High infrared reflective coating

Abstract

The present invention relates to the field of coating technology, and in particular to a high-infrared reflective coating; comprising a transition layer, a reflective auxiliary layer, a reflective layer, and a protective layer deposited sequentially on a base layer; the present invention has the following beneficial technical effects: providing a reflective coating, which is deposited into a composite structure using inorganic materials, and the resulting coating has high reflectivity in both near-infrared and far-infrared, and the coating is strong and corrosion-resistant.

Description

Technical Field

[0001] The present invention relates to the technical field of coatings, in particular to a high infrared reflection coating. Background Art

[0002] Industrial heating equipment often experiences undesirable heat dissipation during use. To improve the thermal efficiency of these devices, high-infrared reflective coatings have been introduced. These coatings exhibit high reflectivity in the near-infrared and far-infrared electromagnetic waves. Their infrared reflective properties can be used to achieve thermal insulation and energy savings in equipment such as annealing furnaces.

[0003] Vacuum coating and spray coating are common methods for forming infrared reflective coatings on device substrates. Vacuum coating is primarily used for near-infrared high-reflectivity coatings and has not been applied to coatings with high reflectivity in both the near-infrared and far-infrared regions. Spray coating deposits highly reflective coatings through plasma spraying combined with high-temperature sintering. However, the resulting coatings typically have an infrared reflectivity of less than 75% and are not corrosion-resistant, limiting their application. Summary of the Invention

[0004] The primary purpose of the present invention is to provide a high infrared reflective coating that can have high reflectivity in both near infrared and far infrared, and the coating is strong and corrosion-resistant.

[0005] A high infrared reflective coating comprises a transition layer, a reflection auxiliary layer, a reflective layer and a protective layer deposited on a base layer in sequence;

[0006] The thermal expansion coefficient of the base layer is (1-10)×10 -6 / K;

[0007] The thermal expansion coefficient of the transition layer is (1-10)×10 -6 / K;

[0008] The thermal expansion coefficient of the reflection auxiliary layer is (1-10)×10 -6 / K;

[0009] The thermal expansion coefficient of the reflective layer is (1-10)×10 -5 / K;

[0010] The thickness of the high infrared reflective coating is 700nm to 3500nm.

[0011] Preferably, the number of the reflection auxiliary layers is 1 to 100.

[0012] Preferably, the number of the reflective layer is 1 to 100.

[0013] Preferably, the thicknesses of the transition layer, the reflection auxiliary layer, the reflection layer and the protection layer are 1 to 1000 nm respectively.

[0014] Preferably, the base layer is aluminum oxide or zirconium oxide.

[0015] Preferably, the transition layer is one of metal tungsten, metal molybdenum, tungsten-molybdenum alloy, silicon nitride, silicon oxide, aluminum nitride, and aluminum oxide.

[0016] Preferably, the reflection auxiliary layer is made of metal tungsten, metal molybdenum or tungsten-molybdenum alloy.

[0017] Preferably, the reflective layer is made of one of gold, silver, copper and aluminum.

[0018] Preferably, the protective layer is aluminum oxide or titanium dioxide.

[0019] Preferably, the deposition method is magnetron sputtering.

[0020] Unless otherwise specified, when the present invention relates to the percentage between liquids, the percentages are volume / volume percentages; when the present invention relates to the percentage between liquids and solids, the percentages are volume / weight percentages; when the present invention relates to the percentage between solids and liquids, the percentages are weight / volume percentages; and the rest are weight / weight percentages.

[0021] Compared with the prior art, the present invention has the following beneficial technical effects: providing a reflective coating, which is deposited into a composite structure using inorganic materials. The resulting coating has high reflectivity (≥85%) in both near-infrared and far-infrared, and the coating is strong and corrosion-resistant. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 This is a schematic structural diagram of Example 1 of the present invention;

[0023] Figure 2 This is a structural diagram of Example 2 of the present invention. DETAILED DESCRIPTION

[0024] The present invention will be described below with reference to Examples, but the present invention is not limited to the Examples.

[0025] Example 1

[0026] See Figure 1 , a high infrared reflective coating with a total thickness of 1050 nm, comprising a transition layer 20, a reflection auxiliary layer 30, a reflective layer 40 and a protective layer 50 sequentially deposited on a base layer 10;

[0027] The base layer 10 is made of aluminum oxide, and the thermal expansion coefficient of the material is 8.4×10-6 / K, the material deposition thickness is 300nm;

[0028] The transition layer 20 is made of silicon nitride, and the thermal expansion coefficient of the material is 2.6×10 -6 / K, the material deposition thickness is 200nm;

[0029] The reflective auxiliary layer 30 is made of metal molybdenum, and the thermal expansion coefficient of the material is 4.9×10 -6 / K, material deposition thickness is 100nm;

[0030] The reflective layer 40 is made of copper, and the thermal expansion coefficient of the material is 2×10 -5 / K, the material deposition thickness is 200nm;

[0031] The protective layer 50 is made of aluminum oxide, and the thermal expansion coefficient of the material is 8.4×10 -6 / K, the material deposition thickness is 250nm.

