Method for adjusting the length of target baffles to ensure uniform thickness of glass film layer

Abstract

The present invention discloses a method for adjusting the length of target material baffles to ensure the uniformity of glass film thickness. The glass is magnetron sputtered and coated with the current baffle length. After coating, the reflectivity of the film layer is detected and analyzed, and the baffles are adjusted according to the analysis results. After adjusting the baffles of each target material, a new white glass is used for coating, and a color difference detection is performed on it. If the color difference ΔE is less than 3, it means that the adjustment of the baffles is appropriate. If the color difference ΔE is greater than 3, it means that the uniformity of the film layer is unqualified. At this time, the reflectivity of the film layer of the second coated white glass is detected and analyzed, and each baffle is adjusted again according to the analysis results. After the baffles are adjusted, the third white glass is used for coating, and ΔE is detected again to see if it is less than 3. Through the target material baffle length adjustment method of the present invention, the length of each baffle of the target material can be accurately and reasonably adjusted according to the detection data, which greatly reduces the difficulty of operation and improves production efficiency.

Description

Technical Field

[0001] The invention relates to the technical field of glass coating, and in particular to a method for adjusting the use length of a target material baffle for ensuring the uniformity of the thickness of a glass film layer. Background Art

[0002] When the cover glass is magnetron sputtered, the uniformity of the film thickness is very important. Poor uniformity of the film thickness will lead to inconsistency between the film characteristics and the design, and thus the desired glass performance cannot be achieved. Among them, the uniformity of the film thickness refers to the situation where the film thickness changes with the position on the substrate surface. The uniformity of the film thickness is related to many factors. The commonly used method to adjust the uniformity of the film thickness is to adjust the length of the baffle of the coating target material, so as to adjust the thickness of the film layer at different positions of the glass by adjusting the amount of the baffle blocking the target material, so as to achieve a uniform film thickness for the entire glass. Among them, the use status of the baffle is as follows: Figure 1 As shown, a fixing rod is arranged on one side of the cylindrical target material, and a screw hole is provided on the fixing rod. The baffle bar is fixed on the fixing rod by screws passing through the screw holes. The baffle bar does not contact the target material. The baffle bar can be moved left and right by loosening the screws, and the use length of the baffle bar can be adjusted to increase or decrease the shielding of the target material by each baffle bar.

[0003] There are two situations where the length of the baffle needs to be adjusted: the first situation is to replace the old baffle with a new one, and the length of the replaced baffle needs to be readjusted to ensure the uniformity of the thickness of the glass film layer; the second situation is to change the model of the glass product produced. The model change means that the size, shape, etc. of the product have changed, and the length of the baffle needs to be readjusted to ensure the uniformity of the thickness of the glass film layer. The current method for adjusting the length of the baffle is usually to refer to the Lab value and color of the coated glass, and roughly adjust the position of the baffle based on experience. This method of adjusting the length of the baffle is not accurate enough, and only experienced workers can do it. The number of adjustments and time are generally long, which is inefficient. Summary of the invention

[0004] The technical problem to be solved by the present invention is: to overcome the shortcomings of the prior art and provide a method for adjusting the length of target material baffles to ensure the uniformity of the thickness of the glass film layer. The length of each baffle of the target material can be adjusted accurately and reasonably according to the detection data. The operator does not need rich experience to complete it, which greatly reduces the difficulty of operation and improves production efficiency.

[0005] The technical solution of the present invention is:

[0006] The method for adjusting the length of a target material baffle to ensure uniform thickness of a glass film layer comprises the following steps:

[0007] S1 selects white glass of the same model and size as the cover glass, marks the upper marking points at intervals from top to bottom along the length direction of the edge of the white glass, and the interval between adjacent marking points is the width of the barrier strip; magnetron sputtering coating is performed on the white glass at the current barrier strip length;

[0008] The marking points at the edge of the glass divide the entire piece of glass into sections. Since the spacing between the marking points is the width of the baffle, each area on the glass corresponds to a baffle. In this way, the reflectivity curve of each marking point obtained by subsequent detection can reflect the film thickness of the area blocked by each baffle after coating, and finally determine how to adjust the length of each baffle.

[0009] S2 measures the reflectivity curves of all marked points on the white glass at 400-700nm. All reflectivity curves form a spectrum curve graph, and the reflectivity curve in the middle is selected in the spectrum curve graph;

[0010] The centered reflectivity curve refers to the reflectivity curve located in the middle position among all the reflectivity curves in the spectral curve diagram. In actual operation, the reflectivity curve roughly located in the middle can be selected by visual observation, and the curve does not need to be the most middle curve; the purpose of this is that the reflectivity curve in the middle position represents the film layer with an intermediate thickness among the film layers at different positions of the glass. The centered reflectivity curve is selected so that in subsequent work, the thickness value can be expanded up and down based on the thickness of the film layer as a reference, and the thickness-reflectivity function relationship can be constructed with a gradient. Therefore, the thickness value expanded up and down based on the thickness of the film layer at the intermediate level can represent the thickness level of the film layer on the entire glass.

[0011] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness d reflected by the reflectivity curve, and expands at least two thickness values ​​in a larger and smaller direction based on the actual film thickness, with an expansion interval of Δd; simulates the reflectivity curves under the actual film thickness and the expanded film thickness through the film system design software TFC, and selects a wavelength value between the peaks and valleys where these reflectivity curves intersect;

[0012] The reason why a wavelength value is selected between the intersecting peaks and valleys in these reflectivity curves is that the difference in film thickness at different locations is an objective value, but when measured at certain wavelength values, these thickness differences cannot be reflected (that is, the difference in reflectivity values ​​is not large). Therefore, it is necessary to select a wavelength value between 400-700nm that can sensitively and accurately reflect the difference in film thickness at different locations, so that subsequent calculations can be performed.

[0013] S4 records the reflectivity values ​​corresponding to these reflectivity curves at the wavelength value selected in step S3, and obtains the functional relationship between reflectivity and thickness by taking the reflectivity value as X and the thickness value as Y;

[0014] S5, according to all the reflectivity curves obtained in step S2, obtain the reflectivity values ​​corresponding to the wavelength value selected in step S3, and according to the functional relationship between reflectivity and thickness obtained in step S4, calculate the film thickness values ​​corresponding to all the reflectivity curves at the wavelength value selected in step S3;

[0015] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 350-450mm;

[0016] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material;

[0017] S8 After all the baffle lengths are adjusted, select white glass of the same model and size, and perform magnetron sputtering coating on the white glass at the adjusted baffle length; after coating, detect the color difference ΔE of the white glass, if ΔE < 3, it means that the film thickness on the cover glass is uniform; otherwise, it means that the film thickness on the cover glass is uneven, and it is necessary to repeat steps S1-S6 and continue to adjust the baffle length until the color difference ΔE of the coated white glass is < 3.

[0018] Preferably, in step S3, two thickness values ​​are expanded in a larger direction and a smaller direction based on the actual film thickness, and the expansion interval is 1 nm.

[0019] Preferably, in step S6, the length of the barrier strip that needs to be adjusted for each 1% difference in film thickness is set to 400 mm.

