Electrochromic device and method of manufacturing the same

Abstract

The present application relates to a kind of electrochromic devices, including sequentially stacked first conductive substrate layer, ion storage layer, electrolyte layer, electrochromic layer and second conductive substrate layer, wherein electrolyte layer edge region is provided with sequentially stacked first bus bar, isolation layer and second bus bar, first bus bar is close to ion storage layer, and second bus bar is close to electrochromic layer, so by the first bus bar and the second bus bar are set in electrolyte layer edge region, without affecting the electrochromic function of device, avoid the problem that ion storage layer and electrochromic layer thickness is not uniform caused by burying bus bar under ion storage layer or electrochromic layer, ensure the color-changing speed and uniformity of electrochromic device.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photoelectric devices, in particular to an electrochromic device and a preparation method thereof. BACKGROUND

[0002] The electrochromic device can stably and reversibly change color under the action of an applied electric field, and reversibly change in color and transparency in appearance. Generally, the electrochromic device is composed of a substrate, a conductive layer, an electrochromic layer, an electrolyte layer, an ion storage layer, a conductive layer and a substrate which are sequentially stacked, wherein a bus bar is arranged between one of the conductive layers and the electrochromic layer, and another bus bar is arranged between the other conductive layer and the ion storage layer. When a voltage is applied to the two bus bars, ions are conducted from the ion storage layer to the electrochromic layer through the electrolyte layer to achieve color change; when a reverse voltage is applied, ions are conducted from the electrochromic layer to the ion storage layer through the electrolyte layer to achieve color fading.

[0003] Generally, the thickness of the bus bar is greater than the thickness of the ion storage layer or the electrochromic layer, so that the ion storage layer part and the electrochromic layer part provided with the bus bar form a protrusion, and the accumulation or absence of the electrochromic layer and the ion storage layer (especially the electrochromic layer) is easily formed in the peripheral area of the protrusion, so that the electrochromic layer in the peripheral area is thicker or thinner, thereby causing poor color change speed and uniformity of the electrochromic device. SUMMARY

[0004] Therefore, it is necessary to provide an electrochromic device and a preparation method thereof which can avoid uneven thickness of the ion storage layer and the electrochromic layer.

[0005] The first aspect of the present application provides an electrochromic device, comprising a first conductive substrate layer, an ion storage layer, an electrolyte layer, an electrochromic layer and a second conductive substrate layer which are sequentially stacked; wherein the edge area of the electrolyte layer is provided with a first bus bar, a separation layer and a second bus bar which are sequentially stacked, the first bus bar is close to the ion storage layer, the second bus bar is close to the electrochromic layer, the first bus bar, the separation layer and the second bus bar are respectively arranged adjacent to the electrolyte layer, and the first bus bar and the second bus bar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when external electric energy is input.

[0006] The electrochromic device includes a first conductive substrate layer, an ion storage layer, an electrolyte layer, an electrochromic layer and a second conductive substrate layer which are sequentially stacked, wherein the electrolyte layer edge region is provided with a first bus bar, a separation layer and a second bus bar which are sequentially stacked, the first bus bar is close to the ion storage layer, the second bus bar is close to the electrochromic layer, the first bus bar, the separation layer and the second bus bar are respectively arranged adjacent to the electrolyte layer, and the first bus bar and the second bus bar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when external electric energy is input. By arranging the first bus bar and the second bus bar at the edge region of the electrolyte layer, the problem of uneven thickness of the ion storage layer and the electrochromic layer caused by burying the bus bar under the ion storage layer or the electrochromic layer is avoided without affecting the electrochromic function of the device, and the color changing speed and uniformity of the electrochromic device are ensured.

[0007] In some embodiments, the first bus bar and the second bus bar are respectively electrically connected with the first conductive substrate layer and the second conductive substrate layer. That is, when external electric energy is input, the first bus bar and the second bus bar are used to conduct the external electric energy to the first conductive substrate layer and the second conductive substrate layer respectively. In this way, by electrically connecting the bus bar with the conductive substrate, the external electric energy introduced through the bus bar can more conveniently form a potential difference between the conductive substrate layers, so as to more effectively form an electric field between the ion storage layer and the electrochromic layer, thereby realizing the color changing or light transmittance changing of the electrochromic device.

[0008] In some embodiments, the electrochromic layer and the ion storage layer are both layers of conductive material. In this way, when the first bus bar and the second bus bar are connected with the electrochromic layer and the ion storage layer respectively, the external electric energy can be conducted to the conductive substrate layer (the conductive layer therein) through the electrochromic layer and the ion storage layer, so as to form an electric field inside the device, so that the ions or electrons in the electrochromic layer and the ion storage layer undergo intercalation or deintercalation phenomenon, which is manifested as color changing or light transmittance changing of the device, etc.

[0009] In some embodiments, the electrolyte layer extends to the surface of the separation layer and is in contact with the sidewall of the first bus bar to bond the separation layer, the first bus bar and the ion storage layer; and / or the electrolyte layer extends to the surface of the separation layer and is in contact with the sidewall of the second bus bar to bond the separation layer, the second bus bar and the electrochromic layer. In some examples, the electrolyte layer contains a bonding material. In this way, extending the electrolyte layer to the surface of the separation layer can form a more stable bond between the electrolyte layer, the ion storage layer and the electrochromic layer, and further extending to the sidewall of the bus bar can make the bond between the bus bar and the electrolyte layer more firm, thereby improving the connection stability and reliability of the whole device, etc.

[0010] In some embodiments, the electrolyte layer penetrates the first busbar in a direction parallel to the first conductive substrate layer to bond with the first busbar; and / or the electrolyte layer penetrates the second busbar in a direction parallel to the first conductive substrate layer to bond with the second busbar. This allows the electrolyte layer to extend to the outer region of the busbar (away from the intermediate electrolyte layer), resulting in electrolyte layers on both sides of the busbar. This provides a more stable bond between the busbar and the electrochromic layer or ion storage layer, preventing busbar detachment and further improving device stability. Furthermore, by extending the electrolyte layer through the busbar, it prevents electrolyte from spreading to the surfaces where the busbar contacts the electrochromic layer / ion storage layer / conductive substrate layer, thus blocking the electrical connection between the busbar and the electrochromic layer / ion storage layer / conductive substrate layer and preventing open circuits.

[0011] In some embodiments, the electrolyte layer extends to the edge region of the ion storage layer to bond the ion storage layer and the isolation layer; and / or the electrolyte layer extends to the edge region of the electrochromic layer to bond the electrochromic layer and the isolation layer. This allows for lateral bonding between the electrolyte layer and the ion storage layer or electrochromic layer, improving the adhesion between the ion storage layer or electrochromic layer and the isolation layer, thereby enhancing the overall connection stability and reliability of the device.

[0012] In some embodiments, the electrolyte layer further extends to the surface of the isolation layer to bond the isolation layer and the ion storage layer; and / or the electrolyte layer further extends to the surface of the isolation layer to bond the isolation layer and the electrochromic layer. This improves the adhesion between the ion storage layer or electrochromic layer and the isolation layer, thereby enhancing the overall connection stability and reliability of the device.

[0013] In some embodiments, the first busbar penetrates the ion storage layer in the stacking direction and contacts the first conductive substrate layer; and / or the second busbar penetrates the electrochromic layer in the stacking direction and contacts the second conductive substrate layer. This allows for a more efficient electrical connection between the busbar and the conductive substrate, enabling more convenient and efficient conduction of external electrical energy to the conductive substrate through the busbar, thereby creating an electric field within the electrochromic device and achieving its electrochromic effect.

[0014] In some embodiments, the electrochromic device further comprises a first barrier layer between the first bus bar and the ion storage layer, and / or a second barrier layer between the second bus bar and the electrochromic layer. In some examples, the first barrier layer and the second barrier layer are layers of electrically insulating material. In this way, by providing a barrier layer with insulating properties between the sidewall of the bus bar and the sidewall of the ion storage layer or the electrochromic layer, the influence of ion migration during operation of the electrochromic device on the bus bar can be effectively avoided, to ensure the reliability and stability of the bus bar.

