A vacuum system and method for producing magnesium hydrogen
By using a secondary vacuum plus precipitation tank buffer structure and PLC control system in the production process of magnesium hydrogen, the problem of high loss and maintenance frequency of vacuum equipment is solved, and equipment protection and material loss are reduced.
Patent Information
- Application Number
- CN202211404202.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-11-10
- Publication Date
- 2025-08-19
- Estimated Expiration
- 2042-11-10
AI Technical Summary
During the traditional hydrogen magnesium production process, vacuum equipment is affected by the impeller and dust blocking the filter cloth, resulting in high equipment loss and maintenance frequency.
The secondary vacuum plus precipitation tank buffer structure is adopted, combined with the PLC control system, to control air volume and pressure, reduce dust entering the vacuum system, and protect the vacuum equipment.
It effectively reduces the loss of vacuum equipment, reduces maintenance frequency, reduces material loss, and avoids frequent filter cloth replacement.
Smart Images

Figure CN115837249B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of hydrogen magnesium production, and in particular to a vacuum pumping system and method used in the production process of hydrogen magnesium. Background Art
[0002] In the manufacturing process of hydrogen magnesium, the process pressures and gas media of evaporation and hydrogenation are different. Therefore, when switching the working mode, the cavity needs to be vacuumed. In addition, after the hydrogenation is completed, it is necessary to use protective other replacement to remove the hydrogen required for the reaction to prevent the residual hydrogen in the subsequent steps from accidentally igniting or exploding. Therefore, it is necessary to replace the protective gas with high-pressure hydrogen through vacuuming. The traditional direct extraction method causes a large amount of tiny particles of powder scattered in the equipment to impact the impeller, or enter the teeth of the screw, causing wear, which will cause great damage to the vacuum equipment. The traditional method uses filter cloth for filtration, which is prone to dust blockage and increases the frequency of equipment maintenance. Summary of the Invention
[0003] In order to solve the above technical problems, the present invention discloses a vacuum pumping system and method for the production process of hydrogen magnesium. The technical solution of the present invention is implemented as follows:
[0004] A vacuum pumping system for use in a magnesium hydrogen production process, comprising a reactor, a buffer sedimentation tank, a secondary buffer tank, an impeller vacuum pump, a screw negative pressure vacuum pump, an electrically controlled flow limiting valve, a first pressure sensor, a second pressure sensor, a filter, and a control box;
[0005] Wherein, the reactor is connected to the buffer sedimentation tank via a pipeline, and the electrically controlled flow limiting valve is provided on the pipeline between the reactor and the buffer sedimentation tank;
[0006] The screw negative pressure vacuum pump is connected to the secondary buffer tank through a pipeline, and a first solenoid valve is provided between the screw negative pressure vacuum pump and the secondary buffer tank;
[0007] The impeller vacuum pump is connected to the secondary buffer tank through a pipeline, and a second solenoid valve is provided between the impeller vacuum pump and the secondary buffer tank;
[0008] The secondary buffer tank is connected to the buffer sedimentation tank via a pipeline; the filter is arranged in the pipeline between the secondary buffer tank and the buffer sedimentation tank and is located inside the buffer sedimentation tank;
[0009] The first pressure sensor is installed on the top of the reactor;
[0010] The second pressure sensor is installed inside the buffer sedimentation tank;
[0011] A PLC control system is provided inside the control box;
[0012] The control box controls the reactor, the buffer sedimentation tank, the secondary buffer tank, the impeller vacuum pump, the screw negative pressure vacuum pump, the electronically controlled flow limiting valve, the first pressure sensor and the second pressure sensor through a PLC control system.
[0013] Preferably, the pipe opening inside the buffer sedimentation tank is connected to a first sedimentation baffle; and a dust collection pipe is provided below the first sedimentation baffle.
[0014] Preferably, a second sedimentation baffle is connected to the pipe opening inside the secondary buffer tank.
[0015] Preferably, an observation window is provided on the side of the secondary buffer tank.
[0016] A vacuuming method comprises the following steps:
[0017] S1, turn on the system;
[0018] S2, the PLC control system controls the second solenoid valve to open;
[0019] S3, the PLC control system controls the impeller vacuum pump to start working;
[0020] S4, when the reading of the second pressure sensor is -0.08MPa, the impeller vacuum pump stops working;
[0021] S5, the PLC control system controls the second solenoid valve to close and the electronically controlled flow limiting valve to open, and the gas in the reactor enters the buffer sedimentation tank due to the pressure difference;
[0022] S6, when the readings of the first pressure sensor and the second pressure sensor are equal, the pressures of the buffer sedimentation tank and the reactor are equal, and the gas stops flowing;
[0023] S7, the PLC control system controls the electric control flow limiting valve to close, and repeats steps S2-S6;
[0024] S8, when the electronically controlled flow limiting valve is fully opened and the first and second pressure sensors are both -0.08 MPa, close the second solenoid valve, open the first solenoid valve, and start the screw negative pressure vacuum pump to directly remove the remaining gas in the system;
[0025] S9, when the absolute pressure is 0.14-0.06Pa, the system stops running.
