Display device and method for manufacturing a display device

Abstract

Disclosed are a display device and a manufacturing method thereof. The display device includes a pixel electrode provided in an opening region, a common electrode having at least one region overlapping the pixel electrode in the opening region, a gate line extending in a row direction in a non-opening region surrounding the opening region, a data line extending along the non-opening region in a column direction perpendicular to the row direction, and a touch sensing line extending in the column direction through the opening region, wherein the opening region can have a shape in which a length of the opening region in the row direction is longer than a length of the opening region in the column direction.

Description

[0001] Cross-references to related applications

[0002] This application claims priority to Korean Patent Application No. 10-2021-0193659, filed on December 31, 2021, the entire contents of which are incorporated herein by reference. Technical Field

[0003] This disclosure relates to display devices and methods for manufacturing display devices. Background Technology

[0004] With the development of the information society, various types of display devices have been developed. Recently, various display devices, such as liquid crystal displays (LCDs), plasma display panels (PDPs), and organic light-emitting diode (OLEDs), have been used.

[0005] Recently, touchscreens capable of displaying images and sensing user touch have become widely used. Touchscreens can have attached, top-mounted, and embedded structures. Among these structures, touchscreens with embedded structures can reduce the thickness of display devices and improve their durability. Summary of the Invention

[0006] Technical issues

[0007] The embodiments described herein are for embedded structures and include a display device comprising a common electrode extending in the horizontal direction, and a method for manufacturing the display device.

[0008] Furthermore, the embodiments describe a display device in which touch sensing lines and source-drain electrodes are disposed on the same layer, and a method for manufacturing the display device.

[0009] Technical solution

[0010] An embodiment of the present disclosure includes: a pixel electrode disposed in an opening region; a common electrode having at least one region overlapping the pixel electrode in the opening region; a gate line extending in a row direction in a non-opening region surrounding the opening region; a data line extending along the non-opening region in a column direction perpendicular to the row direction; and a touch sensing line extending through the opening region in the column direction. The opening region has a shape in which the length of the opening region in the row direction is longer than the length of the opening region in the column direction.

[0011] In one embodiment, a method of manufacturing a display device according to an embodiment of the disclosure includes: forming a light-blocking layer on a substrate using a first mask, the substrate including an open area and a non-open area surrounding the open area; forming an active layer on the light-blocking layer using a second mask; forming gate lines extending in a row direction in the non-open area using a third mask; forming an interlayer insulating layer covering the gate lines; forming a first contact hole exposing one region of the active layer using a fourth mask; forming data lines extending in a column direction perpendicular to the row direction in the non-open area, and a touch sensing line extending in the column direction through the open area using a fifth mask; and forming a pixel electrode in the open area using a sixth mask, wherein the open area has a shape in which a length of the open area in the row direction is longer than a length of the open area in the column direction.

[0012] In one embodiment, a display device includes: a plurality of pixels including a pixel having an open area displaying an image and a non-open area not displaying the image, the open area having a length in a first direction longer than a length of the open area in a second direction different from the first direction; a plurality of gate lines connected to the plurality of pixels, the plurality of gate lines including a gate line extending in the first direction in the non-open area of the pixel; a plurality of data lines connected to the plurality of pixels, the plurality of data lines including a data line extending in the second direction in the non-open area of the pixel; a plurality of touch sensing lines including a touch sensing line extending in the second direction through the open area of the pixel; wherein the pixel includes a pixel electrode in the open area of the pixel and a common electrode having a portion overlapping the pixel electrode in the open area, the portion of the common electrode having a length in the first direction longer than a length of the portion of the common electrode in the second direction. BRIEF DESCRIPTION OF DRAWINGS

[0013] Figure 1 is a block diagram illustrating a configuration of a display device according to an embodiment of the disclosure.

[0014] Figure 2 is a plan view illustrating a structure of a touch sensing electrode and a touch sensing line according to an embodiment of the disclosure. Figure 1

[0015] Figure 3 is a cross-sectional view taken along line I-I' of Figure 2

[0016] Figure 4 is a cross-sectional view taken along line I-I' of Figure 3

[0017] Figure 5 is a cross-sectional view taken along line I-I' of​​​Figure 3 is a cross-sectional view taken along line II-II' of FIG. 1.

