A flotation method for high-silicon copper oxide ore

Abstract

A flotation method for high-silicon copper oxide ore employs a closed-circuit grinding process. The ore is ground in a ball mill to a 200-mesh content of 65-70% and a grinding concentration of 78-82%. The ore is then stirred in a roughing mixing tank for 20 minutes. The stirred slurry is fed into a roughing flotation machine, where the roughing flotation concentration is controlled at 30%-35%. A single roughing flotation process produces a copper concentrate with a copper grade between 5% and 8%. The resulting copper concentrate is then fed into a concentrating flotation machine. After three rounds of concentrating, a qualified copper concentrate with a copper metal grade greater than 17% is produced, achieving a copper recovery rate greater than 70%. The flotation process is characterized by stable foam properties, enabling simultaneous flotation of copper oxide ore and some non-copper oxide minerals, significantly improving copper metal recovery.

Description

Technical Field

[0001] The invention relates to the technical field of ore dressing production, in particular to a flotation method for high-silicon copper oxide ore. Background Art

[0002] The mine adopts open-pit mining. The surface ore stripped from the mine is low-grade copper oxide ore. The surface ore is single copper oxide ore. The remaining ore reserves are about 60×10 4 Sampling and analysis revealed a raw copper grade of 0.65-1.0%. This design assumes a copper grade of 0.85%. Under supergene conditions, the oxidized ore, after weathering and leaching, exhibits a light yellowish-green, khaki, and yellowish-brown coloration, with a loose texture. The ore structure is primarily cryptocrystalline with a fibrous radial structure, followed by an anhedral granular structure. The ore texture is primarily film-like and vein-like, with a secondary star-shaped disseminated structure. The oxidized ore is composed of chrysocolla, with minor amounts of covellite, azurite, and malachite, along with gangue minerals such as garnet, epidote, diopside, chlorite, quartz, and calcite. It has a loose texture and well-developed secondary fractures. Chrysocolla is bluish-green in color. It occurs as film, vein, or irregular granular formations along fractures or interstices, often associated with limonite. Chrysocolla, malachite, and limonite are altered from primary sulfides such as chalcopyrite, bornite, and pyrite. Its alteration characteristics are mainly skarnization, namely epidote, garnetization, and penta-calcium pyroxitization.

[0003] At present, most copper oxide ores are processed using the acid leaching-replacement process. However, this technology causes great environmental pollution and concentrated sulfuric acid is explosive. It is a controlled item that is difficult to purchase in many areas, and the operation risk for workers is high. Summary of the Invention

[0004] The present invention aims to address the shortcomings and deficiencies of existing technologies by providing a flotation method for high-silicon copper oxide ores. This method can address a number of issues related to the flotation process, including poor adaptability, high reagent costs, and low metal recovery.

[0005] To achieve the above object, the present invention provides a flotation method for high-silicon copper oxide ore, which is characterized by comprising the following steps: step 1: adding 500-700 g / t of sodium sulfide and 500-700 g / t of ammonium sulfate to the feed port of a ball mill, grinding the ore to a -200 mesh content of 65-70% and a grinding concentration of 78-82%; step 2: adding 150-190 g / t of butyl xanthate, 20-40 g / t of 2# oil, 400-600 g / t of sodium carbonate, 10-20 g / t of acrylic acid, and 20-30 g / t of sodium lignosulfonate to a roughing mixing barrel, and stirring for 20-30 minutes; step 3: feeding the slurry stirred in step 2 into a roughing flotation machine, and adding 110-200 g / t of activator T-17S, 60-100 g / t of sodium sulfide, and 5-10 g / t of dispersant. g / t, the rough flotation concentration is controlled at 30%-35%, and a copper rough concentrate with a copper grade of 5%-8% is produced after a copper roughing process; step 4: the copper rough concentrate produced in step 3 is fed into a fine flotation machine I, and an activator T-17S 50-80 g / t and a butyl xanthate 40-60 g / t are added, and the fine concentration is controlled at 20-28%. After three copper fine separations, a qualified copper concentrate with a copper metal grade greater than 17% is produced, and a copper recovery rate is greater than 70%.

