Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, compound, and infrared absorber

Abstract

The present invention provides a composition having excellent temporal stability and capable of forming a film having excellent spectral characteristics and suppressed defects. The composition comprises a pigment represented by formula (1) and a curable compound, wherein R 1 ~R 4 Each independently represents a substituent, R 5 represents an aliphatic hydrocarbon group, R 11 ~R 15 Each independently represents a hydrogen atom or a substituent, Y 1 and Y 2 Each independently represents a hydrogen atom or a substituent. 11 ~R 14 At least one of them is a substituent, or R 11 ~R 15 Each of them is a hydrogen atom. #imgabs0#

Description

Technical Field

[0001] The present invention relates to a composition comprising a pigment and a curable compound, and also to a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, a compound, and an infrared absorber using the composition. Background Art

[0002] Video cameras, digital cameras, mobile phones with camera functions, and the like use solid-state imaging elements (CCDs) or CMOSs ​​(complementary metal oxide semiconductors) to capture color images. These solid-state imaging elements utilize silicon photodiodes, which are sensitive to infrared light, in their light-receiving sections. Therefore, infrared cutoff filters are sometimes used for photometric correction.

[0003] An infrared cut filter is produced using a composition containing an infrared absorbing pigment. As infrared absorbing pigments, pyrrolopyrrole compounds and the like are known (see Patent Document 1).

[0004] Previous technical literature

[0005] Patent Literature

[0006] Patent Document 1: Japanese Patent Application Laid-Open No. 2014-184688 Summary of the Invention

[0007] Technical issues to be solved by the invention

[0008] In recent years, films obtained using compositions containing infrared absorbing pigments have been required to have further improved spectral characteristics, for example, excellent visible transparency.

[0009] Furthermore, compositions containing infrared absorbing dyes are also required to have excellent stability over time, and the resulting films are required to have few defects.

[0010] Therefore, an object of the present invention is to provide a composition that exhibits excellent temporal stability and can form a film having excellent spectral characteristics and reduced defects. Furthermore, a film, optical filter, solid-state imaging element, image display device, infrared sensor, and camera module using the composition are provided. Furthermore, an object of the present invention is to provide a compound and an infrared absorber.

[0011] Means for solving technical problems

[0012] The present invention provides the following contents.

[0013] <1> A composition comprising a pigment represented by formula (1) and a curable compound,

[0014] [Chemical Formula 1]

[0015]

[0016] In formula (1), R 1 ~R 4 Each independently represents a substituent,

[0017] R 5 represents an aliphatic hydrocarbon group,

[0018] R 11 ~R 15 Each independently represents a hydrogen atom or a substituent,

[0019] Y 1 and Y 2 Each independently represents a hydrogen atom or a substituent,

[0020] Among them, R 11 ~R 14 At least one of them is a substituent, or R 11 ~R 15 Each of them is a hydrogen atom.

[0021] <2> according to <1> The composition, wherein

[0022] R in the above formula (1) 1 and R 2 One of the groups is cyano and the other is aryl or heteroaryl, R 3 and R 4 One of the groups is cyano and the other is aryl or heteroaryl.

[0023] <3> according to <1> or <2> The composition, wherein

[0024] R in the above formula (1) 5 is an alkyl group, R 11 and R 14 At least one of them is a substituent.

[0025] <4> according to <1> to <3> The composition described in any one of the preceding claims, wherein

[0026] Y in the above formula (1) 1 and Y 2 Each independently represents -BR Y1 R Y2 ,

[0027] R Y1 and R Y2 Each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group or a heteroaryloxy group,

[0028] R Y1 and RY2 They may be bonded to each other to form a ring.

[0029] <5> according to <1> to <4> The composition described in any one of the preceding claims, wherein

[0030] The maximum absorption wavelength of the dye represented by the above formula (1) exists at a wavelength of 650 nm or more.

[0031] <6> according to <1> to <5> The composition according to any one of the preceding claims, further comprising a compound represented by formula (Pc),

[0032] [Chemical Formula 2]

[0033]

[0034] In formula (Pc), Rp 1 ~Rp 16 Each independently represents a hydrogen atom or a substituent,

[0035] Rp 1 and Rp 4 At least one of represents an alkyl group,

[0036] Rp 5 and Rp 8 At least one of represents an alkyl group,

[0037] Rp 9 and Rp 12 At least one of represents an alkyl group,

[0038] Rp 13 and Rp 16 At least one of represents an alkyl group,

[0039] M 1 represents two hydrogen atoms, a divalent metal atom, or a divalent substituted metal atom including a trivalent or tetravalent metal atom.

[0040] <7> A membrane which is used <1> to <6> The method is obtained by using the composition described in any one of the above.

[0041] <8> A filter comprising <7> The membrane.

[0042] <9> A solid-state imaging element comprising <7> The membrane.

[0043] <10> An image display device comprising <7> The membrane.

[0044] <11> An infrared sensor comprising <7> The membrane.

[0045] <12> A camera module comprising <7> The membrane.

[0046] <13> A compound represented by formula (1),

[0047] [Chemical Formula 3]

[0048]

[0049] In formula (1), R 1 ~R 4 Each independently represents a substituent,

[0050] R 5 represents an aliphatic hydrocarbon group,

[0051] R 11 ~R 15 Each independently represents a hydrogen atom or a substituent,

[0052] Y 1 and Y 2 Each independently represents a hydrogen atom or a substituent,

[0053] Among them, R 11 ~R 14 At least one of them is a substituent, or R 11 ~R 15 Each of them is a hydrogen atom.

[0054] <14> An infrared absorber comprising <13> The compound.

[0055] Effects of the Invention

[0056] The present invention provides a composition that exhibits excellent temporal stability and can form a film having excellent spectral characteristics and reduced defects. Furthermore, the present invention provides a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, a compound, and an infrared absorber. BRIEF DESCRIPTION OF THE DRAWINGS

[0057] Figure 1 It is a schematic diagram showing one embodiment of an infrared sensor. DETAILED DESCRIPTION

[0058] Hereinafter, the contents of the present invention will be described in detail.

[0059] In this specification, “to” is used to mean that the numerical values ​​described before and after it are included as the lower limit and the upper limit.

[0060] In the description of groups (atomic groups) in this specification, the term "not indicating substituted or unsubstituted" includes both groups (atomic groups) without substitution and groups (atomic groups) with substitution. For example, "alkyl" includes not only alkyl groups without substitution (unsubstituted alkyl groups) but also alkyl groups with substitution (substituted alkyl groups).

[0061] In this specification, "exposure" includes not only exposure using light, but also drawing using a particle beam such as an electron beam or ion beam, unless otherwise specified. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light represented by an excimer laser, extreme ultraviolet light (EUV light), X-rays, electron beams, and other activating light or radiation.

[0062] In this specification, “(meth)acrylate” means both or either acrylate and methacrylate, “(meth)acrylic acid” means both or either acrylic acid and methacrylic acid, and “(meth)acryloyl” means both or either acryloyl and methacryloyl.

[0063] In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene-equivalent values ​​measured by gel permeation chromatography (GPC).

[0064] In the present specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

[0065] In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm.

[0066] In this specification, the total solid content refers to the total mass of the components excluding the solvent from all the components of the composition.

[0067] In this specification, a pigment refers to a colorant that is not easily soluble in a solvent.

[0068] In this specification, the term "step" includes not only independent steps but also steps that cannot be clearly distinguished from other steps as long as the intended effect of the step is achieved.

[0069] <Composition>

[0070] The composition of the present invention is characterized by comprising a pigment represented by formula (1) and a curable compound.

[0071] The pigment represented by formula (1) has excellent infrared shielding properties. 5 is an aliphatic hydrocarbon group, and R 11 ~R 14 At least one of them is a substituent or R11 ~R 15 Each of R is a hydrogen atom, which can reduce the migration of the pigment in the visible region and improve the visible transparency. 11 ~R 14 When at least one of R is a substituent, the torsion angle of the pyrrolopyrrole ring relative to the pigment core becomes larger, which can further improve the visible transparency. 5 is an alkyl group and R 11 and R 14 When at least one of them is a substituent, the torsion angle of the pyrrolopyrrole ring relative to the dye core becomes larger, and the visible transparency can be further improved. Therefore, by using the composition of the present invention, a film having excellent spectral characteristics can be formed.

[0072] Furthermore, the pigment represented by formula (1) has the following structure: (1) an aliphatic hydrocarbon group R 5 and (2)R 11 ~R 14 At least one of them is a substituent or R 11 ~R 15 Each of the benzene ring groups (i.e., a benzene ring group having at least a substituent at the ortho or meta position or an unsubstituted benzene ring group (phenyl)) is a hydrogen atom and is bonded to the pyrrolopyrrole ring of the pigment core at symmetrical positions. Thus, it is speculated that the pigment represented by formula (1) is a compound of an asymmetric structure, so the ease of molecular overlap and the like decrease and the crystallinity decrease, thereby suppressing the aggregation of the pigment in the composition. Therefore, the composition of the present invention has excellent stability over time.

[0073] Furthermore, the dye represented by formula (1) has low crystallinity, and thus can suppress aggregation of the dye in the film. Therefore, by using the composition of the present invention, a film with suppressed defect generation can be formed.

[0074] The composition of the present invention can be used as a composition for an optical filter. As types of optical filters, infrared cut-off filters and infrared transmission filters can be cited. The pigment represented by formula (1) has excellent visible transparency, so by using the composition of the present invention, an infrared cut-off filter with excellent visible transparency can be formed. Moreover, in the infrared transmission filter, the pigment represented by formula (1) has the effect of limiting the transmitted light (infrared light) to the longer wavelength side. The pigment represented by formula (1) has excellent visible transparency, so it is easy to control the spectra of the visible region to be shielded and the spectra of the infrared region to be transmitted within an appropriate range.

[0075] Hereinafter, each component used in the composition of the present invention will be described.

[0076] <<Dye represented by formula (1) (specific dye)>>

[0077] The composition of the present invention contains a pigment represented by formula (1) (hereinafter also referred to as a specific pigment).

[0078] [Chemical Formula 4]

[0079]

[0080] In formula (1), R 1 ~R 4 Each independently represents a substituent,

[0081] R 5 represents an aliphatic hydrocarbon group,

[0082] R 11 ~R 15 Each independently represents a hydrogen atom or a substituent,

[0083] Y 1 and Y 2 Each independently represents a hydrogen atom or a substituent,

[0084] Among them, R 11 ~R 14 At least one of them is a substituent, or R 11 ~R 15 Each of them is a hydrogen atom.

[0085] As R in formula (1) 1 ~R 4 Examples of the substituent represented by include the groups exemplified in the substituent T described later.

[0086] Preferably, R in formula (1) 1 and R 2 One of them is an electron-withdrawing group, and the other is an aryl or heteroaryl group. 3 and R 4 One of the groups is an electron-withdrawing group, and the other is an aryl group or a heteroaryl group.

[0087] Substituents with a positive Hammett σp value (SIGMA parameter value) act as electron-withdrawing groups. In this specification, substituents with a Hammett σp value of 0.2 or more can be exemplified as electron-withdrawing groups. The σp value is preferably 0.25 or more, more preferably 0.3 or more, and particularly preferably 0.35 or more. The upper limit is not particularly limited, but is preferably 0.80. Specific examples of electron-withdrawing groups include cyano (0.66), carboxyl (-COOH: 0.45), alkoxycarbonyl (e.g., -COOCH3: 0.45), aryloxycarbonyl (e.g., -COOPh: 0.44), carbamoyl (e.g., -CONH2: 0.36), alkylcarbonyl (e.g., -COCH3: 0.50), arylcarbonyl (e.g., -COPh: 0.43), alkylsulfonyl (e.g., -SO2CH3: 0.72), and arylsulfonyl (e.g., -SO2Ph: 0.68). Preferably, it is a cyano group, an alkylcarbonyl group, an alkylsulfonyl group, or an arylsulfonyl group, and more preferably a cyano group. 1 and R 2 One of the 3 and R 4 One of them is preferably a cyano group. Here, Ph represents a phenyl group. Regarding the Hammett σp value, reference can be made to paragraphs 0024 to 0025 of Japanese Patent Application Laid-Open No. 2009-263614, the contents of which are incorporated herein.

[0088] R 1 and R 2 One of the 3 and R 4 One of the groups is each independently preferably an aryl group or a heteroaryl group, more preferably a heteroaryl group.

[0089] The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 13. The aryl group may be substituted or unsubstituted. Examples of the substituent include the groups listed below for the substituent T and the group represented by the formula (R-100) below, preferably a halogen atom, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, and a hydroxyl group.

[0090] The heteroaryl group may be a monocyclic ring, but is preferably a condensed ring. The number of heteroatoms constituting the heteroaryl ring is preferably 1 to 3. The heteroatoms constituting the heteroaryl ring are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of carbon atoms constituting the heteroaryl ring is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The heteroaryl ring is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group may have a substituent or may be unsubstituted. As the substituent, the groups listed in the substituent T described later and the groups represented by the formula (R-100) described later are mentioned, preferably a halogen atom, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, and a hydroxyl group.

[0091] Examples of the heteroaryl group include the groups represented by the following formulas (Har-1) to (Har-10). Among them, the group represented by formula (Har-1), the group represented by formula (Har-2), the group represented by formula (Har-3), the group represented by formula (Har-4), the group represented by formula (Har-8), the group represented by formula (Har-9), and the group represented by formula (Har-10) are preferred because of their excellent light resistance. Furthermore, from the reason that more excellent visible transparency can be obtained, the group represented by formula (Har-1), the group represented by formula (Har-2), the group represented by formula (Har-3) or the group represented by formula (Har-4) is preferred, the group represented by formula (Har-1), the group represented by formula (Har-2) or the group represented by formula (Har-4) is more preferred, the group represented by formula (Har-1) or the group represented by formula (Har-2) is further preferred, and the group represented by formula (Har-1) is particularly preferred.

[0092] [Chemical Formula 5]

[0093]

[0094] Where R a1 ~R a49 Each independently represents a hydrogen atom or a substituent, and * represents a connecting bond. a1 ~R a49 Examples of the substituents represented by include the groups exemplified in the substituent T described later and the groups represented by the formula (R-100) described later. a1 ~R a49 Each independently preferably is a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a hydroxyl group.

[0095] In formula (Har-1), R a1 With R a2 、R a2 With R a3 、R a3 With R a4 They may be bonded to each other to form a ring.

[0096] In formula (Har-2), R a5 With R a6 、R a6 With R a7 、R a7 With R a8 They may be bonded to each other to form a ring.

[0097] In formula (Har-3), R a9 With R a10 、Ra10 With R a11 、R a11 With R a12 、R a12 With R a13 They may be bonded to each other to form a ring.

[0098] In formula (Har-4), R a15 With R a16 、R a16 With R a17 、R a17 With R a18 They may be bonded to each other to form a ring.

[0099] In formula (Har-5), R a19 With R a20 、R a20 With R a21 、R a21 With R a22 、R a22 With R a23 、R a23 With R a24 They may be bonded to each other to form a ring.

[0100] In formula (Har-6), R a25 With R a26 、R a26 With R a27 They may be bonded to each other to form a ring.

[0101] In formula (Har-7), R a28 With R a29 、R a29 With R a30 、R a30 With R a31 They may be bonded to each other to form a ring.

[0102] In formula (Har-8), R a32 With R a33 、R a33 With R a34 、R a34 With R a35 、R a35 With R a36 、R a36 With R a37 They may be bonded to each other to form a ring.

[0103] In formula (Har-9), R a38 With R a39 、R a39 With R a40 、R a40 With R a41 、Ra41 With R a42 、R a42 With R a43 They may be bonded to each other to form a ring.

[0104] In formula (Har-10), R a44 With R a45 、R a45 With R a46 、R a46 With R a47 、R a47 With R a48 、R a48 With R a49 They may be bonded to each other to form a ring.

[0105] In formula (Har-1) to formula (Har-10), the ring formed by bonding the above groups to each other is preferably a 5-membered ring or a 6-membered ring.

[0106] R in formula (1) 5 Represents an aliphatic hydrocarbon group. 5 The aliphatic hydrocarbon group represented by R may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. 5 The aliphatic hydrocarbon group represented may be any of linear, branched, and cyclic, but is preferably a branched or cyclic aliphatic hydrocarbon group. Furthermore, the cyclic aliphatic hydrocarbon group may be any of a monocyclic aliphatic hydrocarbon group, a condensed ring aliphatic hydrocarbon group, and a cross-linked ring aliphatic hydrocarbon group, but is preferably a monocyclic aliphatic hydrocarbon group. 5 The aliphatic hydrocarbon group represented by the formula (R-100) may have a substituent. Examples of the substituent include the groups listed below in the substituent T and the group represented by the formula (R-100) below. Preferably, the substituent is a halogen atom, an alkoxy group, an alkylthio group, a urea group, an acyl group, an alkoxycarbonyl group, an acyloxy group, a sulfamoyl group, an aryloxy group, a hydroxyl group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfonic group, or a group represented by the formula (R-100).

[0107] As R in formula (1) 5 Specific examples of the aliphatic hydrocarbon group represented by include an alkyl group, an alkenyl group, and an alkynyl group.

[0108] The number of carbon atoms in the alkyl group is preferably 1 to 30. The lower limit is preferably 3 or more. When the specific coloring matter is a pigment, the upper limit of the number of carbon atoms in the alkyl group is preferably 15 or less, more preferably 10 or less, and even more preferably 7 or less. When the specific coloring matter is a dye, the upper limit of the number of carbon atoms in the alkyl group is preferably 25 or less, more preferably 19 or less. The alkyl group may be linear, branched, or cyclic, and is preferably branched or cyclic.

[0109] The number of carbon atoms in the alkenyl group is preferably 2 to 30. The lower limit is preferably 3 or more. When the specific coloring matter is a pigment, the upper limit of the number of carbon atoms in the alkenyl group is preferably 15 or less, more preferably 10 or less, and even more preferably 7 or less. When the specific coloring matter is a dye, the upper limit of the number of carbon atoms in the alkenyl group is preferably 25 or less, more preferably 19 or less. The alkenyl group may be any of linear, branched, or cyclic, and is preferably a branched or cyclic alkenyl group.

[0110] The number of carbon atoms in the alkynyl group is preferably 2 to 30. The lower limit is preferably 3 or more. When the specific coloring matter is a pigment, the upper limit of the number of carbon atoms in the alkynyl group is preferably 15 or less, more preferably 10 or less, and even more preferably 7 or less. When the specific coloring matter is a dye, the upper limit of the number of carbon atoms in the alkynyl group is preferably 25 or less, more preferably 19 or less. The alkynyl group may be any of linear, branched, or cyclic, but is preferably a branched or cyclic alkynyl group, and more preferably a branched alkynyl group.

[0111] The alkyl, alkenyl, and alkynyl groups may be substituted or unsubstituted. Examples of the substituent include the groups listed below in the substituent T and the group represented by the formula (R-100) below. Preferred substituents include a halogen atom, an alkoxy group, an alkylthio group, a urea group, an acyl group, an alkoxycarbonyl group, an acyloxy group, a sulfamoyl group, an aryloxy group, a hydroxyl group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfo group, or a group represented by the formula (R-100).

[0112] R in formula (1) 5 The aliphatic hydrocarbon group represented by is preferably an alkyl group, more preferably a secondary alkyl group. Here, a secondary alkyl group is a group consisting of -C(R 5a )(R 5b ) represented by a group. 5a and R 5b Each independently represents an alkyl group, R 5a With R 5b They may be bonded to form an aliphatic hydrocarbon ring. 5a and R 5b The number of carbon atoms in the alkyl group represented by is preferably 1 to 10, more preferably 1 to 7. 5a and R 5b The alkyl group represented is preferably a linear or branched alkyl group. 5a and R 5b The alkyl group represented may have a substituent or may be unsubstituted.

[0113] As the substituent, there can be mentioned the groups listed in the substituent T described later and the groups represented by the formula (R-100) described later, preferably a halogen atom, an alkoxy group, an alkylthio group, a urea group, an acyl group, an alkoxycarbonyl group, an acyloxy group, a sulfamoyl group, an aryloxy group, a hydroxyl group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfonic group or a group represented by the formula (R-100).

[0114] R in formula (1) 5 The aliphatic hydrocarbon group represented is preferably a group represented by formula (R-1). According to this embodiment, the dye represented by formula (1) easily forms an association during film formation, and the heat resistance and light resistance of the obtained film can be further improved.

[0115] [Chemical Formula 6]

[0116]

[0117] In formula (R-1), * represents a connecting bond, R 101 and R 102 Each independently represents a hydrogen atom or a substituent, Ar 101 represents an aryl group or a heteroaryl group, and n represents an integer of 1 or greater.

[0118] As R 101 and R 102 The substituent represented by includes alkyl, aryl and heteroaryl, and is preferably alkyl. 101 and R 102 Each independently preferably represents a hydrogen atom.

[0119] Ar 101 represents an aryl group or a heteroaryl group, preferably an aryl group.

[0120] In formula (1), n ​​represents an integer of 1 or greater, preferably an integer of 1 to 10, more preferably an integer of 1 to 5, and even more preferably 1 or 2.

[0121] R 101 and R 102 The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, even more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may be substituted or unsubstituted. Examples of the substituent include those listed below for the substituent T.

[0122] R 101 、R 102 and Ar 101 The number of carbon atoms in the aryl group represented is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may be substituted or unsubstituted. Examples of the substituent include those listed below for the substituent T.

[0123] Composition R 101 、R 102 and Ar 101The number of carbon atoms of the heteroaryl group represented is preferably 1 to 30, more preferably 1 to 12. Examples of the types of heteroatoms constituting the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3, more preferably 1 or 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring with 2 to 8 condensed rings, and further preferably a monocyclic ring or a condensed ring with 2 to 4 condensed rings. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified in the substituent T described below.