[0018] Figures 6 to 21 is a cross-sectional view illustrating a manufacturing method of a display device according to an embodiment of the disclosure.

[0019] Figure 22 is an enlarged plan view of a region of a display device according to an embodiment of the disclosure. DETAILED DESCRIPTION

[0020] Hereinafter, embodiments of the disclosure will be described with reference to the accompanying drawings. In this specification, when a part (or a region, a layer, a portion, etc.) is referred to as "on" another part, it means that the part can be directly connected / coupled to the other part or a third part can be disposed therebetween.

[0021] The same reference denotations mean the same components throughout the specification. Also, in the drawings, the thickness, proportions, and dimensions of the components are exaggerated for effective description of the technical content. "And / or" includes one or more combinations capable of being defined by the associated configuration.

[0022] The terms such as "first" and "second" can be used to describe various components, but the components are not limited by the terms. The terms are used for the purpose of distinguishing one component from other components only. For example, a first component can be referred to as a second component, and similarly, a second component can also be referred to as a first component without departing from the scope of the rights of the present embodiment. Unless the context clearly indicates otherwise, a singular expression includes a plural expression.

[0023] The terms such as "under", "below", "on", "above", and the like are used to describe the association of the components shown in the drawings. The terms are relative concepts and the terms are explained based on the direction indicated in the drawings.

[0024] It should be understood that the terms such as "include" or "have" are intended to indicate that there are features, numbers, steps, operations, components, parts, or combinations thereof described in the specification, and do not preclude the possibility of addition or presence of one or more other features, numbers, steps, operations, components, parts, or combinations thereof.

[0025] Figure 1 is a block diagram illustrating a configuration of a display device according to an embodiment of the disclosure.

[0026] Referring to Figure 1 , the display device 1 includes a timing controller 10, a gate driver 20, a data driver 30, a touch driver 40, and a display panel 50.

[0027] The timing controller 10 can receive an image signal RGB and a control signal CS from outside of the display apparatus (e.g., a host system). The image signal RGB can include a plurality of gradation data. The control signal CS can include, for example, a horizontal synchronization signal, a vertical synchronization signal, and a main clock signal.

[0028] The timing controller 10 processes the image signal RGB and the control signal CS according to an operating condition of the display panel 50, and can generate and output an image data DATA, a gate driving control signal CONT1, a data driving control signal CONT2, and a touch driving control signal CONT3.

[0029] The gate driver 20 can be connected to the pixels (or sub-pixels) PX of the display panel 50 through a plurality of gate lines GL1 to GLn. The gate driver 20 can generate a gate signal based on the gate driving control signal CONT1 output from the timing controller 10. The gate driver 20 can supply the generated gate signal to the pixels PX through the plurality of gate lines GL1 to GLn.

[0030] The data driver 30 can be connected to the pixels PX of the display panel 50 through a plurality of data lines DL1 to DLm. The data driver 30 can generate a data signal based on the data driving control signal CONT2 and the image data DATA output from the timing controller 10. The data driver 30 can supply the generated data signal to the pixels PX through the plurality of data lines DL1 to DLm. The data signal can be applied to the pixels PX of a pixel column selected by the gate signal. To this end, the data driver 30 can supply the data signal to the plurality of data lines DL1 to DLm to be synchronized with the gate signal.

[0031] The touch driver 40 can be connected to the pixels PX of the display panel 50 through a plurality of touch sensing lines SL1 to SLm. The touch driver 40 can generate a touch scan signal based on the touch driving control signal CONT3 output from the timing controller 10 and supply the touch scan signal to the pixels PX. The touch driver 40 can receive a touch sensing signal through the plurality of touch sensing lines SL1 to SLm and detect a touch input based on the received touch sensing signal.

[0032] A plurality of pixels PX can be disposed on the display panel 50. The pixels PX can be arranged in, for example, a matrix form on the display panel 50.

[0033] Each of the pixels PX can be electrically connected to a corresponding gate line and data line. The pixels PX can emit light having a luminance corresponding to a gate signal and a data signal supplied through the gate lines GL1 to GLn and the data lines DL1 to DLm.