[0015] In some embodiments, the surface of the first bus bar facing the first conductive substrate layer is non-planar, and / or the surface of the second bus bar facing the second conductive substrate layer is non-planar. In this case, by designing the bus bar to be non-planar, a greater pressing force can be generated when the surface of the bus bar contacts the electrochromic layer or the ion storage layer, to more effectively pierce or crush the electrochromic layer or the ion storage layer, thereby achieving electrical connection between the bus bar and the conductive substrate layer.

[0016] A second aspect of the present application provides another electrochromic device, comprising a first conductive substrate layer, an ion storage layer, an electrolyte layer, an electrochromic layer and a second conductive substrate layer stacked in sequence, the surface of the first conductive substrate layer comprising a first inner region and a first edge region located at the edge of the first inner region, the surface of the second conductive substrate layer comprising a second inner region and a second edge region located at the edge of the second inner region; wherein the ion storage layer is located in the first inner region, and the electrochromic layer is located in the second inner region, the electrochromic device further comprising a separation layer, a first bus bar and a second bus bar, the separation layer being located in the first edge region and the second edge region, the first bus bar being embedded in the separation layer and in contact with the first conductive substrate layer, and the second bus bar being embedded in the separation layer and in contact with the second conductive substrate layer.

[0017] The first bus bar and the second bus bar are embedded in the separation layer, so that the separation layer separates the first bus bar from the ion storage layer and the second bus bar from the electrochromic layer, so that the sidewall of the first bus bar does not directly contact the sidewall of the ion storage layer, and the sidewall of the second bus bar does not directly contact the sidewall of the electrochromic layer, avoiding the influence of ion migration during operation of the electrochromic device on the first bus bar and the second bus bar, to ensure the reliability and stability of the bus bar.

[0018] In some embodiments, the isolation layer is formed with protrusions towards the region of the electrolyte layer. In this way, the distance of ion flow in the electrolyte layer can be lengthened, and the current size at this position can be reduced.

[0019] In some embodiments, the first bus bar is embedded in the first conductive substrate layer; and / or

[0020] The second bus bar is embedded in the second conductive substrate layer. Embedding the first bus bar in the first conductive substrate layer can increase the contact area between the first bus bar and the first conductive substrate layer, and embedding the second bus bar in the second conductive substrate layer can increase the contact area between the second bus bar and the second conductive substrate layer, thereby improving the reliability of ion transmission and further improving the reliability of ion transmission.

[0021] The third aspect of the present application provides a preparation method of an electrochromic device, the method comprising: providing a first conductive substrate layer and disposing an ion storage layer on the first conductive substrate layer; providing a second conductive substrate layer and disposing an electrochromic layer on the second conductive substrate layer; providing an isolation layer having a first side and a second side, and disposing a first bus bar on the first side and a second bus bar on the second side; sequentially joining the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer, and sequentially stacking the first bus bar, the isolation layer, and the second bus bar, and the first bus bar is close to the ion storage layer, and the second bus bar is close to the electrochromic layer; wherein the method further comprises: disposing an electrolyte material in the region surrounded by the isolation layer to form an electrolyte layer, wherein the first bus bar and the second bus bar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when an external electric energy is input.

[0022] In one aspect of the present embodiment, the ion storage layer is disposed on the first conductive substrate layer first, and in another aspect, the electrochromic layer is disposed on the second conductive substrate layer. Then, the first bus bar and the second bus bar are disposed on the two sides of the isolation layer, respectively. Finally, the material layers are sequentially joined to sequentially stack the first bus bar, the isolation layer, and the second bus bar. In this way, by disposing the first bus bar and the second bus bar separately from the ion storage layer and the electrochromic layer, and finally joining them together by joining, compared with disposing the two bus bars first, and then disposing the ion storage layer and the electrochromic layer on the two bus bars, respectively, the problem of uneven thickness of the ion storage layer and the electrochromic layer caused by the protrusions of the ion storage layer and the electrochromic layer due to the thickness of the bus bars can be avoided. The preparation method of the present embodiment ensures the color changing speed and uniformity of the electrochromic device.

[0023] In some embodiments, the sequentially laminating the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer comprises: penetrating the first bus bar on the isolation layer through the ion storage layer to contact the first conductive substrate layer; and / or penetrating the second bus bar on the isolation layer through the electrochromic layer to contact the second conductive substrate layer. In this way, the electrical connection between the bus bar and the conductive substrate can be more effectively formed, and the external electrical energy can be more conveniently and effectively conducted to the conductive substrate through the bus bar, thereby forming an electric field in the electrochromic device to achieve the electrochromic effect.

[0024] In some embodiments, the method further comprises: sequentially laminating the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer, without curing the ion storage layer and / or without curing the electrochromic layer. In this way, the first bus bar is more easily penetrated through the ion storage layer, and the second bus bar is more easily penetrated through the electrochromic layer, without easily causing cracks in the ion storage layer and the electrochromic layer.

[0025] A fourth aspect of the present application provides another method for preparing an electrochromic device, the method comprising: providing a first conductive substrate layer, and providing an ion storage layer on the first conductive substrate layer; providing a second conductive substrate layer, and providing an electrochromic layer on the second conductive substrate layer; providing a first bus bar on the first conductive substrate layer, a side wall of the first bus bar being in contact with a side wall of the ion storage layer; providing a second bus bar on the second conductive substrate layer, a side wall of the second bus bar being in contact with a side wall of the electrochromic layer; opposing one side of the first conductive substrate layer provided with the first bus bar to one side of the second conductive substrate layer provided with the second bus bar, and providing an isolation layer between the first bus bar and the second bus bar, providing an electrolyte material in an area enclosed by the isolation layer to form an electrolyte layer, and pressing the first conductive substrate layer and the second conductive substrate layer together, wherein the first bus bar and the second bus bar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when an external electrical energy is input.

[0026] The first bus bar is arranged adjacent to the ion storage layer, the second bus bar is arranged adjacent to the electrochromic layer, then the isolation layer is arranged between the first bus bar and the second bus bar, the electrolyte material is arranged in the area surrounded by the isolation layer to form the electrolyte layer, and finally the first bus bar and the second bus bar are integrated by lamination. Compared with arranging the two bus bars first and then arranging the ion storage layer and the electrochromic layer on the two bus bars respectively, the problem that the ion storage layer and the electrochromic layer are uneven in thickness due to the protrusion of the ion storage layer and the electrochromic layer caused by the thickness of the bus bar can be avoided. The preparation method of the embodiment ensures the color changing speed and uniformity of the electrochromic device. BRIEF DESCRIPTION OF DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0028] Figure 1 It is a longitudinal section structure schematic diagram of an embodiment of the electrochromic device;

[0029] Figure 2 It is a position distribution schematic diagram of the first bus bar and the second bus bar of an embodiment on the isolation layer respectively;

[0030] Figure 3 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0031] Figure 4 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0032] Figure 5 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0033] Figure 6 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0034] Figure 7 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0035] Figure 8 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0036] Figure 9 It is a longitudinal section structure schematic diagram of another embodiment of the electrochromic device;

[0037] Figure 10A structural schematic view of a first busbar and a second busbar;

[0038] Figure 11 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0039] Figure 12 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0040] Figure 13 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0041] Figure 14 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0042] Figure 15 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0043] Figure 16 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0044] Figure 17 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment;

[0045] Figure 18 A structural schematic view of a longitudinal section of an electrochromic device of another embodiment. DETAILED DESCRIPTION

[0046] For the purpose of promoting an understanding of the application, the application will be described in greater detail below with reference to the drawings. The embodiments of the application shown in the drawings are intended to explain the disclosure of the application and are not intended to limit the scope of the application. Rather, the embodiments are provided so that the disclosure of the application is more thorough and complete.

[0047] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

[0048] It can be understood that the terms "first", "second", and the like, as used in the description of the application, can be used to describe various elements, but these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, without departing from the scope of the application, a first busbar can be referred to as a second busbar, and similarly, a second busbar can be referred to as a first busbar. Both the first busbar and the second busbar are busbars, but they are not the same busbar.

