the soft deposition cavity (2) along the X direction.

5. The ion soft deposition device according to claim 2, characterized in that The galvanometer (6) is connected to a DC high-voltage power supply (7) through a wire, and the DC high-voltage power supply (7) is used for providing a deceleration voltage.

6. The ion soft deposition device according to claim 2, wherein A metal grid (10) is provided on the top of the transmission base (3).

7. The ion soft deposition device according to claim 6, wherein The material of the metal grid (10) is stainless steel or a material with a conductive coating on the surface.

8. The ion soft deposition device according to claim 1, wherein The soft deposition cavity (2) provides a vacuum environment of 1×10 -3 Pa.

Images