[0034] Each pixel PX can display any one of a first color to a third color. According to an aspect, each pixel PX can display any one of a red color, a green color, and a blue color. According to another aspect, each pixel PX can display any one of a cyan color, a magenta color, and a yellow color. In various embodiments, the pixel PX can be configured to display any one of four or more colors. For example, each pixel PX can display any one of a red color, a green color, a blue color, and a white color.

[0035] The display panel 50 can be an in-cell touch type panel configured to be capable of sensing a touch input. For example, the display panel 50 can be configured to include a pixel electrode driven by receiving a common voltage during a display period within a frame and receiving a touch scan voltage during a touch detection period within a frame. The common voltage for displaying an image during the display period and the touch scan voltage for detecting a touch during the touch detection period can be applied to the pixel electrode of the pixel PX. The pixel electrode can operate as a display driving electrode of the liquid crystal together with the common electrode during the display period, and can operate as a touch sensing electrode TE for detecting a touch position during the touch detection period. The touch sensing electrode can be sequentially driven for a frame, but is not limited thereto.

[0036] The timing controller 10, the gate driver 20, the data driver 30, and the touch driver 40 can each be configured as a separate integrated circuit IC, or can be configured as an integrated circuit integrating at least a portion thereof. For example, at least one of the data driver 30 and the touch driver 40 can be integrated with the timing controller 10 to be configured as an integrated circuit.

[0037] Further, although the gate driver 20 and the data driver 30 are shown as components separate from the display panel 50 in Figure 1 , at least one of the gate driver 20 and the data driver 30 can be configured in an in-panel manner to be integrally formed with the display panel 50. For example, the gate driver 20 can be integrally formed with the display panel 50 according to a gate-in-panel (GIP) manner.

[0038] Figure 2 is a plan view illustrating a structure of a touch sensing electrode and a touch sensing line according to one embodiment. Figure 1 is a plan view illustrating a structure of a touch sensing electrode and a touch sensing line according to one embodiment.

[0039] Referring to Figure 2 , the display panel 50 can include a plurality of touch sensing electrodes TE. The touch sensing electrodes TE can include one or more common electrodes 320.

[0040] Each touch sensing electrode TE is connected to a corresponding touch sensing line SL. The touch sensing electrode TE and the touch sensing line SL can be connected to each other in a one-to-one relationship. For example, each touch sensing line SL can be connected to one common electrode 320 provided in one touch sensing electrode TE.

[0041] The touch sensing line SL can transmit a common voltage to the touch sensing electrode TE connected to the touch sensing line SL during a display period, and transmit a touch scan signal to the touch sensing electrode TE during a touch sensing period. In addition, the touch sensing line SL can sense a change in an electrical characteristic (e.g., a change in a capacitive load) of the touch sensing electrode TE, and output as an electrical signal.

[0042] The touch scan signal supplied through the touch sensing line SL can be a plurality of clock signals. When a user touches the display panel 50 using a finger or an electronic pen, a capacitance is formed between the touch sensing electrodes TE. A touch input can be detected. When a user touches the display panel 50 using a finger or an electronic pen, a capacitance is formed between the touch sensing electrodes TE, and a touch input can be detected by comparing the formed capacitance with a reference capacitance.

[0043] Figure 3 is a plan view of a region AA according to one embodiment. Figure 2 is a plan view of a region AA according to one embodiment.

[0044] Each pixel PX includes an open region OA in which an image is displayed by an electric field between the common electrode 320 and the pixel electrode 310, and a non-open region NOA surrounding the open region, the non-open region NOA having a driving element, e.g., a thin film transistor 200 provided to drive the common electrode 320 and the pixel electrode 310 in the open region OA. Here, the open region OA can be a display region in which an image is displayed, and the non-open region NOA can be a non-display region in which an image is not displayed. The open region OA and the non-open region NOA can be alternately provided in the row direction X. In the present embodiment, the open region OA can have a shape in which a length in the row direction X can be equal to or longer than a length in the column direction Y.

