A bunching resonance device for high energy ion implantation machine

Abstract

The present invention discloses a focusing resonator device for a high-energy ion implanter, comprising a focusing resonator body, comprising a barrel, a focusing electrode head mounted on the barrel, an inductance adjustment device, and an induction coil mounted within the barrel. The barrel is mounted to an electrode flange and a top plate, the electrode flange being provided with one or more holes and blind plates. The holes are provided with recessed grooves, and the blind plates are mounted to the recessed grooves of the holes to achieve sealing. The present invention has the advantages of simple structure, ease of use, and good adjustability.

Description

Technical Field

[0001] The present invention mainly relates to the technical field of semiconductor manufacturing equipment, in particular to a bunching resonance device of a high-energy ion implanter. Background Art

[0002] Ion implantation technology is a technology that ionizes atoms of a specific element, accelerates the ionized ions in an electric field, and injects them into the surface of a solid material at a high speed, thereby changing the physical or chemical properties of the surface of the solid material.

[0003] Ion implanters use two different methods for accelerating ions: electrostatic field acceleration and radio frequency acceleration. However, when the ion energy is high, the size of the equipment must be considered. Radio frequency acceleration allows the ion beam to be accelerated and superimposed in an electric field in time segments, increasing time while reducing space, resulting in a high-energy ion beam.

[0004] The RF acceleration structure only effectively accelerates "reference particles," so a device must be installed before the first accelerator to modulate the energy of the continuous beam drawn from the analyzer and "cluster" it to form a "reference particle cluster." The main working principle is to load a sinusoidal voltage signal with the same resonant frequency as the rear end onto the bunching electrode. When the voltage on the bunching electrode is positive, the positive ions at the front end of the beam are decelerated by resistance, and the distance between them and the ions at the rear end is reduced. When the voltage on the bunching electrode is negative, the ions at the rear end of the beam are accelerated by thrust, and the distance between them and the ions at the front end is reduced. This cycle repeats until the continuous beam eventually passes through the bunching structure (Buncher) and becomes an ion cluster that can be effectively accelerated by the subsequent RF acceleration structure.

[0005] The conventional bunching resonator consists of a bunching electrode head, a bunching electrode assembly, an induction coil, a circular aluminum barrel, an inductance adjustment device, a feed antenna, and a tuning motor. The circular aluminum barrel is fixed to the electrode flange and top plate with screws. The induction coil and inductance adjustment device are installed inside the circular aluminum barrel. The bunching electrode assembly is mounted on the underside of the circular aluminum barrel, and the bunching electrode head is mounted within the bunching electrode assembly.

[0006] The existing traditional structure has some shortcomings:

[0007] 1. The circular aluminum barrel of the existing bunching resonator is installed to the electrode flange and the top plate by screws. The circular aluminum barrel needs to be removed for maintenance of internal components. However, the circular aluminum barrel is difficult to disassemble and install, making maintenance difficult.

[0008] 2. The existing beamforming resonator feed antenna cannot be adjusted after installation, resulting in the inability to adjust the standing wave ratio and the inability to control the size of the feed signal entering the resonator.

[0009] 3. It is difficult to adjust the capacitance with the existing inductance adjustment device, and automatic tuning during operation cannot be achieved.

[0010] 4. The existing bunching resonator induction coil is relatively thin and adopts air cooling, but the air cooling effect is poor and it is easy to cause carbonization of the coil.

[0011] 5. The existing focusing electrode head mounting hole is a round hole, which makes the position of the focusing electrode head unadjustable. Summary of the Invention

[0012] The technical problem to be solved by the present invention is: in response to the technical problems existing in the prior art, the present invention provides a bunching resonance device for a high-energy ion implanter with a simple structure, easy use and good adjustable effect.

[0013] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0014] A bunching resonance device for a high-energy ion implanter includes a bunching resonator body, the bunching resonator body including a barrel body, a bunching electrode head mounted on the barrel body, an inductance adjustment device, an induction coil, and an induction coil mounted in the barrel body; the barrel body is mounted on an electrode flange and a top plate, the electrode flange is provided with one or more sets of holes and blind plates; the holes are provided with sinking grooves, and the blind plates are mounted on the sinking grooves of the holes to achieve sealing.

[0015] As a further improvement of the system of the present invention: the hole is a crescent hole, and the blind plate is a crescent blind plate corresponding to the shape of the hole.