[0124] R 101 with Ar 101 They may be bonded to form a ring, and the formed ring is preferably a 5-membered ring or a 6-membered ring.

[0125] R in formula (1) 11 ~R 15 Each independently represents a hydrogen atom or a substituent. 11 ~R 14 At least one of them is a substituent, or R 11 ~R 15 Each of the R in formula (1) is a hydrogen atom. 11 ~R 14 When at least one of R is a substituent, 15 Preferred is a hydrogen atom.

[0126] R in formula (1) 11 and R 14 At least one of is preferably a substituent. In this case, R 12 、R 13 and R 15 Each is preferably a hydrogen atom.

[0127] As R in formula (1) 11 ~R 15 The substituents represented include the groups listed in the substituent T described later and the groups represented by formula (R-100), and are preferably hydroxyl, halogen, alkyl, alkoxy, acyl, acyloxy, alkoxycarbonyl, sulfamoyl, alkylthio, urea, aryloxy, carboxyl, carbonyl, carboxylic acid amide, sulfonamide, imide, sulfonic or a group represented by formula (R-100).

[0128] [Chemical Formula 7]

[0129] *-L R1 -(X R1 ) n (R-100)

[0130] In formula (R-100), L R1represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, or -NR L1 -, -CO-, -COO-, -OCO-, -SO2- or a n+1 valent linking group consisting of a combination thereof, R L1 represents a hydrogen atom, an alkyl group or an aryl group, X R1 represents an acid group or a base, and n represents an integer greater than 1. When n is 1, L R1 Can be a single key.

[0131] The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 2 to 20, even more preferably 2 to 10, and particularly preferably 2 to 5. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aliphatic hydrocarbon group may have a substituent. Examples of the substituent include the groups listed below for the substituent T.

[0132] The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 18, more preferably 6 to 14, and even more preferably 6 to 10. The aromatic hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified in the substituent T described below.

[0133] The heterocyclic group is preferably a monocyclic ring or a condensed ring having 2 to 4 condensed rings. The number of heteroatoms constituting the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and more preferably 3 to 12. Specific examples of the heterocyclic group include piperazine ring groups, pyrrolidine ring groups, pyrrole ring groups, piperidine ring groups, pyridine ring groups, imidazole ring groups, pyrazole ring groups, oxazole ring groups, thiazole ring groups, pyrazine ring groups, morpholine ring groups, thiazine ring groups, indole ring groups, isoindole ring groups, benzimidazole ring groups, purine ring groups, quinoline ring groups, quinoxaline ring groups, quinoxaline ring groups, cinnoline ring groups, carbazole ring groups, and groups represented by the following formulas (L-1) to (L-7).

[0134] [Chemical Formula 8]

[0135]

[0136] In the formula, * represents a connecting bond. R represents a hydrogen atom or a substituent. Examples of the substituent include the groups listed below for the substituent T.

[0137] The aliphatic hydrocarbon group, aromatic hydrocarbon group, and heterocyclic group may have a substituent. Examples of the substituent include the groups exemplified below in the substituent T. A halogen atom is preferred, and a fluorine atom is more preferred.

[0138] R L1The number of carbon atoms in the alkyl group represented is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear. L1 The alkyl group represented may further have a substituent. Examples of the substituent include the groups exemplified in the substituent T described below.

[0139] R L1 The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. L1 The aryl group represented by may further have a substituent. Examples of the substituent include the groups exemplified in the substituent T described below.

[0140] As X of formula (R-100) R1 Examples of the acid groups include carboxyl, sulfo, phosphoric, boric, carboxylic acid amide, sulfonamide, imidic acid, and salts thereof. Examples of the atoms or atomic groups constituting the salt include alkali metal ions (Li + 、Na + , K + , Rb + 、Cs + etc.), alkaline earth metal ions (Ca 2+ Mg 2+ As the carboxylic acid amide group, preferably -NHCOR X1 As a sulfonamide group, preferably represented by -NHSO2R X2 As the imidic acid group, preferably -SO2NHSO2R X3 、-CONHSO2R X4 、-CONHCOR X5 or-SO2NHCOR X6 The group represented by X4 or -SO2NHSO2R X3 . R X1 ~R X6 R and R are independently an alkyl group or an aryl group. X1 ~R X6 The alkyl group and aryl group represented by the above-mentioned group may have a substituent, and the substituent is preferably a halogen atom, more preferably a fluorine atom.

[0141] As X of formula (R-100) R1 Examples of the base group include amino, pyridyl and salts thereof, ammonium salts, and phthalimidomethyl. Examples of the atom or atomic group constituting the salt include hydroxide ion, halide ion, carboxylate ion, sulfonate ion, and phenoxide ion.

[0142] As the amino group, there can be mentioned -NRx 1 Rx 2 The group represented by -NRx 1 Rx 2 In the group represented by 1 and Rx 2 Each independently represents a hydrogen atom, an alkyl group or an aryl group, preferably an alkyl group. The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The alkyl group may be any of linear, branched, and cyclic, preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. As the substituent, the groups listed in the substituent T described below may be mentioned. The number of carbon atoms of the aryl group is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group may have a substituent. As the substituent, the groups listed in the substituent T described below may be mentioned. In addition, Rx 1 With Rx 2 Can be bonded to form a ring. Examples of cyclic amino groups include pyrrolidinyl, piperidinyl, piperazinyl, morpholinyl, etc. These groups may further have a substituent. As a substituent, the groups listed in the substituent T described below can be listed. Specific examples of substituents include alkyl and aryl groups.

[0143] n in formula (R-100) represents an integer of 1 or greater, preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.

[0144] Y in formula (1) 1 and Y 2 Each independently represents a hydrogen atom or a substituent, preferably a substituent. 1 and Y 2 The substituents represented by include alkyl, aryl, heteroaryl, -BR Y1 R Y2 , preferably -BR Y1 R Y2 .

[0145] Y 1 and Y 2 The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 10, even more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may be substituted or unsubstituted. Examples of the substituent include those listed below for the substituent T.

[0146] Y 1 and Y 2The number of carbon atoms in the aryl group represented is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may be substituted or unsubstituted. Examples of the substituent include those listed below for the substituent T.

[0147] Composition Y 1 and Y 2 The number of carbon atoms of the heteroaryl group represented is preferably 1 to 30, more preferably 1 to 12. Examples of the types of heteroatoms constituting the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring with 2 to 8 condensed rings, and further preferably a monocyclic ring or a condensed ring with 2 to 4 condensed rings. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups exemplified in the substituent T described below.

[0148] By-BR Y1 R Y2 R in the group represented by Y1 and R Y2 Each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group or a heteroaryloxy group, preferably a halogen atom, an alkyl group, an aryl group or a heteroaryl group, more preferably a halogen atom, an alkyl group or an aryl group, further preferably an aryl group.

[0149] As R Y1 and R Y2 Examples of the halogen atom represented by include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferred.

[0150] R 11 and R Y2 The number of carbon atoms in the alkyl and alkoxy groups is preferably 1 to 40, more preferably 1 to 30, and even more preferably 1 to 20. The alkyl and alkoxy groups may be linear, branched, or cyclic, preferably linear or branched. The alkyl and alkoxy groups may or may not be substituted. Examples of substituents include aryl groups, heteroaryl groups, and halogen atoms.

[0151] R Y1 and R Y2 The number of carbon atoms in the alkenyl group represented is preferably 2 to 40, more preferably 2 to 30, and even more preferably 2 to 20. The alkenyl group may be substituted or unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, an aryl group, a heteroaryl group, and a halogen atom.

[0152] R Y1 and R Y2The number of carbon atoms in the aryl group and aryloxy group is preferably 6 to 20, more preferably 6 to 12. The aryl group and aryloxy group may be substituted or unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom.

[0153] R Y1 and R Y2 The heteroaryl group and heteroaryloxy group may be a monocyclic ring or a condensed ring. The number of heteroatoms constituting the heteroaryl ring of the heteroaryl group and heteroaryloxy group is preferably 1 to 3. The heteroatom constituting the heteroaryl ring is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of carbon atoms constituting the heteroaryl ring is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The heteroaryl ring is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group and heteroaryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom.

[0154] By-BR Y1 R Y2 The group R Y1 With R Y2 The rings formed may be bonded to each other to form a ring. Examples of the rings formed include the structures shown in the following formulas (B-1) to (B-4). Hereinafter, Rb represents a substituent, Rb 1 ~Rb 4 Each independently represents a hydrogen atom or a substituent, b1 to b3 each independently represent an integer of 0 to 4, and * represents a connecting bond. 1 ~Rb 4 Examples of the substituent represented by include the groups exemplified in the substituent T described later, and are preferably a halogen atom, an alkyl group, or an alkoxy group.

[0155] [Chemical Formula 9]

[0156]

[0157] (Substituent T)

[0158] Examples of the substituent T include the following groups: a halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxy group having 0 to 30 carbon atoms), an alkyloxy group (preferably an alkyloxy group having 1 to 30 carbon atoms), an alkyloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), an alkyloxy group (preferably an alkyloxy group having 6 to 30 carbon atoms), an alkyloxy group (preferably an alkyloxy group having 1 ... (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heteroaryloxycarbonyl group (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), a sulfamoylamino group (preferably a a thioalkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonyl group having 6 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 6 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 6 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 1 ...1 to 30 carbon atoms), a thioalkylsulfonyl group (preferably an thioalkylsulfonylamino group having 1 to The following examples include alkylsulfonyl groups (preferably alkylsulfonyl groups), heteroarylsulfonylamino groups (preferably heteroarylsulfonylamino groups having 1 to 30 carbon atoms), alkylsulfinyl groups (preferably alkylsulfinyl groups having 1 to 30 carbon atoms), arylsulfinyl groups (preferably arylsulfinyl groups having 6 to 30 carbon atoms), heteroarylsulfinyl groups (preferably heteroarylsulfinyl groups having 1 to 30 carbon atoms), urea groups (preferably urea groups having 1 to 30 carbon atoms), hydroxyl groups, nitro groups, carboxyl groups, sulfo groups, phosphoric acid groups, carboxylic acid amide groups, sulfonic acid amide groups, imide groups, phosphino groups, mercapto groups, cyano groups, alkylsulfinyl groups, arylsulfinyl groups, arylazo groups, heteroarylazo groups, phosphinyl groups, phosphinyloxy groups, phosphinylamino groups, silyl groups, hydrazino groups, and imino groups. When these groups are further substituted, they may further have substituents. Examples of the substituents include those described for the substituent T above.

[0159] The maximum absorption wavelength of the specific pigment preferably exists at a wavelength of 650 nm or longer, more preferably exists in the wavelength range of 650 to 1500 nm, further preferably exists in the wavelength range of 660 to 1200 nm, and particularly preferably exists in the wavelength range of 660 to 1000 nm.

[0160] Furthermore, assuming that the absorbance at the wavelength (λmax) where the absorbance shows a maximum value in the wavelength range of 400 nm to 1200 nm is 1, the average absorbance of the specific pigment in the wavelength range of 420 to 550 nm is preferably less than 0.010, more preferably less than 0.007.

[0161] Can obtain the absorbance of specific pigment and the value of maximum absorption wavelength by making specific pigment be dissolved in the solvent and prepare pigment solution and measure the absorbance of pigment solution.As the solvent for the preparation of pigment solution, chloroform, dimethyl sulfoxide (DMSO), tetrahydrofuran (THF) etc. can be enumerated.In addition, when specific pigment is the compound being dissolved in chloroform, as solvent, chloroform is used.When specific pigment is the compound being insoluble in chloroform but being dissolved in dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF), as solvent, dimethyl sulfoxide (DMSO) or tetrahydrofuran (THF) is used.

[0162] The specific coloring matter may be a pigment or a dye.

[0163] Furthermore, the specific pigment may be a pigment derivative. For example, the pigment derivative may be used as a dispersing aid. A dispersing aid refers to a raw material used to improve the dispersibility of the pigment in the composition. When the composition further contains a resin such as a dispersant, the dispersibility of the pigment can be further improved by forming a network between the pigment, the dispersing aid, and the resin. 11 ~R 14 A compound having a structure in which at least one of the groups is a group represented by formula (R-100) can be preferably used as a dispersing aid. 11 ~R 14 A compound having a structure in which at least one of the groups is a group represented by formula (R-100) can also be used as a pigment or a dye.

[0164] In this specification, the formula (1) also includes its resonance structure. That is, the compound having the resonance structure of the formula (1) is also included in the specific dye of the present invention.

[0165] Specific examples of the specific pigment include compounds having structures described in the examples below (PPB-A-1 to PPB-A-81, PPB-B-24, PPB-B-26, PPB-B-28, PPB-B-30, PPB-B-32, PPB-B-36, PPB-B-37, PPB-B-38, PPB-B-40, PPB-B-44, PPB-B-45, PPB-B-46, PPB-B-50, PPB-B-51, PPB-B-52, PPB-B-53, PPB-B-54, PPB-B-55, PPB-B-56, PPB-B-57, PPB-B-58, PPB-B-59, PPB-B-60, PPB-B-61, PPB-B-62, PPB-B-63, PPB-B-64, PPB-B-65, PPB-B-66, PPB-B-67, PPB-B-68, PPB-B-69, PPB-B-70, PPB-B-71, PPB-B-72, PPB-B-73, PPB-B-74, PPB-B-75, PPB-B-76, PPB-B-77, PPB-B-78, PPB-B-79, PPB-B-80, PPB-B-81, 2. PPB-B-54, PPB-B-56, PPB-B-58, PPB-B-62, PPB-B-63, PPB-B-64, PPB-B-65, PPB-B-66, PPB-B-67, PPB-B-68, PPB-B-69, PPB-B-70, PPB-B-71, PPB-B-72, PPB-B-73, PPB-B-74, PPB-C-1 to PPB-C-12) and salts of these compounds.

[0166] The content of specific pigment is preferably more than 0.5 mass % in the total solids component of composition, more preferably more than 3 mass %, further preferably more than 5 mass %.And, the upper limit of the content of specific pigment is preferably below 50 mass %, more preferably below 40 mass %, further preferably below 30 mass %.Composition can only contain 1 specific pigment, also can contain more than 2 kinds.When comprising more than 2 kinds, these total amounts are preferably in above-mentioned range.

[0167] The composition of the present invention may contain a decomposition product of a specific pigment.

[0168] <<Curing Compound>>

[0169] The composition of the present invention contains a curable compound. As a curable compound, a polymerizable compound, a resin, etc. can be mentioned. The resin can be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). As a polymerizable group, a group containing an ethylenically unsaturated bond, a cyclic ether group, a hydroxymethyl group, an alkoxymethyl group, etc. can be mentioned. As a group containing an ethylenically unsaturated bond, a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, a (meth)acryloylamide group, etc. can be mentioned, preferably a (meth)allyl group, a (meth)acryloyl group and a (meth)acryloyloxy group, more preferably a (meth)acryloyloxy group. As a cyclic ether group, an epoxy group, an oxetane group, etc. can be mentioned, preferably an epoxy group. The polymerizable compound is preferably a polymerizable monomer.

[0170] As the curable compound, a compound containing at least a resin is preferably used. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferred to use as the curable compound a resin and a polymerizable monomer (monomer-type polymerizable compound), and more preferably a resin and a polymerizable monomer having a group containing an ethylenically unsaturated bond (monomer-type polymerizable compound).

[0171] (Polymerizable compound)

[0172] Examples of polymerizable compounds include compounds having a group containing an ethylenically unsaturated bond, compounds having a cyclic ether group, compounds having a hydroxymethyl group, and compounds having an alkoxymethyl group. Compounds having a group containing an ethylenically unsaturated bond can be preferably used as free radical polymerizable compounds. Furthermore, compounds having a cyclic ether group can be preferably used as cationically polymerizable compounds.

[0173] Examples of the resin-type polymerizable compound include resins containing a repeating unit having a polymerizable group.

[0174] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2,000, more preferably 1,500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, more preferably 200 or more. The weight average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2,000 to 2,000,000. The upper limit of the weight average molecular weight is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit of the weight average molecular weight is preferably 3,000 or more, more preferably 5,000 or more.

[0175] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a tri- to penta-functional (meth)acrylate compound, and more preferably a tri- to hexa-functional (meth)acrylate compound. Specific examples include compounds described in paragraphs 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraphs 0254 to 0257 of JP-A-2008-292970, paragraphs 0034 to 0038 of JP-A-2013-253224, paragraph 0477 of JP-A-2012-208494, JP-A-2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, and Japanese Patent No. 2017-194662, the contents of which are incorporated into this specification.

[0176] Examples of the compound having a group containing an ethylenically unsaturated bond include dipentaerythritol triacrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), and compounds having a structure in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (for example, compounds manufactured by SARTOMER). Company, Inc. commercially available SR454, SR499) and the like. Furthermore, as compounds having a group containing an ethylenically unsaturated bond, diglycerol EO (ethylene oxide)-modified (meth)acrylate (commercially available product, M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK ESTER A-TMMT manufactured by Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., LTD.), etc.

[0177] Furthermore, as compounds having a group containing an ethylenically unsaturated bond, trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanurate ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate are also preferably used. Examples of commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARADG PO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0178] The compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxyl group, a sulfo group, or a phosphoric acid group. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, and ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.).

[0179] As the compound having a group containing an ethylenically unsaturated bond, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, reference can be made to paragraphs 0042 to 0045 of JP-A-2013-253224, which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120 commercially available from Nippon Kayaku Co., Ltd.

[0180] As the compound having a group containing an ethylenically unsaturated bond, a compound having a group containing an ethylenically unsaturated bond and an alkyleneoxy group can also be used. Such a compound is preferably a compound having a group containing an ethylenically unsaturated bond and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having a group containing an ethylenically unsaturated bond and an ethyleneoxy group, and even more preferably a trifunctional to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Commercially available products include, for example, SR-494, a tetrafunctional (meth)acrylate having 4 ethyleneoxy groups manufactured by SARTOMER Company, Inc., and KAYARAD TPA-330, a trifunctional (meth)acrylate having 3 isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0181] As the compound having a group containing an ethylenically unsaturated bond, a polymerizable compound having a fluorene skeleton can also be used. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0182] As the compound having a group containing an ethylenically unsaturated bond, it is also preferable to use a compound that does not substantially contain environmentally regulated substances such as toluene. Commercially available products of such a compound include KAYARAD DPHALT and KAYARAD DPEA-12LT (manufactured by Nippon Kayaku Co., Ltd.).

[0183] As compounds having a group containing an ethylenically unsaturated bond, UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by KYOEISHA CHEMICAL Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOETSHA CHEMICAL Co., Ltd.), and the like are also preferably used.

[0184] As the compound having a cyclic ether group, a compound having an epoxy group, a compound having an oxetane group, etc. can be mentioned, and a compound having an epoxy group is preferably a compound having an epoxy group. As the compound having an epoxy group, a compound having 1 to 100 epoxy groups in one molecule can be mentioned. The upper limit of the number of epoxy groups can be set to 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more. As the compound having an epoxy group, the compounds described in paragraphs 0034 to 0036 of Japanese Patent Application Publication No. 2013-011869, paragraphs 0147 to 0156 of Japanese Patent Application Publication No. 2014-043556, paragraphs 0085 to 0092 of Japanese Patent Application Publication No. 2014-089408, and the compounds described in Japanese Patent Application Publication No. 2017-179172 can also be used, and these contents are incorporated into this specification.

[0185] The compound having a cyclic ether group may be a low molecular weight compound (e.g., a molecular weight of less than 1000) or a high molecular weight compound (e.g., a molecular weight of 1000 or more, or a weight average molecular weight of 1000 or more in the case of a polymer). The weight average molecular weight of the compound having a cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0186] As the compound having a cyclic ether group, compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, compounds described in paragraphs 0147 to 0156 of JP-A-2014-043556, compounds described in paragraphs 0085 to 0092 of JP-A-2014-089408, and compounds described in JP-A-2017-179172 can also be used.

[0187] Examples of commercially available compounds having a cyclic ether group include DENACOL EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, and EPPN-502 (all manufactured by ADEKA Corporation), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, and CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by Daicel Corporation), CYCLOMER P ACA200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), ARONE OXETANE OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by TOAGOSEI CO., LTD.), ADEKA GLYCIROL ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF CORPORATION, epoxy group-containing polymer), OXT-101, OXT-121, OXT-212, OXT-221 (above are manufactured by TOAGOSEI CO., LTD., oxetane group-containing monomer), OXE-10, OXE-30 (above are manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD., oxetane group-containing monomer), etc.

[0188] Examples of the compound having a hydroxymethyl group (hereinafter also referred to as a hydroxymethyl compound) include compounds in which a hydroxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.

[0189] Furthermore, as the compound with an alkoxymethyl group (hereinafter also referred to as an alkoxymethyl compound), compounds in which an alkoxymethyl group is bonded to a carbon atom forming a nitrogen atom or an aromatic ring can be enumerated. As the compound in which an alkoxymethyl group or a hydroxymethyl group is bonded to a nitrogen atom, preferably alkoxymethylated melamine, hydroxymethylated melamine, alkoxymethylated benzoguanamine, hydroxymethylated benzoguanamine, alkoxymethylated glycoluril, hydroxymethylated glycoluril, alkoxymethylated urea and hydroxymethylated urea etc. can be used. Furthermore, compounds described in paragraphs 0134 to 0147 of Japanese Patent Application Publication No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Application Publication No. 2014-089408 can also be used.

[0190] (resin)

[0191] The composition of the present invention can use a resin as a curable compound. The curable compound preferably uses a compound containing at least a resin. For example, a resin may be formulated for use as a dispersion of a pigment or the like in a composition, or as a binder. Furthermore, a resin primarily used to disperse a pigment or the like in a composition is also referred to as a dispersant. This use of a resin is merely an example, and the resin may also be used for purposes other than this. Furthermore, a resin having a polymerizable group also corresponds to a polymerizable compound.