[0020] Preferably, in step S8, the color difference is calculated as ΔE=sqrt(Δ 2 a * +Δ 2 b * +Δ 2 Y * ), where Δ Y * 、a * , b * is the parameter in CIE color space, where Y* represents brightness, a * , b * Represents chromaticity, For all Y * The average value of For all a * The average value of For all b * The average value of the value; in the formula, Δa * , Δb * , ΔY * The maximum absolute value of each difference is taken.

[0021] Compared with the prior art, the present invention has the following beneficial effects:

[0022] The target material baffle length adjustment method of the present invention first conducts an experiment on a production line using white glass, and magnetron sputtering coating is performed on the glass with the current baffle length. After coating, the reflectivity of the film layer is detected and analyzed, and the baffle adjustment is determined based on the analysis results. After adjusting the baffles of each target material according to the above method, magnetron sputtering coating is performed on a new white glass, and the film layer is tested for color difference. If the color difference ΔE is less than 3, it means that the uniformity of the film layer is qualified, that is, the baffle adjustment is appropriate. If the color difference ΔE is greater than 3, it means that the uniformity of the film layer is unqualified, that is, the baffle adjustment is inappropriate. At this time, the reflectivity of the film layer of the second coated white glass is detected and analyzed again, and each baffle is adjusted again based on the analysis results. After the baffles of each target material are adjusted, the third white glass is used for coating, and ΔE is tested again to see if it is less than 3. And so on, until the ΔE of the coated glass is less than 3. The method of the present invention can accurately and reasonably adjust the length of each baffle bar of the target material according to the detection data, and the operator does not need rich experience to complete it, which greatly reduces the operating difficulty and improves the production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the use status of the baffle of the present invention.

[0024] Figure 2 It is a functional relationship diagram of the reflectivity and film thickness obtained in step S4 when the niobium oxide film is plated in Example 1 of the present invention.

[0025] Figure 3 It is a functional relationship diagram of the reflectivity and film thickness obtained in step S4 when the silicon dioxide film is plated in Example 1 of the present invention.

[0026] Figure 4 It is a functional relationship diagram of the reflectivity and film thickness obtained in step S4 when the niobium oxide film is plated in Example 2 of the present invention.

[0027] Figure 5It is a functional relationship diagram of the reflectivity and film thickness obtained in step S4 when the silicon dioxide film is plated in Example 2 of the present invention.

[0028] Figure 6 It is a functional relationship diagram of the reflectivity and film thickness obtained in step S4 when the niobium oxide film is plated in Example 3 of the present invention.

[0029] Figure 7 It is a functional relationship diagram of the reflectivity and film thickness obtained in step S4 when the silicon dioxide film is plated in Example 3 of the present invention.

[0030] In the figure, 1. target material; 2. fixing rod; 3. stop bar; 4. screw. DETAILED DESCRIPTION

[0031] In order to enable persons skilled in the art to better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention.

[0032] In the following embodiments, when coating glass, a niobium oxide target and a silicon dioxide target are used to coat the glass with niobium oxide and silicon dioxide film layers in sequence as an example for explanation.

[0033] Example 1

[0034] When replacing a new type of glass product on the production line, it is necessary to adjust the length of the stop bars of the niobium oxide target and the silicon dioxide target in the coating machine. The adjustment method is as follows:

[0035] (1) Niobium oxide coating

[0036] S1 selects white glass of the same size as the cover glass to be coated, with a length of 88.5 cm, and marks 59 points along the length direction from top to bottom at the edge of the white glass, with the interval between adjacent points being 1.5 cm of the bar width; magnetron sputtering coating is performed on the white glass at the current bar length;

[0037] S2 measures the reflectivity curves of all the marked points on the white glass at 400-700nm. All the reflectivity curves form a spectrum curve graph. In the spectrum curve graph, the reflectivity curve in the middle is selected (the reflectivity curve corresponds to the 30th marked point on the glass from top to bottom). The data is shown in Table 1:

[0038] Table 1

[0039] 400 18.72 550 33.38 410 21.04 560 33.47 420 23.15 570 33.53 430 24.96 580 33.52 440 26.59 590 33.48 450 27.95 600 33.44 460 29.11 610 33.35 470 29.95 620 33.23 480 30.77 630 33.09 490 31.43 640 32.94 500 31.97 650 32.78 510 32.44 660 32.56 520 32.80 670 32.40 530 33.01 680 32.19 540 33.24 690 32.01 700 31.77

[0040] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness of 66.42nm when the theoretical coating thickness is set to 80nm at the position, and takes the actual film thickness as the middle value, expands two thickness values ​​in the larger and smaller directions, and the expansion interval is 1nm, that is, the five film thicknesses are 64.42nm, 65.42nm, 66.42nm, 67.42nm, and 68.42nm respectively; simulates the reflectivity curves of the five film thicknesses through the film system design software TFC, and selects a wavelength value of 450nm between the peaks and valleys where the five reflectivity curves intersect;

[0041] S4 records the reflectivity values ​​corresponding to the five reflectivity curves at a wavelength of 450 nm (as shown in Table 2), and uses the reflectivity value as X and the thickness value as Y to obtain the functional relationship between reflectivity (%) and thickness (nm) (as shown in Table 2). Figure 2 shown);

[0042] Table 2

[0043] 450nm reflectivity thickness 29.5264 64.42 28.7048 65.42 27.8489 66.42 26.9610 67.42 26.0438 68.42

[0044] S5 obtains the reflectivity values ​​corresponding to the reflectivity curves at a wavelength of 450 nm according to all the reflectivity curves obtained in step S2, and calculates the film thickness values ​​corresponding to all the reflectivity curves at a wavelength of 450 nm according to the functional relationship between the reflectivity and thickness obtained in step S4, as shown in Table 3:

[0045] Table 3

[0046] 450nm reflectivity x Thickness 450nm reflectivity x Thickness 27.68 66.63 27.54 66.79 27.95 66.32 28.03 66.23 27.17 67.21 28.04 66.22 27.10 67.28 28.14 66.10 27.88 66.40 28.09 66.16 27.89 66.39 28.09 66.16 27.98 66.29 28.09 66.16 28.00 66.26 28.08 66.17 28.01 66.25 28.02 66.24 27.98 66.29 28.02 66.24 27.99 66.27 28.03 66.23 27.95 66.32 28.02 66.24 27.99 66.27 28.04 66.22 27.98 66.29 28.03 66.23 27.96 66.31 28.00 66.26 27.93 66.34 28.00 66.26 27.92 66.36 28.00 66.26 27.92 66.36 27.94 66.33 27.90 66.38 27.98 66.29 27.87 66.41 27.92 66.36 27.88 66.40 27.95 66.32 27.85 66.44 27.81 66.48 27.82 66.47 27.76 66.54 27.84 66.45 27.73 66.57 27.87 66.41 27.73 66.57 27.88 66.40 27.69 66.62 27.88 66.40 27.70 66.61 27.92 66.36 27.72 66.59 27.90 66.38 27.69 66.62 27.96 66.31

[0047] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, as shown in Table 4, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 400 mm, and the calculated baffle bar adjustment length value can be rounded off;