[0049] It is understood that the term "connection" in the following embodiments should be understood as "electrical connection," "communication connection," etc., if the connected circuits, modules, units, etc., have electrical signal or data transmission with each other.

[0050] When used herein, the singular forms of “a,” “an,” and “the” may also include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising / including” or “having,” etc., specify the presence of the stated features, wholes, steps, operations, components, parts, or combinations thereof, but do not preclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts, or combinations thereof. Meanwhile, the term “and / or” as used in this specification includes any and all combinations of the associated listed items.

[0051] Figure 1 This is a schematic diagram of a longitudinal section of an electrochromic device according to an embodiment, as shown below. Figure 1 As shown, the electrochromic device includes a first conductive substrate layer 100, an ion storage layer 101, an intermediate layer 102, an electrochromic layer 103, and a second conductive substrate layer 104 stacked sequentially; wherein the intermediate layer 102 includes an electrolyte layer 1021 and a first busbar 1022, an isolation layer 1023, and a second busbar 1024 stacked sequentially at the edge region of the electrolyte layer 1021, the first busbar 1022 being close to the ion storage layer 101, and the second busbar 1024 being... Near the electrochromic layer 103, the electrolyte layer 1021 is located between the ion storage layer 101 and the electrochromic layer 103. The first bus bar 1022, the isolation layer 1023, and the second bus bar 1024 are respectively arranged adjacent to the electrolyte layer 1021. The first bus bar 1022 and the second bus bar 1024 are used to form an electric field between the ion storage layer 101 covered by the electrolyte layer 1021 and the electrochromic layer 103 covered by the electrolyte layer 1021 when external electrical energy is input.

[0052] Both the first busbar 1022 and the second busbar 1024 can be U-shaped busbars, and their longitudinal cross-sectional structures can be referenced. Figure 1 Alternatively, both the first busbar 1022 and the second busbar 1024 may be semi-enclosed busbars, for example, such as... Figure 2 As shown, the longitudinal section structure of the electrochromic device can be as follows: Figure 3 or Figure 4 As shown; or one of the first busbar 1022 and the second busbar 1024 is a U-shaped busbar, and the other is a semi-enclosed busbar, the longitudinal section structure of which can be as follows: Figure 5 or Figure 6As shown. The first and second busbars can form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when external electrical energy is input, thereby achieving electrochromic performance. The first busbar can be located on the surface of the ion storage layer, and the second busbar can be located on the surface of the electrochromic layer, as shown. Figure 1 As shown, both the ion storage layer and the electrochromic layer are conductive. A portion of the electrochromic layer covering one side of the electrolyte layer forms an electric field with a portion of the ion storage layer covered by the electrolyte layer. In another embodiment, the first busbar can also penetrate the ion storage layer and contact the first conductive substrate layer, and the second busbar can penetrate the electrochromic layer and contact the second conductive substrate layer. In this case, the ion storage layer and / or the electrochromic layer can be insulated. When external power is introduced, the external power supply can be conducted to the conductive substrate layer through the busbar, thereby forming an electric field inside the device. This causes ion injection and extraction to occur in a portion of the electrochromic layer covering one side of the electrolyte layer and a portion of the ion storage layer covered by the electrolyte layer, thereby achieving the electrochromic function.

[0053] In some embodiments, the width of the first busbar 1022 may be smaller than the width of the isolation layer 1023, and the first busbar 1022 may be located in the outer edge region of the surface of the isolation layer 1023, such as... Figure 1 As shown; or the first busbar 1022 may be located in the inner edge region of the surface of the isolation layer 1023, so as to Figure 1 For example, in the implementation example, Figure 7 As shown; or the first busbar 1022 may be located in the central region of the surface of the isolation layer 1023, so as to Figure 1 For example, in the implementation example, Figure 8 As shown.

[0054] In some embodiments, the width of the second busbar 1024 may be smaller than the width of the isolation layer 1023, and the second busbar 1024 may be located in the outer edge region of the surface of the isolation layer 1023, such as... Figure 1 As shown; or the second busbar 1024 may be located in the inner edge region of the surface of the isolation layer 1023, so as to Figure 1 For example, in the implementation example, Figure 7 As shown; or the second busbar 1024 may be located in the central region of the surface of the isolation layer 1023, so as to Figure 1 For example, in the implementation example, Figure 8 As shown.

[0055] It can be understood that the first bus bar 1022 and the second bus bar 1024 are respectively circumscribed by the electrodes, and the first bus bar 1022 is electrically connected with the ion storage layer 101, and the second bus bar 1024 is electrically connected with the electrochromic layer 103. Under the action of the external electric field, the ion storage layer 101 injects or extracts ions to the electrochromic layer 103 through the electrolyte layer 1021, so as to realize the color change and fade of the electrochromic layer 103. The first conductive substrate layer 100 and the second conductive substrate layer 104 are respectively used to shorten the transmission path of the ions in the ion storage layer 101 and the electrochromic layer 103. The first bus bar 1022 transmits ions to the electrolyte layer 1021 in the order of the ion storage layer 101, the first conductive substrate layer 100, and the ion storage layer 101. The second bus bar 1024 transmits ions in the order of the electrochromic layer 103, the second conductive substrate layer 104, and the electrochromic layer 103.

[0056] In addition, the isolation layer 1023 is arranged between the first bus bar 1022 and the second bus bar 1024. The isolation layer 1023 has insulation property, so as to avoid the contact between the first bus bar 1022 and the second bus bar 1024 when the two bus bars are relatively positioned, that is, the normal projection in the stacking direction has overlap, thereby causing the short circuit failure of the formed electrochromic device. The stacking direction is the direction in which the first conductive substrate layer 100 points to the second conductive substrate layer 104.

[0057] In some embodiments, the first conductive substrate layer 100 comprises a first substrate layer and a first conductive layer which are arranged in a stack. The first conductive layer is in contact with the ion storage layer 101.

[0058] In some embodiments, the second conductive substrate layer 104 comprises a second substrate layer and a second conductive layer which are arranged in a stack. The second conductive layer is in contact with the electrochromic layer 103.

[0059] By arranging the first bus bar between the ion storage layer and the isolation layer, and arranging the second bus bar between the electrochromic layer and the isolation layer, without affecting the electrochromic function of the device, the problem of uneven thickness of the ion storage layer and the electrochromic layer caused by burying the bus bar under the ion storage layer or the electrochromic layer is avoided, and the color change speed and uniformity of the electrochromic device are ensured.

[0060] In some embodiments, the electrolyte layer 1021 extends to the surface of the isolation layer 1023 and is in contact with the sidewall of the first bus bar 1022, so as to bond the isolation layer 1023, the first bus bar 1022, and the ion storage layer 101; and / or the electrolyte layer 1021 extends to the surface of the isolation layer 1023 and is in contact with the sidewall of the second bus bar 1024, so as to bond the isolation layer 1023, the second bus bar 1024, and the electrochromic layer 103.

[0061] The electrolyte layer 1021 can have adhesion. The electrolyte layer 1021 can extend to the surface of the isolation layer 1023 and contact the sidewall of the first bus bar 1022, or the electrolyte layer 1021 extends to the surface of the isolation layer 1023 and contacts the sidewall of the second bus bar 1024, or the electrolyte layer 1021 extends to the surface of the isolation layer 1023 and contacts the sidewall of the first bus bar 1022 and the sidewall of the second bus bar 1024. It can be understood that, as shown in Figure 1 , Figure 3 to Figure 6 and Figure 8 The first bus bar 1022 can be disposed at the outer edge region or the middle region of the surface of the isolation layer 1023 to expose the inner region of the surface of the isolation layer 1023, so that the electrolyte layer 1021 can extend to the surface of the isolation layer 1023 and contact the sidewall of the first bus bar 1022; the second bus bar 1024 can be disposed at the outer edge region or the middle region of the surface of the isolation layer 1023 to expose the inner region of the surface of the isolation layer 1023, so that the electrolyte layer 1021 can extend to the surface of the isolation layer 1023 and contact the sidewall of the first bus bar 1022.

