A magnetron sputtering coating tool

Abstract

This invention provides a magnetron sputtering coating fixture, belonging to the field of production fixture technology. It includes a base plate and multiple placement racks. The base plate is fixedly connected to a rotating shaft. The multiple placement racks are arranged end-to-end around the circumference of the base plate, and each placement rack is rotatably connected to the base plate. Each end of each placement rack is detachably connected to the base plate. Each placement rack has a hopper with an upper opening for placing products. Each placement rack has an inner sputtering window connected to the hopper on its inner side and an outer sputtering window connected to the hopper on its outer side. The advantage is that after one side of the product is coated, rotating the placement rack allows for sputtering coating on the other side. Compared to the traditional coating process of flipping products one by one, rotating the placement rack allows for flipping multiple products at once, saving flipping time. Furthermore, rotating the placement rack for flipping is more labor-saving and increases flipping efficiency.

Description

Technical Field

[0001] This invention belongs to the field of production tooling, and particularly relates to a magnetron sputtering coating tooling. Background Technology

[0002] Magnetron sputtering is a coating method for NdFeB magnetrons, belonging to the category of physical vapor deposition. Magnetron sputtering requires specialized equipment and employs a DC magnetron sputtering method. Sintered NdFeB is used as the substrate, and dysprosium or terbium is used as the target. Argon gas is injected into the magnetron sputtering equipment. Collisions between electrons and argon atoms generate argon ions and new electrons. These argon ions are accelerated under the influence of an electric field, bombarding the target. Dysprosium or terbium atoms on the target surface escape from their original lattice and migrate, penetrating the NdFeB surface. High temperatures are generated within the chamber during the sputtering process. Dysprosium or terbium atoms are directional during sputtering, meaning only one side closest to the target can be sputtered at a time. To penetrate the other side of the NdFeB product, the fixture containing the product must be removed from the equipment chamber, and the product pieces must be removed one by one, flipped, and then placed back into the fixture for a reverse magnetron sputtering process. This flipping process is time-consuming and results in low production efficiency. Summary of the Invention

[0003] The purpose of this invention is to address the aforementioned problems in existing technologies by proposing a magnetron sputtering coating fixture that is simple to operate and has high flipping efficiency.

[0004] The objective of this invention can be achieved through the following technical solution: A magnetron sputtering coating fixture includes a base plate and multiple placement racks. The base plate is fixedly connected to a rotating shaft. The multiple placement racks are arranged end-to-end around the circumference of the base plate, and each placement rack is rotatably connected to the base plate. The end of each placement rack is detachably connected to the base plate. Each placement rack is provided with a hopper with an upper opening for placing products. The inner side of each placement rack is provided with an inner sputtering window communicating with the hopper, and the outer side of each placement rack is provided with an outer sputtering window communicating with the hopper.

[0005] In the above-mentioned magnetron sputtering coating fixture, a plurality of mandrels are fixedly arranged on the base plate, and the number of mandrels corresponds one-to-one with the number of placement frames. The mandrels pass through the placement frames, rotatably connecting the placement frames to the base plate.

[0006] In the above-mentioned magnetron sputtering coating fixture, one end of the placement frame is provided with a rotating block, and each mandrel passes through the corresponding rotating block to make the placement frame rotatably connected to the base plate. The other end of the placement frame is detachably connected to the base plate. Each placement frame corresponds to one station. After the side of the product in the hopper away from the center of the base plate is sputtered, each placement frame rotates around the mandrel toward the next station in the same circumferential direction to flip the inner sputtering window and the outer sputtering window.

[0007] In the above-mentioned magnetron sputtering coating fixture, a positioning pin is provided on the other end of each placement rack near the base plate, and multiple positioning holes are provided on the base plate. The positioning pin is inserted and fixed into one of the corresponding positioning holes.

[0008] In the aforementioned magnetron sputtering coating fixture, arc-shaped transition angles are respectively provided at both ends of the hopper.

[0009] In the above-mentioned magnetron sputtering coating fixture, the base plate includes a fixed plate, which is fixed to a rotating shaft. Multiple connecting plates are spaced apart in the circumferential direction of the fixed plate, and the number of connecting plates corresponds to the number of mandrels. The mandrels and the positioning holes are all located at the end of the connecting plates away from the fixed plate.

[0010] In the above-mentioned magnetron sputtering coating fixture, a connecting block is fixedly provided at the end of the connecting plate away from the fixed plate, the mandrel is fixed on the connecting block, and each connecting block is provided with two positioning holes, which are respectively distributed on both sides of the mandrel.