[0048] Table 4

[0049] 450nm reflectivity x Thickness Film thickness difference Adjust length 450nm reflectivity x Thickness Film thickness difference Adjust length 27.68 66.63 0.36％ 1 27.54 66.79 0.60％ 2 27.95 66.32 -0.10％ 0 28.03 66.23 -0.24％ -1 27.17 67.21 1.23％ 5 28.04 66.22 -0.26％ -1 27.10 67.28 1.35％ 5 28.14 66.10 -0.43％ -2 27.88 66.40 0.02％ 0 28.09 66.16 -0.35％ -1 27.89 66.39 0.00％ 0 28.09 66.16 -0.35％ -1 27.98 66.29 -0.15％ -1 28.09 66.16 -0.35％ -1 28.00 66.26 -0.19％ -1 28.08 66.17 -0.33％ -1 28.01 66.25 -0.21％ -1 28.02 66.24 -0.22％ -1 27.98 66.29 -0.15％ -1 28.02 66.24 -0.22％ -1 27.99 66.27 -0.17％ -1 28.03 66.23 -0.24％ -1 27.95 66.32 -0.10％ 0 28.02 66.24 -0.22％ -1 27.99 66.27 -0.17％ -1 28.04 66.22 -0.26％ -1 27.98 66.29 -0.15％ -1 28.03 66.23 -0.24％ -1 27.96 66.31 -0.12％ 0 28.00 66.26 -0.19％ -1 27.93 66.34 -0.07％ 0 28.00 66.26 -0.19％ -1 27.92 66.36 -0.05％ 0 28.00 66.26 -0.19％ -1 27.92 66.36 -0.05％ 0 27.94 66.33 -0.08％ 0 27.90 66.38 -0.02％ 0 27.98 66.29 -0.15％ -1 27.87 66.41 0.04％ 0 27.92 66.36 -0.05％ 0 27.88 66.40 0.02％ 0 27.95 66.32 -0.10％ 0 27.85 66.44 0.07％ 0 27.81 66.48 0.14％ 1 27.82 66.47 0.12％ 0 27.76 66.54 0.23％ 1 27.84 66.45 0.09％ 0 27.73 66.57 0.28％ 1 27.87 66.41 0.04％ 0 27.73 66.57 0.28％ 1 27.88 66.40 0.02％ 0 27.69 66.62 0.35％ 1 27.88 66.40 0.02％ 0 27.70 66.61 0.33％ 1 27.92 66.36 -0.05％ 0 27.72 66.59 0.30％ 1 27.90 66.38 -0.02％ 0 27.69 66.62 0.35％ 1 27.96 66.31 -0.12％ 0

[0050] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material.

[0051] (2) Silicon dioxide coating

[0052] S1 selects white glass of the same model and size as the cover glass to be coated, and performs magnetron sputtering coating on the white glass at the current baffle length; after the silicon dioxide film is coated on the glass surface, 59 marking points are marked at intervals from top to bottom along the length direction at the edge of the white glass, and the interval between adjacent marking points is the baffle width;

[0053] S2 measures the reflectivity curves of all the marked points on the white glass at 400-700nm. All the reflectivity curves form a spectrum curve graph. In the spectrum curve graph, the reflectivity curve in the middle is selected (the reflectivity curve corresponds to the 55th marked point on the glass from top to bottom). The data is shown in Table 5:

[0054] Table 5

[0055] 400 24.20 550 17.22 410 19.29 560 18.09 420 14.84 570 18.80 430 11.28 580 19.32 440 8.64 590 19.67 450 7.14 600 19.91 460 6.58 610 19.99 470 6.82 620 19.96 480 7.76 630 19.80 490 9.00 640 19.55 500 10.49 650 19.22 510 12.03 660 18.82 520 13.54 670 18.36 530 14.90 680 17.85 540 16.14 690 17.33 700 16.74

[0056] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness of 250.79nm when the theoretical coating thickness is set to 230nm at the position, and takes the actual film thickness as the middle value, expands two thickness values ​​in the larger and smaller directions, and the expansion interval is 1nm, that is, the five film thicknesses are 248.79nm, 249.79nm, 250.79nm, 251.79nm, and 252.79nm respectively; simulates the reflectivity curves of the five film thicknesses through the film system design software TFC, and selects a wavelength value of 480nm between the peaks and valleys where the five reflectivity curves intersect;

[0057] S4 records the reflectivity values ​​corresponding to the five reflectivity curves at a wavelength of 480 nm (as shown in Table 6), and uses the reflectivity value as X and the thickness value as Y to obtain the functional relationship between the reflectivity and the thickness (nm) (as shown in Table 6). Figure 3 shown);

[0058] Table 6

[0059] 480nm reflectivity thickness 8.2127 248.79 7.9605 249.79 7.7227 250.79 7.4997 251.79 7.2922 252.79

[0060] S5 obtains the reflectivity values ​​corresponding to the reflectivity curves at a wavelength of 480 nm according to all the reflectivity curves obtained in step S2, and calculates the film thickness values ​​corresponding to all the reflectivity curves at a wavelength of 480 nm according to the functional relationship between the reflectivity and thickness obtained in step S4, as shown in Table 7:

[0061] Table 7

[0062] 480nm reflectivity x Thickness 480nm reflectivity x Thickness 10.00 243.99 7.75 250.67 9.65 244.62 7.74 250.72 9.30 245.41 7.71 250.85 9.04 246.09 7.65 251.11 8.82 246.73 7.60 251.34 8.68 247.16 7.55 251.57 8.55 247.59 7.52 251.70 8.41 248.07 7.47 251.94 8.28 248.54 7.38 252.36 8.19 248.88 7.35 252.51 8.09 249.27 7.05 254.01 8.00 249.63 7.40 252.27 7.93 249.91 7.43 252.13 7.86 250.20 7.43 252.13 7.84 250.29 7.44 252.08 7.79 250.50 7.42 252.17 7.82 250.37 7.31 252.70 7.82 250.37 7.53 251.66 7.81 250.42 7.52 251.70 7.75 250.67 7.56 251.52 7.72 250.80 7.60 251.34 7.71 250.85 7.70 250.89 7.72 250.80 7.73 250.76 7.73 250.76 7.69 250.94 7.69 250.94 7.76 250.63 7.70 250.89 7.62 251.25 7.74 250.72 7.59 251.38 7.71 250.85 7.47 251.94 7.71 250.85 7.42 252.17 7.73 250.76

[0063] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, as shown in Table 8, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 400 mm, and the calculated baffle bar adjustment length value can be rounded off;