[0026] Preferably, the electrically controlled flow limiting valve controls the gas flow rate to ≤0.3 L / s.
[0027] The implementation of the technical solution of the present invention can solve the technical problems in the prior art that a large number of micro-nano-scale tiny particles and powders scattered in the equipment impact the impeller and screw, causing great damage to the vacuum equipment; the use of filter cloth for filtration easily causes dust blockage and also increases the frequency of equipment maintenance; the implementation of the technical solution of the present invention, through the structure of two-level vacuum plus sedimentation tank buffer, controls the air volume and pressure through the control system, reduces the dust entering the vacuum system, thereby protecting the vacuum equipment and greatly reducing the loss of dust to the vacuum equipment.
[0028] Reduce maintenance frequency and eliminate the need to frequently replace consumable parts such as filter cloth.
[0029] The technical effect is to reduce material loss during the production process by controlling the flow. BRIEF DESCRIPTION OF THE DRAWINGS
[0030] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only one embodiment of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0031] Identical components are denoted by the same reference numerals. It should be noted that the terms "front," "rear," "left," "right," "upper," and "lower" used in the following description refer to directions in the accompanying drawings, and the terms "bottom," "top," "inner," and "outer" refer to directions toward or away from the geometric center of a particular component, respectively.
[0032] Figure 1 It is a structural schematic diagram of the present invention;
[0033] Figure 2 It is a structural cross-sectional view of the present invention.
[0034] In the above drawings, the figure numbers represent:
[0035] Reactor
[0036] Buffer sedimentation tank
[0037] 2-1, first sedimentation baffle
[0038] 2-2, dust collection pipe
[0039] Secondary buffer tank
[0040] 3-1, Second sedimentation baffle
[0041] Impeller vacuum pump
[0042] Screw negative pressure vacuum pump
[0043] Electronically controlled flow limiting valve
[0044] First pressure sensor
[0045] Second pressure sensor
[0046] Filter
[0047] control box
[0048] First solenoid valve
[0049] Second solenoid valve
[0050] Observation window DETAILED DESCRIPTION
[0051] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention. Example
[0052] In a specific embodiment, Figure 1 and Figure 2 As shown, a vacuum pumping system and method for the production process of hydrogen magnesium include a reactor 1, a buffer sedimentation tank 2, a secondary buffer tank 3, an impeller vacuum pump 4, a screw negative pressure vacuum pump 5, an electrically controlled flow limiting valve 6, a first pressure sensor 7, a second pressure sensor 8, a filter 9 and a control box 10;
[0053] The reactor 1 is connected to the buffer sedimentation tank 2 through a pipeline, and the electric control flow limiting valve 6 is provided on the pipeline between the reactor 1 and the buffer sedimentation tank 2;
[0054] The screw negative pressure vacuum pump 5 is connected to the secondary buffer tank 3 through a pipeline, and a first solenoid valve 11 is provided between the screw negative pressure vacuum pump 5 and the secondary buffer tank 3;
[0055] The impeller vacuum pump 4 is connected to the secondary buffer tank 3 through a pipeline, and a second solenoid valve 12 is provided between the impeller vacuum pump 4 and the secondary buffer tank 3;
[0056] The secondary buffer tank 3 is connected to the buffer sedimentation tank 2 through a pipeline; the filter 9 is arranged in the pipeline between the secondary buffer tank 3 and the buffer sedimentation tank 2 and is located inside the buffer sedimentation tank 2;
[0057] The pipe opening inside the buffer sedimentation tank 2 is connected to the first sedimentation baffle 2-1; a dust collecting pipe 2-2 is provided below the first sedimentation baffle 2-1.
[0058] The pipe opening inside the secondary buffer tank 3 is connected to the second sedimentation baffle 3 - 1 .
[0059] An observation window 13 is provided on the side of the secondary buffer tank 3 .
[0060] The first pressure sensor 7 is installed on the top of the reactor 1;
[0061] The second pressure sensor 8 is installed inside the buffer sedimentation tank 2;
[0062] A PLC control system is provided inside the control box 10;
[0063] The control box 10 controls the reactor 1, the buffer sedimentation tank 2, the secondary buffer tank 3, the impeller vacuum pump 4, the screw negative pressure vacuum pump 5, the electronically controlled flow limiting valve 6, the first pressure sensor 7 and the second pressure sensor 8 through the PLC control system.
[0064] In this embodiment, the electrically controlled flow limiting valve 6, the first solenoid valve 11, and the second solenoid valve 12 are initially in a closed state, and each structure is isolated;
[0065] After the control box 10 is turned on, the environment is automatically calibrated through the first pressure sensor 7 and the second pressure sensor 8. Each device feeds back its status to the control box 10, and the system enters a standby state.
