Integrated sewage treatment system

Abstract

The invention relates to an integrated sewage treatment system, comprising a square main tank body, which comprises an anoxic zone, an oxidation ditch and four sedimentation zones from the inside to the outside, wherein the anoxic zone and the oxidation ditch are both oblong, a first partition wall is arranged between the anoxic zone and the oxidation ditch, the four sedimentation zones are respectively arranged at the four top corners of the main tank body, and a second partition wall is arranged between the oxidation ditch and each sedimentation zone; a water inlet distribution pipe and a nitrification liquid reflux distribution pipe are arranged at the bottom of the anoxic zone, and the nitrification liquid reflux distribution pipe is connected to the oxidation ditch through a nitrification liquid gas stripping device; a mud discharge port and a water production port are respectively arranged at the bottom and the top of each sedimentation zone, the mud discharge port is connected to the corresponding sedimentation zone and the oxidation ditch, and is used to discharge the sludge in the sedimentation zone into the oxidation ditch, and the water production port is used to output the produced water.

Description

Technical Field

[0001] The invention belongs to the technical field of sewage treatment, and in particular relates to an integrated sewage treatment system. Background Art

[0002] In the current sewage treatment technology, in order to consider the needs of nitrogen removal and phosphorus removal, the AAO process is generally used. However, since the anaerobic tank controls a non-strict anaerobic state, the phosphorus removal effect of the anaerobic tank is poor. In actual construction, the AO process is often combined with chemical phosphorus removal. The general AO process conventionally uses anoxic tanks, aerobic tanks, and secondary sedimentation tanks to be independently constructed or divided into compartments. This method has the disadvantages of large land occupation, many waterways between the tanks, inconvenient process pipeline routes, and low utilization of each tank. In addition, the general anaerobic tank or anoxic tank is a complete mixing type, and the aerobic tank adopts a plug flow type or a semi-complete mixing type, which has a small impact load resistance. When a submersible mixer is used in an anaerobic tank or anoxic tank, the energy consumption is high and the maintenance is frequent; when air stirring is used, the dissolved oxygen in the anoxic tank will be increased, which is not conducive to denitrification. Generally, additional power needs to be provided for sludge return, and the energy consumption is also high. Summary of the invention

[0003] In response to one of the above problems, the present invention provides an integrated sewage treatment system, which combines the oxidation ditch and the AO process. At the same time, a sedimentation zone is set at the corner of the oxidation ditch, and the sludge at the bottom of the sedimentation zone can automatically flow back to the oxidation ditch; the nitrification liquid reflux and the rising flow rate of the incoming water are utilized in the anoxic zone, and mechanical stirring is no longer set separately.

[0004] The integrated sewage treatment system comprises a square main tank body, which comprises an anoxic zone, an oxidation ditch and four sedimentation zones from the inside to the outside. The anoxic zone and the oxidation ditch are both oblong, a first partition wall is provided between the anoxic zone and the oxidation ditch, the four sedimentation zones are respectively provided at the four vertex corners of the main tank body, and a second partition wall is provided between the oxidation ditch and each sedimentation zone;

[0005] The bottom of the anoxic zone is provided with a water inlet distribution pipe and a nitrification liquid return distribution pipe, and the nitrification liquid return distribution pipe is connected to the oxidation ditch through the nitrification liquid gas stripping device;

[0006] A sludge discharge port and a water production port are respectively provided at the bottom and top of each sedimentation zone. The sludge discharge port connects the corresponding sedimentation zone with the oxidation ditch and is used to discharge the sludge in the sedimentation zone into the oxidation ditch, and the water production port is used to output the produced water.

[0007] Optionally, the water inlet distribution pipe of the anoxic zone is connected to the water inlet pipe, and the water inlet distribution pipe is used to uniformly input sewage into the anoxic zone. The nitrification liquid return water distribution pipe is located above the water inlet distribution pipe, and is used to uniformly input return nitrification liquid from the oxidation ditch into the anoxic zone.