[0064] Table 8

[0065] 480nm reflectivity x Thickness Film thickness difference Adjust length 480nm reflectivity x Thickness Film thickness difference Adjust length 10.00 243.99 -2.57％ -10 7.75 250.67 0.10％ 0 9.65 244.62 -2.32％ -9 7.74 250.72 0.11％ 0 9.30 245.41 -2.01％ -8 7.71 250.85 0.17％ 1 9.04 246.09 -1.73％ -7 7.65 251.11 0.27％ 1 8.82 246.73 -1.48％ -6 7.60 251.34 0.36％ 1 8.68 247.16 -1.30％ -5 7.55 251.57 0.45％ 2 8.55 247.59 -1.13％ -5 7.52 251.70 0.51％ 2 8.41 248.07 -0.94％ -4 7.47 251.94 0.60％ 2 8.28 248.54 -0.75％ -3 7.38 252.36 0.77％ 3 8.19 248.88 -0.62％ -2 7.35 252.51 0.83％ 3 8.09 249.27 -0.46％ -2 7.05 254.01 1.43％ 6 8.00 249.63 -0.32％ -1 7.40 252.27 0.73％ 3 7.93 249.91 -0.21％ -1 7.43 252.13 0.68％ 3 7.86 250.20 -0.09％ 0 7.43 252.13 0.68％ 3 7.84 250.29 -0.06％ 0 7.44 252.08 0.66％ 3 7.79 250.50 0.03％ 0 7.42 252.17 0.70％ 3 7.82 250.37 -0.02％ 0 7.31 252.70 0.91％ 4 7.82 250.37 -0.02％ 0 7.53 251.66 0.49％ 2 7.81 250.42 -0.01％ 0 7.52 251.70 0.51％ 2 7.75 250.67 0.10％ 0 7.56 251.52 0.44％ 2 7.72 250.80 0.15％ 1 7.60 251.34 0.36％ 1 7.71 250.85 0.17％ 1 7.70 250.89 0.18％ 1 7.72 250.80 0.15％ 1 7.73 250.76 0.13％ 1 7.73 250.76 0.13％ 1 7.69 250.94 0.20％ 1 7.69 250.94 0.20％ 1 7.76 250.63 0.08％ 0 7.70 250.89 0.18％ 1 7.62 251.25 0.33％ 1 7.74 250.72 0.11％ 0 7.59 251.38 0.38％ 2 7.71 250.85 0.17％ 1 7.47 251.94 0.60％ 2 7.71 250.85 0.17％ 1 7.42 252.17 0.70％ 3 7.73 250.76 0.13％ 1

[0066] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material.

[0067] After all the baffle lengths on the S8 niobium oxide target and the silicon dioxide target were adjusted, white glass of the same model and size was selected, and magnetron sputtering coating was performed on the white glass under the adjusted baffle length, and niobium oxide and silicon dioxide films were coated successively; after the coating was completed, the color difference ΔE of the reflected color of the white glass was detected, and the color data of 9 horizontal points (i.e., n=9) of the glass were obtained by testing with a UV3600 spectrophotometer as shown in Table 9:

[0068] Table 9

[0069]

[0070] Note: Points 1-9 in the table are 9 test points evenly distributed laterally on the glass.

[0071] After calculation, the ΔY of each point * , Δa * , Δb * The maximum absolute values ​​are 0.58, 0.44 and 0.92 respectively, and ΔE=1.18<3 is calculated, indicating that the film thickness on the cover glass is uniform. Therefore, the length of the baffle in this embodiment is appropriately adjusted and can be used for batch coating production of cover glass.

[0072] Example 2

[0073] When replacing a new type of glass product on the production line, it is necessary to adjust the length of the stop bars of the niobium oxide target and the silicon dioxide target in the coating machine. The adjustment method is as follows:

[0074] (1) Niobium oxide coating

[0075] S1 selects white glass of the same size as the cover glass to be coated, with a length of 88.5 cm, and marks 59 points along the length direction from top to bottom at the edge of the white glass, with the interval between adjacent points being 1.5 cm of the bar width; magnetron sputtering coating is performed on the white glass at the current bar length;

[0076] S2 measures the reflectivity curves of all the marked points on the white glass at 400-700nm. All the reflectivity curves form a spectrum curve graph. In the spectrum curve graph, the reflectivity curve in the middle is selected (the reflectivity curve corresponds to the 25th marked point on the glass from top to bottom). The data is shown in Table 10:

[0077] Table 10

[0078] 400 18.75 550 33.36 410 21.09 560 33.45 420 23.17 570 33.5 430 24.96 580 33.5 440 26.56 590 33.46 450 27.87 600 33.42 460 29.05 610 33.33 470 29.93 620 33.22 480 30.77 630 33.1 490 31.44 640 32.94 500 31.97 650 32.77 510 32.43 660 32.59 520 32.78 670 32.4 530 32.99 680 32.22 540 33.22 690 32.02 700 31.78

[0079] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness of 65.42nm when the theoretical coating thickness is set to 80nm at the position, and takes the actual film thickness as the middle value, expands two thickness values ​​in the larger and smaller directions, and the expansion interval is 1nm, that is, the five film thicknesses are 63.42nm, 64.42nm, 65.42nm, 66.42nm, and 67.42nm respectively; simulates the reflectivity curves of the five film thicknesses through the film system design software TFC, and selects a wavelength value of 460nm between the peaks and valleys where the five reflectivity curves intersect;

[0080] S4 records the reflectivity values ​​corresponding to the five reflectivity curves at a wavelength of 460 nm (as shown in Table 11), and uses the reflectivity value as X and the thickness value as Y to obtain the functional relationship between reflectivity and thickness (nm) (as shown in Table 11). Figure 4 shown);

[0081] Table 11

[0082] 460nm reflectivity thickness 30.3877 63.42 29.8373 64.42 29.2534 65.42 28.6372 66.42 27.9898 67.42

[0083] S5 obtains the reflectivity values ​​corresponding to the reflectivity curves at a wavelength of 460 nm according to all the reflectivity curves obtained in step S2, and calculates the film thickness values ​​corresponding to all the reflectivity curves at a wavelength of 460 nm according to the functional relationship between reflectivity and thickness obtained in step S4, as shown in Table 12:

[0084] Table 12

[0085] 460nm reflectivity x Thickness 460nm reflectivity x Thickness 28.79 65.33 28.7 65.44 29.1 64.96 29.19 64.85 28.31 65.90 29.19 64.85 28.26 65.96 29.31 64.71 29.05 65.02 29.26 64.77 29.07 65.00 29.26 64.77 29.15 64.90 29.25 64.78 29.17 64.88 29.26 64.77 29.19 64.85 29.19 64.85 29.16 64.89 29.18 64.86 29.16 64.89 29.21 64.83 29.13 64.93 29.18 64.86 29.17 64.88 29.22 64.82 29.16 64.89 29.2 64.84 29.15 64.90 29.18 64.86 29.12 64.94 29.17 64.88 29.1 64.96 29.17 64.88 29.1 64.96 29.12 64.94 29.08 64.99 29.14 64.91 29.07 65.00 29.1 64.96 29.06 65.01 29.11 64.95 29.04 65.03 29.02 65.06 29 65.08 28.96 65.13 29.03 65.05 28.94 65.15 29.05 65.02 28.92 65.18 29.06 65.01 28.91 65.19 29.05 65.02 28.91 65.19 29.09 64.97 28.94 65.15 29.07 65.00 28.9 65.20 29.12 64.94

[0086] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, as shown in Table 13, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 400 mm, and the calculated baffle bar adjustment length value can be rounded off;