[0066] The vacuuming method of this embodiment is as follows:
[0067] S1, turn on the system;
[0068] S2, the control box 10 controls the second solenoid valve 12 to open through the PLC control system;
[0069] S3, the PLC control system controls the impeller vacuum pump 4 to start working, and removes the gas in the buffer sedimentation tank 2 and the secondary buffer tank 3;
[0070] S4, when the reading of the second pressure sensor 8 is -0.08 MPa, the impeller vacuum pump 4 stops working;
[0071] In step S5, the PLC control system controls the second solenoid valve 12 to close and the electronically controlled flow limiting valve 6 to open. The gas in the reactor 1 enters the buffer sedimentation tank 2 due to the pressure difference. At this time, the electronically controlled flow limiting valve 6 controls the gas flow rate to ≤0.3L / s to reduce the dust caused by the gas circulation.
[0072] S6, the pressure in the reactor 1 gradually decreases, and the pressure in the buffer sedimentation tank 2 gradually increases; when the readings of the first pressure sensor 7 and the second pressure sensor 8 are equal, the pressures in the buffer sedimentation tank 2 and the reactor 1 are equal, and the gas stops flowing;
[0073] S7, the PLC control system controls the electronically controlled flow limiting valve 6 to close, and repeats steps S2-S6;
[0074] S8, when the electronically controlled flow limiting valve 6 is fully opened and the first pressure sensor 7 and the second pressure sensor 8 are both -0.08 MPa, the second solenoid valve 12 is closed, the first solenoid valve 11 is opened, and the screw negative pressure vacuum pump 5 is started to directly remove the remaining gas in the system;
[0075] S9, at this time, because there are very few gas molecules in the system, the airflow generated is not enough to carry the material, and the absolute pressure reaches ≈0.05pa, completing the vacuum extraction work and the system stops running.
[0076] Absolute pressure = reading of the first pressure gauge + atmospheric pressure.
[0077] The advantages of the present invention are as follows:
[0078] The use of double sedimentation tanks effectively solves the problem of dust damage to vacuum equipment.
[0079] The secondary buffer tank 3 is designed with an observation port to facilitate equipment maintenance and inspection.
[0080] The buffer sedimentation tank 2 and the secondary buffer tank 3 are both provided with sedimentation baffles to effectively prevent dust from flying.
[0081] It should be pointed out that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.
Claims
1. A vacuum pumping system for use in the production process of magnesium hydrogen, characterized in that: It includes a reactor, a buffer sedimentation tank, a secondary buffer tank, an impeller vacuum pump, a screw negative pressure vacuum pump, an electronically controlled flow limiting valve, a first pressure sensor, a second pressure sensor, a filter and a control box; in, The reactor is connected to the buffer sedimentation tank via a pipeline, and the electrically controlled flow limiting valve is provided on the pipeline between the reactor and the buffer sedimentation tank; The screw negative pressure vacuum pump is connected to the secondary buffer tank through a pipeline, and a first solenoid valve is provided between the screw negative pressure vacuum pump and the secondary buffer tank; The impeller vacuum pump is connected to the secondary buffer tank through a pipeline, and a second solenoid valve is provided between the impeller vacuum pump and the secondary buffer tank; The secondary buffer tank is connected to the buffer sedimentation tank via a pipeline; the filter is arranged in the pipeline between the secondary buffer tank and the buffer sedimentation tank and is located inside the buffer sedimentation tank; The first pressure sensor is installed on the top of the reactor; The second pressure sensor is installed inside the buffer sedimentation tank; A PLC control system is provided inside the control box; The control box controls the reactor, the buffer sedimentation tank, the secondary buffer tank, the impeller vacuum pump, the screw negative pressure vacuum pump, the electronically controlled flow limiting valve, the first pressure sensor, and the second pressure sensor through a PLC control system; The pipe opening inside the buffer sedimentation tank is connected to a first sedimentation baffle; a dust collection pipe is provided below the first sedimentation baffle; The pipe opening inside the secondary buffer tank is connected to a second sedimentation baffle; An observation window is provided on the side of the secondary buffer tank.
2. A vacuuming method for a vacuuming system used in a magnesium hydrogen production process according to claim 1, characterized in that: The steps are as follows: S1, turn on the system; S2, the PLC control system controls the second solenoid valve to open; S3, the PLC control system controls the impeller vacuum pump to start working; S4, when the reading of the second pressure sensor is -0.08MPa, the impeller vacuum pump stops working; S5, the PLC control system controls the second solenoid valve to close and the electronically controlled flow limiting valve to open, and the gas in the reactor enters the buffer sedimentation tank due to the pressure difference; S6, when the readings of the first pressure sensor and the second pressure sensor are equal, the pressures of the buffer sedimentation tank and the reactor are equal, and the gas stops flowing; S7, the PLC control system controls the electric control flow limiting valve to close, and repeats steps S2-S6; S8, when the electronically controlled flow limiting valve is fully opened and the first and second pressure sensors are both -0.08 MPa, close the second solenoid valve, open the first solenoid valve, and start the screw negative pressure vacuum pump to directly remove the remaining gas in the system; S9, when the absolute pressure is 0.14-0.06Pa, the system stops running.
3. The vacuuming method according to claim 2, characterized in that: In step S5, the electronically controlled flow limiting valve controls the gas flow rate to be ≤0.3 L / s.
Citation Information
Patent Citations
Vacuum variable-pressure buffering device for food processing
CN103340474A
Negative pressure control system
CN214131558U