[0008] Optionally, the height of the first partition wall is higher than the liquid level of the oxidation ditch, and the effluent in the anoxic zone overflows into the oxidation ditch through the first partition wall. Since the oxidation ditch is a completely mixed type, the mixed liquid continuously flows around the anoxic zone to improve the resistance to impact loads, and the effluent in the anoxic zone can overflow evenly on all sides.

[0009] The oxidation ditch is in the shape of an oblong circle and has two opposite straight areas and two curved areas connected at both ends of the straight areas. A curved area of ​​the oxidation ditch is separated from the two precipitation areas by a second partition wall.

[0010] Optionally, a gas stripping zone is provided in the radial direction of the straight zone of the oxidation ditch, one end of the gas stripping zone is connected to the first isolation wall, and the other end is connected to the second isolation wall or the inner wall of the main tank body;

[0011] The gas lift area includes a gas lift high wall and a gas lift low wall which are parallel to each other. The top of the gas lift high wall is higher than the liquid level of the oxidation ditch, and a water outlet is provided between the bottom and the bottom plate of the oxidation ditch; the top of the gas lift low wall is lower than the liquid level of the oxidation ditch, and the bottom is fixedly connected to the bottom plate of the oxidation ditch; a gas release device is provided between the gas lift high wall and the gas lift low wall.

[0012] Optionally, the nitrifying liquid gas stripping device is arranged in a curved area close to the gas stripping zone and close to the high wall of the gas stripping zone. The nitrifying liquid gas stripping device includes a water pumping pipe, a water supply pipe and a gas supply pipe. The top opening of the gas supply pipe is above the liquid level of the oxidation ditch, and the bottom opening is connected to the bottom of the water pumping pipe. The top of the water pumping pipe is connected to the upper part of the water supply pipe, and the bottom of the water supply pipe is connected to the nitrifying liquid reflux water distribution pipe.

[0013] Optionally, the straight area of ​​the oxidation ditch is provided with at least two layers of water guide plate groups, which are arranged up and down, and the water guide plate group includes two split plates and a flexible net rope between the split plates, and the split plates are rectangular;

[0014] One side of a split board is rotatably connected to the first partition wall, and the other side is connected to the net rope; one side of another split board is rotatably connected to the inner wall of the main tank body, and the other side is connected to the net rope. Each split board uses the rotating connection as a fulcrum, and the side connected to the net rope as a free end, and rotates up and down, driving the net rope to move when rotating.

[0015] Further optionally, when two split plates of the same water guide plate group are rotated to a horizontal position, the sides of the connecting net ropes do not contact each other, and a gap is left in the middle to prevent the split plates from colliding with each other during the rotation process.

[0016] Further optionally, the water guide plate group is inclined as a whole, and is inclined toward the downstream direction of the water flow in the straight line area.

[0017] Optionally, the sedimentation area has three sides, two of which are perpendicular to each other and are the pool walls of the overall pool body, and the opposite side is the second partition wall;

[0018] The top of the second partition wall is higher than the liquid level of the oxidation ditch and the sedimentation area, and a water inlet is provided in the middle of the second partition wall for inputting the treated water in the oxidation ditch into the sedimentation area;

[0019] The lower part of the second partition wall is inclined toward the sedimentation area to form a sludge hopper. A sludge discharge port is provided at the bottom of the sludge hopper, and the sludge discharge port is higher than the bottom plate of the oxidation ditch.

[0020] Optionally, a submersible fan is provided in the anoxic tank, and the air inlet of the submersible fan is located above the liquid surface in the anoxic zone; the submersible fan is connected to the aeration device of the oxidation ditch and the air pipe of the nitrification liquid gas lift device to provide them with air, while controlling the aeration volume of the oxidation ditch and the reflux volume of the nitrification liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is the overall structural diagram of the integrated sewage treatment system;

[0022] Figure 2 for Figure 1 A-A' cross-sectional schematic diagram;

[0023] Figure 3 for Figure 1 Schematic diagram of the cross section along the line B-B';

[0024] Figure 4 for Figure 1 Schematic diagram of the cross section of C-C';

[0025] Figure 5 It is a structural schematic diagram of the water guide plate group.