[0062] In some embodiments, the electrolyte layer 1021 extends through the first bus bar 1022 in the direction parallel to the first conductive substrate layer 100 to adhere to the first bus bar 1022; and / or the electrolyte layer 1021 extends through the second bus bar 1024 in the direction parallel to the first conductive substrate layer 100 to adhere to the second bus bar 1024.

[0063] The electrolyte layer 1021 has adhesion. The electrolyte layer 1021 can extend through the first bus bar 1022 in the direction parallel to the first conductive substrate layer 100, or extend through the second bus bar 1024 in the direction parallel to the first conductive substrate layer 100, or extend through the first bus bar 1022 and the second bus bar 1024 in the direction parallel to the first conductive substrate layer 100.

[0064] The passage through the first busbar 1022 may include partial passage through the first busbar 1022 and complete passage through the first busbar 1022. That is, the sidewall of the first busbar 1022 that contacts the electrolyte layer 1021 may have a first inner hole (not shown) that leads to the interior of the first busbar 1022 or to another sidewall of the first busbar 1022, so that the electrolyte layer 1021 can partially or completely pass through the first busbar 1022. The first inner hole may be parallel or non-parallel to the first conductive substrate layer 100, and can be designed without affecting the conductive lines inside the first busbar 1022. The passage through the second busbar 1024 may include partial passage through the second busbar 1024 and complete passage through the second busbar 1024. That is, the sidewall of the second busbar 1024 in contact with the electrolyte layer 1021 may have a second inner hole (not shown) that leads to the interior of the second busbar 1024 or to another sidewall of the second busbar 1024, so that the electrolyte layer 1021 can partially or completely pass through the second busbar 1024. The second inner hole may be parallel or non-parallel to the first conductive substrate layer 100, and can be designed without affecting the conductive lines inside the second busbar 1024.

[0065] In some embodiments, the electrolyte layer 1021 extends to the edge region of the ion storage layer 101 to bond the ion storage layer 101 and the isolation layer 1023; and / or the electrolyte layer 1021 extends to the edge region of the electrochromic layer 103 to bond the electrochromic layer 103 and the isolation layer 1023.

[0066] It is understood that the electrolyte layer 1021 may extend to the edge region of the ion storage layer 101, or to the edge region of the electrochromic layer 103, or to both the edge regions of the ion storage layer 101 and the edge regions of the electrochromic layer 103.

[0067] Specifically, the first busbar 1022 exposes the edge region of the ion storage layer 101, so that the electrolyte layer 1021 can extend to the edge region of the ion storage layer 101, for example, refer to Figure 8 As shown, when the electrolyte layer 1021 does not completely penetrate the first busbar 1022, the electrolyte layer 1021 in the edge region of the ion storage layer 101 can be obtained by injecting electrolyte material separately into the edge region of the ion storage layer 101; when the electrolyte layer 1021 completely penetrates the first busbar 1022, the electrolyte layer 1021 in the edge region of the ion storage layer 101 can be obtained by the electrolyte layer 1021 in the enclosure area of ​​the isolation layer 1023 penetrating the first busbar 1022 and extending to the edge region of the ion storage layer 101.

[0068] The second busbar 1024 exposes the edge region of the electrochromic layer 103 so that the electrolyte layer 1021 can extend to the edge region of the electrochromic layer 103, for example, refer to Figure 8As shown, when the electrolyte layer 1021 does not completely penetrate the second busbar 1024, the electrolyte layer 1021 in the edge region of the electrochromic layer 103 can be obtained by injecting electrolyte material separately into the edge region of the electrochromic layer 103; when the electrolyte layer 1021 completely penetrates the second busbar 1024, the electrolyte layer 1021 in the edge region of the electrochromic layer 103 can be obtained by the electrolyte layer 1021 in the enclosure area of ​​the isolation layer 1023 penetrating the second busbar 1024 and extending to the edge region of the electrochromic layer 103.

[0069] In some embodiments, the electrolyte layer 1021 further extends to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the ion storage layer 101; and / or the electrolyte layer 1021 further extends to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the electrochromic layer 103.

[0070] Specifically, the electrolyte layer 1021 can extend to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the ion storage layer 101, or extend to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the electrochromic layer 103, or simultaneously extend to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the electrochromic layer 103, as well as the isolation layer 1023 and the electrochromic layer 103. Through the adhesive effect of the electrolyte layer 1021, the structural stability of the electrochromic device can be enhanced.

[0071] It is understandable that when the first busbar 1022 is a non-U-shaped busbar, there is a hollow region between the isolation layer 1023 and the ion storage layer 101. In this case, the electrolyte layer 1021 can extend into this hollow region to bond the isolation layer 1023 and the ion storage layer 101, such as... Figure 5 As shown; when the second busbar 1024 is a non-U-shaped busbar, there is a hollow region between the insulating layer 1023 and the electrochromic layer 103. In this case, the electrolyte layer 1021 can extend into this hollow region to bond the insulating layer 1023 and the electrochromic layer 103, as shown. Figure 6 As shown; when both the first busbar 1022 and the second busbar 1024 are non-U-shaped busbars, there are hollow regions between the isolation layer 1023 and the ion storage layer 101, and between the isolation layer 1023 and the electrochromic layer 103. In this case, the electrolyte layer 1021 can extend into the hollow regions to simultaneously bond the isolation layer 1023 and the ion storage layer 101, and to bond the isolation layer 1023 and the electrochromic layer 103, as shown. Figure 3 or Figure 4 As shown.

[0072] In some embodiments, the first bus bar 1022 penetrates the ion storage layer 101 in the stacking direction and is in contact with the first conductive base layer 100; and / or the second bus bar 1024 penetrates the electrochromic layer 103 in the stacking direction and is in contact with the second conductive base layer 104.

[0073] Specifically, in an electrochromic device, only the first bus bar 1022 can penetrate the ion storage layer 101 in the stacking direction and be in contact with the first conductive base layer 100, or only the second bus bar 1024 can penetrate the electrochromic layer 103 in the stacking direction and be in contact with the second conductive base layer 104, or both the first bus bar 1022 and the second bus bar 1024 can penetrate the ion storage layer 101 and the electrochromic layer 103 in the stacking direction and be in contact with the first conductive base layer 100 and the second conductive base layer 104, respectively.

[0074] In some embodiments, the electrochromic device further comprises a first barrier layer (not shown) and / or a second barrier layer (not shown), the first barrier layer is located between the first bus bar 1022 and the ion storage layer 101; the second barrier layer is located between the second bus bar 1024 and the electrochromic layer 103. Figure 8 For example, in the electrochromic device structure of the embodiments, when the first bus bar 1022 penetrates the ion storage layer 101 in the stacking direction and is in contact with the first conductive base layer 100, a schematic diagram thereof can be referred to FIG. 1A. Figure 9 At this time, since the first bus bar is directly in contact with the first conductive base layer, the transmission path of ions between the first bus bar and the ion storage layer is shortened; when the second bus bar 1024 penetrates the electrochromic layer 103 in the stacking direction and is in contact with the second conductive base layer 104, a schematic diagram thereof can be referred to FIG. 1B. Figure 9 At this time, since the second bus bar is directly in contact with the second conductive base layer, the transmission path of ions between the second bus bar and the electrochromic layer is shortened. The conductivity of the first conductive base layer is higher than that of the ion storage layer, and the conductivity of the second conductive base layer is higher than that of the electrochromic layer.

[0075] In some embodiments, the first conductive base layer 100 can comprise a first conductive layer and a first base layer, wherein the first conductive layer and the first base layer are stacked, and the first bus bar 1022 penetrates the ion storage layer 101 in the stacking direction and is in contact with the first conductive layer; the second conductive base layer 104 can comprise a second conductive layer and a second base layer, wherein the second conductive layer and the second base layer are stacked, and the second bus bar 1024 penetrates the electrochromic layer 103 in the stacking direction and is in contact with the second conductive layer.

[0076] In some embodiments, the electrochromic device further comprises a first barrier layer (not shown) and / or a second barrier layer (not shown), the first barrier layer is located between the first bus bar 1022 and the ion storage layer 101; the second barrier layer is located between the second bus bar 1024 and the electrochromic layer 103.