[0192] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0193] As resin, can enumerate (meth) acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamide-imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin etc.. Among these resins, can use 1 kind alone, can also use 2 or more kinds in mixture.As cyclic olefin resin, from the viewpoint of improving heat resistance, preferably norbornene resin.

[0194] Examples of commercially available norbornene resins include the ARTON series manufactured by JSR Corporation (e.g., ARTON F4520). Furthermore, the resins described in Examples of International Publication No. 2016 / 088645, JP-A-2017-057265, JP-A-2017-032685, JP-A-2017-075248, JP-A-2017-066240, JP-A-2017-167513, JP-A-2017-206689, and JP-A-2018-010856, can also be used. Furthermore, as the resin, a resin having a fluorene skeleton can also be preferably used. Regarding the resin having a fluorene skeleton, reference can be made to the description of U.S. Patent Application Publication No. 2017 / 0102610, the contents of which are incorporated into this specification.

[0195] As the resin, a resin having an acid group is preferably used. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group. These acid groups may be one or more. A resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, further preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0196] The resin is also preferably a resin containing repeating units derived from a compound represented by formula (ED1) and / or a compound represented by formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimers").

[0197] [Chemical Formula 10]

[0198]

[0199] In formula (ED1), R 1 and R 2 Each independently represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

[0200] [Chemical Formula 11]

[0201]

[0202] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. Specific examples of formula (ED2) can be found in Japanese Patent Application Laid-Open No. 2010-168539.

[0203] For specific examples of the ether dimer, reference can be made to paragraph 0317 of JP-A-2013-029760, the contents of which are incorporated herein.

[0204] As the resin, a resin having a polymerizable group is also preferably used. The polymerizable group is preferably a group containing an ethylenically unsaturated bond and a cyclic ether group, and more preferably a group containing an ethylenically unsaturated bond.

[0205] As the resin, a resin containing a repeating unit derived from a compound represented by formula (X) is also preferably used.

[0206] [Chemical Formula 12]

[0207]

[0208] Where R 1 represents a hydrogen atom or a methyl group, R 21 and R 22 Each independently represents an alkylene group, and n represents an integer of 0 to 15. 21 and R 22 The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and further preferably an integer of 0 to 3.

[0209] Examples of the compound represented by formula (X) include ethylene oxide- or propylene oxide-modified (meth)acrylates of para-cumylphenol, and examples of commercially available products include ARONIXM-110 (manufactured by TOAGOSEI CO., LTD.).

[0210] The resin preferably contains a resin that serves as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (alkaline resins). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of base groups. As the acidic dispersant (acidic resin), when the total amount of the amount of acid groups and the amount of base groups is set to 100 mol%, the resin in which the amount of acid groups is 70 mol% or more is preferred. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the alkaline dispersant (alkaline resin) refers to a resin in which the amount of base groups is greater than the amount of acid groups. As the alkaline dispersant (alkaline resin), when the total amount of the amount of acid groups and the amount of base groups is set to 100 mol%, the resin in which the amount of base groups exceeds 50 mol%. The base group possessed by the alkaline dispersant is preferably an amino group.

[0211] The resin used as the dispersant is also preferably a grafted resin. For details of the grafted resin, reference can be made to paragraphs 0025 to 0094 of JP-A-2012-255128, the contents of which are incorporated herein.

[0212] The resin used as a dispersant is also preferably a polyimine-based dispersant containing nitrogen atoms in at least one of the main chain and side chains. The polyimine-based dispersant is preferably a resin having a main chain and side chains, and having a basic nitrogen atom in at least one of the main chain and side chains, wherein the main chain contains a partial structure having a functional group with a pKa of 14 or less, and the number of atoms in the side chain is 40 to 10,000. There are no particular restrictions on the basic nitrogen atom as long as it is a basic nitrogen atom. For information on polyimine-based dispersants, reference can be made to paragraphs 0102 to 0166 of Japanese Patent Application Publication No. 2012-255128, which is incorporated herein by reference.

[0213] The resin used as a dispersant is also preferably a resin having a structure in which multiple polymer chains are bonded to the core. Examples of such resins include dendritic polymers (including star polymers). Specific examples of dendritic polymers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0214] The resin used as a dispersant is also preferably a resin containing repeating units having a group containing an ethylenically unsaturated bond in its side chain. The content of repeating units having a group containing an ethylenically unsaturated bond in its side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and even more preferably 20 to 70 mol% based on all repeating units in the resin.

[0215] In addition, as a dispersant, the resin described in Japanese Patent Application Laid-Open No. 2018-087939, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent Application No. 6432077, the polyethyleneimine having a polyester side chain described in International Publication No. 2016 / 104803, the block copolymer described in International Publication No. 2019 / 125940, the block polymer having an acrylamide structural unit described in Japanese Patent Application Laid-Open No. 2020-066687, the block polymer having an acrylamide structural unit described in Japanese Patent Application Laid-Open No. 2020-066688, etc. can also be used.

[0216] Dispersants are commercially available, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie GmbH, the SOLSPERSE series manufactured by Japan Lubrizol Corporation, the Efka series manufactured by BASF, and the Ajispar series manufactured by Ajinomoto Fine-Techno Co., Inc. Furthermore, the products described in paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as dispersants.

[0217] The content of the curable compound is preferably 1 to 95% by mass of the total solids content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, further preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0218] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound is preferably 1 to 85% by mass of the total solids content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0219] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer is preferably 1 to 50% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0220] When the composition of the present invention includes a compound having a group containing an ethylenically unsaturated bond as a curable compound, the content of the compound having a group containing an ethylenically unsaturated bond is preferably 1 to 70% by mass in the total solids content of the composition. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0221] When the composition of the present invention contains a resin as a curable compound, the content of the resin is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, further preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0222] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40% by mass in the total solid content of the composition. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass relative to 100 parts by mass of the above-mentioned specific pigment. The upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more.

[0223] The composition of the present invention may contain only one curable compound or two or more curable compounds. When containing two or more curable compounds, the total amount thereof is preferably within the above range.

[0224] <<Other infrared absorbers>>

[0225] The composition of the present invention can contain infrared absorbers (other infrared absorbers) in addition to the above-mentioned specific pigment. By further containing other infrared absorbers, a film that can block the infrared rays of a wider wavelength range can be formed. Other infrared absorbers can be dyes or pigments (particles). As other infrared absorbers, pyrrolopyrrole compounds, cyanine compounds, square acid compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, crotonium compounds, oxonol compounds, imine compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, disulfide metal complexes, metal oxides, metal borides, etc. can be enumerated. Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614, compounds described in paragraphs 0037 to 0052 of JP-A-2011-068731, and compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873. Examples of the squaric acid compound include compounds described in paragraphs 0044 to 0049 of Japanese Patent Application Laid-Open No. 2011-208101, compounds described in paragraphs 0060 to 0061 of Japanese Patent Application No. 6065169, compounds described in paragraph 0040 of International Publication No. 2016 / 181987, compounds described in Japanese Patent Application Laid-Open No. 2015-176046, and compounds described in paragraph 0072 of International Publication No. 2016 / 190162. , compounds described in paragraphs 0196 to 0228 of Japanese Patent Application Laid-Open No. 2016-074649, compounds described in paragraph 0124 of Japanese Patent Application Laid-Open No. 2017-067963, compounds described in International Publication No. 2017 / 135359, compounds described in Japanese Patent Application Laid-Open No. 2017-114956, compounds described in Japanese Patent No. 6197940, compounds described in International Publication No. 2016 / 120166, etc. Examples of cyanine compounds include compounds described in paragraphs 0044 to 0045 of JP-A-2009-108267, compounds described in paragraphs 0026 to 0030 of JP-A-2002-194040, compounds described in JP-A-2015-172004, compounds described in JP-A-2015-172102, compounds described in JP-A-2008-088426, compounds described in paragraph 0090 of International Publication No. 2016 / 190162, and compounds described in JP-A-2017-031394. Examples of crotonium compounds include compounds described in JP-A-2017-082029.Examples of the imine compound include compounds described in JP-A-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of International Publication No. 2018 / 043564. Examples of the phthalocyanine compound include the compounds described in paragraph 0093 of JP-A-2012-077153, the oxytitanium phthalocyanine described in paragraph 0013 of JP-A-2006-343631, the compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, the vanadium phthalocyanine compounds described in paragraph 0029 of Japanese Patent No. 6081771, the compounds described in paragraph 0020 to 0024 of JP-A-2018 / 186489, and the compounds described in paragraphs 0029 to 0076 of JP-A-2020 / 071470. Examples of the naphthalocyanine compound include the compounds described in paragraph 0093 of JP-A-2012-077153. As disulfide metal complexes, compounds described in Japanese Patent No. 5733804 can be cited. As metal oxides, for example, indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide, etc. can be cited. For details of tungsten oxide, reference can be made to paragraph 0080 of Japanese Patent Application Publication No. 2016-006476, which is incorporated into this specification. As metal borides, lanthanum boride and the like can be cited. Commercially available products of lanthanum boride include LaB6-F (manufactured by Japan New Metals Co., Ltd.). In addition, as metal borides, compounds described in International Publication No. 2017 / 119394 can also be used. Commercially available products of indium tin oxide include F-ITO (manufactured by DOWA HIGHTECH CO., LTD.) and the like.

[0226] Furthermore, as the phthalocyanine compound, a compound represented by formula (Pc) can also be used.

[0227] [Chemical Formula 13]

[0228]

[0229] In formula (Pc), Rp 1 ~Rp 16 Each independently represents a hydrogen atom or a substituent,

[0230] Rp 1 and Rp 4 At least one of represents an alkyl group,

[0231] Rp5 and Rp 8 At least one of represents an alkyl group,

[0232] Rp 9 and Rp 12 At least one of represents an alkyl group,

[0233] Rp 13 and Rp 16 At least one of represents an alkyl group,

[0234] M 1 represents two hydrogen atoms, a divalent metal atom, or a divalent substituted metal atom including a trivalent or tetravalent metal atom.

[0235] Rp as formula (Pc) 1 ~Rp 16 The substituent represented by includes the groups exemplified above for the substituent T. Rp in formula (Pc) 1 、Rp 4 、Rp 5 、Rp 8 、Rp 9 、Rp 12 、Rp 13 and Rp 16 The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10. The alkyl group is preferably linear or branched, more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of substituents on the alkyl group include alkoxy, aryloxy, alkylthio, and arylthio, with alkoxy and aryloxy being preferred. These groups may further have a substituent. Examples of further substituents include alkyl, aryl, alkoxy, aryloxy, alkylthio, and arylthio, with alkoxy and aryloxy being preferred, and alkoxy being more preferred.

[0236] In formula (Pc), Rp 1 、Rp 4 、Rp 5 、Rp 8 、Rp 9 、Rp 12 、Rp 13 and Rp 16 Each independently is preferably an alkyl group.

[0237] Moreover, Rp 2 、Rp 3 、Rp 6 、Rp 7 、Rp 10 、Rp 11 、Rp 14 and Rp 15 Preferred is a hydrogen atom.

[0238] As Rp 1 ~Rp 16 The preferred embodiment of Rp 1 、Rp 4 、Rp 5 、Rp 8 、Rp 9 、Rp 12 、Rp 13 and Rp 16 are independently alkyl and Rp 2 、Rp 3 、Rp 6 、Rp 7 、Rp 10 、Rp 11 、Rp 14 and Rp 15 For hydrogen atoms.

[0239] As Rp 1 ~Rp 16 Another preferred embodiment of Rp 1 and Rp 4 One of them is an alkyl group and the other is a hydrogen atom, Rp 5 and Rp 8 One of them is an alkyl group and the other is a hydrogen atom, Rp 9 and Rp 12 One of them is an alkyl group and the other is a hydrogen atom, Rp 13 and Rp 16 One of them is an alkyl group and the other is a hydrogen atom, Rp 2 、Rp 3 、Rp 6 、Rp 7 、Rp 10 、Rp 11 、Rp 14 and Rp 15 For hydrogen atoms.

[0240] M in formula (Pc) 1 Preferred are Pd, Cu, Zn, Pt, Ni, TiO, Co, Fe, Mn, Sn, SnCl2, AlCl, Al(OH), Si(OH)2, VO or InCl, more preferred are Cu or VO.

[0241] Specific examples of the compound represented by formula (Pc) include the following compounds.

[0242] [Chemical Formula 14]

[0243]

[0244] [Chemical Formula 15]

[0245]

[0246] Furthermore, as the infrared absorber, the squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-197437, the squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-025311, the squarylium compounds described in International Publication No. 2016 / 154782, the squarylium compounds described in Japanese Patent No. 5884953, and the squarylium compounds described in Japanese Patent No. 6036689 can also be used. , the squaric acid compound described in Japanese Patent No. 5810604, the squaric acid compound described in paragraphs 0090 to 0107 of International Publication No. 2017 / 213047, the pyrrole ring-containing compound described in paragraphs 0019 to 0075 of Japanese Patent Application Laid-Open No. 2018-054760, the pyrrole ring-containing compound described in paragraphs 0078 to 0082 of Japanese Patent Application Laid-Open No. 2018-040955, The pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP-A-2018-002773, the squarylium compounds having an aromatic ring at the amide α position described in paragraphs 0024 to 0086 of JP-A-2018-041047, the amide-linked squarylium compounds described in JP-A-2017-179131, the pyrrole bi-type squarylium compounds described in JP-A-2017-141215 Compounds having an acid skeleton or a crotonate skeleton, dihydrocarbazole bis-type square acid compounds described in Japanese Patent Application Laid-Open No. 2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of Japanese Patent Application Laid-Open No. 2017-068120, pyrrole ring-containing compounds (carbazole type) described in Japanese Patent Application Laid-Open No. 2017-067963, phthalocyanine compounds described in Japanese Patent Application No. 6251530, etc.

[0247] The content of the other infrared absorbers is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass relative to 100 parts by mass of the specific pigment. Furthermore, the total content of the specific pigment and other infrared absorbers is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more of the total solids content of the composition. The upper limit of the above-mentioned total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less. Two or more other infrared absorbers may be used simultaneously. When two or more other infrared absorbers are used simultaneously, the total content of the specific pigment and other infrared absorbers may be within the above-mentioned range.

[0248] <<Pigment Derivatives>>

[0249] In addition to the specific pigment, the composition of the present invention may further contain a pigment derivative. The pigment derivative can be used as a dispersing aid. Examples of the pigment derivative include compounds having a structure in which an acid group or a base group is bonded to the pigment skeleton.

[0250] Examples of the pigment skeleton constituting the pigment derivative include a squarylium pigment skeleton, a pyrrolopyrrole pigment skeleton, a diketopyrrolopyrrole pigment skeleton, a quinacridone pigment skeleton, anthraquinone pigment skeleton, a dianthraquinone pigment skeleton, a benzisoindole pigment skeleton, a thiazine indigo pigment skeleton, an azo pigment skeleton, a quinophthalone pigment skeleton, a phthalocyanine pigment skeleton, a naphthalocyanine pigment skeleton, a dioxazine pigment skeleton, a perylene pigment skeleton, a perinone pigment skeleton, a benzimidazolone pigment skeleton, a benzothiazole pigment skeleton, a benzimidazole pigment skeleton, and a benzoxazole pigment skeleton. Preferred are the squarylium pigment skeleton, the pyrrolopyrrole pigment skeleton, the diketopyrrolopyrrole pigment skeleton, the phthalocyanine pigment skeleton, the quinacridone pigment skeleton, and the benzimidazolone pigment skeleton, and more preferred are the squarylium pigment skeleton and the pyrrolopyrrole pigment skeleton.

[0251] Examples of the acid group include carboxyl, sulfo, phosphoric acid, boric acid, carboxylic acid amide, sulfonamide, imidic acid, and salts thereof. Examples of the atom or atomic group constituting the salt include alkali metal ions (Li + 、Na + , K + , Rb + 、Cs + etc.), alkaline earth metal ions (Ca 2+ Mg 2+ As the carboxylic acid amide group, preferably -NHCOR X1 As a sulfonamide group, preferably represented by -NHSO2R X2 As the imidic acid group, preferably -SO2NHSO2R X3 、-CONHSO2R X4 、-CONHCOR X5 or-SO2NHCOR X6 The group represented by -SO2NHSO2R is more preferably X3 . R X1 ~R X6 R and R are independently an alkyl group or an aryl group. X1 ~R X6 The alkyl group and aryl group represented by the above-mentioned group may have a substituent, and the substituent is preferably a halogen atom, more preferably a fluorine atom.

[0252] Examples of the base include amino, pyridyl, and salts thereof, ammonium salts, and phthalimidomethyl groups. Examples of the atom or atomic group constituting the salt include hydroxide ions, halogen ions, carboxylic acid ions, sulfonic acid ions, and phenoxide ions.

[0253] As the specific example of the pigment derivative, the compounds described in the examples below can be enumerated. In addition, Japanese Patent Laid-Open No. 56-118462 Gazette, Japanese Patent Laid-Open No. 63-264674 Gazette, Japanese Patent Laid-Open No. 01-217077 Gazette, Japanese Patent Laid-Open No. 03-009961 Gazette, Japanese Patent Laid-Open No. 03-026767 Gazette, Japanese Patent Laid-Open No. 03-153780 Gazette, Japanese Patent Laid-Open No. 03-045662 Gazette, Japanese Patent Laid-Open No. 04-285669 Gazette, Japanese Patent Laid-Open No. 06- The compounds described in Japanese Patent Application Laid-Open No. 145546, Japanese Patent Application Laid-Open No. 06-212088, Japanese Patent Application Laid-Open No. 06-240158, Japanese Patent Application Laid-Open No. 10-030063, Japanese Patent Application Laid-Open No. 10-195326, paragraphs 0086 to 0098 of International Publication No. 2011 / 024896, and paragraphs 0063 to 0094 of International Publication No. 2012 / 102399 are incorporated into the present specification.

[0254] The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the above-mentioned specific pigment. The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. The pigment derivative may be used in one or more ways. When using two or more kinds, the total amount is preferably within the above range.

[0255] Solvents

[0256] The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, with organic solvents being preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details on these, please refer to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated herein by reference. Furthermore, cyclic alkyl-substituted ester solvents and cyclic alkyl-substituted ketone solvents are also preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... alcohol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, etc. Among these, for environmental reasons, it may be preferable to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents (for example, it can be reduced to 50 mass ppm (parts per million) or less, 10 mass ppm or less, or even 1 mass ppm or less relative to the total amount of the organic solvent).

[0257] In the present invention, it is preferred to use an organic solvent with a low metal content. For example, the metal content of the organic solvent is preferably 10 parts per billion (ppb) or less. Organic solvents with a ppt (parts per trillion) mass content can be used as needed. Such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

[0258] Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The pore size of the filter used for filtration is preferably 100 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter is preferably made of polytetrafluoroethylene, polyethylene, or nylon.

[0259] The organic solvent may contain isomers (compounds having the same number of atoms but different structures). The isomers may contain only one type or multiple types.

[0260] The content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially no peroxide is contained.

[0261] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, even more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one solvent or two or more. When containing two or more solvents, the total amount of these solvents is preferably within the above range.

[0262] <<Photopolymerization Initiator>>

[0263] When the composition of the present invention includes a polymerizable compound, the composition of the present invention preferably further includes a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound that is photosensitized to light in the ultraviolet to visible range is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0264] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a triarylimidazole dimer, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, and a 3-aryl-substituted coumarin compound. More preferred are compounds selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds, and even more preferred are oxime compounds. In addition, examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173 and Japanese Patent No. 6301489, MATERIAL STAGE 37~60p, vol.19, No.3, 2019, the peroxide-based photopolymerization initiator described in International Publication No. 2018 / 221177, the photopolymerization initiator described in International Publication No. 2018 / 110179, the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-043864, the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-044030, the peroxide-based initiator described in Japanese Patent Application Publication No. 2019-167313, the aminoacetophenone-based initiator having an oxazolidinyl group described in Japanese Patent Application Publication No. 2020-055992, the oxime-based photopolymerization initiator described in Japanese Patent Application Publication No. 2013-190459, etc., these contents are incorporated into this specification.

[0265] Examples of commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins BV), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Examples of commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (all manufactured by IGM Resins BV), and Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (all manufactured by BASF). Examples of commercially available products of the acylphosphine compound include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF), and the like.

[0266] Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, compounds described in JCS Perkin II (1979, pp. 1653-1660), compounds described in JCS Perkin II (1979, pp. 156-162), and compounds described in Journal of Photopolymer Science and Technology. Technology (1995, pp. 202-232), compounds described in Japanese Patent Application Laid-Open No. 2000-066385, compounds described in Japanese Translation of PCT International Publication No. 2004-534797, compounds described in Japanese Patent Application Laid-Open No. 2017-019766, compounds described in Japanese Patent No. 6065596, compounds described in International Publication No. 2015 / 152153, compounds described in International Publication No. 2017 / 051680, compounds described in Japanese Patent Application Laid-Open No. 2017-198865, compounds described in paragraphs 0025 to 0038 of International Publication No. 2017 / 164127, and compounds described in International Publication No. 2013 / 167515. Specific examples of oxime compounds include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetoxyiminopentane-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutane-2-one and 2-ethoxycarbonyloxyimino-1-phenylpropane-1-one. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Tronly New Electronic Materials Co., Ltd.), and Adeka Optomer N-1919 (manufactured by Adeka Corporation, a photopolymerization initiator 2 described in Japanese Patent Application Laid-Open No. 2012-014052). Furthermore, as the oxime compound, it is also preferred to use a non-coloring compound or a compound that is highly transparent and resistant to discoloration. Commercially available products include Adeka ARKLS NCI-730, NCI-831, and NCI-930 (all manufactured by Adeka Corporation).