[0026] In the attached drawings, 1-main pool body, 2-anoxic zone, 3-oxidation ditch, 4-sedimentation zone, 5-first partition wall, 6-second partition wall, 7-water inlet distribution pipe, 8-nitrification liquid reflux distribution pipe, 9-nitrification liquid gas lift device, 10-sludge outlet, 11-water production outlet, 12-gas lift zone, 13-gas lift high wall, 14-gas lift low wall, 15-water outlet, 16-gas release device, 17-air pipe, 18-aerator, 19-water pumping pipe, 20-water pipe, 21-gas pipe, 22-aeration device, 23-dividing plate, 24-net rope, 25-water outlet, 26-submerged fan. DETAILED DESCRIPTION

[0027] This embodiment provides an integrated sewage treatment system, such as Figure 1-Figure 5 As shown, it includes a square main pool body 1, and the main pool body 1 includes an anoxic zone 2, an oxidation ditch 3 and four sedimentation zones 4 from the inside to the outside. The anoxic zone 2 and the oxidation ditch 3 are both oblong, and a first partition wall 1 is provided between the anoxic zone 2 and the oxidation ditch 3. The four sedimentation zones 4 are respectively provided at the four vertex corners of the main pool body 1, and a second partition wall 6 is provided between the oxidation ditch 3 and each sedimentation zone 4;

[0028] The bottom of the anoxic zone 2 is provided with a water inlet distribution pipe 7 and a nitrification liquid return distribution pipe 8, and the nitrification liquid return distribution pipe 8 is connected to the oxidation ditch 3 through a nitrification liquid gas stripping device 9;

[0029] A sludge discharge port 10 and a water production port 11 are respectively provided at the bottom and the top of each sedimentation zone 4. The sludge discharge port 10 connects the corresponding sedimentation zone 4 with the oxidation ditch 3 to discharge the sludge in the sedimentation zone 4 into the oxidation ditch 3, and the water production port 11 is used to output the produced water.

[0030] Optionally, the water inlet distribution pipe 7 of the anoxic zone 2 is connected to the water inlet pipe, and the water inlet distribution pipe 7 is used to uniformly input sewage into the anoxic zone 2, and the nitrification liquid return distribution pipe 8 is located above the water inlet distribution pipe 7, and is used to uniformly input the return nitrification liquid from the oxidation ditch 3 into the anoxic zone 2;

[0031] The water inlet distribution pipe 7 and the nitrification liquid return distribution pipe 8 are both long tubes, with water distribution holes densely distributed on the upper surface, and are parallel to the long axis direction of the anoxic tank.

[0032] The nitrification liquid return water distribution pipe 8 is located above the water inlet water distribution pipe 7. The sewage inputted by the water inlet water distribution pipe 7 is evenly distributed on the cross section of the anoxic zone 2, and encounters the nitrification liquid inputted by the nitrification liquid return water distribution pipe 8 during the rising process. The two are evenly mixed during the subsequent rising process. By controlling the rising flow rate of the inlet water and the nitrification liquid, the sludge in the anoxic tank is always in a suspended state, so that the sludge is fully in contact with the sewage and the nitrification liquid, thereby improving the denitrification rate.

[0033] Optionally, the height of the first partition wall 1 is higher than the liquid level of the oxidation ditch 3, and the effluent in the anoxic zone 2 overflows into the oxidation ditch 3 through the first partition wall 1. Since the oxidation ditch 3 is a completely mixed type, the mixed liquid continuously flows around the anoxic zone 2 to improve the resistance to impact loads, and the anoxic zone 2 can overflow with water evenly on all sides.

[0034] Since the oxidation ditch 3 is an oblong shape, that is, the oxidation ditch 3 is provided with a circular chamfer at the top corner of the square main pool body 1, the area outside the chamfer is the sedimentation area 4; the oxidation ditch 3 has two opposite straight areas and two curved areas connected at both ends of the straight areas, and one curved area of ​​the oxidation ditch 3 is separated from the two sedimentation areas 4 by a second partition wall 6, so the second partition wall 6 is also curved.