[0045] The common electrode 320 receives a common voltage during a display period in a frame, and forms an electric field with the pixel electrode 310. The common electrode 320 includes branch portions 321 (e.g., protrusions) arranged side by side at equal intervals in the column direction Y, and stem portions 322 (e.g., connection portions) connecting the branch portions 321 to each other. By providing the branch portions 321 at equal intervals in the column direction Y, the distance between each pair of adjacent branch portions 321 is the same. The branch portions 321 can extend substantially in the row direction X within the opening region OA, and the stem portions 322 can extend in the column direction Y while connecting the branch portions 321 to each other at both ends of the branch portions 321. Here, the length of the branch portions 321 can be formed longer than the length of the stem portions 322. The common electrode 320 is formed overall in the opening region OA, and the common electrode 320 can be arranged in a manner such that it spreads from the opening region OA toward the non-opening region NOA.

[0046] The pixel electrode 310 can be formed extensively in the opening region OA. When the opening region OA is formed in a manner such that the length in the row direction X is longer than the length in the column direction Y, the pixel electrode 310 can have a substantially rectangular shape along the shape of the opening region OA, in which the length in the row direction X is longer than the length in the column direction Y.

[0047] The data line DL, the gate line GL, and a drive element such as the thin-film transistor 200 can be provided in the non-opening region NOA provided between the opening regions OA of adjacent pixel columns.

[0048] The data line DL extends in the column direction Y in the non-opening region NOA provided between the opening regions OA of adjacent pixel columns. The data line DL is connected to the pixel electrode 310, and can transmit a data signal to the pixel electrode 310.

[0049] The gate line GL extends in the row direction X in the non-opening region NOA provided between the opening regions OA of adjacent pixel rows.

[0050] The touch sensing line SL passes through the opening region OA and extends in the column direction Y. The touch sensing line SL is provided on the same layer as the data line DL provided in the non-opening region NOA. The touch sensing line SL is formed in the column direction Y passing through the opening region OA, and thus does not overlap the data line DL. Here, the data line DL and the touch sensing line SL can be alternately provided in the row direction X on the display panel 50.

[0051] The thin-film transistor 200 includes a gate electrode 220 connected to the gate line GL, a source electrode 230 connected to the data line DL, and a drain electrode 240 spaced apart from the source electrode 230. The drain electrode 240 of the thin-film transistor 200 can be connected to the pixel electrode 310 through a contact hole.

[0052] As illustrated, the pixel PX according to the present embodiment has a horizontal electrode structure in which the opening region OA of the pixel PX extends substantially in the row direction X and the branch portion 321 of the common electrode 320 extends substantially in the row direction X.

[0053] Hereinafter, a detailed stack structure of the above-described pixel structure will be described in detail.

[0054] Figure 4 is a cross-sectional view taken along the line I-I' of Figure 3 , and Figure 5 is a cross-sectional view taken along the line II-II' of Figure 3 , according to one embodiment.

[0055] Referring to Figure 3 along with Figure 4 and Figure 5 , the display device 1 according to the embodiment includes a substrate 100, circuit elements provided on the substrate, and a common electrode 320 and a pixel electrode 310 for displaying an image.

[0056] The substrate 100 can be a light-transmissive substrate, which serves as a base substrate of the display panel 50. The substrate 100 can be a rigid substrate including glass or tempered glass, or a flexible substrate made of a plastic material. For example, the substrate 100 can be formed of a plastic material such as polyimide, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), or the like. However, the material of the substrate 100 is not limited thereto.

[0057] An opening region OA and a non-opening region NOA are formed on the substrate 100. The opening region OA can be defined as a region in which an image is displayed according to an electric field between the pixel electrode 310 and the common electrode 320. The non-opening region NOA can be defined as a region in which a driving element (e.g., a thin film transistor 200) and a wiring for driving the pixel electrode 310 in the opening region OA are provided.

[0058] A light-blocking layer 110 can be formed on the substrate 100. The light-blocking layer 110 is provided to overlap with a semiconductor pattern (e.g., a channel region (CH1, CH2) of the active layer 210 in a plan view) of the thin film transistor 200, thereby protecting the oxide semiconductor device from external light.