[0267] As the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of the oxime compound having a fluorene ring include compounds described in Japanese Patent Application Publication No. 2014-137466, compounds described in Japanese Patent No. 6636081, and compounds described in Korean Patent Application Publication No. 10-2016-0109444.

[0268] As the photopolymerization initiator, an oxime compound having a carbazole ring and a naphthalene ring as the skeleton of at least one benzene ring can also be used. Specific examples of such oxime compounds include the compounds described in International Publication No. 2013 / 083505.

[0269] As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include the compounds described in JP-A-2010-262028, compounds 24, 36 to 40 described in JP-A-2014-500852, and compound (C-3) described in JP-A-2013-164471.

[0270] As the photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is preferably also a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249, paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in paragraphs 0007 to 0025 of Japanese Patent Application No. 4223071, and ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

[0271] As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015 / 036910.

[0272] As a photopolymerization initiator, an oxime compound having a substituent having a hydroxyl group bonded to a carbazole skeleton can also be used. As such a photopolymerization initiator, compounds described in International Publication No. 2019 / 088055 can be cited.

[0273] Specific examples of the oxime compound that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0274] [Chemical Formula 16]

[0275]

[0276] [Chemical Formula 17]

[0277]

[0278] The oxime compound preferably has a maximum absorption wavelength in the range of 350 to 500 nm, more preferably a compound with a maximum absorption wavelength in the range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the molar absorptivity of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300,000, further preferably 2000 to 300,000, and particularly preferably 5000 to 200,000. The molar absorptivity of the compound can be measured using a known method. For example, it is preferably measured using a spectrophotometer (Var ian Cary-5 spectrophotometer) using an ethyl acetate solvent at a concentration of 0.01 g / L.

[0279] As the photopolymerization initiator, a difunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more free radicals are generated from one molecule of the photoradical polymerization initiator, thereby achieving good sensitivity. Furthermore, when a compound with an asymmetric structure is used, crystallinity decreases and solubility in solvents etc. increases, making precipitation difficult over time, thereby improving the temporal stability of the composition. Specific examples of bifunctional or trifunctional or higher photoradical polymerization initiators include dimers of oxime compounds described in JP-A-2010-527339, JP-A-2011-524436, International Publication No. 2015 / 004565, paragraphs 0407 to 0412 of JP-A-2016-532675, and paragraphs 0039 to 0055 of International Publication No. 2017 / 033680, and compounds described in JP-A-2013-522445 ( E) and compound (G), Cmpd1 to 7 described in International Publication No. 2016 / 034963, the oxime ester photoinitiator described in paragraph 0007 of Japanese Unexamined Patent Application Publication No. 2017-523465, the photoinitiator described in paragraphs 0020 to 0033 of Japanese Unexamined Patent Application Publication No. 2017-167399, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of Japanese Unexamined Patent Application Publication No. 2017-151342, and the oxime ester photoinitiator described in Japanese Patent No. 6469669.

[0280] The content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, and even more preferably 1 to 30% by mass of the total solids content of the composition. The composition may contain only one type of photopolymerization initiator or two or more types. When containing two or more types, the total amount of these initiators is preferably within the above range.

[0281] <<Curing Agent>>

[0282] When the composition of the present invention includes a compound with a cyclic ether group, it is preferably further included a curing agent. As a curing agent, for example, an amine compound, an acid anhydride compound, an amide compound, a phenolic compound, a polycarboxylic acid, a thiol compound, etc. can be mentioned. As a specific example of a curing agent, succinic acid, trimellitic acid, pyromellitic acid, N, N-dimethyl-4-aminopyridine, pentaerythritol tetrakis (3-mercaptopropionic acid) etc. can be mentioned. The curing agent can also use the compounds described in paragraphs 0072 to 0078 of Japanese Patent Application Laid-Open No. 2016-075720 and the compounds described in Japanese Patent Application Laid-Open No. 2017-036379.

[0283] The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, relative to 100 parts by mass of the compound having a cyclic ether group.

[0284] <<Color colorants>>

[0285] The composition of the present invention may contain a colorant. In the present invention, a colorant refers to a colorant other than a white colorant and a black colorant. The colorant preferably has a maximum absorption wavelength within a wavelength range of 400 nm to less than 650 nm.

[0286] Examples of color colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. Color colorants may be pigments or dyes. Pigments and dyes may be used simultaneously. Furthermore, the pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which a portion of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore. By replacing an inorganic pigment or an organic-inorganic pigment with an organic chromophore, hue design can be facilitated.

[0287] The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and further preferably 100 nm or less. As long as the average primary particle size of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. In addition, in the present invention, the primary particle size of the pigment can be obtained by observing the primary particles of the pigment with a transmission electron microscope and based on the image photograph obtained. Specifically, the projected area of ​​the primary particles of the pigment is obtained, and the equivalent circle diameter corresponding thereto is calculated as the primary particle size of the pigment. In addition, the average primary particle size in the present invention is set to the arithmetic mean of the primary particle sizes of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

[0288] The coloring agent preferably contains a pigment. The content of the pigment in the coloring agent is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of the pigment include the following.

[0289] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128 、129、137、138、139、147、148、150、151、152、153、154、155、156、161、162、164、166、167、168、169、170、171、172、173、174、175、176、177、179、180、181、182、185、187、188、193、194、199、213、214、215、228、231、232(methine series), 233(quinoline series), 234(aminoketone series), 235(aminoketone series), 236(aminoketone series), etc. (the above are yellow pigments),

[0290] CI Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (the above are orange pigments),

[0291] CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (anvil series, Organo Ultramarine (Organic Ultramarine), Luish Red (Blue Red)), 295 (monoazo series), 296 (diazo series), 297 (amino ketone), etc. (the above are red pigments),

[0292] CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine series), 65 (phthalocyanine series), 66 (phthalocyanine series), etc. (the above are green pigments),

[0293] CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (anvil series), etc. (the above are purple pigments),

[0294] CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo series), 88 (methine series), etc. (the above are blue pigments).

[0295] Furthermore, as green pigments, zinc phthalocyanine halides having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can also be used. Specific examples include compounds described in International Publication No. 2015 / 118720. Furthermore, as green pigments, compounds described in the specification of Chinese Patent Application No. 106909027, phthalocyanine compounds having a phosphate ester as a ligand described in International Publication No. 2012 / 102395, phthalocyanine compounds described in Japanese Patent Application Publication No. 2019-008014, phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, compounds described in Japanese Patent Application Publication No. 2019-038958, and core-shell pigments described in Japanese Patent Application Publication No. 2020-076995 can also be used.

[0296] Furthermore, as a blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A-2012-247591 and paragraph 0047 of JP-A-2011-157478.

[0297] Furthermore, as yellow pigments, compounds described in Japanese Patent Application Laid-Open No. 2017-201003, compounds described in Japanese Patent Application Laid-Open No. 2017-197719, compounds described in paragraphs 0011 to 0062 and 0137 to 0276 of Japanese Patent Application Laid-Open No. 2017-171912, compounds described in paragraphs 0010 to 0062 and 0138 to 0295 of Japanese Patent Application Laid-Open No. 2017-171913, compounds described in paragraphs 0011 to 0062 and 0139 to 0190 of Japanese Patent Application Laid-Open No. 2017-171914, compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of Japanese Patent Application Laid-Open No. 2017-171915, The compounds described in paragraphs 0011 to 0034 of Japanese Patent Application Laid-Open No. 2013-054339, the quinophthalone compounds described in paragraphs 0013 to 0058 of Japanese Patent Application Laid-Open No. 2014-026228, the isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, the quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-203798, the quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-062578, the quinophthalone compounds described in Japanese Patent No. 6432076, the quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-155881, and the quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-111757. Quinophthalone compounds, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-040835, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2017-197640, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2016-145282, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2014-085565, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2014-021139, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-209614, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-209435, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-181015, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-06 Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-032486, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2012-226110, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-074987, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-081565, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-074986, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-074985, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-050420, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-031281,Quinophthalone compounds described in Japanese Patent Publication No. 48-032765, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2019-008014, quinophthalone compounds described in Japanese Patent No. 6607427, compounds described in Korean Patent Publication No. 10-2014-0034963, compounds described in Japanese Patent Application Laid-Open No. 2017-095706, compounds described in Taiwan Patent Application Publication No. 201920495, compounds described in Japanese Patent No. 6607427, Japanese Patent No. Compounds described in Japanese Patent Application Publication No. 2020-033525, compounds described in Japanese Patent Application Publication No. 2020-033524, compounds described in Japanese Patent Application Publication No. 2020-033523, compounds described in Japanese Patent Application Publication No. 2020-033522, compounds described in Japanese Patent Application Publication No. 2020-033521, compounds described in International Publication No. 2020 / 045200, compounds described in International Publication No. 2020 / 045199, and compounds described in International Publication No. 2020 / 045197. In addition, from the viewpoint of improving color value, compounds obtained by polymerizing these compounds can also be preferably used.

[0298] As red pigments, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in Japanese Patent Application Laid-Open No. 2017-201384, diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838, diketopyrrolopyrrole compounds described in International Publication No. 2012 / 102399, diketopyrrolopyrrole compounds described in International Publication No. 2012 / 117965, naphthol azo compounds described in Japanese Patent Application Laid-Open No. 2012-229344, and the like can also be used. Compounds, red pigments described in Japanese Patent No. 6516119, red pigments described in Japanese Patent No. 6525101, brominated diketopyrrolopyrrole compounds described in paragraph 0229 of Japanese Patent Application Laid-Open No. 2020-090632, anthraquinone compounds described in Korean Patent Application Laid-Open No. 10-2019-0140741, anthraquinone compounds described in Korean Patent Application Laid-Open No. 10-2019-0140744, and perylene compounds described in Japanese Patent Application Laid-Open No. 2020-079396. Furthermore, as red pigments, compounds having a structure in which an aromatic ring group having a group bonded to an oxygen atom, a sulfur atom, or a nitrogen atom is introduced into the aromatic ring and bonded to a diketopyrrolopyrrole skeleton can also be used.

[0299] Regarding the diffraction angles preferably possessed by various pigments, reference can be made to the descriptions of Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-Open No. 2020-026503, which are incorporated herein by reference. Furthermore, as pyrrolopyrrole-based pigments, it is also preferred to use a pyrrolopyrrole pigment having a crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern of 100 nm in the 8 planes of the lattice plane (±1±1±1). The following pigments. In addition, the physical properties of the pyrrolopyrrole-based pigment are preferably set as described in paragraphs 0028 to 0073 of JP-A-2020-097744.

[0300] In the present invention, color coloring agent can also use dye.As dye, there is no particular restriction, known dye can be used.For example, pyrazole azo dye, anilino azo dye, triarylmethane dye, anthraquinone dye, anthrapyridone dye, benzylidene dye, oxonol dye, pyrazolotriazole azo dye, pyridone azo dye, cyanine dye, phenothiazine dye, pyrrolopyrazole azo methine dye, anvil dye, phthalocyanine dye, benzopyran dye, indigo dye, pyrromethene dye etc. can be enumerated.And dye also can preferably use the azo compound of recording in Japanese Unexamined Patent Publication No. 2012-158649, the azo compound of recording in Japanese Unexamined Patent Publication No. 2011-184493, the azo compound of recording in Japanese Unexamined Patent Publication No. 2011-145540.

[0301] When the composition of the present invention contains a colorant, the content of the colorant is preferably 1 to 50% by mass of the total solid content of the composition of the present invention. When the composition of the present invention contains two or more colorants, the total amount of these colorants is preferably within the above range.

[0302] <<Colorants that transmit infrared rays but block visible light>>

[0303] The composition of the present invention may also contain a colorant that transmits infrared rays and blocks visible light (hereinafter also referred to as a visible light blocking colorant). A composition containing a visible light blocking colorant can be preferably used as a composition for forming an infrared transmitting filter.

[0304] The visible light-blocking colorant preferably absorbs light in the violet to red wavelength range. Furthermore, the visible light-blocking colorant preferably blocks light in the 450-650 nm wavelength range. Furthermore, the visible light-blocking colorant preferably transmits light in the 900-1500 nm wavelength range. The visible light-blocking colorant preferably satisfies at least one of the following requirements (A) and (B).

[0305] (A): Contains two or more coloring agents, and the combination of the two or more coloring agents forms black.

[0306] (B): Contains an organic black colorant.

[0307] As color colorants, the colorants mentioned above can be mentioned. As organic black colorants, for example, bisbenzofuranone compounds, azomethine compounds, perylene compounds, azo compounds, etc. can be mentioned, preferably bisbenzofuranone compounds and perylene compounds. As bisbenzofuranone compounds, compounds described in Japanese Unexamined Patent Publication No. 2010-534726, Japanese Unexamined Patent Publication No. 2012-515233, Japanese Unexamined Patent Publication No. 2012-515234, etc. can be mentioned, for example, they can be obtained as "Irgaphor Rlack" manufactured by BASF. As perylene compounds, compounds described in paragraphs 0016 to 0020 of Japanese Unexamined Patent Publication No. 2017-226821, CI Pigment Black 31, 32, etc. can be mentioned. Examples of the azomethine compound include compounds described in JP-A-01-170601 and JP-A-02-034664. For example, many of the compounds are available as "CHROMO FINE BLACK A1103" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd.

[0308] When two or more coloring agents are combined to form black, for example, the following embodiments (1) to (8) can be mentioned.

[0309] (1) A method containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant.

[0310] (2) A method containing a yellow colorant, a blue colorant, and a red colorant.

[0311] (3) A method containing a yellow colorant, a purple colorant, and a red colorant.

[0312] (4) A method containing a yellow colorant and a purple colorant.

[0313] (5) A method containing a green colorant, a blue colorant, a purple colorant, and a red colorant.

[0314] (6) A form containing a purple colorant and an orange colorant.

[0315] (7) A method containing a green colorant, a purple colorant, and a red colorant.

[0316] (8) A method containing a green colorant and a red colorant.

[0317] When the composition of the present invention contains a colorant that blocks visible light, the content of the colorant that blocks visible light is preferably 1 to 50% by mass of the total solids content of the composition. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, and particularly preferably 30% by mass or more.

[0318] <<Surfactants>>

[0319] The composition of the present invention preferably contains a surfactant. Examples of surfactants include fluorochemical surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants. Examples of surfactants include those described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779, which are incorporated herein by reference.

[0320] As fluorochemical surfactants, surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Publication No. 2014-041318 (paragraphs 0060 to 0064 of the corresponding International Publication No. 2014 / 017669), surfactants described in paragraphs 0117 to 0132 of Japanese Patent Application Publication No. 2011-132503, and surfactants described in Japanese Patent Application Publication No. 2020-008634 are mentioned, and the contents are incorporated into this specification. As commercially available fluorochemical surfactants, for example, MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F- 477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F- 563, F-565, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41, R-41-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all manufactured by DIC Corporation), FLUORAD FC430, FC431, FC171 (all manufactured by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all manufactured by AGC Inc.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (all manufactured by OMNOVA Solutions Inc.), Futurgent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX-218 (all manufactured by NEOS Company Limited), etc.

[0321] Furthermore, as a fluorine-based surfactant, an acrylic compound can also be preferably used. The acrylic compound has a molecular structure containing a functional group containing a fluorine atom, and when heated, the portion of the functional group containing a fluorine atom is cut off and the fluorine atom is volatilized. Examples of such fluorine-based surfactants include the MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Industry News (February 23, 2016)), for example, MEGAFACE DS-21.

[0322] Furthermore, as a fluorine-based surfactant, a polymer of a fluorine-containing vinyl ether compound having a fluorinated alkyl or fluorinated alkylene ether group and a hydrophilic vinyl ether compound is also preferably used. Such fluorine-based surfactants include the fluorine-based surfactants described in Japanese Patent Application Laid-Open No. 2016-216602, the contents of which are incorporated herein.

[0323] As a fluorine-based surfactant, a block polymer can also be used. As a fluorine-based surfactant, a fluorine-containing polymer compound can also be preferably used, which contains: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; and a repeating unit derived from a (meth)acrylate compound having two or more (preferably five or more) alkyleneoxy groups (preferably ethyleneoxy or propyleneoxy). In addition, the fluorine-containing surfactants described in paragraphs 0016 to 0037 of Japanese Patent Application Laid-Open No. 2010-032698 and the following compounds are also exemplified as fluorine-based surfactants used in the present invention.

[0324] [Chemical Formula 18]

[0325]

[0326] The weight average molecular weight of the compound is preferably 3000 to 50000, for example, 14000. In the compound, % indicating the ratio of the repeating unit is mol %.

[0327] Furthermore, as a fluorine-based surfactant, a fluorine-containing polymer having a group containing an ethylenically unsaturated bond in a side chain can also be used. Specific examples include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, and MEGAFACE RS-101, RS-102, RS-718K, and RS-72-K manufactured by DIC Corporation. Furthermore, as a fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can also be used.

[0328] Furthermore, it is also preferred from the viewpoint of environmental regulation to use the surfactant described in International Publication No. 2020 / 084854 as an alternative to the surfactant having a perfluoroalkyl group with 6 or more carbon atoms.

[0329] Furthermore, it is also preferable to use a fluorine-containing imide salt compound represented by formula (fi-1) as a surfactant.

[0330] [Chemical Formula 19]

[0331]

[0332] In formula (fi-1), m represents 1 or 2, n represents an integer of 1 to 4, α represents 1 or 2, and X α+ Represents α-valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, quaternary ammonium ion or NH4 + .

[0333] Examples of the nonionic surfactant include glycerol, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid esters, Pluronic L10, L31, L61, L62, 10R5, 17R2, and 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, and 150R1 (manufactured by BASF), SOLSPERSE 20000 (manufactured by Japan Lubrizol Corporation), NCW-101, NCW-1001, and NCW-1002 (manufactured by FUJIFILM Wako Pure Chemical Corporation), PIONTN D-6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.), etc.

[0334] Examples of the cationic surfactant include tetraalkylammonium salts, alkylamine salts, benzylalkylammonium salts, alkylpyridinium salts, and imidazolium salts. Specific examples include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, dodecyldimethylbenzylammonium chloride, cetylpyridinium chloride, and stearamidomethylpyridinium chloride.

[0335] Examples of the anionic surfactant include dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium lauryl sulfate, sodium alkyldiphenyl ether disulfonate, sodium alkylnaphthalenesulfonate, sodium dialkylsulfosuccinate, sodium stearate, potassium oleate, sodium dioctylsulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkylsulfosuccinate, sodium oleate, and sodium salt of tert-octylphenoxyethoxypolyethoxyethyl sulfate.

[0336] Examples of the silicone surfactant include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, and Toray Silicone SH8400 (all manufactured by Dow Corning Toray Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (all manufactured by Momentive Performance Materials Inc.), KP-341, KF-6001, and KF-6002 (all manufactured by Shin-Etsu Chemical Co., Ltd.), and the like. Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie GmbH), FZ-2122 (manufactured by Dow Corning Toray Co., Ltd.), etc.

[0337] Furthermore, as the silicone surfactant, compounds having the following structures can also be used.

[0338] [Chemical Formula 20]

[0339]

[0340] The content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and even more preferably 0.001 to 0.2% by mass of the total solid content of the composition. The composition may contain only one surfactant or two or more. When containing two or more surfactants, the total amount of these surfactants is preferably within the above range.

[0341] <<Polymerization Inhibitor>>

[0342] The composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol), and N-nitrosophenylhydroxylamine salts (ammonium salts, first cerium salts, etc.), preferably p-methoxyphenol. The content of the polymerization inhibitor is preferably 0.0001 to 5% by mass of the total solids content of the composition. The composition may contain only one polymerization inhibitor or two or more. When two or more polymerization inhibitors are included, the total amount of these inhibitors is preferably within the above range.

[0343] <<Silane Coupling Agent>>

[0344] The composition of the present invention may contain a silane coupling agent. In this specification, a silane coupling agent refers to a silane compound having a hydrolyzable group and functional groups other than the hydrolyzable group. Furthermore, a hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can produce a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of hydrolyzable groups include halogen atoms, alkoxy groups, acyloxy groups, and the like, preferably alkoxy groups. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Furthermore, examples of functional groups other than the hydrolyzable group include vinyl, styryl, (meth)acryloyl, thiol, epoxy, oxetanyl, amino, urea, thioether, isocyanate, phenyl, and the like, preferably (meth)acryloyl and epoxy groups. Examples of silane coupling agents include the compounds described in paragraphs 0018 to 0036 of JP-A-2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP-A-2009-242604, the contents of which are incorporated herein. The content of the silane coupling agent is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass, based on the total solids content of the composition. The composition may contain only one silane coupling agent or two or more. When containing two or more silane coupling agents, the total amount of these agents is preferably within the above range.

[0345] <<Ultraviolet absorber>>

[0346] The composition of the present invention can contain an ultraviolet absorber. As ultraviolet absorbers, conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, merocyanine pigments, etc. can be mentioned. As specific examples of such compounds, the compounds described in paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, paragraphs 0317 to 0334 of Japanese Patent Application Laid-Open No. 2013-068814, and paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946 can be mentioned, and these contents are incorporated into this specification. As commercially available products of ultraviolet absorbers, Tinuvin series and Uvinul series manufactured by BASF can be mentioned. Furthermore, as benzotriazole compounds, MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016) can be cited. Furthermore, as ultraviolet absorbers, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 and paragraphs 0059 to 0076 of International Publication No. 2016 / 181987 can also be used. The content of the ultraviolet absorber is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass, in the total solid content of the composition. The composition may contain only one ultraviolet absorber or two or more. When two or more are included, the total amount thereof is preferably within the above range.