[0035] Optionally, a gas stripping zone 12 is provided in the radial direction of the straight zone of the oxidation ditch 3, and one end of the gas stripping zone 12 is connected to the first isolation wall, and the other end is connected to the second isolation wall or the inner wall of the main tank body 1;

[0036] The gas lift zone 12 includes a gas lift wall 13 and a gas lift low wall 14 which are parallel to each other. The top of the gas lift wall 13 is higher than the liquid level of the oxidation ditch 3, and a water outlet 15 is provided between the bottom and the bottom plate of the oxidation ditch 3; the top of the gas lift low wall 14 is lower than the liquid level of the oxidation ditch 3, and the bottom is fixedly connected to the bottom plate of the oxidation ditch 3; a gas release device 16 is provided between the gas lift wall 13 and the gas lift low wall 14.

[0037] Further optionally, the length of the water opening 15 is equal to the length of the gas raising wall 13 , so that the water opening 15 runs through the radial direction of the oxidation ditch 3 .

[0038] Further optionally, the gas release device 16 includes an air pipe 17 and an aerator 18 connected to each other, the top opening of the air pipe 17 is above the liquid level of the oxidation ditch 3, and is connected to a fan (such as a blower), and the aerator 18 is located at the lower part of the air lifting wall 13 and aerates upward, and is used to push the water between the air lifting wall 13 and the air lifting low wall 14 upward, and then cross the air lifting low wall 14 into the oxidation ditch 3, and at the same time replenish oxygen, and the water on the other side of the air lifting wall 13 continuously enters between the air lifting wall 13 and the air lifting low wall 14 through the water inlet 15 to replenish the water volume, thus forming the power of water flow in the oxidation ditch 3. The air pipe 17 is provided with an air valve, which is used to adjust the gas volume during operation to ensure the overall pushing effect in the oxidation ditch 3.

[0039] Optionally, the nitrifying liquid gas stripping device 9 is arranged in a curved area close to the gas stripping zone 12 and close to the high wall of the gas stripping zone 12. The nitrifying liquid gas stripping device 9 includes a water pumping pipe 19, a water supply pipe 20 and a gas supply pipe 21. The top opening of the gas supply pipe 21 is above the liquid level of the oxidation ditch 3, and the bottom opening is connected to the bottom of the water pumping pipe 19. The top of the water pumping pipe 19 is connected to the upper part of the water supply pipe 20, and the bottom of the water supply pipe 20 is connected to the nitrifying liquid reflux water distribution pipe 8.

[0040] The dissolved oxygen content on one side of the gas lift low wall 14 of the gas lift zone 12 is higher than the dissolved oxygen content on one side of the gas lift high wall 13. The nitrification liquid gas lift device 9 is arranged on one side of the gas lift high wall 13 to extract the nitrification liquid with less dissolved oxygen and return it to the anoxic zone 2. The gas pipe 21 provides upward gas power to the water pumping pipe 19, driving the nitrification liquid to flow upward along the water pumping pipe 19 and enter the water pipe 20. The top of the water pipe 20 is sealed, and the nitrification liquid flows downward along the water pipe 20 until it is input into the nitrification liquid reflux water distribution pipe 8, and finally uniformly input into the anoxic zone 2 through the water distribution holes of the nitrification liquid reflux water distribution pipe 8.

[0041] Optionally, an aeration device 22 , such as an aeration head or an aeration pipe, is evenly provided at the bottom of the oxidation ditch 3 to evenly aerate the entire interior of the oxidation ditch 3 .