[0077] Specifically, the electrochromic device can only include the first barrier layer, or only include the second barrier layer, or include both the first barrier layer and the second barrier layer.

[0078] It can be understood that, since the first bus bar 1022 penetrates the ion storage layer 101 in the stacking direction, the sidewall of the first bus bar 1022 is in contact with the sidewall of the ion storage layer 101, in order to avoid the influence of ion migration on the first bus bar 1022 during the operation of the electrochromic device, and to ensure the reliability and stability of the bus bar, a first barrier layer with insulating properties, for example, a photo oil layer, can be arranged between the sidewall of the first bus bar 1022 and the sidewall of the ion storage layer 101.

[0079] Since the second bus bar 1024 penetrates the electrochromic layer 103 in the stacking direction, the sidewall of the second bus bar 1024 is in contact with the sidewall of the electrochromic layer 103, in order to avoid the influence of ion migration on the second bus bar 1024 during the operation of the electrochromic device, and to ensure the reliability and stability of the bus bar, a second barrier layer with insulating properties, for example, a photo oil layer, can be arranged between the sidewall of the second bus bar 1024 and the sidewall of the electrochromic layer 103.

[0080] In some embodiments, the surface of the first bus bar 1022 towards the first conductive substrate layer 100 is non-planar.

[0081] In some embodiments, the surface of the second bus bar 1024 towards the second conductive substrate layer 104 is non-planar.

[0082] It can be understood that, in order to make the bus bar in contact with the conductive substrate layer, the first bus bar 1022 can be squeezed to break the ion storage layer 101 and the second bus bar 1024 can be squeezed to break the electrochromic layer 103 when the electrochromic device is prepared by pressing, and therefore, arranging the surface of the bus bar to be non-planar can increase the pressure of the bus bar on the ion storage layer 101 and the electrochromic layer 103.

[0083] The non-planar surface can be an arched surface, for example, a fan-shaped, semicircular or arched bridge-shaped surface, and the like, so as to Figure 8 For example, the structure of the electrochromic device of the embodiment when the surface of the first bus bar 1022 and the surface of the second bus bar 1024 are arched surfaces can refer to FIG. 1C shown. Figure 10 In addition, the surface can also be a sharp-angled surface, for example, a zigzag-shaped surface.

[0084] In some embodiments, the surface of the bus bar towards the conductive substrate layer can also be partially non-planar in the length direction of the bus bar.

[0085] The embodiment of the present application also provides an electrochromic device, for example, the electrochromic device shown in FIG. 1A. Figure 11As shown, the electrochromic device comprises a first conductive substrate layer 200, an intermediate layer and a second conductive substrate layer 204 which are sequentially stacked, the surface of the first conductive substrate layer 200 comprises a first inner region and a first edge region located at the edge of the first inner region, and the surface of the second conductive substrate layer 204 comprises a second inner region and a second edge region located at the edge of the second inner region; wherein the intermediate layer comprises an ion storage layer 201, an electrolyte layer 2021, an electrochromic layer 203, a separation layer 2023, a first bus bar 2022 and a second bus bar 2024, the ion storage layer 201, the electrolyte layer 2021 and the electrochromic layer 203 are sequentially stacked, and the ion storage layer 201 is located in the first inner region, the electrochromic layer 203 is located in the second inner region, the separation layer 2023 is located in the first edge region and the second edge region, the first bus bar 2022 is embedded in the separation layer 2023 and in contact with the first conductive substrate layer 200, and the second bus bar 2024 is embedded in the separation layer 2023 and in contact with the second conductive substrate layer 204.

[0086] The first bus bar 2022 and the second bus bar 2024 can both be a U-shaped bus bar, at which time the longitudinal section structure schematic diagram can be as shown in Figure 11 The first bus bar 2022 and the second bus bar 2024 can both be a U-shaped bus bar, at which time the longitudinal section structure schematic diagram can be as shown in Figure 12 The first bus bar 2022 and the second bus bar 2024 can both be a U-shaped bus bar, at which time the longitudinal section structure schematic diagram can be as shown in Figure 13 The first bus bar 2022 and the second bus bar 2024 can both be a U-shaped bus bar, at which time the longitudinal section structure schematic diagram can be as shown in Figure 14 The first bus bar 2022 and the second bus bar 2024 can both be a U-shaped bus bar, at which time the longitudinal section structure schematic diagram can be as shown in Figure 15 The first bus bar 2022 and the second bus bar 2024 can both be a U-shaped bus bar, at which time the longitudinal section structure schematic diagram can be as shown in

[0087] The width of the first bus bar 2022 is smaller than the width of the separation layer 2023 so as to be able to be embedded in the separation layer 2023, and the first bus bar 2022 can be located at the outer edge region of the surface of the separation layer 2023, so as to Figure 11 For example, the positional relationship between the first bus bar 2022 and the separation layer 2023 can be as shown in Figure 16 For example, the positional relationship between the first bus bar 2022 and the separation layer 2023 can be as shown in Figure 11 For example, the positional relationship between the first bus bar 2022 and the separation layer 2023 can be as shown in

[0088] The width of the second bus bar 2024 is smaller than the width of the separation layer 2023 so as to be able to be embedded in the separation layer 2023, and the second bus bar 2024 can be located at the outer edge region of the surface of the separation layer 2023, so as to Figure 11 For example, the positional relationship between the second bus bar 2024 and the separation layer 2023 can be as shown in Figure 16 For example, the positional relationship between the second bus bar 2024 and the separation layer 2023 can be as shown in Figure 11 For example, the positional relationship between the second bus bar 2024 and the separation layer 2023 can be as shown in

[0089] The isolation layer 2023 has insulation property. It can be understood that the first bus bar 2022 and the second bus bar 2024 are provided with the isolation layer 2023, and the isolation layer 2023 has insulation property, which can avoid the contact between the first bus bar and the second bus bar when the positions of the two bus bars are opposite, that is, the orthographic projection in the stacking direction overlaps, thereby forming an electrical connection, and thus causing a short circuit fault of the electrochromic device formed. The stacking direction is the direction in which the first conductive substrate layer 200 points to the second conductive substrate layer 204.

[0090] In addition, the first bus bar 2022 is embedded in the isolation layer 2023, so that the isolation layer 2023 isolates the first bus bar 2022 from the ion storage layer 201, so that the side wall of the first bus bar 2022 and the side wall of the ion storage layer 201 do not directly contact, avoiding the influence of ion migration on the first bus bar during the working process of the electrochromic device, to ensure the reliability and stability of the bus bar. The second bus bar 2024 is embedded in the isolation layer 2023, so that the isolation layer 2023 isolates the second bus bar 2024 from the electrochromic layer 203, so that the side wall of the second bus bar and the side wall of the electrochromic layer do not directly contact, avoiding the influence of ion migration on the first bus bar during the working process of the electrochromic device, to ensure the reliability and stability of the bus bar.

[0091] In some embodiments, the first conductive substrate layer 200 includes a first substrate layer and a first conductive layer stacked, wherein the first conductive layer is in contact with the ion storage layer 201, the first bus bar 2022 and the isolation layer 2023, respectively.

[0092] In some embodiments, the second conductive substrate layer 204 includes a second substrate layer and a second conductive layer stacked, wherein the second conductive layer is in contact with the electrochromic layer 203, the second bus bar 2024 and the isolation layer 2023, respectively.

[0093] The electrochromic device of the embodiment of the present application is provided with the first bus bar and the ion storage layer, and the first bus bar is embedded in the isolation layer. The second bus bar and the electrochromic layer are provided separately, and the second bus bar is embedded in the isolation layer, thereby preventing the first bus bar and the second bus bar from directly contacting. Without affecting the electrochromic function of the device, the problem of uneven thickness of the ion storage layer and the electrochromic layer caused by the first bus bar and the second bus bar is avoided. In addition, since the isolation layer prevents the first bus bar from directly contacting the ion storage layer and the second bus bar from directly contacting the electrochromic layer, the influence of ion migration on the first bus bar during the working process of the electrochromic device is avoided, thereby ensuring the reliability and stability of the bus bar.