[0347] <<Antioxidants>>

[0348] The composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenolic compounds, phosphite compounds, and thioether compounds. As the phenolic compound, any phenolic compound known as a phenolic antioxidant may be used. Preferred phenolic compounds include hindered phenolic compounds. Compounds having a substituent at the site adjacent to the phenolic hydroxyl group (ortho position) are preferred. As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. Furthermore, the antioxidant is preferably a compound having a phenolic group and a phosphite group in the same molecule. Furthermore, as the antioxidant, a phosphorus-based antioxidant may be preferably used. Examples of the phosphorus-based antioxidant include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphep-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetrakis-tert-butyldibenzo[d,f][1,3,2]dioxaphosphep-2-yl)oxy]ethyl]amine, and bis(2,4-di-tert-butyl-6-methylphenyl)ethyl phosphite. As commercially available products of antioxidants, for example, ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, ADEKA STAB AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330 (all manufactured by ADEKA CORPORATION) and the like can be mentioned. In addition, the antioxidant can also use the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in International Publication No. 2017 / 006600, and the compounds described in International Publication No. 2017 / 164024. The content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass, in the total solid content of the composition. The composition may contain only one antioxidant or two or more. When containing two or more antioxidants, the total amount thereof is preferably within the above range.

[0349] <<Other ingredients>>

[0350] The composition of the present invention can contain sensitizer, curing accelerator, filler, thermosetting accelerator, plasticizer and other auxiliary agents (for example, conductive particles, defoamer, flame retardant, leveling agent, peeling accelerator, fragrance, surface tension modifier, chain transfer agent, etc.) as needed. By suitably containing these components, it is possible to adjust properties such as film physical properties. About these components, for example, it is possible to refer to the records of paragraphs 0183 and 0237 of Japanese Unexamined Patent Application Publication No. 2013 / 0034812, paragraphs 0101 to 0104, 0107 to 0109 of Japanese Unexamined Patent Application Publication No. 2008-250074, etc., and these contents are incorporated into this specification. In addition, the composition of the present invention can contain potential antioxidants as needed. As potential antioxidants, the following compounds can be mentioned: the site that functions as an antioxidant is protected by a protecting group and the protecting group is removed by heating at 100 to 250 ° C or heating at 80 to 200 ° C in the presence of an acid / base catalyst and functions as an antioxidant. As potential antioxidants, the compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and Japanese Patent Application Publication No. 2017-008219 can be mentioned. As commercially available products of potential antioxidants, ADEKA ARKLS GPA-5001 (made by ADEKA CORPORATION) and the like can be mentioned.

[0351] <Storage Container>

[0352] The container for storing the composition of the present invention is not particularly limited, and known containers can be used. Furthermore, in order to suppress the incorporation of impurities into the raw materials or the composition, a multilayer bottle having an inner wall composed of six layers of six types of resin, or a bottle having a seven-layer structure in which six types of resin are used, is also preferably used as the container. Examples of such containers include the containers described in Japanese Patent Application Laid-Open No. 2015-123351. Furthermore, the inner wall of the container is preferably made of glass or stainless steel, etc., in order to prevent metal from eluting from the inner wall of the container, improve the temporal stability of the composition, or suppress the deterioration of the components.

[0353] <Method for Preparing Composition>

[0354] The composition of the present invention can be prepared by mixing the aforementioned components. When preparing the composition, all components may be dissolved or dispersed simultaneously in a solvent to prepare the composition. Alternatively, two or more solutions or dispersions containing each component may be prepared in advance as needed and mixed at the time of use (during application).

[0355] When preparing the composition, a process for dispersing the pigment may be included. In the pigment dispersion process, as the mechanical force for dispersing the pigment, compression, extrusion, impact, shearing, cavitation, etc. may be enumerated. As the specific examples of these processes, bead milling, sand milling, roller milling, ball milling, paint stirring, micro jet, high-speed impeller, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, etc. may be enumerated. In addition, the pigment is preferably processed under conditions such as using microbeads with a small diameter to increase the filling rate of the microbeads and improve the pulverization efficiency. In addition, after the pulverization process, it is preferably removed by filtration, centrifugation, etc., to remove coarse particles. Furthermore, regarding the pigment dispersion process and disperser, the processes and dispersers described in "Complete Collection of Dispersion Technology, Published by JOHOKIKO CO., LTD., July 15, 2005" or "Comprehensive Data Collection of Dispersion Technology and Practical Industrial Applications Focusing on Suspensions (Solid / Liquid Dispersion Systems), Published by the Business Development Center Publishing Department, October 10, 1978," and paragraph 0022 of Japanese Patent Application Publication No. 2015-157893 can be preferably used. Furthermore, in the pigment dispersion process, the pigment can be micronized by a salt milling process. For example, the raw materials, equipment, and processing conditions used in the salt milling process can be referred to the records in Japanese Patent Application Publication No. 2015-194521 and Japanese Patent Application Publication No. 2012-046629.

[0356] When preparing the composition, for the purpose of removing impurities, reducing defects, etc., it is preferred to filter the composition with a filter. As a filter, as long as it is a filter for filtering purposes etc., it is possible to use it without particular limitation. For example, filters made of raw materials such as polyolefin resins (including high-density, ultra-high molecular weight polyolefin resins) such as polyamide resins, polyethylene, polypropylene (PP) and fluororesins such as polytetrafluoroethylene (PTFE), nylon (such as nylon-6, nylon-6,6) can be enumerated. Among these raw materials, polypropylene (including high-density polypropylene) and nylon are preferably used.

[0357] The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. Regarding the pore size value of the filter, the nominal value of the filter manufacturer can be referred to. Regarding the filter, various filters provided by Nihon Pall Ltd. (DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., NihonEntegris KK (Formerly Nippon Mykrolis Corporation) and KITZ MICROFILTERCorporation can be used.

[0358] Furthermore, fibrous filter materials are also preferably used as filters. Examples of fibrous filter materials include polypropylene fibers, nylon fibers, and glass fibers. Commercially available products include the SBP series (e.g., SBP008), TPR series (e.g., TPR002, TPR005), and SHPX series (e.g., SHPX003) manufactured by ROKI TECHNO CO., LTD.

[0359] When using filters, different filters (e.g., a first filter and a second filter) may be combined. In this case, filtration using each filter may be performed only once or twice or more. Furthermore, filters with different pore sizes may be combined within the above-mentioned range. Furthermore, filtration using the first filter may be performed only on the dispersion, and filtration using the second filter may be performed after mixing other components.

[0360] <Film>

[0361] Next, the film of the present invention is described. The film of the present invention is a film obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and examples include infrared cutoff filters, infrared transmission filters, and the like. As infrared cutoff filters, for example, infrared cutoff filters on the light-receiving side of a solid-state imaging element (for example, infrared cutoff filters used for wafer-level lenses, etc.), infrared cutoff filters on the back side (the side opposite to the light-receiving side) of a solid-state imaging element, infrared cutoff filters for ambient light sensors (for example, an illumination sensor that senses the illuminance and hue of the environment where an information terminal device is placed and adjusts the hue of the display, a color correction sensor that adjusts the hue), and the like can be mentioned. In particular, it can be preferably used as an infrared cutoff filter on the light-receiving side of a solid-state imaging element. As infrared transmission filters, filters that block visible light and can selectively transmit infrared rays above a specific wavelength can be mentioned.

[0362] The film of the present invention may have a pattern or may be a film without a pattern (flat film). Furthermore, the film of the present invention may be laminated on a support for use or may be peeled off from the support for use. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

[0363] A charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. may be formed on a semiconductor substrate serving as a support. Furthermore, a black matrix for isolating each pixel may be formed on the semiconductor substrate. Furthermore, a primer layer may be provided on the semiconductor substrate as needed to improve adhesion to an upper layer, prevent diffusion of substances, or flatten the substrate surface.

[0364] As a transparent substrate that can be used as a support, as long as it is made of a material that can at least transmit visible light, there is no particular limitation. For example, substrates made of materials such as glass and resin can be mentioned. As resins, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene / vinyl acetate copolymers, acrylic resins such as norbornene resins, polyacrylates, and polymethyl methacrylate, polyurethane resins, vinyl chloride resins, fluororesins, polycarbonate resins, polyvinyl butyral resins, and polyvinyl alcohol resins can be mentioned. As glass, soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass can be mentioned. As copper-containing glass, copper-containing phosphate glass and copper-containing fluorophosphate glass can be mentioned. Commercially available copper-containing glass can also be used. Commercially available copper-containing glass includes NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.).

[0365] The thickness of the film of the present invention can be adjusted appropriately depending on the intended purpose. The film thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

[0366] When the film of the present invention is used as an infrared cut filter, it preferably has a maximum absorption wavelength within the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). Furthermore, the average transmittance for light with a wavelength of 420 to 550 nm is preferably 50% or greater, more preferably 70% or greater, even more preferably 80% or greater, and particularly preferably 85% or greater. Furthermore, the transmittance over the entire wavelength range of 420 to 550 nm is preferably 50% or greater, more preferably 70% or greater, even more preferably 80% or greater. Furthermore, the transmittance at at least one point within the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 15% or less, more preferably 10% or less, and even more preferably 5% or less. Furthermore, the film of the present invention preferably has an average absorbance within a wavelength range of 420 to 550 nm of less than 0.030, more preferably less than 0.025, when the absorbance at the maximum absorption wavelength is defined as 1.

[0367] When the film of the present invention is used as an infrared transmission filter, the film of the present invention preferably has any one of the following spectral characteristics (i1) to (i3), for example.

[0368] (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) within the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics blocks light within the wavelength range of 400 to 850 nm and transmits light with a wavelength greater than 950 nm.

[0369] (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) within the wavelength range of 400 to 950 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics blocks light within the wavelength range of 400 to 950 nm and transmits light with a wavelength greater than 1050 nm.

[0370] (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) within the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics blocks light within the wavelength range of 400 to 1050 nm while transmitting light with a wavelength greater than 1150 nm.

[0371] The film of the present invention can also be used in combination with a color filter containing a color colorant. The color filter can be manufactured using a coloring composition containing a color colorant. When the film of the present invention is used as an infrared cutoff filter and the film of the present invention is used in combination with a color filter, the color filter is preferably configured on the optical path of the film of the present invention. For example, it is preferred that the film of the present invention is stacked with a color filter and used as a laminate. In the laminate, the film of the present invention and the color filter may be adjacent or non-adjacent in the thickness direction. When the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support body differently from the support body on which the color filter is formed, or other components constituting a solid-state imaging element (for example, microlenses, a flattening layer, etc.) may be sandwiched between the film of the present invention and the color filter.

[0372] The film of the present invention can be used in various devices such as solid-state imaging devices such as CCD (charge coupled device) and CMOS (complementary metal oxide semiconductor), infrared sensors, and image display devices.

[0373] <Method for producing film>

[0374] The film of the present invention can be produced through a step of applying the composition of the present invention.

[0375] As a support, the above-mentioned support can be mentioned. As a coating method of the composition, a known method can be used. For example, a drop method (droplet coating) can be mentioned; a slit coating method; a spray method; a roller coating method; a spin coating method (spin coating); a cast coating method; a slit spin coating method; a pre-wetting method (for example, a method described in Japanese Patent Application Laid-Open No. 2009-145395); various printing methods such as ejection printing such as inkjet (for example, on-demand method, piezoelectric method, thermal method), nozzle jetting, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing method; a transfer method using a mold, etc.; a nanoimprint method, etc. There is no particular limitation on the applicable method in inkjet printing. For example, the method described in "Inkjet that can be promoted and used - Infinite possibilities appearing in patents -, published in February 2005, Sumitbe Techon Research Co., Ltd." (especially pages 115 to 133) or the methods described in Japanese Patent Publication No. 2003-262716, Japanese Patent Publication No. 2003-185831, Japanese Patent Publication No. 2003-261827, Japanese Patent Publication No. 2012-126830, Japanese Patent Publication No. 2006-169325, etc. can be cited.

[0376] The composition layer formed by the coating composition can be dried (prebaked). When prebaking, the prebaking temperature is preferably 150°C or less, more preferably 120°C or less, and further preferably 110°C or less. The lower limit can be, for example, 50°C or more, or 80°C or more. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0377] The film manufacturing method may also include a patterning step. Examples of patterning methods include those using photolithography and those using dry etching, with photolithography being preferred. Furthermore, when the film of the present invention is used as a flat film, the patterning step may not be performed. The patterning step will be described in detail below.

[0378] (When patterning using photolithography)

[0379] The pattern forming method using photolithography preferably includes a step of exposing the composition layer formed by applying the composition of the present invention in a patterned manner (exposure step) and a step of developing and removing the unexposed portion of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step is described below.

[0380] In the exposure step, the composition layer is exposed in a pattern. For example, a stepper or scanner is used to expose the composition layer through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0381] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Furthermore, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Furthermore, light sources with a long wavelength of 300 nm or more can also be used.

[0382] Furthermore, during exposure, light can be irradiated continuously or pulsed (pulse exposure). Pulse exposure refers to an exposure method in which light is irradiated and paused repeatedly in a short period of time (e.g., milliseconds or less).

[0383] For example, the irradiation dose (exposure dose) is preferably 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 The oxygen concentration during exposure can be appropriately selected. In addition to being performed in the atmosphere, exposure can also be performed in a low-oxygen environment with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen environment with an oxygen concentration exceeding 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume). Furthermore, the exposure illuminance can be appropriately set and can generally be selected from 1000 W / m 2 ~100000W / m 2 (For example, 5000W / m 2 、15000W / m 2 or 35000W / m 2 The oxygen concentration and exposure illuminance conditions can be appropriately combined, for example, the oxygen concentration can be set to 10% by volume and the illuminance can be set to 10000 W / m 2 , oxygen concentration is 35% by volume and illumination is 20000W / m 2 wait.

[0384] Next, the unexposed portions of the composition layer after exposure are removed by development to form a pattern. The unexposed portions of the composition layer can be removed by development using a developer. As a result, the unexposed portions of the composition layer during the exposure step are washed into the developer, leaving only the photocured portions on the support. For example, the temperature of the developer is preferably 20 to 30°C. The development time is preferably 20 to 180 seconds. Furthermore, to improve residue removability, the following process can be repeated multiple times: discarding the developer every 60 seconds and then supplying a new developer.

[0385] Developer can include organic solvents, alkali developers, etc., and alkali developers can be preferably used. As alkali developer, it is preferably an alkaline aqueous solution (alkaline developer) obtained by diluting an alkali agent with pure water. As alkali agents, for example, ammonia, ethylamine, diethylamine, dimethylethanolamine, diethylene glycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene and other organic alkaline compounds or inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, sodium metasilicate. From the perspective of environment and safety, the alkali agent is preferably a compound with a large molecular weight. The concentration of the alkali agent of the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. Furthermore, the developer may further contain a surfactant. As the surfactant, a nonionic surfactant is preferred. From the viewpoint of ease of transportation, storage, etc., the developer may be first prepared as a concentrated solution and diluted to the desired concentration when used. The dilution ratio is not particularly limited and can be set, for example, within the range of 1.5 to 100 times. Furthermore, it is also preferred to wash (rinse) with pure water after development. Furthermore, rinsing is preferably performed as follows: while rotating the support on which the developed composition layer is formed, a rinsing liquid is supplied to the developed composition layer. Furthermore, it is also preferred to perform the rinsing by moving the nozzle that sprays the rinsing liquid from the center of the support to the peripheral portion of the support. At this time, when moving the nozzle from the center of the support to the peripheral portion, the nozzle can be moved while gradually reducing the moving speed. By performing the rinsing in this way, the unevenness of the rinsed surface can be suppressed. Furthermore, the same effect can be achieved by gradually reducing the rotation speed of the support while moving the nozzle from the center of the support to the peripheral portion.

[0386] After development, it is preferred to perform additional exposure treatment and heating treatment (post-baking) after drying. Additional exposure treatment and post-baking are curing treatments after development for producing a completely cured film. For example, the heating temperature in the post-baking is preferably 100 to 240°C, more preferably 200 to 240°C. The developed film can be post-baked in a continuous or intermittent manner using a heating mechanism such as a hot plate or a convection constant temperature oven (hot air circulation dryer), a high-frequency heater, etc. in such a manner as to achieve the above conditions. In the case of performing additional exposure treatment, the light used for exposure is preferably light with a wavelength of 400nm or less. In addition, the additional exposure treatment can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0387] (When patterning is performed by dry etching)

[0388] When forming a pattern by dry etching, the following method can be used: a composition layer formed by coating the above-mentioned composition on a support is cured to form a cured layer, a patterned photoresist layer is formed on the cured layer, and then the cured layer is dry-etched using an etching gas using the patterned photoresist layer as a mask. When forming the photoresist layer, a pre-baking treatment is preferably performed. For details on forming a pattern by dry etching, reference can be made to paragraphs 0010 to 0067 of Japanese Patent Application Laid-Open No. 2013-064993, which is incorporated into this specification.

[0389] <Filter>

[0390] The optical filter of the present invention includes the film of the present invention. Examples of the types of optical filters include infrared cut filters and infrared transmission filters.

[0391] In addition to the film of the present invention, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorption layer, and the like. As the ultraviolet absorption layer, for example, the absorption layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015 / 099060 may be cited. As the dielectric multilayer film, the dielectric multilayer film described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318 may be cited. As the copper-containing layer, a glass substrate composed of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper-containing complex layer) may also be used. As the copper-containing glass substrate, copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like may be cited. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, and BG-61 (each manufactured by Schott AG), and CD5000 (manufactured by Hoya Corporation).

[0392] <Solid-state imaging device>

[0393] The solid-state imaging element of the present invention includes the film of the present invention. The structure of the solid-state imaging element is not particularly limited as long as it has the structure of the film of the present invention and functions as a solid-state imaging element. For example, the following structures can be mentioned.

[0394] The structure is as follows: a transmission electrode composed of a plurality of photodiodes and polysilicon, etc., which constitutes a light-receiving area of ​​a solid-state imaging element, is provided on a support body; a light-shielding film composed of tungsten, etc., which is opened only in the light-receiving portion of the photodiode, is provided on the photodiode and the transmission electrode; a device protection film composed of silicon nitride, etc., which is formed in a manner covering the entire light-shielding film and the light-receiving portion of the photodiode, is provided on the light-shielding film; and a film of the present invention is provided on the device protection film. In addition, a structure may be provided in which a focusing mechanism (for example, a microlens, etc., the same applies hereinafter) is provided on the device protection film and below the film of the present invention (close to the support body side); a structure may be provided in which a focusing mechanism is provided on the film of the present invention. Furthermore, the color filter may also have a structure in which, for example, a film forming each pixel is embedded in a space divided into a grid shape by partition walls. In this case, the refractive index of the partition walls is preferably lower than that of each pixel. Examples of imaging devices having such a configuration include those described in Japanese Patent Application Laid-Open Nos. 2012-227478 and 2014-179577.

[0395] <Image Display Device>

[0396] The image display device of the present invention includes the film of the present invention. As the image display device, a liquid crystal display device, an organic electroluminescent (organic EL) display device, etc. can be cited. The definition and details of the image display device are recorded in, for example, "Electronic Display Device (written by Akio Sasaki, Kogyo Chosakai Publishing Co., Ltd., published in 1990)", "Display Device (written by Junsho Ibuki, Sangyo Tosho Publishing Co., Ltd., published in 1989)", etc. In addition, regarding the liquid crystal display device, it is recorded in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Chosakai Publishing Co., Ltd., published in 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied, for example, it can be applied to liquid crystal display devices of various types described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device can have a white organic EL element. As the white organic EL element, a tandem structure is preferred. The tandem structure of organic EL elements is described in Japanese Patent Application Laid-Open No. 2003-045676, edited by Akiyoshi Mikami, "The Cutting Edge of Organic EL Technology Development: High Brightness, High Precision, Long Life, and Technology Collection," Technical Information Institute Co., Ltd., pp. 326-328, 2008. The spectrum of white light emitted by an organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), the green region (530-580 nm), and the yellow region (580-620 nm). In addition to these peaks, it is even more preferable to have a maximum emission peak in the red region (650-700 nm).

[0397] <Infrared sensor>

[0398] The infrared sensor of the present invention includes the film of the present invention. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. An embodiment of the infrared sensor of the present invention is described below with reference to the drawings.

[0399] Figure 1 In the figure, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on the imaging area of ​​the solid-state imaging element 110. Furthermore, a color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0400] The composition of the present invention can be used to form an infrared cutoff filter 111. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible region. It is not particularly limited, and a color filter for pixel formation known in the past can be used. For example, a color filter formed with red (R), green (G), and blue (B) pixels can be used. For example, reference can be made to the description of paragraphs 0214 to 0263 of Japanese Patent Publication No. 2014-043556, which is incorporated into this specification. The characteristics of the infrared transmission filter 114 can be selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0401] Figure 1 In the infrared sensor shown, an infrared cutoff filter (another infrared cutoff filter) different from the infrared cutoff filter 111 may be further disposed on the planarization layer 116. Examples of other infrared cutoff filters include filters having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are described above. Furthermore, a dual-bandpass filter may be used as the other infrared cutoff filter.

[0402] <Camera Module>

[0403] The camera module of the present invention includes a solid-state imaging element and the film of the present invention described above. The camera module preferably further includes a lens and a circuit for processing an image obtained from the solid-state imaging element. The solid-state imaging element used in the camera module may be the solid-state imaging element involved in the present invention described above, or a known solid-state imaging element. Furthermore, as the lens used in the camera module and the circuit for processing the image obtained from the above-mentioned solid-state imaging element, known elements can be used. As examples of camera modules, reference can be made to the camera modules described in Japanese Patent Application Publication No. 2016-006476 and Japanese Patent Application Publication No. 2014-197190, and these contents are incorporated into this specification.

[0404] <Compound>

[0405] The compound of the present invention is a compound represented by formula (1).

[0406] [Chemical Formula 21]

[0407]

[0408] In formula (1), R 1 ~R 4 Each independently represents a substituent,

[0409] R 5 represents an aliphatic hydrocarbon group,

[0410] R11 ~R 15 Each independently represents a hydrogen atom or a substituent,

[0411] Y 1 and Y 2 Each independently represents a hydrogen atom or a substituent,

[0412] Among them, R 11 ~R 14 At least one of them is a substituent, or R 11 ~R 15 Each of them is a hydrogen atom.