[0042] In the present invention, the inlet water of the oxidation ditch 3 overflows from the top of the first partition wall 1 to the oxidation ditch 3, which belongs to the uniform inlet water of the top of the oxidation ditch 3. The oxidation ditch 3 discharges water to the sedimentation area 4 at the water inlet 25 corresponding to the second partition wall 6. If the aeration device 22 cannot make the water in the oxidation ditch 3 completely and timely mixed evenly, the inlet water corresponding to the second partition wall 6 may be discharged into the sedimentation area 4 before being fully treated. In addition, the sludge at the bottom of the sedimentation area 4 flows back to the four top corners of the oxidation ditch 3, and then is evenly distributed to the oxidation ditch 3 under the action of the aeration device 22. It takes a long time and is prone to uneven distribution, which will consume more energy and gas volume of the aeration device 22, and may cause the dissolved oxygen content in the oxidation ditch 3 to be too high.

[0043] Optionally, the straight area of ​​the oxidation ditch 3 is provided with at least two layers of water guide plate groups, which are arranged up and down, and the water guide plate group includes two dividing plates 23 and a flexible net rope 24 between the dividing plates 23, and the dividing plates 23 are rectangular;

[0044] One side of a split plate 23 is rotatably connected to the first partition wall 1, and the other side is connected to the net rope 24; one side of another split plate 23 is rotatably connected to the inner wall of the main tank body 1, and the other side is connected to the net rope 24. Each split plate 23 uses the rotation connection as a fulcrum and the side connected to the net rope 24 as a free end, and rotates up and down, driving the net rope 24 to move when rotating.

[0045] Further optionally, when the two split plates 23 of the same water guide plate group are rotated to a horizontal position, the sides of the connecting net rope 24 do not contact each other, and a gap is left in the middle to prevent the split plates 23 from bumping against each other during the rotation process;

[0046] When the two dividing plates 23 of the same water guide plate group rotate downward to the lowest position, the net rope 24 between them stretches out, but is not tightened to avoid breaking the net rope 24; the mesh of the net rope 24 is larger than the sludge size.

[0047] Further optionally, the water guide plate group is inclined as a whole, inclined toward the downstream direction of the water flow in the straight area, and the inclination angle is 5-15°.

[0048] As a specific implementation method, the oblong oxidation ditch 3 is approximated as a circular clock face for illustrative explanation. The gas lift zone 12 is arranged at the edge of the straight zone close to the right curved zone, and the gas lift low wall 14 is on the left side of the gas lift high wall 13, so that a counterclockwise water flow direction is formed in the oxidation ditch 3. The nitrification liquid gas lift device 9 is arranged in the right curved zone, and the water guide plate group close to the left side of the gas lift low wall 14 is inclined toward the left curved zone as a whole, and the water guide plate group in another straight zone of the oxidation ditch 3 is inclined toward the right curved zone as a whole.

[0049] In view of the above problems, the present invention designs the water guide plate group, which homogenizes the water and sludge in the straight area that occupies most of the volume of the oxidation ditch 3. Specifically, when the water flow rate of the water inlet distribution pipe 7 and / or the nitrification liquid return distribution pipe 8 of the anoxic tank is low, that is, when the water inflow from the anoxic zone 2 to the oxidation ditch 3 is at a low point, the impact of the water on the oxidation ditch 3 is not large, and all the sub-plates 23 of the water guide plate group are rotated downward and are open, allowing the water to contact and mix with the original water being treated in the oxidation ditch 3 below. At the same time, the return sludge at the bottom of the oxidation ditch 3 can also move upward and contact more water. The net rope 24 stretches, which does not affect the movement of water and sludge, and can also carry a certain amount of aerobic bacteria to form a biochemical carrier to perform biochemical treatment on the water that has passed through the net rope 24. When the water flow rate of the inlet distribution pipe 7 and / or the nitrification liquid return distribution pipe 8 of the anoxic tank is fast, that is, the water inflow from the anoxic zone 2 to the oxidation ditch 3 is at a peak, the impact of the inflow on the oxidation ditch 3 is relatively large, and the sub-plates 23 of all water guide plate groups rotate upward. In this process, part of the bottom sludge is carried to the top of the sub-plate 23 for use in treating the inflow. At the same time, this process will raise the water level in the straight area. In order to avoid overflow of water in the straight area, the inclined sub-plate 23 allows the raised water to flow to the curved area along the original water flow direction, which also provides additional power for the water flow of the oxidation ditch 3. When the sub-plate 23 rotates to a horizontal position, a shield is formed to temporarily shield most of the upper and lower sewage in the oxidation ditch 3, so that the lower sewage can be discharged into the sedimentation area 4 through the water inlet 25 after treatment, and the upper sewage is biochemically treated, and then a small amount slowly flows to the lower part of the oxidation ditch 3.