[0094] In some embodiments, the area of the isolation layer 2023 towards the electrolyte layer 2021 can be formed with a protrusion, such as Figure 17As shown, in this way, the distance of ion flow in the electrolyte layer 2021 can be lengthened, and the current size at this position can be reduced.

[0095] In some embodiments, the first bus bar 2022 can be embedded in the first conductive substrate layer 200, as shown in FIG. 2B. Figure 18 As shown, in this way, the contact area of the first bus bar 2022 and the first conductive substrate layer 200 can be increased, and the reliability of ion transmission can be improved. When the first conductive substrate layer 200 includes a first conductive layer and a first substrate layer, the first bus bar 2022 can be embedded in the first conductive layer.

[0096] In some embodiments, the second bus bar 2024 can be embedded in the second conductive substrate layer 204, as shown in FIG. 2D. Figure 18 As shown, in this way, the contact area of the second bus bar 2024 and the second conductive substrate layer 204 can be increased, and the reliability of ion transmission can be improved. When the second conductive substrate layer 204 includes a second conductive layer and a first substrate layer, the second bus bar 2024 can be embedded in the second conductive layer.

[0097] Embodiments of the present application also provide a preparation method of an electrochromic device, which includes steps S110 to S150.

[0098] Step S110, providing a first conductive substrate layer 100, and setting an ion storage layer 101 on the first conductive substrate layer 100.

[0099] In some embodiments, the first conductive substrate layer 100 can include a first substrate layer and a first conductive layer arranged in a stack, wherein the first conductive layer is in contact with the ion storage layer 101.

[0100] Step S120, providing a second conductive substrate layer 104, and setting an electrochromic layer 103 on the second conductive substrate layer 104.

[0101] In some embodiments, the second conductive substrate layer 104 can include a second substrate layer and a second conductive layer arranged in a stack, wherein the second conductive layer is in contact with the electrochromic layer 103.

[0102] Step S130, providing an isolation layer 1023 having a first side and a second side, and setting a first bus bar 1022 on the first side and a second bus bar 1024 on the second side.

[0103] The first bus bar 1022 can be a U-shaped bus bar, and the longitudinal section structure can refer to FIG. 10A. Figure 1 The first bus bar 1022 can also be a semi-closed bus bar, and the longitudinal section structure can refer to FIG. 10B. Figure 3 to Figure 5

[0104] ​In some embodiments, the first bus bar 1022 can be arranged at the edge region of the surface of the isolation layer 1023, as shown in FIG. 10A, or can be arranged at the non-edge region of the surface of the isolation layer 1023, as shown in FIG. 10B. Figure 1 Figure 7 to Figure 8

[0105] In some embodiments, the width of the first bus bar 1022 can be less than the width of the isolation layer 1023, and the first bus bar 1022 can be located at the outer edge region of the surface of the isolation layer 1023, as shown in FIG. 10A; or the first bus bar 1022 can be located at the inner edge region of the surface of the isolation layer 1023, as shown in FIG. 10B; or the first bus bar 1022 can be located at the middle region of the surface of the isolation layer 1023, as shown in FIG. 10C. Figure 1 Figure 1 Figure 7 Figure 1 Figure 8

[0106] In some embodiments, the second bus bar 1024 can be a U-shaped bus bar, and the longitudinal section structure can refer to FIG. 11A; or the second bus bar 1024 can be a semi-enclosed bus bar, and the longitudinal section structure can refer to FIG. 11B or FIG. 11C. Figure 1 Figure 3 to Figure 4 Figure 6

[0107] In some embodiments, the second bus bar 1024 can be arranged at the edge region of the surface of the isolation layer 1023, as shown in FIG. 10A, or can be arranged at the non-edge region of the surface of the isolation layer 1023, as shown in FIG. 10B. Figure 1 Figure 7 to Figure 8

[0108] In some embodiments, the width of the second bus bar 1024 can be less than the width of the isolation layer 1023, and the second bus bar 1024 can be located at the outer edge region of the surface of the isolation layer 1023, as shown in FIG. 10A; or the second bus bar 1024 can be located at the inner edge region of the surface of the isolation layer 1023, as shown in FIG. 10B; or the second bus bar 1024 can be located at the middle region of the surface of the isolation layer 1023, as shown in FIG. 10C. Figure 1 Figure 1 Figure 7 Figure 1 Figure 8

[0109] ​​​​​​​​​​​​​​​​​The first conductive substrate layer 100 provided with the ion storage layer 101, the isolation layer 1023 provided with the first bus bar 1022 and the second bus bar 1024, and the second conductive substrate layer 104 provided with the electrochromic layer 103 can be aligned and attached side by side along the first direction, and then folded to attach the first conductive substrate layer, the isolation layer, and the second conductive substrate layer side by side along the second direction opposite to the first direction, for example, aligning and attaching the first conductive substrate layer, the isolation layer, and the second conductive substrate layer along the left side, and then attaching them to the right side to attach the first conductive substrate layer, the isolation layer, and the second conductive substrate layer on the right side.

[0110] In step S150, an electrolyte material is provided in the region surrounded by the isolation layer to form an electrolyte layer.

[0111] The specific method of providing the electrolyte material in the region surrounded by the isolation layer to form the electrolyte layer is not limited. In some examples, the electrolyte material can be provided in the region surrounded by the isolation layer to form the electrolyte layer after the first conductive substrate layer, the isolation layer, and the second conductive substrate layer are sequentially attached. It can be understood that the isolation layer can be provided with a through hole, and after the first conductive substrate layer, the isolation layer, and the second conductive substrate layer are sequentially attached, the electrolyte material can be injected into the region surrounded by the isolation layer through the through hole to form the electrolyte layer.

[0112] In other examples, the first conductive substrate layer and the isolation layer, or the second conductive substrate layer and the isolation layer, can be attached first, and after the electrolyte material is provided in the region surrounded by the isolation layer, the second conductive substrate layer or the first conductive substrate layer is attached, and the electrolyte material is formed into the electrolyte layer through curing or other processes. In yet other examples, the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer can be sequentially attached along one side, for example, aligning the three-layer structure along the left side, and then adding the electrolyte material to the middle region of the isolation layer during the process of aligning and attaching to the right side, and then completely aligning to the right side to make the first bus bar close to the ion storage layer and the second bus bar close to the electrochromic layer, and the electrolyte material is formed into the electrolyte layer through curing or other processes.

[0113] In one aspect, the ion storage layer is arranged on the first conductive substrate layer, and in another aspect, the electrochromic layer is arranged on the second conductive substrate layer, and then the first bus bar and the second bus bar are arranged on both sides of the isolation layer, and finally the material layers are successively butted to make the first bus bar, the isolation layer and the second bus bar be successively stacked. In this way, by arranging the first bus bar and the second bus bar separately from the ion storage layer and the electrochromic layer, and finally butting them together, compared with arranging the ion storage layer and the electrochromic layer on the two bus bars after arranging the two bus bars, the problem of uneven thickness of the ion storage layer and the electrochromic layer caused by the protrusion of the ion storage layer and the electrochromic layer due to the thickness of the bus bar can be avoided, and the color changing speed and uniformity of the electrochromic device are ensured by the preparation method.