[0087] Table 13

[0088] 460nm reflectivity x Thickness Film thickness difference Adjust length 460nm reflectivity x Thickness Film thickness difference Adjust length 28.79 65.33 -1.59％ -6 28.70 65.44 -1.43％ -6 29.10 64.96 -2.15％ -9 29.19 64.85 -2.31％ -9 28.31 65.90 -0.73％ -3 29.19 64.85 -2.31％ -9 28.26 65.96 -0.64％ -3 29.31 64.71 -2.53％ -10 29.05 65.02 -2.06％ -8 29.26 64.77 -2.44％ -10 29.07 65.00 -2.10％ -8 29.26 64.77 -2.44％ -10 29.15 64.90 -2.24％ -9 29.25 64.78 -2.42％ -10 29.17 64.88 -2.28％ -9 29.26 64.77 -2.44％ -10 29.19 64.85 -2.31％ -9 29.19 64.85 -2.31％ -9 29.16 64.89 -2.26％ -9 29.18 64.86 -2.30％ -9 29.16 64.89 -2.26％ -9 29.21 64.83 -2.35％ -9 29.13 64.93 -2.20％ -9 29.18 64.86 -2.30％ -9 29.17 64.88 -2.28％ -9 29.22 64.82 -2.37％ -9 29.16 64.89 -2.26％ -9 29.20 64.84 -2.33％ -9 29.15 64.90 -2.24％ -9 29.18 64.86 -2.30％ -9 29.12 64.94 -2.19％ -9 29.17 64.88 -2.28％ -9 29.10 64.96 -2.15％ -9 29.17 64.88 -2.28％ -9 29.10 64.96 -2.15％ -9 29.12 64.94 -2.19％ -9 29.08 64.99 -2.11％ -8 29.14 64.91 -2.22％ -9 29.07 65.00 -2.10％ -8 29.10 64.96 -2.15％ -9 29.06 65.01 -2.08％ -8 29.11 64.95 -2.17％ -9 29.04 65.03 -2.04％ -8 29.02 65.06 -2.00％ -8 29.00 65.08 -1.97％ -8 28.96 65.13 -1.90％ -8 29.03 65.05 -2.02％ -8 28.94 65.15 -1.86％ -7 29.05 65.02 -2.06％ -8 28.92 65.18 -1.82％ -7 29.06 65.01 -2.08％ -8 28.91 65.19 -1.81％ -7 29.05 65.02 -2.06％ -8 28.91 65.19 -1.81％ -7 29.09 64.97 -2.13％ -9 28.94 65.15 -1.86％ -7 29.07 65.00 -2.10％ -8 28.90 65.20 -1.79％ -7 29.12 64.94 -2.19％ -9

[0089] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material.

[0090] (2) Silicon dioxide coating

[0091] S1 selects white glass of the same model and size as the cover glass to be coated, and performs magnetron sputtering coating on the white glass at the current baffle length; after the silicon dioxide film is coated on the glass surface, 59 marking points are marked at intervals from top to bottom along the length direction at the edge of the white glass, and the interval between adjacent marking points is the baffle width;

[0092] S2 measures the reflectivity curves of all the marked points on the white glass at 400-700nm. All the reflectivity curves form a spectrum curve graph. In the spectrum curve graph, the reflectivity curve in the middle is selected (the reflectivity curve corresponds to the 45th marked point on the glass from top to bottom). The data is shown in Table 14:

[0093] Table 14

[0094] 400 24.66 550 16.98 410 19.74 560 17.88 420 15.26 570 18.61 430 11.62 580 19.17 440 8.86 590 19.55 450 7.23 600 19.81 460 6.56 610 19.92 470 6.7 620 19.91 480 7.56 630 19.78 490 8.75 640 19.55 500 10.2 650 19.25 510 11.73 660 18.86 520 13.24 670 18.41 530 14.61 680 17.91 540 15.88 690 17.41 700 16.83

[0095] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness of 249.79nm when the theoretical coating thickness is set to 230nm at the position, and takes the actual film thickness as the middle value, expands two thickness values ​​in the larger and smaller directions, and the expansion interval is 1nm, that is, the five film thicknesses are 247.79nm, 248.79nm, 249.79nm, 250.79nm, and 251.79nm respectively; simulates the reflectivity curves of the five film thicknesses through the film system design software TFC, and selects a wavelength value of 490nm between the peaks and valleys where the five reflectivity curves intersect;

[0096] S4 records the reflectivity values ​​corresponding to the five reflectivity curves at a wavelength of 490 nm (as shown in Table 15), and uses the reflectivity value as X and the thickness value as Y to obtain the functional relationship between reflectivity and thickness (nm) (as shown in Table 15). Figure 5 shown);

[0097] Table 15

[0098] 490nm reflectivity thickness 9.3384 247.79 9.0407 248.79 8.7504 249.79 8.4678 250.79 8.1938 251.79

[0099] S5 obtains the reflectivity values ​​corresponding to the reflectivity curves at a wavelength of 490 nm according to all the reflectivity curves obtained in step S2, and calculates the film thickness values ​​corresponding to all the reflectivity curves at a wavelength of 490 nm according to the functional relationship between the reflectivity and thickness obtained in step S4, as shown in Table 16:

[0100] Table 16

[0101] 490nm reflectivity x Thickness 490nm reflectivity x Thickness 11.57 242.98 9.01 246.17 11.19 242.95 9.00 246.20 10.81 243.09 8.97 246.28 10.53 243.31 8.89 246.52 10.27 243.60 8.83 246.70 10.11 243.82 8.76 246.91 9.96 244.05 8.73 247.00 9.81 244.32 8.66 247.23 9.66 244.60 8.55 247.59 9.55 244.83 8.51 247.73 9.43 245.10 8.17 248.96 9.32 245.36 8.57 247.52 9.23 245.58 8.60 247.42 9.15 245.79 8.62 247.36 9.12 245.87 8.62 247.36 9.07 246.00 8.59 247.46 9.10 245.92 8.47 247.86 9.09 245.95 8.71 247.07 9.09 245.95 8.70 247.10 9.01 246.17 8.75 246.94 8.98 246.26 8.80 246.79 8.97 246.28 8.92 246.43 8.97 246.28 8.96 246.31 8.98 246.26 8.91 246.46 8.94 246.37 9.00 246.20 8.95 246.34 8.83 246.70 9.00 246.20 8.78 246.85 8.96 246.31 8.65 247.26 8.97 246.28 8.58 247.49 8.99 246.23

[0102] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, as shown in Table 17, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 400 mm, and the calculated baffle bar adjustment length value can be rounded off;