[0016] As a further improvement of the system of the present invention: a sealing groove is provided on the inner side of the blind plate, and a sealing ring is installed, which forms a seal after being installed in the sinking groove of the hole.

[0017] As a further improvement of the system of the present invention, it also includes a feeding antenna, and the standing wave ratio of the resonator is adjusted by adjusting the installation position of the feeding antenna and the long strip hole of the antenna mounting support, so that the resonant frequency of the resonator is equal to the frequency of the feeding signal.

[0018] As a further improvement to the system of the present invention: the antenna mounting support of the feed antenna is a long hole, the feed antenna is a soft material antenna, and the relative position of the feed antenna and the induction coil is adjusted through the long hole on the antenna mounting support.

[0019] As a further improvement of the system of the present invention: the inductance adjustment device includes a radio frequency head, a motor and a transmission mechanism, and the motor drives the transmission mechanism to move up and down to adjust the vertical distance between the radio frequency head and the induction coil.

[0020] As a further improvement of the system of the present invention: the transmission mechanism includes a threaded rod, which moves vertically up and down through threads under the drive of a motor, and the radio frequency head moves up and down along with the threaded copper rod.

[0021] As a further improvement to the system of the present invention: the focusing electrode head is installed in a focusing electrode head mounting hole on a focusing electrode head mounting base, and the focusing electrode head mounting hole is in a long strip shape; the focusing electrode head is positioned between the first and second beam filter plates by adjusting its position in the focusing electrode head mounting hole.

[0022] As a further improvement to the system of the present invention: the induction coil is designed as a spiral hollow tube, and the pitch and number of turns are adapted to the requirements of the radio frequency acceleration zone, which is used to transmit the feed signal from the upper end of the coil to the beam-forming electrode head at the lower end, and form an electric field with the ground electrode on the front side.

[0023] As a further improvement to the system of the present invention, the water-cooling spiral tube is provided inside the induction coil to cool the induction coil.

[0024] Compared with the prior art, the advantages of the present invention are:

[0025] 1. The bunching resonance device of the high-energy ion implanter of the present invention has a simple structure, is easy to use, and has a good adjustable effect. The present invention designs two crescent holes and two crescent blind plates in the upper flange for assembly. The crescent blind plates can be disassembled to maintain the internal parts of the circular aluminum barrel. The two crescent blind plates are symmetrically designed, which is more convenient for two-handed operation.

[0026] 2. The bunching resonance device of the high-energy ion implanter of the present invention is provided with a fixing plate at the installation position of the feed antenna. The fixing plate is provided with a long circular hole to facilitate the adjustment of the feed antenna, thereby adjusting the standing wave ratio and realizing the reflection of the control signal.

[0027] 3. The beam-forming resonance device of the high-energy ion implanter of the present invention is designed with a threaded rod, a radio frequency head and a radio frequency head shield. The threaded rod is driven to rotate by a tuning motor to adjust the vertical position of the radio frequency head and the radio frequency head shield relative to the induction coil, thereby realizing automatic tuning during operation.

[0028] 4. The bunching resonance device of the high-energy ion implanter of the present invention increases the inner diameter and pitch of the induction coil, adds a spiral cooling water pipe inside, uses water cooling, and improves the cooling effect.

[0029] 5. In the focusing resonance device of the high energy ion implanter of the present invention, long holes are designed on both the focusing electrode head and the mounting copper rod, so that the position of the focusing electrode head can be adjusted. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1It is a schematic diagram of the structural principle of the bunching resonance device of the present invention after assembly.

[0031] Figure 2 It is a partial cross-sectional schematic diagram of the present invention in a specific application example.

[0032] Figure 3 It is a schematic diagram of the structural principle of the top plate and the motor flange in a specific application example of the present invention.

[0033] Figure 4 It is a schematic diagram of the structural principle of the crescent hole and the crescent blind plate in a specific application example of the present invention.

[0034] Figure 5 It is an enlarged schematic diagram of the installation location of the feed antenna in a specific application example of the present invention.

[0035] Figure 6 It is a schematic diagram of the structural principle of the inductance adjustment device in a specific application example of the present invention.

[0036] Figure 7 It is a schematic diagram of a beam-forming electrode head mounting seat and mounting holes in a specific application example of the present invention.

[0037] Figure 8 It is a schematic diagram of the installation of a focusing electrode head in a specific application example of the present invention.