[0114] In some embodiments, successively butting the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer can include making the first bus bar 1022 penetrate through the ion storage layer 101 to be in contact with the first conductive substrate layer 100. The relative positions of the first conductive substrate layer 100 and the ion storage layer 101 after pressing can refer to the structure shown in FIG. 10B. In this embodiment, the thickness of the first bus bar 1022 is greater than the thickness of the ion storage layer 101. Figure 9

[0115] In some embodiments, the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer can be successively butted without curing the ion storage layer 101, so that the first bus bar 1022 is more easily penetrated through the ion storage layer 101. In some embodiments, the surface of the first bus bar 1022 towards the first conductive substrate layer 100 can be a non-planar surface. The non-planar surface can be an arched surface, such as a fan-shaped, semicircular or arch bridge-shaped surface, which can gently break the ion storage layer and is not easy to form cracks on the ion storage layer, so as to not easily affect the stability and reliability of the ion storage layer, so that the ion storage layer and the electrochromic layer can be more stable. Figure 8 For example, the structure of the electrochromic device of the embodiment can refer to the structure shown in FIG. 10B when the surface of the first bus bar 1022 is an arched surface. In addition, it can also be a sharp corner surface, such as a sawtooth-shaped surface. By limiting the size of the triangle at the top of the sawtooth, it can also ensure that the first bus bar can moderately pierce the corresponding ion storage layer, while not causing cracks in the ion storage layer, thereby ensuring the stability of the electrochromic layer and the ion storage layer. Figure 10

[0116] ​​In some embodiments, the first conductive substrate layer provided with the ion storage layer, the isolation layer provided with the first bus bar and the second bus bar, and the second conductive substrate layer provided with the electrochromic layer are sequentially laminated, which can include penetrating the second bus bar 1024 through the electrochromic layer 103 to contact the second conductive substrate layer 104. The relative positions of the second conductive substrate layer 104 and the electrochromic layer 103 after lamination can be as shown in FIG. 10B. In some embodiments, the thickness of the second bus bar 1024 is greater than the thickness of the electrochromic layer 103. Figure 9

[0117] In some embodiments, the first conductive substrate layer 100 and the second conductive substrate layer 104 can be laminated without curing the electrochromic layer 103, so that the second bus bar 1024 is more easily penetrated through the electrochromic layer 103. In some embodiments, the surface of the second bus bar 1024 towards the first conductive substrate layer 100 can be non-planar. The non-planar surface can be an arched surface, such as a fan-shaped, semicircular, or arch bridge-shaped surface, which can gently break the electrochromic layer and is less likely to form cracks in the electrochromic layer, thereby less likely to affect the stability and reliability of the electrochromic layer. Figure 8 For example, the electrochromic device structure of the embodiment can be as shown in FIG. 10B, and the structure of the second bus bar 1024 with an arched surface can be as shown in FIG. 10C. Figure 10 In some embodiments, the surface of the second bus bar 1024 can also be a sharp surface, such as a sawtooth-shaped surface. By limiting the size of the triangular shape at the top of the sawtooth, it can also be ensured that the second bus bar can moderately pierce the corresponding electrochromic layer without causing cracks in the electrochromic layer, thereby ensuring the stability of the electrochromic layer.

[0118] In some embodiments, the above steps S130 to S150 can also be replaced by steps S230 to S250, respectively.

[0119] In step S230, a first bus bar 1022 is provided on the first conductive substrate layer 100, and the side wall of the first bus bar 1022 is in contact with the side wall of the ion storage layer 101.

[0120] In some embodiments, the surface of the first conductive substrate layer 100 includes a first inner region and a first edge region located at the edge of the first inner region. Providing the ion storage layer 101 on the first conductive substrate layer 100 can include masking the first edge region and providing the ion storage layer 101 on the first inner region. In this way, the first edge region of the surface of the first conductive substrate layer can be reserved, and the mask can be removed and the first bus bar can be provided on the first edge region of the first conductive substrate layer.

[0121] ​In another embodiment, after the first bus bar 1022 is disposed on the first conductive substrate layer 100, the preparation method can further include etching to remove a first edge region of the surface of the first conductive substrate layer 100 exposed by the ion storage layer 101, so that the first edge region of the surface of the first conductive substrate layer is reserved, and then the first bus bar can be disposed on the first edge region of the first conductive substrate layer.

[0122] At step S240, a second bus bar 1024 is disposed on the second conductive substrate layer 104, and a side wall of the second bus bar 1024 is in contact with a side wall of the electrochromic layer 103.

[0123] In some embodiments, the surface of the second conductive substrate layer 104 includes a second inner region and a second edge region located at an edge of the second inner region, and disposing the electrochromic layer 103 on the second conductive substrate layer 104 can include masking the second edge region and disposing the electrochromic layer 103 on the second inner region, so that the second edge region of the surface of the second conductive substrate layer is reserved, and then the mask can be removed and the second bus bar can be disposed on the second edge region of the second conductive substrate layer 104.

[0124] In another embodiment, after the second bus bar 1024 is disposed on the second conductive substrate layer 104, the preparation method can further include etching to remove a second edge region of the surface of the second conductive substrate layer 104 exposed by the ion storage layer 101, so that the second edge region of the surface of the second conductive substrate layer is reserved, and then the second bus bar can be disposed on the second edge region of the second conductive substrate layer.

[0125] At step S250, one side of the first conductive substrate layer 100 provided with the first bus bar 1022 is opposed to one side of the second conductive substrate layer 104 provided with the second bus bar 1024, and a separation layer 1023 is disposed between the first bus bar 1022 and the second bus bar 1024. An electrolyte material is disposed in an area surrounded by the separation layer 1023 to form an electrolyte layer 1021, and the first conductive substrate layer 100 and the second conductive substrate layer 104 are pressed together, wherein the first bus bar 1022 and the second bus bar 1024 are used to form an electric field between the ion storage layer 101 covered by the electrolyte layer 1021 and the electrochromic layer 103 covered by the electrolyte layer 1021 when external electric energy is input. The longitudinal section structure of the electrochromic device finally obtained can be referred to the structure shown in Figure 9

[0126] In some embodiments, the electrolyte layer 1021 can have adhesion. As Figure 1 、 Figure 3 to Figure 6 and Figure 8 ​As shown, when the first bus bar 1022 is disposed in an inner region of one surface of the isolation layer 1023 outside the outer edge region or the middle region of the surface of the isolation layer 1023, the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 to the surface of the isolation layer 1023 and contacting the sidewall of the first bus bar 1022, so as to bond the isolation layer 1023, the first bus bar 1022 and the ion storage layer 101.

[0127] In some embodiments, as shown in Figure 1 、 Figure 3 to Figure 6 and Figure 8 As shown, when the second bus bar 1024 is disposed in an inner region of the other surface of the isolation layer 1023 outside the outer edge region or the middle region of the surface of the isolation layer 1023, the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 to the surface of the isolation layer 1023 and contacting the sidewall of the second bus bar 1024, so as to bond the isolation layer 1023, the second bus bar 1024 and the electrochromic layer 103.

[0128] In some embodiments, the first bus bar 1022 can have a first inner hole (not shown) in a direction parallel to the first conductive base layer 100, the first inner hole can completely or partially penetrate the first bus bar 1022, and the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 in the direction parallel to the first conductive base layer 100 to penetrate the first bus bar 1022. Wherein the electrolyte layer 1021 can completely or partially penetrate the first bus bar 1022, the first inner hole can be parallel or not parallel to the first conductive base layer 100, and can be specifically designed on the premise of not affecting the conductive circuit in the first bus bar 1022.

[0129] In some embodiments, the second bus bar 1024 can have a second inner hole (not shown) in a direction parallel to the second conductive base layer 104, the second inner hole can completely or partially penetrate the second bus bar 1024, and the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 in the direction parallel to the first conductive base layer 100 to penetrate the second bus bar 1024. Wherein the electrolyte layer 1021 can completely or partially penetrate the second bus bar 1024. The second inner hole can be parallel or not parallel to the first conductive base layer 100, and can be specifically designed on the premise of not affecting the conductive circuit in the second bus bar 1024.

[0130] In some embodiments, when the first bus bar 1022 exposes the edge region of the ion storage layer 101, the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 to the edge region of the ion storage layer 101 to bond the ion storage layer 101 and the isolation layer 1023, for example as shown in FIG. 10B. Figure 8 It is understood that when the electrolyte layer 1021 completely penetrates the first bus bar 1022, the electrolyte layer 1021 within the surrounding region of the isolation layer 1023 can penetrate the first bus bar 1022 and extend to the edge region of the ion storage layer 101.

[0131] In another embodiment, when the first bus bar 1022 exposes the edge region of the ion storage layer 101 and the electrolyte layer 1021 does not completely penetrate the first bus bar 1022, the method of fabrication can further include injecting electrolyte material at the edge region of the ion storage layer 101 to bond the ion storage layer 101 and the isolation layer 1023.