[0011] In the magnetron sputtering coating fixture described above, a reinforcing plate is provided between two adjacent connecting plates.

[0012] In the above-mentioned magnetron sputtering coating fixture, a through hole is provided in the center of the fixed plate, and a bushing is fixedly provided on the fixed plate. The rotating shaft passes through the through hole and the bushing and is fixed to the bushing.

[0013] In the above-mentioned magnetron sputtering coating fixture, the bushing is welded and fixed to the fixing plate, and the fixing plate is provided with gaps at intervals in the circumferential direction.

[0014] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0015] (1) After one side of the coating is completed, the placement rack is rotated and flipped to sputter coating the other side of the product. Compared with the traditional coating process of flipping the product one by one, the rotating placement rack can flip multiple products at once, saving flipping time; and by rotating the placement rack to flip the product, it is more labor-saving and the flipping efficiency is higher.

[0016] (2) Arc-shaped transition angles are set at both ends of the hopper. By setting arc-shaped transition angles, the defects caused by collisions during product placement and removal can be reduced. Arc-shaped transition angles are applicable to products of different widths and sizes, which can effectively expand the usable space of different products and make the utilization rate higher.

[0017] (3) The bushing is welded and fixed to the fixing plate. The fixing plate is provided with gaps in the circumferential direction to prevent the fixing plate from deforming during welding. Attached Figure Description

[0018] Figure 1 This is a three-dimensional structural schematic diagram of the present invention;

[0019] Figure 2 This is a bottom view of the present invention;

[0020] Figure 3 This is a three-dimensional structural diagram of the placement rack in this invention;

[0021] Figure 4 This is a three-dimensional structural diagram of the base plate of the present invention.

[0022] In the figure, the base plate is 100; the fixing plate is 101; the connecting plate is 102; the connecting block is 103; the reinforcing plate is 104; the bushing is 105; the gap is 106; the mandrel is 107; the placement rack is 200; the hopper is 201; the inner sputtering window is 202; the outer sputtering window is 203; the rotating block is 204; the positioning pin is 205; the positioning hole is 206; and the arc transition angle is 207. Detailed Implementation

[0023] The following are specific embodiments of the present invention, which are described in conjunction with the accompanying drawings. However, the present invention is not limited to these embodiments.

[0024] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0025] like Figures 1-4As shown, a magnetron sputtering coating fixture includes a base plate 100 and multiple placement racks 200. The base plate 100 is fixedly connected to a rotating shaft (not shown in the figure). The multiple placement racks 200 are arranged end to end around the circumference of the base plate 100, and each placement rack 200 is rotatably connected to the base plate 100. The end of each placement rack 200 is detachably connected to the base plate 100. Each placement rack 200 is provided with a material hopper 201 with an upper opening for placing products. The inner side of each placement rack 200 is provided with an inner sputtering window 202 connected to the material hopper 201, and the outer side of each placement rack 200 is provided with an outer sputtering window 203 connected to the material hopper 201.

[0026] A magnetron sputtering coating fixture includes a base plate 100 and multiple placement racks 200. The base plate 100 is fixedly connected to a rotating shaft. The multiple placement racks 200 are arranged end-to-end around the circumference of the base plate 100, and each placement rack 200 is rotatably connected to the base plate 100. The end of each placement rack 200 is detachably connected to the base plate 100. Each placement rack 200 is provided with a hopper 201 with an upper opening for placing products. Each hopper 201 can hold multiple products. The inner side of each placement rack 200 is provided with an inner sputtering window 202 that communicates with the hopper 201 for placing products. The outer side of the rack 200 is provided with an external sputtering window 203 connected to the hopper 201. First, the products are placed into the hopper 201 one by one. Then, the base plate 100 is rotated by the rotating shaft. At this time, the magnetron sputtering machine coats the side of the product away from the base plate 100. After one side is coated, the rack 200 is rotated and flipped to coat the other side of the product. Compared with the traditional coating process of flipping the product one by one, the rotating rack 200 can flip multiple products at once, saving flipping time. Moreover, by rotating the rack 200 to flip the product, it is more labor-saving and the flipping efficiency is higher.

[0027] Preferably, a plurality of spindles 107 are fixedly provided on the base plate 100, and the number of spindles 107 corresponds one-to-one with the number of placement racks 200. The spindles 107 pass through the placement racks 200 to rotatably connect the placement racks 200 and the base plate 100.

[0028] In this embodiment, multiple spindles 107 are fixedly mounted on the base plate 100. The number of spindles 107 corresponds one-to-one with the number of placement racks 200. The spindles 107 pass through the placement racks 200, rotatably connecting the placement racks 200 and the base plate 100.