[0038] Legend:

[0039] 1. Antenna mounting bracket; 2. Focusing assembly; 3. Induction coil; 4. Water-cooled spiral tube; 5. Round aluminum barrel; 6. Inductance adjustment device; 7. Feed antenna; 8. Tuning motor; 9. Control circuit board; 10. Electrode flange; 11. Top plate; 1011. Focusing electrode head mounting base; 1021. Focusing electrode head mounting hole; 201. Focusing electrode head; 202. First beam filter plate; 203. Second beam filter plate; 601. Radio frequency head; 602. Threaded rod; 603. Radio frequency head shield. DETAILED DESCRIPTION

[0040] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0041] In the description of this application, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0042] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. Throughout the description of this application, "plurality" means two or more, unless otherwise specifically defined.

[0043] In this application, unless otherwise specified or limited, the terms "assemble," "connect," "connect," "fix," and the like should be understood in a broad sense. For example, they may refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0044] like Figures 1-8 As shown, the focusing resonator device for a high-energy ion implanter of the present invention comprises: a focusing electrode head 201, a focusing assembly 2, an induction coil 3, a water-cooled spiral tube 4, a barrel 5 (a round aluminum barrel), an inductance adjustment device 6, a feed antenna 7, a tuning motor 8, and a control circuit board 9. The induction coil 3, barrel 5, focusing electrode head 201, and inductance adjustment device 6 constitute the main body of the focusing resonator, forming the inductance and capacitance of the focusing structure. The resonant frequency is determined by adjusting the inductance and capacitance of the focusing resonator, thereby adjusting the resonant frequency, standing wave ratio, and other parameters of the focusing resonator. The main function of the focusing resonator of the present invention is to transmit the fed signal from one area to another and generate an electric field in that area.

[0045] See also Figure 3 and Figure 4 The present invention installs the barrel body 5 on the electrode flange 10 and the top plate 11, wherein two crescent holes 101 and two crescent blind plates 102 are designed in the electrode flange 10. The crescent hole 101 is designed in a crescent shape and has a sunken groove on the outside; the crescent blind plate 102 is designed in a crescent shape and has a sealing groove on the inside. A rubber ring is installed and installed on the sunken groove of the crescent hole 101 by screws. After installation, the barrel body 5 is sealed. After opening, the parts inside the barrel body 5 can be maintained. Furthermore, the screw hole installation method is convenient for disassembly, and the use of two crescent blind plates 102 makes it easier to maintain the parts inside the barrel with both hands.

[0046] See also Figure 5In a specific application example, the present invention is provided with a feeding antenna 7. By adjusting the installation position of the feeding antenna 7 and the long hole of the antenna mounting support, the standing wave ratio of the resonator is adjusted so that the resonant frequency of the resonator is equal to the frequency of the feeding signal, that is, the feeding energy enters the resonator with zero reflection.

[0047] Furthermore, in the solution of the present invention, the antenna mounting support 1 of the feed antenna 7 is a long strip hole. The design of the feed antenna 7 adopts a copper antenna with a cylindrical and slender shape. The material is relatively soft and the shape is easy to repeat. Therefore, when adjusting the feed antenna 7, the relative position of the feed antenna 7 and the induction coil 3 can be adjusted through the long strip hole on the antenna mounting support 1.

[0048] See also Figure 6 In a specific application example, the inductance adjustment device 6 uses a motor to drive a transmission mechanism up and down, thereby adjusting the vertical distance between the RF head 601 and the induction coil 3, thereby adjusting the resonator frequency and the voltage between the focusing electrode head 201 and the ground electrode. Furthermore, in this example, the transmission mechanism includes a threaded rod 602 (a copper rod). Driven by a motor, the rod moves vertically up and down, and the RF head 601 moves up and down with the threaded copper rod. A RF head shield 603 is provided on the outside of the RF head 601 for protection.

[0049] See also Figure 7 and Figure 8 In a specific application example, the focusing electrode head 201 is placed between the first beam filter plate 202 and the second beam filter plate 203, with a spacing of L1 between the first beam filter plate 202 and a spacing of L2 between the second beam filter plate 203. However, the structural design of the mounting hole 102 (long hole) on the focusing electrode head 201 and the focusing electrode head mounting base 1011 of the present invention can achieve adjustment of L1 / L2. As ions pass through L1, particles with higher energy gradually catch up with particles with lower energy, achieving longitudinal focusing. Particles that pass through L2 drift to the first acceleration unit.