[0059] The buffer layer 120 covers the light-blocking layer 110. The buffer layer 120 can prevent or at least reduce diffusion of ions or impurities from the substrate 100 and block or at least reduce penetration of moisture. In addition, the buffer layer 120 can improve the surface flatness of the substrate 100. The buffer layer 120 can include inorganic materials such as oxides and nitrides, organic materials, or organic-inorganic composite materials, and the buffer layer 120 can be formed in a single layer or a multi-layer structure. For example, the buffer layer 120 can have a three-layer or more structure composed of silicon oxide, silicon nitride, and silicon oxide.

[0060] The active layer 210 is formed on the buffer layer 120. The active layer 210 can be formed of a silicon-based semiconductor material or an oxide-based semiconductor material. Amorphous silicon or polysilicon can be used as the silicon-based semiconductor material. The oxide-based semiconductor material includes quaternary metal oxides such as indium tin gallium zinc oxide (InSnGaZnO), ternary metal oxides such as indium gallium zinc oxide (InGaZnO), indium tin zinc oxide (InSnZnO), indium aluminum zinc oxide (InAlZnO), tin gallium zinc oxide (SnGaZnO), aluminum gallium zinc oxide (AlGaZnO), and tin aluminum zinc oxide (SnAlZnO), binary metal oxides such as indium zinc oxide (InZnO), tin zinc oxide (SnZnO), aluminum zinc oxide (AlZnO), zinc magnesium oxide (ZnMgO), tin magnesium oxide (SnMgO), indium magnesium oxide (InMgO), indium gallium oxide (InGaO), and indium oxide (InO), tin oxide (SnO), and zinc oxide (ZnO), etc.

[0061] The active layer 210 can include source and drain regions containing p-type or n-type impurities, and channel regions CH1 and CH2 formed between the source and drain regions. In an embodiment, at least two channel regions CH1 and CH2 spaced apart from each other can be formed between the source and drain regions in the active layer 210. In this case, the two channel regions CH1 and CH2 spaced apart from each other by the curved shape of the active layer 210 can be arranged side by side in the row direction X. However, the shape of the active layer 210 is not limited thereto. For example, in another embodiment, one channel region CH1 or CH2 can be formed in the active layer 210, and the active layer 210 can be formed in a straight bar shape without being curved.

[0062] The gate insulating layer 130 can be formed on the active layer 210. The gate insulating layer 130 can be silicon oxide (SiOx), silicon nitride (SiNx), or a plurality of layers thereof.

[0063] A first conductive layer is formed on the gate insulating layer 130. The first conductive layer can include a gate electrode 220. Further, the first conductive layer can also include a gate line GL. In an embodiment, the gate line GL is formed to extend at one side of the opening area OA substantially in the row direction X.

[0064] Here, the gate electrode 220 can be disposed to overlap the channel regions of the corresponding active layers 210. As shown, when two channel regions CH1 and CH2 are formed on the active layer 210, the gate electrode 220 is disposed to overlap the two channel regions CH1 and CH2 and can constitute a thin film transistor 200 having a dual gate structure.

[0065] The gate electrode 220 can be integrally formed with the gate line GL electrically connected to the gate electrode 220 to configure one pattern. For example, the gate electrode 220 can be a region on the gate line GL overlapping the channel regions CH1 and CH2 of the active layer 210.

[0066] The interlayer insulating layer 140 can cover the first conductive layer. The interlayer insulating layer 140 can be silicon oxide (SiOx), silicon nitride (SiNx), or a multilayer thereof.

[0067] A second conductive layer is formed on the interlayer insulating layer 140. The second conductive layer can include a source electrode 230 and a drain electrode 240. Further, the second conductive layer can also include a data line DL. The source electrode 230 and the drain electrode 240 can be connected to the source region and the drain region of the active layer 210, respectively. According to an embodiment, at least one of the source electrode 230 and the drain electrode 240 can be integrally formed with the electrically connected data line DL to form one pattern. For example, the source electrode 230 can be a region of the data line DL disposed on the same layer.

[0068] In an embodiment, the data line DL extends in the column direction Y in the non-opening area NOA. In such an embodiment, the source electrode 230 and the drain electrode 240 are a region on the data line DL extending in the column direction Y or a region branched from the extending data line DL.