[0413] R in formula (1) 1 ~R 5 、R 11 ~R 15 、Y 1 and Y 2 The meanings of R in the formula (1) are respectively the same as those of the pigment (specific pigment) represented by the above formula (1). 1 ~R 5 、R 11 ~R 15 、Y 1 and Y 2 same.

[0414] The maximum absorption wavelength of the compound of the present invention is preferably at a wavelength of 650 nm or longer, more preferably in the wavelength range of 650 to 1500 nm, further preferably in the wavelength range of 660 to 1200 nm, and particularly preferably in the wavelength range of 660 to 1000 nm.

[0415] Furthermore, when the absorbance at the wavelength (λmax) where the absorbance shows a maximum value in the wavelength range of 400 nm to 1200 nm is set to 1, the average absorbance of the compound of the present invention in the wavelength range of 420 to 550 nm is preferably less than 0.010, more preferably less than 0.007.

[0416] The compound of the present invention can be preferably used as an infrared absorber. Furthermore, the compound of the present invention can also be used as a dispersing aid. Furthermore, the compound of the present invention can also be used as a fluorescent pigment.

[0417] <Infrared absorber>

[0418] The infrared absorber of the present invention contains a compound represented by formula (1). The infrared absorber may contain only one compound represented by formula (1), or may contain two or more compounds represented by formula (1). Furthermore, the infrared absorber of the present invention may contain a decomposition product of the compound represented by formula (1).

[0419] Example

[0420] The present invention is further described in detail below with reference to the following examples. The materials, amounts used, ratios, treatment contents, and treatment sequences shown in the following examples may be modified as appropriate without departing from the spirit of the present invention. Furthermore, in the structural formula, Me represents a methyl group, Et represents an ethyl group, iPr represents an isopropyl group, Bu represents a butyl group, Ph represents a phenyl group, and Ac represents an acetyl group.

[0421] <Synthesis of the Pigment (Specific Pigment) Represented by Formula (1)>

[0422] <<Synthesis Example of Pigment PPB-A-43>>

[0423] Pigment PPB-A-43 was synthesized according to the following scheme.

[0424] [Chemical Formula 22]

[0425]

[0426] (Synthesis of Intermediate 1)

[0427] Under a nitrogen atmosphere, 500 g of ethyl isobutyryl acetate, 3000 mL of acetone, 61.17 g of potassium iodide, 458.66 g of potassium carbonate, and 387.33 g of ethyl chloroacetate were added to a three-necked flask and stirred under reflux for 10 hours. The reaction solution was cooled to below 10°C and filtered. After rinsing with 1000 mL of acetone, the filtrate was concentrated using an evaporator to obtain 772.09 g of Intermediate 1.

[0428] (Synthesis of Intermediate 2)

[0429] Under nitrogen, 772.09 g of intermediate 1, 1827 g of ammonium acetate, and 1544 mL of acetic acid were added to a three-necked flask and stirred for 2 hours under heating and reflux. The reaction solution was cooled to 25°C, 6176 mL of distilled water was added, and then stirred for 30 minutes under ice-cold conditions below 5°C. The reaction solution was filtered and rinsed with 1081 mL of distilled water. The obtained crystals and 811 mL of hexane were added to a three-necked flask, stirred in air for 1 hour, filtered, and rinsed with 540 mL of hexane. The obtained crystals were air-dried at 50°C for 12 hours to obtain 284.2 g of intermediate 2 (yield 45.6%).

[0430] 1H-NMR (CDCl3): δ=1.20 (d, J=7.0Hz, 6H), 1.29 (t, J=7.1Hz, 3H), 3.30 (s, 2H), 3.91 (sep, J=7.0Hz, 1H), 4.19 (q, J=7.1Hz, 2H), 8.82 (s, 1H)

[0431] (Synthesis of Intermediate 3)

[0432] Under a nitrogen atmosphere, 165 g of Intermediate 2, 107.12 g of o-toluonitrile, and 759 mL of tert-amyl alcohol were added to a three-necked flask. Then, 241.19 g of sodium tert-butoxide was added while being washed with 66 mL of tert-amyl alcohol. The mixture was heated under reflux at an external temperature of 135°C for 3.5 hours with stirring. The reaction solution was cooled to 40°C, and 1518 mL of methanol, 1518 mL of distilled water, and 150.71 g of acetic acid were added in sequence below 40°C. The mixture was then stirred at 25°C for 20 minutes. The reaction solution was filtered, rinsed with 1320 mL of methanol, and the resulting crystals were air-dried at 50°C for 12 hours to obtain 66.83 g of Intermediate 3 (yield 29.8%).

[0433] 1 H-NMR (deuterated DMSO (dimethyl sulfoxide)): δ = 1.30 (d, J = 6.9 Hz, 6H), 2.44 (s, 3H), 2.90 (sep, J = 6.9 Hz, 1H), 7.26-7.42 (m, 3H), 7.53 (m, 1H), 10.49 (s, 2H)

[0434] (Synthesis of Intermediate 4)

[0435] Under a nitrogen atmosphere, 237.46 g of malononitrile, 201 mL of acetic acid, and 1977 mL of methanol were added to a three-necked flask. 450 g of o-aminothiophenol was then added dropwise at a temperature below 40°C while being washed with 150 mL of methanol. The reaction solution was stirred at 30°C for 2 hours, then at a temperature below 10°C for 30 minutes, filtered, and rinsed with 300 mL of cold methanol. The resulting crystals were air-dried at 40°C for 12 hours to obtain 510.55 g of Intermediate 4 (yield 81.5%).

[0436] 1 H-NMR (CDCl3): δ=4.24 (s, 2H), 7.44 (m, 1H), 7.53 (m, 1H), 7.89 (m, 1H), 8.04 (m, 1H)

[0437] (Synthesis of Intermediate 5)

[0438] Under a nitrogen atmosphere, 66.5 g of Intermediate 3, 103.63 g of Intermediate 4, and 1397 mL of toluene were added to a three-necked flask, and 67 mL of toluene was distilled off under reflux. The reaction solution was cooled to 95°C, and while maintaining the temperature between 90 and 95°C, 229.22 g of phosphorus oxychloride was added, followed by stirring under reflux for 2 hours. The reaction solution was cooled to 20°C, and while maintaining the temperature between 20 and 30°C, 2993 mL of ethyl acetate and 2993 mL of distilled water were added to separate the liquids. The organic layer was dried over magnesium sulfate, filtered to remove the magnesium sulfate, and the filtrate was concentrated using an evaporator. 998 mL of methanol was added to the resulting residue, and the mixture was stirred at 25°C for 30 minutes. The precipitated crystals were filtered and rinsed with 333 mL of methanol. The resulting crystals were air-dried at 50°C for 12 hours to obtain 25.13 g of Intermediate 5 (yield 17.5%).

[0439] 1 H-NMR (CDCl3): δ=1.57 (d, 6H), 2.49 (s, 3H), 4.25 (sep, J=6.8Hz, 1H), 7.28 -7.58(m, 8H), 7.74(m, 1H), 7.82-7.87(m, 3H), 12.78(m, 1H), 13.01(m, 1H)

[0440] (Synthesis of Pigment PPB-A-43)

[0441] Under nitrogen, 1.0 g of intermediate 5, 2.12 g of chloro-o-phenylenedioxyborane, and 10 mL of toluene were added to a three-necked flask, and 2.22 g of diisopropylethylamine was added while washing with 1.0 mL of toluene. The reaction solution was stirred at 60° C. for 10 minutes, then cooled to 20° C., and 20 mL of methanol was added while maintaining 10° C. to 20° C., and stirred at 20° C. for 10 minutes. The precipitated crystals were filtered and rinsed with 10 mL of methanol. The crude product was dissolved in chloroform and purified by silica gel column chromatography (chloroform) to obtain 0.2 g of pigment PPB-A-43 (yield 14.2%).

[0442] 1 H-NMR (CDCl3): δ=1.47 (d, J=7.2Hz, 3H), 1.48 (d, J=7.2Hz, 3H), 2.31 (s, 3H), 3.05 (m, 1H), 6. 32-6.36(m, 2H), 6.55-6.58(m, 2H), 6.84-7.08(m, 8H), 7.17-7.35(m, 6H), 7.69-7.74(m, 2H)

[0443] <<Synthesis Example of Pigment PPB-A-19>>

[0444] Pigment PPB-A-19 was synthesized according to the following scheme.

[0445] [Chemical Formula 23]

[0446]

[0447] Under a nitrogen atmosphere, 25.0 g of intermediate 5, 77.52 g of 2-aminoethyl diphenylborate, and 500 mL of toluene were added to a three-necked flask, the temperature being maintained at 90 to 100° C., and 97.99 g of titanium tetrachloride was added while being washed with 50 mL of toluene. The reaction solution was stirred under reflux for 2 hours, then cooled to 20° C., and 500 mL of methanol was added while maintaining the temperature at 20 to 30° C. The resulting crystals were filtered and rinsed with 250 mL of methanol. 500 mL of methanol was added to the crude product obtained, stirred under reflux for 30 minutes, cooled to 20° C., filtered, rinsed with 250 mL of methanol, and air-dried at 50° C. for 12 hours to obtain 9.56 g of pigment PPB-A-19 (yield 24.4%).

[0448] 1 H-NMR (CDCl3): δ=0.88 (d, J=7.2Hz, 3H), 0.95 (d, J=7.2Hz, 3H), 1.51 (s, 3H), 3.51 (m, 1H), 6.39 (m, 1H), 6.74(m, 1H), 6.82(m, 1H), 6.88-7.41(m, 21H), 7.51-7.55(m, 4H), 7.64-7.67(m, 2H), 7.76-7.78(m, 2H)

[0449] <<Synthesis Example of Pigment PPB-C-1>>

[0450] Pigment PPB-C-1 was synthesized according to the following scheme.

[0451] [Chemical Formula 24]

[0452]

[0453] Intermediate 6 was synthesized using the same method as intermediate 5. Under a nitrogen atmosphere, 0.4 g of intermediate 6, 0.86 g of chloro-o-phenylenedioxyborane, and 4 mL of toluene were added to a three-necked flask, and 0.96 g of diisopropylethylamine was added while washing with 0.4 mL of toluene. The reaction solution was stirred at 60°C for 10 minutes and then cooled to 20°C. 12 mL of methanol was added while maintaining 10°C to 20°C, and stirred at 20°C for 10 minutes. The precipitated crystals were filtered and rinsed with 7 mL of methanol. The crude product was dissolved in chloroform and purified by silica gel column chromatography (chloroform) to obtain 0.29 g of pigment PPB-C-1 (yield 57%).

[0454] 1 H-NMR (CDCl3): δ=0.87-1.90 (m, 45H), 3.04 (m, 1H), 3.67-3.71 (m, 2H), 6.36 (m, 2H), 6.56-6.63 (m, 3H), 6.82-7.35 (m, 13H), 7.69-7.74 (dd, J=7.6Hz, 2H)

[0455] <<Synthesis Example of Pigment PPB-B-34>>

[0456] Pigment PPB-B-34 was synthesized according to the following scheme.

[0457] [Chemical Formula 25]

[0458]

[0459] Intermediate 7 was synthesized in the same manner as Intermediate 5. Under a nitrogen atmosphere, 1.00 g of Intermediate 7 and 0.607 g of potassium carbonate were stirred in 12 mL of dimethylacetamide (DMAc) in a three-necked flask, and then 1.05 g of butane sultone was added while being washed with 1 mL of DMAc. The reaction solution was stirred at 95°C for 2 hours, then cooled to 20°C, and 6 mL of ethyl acetate was added while maintaining the temperature at 20°C to 30°C, and stirred at 25°C for 10 minutes. The precipitated crystals were filtered and rinsed with 12 mL of a 1:1 mixture of ethyl acetate and DMAc and 6 mL of ethyl acetate, respectively. The crude product obtained was added to 20 mL of 4 mol / L hydrochloric acid water and stirred at 25°C for 40 minutes. The reaction solution was filtered and rinsed with 10 mL of distilled water. The obtained crystals were dried with air at 50° C. for 12 hours to obtain 0.36 g of pigment PPB-B-34 (yield 31.4%).

[0460] 1H-NMR (d-DMSO): δ=0.79 (d, J=7.2Hz, 6H), 1.29-1.46 (m, 2H), 1.74-1.77 (m, 4H), 2.01 (m, 1H), 3.91-3.94 (m, 2H), 6.30 ( d, J=8.8Hz, 1H), 6.42 (d, J=8.8Hz, 1H), 6.84 (d, J=8.5Hz, 1H), 7.10-7.40 (m, 23H), 7.77-7.79 (m, 4H), 7.95-7.97 (m, 2H)

[0461] <<Synthesis Example of Pigment PPB-B-36>>

[0462] Pigment PPB-B-36 was synthesized according to the following scheme.

[0463] [Chemical Formula 26]

[0464]

[0465] Intermediate 8 was synthesized in the same manner as intermediate 5. Under a nitrogen atmosphere, 3.50 g of intermediate 8 and 1.06 g of potassium carbonate were stirred in 105 mL of dimethylacetamide (DMAc) in a three-necked flask, and then 7.43 g of intermediate 9 was added. The reaction solution was stirred at 95°C for 1 hour and then cooled to 20°C. While maintaining the temperature at 20°C to 30°C, 140 mL of 4 mol / L hydrochloric acid water was added and stirred at 25°C for 10 minutes. The precipitated crystals were filtered and rinsed with 140 mL of 4 mol / L hydrochloric acid water. The crude product was added to 140 mL of 4 mol / L hydrochloric acid water and stirred at 25°C for 30 minutes. The reaction solution was filtered and rinsed with 140 mL of 4 mol / L hydrochloric acid water. The crude product was added to 70 mL of a 1:1 mixture of hexane and ethyl acetate, stirred at 25° C. for 10 minutes, and filtered. The crude product was rinsed with 70 mL of a 1:1 mixture of hexane and ethyl acetate. The crystals were dried by air at 50° C. for 12 hours to obtain 4.34 g of the pigment PPB-B-36 (yield 84.6%).

[0466] 1 H-NMR (d-DMSO): δ=0.78 (d, J=7.2Hz, 3H), 0.82 (d, J=7.2Hz, 3H), 3.57 (m, 1H), 6.49 (m, 1 H), 6.58(m, 1H), 6.82(m, 1H), 7.00-7.43(m, 23H), 7.77-7.82(m, 4H), 7.96-8.00(m, 2H)

[0467] 19 F-NMR (d-DMSO): δ=-78.7(3F), -108.8(2F), -112.8(2F), -118.3(2F)

[0468] <<Synthesis Examples of Pigments PPB-A-1 to 18, PPB-A-20 to 42, PPB-A-44 to 81, PPB-C-2 to PPB-C-12, PPB-D-1, PPB-D-2, PPB-E-1, PPB-B-1 to PPB-B-33, PPB-B-35, and PPB-B-37 to PPB-B-65>>

[0469] Each pigment was synthesized in the same manner as for the pigments PPB-A-19, PPB-A-43, PPB-B-34, PPB-B-36, and PPB-C-1.

[0470] <Evaluation of Visible Transparency>

[0471] Pigment solutions were prepared by dissolving the pigments listed in the following table in the solvents listed in the following table. The absorbance of the resulting pigment solutions for light with a wavelength of 400 to 1200 nm was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation). Within the wavelength range of 400 to 1200 nm, the wavelength (λmax) at which the absorbance shows a maximum was measured. The absorbance at λmax was set to 1, and the average absorbance within the wavelength range of 420 to 550 nm was calculated. Visible transparency was evaluated according to the following criteria.

[0472] A: The average absorbance in the range of 420-550nm is less than 0.007

[0473] B: The average absorbance in the range of 420 to 550 nm is 0.007 or more and less than 0.010

[0474] C: Average absorbance in the range of 420-550 nm is 0.010 or more

[0475] [Table 1]

[0476]

[0477] [Table 2]

[0478]

[0479] [Table 3]

[0480]

[0481] Pigments PPB-A-1 to PPB-A-81 and PPB-C-1 to PPB-C-12 have better visible transparency than PPB-D-1, PPB-D-2, and PPB-E-1. The details of each pigment are shown below.

[0482] PPB-A-1 to PPB-A-81: Compounds of the following structures (pigment (specific pigment) represented by formula (1))

[0483] PPB-C-1 to PPB-C-12: Compounds of the following structures (pigment (specific pigment) represented by formula (1))

[0484] PPB-D-1, PPB-D-2, PPB-E-1: Compounds with the following structures (for comparison)

[0485] [Chemical Formula 27]

[0486]

[0487] [Chemical Formula 28]

[0488]

[0489] [Chemical Formula 29]

[0490]

[0491] [Chemical formula 30]

[0492]

[0493] [Chemical Formula 31]

[0494]

[0495] [Chemical Formula 32]

[0496]

[0497] [Chemical Formula 33]

[0498]

[0499] [Chemical Formula 34]

[0500]

[0501] [Chemical Formula 35]

[0502]

[0503] [Chemical Formula 36]

[0504]

[0505] [Chemical Formula 37]

[0506]

[0507] <Preparation of Dispersion>

[0508] 1.902 parts by mass of the coloring matter (pigment) listed in the following table, 0.36 parts by mass of the derivative listed in the following table, 9 parts by mass of the dispersant listed in the following table, 18.74 parts by mass of the solvent listed in the following table, and 40 parts by mass of zirconia beads having a diameter of 0.3 mm were mixed and dispersed using a paint shaker for 5 hours. The beads were then separated by filtration to prepare a dispersion liquid.

[0509] [Table 4]

[0510]

[0511] [Table 5]

[0512]

[0513] [Table 6]

[0514]

[0515] [Table 7]

[0516]

[0517] (pigment)

[0518] PPB-A-1 to PPB-A-81: Compounds of the above structure (pigment (specific pigment) represented by formula (1))

[0519] PPB-D-1, PPB-D-2: Compounds with the above structures (for comparison)

[0520] (derivative)

[0521] PPB-B-1 to PPB-B-74: compounds of the following structures (PPB-B-24, PPB-B-26, PPB-B-28, PPB-B-30, PPB-B-32, PPB-B-36, PPB-B-37, PPB-B-38, PPB-B-40, PPB-B-44, PPB-B-45, PPB-B-46, PPB-B-50, PPB-B-52, PPB-B-53, PPB-B-54, PPB-B-55, PPB-B-56, PPB-B-57, PPB-B-58, PPB-B-59, PPB-B-60, PPB-B-61, PPB-B-62, PPB-B-63, PPB-B-64, PPB-B-65, PPB-B-66, PPB-B-67, PPB-B-68, PPB-B-69, PPB-B-70, PPB-B-71, PPB-B-72, PPB-B-73, PPB-B-74, PPB-B-75, PPB-B-76, PPB-B-77, PPB-B-78, PPB-B-79, PPB-B-80, PPB-B-81, PPB-B-82, PPB-B-83, PPB-B-84, PPB-B-85 PPB-B-54, PPB-B-56, PPB-B-58, PPB-B-62, PPB-B-63, PPB-B-64, PPB-B-65, PPB-B-66, PPB-B-67, PPB-B-68, PPB-B-69, PPB-B-70, PPB-B-71, PPB-B-72, PPB-B-73, and PPB-B-74 are pigments represented by formula (1) (specific pigments).

[0522] [Chemical Formula 38]

[0523]

[0524] [Chemical Formula 39]

[0525]

[0526] [Chemical Formula 40]

[0527]

[0528] [Chemical Formula 41]

[0529]

[0530] [Chemical Formula 42]

[0531]

[0532] [Chemical Formula 43]

[0533]

[0534] [Chemical Formula 44]

[0535]

[0536] [Chemical Formula 45]

[0537]

[0538] [Chemical Formula 46]

[0539]

[0540] [Chemical Formula 47]

[0541]

[0542] [Chemical Formula 48]

[0543]

[0544] (Dispersant)

[0545] D-1: The resin of the following structure (the numerical value indicated on the main chain indicates the molar ratio, and the numerical value indicated on the side chain indicates the number of repeating units. Weight average molecular weight 38900, acid value 99.1 mgKOH / g) was adjusted to a solution with a solid content concentration of 20% by mass using a mixed solution of propylene glycol monomethyl ether acetate: propylene glycol monomethyl ether = 9:1 (mass ratio) D-2: The resin of the following structure (the numerical value indicated on the main chain indicates the molar ratio, and the numerical value indicated on the side chain indicates the number of repeating units. Weight average molecular weight 21000, acid value 36.0 mgKOH / g, amine value 47.0 mgKOH / g) was adjusted to a solution with a solid content concentration of 20% by mass using a mixed solution of propylene glycol monomethyl ether acetate: propylene glycol monomethyl ether = 9:1 (mass ratio)

[0546] [Chemical Formula 49]

[0547]

[0548] (Solvent)

[0549] S-1: Propylene glycol monomethyl ether acetate

[0550] S-2: Propylene glycol monomethyl ether

[0551] <Preparation of Pigment Solution>

[0552] 8.02 parts by mass of the pigment (dyes) described in the following table and 91.98 parts by mass of the solvent described in the following table were mixed to prepare a pigment solution.

[0553] [Table 8]

[0554]

[0555] (pigment)

[0556] PPB-C-1 to PPB-C-12: Compounds of the above structures (pigment (specific pigment) represented by formula (1))

[0557] PPB-E-1: Compound with the above structure (for comparison)

[0558] (Solvent)

[0559] S-3: Cyclopentanone

[0560] S-4: Cyclohexanone

[0561] S-5: Anisole

[0562] <Manufacturing of Composition>

[0563] Each raw material was mixed in the ratio of the following formulations 1 to 6, and filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.) to produce each composition.