[0050] See also Figure 2 In a specific application example, the induction coil 3 is designed as a spiral hollow tube. The pitch and number of turns need to be designed in combination with the requirements of the RF acceleration zone. It is used to transmit the feed signal from the upper end of the coil to the beam electrode head 201 at the lower end, and form an electric field with the ground electrode (protective plate) on the front side.

[0051] In a specific application example, the water-cooled spiral tube 4 is placed inside the induction coil 3, and its pitch and number of turns are consistent with those of the induction coil 3. It is used to cool the induction coil 3 to prevent deformation due to heating of the coil when a large power is fed in, thereby affecting the frequency of the resonator to deviate from the required value.

[0052] The above are merely preferred embodiments of the present invention. The scope of protection of the present invention is not limited to the above embodiments. All technical solutions based on the principles of the present invention are within the scope of protection of the present invention. It should be noted that for those skilled in the art, various improvements and modifications that do not depart from the principles of the present invention should be considered within the scope of protection of the present invention.

Claims

1. A bunching resonance device for a high energy ion implanter, characterized in that: The invention comprises a bunching resonator body, the bunching resonator body comprising a barrel (5), a bunching electrode head (201) mounted on the barrel (5), an inductance adjustment device (6), and an induction coil (3) mounted in the barrel (5); the barrel (5) is mounted on an electrode flange (10) and a top plate (11); the electrode flange (10) is provided with one or more holes and blind plates; the holes are provided with a sinking groove, and the blind plates are mounted on the sinking groove of the holes to achieve sealing; the invention also comprises a feeding antenna (7), and the standing wave ratio of the resonator is adjusted by adjusting the installation position of the feeding antenna (7) and the long hole of the antenna mounting support, so that the resonant frequency of the resonator is equal to the frequency of the feeding signal; the antenna mounting support (1) of the feeding antenna (7) is a long hole, and the feeding antenna (7) is a soft material antenna. The long strip hole on the wire mounting support (1) adjusts the relative position of the feed antenna (7) and the induction coil (3); the focusing electrode head (201) is mounted in the focusing electrode head mounting hole (1021) on the focusing electrode head mounting seat (1011), and the focusing electrode head mounting hole (1021) is long strip-shaped; the focusing electrode head (201) is placed between the first beam filter plate (202) and the second beam filter plate (203), with a spacing of L1 from the first beam filter plate (202) and a spacing of L2 from the second beam filter plate (203). L1 and L2 can be adjusted through the focusing electrode head mounting hole (1021) and the focusing electrode head mounting seat (1011). When ions pass through L1, particles with high energy gradually catch up with particles with low energy, thereby achieving longitudinal focusing. Particles passing through L2 drift to the first acceleration unit.

2. The focusing resonance device of the high energy ion implanter according to claim 1, characterized in that: The hole is a crescent hole (101), and the blind plate is a crescent blind plate (102) corresponding to the shape of the hole.

3. The focusing resonance device of a high energy ion implanter according to claim 1, characterized in that: A sealing groove is provided on the inner side of the blind plate, and a sealing ring is installed, which is installed in the sinking groove of the hole to form a seal.

4. The focusing resonance device of a high energy ion implanter according to any one of claims 1 to 3, characterized in that: The inductance adjustment device (6) comprises a radio frequency head (601), a motor and a transmission mechanism, and the motor drives the transmission mechanism to move up and down to adjust the vertical distance between the radio frequency head (601) and the induction coil (3).

5. The focusing resonance device of the high energy ion implanter according to claim 4, characterized in that: The transmission mechanism comprises a threaded rod (602) which moves vertically up and down through a thread under the drive of a motor, and the radio frequency head (601) moves up and down along with the threaded copper rod.

6. The focusing resonance device of a high energy ion implanter according to any one of claims 1 to 3, characterized in that: The focusing electrode head (201) is positioned between the first beam filter plate (202) and the second beam filter plate (203) by adjusting the focusing electrode head mounting hole (1021) and the focusing electrode head mounting seat (1011).

7. The focusing resonance device of a high energy ion implanter according to any one of claims 1 to 3, characterized in that: The induction coil (3) is designed as a spiral hollow tube, and the pitch and number of turns are adapted to the requirements of the radio frequency acceleration zone, and is used to transmit the feed signal from the upper end of the coil to the beam electrode head (201) at the lower end, and form an electric field with the ground electrode on the front side.

8. The focusing resonance device of a high energy ion implanter according to claim 7, characterized in that: A water-cooling spiral tube (4) is provided inside the induction coil (3) for cooling the induction coil (3).

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