[0069] In the present embodiment, the second conductive layer can also include a touch sensing line SL. The touch sensing line SL passes through the opening area OA and extends in the column direction Y. The touch sensing line SL is disposed on the same layer as the data line DL disposed in the non-opening area NOA. For example, the data line DL and the touch sensing line SL can be alternately disposed in the row direction X on the display panel 50.

[0070] In an embodiment, the data lines DL and the touch sensing lines SL can be disposed to overlap each other on different layers. In such an embodiment, a planarization layer or the like can be interposed between the data lines DL and the touch sensing lines SL. The planarization layer can be provided to mitigate step differences in the underlying structure.

[0071] However, in the present embodiment, the data lines DL and the touch sensing lines SL are disposed on the same layer while being spaced apart from each other. In this case, the source and drain electrodes 230, 240, the data lines DL, and the touch sensing lines SL can be formed in a single process. Further, since the data lines DL and the touch sensing lines SL are on the same layer due to being formed during the single process, the process of forming a planarization layer is omitted. Thus, it is possible to simplify the manufacturing process of the display device 1 according to the present embodiment and to reduce the number of masks required for the process, and to reduce the production cost thereof.

[0072] The second conductive layer can be covered by the first passivation layer 150.

[0073] According to an embodiment, a third conductive layer can be formed on the first passivation layer 150. The third conductive layer can include, for example, a dummy line. In an embodiment in which the data lines DL and the touch sensing lines SL are disposed on different layers to overlap each other, the dummy line is disposed to overlap the data lines DL and the touch sensing lines SL in at least a portion. The dummy line can be electrically floating during a driving period to distribute noise through the wiring and can reduce noise of a touch sensing signal detected through the touch sensing lines SL.

[0074] However, in the present embodiment, since the touch sensing lines SL are spaced apart from the data lines DL, noise of other wiring is reduced. Thus, the dummy line is not required, and the process of forming the third conductive layer can be omitted. Thus, it is possible to simplify the manufacturing process of the display device 1 according to the present embodiment and to reduce the number of masks required for the process, and to reduce the production cost thereof.

[0075] The pixel electrode 310 is formed on the first passivation layer 150. The pixel electrode 310 can be widely formed within the opening area OA. When the opening area OA is formed in a manner such that a length in the row direction X is longer than a length in the column direction Y, the pixel electrode 310 can have a substantially rectangular shape along the shape of the opening area OA, in which the length in the row direction X is longer than the length in the column direction Y. Further, the pixel electrode 310 can be disposed to overlap the touch sensing lines SL passing through the opening area OA in at least one region.

[0076] The pixel electrode 310 can be covered by the second passivation layer 160. The first passivation layer 150 and the second passivation layer 160 can be a silicon oxide film (SiOx), a silicon nitride film (SiNx), or a multilayer thereof, as an insulating layer for protecting covered elements.

[0077] The common electrode 320 can be formed on the second passivation layer 160. The common electrode 320 is formed in the opening area OA in general, and can be arranged to extend from the opening area to the non-opening area NOA. The common electrode 320 is electrically connected to the touch sensing line SL through the contact hole.

[0078] In an embodiment, the common electrode 320 can include branch portions 321 arranged side by side at equal intervals and stem portions 322 connecting the branch portions 321 to each other. The branch portions 321 can extend in the row direction X within the opening area OA, and the stem portions 322 can extend in the column direction Y while connecting the branch portions 321 to each other at both ends of the branch portions 321. Here, the length of the branch portions 321 can be formed longer than the length of the stem portions 322.

[0079] The cover substrate 400 can be disposed on the substrate 100. The color filter 410 can be formed on the cover substrate 400. The color filter 410 can be disposed to overlap the opening area OA. The color filter 410 is a wavelength-selective optical filter that selectively transmits only a partial wavelength band of incident light, so that light in a certain wavelength band is transmitted and light in another certain wavelength band is blocked, and the color filter 410 can be composed of a photosensitive resin containing a colorant such as a pigment or a dye. Light passing through the color filter 410 in the opening area OA can have any one of red, green, and blue. The color filter 410 can be omitted for the pixel PX when the pixel PX displays white.