[0006] In the technical solution of the flotation method of a high-silicon copper oxide ore of the present invention, a further preferred technical solution feature is:

[0007] 1. In step 1, add 500g / t of sodium sulfide and 500g / t of ammonium sulfate, grind the ore to a -200 mesh content of 65% and a grinding concentration of 78%;

[0008] 2. In step 1, add 700 g / t of sodium sulfide and 700 g / t of ammonium sulfate, grind the ore to a -200 mesh content of 70% and a grinding concentration of 82%;

[0009] 3. In step 1, add 600 g / t of sodium sulfide and 600 g / t of ammonium sulfate, grind the ore to a -200 mesh content of 68% and a grinding concentration of 80%;

[0010] 4. In step 2, 150 g / t of butyl xanthate, 20 g / t of 2# oil, 400 g / t of sodium carbonate, 10 g / t of acrylic acid, and 20 g / t of sodium lignosulfonate were added and stirred for 20 minutes;

[0011] 5. In step 2, 190 g / t of butyl xanthate, 40 g / t of 2# oil, 600 g / t of sodium carbonate, 20 g / t of acrylic acid, and 30 g / t of sodium lignosulfonate were added and stirred for 30 minutes;

[0012] 6. In step 2, 170 g / t of butyl xanthate, 30 g / t of 2# oil, 500 g / t of sodium carbonate, 15 g / t of acrylic acid, and 25 g / t of sodium lignosulfonate were added and stirred for 30 minutes;

[0013] 7. In step 3, the activator T-17S is 115 g / t, the sodium sulfide is 80 g / t, and the dispersant is 8 g / t. The roughing flotation concentration is controlled at 35%;

[0014] 8. In step 4, 70 g / t of activator T-17S and 50 g / t of butyl xanthate were added, and the concentration was controlled at 28%.

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows: DETAILED DESCRIPTION

[0016] The following is a clear and complete description of the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of them. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts are within the scope of protection of the present invention.

[0017] Example 1, a flotation method for high-silicon copper oxide ore, comprising the following steps: Step 1: adding 500-700 g / t of sodium sulfide and 500-700 g / t of ammonium sulfate to the feed port of the ball mill, grinding the ore to a -200 mesh content of 65-70% and a grinding concentration of 78-82%; Step 2: adding 150-190 g / t of butyl xanthate, 20-40 g / t of 2# oil, 400-600 g / t of sodium carbonate, 10-20 g / t of acrylic acid, and 20-30 g / t of sodium lignosulfonate to a roughing mixing barrel, and stirring for 20-30 minutes; Step 3: feeding the slurry stirred in Step 2 into a roughing flotation machine, and adding 110-200 g / t of activator T-17S, 60-100 g / t of sodium sulfide, and 5-10 g / t of dispersant. g / t, the roughing flotation concentration is controlled at 30%-35%, and after a copper roughing, a copper concentrate with a copper grade between 5% and 8% is produced; Step 4: The copper concentrate produced in Step 3 is fed to the concentrating flotation machine I, and activator T-17S 50-80 g / t and butyl xanthate 40-60 g / t are added. The concentration is controlled at 20-28%. After three copper concentrating, a qualified copper concentrate with a copper metal grade greater than 17% is produced, and the copper recovery rate is greater than 70%. The dosage of the above-mentioned reagents can be appropriately adjusted according to the grade of the original ore. The present invention controls the pH value of the flotation operation by the dosage of sodium sulfide, and the pH value of the entire flotation operation pulp is controlled at 9-9.5. The original ore contains a copper grade of 0.8-1.2 and a chrysocolla content greater than 50%.

[0018] Example 2, in the flotation method of high-silicon copper oxide ore according to Example 1, 500 g / t of sodium sulfide and 500 g / t of ammonium sulfate are added in step 1, and the ore is ground to a -200 mesh content of 65% and a grinding concentration of 78%.

[0019] Example 3, in the flotation method of high-silicon copper oxide ore according to Example 1 or 2, 700 g / t of sodium sulfide and 700 g / t of ammonium sulfate are added in step 1, and the ore is ground to a -200 mesh content of 70% and a grinding concentration of 82%.

[0020] Example 4, in the flotation method of high-silicon copper oxide ore according to any one of Examples 1-3, 600 g / t of sodium sulfide and 600 g / t of ammonium sulfate are added in step 1, and the ore is ground to a -200 mesh content of 68% and a grinding concentration of 80%.

[0021] Example 5, in the flotation method of high-silicon copper oxide ore according to any one of Examples 1-4, 150 g / t of butyl xanthate, 20 g / t of 2# oil, 400 g / t of sodium carbonate, 10 g / t of acrylic acid, and 20 g / t of sodium lignosulfonate are added in step 2, and the mixture is stirred for 20 minutes.