[0103] Table 17

[0104] 490nm reflectivity x Thickness Film thickness difference Adjust length 490nm reflectivity x Thickness Film thickness difference Adjust length 11.57 242.98 -2.98％ -12 9.01 246.17 -1.70％ -7 11.19 242.95 -2.99％ -12 9.00 246.20 -1.69％ -7 10.81 243.09 -2.93％ -12 8.97 246.28 -1.66％ -7 10.53 243.31 -2.84％ -11 8.89 246.52 -1.56％ -6 10.27 243.60 -2.73％ -11 8.83 246.70 -1.49％ -6 10.11 243.82 -2.64％ -11 8.76 246.91 -1.41％ -6 9.96 244.05 -2.55％ -10 8.73 247.00 -1.37％ -5 9.81 244.32 -2.44％ -10 8.66 247.23 -1.28％ -5 9.66 244.60 -2.33％ -9 8.55 247.59 -1.13％ -5 9.55 244.83 -2.24％ -9 8.51 247.73 -1.08％ -4 9.43 245.10 -2.13％ -9 8.17 248.96 -0.59％ -2 9.32 245.36 -2.02％ -8 8.57 247.52 -1.16％ -5 9.23 245.58 -1.94％ -8 8.60 247.42 -1.20％ -5 9.15 245.79 -1.85％ -7 8.62 247.36 -1.23％ -5 9.12 245.87 -1.82％ -7 8.62 247.36 -1.23％ -5 9.07 246.00 -1.77％ -7 8.59 247.46 -1.19％ -5 9.10 245.92 -1.80％ -7 8.47 247.86 -1.02％ -4 9.09 245.95 -1.79％ -7 8.71 247.07 -1.34％ -5 9.09 245.95 -1.79％ -7 8.70 247.10 -1.33％ -5 9.01 246.17 -1.70％ -7 8.75 246.94 -1.39％ -6 8.98 246.26 -1.67％ -7 8.80 246.79 -1.45％ -6 8.97 246.28 -1.66％ -7 8.92 246.43 -1.60％ -6 8.97 246.28 -1.66％ -7 8.96 246.31 -1.64％ -7 8.98 246.26 -1.67％ -7 8.91 246.46 -1.59％ -6 8.94 246.37 -1.62％ -6 9.00 246.20 -1.69％ -7 8.95 246.34 -1.63％ -7 8.83 246.70 -1.49％ -6 9.00 246.20 -1.69％ -7 8.78 246.85 -1.43％ -6 8.96 246.31 -1.64％ -7 8.65 247.26 -1.27％ -5 8.97 246.28 -1.66％ -7 8.58 247.49 -1.17％ -5 8.99 246.23 -1.689％ -7

[0105] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material.

[0106] After all the bar lengths on the S8 niobium oxide target and silicon dioxide target were adjusted, white glass of the same model and size was selected, and magnetron sputtering coating was performed on the white glass under the adjusted bar length, and niobium oxide and silicon dioxide films were coated successively; after the coating was completed, the color difference ΔE of the reflected color of the white glass was detected, and the color data of 9 horizontal points (i.e., n=9) of the glass were obtained by testing with a UV3600 spectrophotometer as shown in Table 18:

[0107] Table 18

[0108]

[0109] Note: Points 1-9 in the table are 9 test points evenly distributed laterally on the glass.

[0110] After calculation, the ΔY of each point * , Δa * , Δb * The maximum absolute values ​​are 0.49, 0.53 and 0.58 respectively, and ΔE=0.93<3 is calculated, indicating that the film thickness on the cover glass is uniform. Therefore, the length of the baffle in this embodiment is appropriately adjusted and can be used for batch coating production of cover glass.

[0111] Example 3

[0112] When replacing a new type of glass product on the production line, it is necessary to adjust the length of the stop bars of the niobium oxide target and the silicon dioxide target in the coating machine. The adjustment method is as follows:

[0113] (1) Niobium oxide coating

[0114] S1 selects white glass of the same size as the cover glass to be coated, with a length of 88.5 cm, and marks 59 points along the length direction from top to bottom at the edge of the white glass, with the interval between adjacent points being 1.5 cm of the bar width; magnetron sputtering coating is performed on the white glass at the current bar length;

[0115] S2 measures the reflectivity curves of all the marked points on the white glass at 400-700nm. All the reflectivity curves form a spectrum curve graph. In the spectrum curve graph, the reflectivity curve in the middle is selected (the reflectivity curve corresponds to the 35th marked point on the glass from top to bottom). The data is shown in Table 19:

[0116] Table 19

[0117] 400 19.09 550 33.40 410 21.41 560 33.47 420 23.48 570 33.53 430 25.24 580 33.51 440 26.81 590 33.46 450 28.09 600 33.41 460 29.26 610 33.32 470 30.11 620 33.20 480 30.93 630 33.06 490 31.57 640 32.91 500 32.08 650 32.74 510 32.53 660 32.54 520 32.86 670 32.35 530 33.06 680 32.15 540 33.28 690 31.96 700 31.73

[0118] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness of 64.42nm when the theoretical coating thickness is set to 80nm at the position, and takes the actual film thickness as the middle value, expands two thickness values ​​in the larger and smaller directions, and the expansion interval is 1nm, that is, the five film thicknesses are 62.42nm, 63.42nm, 64.42nm, 65.42nm, and 66.42nm respectively; simulates the reflectivity curves of the five film thicknesses through the film system design software TFC, and selects a wavelength value of 470nm between the peaks and valleys where the five reflectivity curves intersect;

[0119] S4 records the reflectivity values ​​corresponding to the five reflectivity curves at a wavelength of 470 nm (as shown in Table 20), and uses the reflectivity value as X and the thickness value as Y to obtain the functional relationship between reflectivity and thickness (nm) (as shown in Table 20). Figure 6 shown);

[0120] Table 20

[0121] 470nm reflectivity thickness 30.9040 62.42 30.3877 63.42 29.8373 64.42 29.2534 65.42 28.6372 66.42

[0122] S5 obtains the reflectivity values ​​corresponding to the reflectivity curves at a wavelength of 470 nm according to all the reflectivity curves obtained in step S2, and calculates the film thickness values ​​corresponding to all the reflectivity curves at a wavelength of 470 nm according to the functional relationship between reflectivity and thickness obtained in step S4, as shown in Table 21:

[0123] Table 21

[0124] 470nm reflectivity x Thickness 470nm reflectivity x Thickness 29.61 64.34 29.52 64.45 29.95 63.92 30.03 63.82 29.14 64.91 30.04 63.80 29.11 64.95 30.17 63.64 29.92 63.95 30.11 63.71 29.94 63.93 30.10 63.73 30.03 63.82 30.11 63.71 30.04 63.80 30.10 63.73 30.05 63.79 30.04 63.80 30.01 63.84 30.03 63.82 30.02 63.83 30.06 63.78 30.00 63.85 30.04 63.80 30.04 63.80 30.07 63.77 30.02 63.83 30.06 63.78 30.00 63.85 30.04 63.80 29.99 63.87 30.04 63.80 29.97 63.89 30.03 63.82 29.97 63.89 29.98 63.88 29.95 63.92 29.99 63.87 29.93 63.94 29.97 63.89 29.94 63.93 29.95 63.92 29.92 63.95 29.88 64.00 29.88 64.00 29.83 64.07 29.90 63.98 29.81 64.09 29.93 63.94 29.81 64.09 29.93 63.94 29.78 64.13 29.93 63.94 29.79 64.12 29.96 63.90 29.81 64.09 29.93 63.94 29.78 64.13 29.97 63.89

[0125] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, as shown in Table 22, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 400 mm, and the calculated baffle bar adjustment length value can be rounded off;