[0080] The black matrix 420 can be disposed between the color filters 410 of each color. The black matrix 420 is disposed around the color filter 410 between adjacent color filters 410, and can prevent light leakage and color mixing between pixels PX of each color.

[0081] In an embodiment, the black matrix 420 is disposed to overlap the touch sensing line SL in at least one region. Such a black matrix 420 has a pattern in which at least one region passes through the opening area OA and extends in the column direction Y.

[0082] In an embodiment, a concavo-convex pattern can be formed on the common electrode 320. The concavo-convex pattern is disposed to overlap the black matrix, so that color mixing between adjacent pixels PX can be prevented. In the present embodiment, the touch sensing line SL is disposed to overlap the black matrix 420, so that a substantially double-layered black matrix 420 can be implemented. In the present embodiment, by such a structure, reduction in aperture ratio of the pixel PX can be reduced, color mixing can be prevented or at least reduced, and an increase in thickness of the black matrix can be prevented.

[0083] A light emitting control device such as a liquid crystal layer can be included between the substrate 100 and the cover substrate 400.

[0084] Hereinafter, a manufacturing method of the display device 1 having the above-described structure will be described in detail.

[0085] Figures 6 to 21 is a cross-sectional view illustrating a manufacturing method of a display device according to an embodiment of the present disclosure.

[0086] Referring to Figure 6 and Figure 7 , a light blocking layer 110 can be formed on the substrate 100. The light blocking layer 110 can be produced by forming a conductive film on the substrate 100 through a printing process, a sputtering process, a chemical vapor deposition process, a pulsed laser deposition (PLD) process, a vacuum deposition process, an atomic layer deposition process, or the like, and performing patterning using a mask through an etching process. Here, a first mask can be used.

[0087] Thereafter, referring to Figure 8 and Figure 9 , a buffer layer 120 can be formed on the light blocking layer 110. The buffer layer 120 can be formed by a chemical vapor deposition process, a spin coating process, a plasma enhanced chemical vapor deposition process, a sputtering process, a vacuum deposition process, a high-density plasma chemical vapor deposition process, a printing process, or the like.

[0088] An active layer 210 can be formed on the buffer layer 120. For example, an amorphous silicon layer can be formed on the buffer layer 120, and the amorphous silicon layer can be crystallized to form a polysilicon layer. Thereafter, the polysilicon layer is subjected to patterning by photolithography or the like, thereby forming the active layer 210. Here, a second mask can be used for the photolithography process. Impurities are injected into the polysilicon layer constituting the active layer 210, so that a source region, a drain region, and a channel CH can be formed.

[0089] Referring to Figure 10 and Figure 11The gate insulating layer 130 can be formed on the active layer 210. The gate insulating layer 130 can be formed by a chemical vapor deposition process, a spin coating process, a plasma enhanced chemical vapor deposition process, a sputtering process, a vacuum deposition process, a high-density plasma chemical vapor deposition process, a printing process, or the like.

[0090] The first conductive layer can be formed on the gate insulating layer 130. For example, the gate electrode 220 and the gate line GL connected thereto can be formed on the gate insulating layer 130. The gate electrode 220 can be formed in one pattern integrally formed with the gate line GL. In an embodiment, the gate line GL can be formed in a shape extending substantially in the row direction X.

[0091] The first conductive layer is formed by forming a conductive film on the gate insulating layer 130 using a printing process, a sputtering process, a chemical vapor deposition process, a pulsed laser deposition process, a vacuum deposition process, an atomic layer deposition process, or the like, and performing patterning by an etching process using a mask. Here, a third mask can be used.

[0092] Referring to Figure 12 and Figure 13 The interlayer insulating layer 140 can be formed to cover the first conductive layer. The first contact hole H1 for contacting the second conductive layer and the bottom layer can be formed in the interlayer insulating layer 140. Specifically, the interlayer insulating layer 140 is formed on the entire surface of the substrate 100, and a mask process is performed to expose one region of the active layer 210 corresponding to the region of the first contact hole H1 upward. A fourth mask can be used in forming the first contact hole H1.