[0022] Example 6, in the flotation method of high-silicon copper oxide ore according to any one of Examples 1-5, in step 2, 190 g / t of butyl xanthate, 40 g / t of 2# oil, 600 g / t of sodium carbonate, 20 g / t of acrylic acid, and 30 g / t of sodium lignosulfonate are added, and the mixture is stirred for 30 minutes.

[0023] Example 7, in the flotation method of high-silicon copper oxide ore according to any one of Examples 1-6, in step 2, 170 g / t of butyl xanthate, 30 g / t of 2# oil, 500 g / t of sodium carbonate, 15 g / t of acrylic acid, and 25 g / t of sodium lignosulfonate are added, and the mixture is stirred for 30 minutes.

[0024] Example 8, in the flotation method of high-silicon copper oxide ore according to any one of Examples 1-7, in step 3, the activator T-17S is 115 g / t, the sodium sulfide is 80 g / t, and the dispersant is 8 g / t, and the roughing flotation concentration is controlled at 35%.

[0025] Example 9, in the flotation method for high-silicon copper oxide ore according to any one of Examples 1-8, 70 g / t of activator T-17S and 50 g / t of butyl xanthate are added in step 4, and the concentration is controlled at 28%.

[0026] Example 10: High silicon copper oxide with a copper content of 0.82% and an oxidation rate of 78%. The following steps are used:

[0027] Step 1: Use a closed-circuit grinding process, add 500g / t of sodium sulfide and 500g / t of ammonium sulfate at the feed port of the ball mill, grind the ore to a -200 mesh content of 65%, a grinding concentration of 78%-82%, and a pulp pH of 9.

[0028] Step 2: Add 170 g / t of butyl xanthate, 30 g / t of 2# oil, 500 g / t of sodium carbonate, 10 g / t of acrylic acid, and 20 g / t of sodium lignosulfonate to the roughing mixing barrel and stir for 20 minutes;

[0029] Step 3: Feed the qualified slurry stirred in step 2 into the roughing flotation machine, and add activator T-17S 110 g / t, sodium sulfide 80 g / t, and dispersant 5 g / t into the roughing feed box. The roughing flotation concentration is controlled at 30%-35%, and the slurry pH value is 9.5. After one copper roughing, a copper concentrate with a copper grade of 5.6% is produced;

[0030] Step 4: The copper rough concentrate produced in step 3 is fed into the Concentrator I flotation machine, and activator T-17S 50g / t and butyl xanthate 50g / t are added to the Concentrator I feed box. The concentration is controlled between 20% and 28%. After three copper concentrating operations, the copper concentrate grade is 17.2%, and the copper metal recovery rate is 70.42%.

[0031] Example 11: A high-silicon copper oxide with a copper content of 1.07% and an oxidation rate of 82% was prepared using the following steps:

[0032] Step 1: Use a closed-circuit grinding process, add 600g / t of sodium sulfide and 600g / t of ammonium sulfate at the feed port of the ball mill, grind the ore to a -200 mesh content of 70%, a grinding concentration of 78%-82%, and a pulp pH value of 9.5.

[0033] Step 2: Add 170 g / t of butyl xanthate, 30 g / t of 2# oil, 500 g / t of sodium carbonate, 15 g / t of acrylic acid, and 25 g / t of sodium lignosulfonate to the roughing mixing barrel and stir for 20 minutes;

[0034] Step 3: Feed the qualified slurry stirred in step 2 into the roughing flotation machine, and add activator T-17S 160 g / t, sodium sulfide 80 g / t, and dispersant 8 g / t into the roughing feed box. The roughing flotation concentration is controlled at 30%-35%, and the slurry pH value is 9.5. After one copper roughing, a copper concentrate with a copper grade of 6.5% is produced;

[0035] Step 4: The copper rough concentrate produced in step 3 is fed into the Concentrator I flotation machine, and activator T-17S 60g / t and butyl xanthate 50g / t are added to the Concentrator I feed box. The concentration is controlled between 20% and 28%. After three copper concentrating operations, the copper concentrate grade is 17.5%, and the copper metal recovery rate is 72.45%.

[0036] Example 12: A high-silicon copper oxide with a copper content of 1.18% and an oxidation rate of 85% was prepared using the following steps:

[0037] Step 1: Use a closed-circuit grinding process, add 700g / t of sodium sulfide and 700g / t of ammonium sulfate at the feed port of the ball mill, grind the ore to a -200 mesh content of 65%, a grinding concentration of 78%-82%, and a pulp pH value of 9.5.