[0126] Table 22

[0127] 470nm reflectivity x Thickness Film thickness difference Adjust length 470nm reflectivity x Thickness Film thickness difference Adjust length 29.61 64.34 -3.09％ -12 29.52 64.45 -2.92％ -12 29.95 63.92 -3.73％ -15 30.03 63.82 -3.88％ -16 29.14 64.91 -2.22％ -9 30.04 63.80 -3.90％ -16 29.11 64.95 -2.17％ -9 30.17 63.64 -4.14％ -17 29.92 63.95 -3.67％ -15 30.11 63.71 -4.03％ -16 29.94 63.93 -3.71％ -15 30.10 63.73 -4.01％ -16 30.03 63.82 -3.88％ -16 30.11 63.71 -4.03％ -16 30.04 63.80 -3.90％ -16 30.10 63.73 -4.01％ -16 30.05 63.79 -3.91％ -16 30.04 63.80 -3.90％ -16 30.01 63.84 -3.84％ -15 30.03 63.82 -3.88％ -16 30.02 63.83 -3.86％ -15 30.06 63.78 -3.93％ -16 30.00 63.85 -3.82％ -15 30.04 63.80 -3.90％ -16 30.04 63.80 -3.90％ -16 30.07 63.77 -3.95％ -16 30.02 63.83 -3.86％ -15 30.06 63.78 -3.93％ -16 30.00 63.85 -3.82％ -15 30.04 63.80 -3.90％ -16 29.99 63.87 -3.80％ -15 30.04 63.80 -3.90％ -16 29.97 63.89 -3.76％ -15 30.03 63.82 -3.88％ -16 29.97 63.89 -3.76％ -15 29.98 63.88 -3.78％ -15 29.95 63.92 -3.73％ -15 29.99 63.87 -3.80％ -15 29.93 63.94 -3.69％ -15 29.97 63.89 -3.76％ -15 29.94 63.93 -3.71％ -15 29.95 63.92 -3.73％ -15 29.92 63.95 -3.67％ -15 29.88 64.00 -3.59％ -14 29.88 64.00 -3.59％ -14 29.83 64.07 -3.50％ -14 29.90 63.98 -3.63％ -15 29.81 64.09 -3.46％ -14 29.93 63.94 -3.69％ -15 29.81 64.09 -3.46％ -14 29.93 63.94 -3.69％ -15 29.78 64.13 -3.41％ -14 29.93 63.94 -3.69％ -15 29.79 64.12 -3.42％ -14 29.96 63.90 -3.74％ -15 29.81 64.09 -3.46％ -14 29.93 63.94 -3.69％ -15 29.78 64.13 -3.41％ -14 29.97 63.89 -3.76％ -15

[0128] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material.

[0129] (2) Silicon dioxide coating

[0130] S1 selects white glass of the same model and size as the cover glass to be coated, and performs magnetron sputtering coating on the white glass at the current baffle length; after the silicon dioxide film is coated on the glass surface, 59 marking points are marked at intervals from top to bottom along the length direction at the edge of the white glass, and the interval between adjacent marking points is the baffle width;

[0131] S2 measures the reflectivity curves of all the marked points on the white glass at 400-700nm. All the reflectivity curves form a spectrum curve graph. In the spectrum curve graph, the reflectivity curve in the middle is selected (the reflectivity curve corresponds to the 55th marked point on the glass from top to bottom). The data is shown in Table 23:

[0132] Table 23

[0133] 400 24.80 550 16.80 410 19.92 560 17.72 420 15.44 570 18.48 430 11.76 580 19.04 440 8.95 590 19.44 450 7.27 600 19.71 460 6.53 610 19.83 470 6.61 620 19.83 480 7.42 630 19.71 490 8.58 640 19.49 500 10.01 650 19.20 510 11.53 660 18.81 520 13.04 670 18.39 530 14.42 680 17.89 540 15.70 690 17.40 700 16.81

[0134] S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness of 248.79nm when the theoretical coating thickness is set to 230nm at the position, and takes the actual film thickness as the middle value, expands two thickness values ​​in the larger and smaller directions, and the expansion interval is 1nm, that is, the five film thicknesses are 246.79nm, 247.79nm, 248.79nm, 249.79nm, and 250.79nm respectively; simulates the reflectivity curves of the five film thicknesses through the film system design software TFC, and selects a wavelength value of 500nm between the peaks and valleys where the five reflectivity curves intersect;

[0135] S4 records the reflectivity values ​​corresponding to the five reflectivity curves at a wavelength of 500 nm (as shown in Table 24), and uses the reflectivity value as X and the thickness value as Y to obtain the functional relationship between reflectivity and thickness (nm) (as shown in Table 24). Figure 7 shown);

[0136] Table 24

[0137] 500nm reflectivity thickness 11.2454 246.79 10.9212 247.79 10.6009 248.79 10.2850 249.79 9.9741 250.79

[0138] S5 obtains the reflectivity values ​​corresponding to all the reflectivity curves obtained in step S2 at a wavelength of 500 nm, and calculates the film thickness values ​​corresponding to all the reflectivity curves at a wavelength of 500 nm according to the functional relationship between reflectivity and thickness obtained in step S4, as shown in Table 25:

[0139] Table 25

[0140] 500nm reflectivity x Thickness 500nm reflectivity x Thickness 13.16 245.02 10.50 243.34 12.77 244.23 10.48 243.36 12.40 243.66 10.45 243.39 12.11 243.33 10.37 243.48 11.85 243.11 10.29 243.58 11.67 243.02 10.22 243.67 11.52 242.97 10.18 243.72 11.35 242.94 10.10 243.84 11.19 242.95 9.98 244.02 11.08 242.97 9.93 244.10 10.94 243.02 9.53 244.88 10.83 243.08 10.01 243.97 10.74 243.14 10.04 243.93 10.65 243.21 10.06 243.90 10.62 243.23 10.07 243.88 10.56 243.29 10.02 243.96 10.59 243.26 9.89 244.17 10.58 243.27 10.16 243.75 10.58 243.27 10.14 243.78 10.49 243.35 10.20 243.69 10.47 243.37 10.26 243.62 10.45 243.39 10.39 243.46 10.46 243.38 10.43 243.41 10.45 243.39 10.39 243.46 10.41 243.44 10.49 243.35 10.43 243.41 10.30 243.56 10.48 243.36 10.24 243.64 10.43 243.41 10.08 243.87 10.45 243.39 10.01 243.97 10.47 243.37

[0141] S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, as shown in Table 26, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 400 mm, and the calculated baffle bar adjustment length value can be rounded off;