[0029] More preferably, one end of the placement rack 200 is provided with a rotating block 204, and each spindle 107 passes through the corresponding rotating block 204 to make the placement rack 200 rotatably connected to the base plate 100. The other end of the placement rack 200 is detachably connected to the base plate 100. Each placement rack 200 corresponds to one station. After the side of the product in the hopper 201 away from the center of the base plate 100 is sputtered, each placement rack 200 rotates around the spindle 107 toward the next station in the same circumferential direction, flipping the inner sputtering window 202 and the outer sputtering window 203.

[0030] In this embodiment, a plurality of mandrels 107 are fixedly mounted on the base plate 100. The number of mandrels 107 corresponds to the number of placement racks 200. A rotating block 204 is provided at one end of each placement rack 200. Each mandrel 107 passes through the corresponding rotating block 204, making the placement rack 200 rotatably connected to the base plate 100. The other end of the placement rack 200 is detachably connected to the base plate 100. By placing the rotating block 204 at the end, more products can be placed in the same length of hopper 201. The rotating block 204 is placed at the center or other position of the placement rack 200. The rotating block 204 will occupy a certain space of the hopper 201, reducing the amount of products placed. Each placement rack 200 corresponds to one station. After the side of the product in the hopper 201 away from the center of the base plate 100 is sputtered, each placement rack 200 rotates around the spindle 107 towards the next station in the same circumferential direction, flipping the inner sputtering window 202 and the outer sputtering window 203. This is very convenient and quick, reducing the product flipping time.

[0031] Preferably, each placement rack 200 has a positioning pin 205 on the side of the other end near the base plate 100, and the base plate 100 has a plurality of positioning holes 206, with the positioning pin 205 being inserted and fixed into one of the corresponding positioning holes 206.

[0032] In this embodiment, a positioning pin 205 is provided on the other end of each placement rack 200 near the base plate 100. The base plate 100 is provided with multiple positioning holes 206. The positioning pin 205 is inserted and fixed with one of the corresponding positioning holes 206. When the placement rack 200 needs to be rotated and flipped, the placement rack 200 is pushed upward a certain distance, and the positioning pin 205 disengages from the positioning hole 206. Then, the placement rack 200 is rotated to achieve the rotation and flipping of the placement rack 200. If the rotating block 204 is set at the end of the placement rack 200, then the positioning pin 205 is set at the other end of the placement rack 200 to fix the placement rack 200 during the sputtering coating process. If the rotating block 204 is set at the center or other position of the placement rack 200, then positioning pins 205 and positioning holes 206 need to be set at both ends of the placement rack 200 to fix the placement rack 200, making the product structure of the placement rack 200 more complex, increasing the cost, and making it more troublesome to use.

[0033] More preferably, arc-shaped transition angles 207 are provided at both ends of the hopper 201.

[0034] In this embodiment, arc-shaped transition angles 207 are provided at both ends of the hopper 201. By providing arc-shaped transition angles 207, the defects caused by collisions during product placement and retrieval can be reduced. Furthermore, arc-shaped transition angles 207 are applicable to products of different widths and sizes, effectively expanding the usable space for different products and increasing utilization.

[0035] Preferably, the base plate 100 includes a fixing plate 101, which is fixed to the rotating shaft. Multiple connecting plates 102 are spaced apart in the circumferential direction of the fixing plate 101. The number of connecting plates 102 corresponds to the number of spindles 107. The spindles 107 and the positioning holes 206 are both located at the end of the connecting plate 102 away from the fixing plate 101.

[0036] In this embodiment, the base plate 100 includes a fixing plate 101 and a plurality of connecting plates 102 spaced apart in the circumferential direction of the fixing plate 101. Under the premise of meeting the support strength, the spaced connecting plates 102 use less material and have a better economic cost. Moreover, the sputtering coating fixture needs to be cleaned after a period of use. By setting the spaced connecting plates 102, the cleaning time of the fixture can be effectively reduced.

[0037] More preferably, a connecting block 103 is fixedly provided at the end of the connecting plate 102 away from the fixed plate 101, the spindle 107 is fixed on the connecting block 103, and each connecting block 103 is provided with two positioning holes 206, which are distributed on both sides of the spindle 107.

[0038] In this embodiment, a connecting block 103 is fixedly provided at the end of the connecting plate 102 away from the fixing plate 101, the spindle 107 is fixed on the connecting block 103, and each connecting block 103 is provided with two positioning holes 206, which are respectively distributed on both sides of the spindle 107.

[0039] More preferably, a reinforcing plate 104 is provided between two adjacent connecting plates 102.