[0038] Step 2: Add 170 g / t of butyl xanthate, 30 g / t of 2# oil, 500 g / t of sodium carbonate, 20 g / t of acrylic acid, and 30 g / t of sodium lignosulfonate to the roughing mixing barrel and stir for 20 minutes;

[0039] Step 3: Feed the qualified slurry stirred in step 2 into the roughing flotation machine, and add activator T-17S 200 g / t, sodium sulfide 80 g / t, and dispersant 10 g / t into the roughing feed box. The roughing flotation concentration is controlled at 30%-35%, and the slurry pH value is 9.5. After a copper roughing, a copper concentrate with a copper grade of 7.5% is produced.

[0040] Step 4: The copper rough concentrate produced in step 3 is fed into the Concentrator I flotation machine, and activator T-17S 80g / t and butyl xanthate 50g / t are added to the Concentrator I feed box. The concentration is controlled between 20% and 28%. After three copper concentrating operations, the copper concentrate grade is 17.5%, and the copper metal recovery rate is 72.88%.

[0041] The above is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes based on the technical solution and invention concept of the present invention within the scope disclosed by the present invention, which falls within the scope of protection of the present invention.

Claims

1. A flotation method for high-silicon copper oxide ore, characterized in that: The steps include: Step 1: Add 500-700g / t of sodium sulfide and 500-700g / t of ammonium sulfate to the feed port of the ball mill, grind the ore to a -200 mesh content of 65-70% and a grinding concentration of 78-82%; Step 2: Add 150-190 g / t of butyl xanthate, 20-40 g / t of No. 2 oil, 400-600 g / t of sodium carbonate, 10-20 g / t of acrylic acid, and 20-30 g / t of sodium lignosulfonate to the roughing mixing tank and stir for 20-30 minutes; Step 3: Feed the slurry stirred in step 2 into a roughing flotation machine, and add activator T-17S 110-200 g / t, sodium sulfide 60-100 g / t, and dispersant 5-10 g / t. The roughing flotation concentration is controlled at 30%-35%. After a copper roughing process, a copper concentrate with a copper grade of 5%-8% is produced. Step 4: The copper rough concentrate produced in step 3 is fed into the flotation machine I, and activator T-17S 50-80 g / t and butyl xanthate 40-60 g / t are added. The concentration is controlled at 20-28%. After three copper concentrations, a qualified copper concentrate with a copper metal grade greater than 17% is produced, and the copper recovery rate is greater than 70%.

2. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In the step 1, 500 g / t of sodium sulfide and 500 g / t of ammonium sulfate are added, and the ore is ground to a -200 mesh content of 65% and a grinding concentration of 78%.

3. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In the step 1, 700 g / t of sodium sulfide and 700 g / t of ammonium sulfate are added, and the ore is ground to a -200 mesh content of 70% and a grinding concentration of 82%.

4. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In the step 1, 600 g / t of sodium sulfide and 600 g / t of ammonium sulfate are added, and the ore is ground to a -200 mesh content of 68% and a grinding concentration of 80%.

5. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In the step 2, 150 g / t of butyl xanthate, 20 g / t of 2# oil, 400 g / t of sodium carbonate, 10 g / t of acrylic acid, and 20 g / t of sodium lignosulfonate were added and stirred for 20 minutes.

6. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In the step 2, 190 g / t of butyl xanthate, 40 g / t of 2# oil, 600 g / t of sodium carbonate, 20 g / t of acrylic acid, and 30 g / t of sodium lignosulfonate were added and stirred for 30 minutes.

7. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In the step 2, 170 g / t of butyl xanthate, 30 g / t of 2# oil, 500 g / t of sodium carbonate, 15 g / t of acrylic acid, and 25 g / t of sodium lignosulfonate were added and stirred for 30 minutes.

8. The flotation method of a high-silicon copper oxide ore according to claim 1, characterized in that: In step 3, the activator T-17S is 115 g / t, the sodium sulfide is 80 g / t, and the dispersant is 8 g / t. The roughing flotation concentration is controlled at 35%.

9. The flotation method of high-silicon copper oxide ore according to claim 1, characterized in that: In the step 4, 70 g / t of activator T-17S and 50 g / t of butyl xanthate were added, and the concentration was controlled at 28%.