[0564] <Recipe 1>

[0565] Dispersion liquid described in the following table······15.873 parts by mass

[0566] Resins listed in the following table······2.943 parts by mass

[0567] Polymerizable compound described in the following table······0.45 parts by mass

[0568] Photopolymerization initiator described in the following table······0.45 parts by mass

[0569] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0570] Surfactants listed in the following table······0.0075 parts by mass

[0571] Solvents listed in the following table: 10.276 parts by mass

[0572] <Recipe 2>

[0573] Dispersion liquid described in the following table······15.873 parts by mass

[0574] Resins listed in the following table······2.943 parts by mass

[0575] Epoxy compounds listed in the following table······0.9 parts by mass

[0576] Curing agent listed in the following table (if listed in the table) ······0.045 parts by mass

[0577] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0578] Surfactants listed in the following table······0.0075 parts by mass

[0579] Solvents listed in the following table······10.276 parts by mass

[0580] <Recipe 3>

[0581] Dye solution described in the following table······14.921 parts by mass

[0582] Resins listed in the following table······3.895 parts by mass

[0583] Polymerizable compound described in the following table······0.45 parts by mass

[0584] Photopolymerization initiator described in the following table······0.45 parts by mass

[0585] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0586] Surfactants listed in the following table······0.00075 parts by mass

[0587] Solvents listed in the following table······10.276 parts by mass

[0588] <Recipe 4>

[0589] Dye solution described in the following table······14.921 parts by mass

[0590] Resins listed in the following table······3.895 parts by mass

[0591] Epoxy compounds listed in the following table······0.9 parts by mass

[0592] Curing agent listed in the following table (if listed in the table) ······0.045 parts by mass

[0593] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0594] Surfactants listed in the following table······0.0075 parts by mass

[0595] Solvents listed in the following table······10.276 parts by mass

[0596] <Recipe 5>

[0597] Dispersion liquid described in the following table······8.333 parts by mass

[0598] 45% propylene glycol monomethyl ether acetate solution of the resin with the following structure (weight average molecular weight 24600, the numerical value indicated on the main chain represents the mass ratio of the repeating unit) ·······4.886 parts by mass

[0599] [Chemical Formula 50]

[0600]

[0601] Ultraviolet absorber described in the following table······2.7 parts by mass

[0602] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0603] Surfactants listed in the following table······0.011 parts by mass

[0604] Solvents listed in the following table: 6.305 parts by mass

[0605] <Recipe 6>

[0606] Dye solution described in the following table······7.833 parts by mass

[0607] 45% propylene glycol monomethyl ether acetate solution of the resin with the following structure (weight average molecular weight 24600, the numerical value indicated on the main chain represents the mass ratio of the repeating unit) ······ 5.386 parts by mass

[0608] [Chemical Formula 51]

[0609]

[0610] Ultraviolet absorber described in the following table······2.7 parts by mass

[0611] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0612] Surfactants listed in the following table······0.011 parts by mass

[0613] Solvents listed in the following table: 6.030 parts by mass

[0614] [Table 9]

[0615]

[0616] [Table 10]

[0617]

[0618] [Table 11]

[0619]

[0620] [Table 12]

[0621]

[0622] [Table 13]

[0623]

[0624] [Table 14]

[0625]

[0626] [Table 15]

[0627]

[0628] [Table 16]

[0629]

[0630] [Table 17]

[0631]

[0632] [Table 18]

[0633]

[0634] [Table 19]

[0635]

[0636] [Table 20]

[0637]

[0638] Among the raw materials described in the above table, details of the raw materials other than the dispersion liquid and the pigment solution are as follows.

[0639] (resin)

[0640] E-1: Copolymer resin of benzyl methacrylate, methacrylic acid, and 2-hydroxyethyl methacrylate (weight average molecular weight 14,000, acid value 77 mgKOH / g, alkali-soluble resin)

[0641] E-2: ARTON F4520 (manufactured by JSR Corporation, cyclic polyolefin resin)

[0642] E-3: Resin with the following structure (weight average molecular weight 40,000, acid value 100 mgKOH / g, the numerical value indicated on the main chain represents the mass ratio of the repeating units. Alkali-soluble resin)

[0643] [Chemical Formula 52]

[0644]

[0645] (Polymerizable compound)

[0646] M-1: ARONIX M-305 (manufactured by TOAGOSEI CO., LTD., a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate. The content of pentaerythritol triacrylate is 55% to 63% by mass.)

[0647] M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate)

[0648] M-3: ARONIX M-510 (manufactured by TOAGOSEI CO., LTD., polyacid-modified acrylic oligomer)

[0649] (Photopolymerization initiator)

[0650] C-1: Irgacure OXE01 (manufactured by BASF, oxime ester initiator)

[0651] C-2: Irgacure OXE02 (manufactured by BASF, oxime ester initiator)

[0652] C-3: Omnifad 907 (manufactured by IGM Resins BV, α-aminoalkylphenone-based initiator)

[0653] (Epoxy Compound)

[0654] F-1: Glycidyl methacrylate backbone random polymer (manufactured by NOF CORPORATION, Marproof G-0150M, weight average molecular weight 10,000)

[0655] F-2: EPICLON N-695 (manufactured by DIC Corporation, novolac-type epoxy resin)

[0656] F-3: JER1031S (manufactured by Mitsubishi Chemical Corporation, multifunctional epoxy resin)

[0657] F-4: EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol)

[0658] (Curing Agent)

[0659] G-1: trimellitic acid

[0660] G-2: Pyromellitic anhydride

[0661] G-3: N,N-dimethyl-4-aminopyridine

[0662] G-4: Pentaerythritol tetrakis (3-mercaptopropionate)

[0663] (Surfactant)

[0664] H-1: MEGAFACE RS-72-K (manufactured by DIC Corporation, fluorine-based surfactant)

[0665] H-2: Compound having the following structure (weight average molecular weight: 14,000, values ​​indicating the ratio of repeating units are in mol %)

[0666] [Chemical Formula 53]

[0667]

[0668] H-3: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., dual-end carbinol-modified polydimethylsiloxane, hydroxyl value 62 mgKOH / g)

[0669] (UV absorber)

[0670] U-1: Uvinul 3050 (manufactured by BASF, compound with the following structure)

[0671] [Chemical Formula 54]

[0672]

[0673] U-2: Tinuvin 477 (manufactured by BASF, a hydroxyphenyltriazine-based UV absorber)

[0674] U-3: Tinuvin 326 (manufactured by BASF, compound with the following structure)

[0675] [Chemical Formula 55]

[0676]

[0677] (Solvent)

[0678] S-1: Propylene glycol monomethyl ether acetate

[0679] S-2: Propylene glycol monomethyl ether

[0680] S-3: Cyclopentanone

[0681] S-4: Cyclohexanone

[0682] <Evaluation of Temporal Stability of Composition>

[0683] Immediately after production, the composition was sealed in a light-shielding container and then stored at 45° C. for 3 days. The presence of foreign matter precipitated from the liquid (composition solution) was visually checked and evaluated according to the following criteria.

[0684] A: No precipitation of foreign matter was found

[0685] B: A small amount of foreign matter can be found, but there is no problem in actual application

[0686] C: Precipitation of foreign matter was found, and there were problems in practical application

[0687] D: Large amounts of foreign matter are precipitated

[0688] <Film Production>

[0689] (Manufacturing Example 1) Method for manufacturing films using the compositions of Examples 1 to 139 and Comparative Examples 1 to 3

[0690] Each composition was applied on a glass substrate by spin coating and then heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. An i-ray stepper was used to apply 500 mJ / cm 2 The obtained composition layer was exposed to an exposure dose of 1.5 μm. Next, the exposed composition layer was heated at 220° C. for 5 minutes using a hot plate for curing, thereby obtaining a film having a thickness of 1.5 μm.

[0691] (Manufacturing Example 2) Method for manufacturing films using the compositions of Examples 401 to 539 and Comparative Examples 201 to 203

[0692] Each composition prepared above was applied on a glass substrate by spin coating, and then heated (prebaked) at 100° C. for 10 minutes on a hot plate and then heated at 200° C. for 8 minutes for curing, thereby obtaining a film with a thickness of 1.5 μm.

[0693] (Manufacturing Example 3) Method for manufacturing a film using the composition of Examples 701 to 839

[0694] Each of the compositions prepared above was applied on a glass substrate by spin coating, and then heated (prebaked) at 100° C. for 10 minutes on a hot plate and then heated at 200° C. for 8 minutes for curing, thereby obtaining a film with a thickness of 8.0 μm.

[0695] <Evaluation of defects>

[0696] The obtained film was observed using an optical microscope at a bright field magnification of 200 times to see if there was precipitation of foreign matter due to heating on the film surface, and defects were evaluated according to the following criteria.

[0697] A: No precipitation of foreign matter was found

[0698] B: A small amount of foreign matter can be found, but there is no problem in actual application

[0699] C: Precipitation of foreign matter was found, and there were problems in practical application

[0700] D: Large amounts of foreign matter are precipitated

[0701] [Table 21]

[0702]

[0703] [Table 22]

[0704]

[0705] [Table 23]

[0706]

[0707] [Table 24]

[0708]

[0709] [Table 25]

[0710]

[0711] [Table 26]

[0712]

[0713] As shown in the table above, the compositions of the examples exhibited good temporal stability, and films obtained using the compositions of the examples exhibited fewer defects. Furthermore, the films obtained using the compositions of the examples exhibited superior visual transparency compared to the films obtained using the compositions of the comparative examples.

[0714] Furthermore, the films obtained using the compositions of Examples 701 to 839 all had a transmittance of 5% at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0715] In the above examples, for compounds having a group represented by the following formula (A-1) among PPB-B-1 to PPB-B-74 used as derivatives, even if the group represented by the following formula (A-1) is replaced by a compound having a structure represented by the following formula (B-1) or a mixture thereof, the same effects as those of the respective examples can be obtained. Furthermore, in the above examples, for compounds having a group represented by the following formula (A-2) among PPB-B-1 to PPB-B-74 used as derivatives, even if the group represented by the following formula (A-2) is replaced by a compound having a structure represented by the following formula (B-2) or a mixture thereof, the same effects as those of the respective examples can be obtained.

[0716] [Chemical Formula 56]

[0717]

[0718] In the above formula, M represents Li, Na, K, Rb, Cs, or a structure represented by formula (C) or formula (D).

[0719] [Chemical Formula 57]

[0720]

[0721] In formula (C), R z 1 ~R z 4 Each independently represents a hydrogen atom, a branched or linear alkyl group which may have a substituent, or an aryl group which may have a substituent. z 1 ~R z 4 Can be connected to each other to form a ring.

[0722] In formula (D), R z 5 ~R z 9 Each independently represents a substituent, R z 5 With R z 6 、R z 6 With R z 7 、R z 7 With R z 8 、R z 8 With R z 9 Can be connected to each other to form a ring.

[0723] <Examples 1001 to 1139>

[0724] Composition IR1 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0725] Infrared absorber (FDR-003, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.045 parts by mass

[0726] Resin P1 (a 45% propylene glycol monomethyl ether acetate solution of a resin having the following structure (weight average molecular weight 24600, the numerical value indicated on the main chain represents the mass ratio of the repeating unit)) ·······6.9 parts by mass

[0727] [Chemical Formula 58]

[0728]

[0729] Ultraviolet absorber (Uvinul 3050, manufactured by BASF)······1.35 parts by mass

[0730] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0731] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0732] Composition IR1 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 7.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a film having a thickness of 7.0 μm. The compositions of Examples 401 to 539 were then spin-coated onto the resulting film as second layer compositions until the film thickness of the second layer after post-baking reached 1.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form a film having a thickness of 1.0 μm. The laminated films of Examples 1001 to 1139 (total film thickness: 8.0 μm) were obtained.

[0733] The laminated films of Examples 1001 to 1139 were observed using an optical microscope at 200x magnification for the presence of foreign matter. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 1001 to 1139 at a wavelength of 390 nm was less than 5%, indicating excellent UV shielding properties.

[0734] <Examples 1201 to 1323>

[0735] In Formula 1 of the compositions of Examples 1 to 48, 58 to 110, and 112 to 133, 0.120 parts by mass of FDR-003 (manufactured by YAMADA CHEMICAL CO., LTD.) and 0.359 parts by mass of FDR-004 (manufactured by YAMADA CHEMICAL CO., LTD.) were further added as infrared absorbers. The compositions of Examples 1201 to 1323 were prepared by the same method as in Examples 1 to 48, 58 to 110, and 112 to 133. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were prepared and evaluated for defects in the same manner as in Production Example 1, except that the film thickness was set to 1.0 μm. The evaluation results of defects and temporal stability of Examples 1201 to 1323 were the same as the evaluation results of Examples 1 to 48, 58 to 110, and 112 to 133.

[0736] <Examples 1401 to 1523>

[0737] In Formula 1 of the compositions of Examples 1 to 48, 58 to 110, and 112 to 133, 0.287 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.191 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers. The compositions of Examples 1401 to 1523 were produced by the same method as in Examples 1 to 48, 58 to 110, and 112 to 133. The temporal stability of the resulting compositions was evaluated in the same manner as described above. Films were produced and evaluated for defects in the same manner as in Production Example 1, except that the film thickness was set to 1.0 μm. The evaluation results of defects and temporal stability of Examples 1401 to 1523 were the same as the evaluation results of Examples 1 to 48, 58 to 110, and 112 to 133.

[0738] <Examples 1601 to 1723>

[0739] In the formula 1 of the composition of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, 0.209 parts by mass of a phthalocyanine compound (Pc-5) (a compound having the following structure) and 0.269 parts by mass of FDR-004 (manufactured by YAMADA CHEMICAL CO., LTD.) were further added as infrared absorbers. The compositions of Examples 1601 to 1723 were prepared by the same method as in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133. The temporal stability of the obtained compositions was evaluated in the same manner as described above. In addition, the film thickness was set to 1.0 μm, and the film was prepared by the same method as in Production Example 1, and the defect evaluation was implemented. The evaluation results of defects and temporal stability of Examples 1601 to 1723 were the same as those of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133.

[0740] [Chemical Formula 59]

[0741]

[0742] <Examples 1801-1923>

[0743] In Formula 1 of the compositions of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, except that 0.389 parts by mass of a phthalocyanine compound (Pc-5) and 0.090 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers, the compositions of Examples 1801 to 1923 were produced using the same method as in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133. The temporal stability of the resulting compositions was evaluated using the same method as above. Films were produced and evaluated for defects using the same method as in Production Example 1, except that the film thickness was set to 1.0 μm. The results of the defect and temporal stability evaluations for Examples 1801 to 1923 were the same as those for Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133.

[0744] <Examples 2001 to 2123>

[0745] In the formula 1 of the composition of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, 0.209 parts by mass of a phthalocyanine compound (Pc-5) and 0.389 parts by mass of a phthalocyanine compound (Pc-2) (a compound having the following structure) were further added as infrared absorbers. In addition, the compositions of Examples 2001 to 2123 were manufactured by the same method as in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133. The temporal stability of the obtained composition was evaluated in the same manner as the above method. In addition, the film thickness was set to 1.0 μm, and the film was prepared in the same manner as in Manufacturing Example 1, and the defect evaluation was implemented. The evaluation results of defects and temporal stability of Examples 2001 to 2123 were the same as those of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133.

[0746] [Chemical Formula 60]

[0747]

[0748] <Examples 2201 to 2323>

[0749] In the formula 1 of the composition of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, 0.419 parts by mass of a phthalocyanine compound (Pc-5) and 0.120 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers. The compositions of Examples 2201 to 2323 were manufactured by the same method as in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133. The temporal stability of the obtained compositions was evaluated in the same manner as the above method. In addition, the film thickness was set to 1.0 μm, and the film was prepared in the same manner as in Manufacturing Example 1, and the defect evaluation was implemented. The evaluation results of defects and temporal stability of Examples 2201 to 2323 were the same as those of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133.

[0750] <Examples 2401 to 2523>

[0751] In Formula 1 of the compositions of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, 0.180 parts by mass of FDR-003 (manufactured by YAMADA CHEMICAL CO., LTD.) and 0.419 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers. The compositions of Examples 2401 to 2523 were produced by the same method as in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were produced and evaluated for defects in the same manner as in Production Example 1, except that the film thickness was set to 1.0 μm. The evaluation results for defects and temporal stability in Examples 2401 to 2523 were the same as those in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133.

[0752] <Examples 2601 to 2723>

[0753] In the formulation 1 of the compositions of Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, 0.389 parts by mass of FDR-003 (manufactured by YAMADA CHEMICAL CO., LTD.) and 0.209 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers. The compositions of Examples 2601 to 2723 were prepared by the same method as in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133, except that these were added. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were prepared and evaluated for defects in the same manner as in Production Example 1, except that the film thickness was set to 1.0 μm. The evaluation results of defects and temporal stability in Examples 2601 to 2723 were the same as those in Examples 1 to 48, Examples 58 to 110, and Examples 112 to 133.

[0754] <Examples 2801 to 2923>

[0755] In Formulation 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.120 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.359 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers, the compositions of Examples 2801 to 2923 were prepared by the same method as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533. The temporal stability of the obtained compositions was evaluated in the same manner as above. Films were prepared and evaluated for defects in the same manner as in Production Example 2, except that the film thickness was set to 1.0 μm. The evaluation results of defects and temporal stability of Examples 2801 to 2923 were the same as the evaluation results of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0756] <Examples 3001 to 3123>

[0757] In Formulation 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.287 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.191 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers, the compositions of Examples 3001 to 3123 were prepared in the same manner as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533. The temporal stability of the obtained compositions was evaluated in the same manner as above. Films were prepared and evaluated for defects in the same manner as in Production Example 2, except that the film thickness was set to 1.0 μm. The evaluation results of defects and temporal stability of Examples 3001 to 3123 were the same as the evaluation results of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0758] <Examples 3201 to 3323>

[0759] In Formula 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.209 parts by mass of a phthalocyanine compound (Pc-5) and 0.269 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers, the compositions of Examples 3201 to 3323 were prepared by the same method as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were prepared and evaluated for defects in the same manner as in Production Example 2, except that the film thickness was set to 1.0 μm. The results of the defect and temporal stability evaluations for Examples 3201 to 3323 were the same as those for Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0760] <Examples 3401 to 3523>

[0761] In Formula 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.389 parts by mass of a phthalocyanine compound (Pc-5) and 0.090 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers, the compositions of Examples 3401 to 3523 were prepared by the same method as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were prepared and evaluated for defects in the same manner as in Production Example 2, except that the film thickness was set to 1.0 μm. The results of the defect and temporal stability evaluations for Examples 3401 to 3523 were the same as those for Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0762] <Examples 3601 to 3723>

[0763] In Formula 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, 0.209 parts by mass of a phthalocyanine compound (Pc-5) and 0.389 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers. The compositions of Examples 3601 to 3723 were prepared using the same method as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that these additions further included 0.209 parts by mass of a phthalocyanine compound (Pc-5) and 0.389 parts by mass of a phthalocyanine compound (Pc-2). The temporal stability of the resulting compositions was evaluated using the same method as described above. Films were prepared and evaluated for defects using the same method as in Production Example 2, except that the film thickness was set to 1.0 μm. The evaluation results for defects and temporal stability of Examples 3601 to 3723 were the same as those of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0764] <Examples 3801 to 3923>

[0765] In Formula 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.419 parts by mass of a phthalocyanine compound (Pc-5) and 0.120 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers, the compositions of Examples 3801 to 3923 were prepared using the same method as Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533. The temporal stability of the obtained compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 2, except that the film thickness was set to 1.0 μm. The evaluation results for defects and temporal stability of Examples 3801 to 3923 were the same as those of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0766] <Examples 4001 to 4123>

[0767] In Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, compositions of Examples 4001 to 4123 were prepared using the same methods as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.180 parts by mass of FDR-003 (manufactured by YAMADA CHEMICAL CO., LTD.) and 0.419 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers to Formulation 2. The temporal stability of the resulting compositions was evaluated using the same method as described above. Films were prepared and evaluated for defects using the same method as in Production Example 2, except that the film thickness was set to 1.0 μm. The results of the defect and temporal stability evaluations for Examples 4001 to 4123 were the same as those for Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0768] <Examples 4201 to 4323>

[0769] In Formula 2 of Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533, except that 0.389 parts by mass of FDR-003 (manufactured by YAMADA CHEMICAL CO., LTD.) and 0.209 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers, the compositions of Examples 4201 to 4323 were prepared by the same method as in Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533. The temporal stability of the obtained compositions was evaluated in the same manner as above. Films were prepared and evaluated for defects in the same manner as in Production Example 2, except that the film thickness was set to 1.0 μm. The results of the defect and temporal stability evaluations for Examples 4201 to 4323 were the same as those for Examples 401 to 448, Examples 458 to 510, and Examples 512 to 533.