[0132] In some embodiments, when the second bus bar 1024 exposes the edge region of the electrochromic layer 103, the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 to the edge region of the electrochromic layer 103 to bond the electrochromic layer 103 and the isolation layer 1023, for example as shown in FIG. 10B. Figure 8 It is understood that when the electrolyte layer 1021 completely penetrates the second bus bar 1024, the electrolyte layer 1021 within the surrounding region of the isolation layer 1023 can penetrate the second bus bar 1024 and extend to the edge region of the electrochromic layer 103.

[0133] In another embodiment, when the second bus bar 1024 exposes the edge region of the electrochromic layer 103 and the electrolyte layer 1021 does not completely penetrate the second bus bar 1024, the method of fabrication can further include injecting electrolyte material at the edge region of the electrochromic layer 103 to bond the electrochromic layer 103 and the isolation layer 1023.

[0134] In some embodiments, when the first bus bar 1022 is a non-Ω-shaped bus bar, there is a hollow region between the isolation layer 1023 and the ion storage layer 101, the step of pressing the first conductive base layer 100 and the second conductive base layer 104 can further include extending the electrolyte layer 1021 to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the ion storage layer 101, as shown in FIG. 10A. Figure 5

[0135] ​In some embodiments, when the second bus bar 1024 is a non-back-shaped bus bar, there is a hollow region between the isolation layer 1023 and the electrochromic layer 103, and the step of pressing the first conductive substrate layer 100 and the second conductive substrate layer 104 can further include extending the electrolyte layer 1021 to the surface of the isolation layer 1023 to bond the isolation layer 1023 and the electrochromic layer 103, as shown in Figure 6

[0136] In some embodiments, disposing the first bus bar on the first conductive substrate layer includes disposing a first barrier layer between the first bus bar and the ion storage layer.

[0137] In some embodiments, disposing the second bus bar on the second conductive substrate layer includes disposing a second barrier layer between the second bus bar and the electrochromic layer.

[0138] It should be understood that the execution of the above steps does not have strict sequence restrictions, and the steps can be executed in other sequences. Moreover, the steps or stages do not necessarily be executed at the same time, but can be executed at different times, and the execution sequence of the steps or stages does not necessarily be sequential, but can be executed alternately or alternately with at least part of other steps or stages.

[0139] In the description of the present specification, the description of the terms "some embodiments", "other embodiments", "ideal embodiments", and the like means that the specific features, structures, materials, or characteristics described in conjunction with the embodiments or examples are contained in at least some embodiments or examples of the present application. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example.

[0140] Each technical feature of the above-described embodiments can be combined arbitrarily, and in order to make the description simple, each technical feature in the above-described embodiments is not described all possible combinations, however, as long as the combination of the technical features does not exist contradictory, it should be considered as the scope of the present specification.

[0141] The above-described embodiments only express several implementation manners of the present application, and the description is more specific and detailed, but it should not be understood as a limitation on the scope of the patent. It should be noted that for those skilled in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which are within the scope of protection of the present application. Therefore, the scope of protection of the present application should be subject to the appended claims.​

Claims

1. An electrochromic device, characterized in that, It includes a first conductive substrate layer, an ion storage layer, an electrolyte layer, an electrochromic layer, and a second conductive substrate layer, which are stacked sequentially; wherein, The electrolyte layer edge region is provided with a first busbar, an isolation layer and a second busbar stacked in sequence. The first busbar is close to the ion storage layer and the second busbar is close to the electrochromic layer. The first busbar, the isolation layer and the second busbar are respectively arranged adjacent to the electrolyte layer. The first busbar and the second busbar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when external electrical energy is input. The electrolyte layer extends to the surface of the insulating layer and contacts the sidewall of the first busbar to bond the insulating layer, the first busbar, and the ion storage layer; and / or The electrolyte layer extends to the surface of the insulating layer and contacts the sidewall of the second busbar to bond the insulating layer, the second busbar, and the electrochromic layer.

2. The electrochromic device according to claim 1, characterized in that, The electrolyte layer penetrates the first busbar in a direction parallel to the first conductive substrate layer to bond with the first busbar; and / or the electrolyte layer penetrates the second busbar in a direction parallel to the first conductive substrate layer to bond with the second busbar.

3. The electrochromic device according to claim 2, characterized in that, The electrolyte layer extends to the edge region of the ion storage layer to bond the ion storage layer and the isolation layer; and / or The electrolyte layer extends to the edge region of the electrochromic layer to bond the electrochromic layer and the insulating layer.

4. The electrochromic device according to claim 1, characterized in that, The electrolyte layer also extends to the surface of the insulating layer to bond the insulating layer and the ion storage layer; and / or The electrolyte layer also extends to the surface of the insulating layer to bond the insulating layer and the electrochromic layer.

5. The electrochromic device according to claim 1, characterized in that, The first busbar penetrates the ion storage layer in the stacking direction and contacts the first conductive substrate layer; and / or The second busbar penetrates the electrochromic layer in the stacking direction and contacts the second conductive substrate layer.

6. The electrochromic device according to claim 5, characterized in that, The electrochromic device further includes: A first barrier layer is located between the first busbar and the ion storage layer; and / or The second barrier layer is located between the second busbar and the electrochromic layer.

7. The electrochromic device according to claim 5, characterized in that, The surface of the first busbar facing the first conductive substrate is non-planar; and / or The surface of the second busbar facing the second conductive substrate is non-planar.

8. An electrochromic device, characterized in that, The system comprises, in sequence, a first conductive substrate layer, an ion storage layer, an electrolyte layer, an electrochromic layer, and a second conductive substrate layer. The surface of the first conductive substrate layer includes a first internal region and a first edge region located at the edge of the first internal region. The surface of the second conductive substrate layer includes a second internal region and a second edge region located at the edge of the second internal region. The ion storage layer is located in the first internal region, the electrochromic layer is located in the second internal region, and the electrochromic device further includes an isolation layer, a first busbar, and a second busbar. The isolation layer is located in the first edge region and the second edge region. The first busbar is embedded in the isolation layer and contacts the first conductive substrate layer. The second busbar is embedded in the isolation layer and contacts the second conductive substrate layer. The first busbar is embedded in the first conductive substrate layer; and / or The second busbar is embedded in the second conductive substrate layer.

9. A method for fabricating an electrochromic device, characterized in that, The method for preparing the electrochromic device according to any one of claims 1 to 7 comprises: A first conductive substrate layer is provided, and an ion storage layer is disposed on the first conductive substrate layer; A second conductive substrate layer is provided, and an electrochromic layer is disposed on the second conductive substrate layer; An isolation layer having a first side and a second side is provided, and a first busbar is provided on the first side and a second busbar is provided on the second side; The first conductive substrate layer with the ion storage layer, the isolation layer with the first bus bar and the second bus bar, and the second conductive substrate layer with the electrochromic layer are sequentially aligned and stacked, with the first bus bar, the isolation layer and the second bus bar stacked sequentially, and the first bus bar close to the ion storage layer and the second bus bar close to the electrochromic layer. The method further includes: An electrolyte material is disposed within the area enclosed by the isolation layer to form an electrolyte layer, wherein the first busbar and the second busbar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when external electrical energy is input.

10. A method for fabricating an electrochromic device, characterized in that, The method for preparing the electrochromic device of claim 8 includes: A first conductive substrate layer is provided, and an ion storage layer is disposed on the first conductive substrate layer; A second conductive substrate layer is provided, and an electrochromic layer is disposed on the second conductive substrate layer; A first busbar is disposed on the first conductive substrate layer, and the sidewall of the first busbar is in contact with the sidewall of the ion storage layer; A second busbar is disposed on the second conductive substrate layer, and the sidewall of the second busbar is in contact with the sidewall of the electrochromic layer; One side of the first conductive substrate layer with the first busbar is positioned opposite to one side of the second conductive substrate layer with the second busbar, and an isolation layer is provided between the first busbar and the second busbar. An electrolyte material is provided in the area enclosed by the isolation layer to form an electrolyte layer, and the first conductive substrate layer and the second conductive substrate layer are pressed together. The first busbar and the second busbar are used to form an electric field between the ion storage layer covered by the electrolyte layer and the electrochromic layer covered by the electrolyte layer when external electrical energy is input.

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