[0050] The above is a general rotation method of the water guide plate group, but the water inlet of the anoxic zone 2 does not change frequently. When the water inlet of the anoxic zone 2 does not change, the water guide plate group also continuously rotates up and down to promote the upper and lower mixing of water and sludge in the oxidation ditch 3.

[0051] Optionally, the sedimentation area 4 has three sides, two of which are perpendicular to each other and are the pool walls of the main pool body 1, and the opposite side is the second partition wall 6;

[0052] The top of the second partition wall 6 is higher than the liquid level of the oxidation ditch 3 and the sedimentation area 4. A water inlet 25 is provided in the middle of the second partition wall 6 for inputting the treated water in the oxidation ditch 3 into the sedimentation area 4.

[0053] The lower part of the second partition wall 6 is inclined toward the sedimentation area 4 to form a sludge hopper. A sludge discharge port 10 is provided at the bottom of the sludge hopper. The sludge discharge port 10 is higher than the bottom plate of the oxidation ditch 3 .

[0054] The four sedimentation zones 4 of the present invention utilize the space between the oxidation ditch 3 and the top corner of the main tank body 1. The sludge hopper is inclined toward the side of the sedimentation zone 4, which can increase the space at the bottom of the oxidation ditch 3, facilitate the accumulation of sludge in the sedimentation zone 4, improve the sedimentation effect, and prevent the air in the oxidation ditch 3 from entering the sedimentation zone 4. The treated water in the oxidation ditch 3 enters the sedimentation zone 4 for mud and water separation, the supernatant is discharged from the water outlet 11, the sludge sinks into the sludge hopper, and then returns to the oxidation ditch 3 from the sludge outlet 10 by the sludge gravity, realizing the automatic reflux of the sludge without the need for powered sludge transport.

[0055] Optionally, a submerged fan 26 is provided in the anoxic tank, and the air inlet of the submerged fan 26 is located above the liquid surface of the anoxic zone 2; the submerged fan 26 is connected to the aeration device 22 of the oxidation ditch 3 and the air supply pipe 21 of the nitrification liquid gas stripping device 9 to provide them with air and control the aeration amount of the oxidation ditch 3 and the reflux amount of the nitrification liquid at the same time.

[0056] The use of submerged fans 26 can reduce fan noise and temperature, save space, and appropriately increase the water temperature of the anoxic zone 2, which is conducive to biochemical reactions. The submerged fans 26 are fixed to the bottom of the anoxic zone 2 by guide rods. The submerged fans 26 are lifted out of the anoxic zone 2 by the guide rods during maintenance, without draining the water in the anoxic zone 2.