[0770] <Examples 4401 to 4523>

[0771] In Formulation 5 of the compositions of Examples 701 to 748, 758 to 810, and 812 to 833, the UV absorber was increased to 3.927 parts by mass, and 0.057 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.182 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers. The compositions of Examples 4401 to 4523 were prepared using the same method as in Examples 701 to 748, 758 to 810, and 812 to 833. The temporal stability of the obtained compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 3, except that the film thickness was set to 5.0 μm. The evaluation results of defects and temporal stability for Examples 4401 to 4523 were the same as those for Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained films had a transmittance of 5% or less at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0772] <Examples 4601 to 4723>

[0773] In Formulation 5 of the compositions of Examples 701 to 748, 758 to 810, and 812 to 833, the UV absorber was increased to 3.927 parts by mass, and 0.151 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.101 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers. The compositions of Examples 4601 to 4723 were prepared using the same method as in Examples 701 to 748, 758 to 810, and 812 to 833. The temporal stability of the resulting compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 3, except that the film thickness was set to 5.0 μm. The evaluation results of defects and temporal stability for Examples 4601 to 4723 were the same as those for Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained films had a transmittance of 5% or less at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0774] <Examples 4801 to 4923>

[0775] In Formulation 5 of the compositions of Examples 701 to 748, 758 to 810, and 812 to 833, except that the ultraviolet absorber was increased to 3.927 parts by mass, and 0.110 parts by mass of a phthalocyanine compound (Pc-5) and 0.141 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers, the compositions of Examples 4801 to 4923 were prepared by the same method as in Examples 701 to 748, 758 to 810, and 812 to 833. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were prepared and evaluated for defects in the same manner as in Production Example 3, except that the film thickness was changed to 5.0 μm. The evaluation results of defects and temporal stability in Examples 4801 to 4923 were the same as those in Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained films had a transmittance of 5% or less at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0776] <Examples 5001 to 5123>

[0777] In Formula 5 of the compositions of Examples 701 to 748, 758 to 810, and 812 to 833, the UV absorber was increased to 3.927 parts by mass, and 0.204 parts by mass of a phthalocyanine compound (Pc-5) and 0.047 parts by mass of FDR-004 (manufactured by Yamada Chemical Co., Ltd.) were further added as infrared absorbers. The compositions of Examples 5001 to 5123 were prepared by the same method as in Examples 701 to 748, 758 to 810, and 812 to 833. The temporal stability of the obtained compositions was evaluated in the same manner as described above. Films were prepared and evaluated for defects in the same manner as in Production Example 3, except that the film thickness was changed to 5.0 μm. The evaluation results of defects and temporal stability in Examples 5001 to 5123 were the same as those in Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained films had a transmittance of 5% or less at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0778] <Examples 5201 to 5323>

[0779] In Formula 5 of the compositions of Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833, except that the ultraviolet absorber was increased to 3.927 parts by mass, and 0.110 parts by mass of a phthalocyanine compound (Pc-5) and 0.204 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers, the compositions of Examples 5201 to 5323 were prepared using the same method as in Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. The temporal stability of the resulting compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 3, except that the film thickness was changed to 5.0 μm. The evaluation results for defects and temporal stability of Examples 5201 to 5323 were the same as those of Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained film had a transmittance of 5% or less at a wavelength of 390 nm and was excellent in ultraviolet light shielding properties.

[0780] <Examples 5401 to 5523>

[0781] In Formulation 5 of the compositions of Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833, except that the UV absorber was increased to 3.927 parts by mass, and 0.220 parts by mass of a phthalocyanine compound (Pc-5) and 0.063 parts by mass of a phthalocyanine compound (Pc-2) were further added as infrared absorbers, the compositions of Examples 5401 to 5523 were prepared using the same methods as Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. The temporal stability of the resulting compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 3, except that the film thickness was changed to 5.0 μm. The results of the defect and temporal stability evaluations for Examples 5401 to 5523 were the same as those for Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained film had a transmittance of 5% or less at a wavelength of 390 nm and was excellent in ultraviolet light shielding properties.

[0782] <Examples 5601 to 5723>

[0783] In Formulation 5 of the compositions of Examples 701 to 748, 758 to 810, and 812 to 833, except that the ultraviolet absorber was increased to 3.927 parts by mass, and 0.094 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.220 parts by mass of a phthalocyanine compound (Pc-2) were further added as an infrared absorber, the compositions of Examples 5601 to 5723 were prepared using the same method as in Examples 701 to 748, 758 to 810, and 812 to 833. The temporal stability of the obtained compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 3, except that the film thickness was changed to 5.0 μm. The evaluation results of defects and temporal stability for Examples 5601 to 5723 were the same as those for Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained films had a transmittance of 5% or less at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0784] <Examples 5801 to 5923>

[0785] In Formulation 5 of the compositions of Examples 701 to 748, 758 to 810, and 812 to 833, except that the ultraviolet absorber was increased to 3.927 parts by mass, and 0.204 parts by mass of FDR-003 (manufactured by Yamada Chemical Co., Ltd.) and 0.110 parts by mass of a phthalocyanine compound (Pc-2) were further added as an infrared absorber, the compositions of Examples 5801 to 5923 were prepared using the same method as in Examples 701 to 748, 758 to 810, and 812 to 833. The temporal stability of the resulting compositions was evaluated using the same method as above. Films were prepared and evaluated for defects using the same method as in Production Example 3, except that the film thickness was changed to 5.0 μm. The evaluation results of defects and temporal stability in Examples 5801 to 5923 were the same as those in Examples 701 to 748, Examples 758 to 810, and Examples 812 to 833. Furthermore, the obtained films had a transmittance of 5% or less at a wavelength of 390 nm, indicating excellent ultraviolet light shielding properties.

[0786] <Examples 6001 to 6139>

[0787] Composition IR2 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0788] Infrared absorber (FDR-003, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.0152 parts by mass

[0789] Infrared absorber (FDR-004, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.0490 parts by mass

[0790] The above resin P1······6.9 parts by mass

[0791] Ultraviolet absorber (Uvinul 3050, manufactured by BASF) ·······1.057 parts by mass

[0792] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0793] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0794] Composition IR2 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a 5.0 μm thick film. The compositions of Examples 401 to 539 were then spin-coated onto the resulting film as second layer compositions until the film thickness after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form a 0.9 μm thick film, yielding the laminated films of Examples 6001 to 6139 (total film thickness 5.9 μm). The laminated films of Examples 6001 to 6139 were observed using an optical microscope at a bright field magnification of 200x for the presence of foreign matter. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 6001 to 6139 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0795] <Examples 6201 to 6339>

[0796] Composition IR3 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0797] Infrared absorber (FDR-003, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.0406 parts by mass

[0798] Infrared absorber (FDR-004, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.0271 parts by mass

[0799] The above resin P1······6.9 parts by mass

[0800] Ultraviolet absorber (Uvinul 3050, manufactured by BASF)······1.058 parts by mass

[0801] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0802] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0803] Composition IR3 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a film with a thickness of 5.0 μm. The compositions of Examples 401 to 539 were then spin-coated onto the resulting film as second layer compositions until the film thickness of the second layer after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form films with a thickness of 0.9 μm. The laminated films of Examples 6201 to 6339 (total film thickness of 5.9 μm) were obtained. The laminated films of Examples 6201 to 6339 were observed for the presence of foreign matter using an optical microscope at a bright field magnification of 200x. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 6201 to 6339 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0804] <Examples 6401 to 6539>

[0805] Composition IR4 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0806] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-5))······0.0296 parts by mass

[0807] Infrared absorber (FDR-004, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.0381 parts by mass

[0808] The above resin P1······6.9 parts by mass

[0809] Ultraviolet absorber (Uvinul 3050, manufactured by BASF)······1.058 parts by mass

[0810] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0811] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0812] Composition IR4 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes using a hot plate, followed by curing at 200°C for 8 minutes to obtain a film with a thickness of 5.0 μm. The compositions of Examples 401 to 539 were then applied to the glass substrate as second layer compositions by spin coating until the film thickness of the second layer after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes using a hot plate, followed by curing at 200°C for 8 minutes to form a film with a thickness of 0.9 μm. The laminated films of Examples 6401 to 6539 (total film thickness of 5.9 μm) were obtained. The laminated films of Examples 6401 to 6539 were observed for the presence of foreign matter using an optical microscope at a bright field magnification of 200x. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 6401 to 6539 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0813] <Examples 6601 to 6739>

[0814] Composition IR5 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm.

[0815] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-5))······0.0550 parts by mass

[0816] Infrared absorber (FDR-004, manufactured by YAMADA CHEMICAL CO., LTD.) ······0.0127 parts by mass

[0817] The above resin P1······6.9 parts by mass

[0818] Ultraviolet absorber (Uvinu 13050, manufactured by BASF) ·······1.058 parts by mass

[0819] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0820] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0821] The composition IR5 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes using a hot plate, followed by curing at 200°C for 8 minutes to obtain a film with a thickness of 5.0 μm. On the obtained film, the compositions of Examples 401 to 539 were applied to a glass substrate by spin coating as a second layer composition until the film thickness of the second layer after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes using a hot plate, followed by curing at 200°C for 8 minutes to form a film with a thickness of 0.9 μm. The laminated films of Examples 6601 to 6739 (total film thickness of 5.9 μm) were obtained. The laminated films of Examples 6601 to 6739 were observed for the presence of foreign matter using an optical microscope at a bright field magnification of 200 times. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 6601 to 6739 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0822] <Examples 6801 to 6939>

[0823] Composition IR6 was produced by mixing the raw materials in the following ratios and filtering the mixture through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm.

[0824] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-5))······0.0298 parts by mass

[0825] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-2))······0.0553 parts by mass

[0826] The above resin P1······6.9 parts by mass

[0827] Ultraviolet absorber (Uvinul 3050, manufactured by BASF) ·······1.064 parts by mass

[0828] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0829] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0830] Composition IR6 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a film with a thickness of 5.0 μm. The compositions of Examples 401 to 539 were then applied to the glass substrate as second layer compositions by spin coating until the film thickness after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form films with a thickness of 0.9 μm. The laminated films of Examples 6801 to 6939 (total film thickness of 5.9 μm) were obtained. The laminated films of Examples 6801 to 6939 were observed for the presence of foreign matter using an optical microscope at a bright field magnification of 200x. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 6801 to 6939 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0831] <Examples 7001 to 7139>

[0832] Composition IR7 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0833] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-5))······0.0594 parts by mass

[0834] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-2))······0.0170 parts by mass

[0835] The above resin P1······6.9 parts by mass

[0836] Ultraviolet absorber (Uvinul 3050, manufactured by BASF) ·······1.061 parts by mass

[0837] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0838] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0839] Composition IR7 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a 5.0 μm thick film. The compositions of Examples 401 to 539 were then spin-coated onto the resulting film as second layer compositions until the film thickness after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form a 0.9 μm thick film, yielding the laminated films of Examples 7001 to 7139 (total film thickness 5.9 μm). The laminated films of Examples 7001 to 7139 were observed using an optical microscope at a bright field magnification of 200x for the presence of foreign matter. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 7001 to 7139 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0840] <Examples 7201 to 7339>

[0841] Composition IR8 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0842] Infrared absorber (FDR-003 (manufactured by YAMADA CHEMICAL CO., LTD.))······0.0255 parts by mass

[0843] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-2))······0.0596 parts by mass

[0844] The above resin P1······6.9 parts by mass

[0845] Ultraviolet absorber (Uvinul 3050, manufactured by BASF) ·······1.064 parts by mass

[0846] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0847] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0848] Composition IR8 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a film with a thickness of 5.0 μm. The compositions of Examples 401 to 539 were then applied to the glass substrate as second layer compositions by spin coating until the film thickness after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form films with a thickness of 0.9 μm. The laminated films of Examples 7201 to 7339 (total film thickness of 5.9 μm) were obtained. The laminated films of Examples 7201 to 7339 were observed for the presence of foreign matter using an optical microscope at a bright field magnification of 200x. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 7201 to 7339 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0849] <Examples 7401 to 7539>

[0850] Composition IR9 was produced by mixing the raw materials in the ratio shown below and filtering the mixture through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.).

[0851] Infrared absorber (FDR-003 (manufactured by Yamada Chemical Co., Ltd.))······0.0553 parts by mass

[0852] Infrared absorber (the above-mentioned phthalocyanine compound (Pc-2))······0.0298 parts by mass

[0853] The above resin P1······6.9 parts by mass

[0854] Ultraviolet absorber (Uvinul 3050, manufactured by BASF) ·······1.064 parts by mass

[0855] Polymerization inhibitor (p-methoxyphenol)······0.001 parts by mass

[0856] Propylene glycol monomethyl ether acetate······6.705 parts by mass

[0857] Composition IR9 prepared above was applied to a glass substrate by spin coating until the film thickness after post-baking reached 5.0 μm. The film was then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to obtain a film with a thickness of 5.0 μm. The compositions of Examples 401 to 539 were then applied to the glass substrate as second layer compositions by spin coating until the film thickness after post-baking reached 0.9 μm. The films were then heated (pre-baked) at 100°C for 10 minutes on a hot plate, followed by curing at 200°C for 8 minutes to form films with a thickness of 0.9 μm. The laminated films of Examples 7401 to 7539 (total film thickness of 5.9 μm) were obtained. The laminated films of Examples 7401 to 7539 were observed for the presence of foreign matter using an optical microscope at a bright field magnification of 200x. No foreign matter was observed. Furthermore, the transmittance of the laminated films of Examples 7401 to 7539 at a wavelength of 390 nm was less than 5%, indicating excellent ultraviolet shielding properties.

[0858] In each example, even when the dispersant (D-2) is replaced with DISPERBYK-140 (manufactured by BYK-Chemie GmbH), DISPERBYK-167 (manufactured by BYK-Chemie GmbH), DISPERBYK-2026 (manufactured by BYK-Chemie GmbH), or the dispersant (D-3) shown below, the same effects can be obtained.

[0859] Dispersant (D-3): A resin having the following structure (numerals indicated on the main chain represent the molar ratio, and numerical values ​​indicated on the side chain represent the number of repeating units; weight average molecular weight 11500, acid value 105 mgKOH / g, amine value 105 mgKOH / g) was prepared using a mixed solution of propylene glycol monomethyl ether acetate:propylene glycol monomethyl ether = 1:3 (mass ratio) to adjust the solid content concentration to 30% by mass.

[0860] [Chemical Formula 61]

[0861]

[0862] In each embodiment, the same effect can be obtained even if the phthalocyanine compound (Pc-2) used as the infrared absorber is replaced by the phthalocyanine compound (Pc-4), phthalocyanine compound (Pc-6), phthalocyanine compound (Pc-8) or phthalocyanine compound (Pc-10) shown below.

[0863] [Chemical Formula 62]

[0864]

[0865] In each embodiment, the same effect can be obtained even if the phthalocyanine compound (Pc-5) used as the infrared absorber is replaced by the phthalocyanine compound (Pc-1), phthalocyanine compound (Pc-3), phthalocyanine compound (Pc-7) or phthalocyanine compound (Pc-9) shown below.

[0866] [Chemical Formula 63]

[0867]

[0868] By using the film or laminated film of the examples, it is possible to obtain an optical filter, a solid-state imaging element, an image display device, an infrared sensor, or a camera module having excellent performance.

[0869] Explanation of symbols

[0870] 110 - solid-state imaging element, 111 - infrared cut filter, 112 - color filter, 114 - infrared transmission filter, 115 - microlens, 116 - planarization layer.

Claims

1. A composition comprising a pigment represented by formula (1) and a curable compound, In formula (1), R 1 and R 2 One of them represents a cyano group and the other represents a heteroaryl group represented by any one selected from the following formula (Har-1) to formula (Har-9), R 3 and R 4 One of them represents a cyano group and the other represents a heteroaryl group represented by any one selected from the following formula (Har-1) to formula (Har-9), R 5 represents an alkyl group, R 11 ~R 15 Each independently represents a hydrogen atom or a substituent, wherein, R 11 and R 14 wherein at least one of the substituents is a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a sulfamoyl group, an alkylthio group, a urea group, an aryloxy group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfonic group, or a group represented by formula (R-100), In the formula (R-100), L R1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, or -NR L1 -, -CO-, -COO-, -OCO-, -SO2-, or an n+1 valent linking group consisting of a combination thereof, R L1 represents a hydrogen atom, an alkyl group or an aryl group, X R1 represents an acid group or a base, n represents an integer greater than 1, when n is 1, L R1 is optionally a single bond, Y 1 and Y 2 Each independently represents -BR Y1 R Y2 , R Y1 and R Y2 Each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group or a heteroaryloxy group, and R Y1 and R Y2 optionally bonded to each other to form a ring, In the above formulas (Har-1) to (Har-9), Indicates the connecting key, R a1 ~R a43 Each independently represents a hydrogen atom or a substituent, wherein the substituent is a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a sulfamoyl group, an alkylthio group, a urea group, an aryloxy group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfonic group, or a group represented by the formula (R-100). In the formula (Har-1), R a1 With R a2 、R a2 With R a3 、R a3 With R a4 optionally bonded to each other to form a ring, In the formula (Har-2), R a5 With R a6 、R a6 With R a7 、R a7 With R a8 optionally bonded to each other to form a ring, In the formula (Har-3), R a9 With R a10 、R a10 With R a11 、R a11 With R a12 、R a12 With R a13 optionally bonded to each other to form a ring, In the formula (Har-4), R a15 With R a16 、R a16 With R a17 、R a17 With R a18 optionally bonded to each other to form a ring, In the formula (Har-5), R a19 With R a20 、R a20 With R a21 、R a21 With R a22 、R a22 With R a23 、R a23 With R a24 optionally bonded to each other to form a ring, In the formula (Har-6), R a25 With R a26 、R a26 With R a27 optionally bonded to each other to form a ring, In the formula (Har-7), R a28 With R a29 、R a29 With R a30 、R a30 With R a31 optionally bonded to each other to form a ring, In the formula (Har-8), R a32 With R a33 、R a33 With R a34 、R a34 With R a35 、R a35 With R a36 、R a36 With R a37 optionally bonded to each other to form a ring, In the formula (Har-9), R a38 With R a39 、R a39 With R a40 、R a40 With R a41 、R a41 With R a42 、R a42 With R a43 They are optionally bonded to each other to form a ring.

2. The composition according to claim 1, wherein R in the formula (1) 5 represents a group represented by formula (R-1), In formula (R-1), Indicates the connecting key, R 101 and R 102 Each independently represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms, Ar 101 represents an aryl group or a heteroaryl group, and n represents an integer of 1 or greater.

3. The composition according to claim 1, wherein In the formula (1), R 1 and R 2 One of them represents a cyano group and the other represents a group represented by the formula (Har-1), R 3 and R 4 One of represents a cyano group and the other represents a group represented by the formula (Har-1), In the formula (Har-1), R a1 ~R a4 represents a hydrogen atom, Indicates a connection key.

4. The composition according to claim 1 or claim 2, wherein The maximum absorption wavelength of the dye represented by the formula (1) exists at a wavelength of 650 nm or more.

5. The composition according to claim 1 or claim 2, further comprising a compound represented by formula (Pc), In formula (Pc), Rp 1 ~Rp 16 Each independently represents a hydrogen atom or a substituent, Rp 1 and Rp 4 At least one of represents an alkyl group, Rp 5 and Rp 8 At least one of represents an alkyl group, Rp 9 and Rp 12 At least one of represents an alkyl group, Rp 13 and Rp 16 At least one of represents an alkyl group, M 1 represents two hydrogen atoms, a divalent metal atom, or a divalent substituted metal atom including a trivalent or tetravalent metal atom. 6 . A film obtained using the composition according to claim 1 .

7. An optical filter comprising the film according to claim 6. A solid-state imaging element comprising the film according to claim 6 . 9 . An image display device comprising the film according to claim 6 . 10 . An infrared sensor comprising the film according to claim 6 .

11. A camera module comprising the film according to claim 6.

12. A compound represented by formula (1): In formula (1), R 1 and R 2 One of them represents a cyano group and the other represents a heteroaryl group represented by any one selected from the following formula (Har-1) to formula (Har-9), R 3 and R 4 One of them represents a cyano group and the other represents a heteroaryl group represented by any one selected from the following formula (Har-1) to formula (Har-9), R 5 represents an alkyl group, R 11 ~R 15 Each independently represents a hydrogen atom or a substituent, wherein, R 11 and R 14 wherein at least one of the substituents is a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a sulfamoyl group, an alkylthio group, a urea group, an aryloxy group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfonic group, or a group represented by formula (R-100), In the formula (R-100), L R1 represents an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -S-, or -NR L1 -, -CO-, -COO-, -OCO-, -SO2-, or an n+1 valent linking group consisting of a combination thereof, R L1 represents a hydrogen atom, an alkyl group or an aryl group, X R1 represents an acid group or a base, n represents an integer greater than 1, when n is 1, L R1 is optionally a single bond, Y 1 and Y 2 Each independently represents -BR Y1 R Y2 , R Y1 and R Y2 Each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group or a heteroaryloxy group, and R Y1 and R Y2 optionally bonded to each other to form a ring, In the above formulas (Har-1) to (Har-9), Indicates the connecting key, R a1 ~R a43 Each independently represents a hydrogen atom or a substituent, wherein the substituent is a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a sulfamoyl group, an alkylthio group, a urea group, an aryloxy group, a carboxyl group, a carbonyl group, a carboxylic acid amide group, a sulfonamide group, an imide group, a sulfonic group, or a group represented by the formula (R-100). In the formula (Har-1), R a1 With R a2 、R a2 With R a3 、R a3 With R a4 optionally bonded to each other to form a ring, In the formula (Har-2), R a5 With R a6 、R a6 With R a7 、R a7 With R a8 optionally bonded to each other to form a ring, In the formula (Har-3), R a9 With R a10 、R a10 With R a11 、R a11 With R a12 、R a12 With R a13 optionally bonded to each other to form a ring, In the formula (Har-4), R a15 With R a16 、R a16 With R a17 、R a17 With R a18 optionally bonded to each other to form a ring, In the formula (Har-5), R a19 With R a20 、R a20 With R a21 、R a21 With R a22 、R a22 With R a23 、R a23 With R a24 optionally bonded to each other to form a ring, In the formula (Har-6), R a25 With R a26 、R a26 With R a27 optionally bonded to each other to form a ring, In the formula (Har-7), R a28 With R a29 、R a29 With R a30 、R a30 With R a31 optionally bonded to each other to form a ring, In the formula (Har-8), R a32 With R a33 、R a33 With R a34 、R a34 With R a35 、R a35 With R a36 、R a36 With R a37 optionally bonded to each other to form a ring, In the formula (Har-9), R a38 With R a39 、R a39 With R a40 、R a40 With R a41 、R a41 With R a42 、R a42 With R a43 They are optionally bonded to each other to form a ring.

13. An infrared absorber comprising the compound according to claim 12.

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