Method for compensating performance degradation of hybrid gate structure device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHANGHAI TECH UNIV
- Filing Date
- 2023-02-23
- Publication Date
- 2026-07-07
AI Technical Summary
In the prior art, applying a suitable back gate voltage to improve device lifespan can lead to the front gate losing its turn-off capability, resulting in increased leakage current.
The system employs a hybrid gate structure π-GAA-π, which includes a central GAA gate and two π gates on either side. The GAA gate fully encloses the channel, while the π gates are partially exposed. This allows the back gate to compensate for current when it is on and isolate the back gate from its influence when it is off.
It effectively compensates for device performance degradation, suppresses leakage current rise and gate control capability deterioration, while maintaining stable device turn-off performance.
Smart Images

Figure CN116153968B_ABST