[0032] The method for forming the high infrared reflective coating adopts conventional magnetron sputtering technology, for example: (1) removing impurities on the surface of the base layer 10; (2) heat-treating the base layer 10 to remove moisture; (3) sequentially plating a transition layer 20, a reflective auxiliary layer 30, a reflective layer 40 and a protective layer 50 on the base layer 10.

[0033] Using a spectrophotometer, the material reflectivity is ≥85% at a wavelength of 800-2500nm.

[0034] Example 2

[0035] See Figure 2 , a high infrared reflective coating with a total thickness of 1600 nm, comprising a transition layer 20, a first reflective auxiliary layer 30, a second reflective auxiliary layer 30, a first reflective layer 40, a second reflective layer 40, a third reflective layer 40 and a protective layer 50 sequentially deposited on a base layer 10;

[0036] The base layer 10 is made of zirconium oxide, and the thermal expansion coefficient of the material is 10×10 -6 / K, the material deposition thickness is 300nm;

[0037] The transition layer 20 is made of tungsten-molybdenum alloy, and the thermal expansion coefficient of the material is 4.7×10 -6 / K, the material deposition thickness is 150nm;

[0038] The first reflective auxiliary layer 30 is made of metal tungsten, and the thermal expansion coefficient of the material is 4.6×10 -6 / K, the material deposition thickness is 250nm;

[0039] The second reflective auxiliary layer 30 is made of metal molybdenum, and the thermal expansion coefficient of the material is 4.9×10 -6 / K, the material deposition thickness is 150nm;

[0040] The first reflective layer 40 is made of copper, and the thermal expansion coefficient of the material is 2×10 -5 / K, the material deposition thickness is 200nm;

[0041] The second reflective layer 40 is made of aluminum, and the thermal expansion coefficient of the material is 2.3×10 -5 / K, the material deposition thickness is 250nm;

[0042] The third reflective layer 40 is made of copper, and the thermal expansion coefficient of the material is 2×10 -5 / K, material deposition thickness is 100nm;

[0043] The protective layer 50 is titanium dioxide, and the thermal expansion coefficient of the material is 7.6×10 -6 / K, the material deposition thickness is 200nm.

[0044] Using a spectrophotometer, the material reflectivity is ≥85% at a wavelength of 800-2500nm.

Claims

1. A high infrared reflective coating, characterized in that: The total thickness is 1050nm, including a transition layer, a reflection auxiliary layer, a reflection layer and a protective layer deposited on the base layer in sequence; the base layer is aluminum oxide, and the thermal expansion coefficient of the material is 8.4×10 -6 / K, the material deposition thickness is 300nm; the transition layer is silicon nitride, and the thermal expansion coefficient of the material is 2.6×10 -6 / K, the material deposition thickness is 200nm; the reflection auxiliary layer is metal molybdenum, and the thermal expansion coefficient of the material is 4.9×10 -6 / K, the material deposition thickness is 100nm; the reflective layer is made of metallic copper, and the thermal expansion coefficient of the material is 2×10 -5 / K, the material deposition thickness is 200nm; the protective layer is aluminum oxide, and the thermal expansion coefficient of the material is 8.4×10 -6 / K, the material deposition thickness is 250nm; Or, the total thickness is 1600nm, including a transition layer, a first reflection auxiliary layer, a second reflection auxiliary layer, a first reflection layer, a second reflection layer, a third reflection layer and a protective layer deposited on the base layer in sequence; the base layer is zirconium oxide, and the thermal expansion coefficient of the material is 10×10 -6 / K, the material deposition thickness is 300nm; the transition layer is tungsten-molybdenum alloy, the thermal expansion coefficient of the material is 4.7×10 -6 / K, the material deposition thickness is 150nm; the first reflective auxiliary layer is metal tungsten, and the thermal expansion coefficient of the material is 4.6×10 -6 / K, the material deposition thickness is 250nm; the second reflective auxiliary layer is metal molybdenum, and the thermal expansion coefficient of the material is 4.9×10 -6 / K, the material deposition thickness is 150nm; the first reflective layer is metal copper, and the thermal expansion coefficient of the material is 2×10 -5 / K, the material deposition thickness is 200nm; the second reflective layer is metal aluminum, and the thermal expansion coefficient of the material is 2.3×10 -5 / K, the material deposition thickness is 250nm; the third reflective layer is metal copper, and the thermal expansion coefficient of the material is 2×10 -5 / K, the material deposition thickness is 100nm; the protective layer is titanium dioxide, and the thermal expansion coefficient of the material is 7.6×10 -6 / K, the material deposition thickness is 200nm.

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