Claims

1. Integrated sewage treatment system, characterized in that: The main pool body comprises a square body, which comprises an anoxic zone, an oxidation ditch and four sedimentation zones from the inside to the outside. The anoxic zone and the oxidation ditch are both oblong. A first partition wall is provided between the anoxic zone and the oxidation ditch. The four sedimentation zones are respectively provided at the four top corners of the main pool body. A second partition wall is provided between the oxidation ditch and each sedimentation zone. The bottom of the anoxic zone is provided with a water inlet distribution pipe and a nitrification liquid return distribution pipe, and the nitrification liquid return distribution pipe is connected to the oxidation ditch through the nitrification liquid gas stripping device; The bottom and top of each sedimentation zone are respectively provided with a mud discharge port and a water production port. The mud discharge port connects the corresponding sedimentation zone with the oxidation ditch to discharge the sludge in the sedimentation zone into the oxidation ditch, and the water production port is used to output the produced water; A gas stripping zone is provided in the radial direction of the straight zone of the oxidation ditch, one end of the gas stripping zone is connected to the first isolation wall, and the other end is connected to the second isolation wall or the inner wall of the main tank body; The gas lift area includes a gas lift wall and a gas lift short wall which are parallel to each other. The top of the gas lift wall is higher than the liquid level of the oxidation ditch, and a water outlet is provided between the bottom and the bottom plate of the oxidation ditch. The top of the gas lift short wall is lower than the liquid level of the oxidation ditch, and the bottom is fixedly connected to the bottom plate of the oxidation ditch. A gas release device is provided between the gas lift wall and the gas lift short wall. The nitration liquid gas stripping device is arranged in a curved area close to the gas stripping area and close to the high wall of the gas stripping area. The nitration liquid gas stripping device comprises a water extraction pipe, a water delivery pipe and a gas delivery pipe. The top opening of the gas delivery pipe is above the liquid level of the oxidation ditch, the bottom opening is connected to the bottom of the water extraction pipe, the top of the water extraction pipe is connected to the upper part of the water delivery pipe, and the bottom of the water delivery pipe is connected to the nitration liquid return water distribution pipe. The straight area of ​​the oxidation ditch is provided with at least two layers of water guide plate groups, which are arranged up and down, and the water guide plate group includes two dividing plates and a flexible net rope between the dividing plates, and the dividing plates are rectangular; One side of a split plate is rotatably connected to the first partition wall, and the other side is connected to the net rope; one side of another split plate is rotatably connected to the inner wall of the main pool body, and the other side is connected to the net rope; each split plate uses the rotating connection as a fulcrum, and the side connected to the net rope as a free end, and rotates up and down, driving the net rope to move when rotating.

2. The integrated sewage treatment system according to claim 1, characterized in that: The water inlet distribution pipe of the anoxic zone is connected to the water inlet pipe, and the water inlet distribution pipe is used to uniformly input sewage into the anoxic zone. The nitrification liquid return water distribution pipe is located above the water inlet distribution pipe, and is used to uniformly input the return nitrification liquid from the oxidation ditch into the anoxic zone.

3. The integrated sewage treatment system according to claim 2, characterized in that: The height of the first partition wall is higher than the liquid level of the oxidation ditch, and the effluent in the anoxic zone overflows into the oxidation ditch through the first partition wall.

4. The integrated sewage treatment system according to claim 3, characterized in that: The oxidation ditch is in the shape of an oblong circle and has two opposite straight areas and two curved areas connected at both ends of the straight areas. A curved area of ​​the oxidation ditch is separated from the two precipitation areas by a second partition wall.

5. The integrated sewage treatment system according to claim 4, characterized in that: When the two split plates of the same water guide plate group rotate to a horizontal position, the sides of the connecting net rope do not touch each other, and a gap is left in the middle to prevent the split plates from bumping against each other during the rotation process; The water guide plate group is inclined as a whole, and is inclined toward the downstream direction of the water flow in the straight line area.

6. The integrated sewage treatment system according to claim 5, characterized in that: The sedimentation area has three sides, two of which are perpendicular to each other and are the pool walls of the main pool body, and the opposite side is the second partition wall; The top of the second partition wall is higher than the liquid level of the oxidation ditch and the sedimentation area, and a water inlet is provided in the middle of the second partition wall for inputting the treated water in the oxidation ditch into the sedimentation area; The lower part of the second partition wall is inclined toward the sedimentation area to form a sludge hopper. A sludge discharge port is provided at the bottom of the sludge hopper, and the sludge discharge port is higher than the bottom plate of the oxidation ditch.

7. The integrated sewage treatment system according to claim 6, characterized in that: A submerged fan is provided in the anoxic zone, and the air inlet of the submerged fan is located above the liquid surface in the anoxic zone; the submerged fan is connected to the aeration device of the oxidation ditch and the air supply pipe of the nitrification liquid gas stripping device to provide them with air and control the aeration volume of the oxidation ditch and the reflux volume of the nitrification liquid at the same time.

Images