[0040] In this embodiment, a reinforcing plate 104 is also provided between two adjacent connecting plates 102 to strengthen the supporting strength of the connecting plates 102.

[0041] More preferably, the fixing plate 101 has a through hole at its center, and a bushing 105 is fixedly installed on the fixing plate 101. The rotating shaft passes through the through hole and the bushing 105 and is then fixed to the bushing 105.

[0042] In this embodiment, a through hole is provided in the center of the fixing plate 101, and a bushing 105 is fixedly provided on the fixing plate 101. The rotating shaft passes through the through hole and the bushing 105 and is fixed to the bushing 105.

[0043] More preferably, the bushing 105 is welded to the fixing plate 101, and the fixing plate 101 is provided with gaps 106 at intervals in the circumferential direction.

[0044] In this embodiment, the bushing 105 is welded to the fixing plate 101, and the fixing plate 101 is provided with gaps 106 in the circumferential direction to prevent the fixing plate 101 from deforming during welding.

[0045] It should be noted that in this invention, the use of terms such as "first," "second," and "a" is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified. The terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two elements or the interaction between two elements, unless otherwise explicitly specified. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0046] Furthermore, the technical solutions of the various embodiments of the present invention can be combined with each other, but only if they are feasible for those skilled in the art. If the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such combination of technical solutions does not exist and is not within the scope of protection claimed by the present invention.

[0047] The specific embodiments described herein are merely illustrative of the spirit of the invention. Those skilled in the art to which this invention pertains may make various modifications or additions to the described specific embodiments or use similar methods to substitute them, without departing from the spirit of the invention or exceeding the scope defined by the appended claims.

Claims

1. A magnetron sputtering coating fixture, characterized in that, The device includes a base plate and multiple placement racks. The base plate is fixedly connected to a rotating shaft. The multiple placement racks are spliced ​​end to end around the circumference of the base plate, and each placement rack is rotatably connected to the base plate. The end of each placement rack is detachably connected to the base plate. Each placement rack is provided with a hopper with an opening at the top for placing products. The inner side of each placement rack is provided with an inner sputtering window that communicates with the hopper, and the outer side of each placement rack is provided with an outer sputtering window that communicates with the hopper. The base plate includes a fixing plate, which is fixed to the rotating shaft. Multiple connecting plates are spaced apart in the circumferential direction of the fixing plate. A connecting block is fixedly installed at the end of the connecting plate away from the fixing plate. The spindle is fixed on the connecting block. A through hole is provided in the center of the fixing plate.

2. The magnetron sputtering coating fixture according to claim 1, characterized in that, Multiple spindles are fixedly installed on the base plate. The number of spindles corresponds one-to-one with the number of placement racks. The spindles pass through the placement racks, rotatably connecting the placement racks to the base plate.

3. The magnetron sputtering coating fixture according to claim 2, characterized in that... The placement rack has a rotating block at one end, and each mandrel passes through the corresponding rotating block to make the placement rack rotatably connected to the base plate. The other end of the placement rack is detachably connected to the base plate. Each placement rack corresponds to a work station. After the side of the product in the hopper away from the center of the base plate is sputtered, each placement rack rotates around the mandrel toward the next work station in the same circumferential direction, flipping the inner sputtering window and the outer sputtering window.

4. The magnetron sputtering coating fixture according to claim 3, characterized in that, Each of the placement racks has a positioning pin on the side near the base plate at the other end. The base plate has multiple positioning holes, and the positioning pin is inserted into one of the corresponding positioning holes for fixation.

5. A magnetron sputtering coating fixture according to claim 1 or 4, characterized in that, The hopper has arc-shaped transition angles at both ends.

6. The magnetron sputtering coating fixture according to claim 4, characterized in that, The number of connecting plates corresponds to the number of mandrels, and the mandrels and the positioning holes are both located at the end of the connecting plate away from the fixing plate.

7. The magnetron sputtering coating fixture according to claim 6, characterized in that, Each of the connecting blocks is provided with two positioning holes, which are respectively distributed on both sides of the mandrel.

8. The magnetron sputtering coating fixture according to claim 6, characterized in that, A reinforcing plate is provided between two adjacent connecting plates.

9. A magnetron sputtering coating fixture according to claim 6, characterized in that, A bushing is fixedly installed on the fixed plate, and the rotating shaft passes through the through hole and the bushing and is then fixed to the bushing.

10. A magnetron sputtering coating fixture according to claim 9, characterized in that, The bushing is welded and fixed to the fixing plate, and the fixing plate is provided with gaps at intervals in the circumferential direction.

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