[0142] Table 26

[0143] 500nm reflectivity x Thickness Film thickness difference Adjust length 500nm reflectivity x Thickness Film thickness difference Adjust length 13.16 245.02 -2.16％ -9 10.50 243.34 -2.83％ -11 12.77 244.23 -2.48％ -10 10.48 243.36 -2.82％ -11 12.40 243.66 -2.70％ -11 10.45 243.39 -2.81％ -11 12.11 243.33 -2.84％ -11 10.37 243.48 -2.77％ -11 11.85 243.11 -2.92％ -12 10.29 243.58 -2.74％ -11 11.67 243.02 -2.96％ -12 10.22 243.67 -2.70％ -11 11.52 242.97 -2.98％ -12 10.18 243.72 -2.68％ -11 11.35 242.94 -2.99％ -12 10.10 243.84 -2.63％ -11 11.19 242.95 -2.99％ -12 9.98 244.02 -2.56％ -10 11.08 242.97 -2.98％ -12 9.93 244.10 -2.53％ -10 10.94 243.02 -2.96％ -12 9.53 244.88 -2.22％ -9 10.83 243.08 -2.93％ -12 10.01 243.97 -2.58％ -10 10.74 243.14 -2.91％ -12 10.04 243.93 -2.60％ -10 10.65 243.21 -2.88％ -12 10.06 243.90 -2.61％ -10 10.62 243.23 -2.87％ -11 10.07 243.88 -2.62％ -10 10.56 243.29 -2.85％ -11 10.02 243.96 -2.58％ -10 10.59 243.26 -2.86％ -11 9.89 244.17 -2.50％ -10 10.58 243.27 -2.86％ -11 10.16 243.75 -2.67％ -11 10.58 243.27 -2.86％ -11 10.14 243.78 -2.66％ -11 10.49 243.35 -2.83％ -11 10.20 243.69 -2.69％ -11 10.47 243.37 -2.82％ -11 10.26 243.62 -2.72％ -11 10.45 243.39 -2.81％ -11 10.39 243.46 -2.78％ -11 10.46 243.38 -2.81％ -11 10.43 243.41 -2.80％ -11 10.45 243.39 -2.81％ -11 10.39 243.46 -2.78％ -11 10.41 243.44 -2.79％ -11 10.49 243.35 -2.839％ -11 10.43 243.41 -2.80％ -11 10.30 243.56 -2.74％ -11 10.48 243.36 -2.82％ -11 10.24 243.64 -2.71％ -11 10.43 243.41 -2.80％ -11 10.08 243.87 -2.62％ -10 10.45 243.39 -2.81％ -11 10.01 243.97 -2.58％ -10 10.47 243.37 -2.82％ -11

[0144] S7 adjusts the length of the baffle bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the baffle bar should be pulled outward to increase the shielding of the target material; when the difference in film thickness is a negative value, it means that the baffle bar should be pushed inward to reduce the shielding of the target material.

[0145] After all the baffle lengths on the S8 niobium oxide target and the silicon dioxide target were adjusted, white glass of the same model and size was selected, and magnetron sputtering coating was performed on the white glass under the adjusted baffle length, and niobium oxide and silicon dioxide films were coated successively; after the coating was completed, the color difference ΔE of the reflected color of the white glass was detected, and the color data of 9 horizontal points (i.e., n=9) of the glass were obtained by testing with a UV3600 spectrophotometer as shown in Table 27:

[0146] Table 27

[0147]

[0148] Note: Points 1-9 in the table are 9 test points evenly distributed laterally on the glass.

[0149] After calculation, the ΔY of each point * , Δa * , Δb * The maximum absolute values ​​are 0.50, 0.83 and 0.66 respectively, and ΔE=1.17<3 is calculated, indicating that the film thickness on the cover glass is uniform. Therefore, the length of the baffle in this embodiment is appropriately adjusted and can be used for batch coating production of cover glass.

[0150] It can be seen from Examples 1-3 that the method of the present invention can accurately and reasonably adjust the use length of each baffle of the target material according to the detection data, and the operator does not need rich experience to complete it, which greatly reduces the difficulty of operation and improves production efficiency.

[0151] Although the present invention has been described in detail by referring to the accompanying drawings and in combination with the preferred embodiments, the present invention is not limited thereto. Without departing from the spirit and essence of the present invention, a person of ordinary skill in the art may make various equivalent modifications or substitutions to the embodiments of the present invention, and these modifications or substitutions shall be within the scope of the present invention. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed by the present invention, and all of these shall be within the scope of protection of the present invention. Therefore, the scope of protection of the present invention shall be subject to the scope of protection of the claims.

Claims

1. A method for adjusting the length of a target material baffle to ensure uniform thickness of a glass film layer, characterized in that: The following steps are involved: S1 selects white glass of the same model and size as the cover glass, marks the upper marking points at intervals from top to bottom along the length direction of the edge of the white glass, and the interval between adjacent marking points is the width of the barrier strip; magnetron sputtering coating is performed on the white glass at the current barrier strip length; S2 measures the reflectivity curves of all marked points on the white glass at 400-700nm. All reflectivity curves form a spectrum curve graph, and the reflectivity curve in the middle is selected in the spectrum curve graph; S3 imports the reflectivity curve data selected in step S2 into the film system design software TFC, simulates the actual film thickness d reflected by the reflectivity curve, and expands at least two thickness values ​​in a larger and smaller direction based on the actual film thickness, with an expansion interval of Δd; simulates the reflectivity curves under the actual film thickness and the expanded film thickness through the film system design software TFC, and selects a wavelength value between the peaks and valleys where these reflectivity curves intersect; S4 records the reflectivity values ​​corresponding to these reflectivity curves at the wavelength value selected in step S3, and obtains the functional relationship between reflectivity and thickness by taking the reflectivity value as X and the thickness value as Y; S5, according to all the reflectivity curves obtained in step S2, obtain the reflectivity values ​​corresponding to the wavelength value selected in step S3, and according to the functional relationship between reflectivity and thickness obtained in step S4, calculate the film thickness values ​​corresponding to all the reflectivity curves at the wavelength value selected in step S3; S6 calculates the average thickness value of all the film thickness values ​​obtained in step S5, thereby calculating the film thickness difference at each mark point position on the white glass, wherein the film thickness difference = (a certain film thickness value - average thickness value) / average thickness value * 100%; the length of the baffle bar that needs to be adjusted for each 1% film thickness difference is set to 350-450mm; S7 adjusts the length of the barrier bar corresponding to each marking point according to the difference in film thickness at each marking point position calculated in step S6, wherein when the difference in film thickness is a positive value, it means that the barrier bar needs to be pulled outward to increase the shielding of the target material; When the film thickness difference is a negative value, it means that the barrier strip should be pushed inward to reduce the obstruction of the target material; S8 After all the baffle lengths are adjusted, select white glass of the same model and size, and perform magnetron sputtering coating on the white glass at the adjusted baffle length; after coating, detect the color difference ΔE of the white glass, if ΔE < 3, it means that the film thickness on the cover glass is uniform; otherwise, it means that the film thickness on the cover glass is uneven, and it is necessary to repeat steps S1-S7 and continue to adjust the baffle length until the color difference ΔE of the coated white glass is < 3.

2. The method for adjusting the length of the target material baffle for ensuring the uniformity of the thickness of the glass film layer according to claim 1, characterized in that: In step S3, two thickness values ​​are expanded to a larger value and a smaller value based on the actual film thickness, and the expansion interval is 1 nm.

3. The method for adjusting the length of the target material baffle for ensuring the uniformity of the thickness of the glass film layer according to claim 1, characterized in that: In step S6, the length of the barrier strip that needs to be adjusted for each 1% difference in film thickness is set to 400 mm.

4. The method for adjusting the length of the target material baffle for ensuring the uniformity of the thickness of the glass film layer according to claim 1, characterized in that: In step S8, the color difference is calculated as ΔE=sqrt(Δ 2 a * +Δ 2 b * +Δ 2 Y * ),in Y * 、a * 、b * is the parameter in CIE color space, where Y * represents brightness, a * 、b * Represents chromaticity, For all Y * The average value of For all a * The average value of For all b * The average value of the value; in the formula, Δa * , Δb * , ΔY * The maximum absolute value of each difference is taken.

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