[0093] Referring to Figure 14 and Figure 15 The second conductive layer can be formed on the interlayer insulating layer 140. For example, the source electrode 230 and the drain electrode 240 and the data line DL connected to at least one of them can be formed on the interlayer insulating layer 140. In an embodiment, the source electrode 230 can be formed in one pattern integrally formed with the data line DL. In an embodiment, the data line DL can be formed to extend substantially in the column direction Y.

[0094] In an embodiment, the touch sensing line SL can be further formed on the interlayer insulating layer 140. The touch sensing line SL can be formed to be spaced apart from the data line DL and to extend substantially in the column direction Y.

[0095] The second conductive layer is formed by forming a conductive film on the interlayer insulating layer 140 using a printing process, a sputtering process, a chemical vapor deposition process, a pulsed laser deposition process, a vacuum deposition process, an atomic layer deposition process, or the like, and performing patterning by an etching process using a mask. Here, a fifth mask can be used.

[0096] Referring to Figure 16 and Figure 17 , a first passivation layer 150 can be formed on the second conductive layer. Further, a pixel electrode 310 can be formed on the first passivation layer 150. The pixel electrode 310 is patterned using a mask through an etching process to be formed to correspond to the opening area OA. Here, a sixth mask can be used.

[0097] Referring to Figure 18 and Figure 19 , a second passivation layer 160 can be formed on the pixel electrode 310. Thereafter, contact holes H2 and H3 for contacting the pixel electrode 310 and the bottom layer, for example, the drain electrode 240 can be formed. For example, the second contact hole H2 is formed to penetrate the second passivation layer 160 and can connect the pixel electrode 310 and an island pattern of the common electrode 320 to be formed later, and the third contact hole H3 is formed to penetrate the second passivation layer 160 and the first passivation layer 150 and can connect the drain electrode 240 and the island pattern 324 of the common electrode 320.

[0098] Further, a contact hole H4 for connecting the touch sensing line SL and the common electrode 320 can be further formed. For example, the fourth contact hole H4 is formed to penetrate the first passivation layer 150 and the second passivation layer 160 and thus can connect the common electrode 320 and the touch sensing line SL Figure 5 ). These contact holes H2, H3, and H4 can be formed through a mask process, and here, an eighth mask can be used.

[0099] Referring to Figure 20 and Figure 21 , the common electrode 320 is formed on the second passivation layer 160. The common electrode 320 is formed to include branch portions 321 arranged side by side at equal intervals and stem portions 322 connecting the branch portions 321. The branch portions 321 extend substantially in the row direction X within the opening area OA, and the stem portions 322 are formed to extend in the column direction Y while connecting the branch portions 321 to each other at both ends of the branch portions 321. The common electrode 320 can be formed to have a corresponding shape by performing a mask process. In this case, an eighth mask can be used.

[0100] A portion of the common electrode 320 can be formed as an island pattern 324 overlapping the second contact hole H2 and the third contact hole H3. The island pattern 324 can have various shapes such as a circular shape, an elliptical shape, and a polygonal shape. The island pattern can be connected to the pixel electrode 310 and the drain electrode 240 through the second contact hole H2 and the third contact hole H3 and thus can electrically connect them.

[0101] In the display device 1 according to the present embodiment, the stacked structure of the substrate 100 is manufactured by eight mask processes as described above. In another embodiment, the number of mask processes required is further increased in an embodiment in which the touch sensing lines SL are formed on a separate upper conductive layer or an embodiment in which dummy lines are required. Furthermore, when a concavo-convex pattern is additionally formed, the number of mask processes required can increase to 11.

[0102] However, in the present embodiment, since the substrate 100 can be manufactured by eight mask processes, the manufacturing process can be simplified and the manufacturing cost can be reduced.

[0103] Figure 22 is an enlarged plan view of a region of the display device according to an embodiment. Specifically, Figure 22 Four adjacent touch blocks TB1 to TB4 are shown.

[0104] The respective touch blocks TB1 to TB4 can correspond to a plurality of pixels. The common electrodes 320 of the pixels included in each of the touch blocks TB1 to TB4 can be connected to each other and used as one touch sensing electrode TE (refer to Figure 2 ). At the boundaries between the different touch blocks TB1 to TB4, the common electrodes 320 are not connected to each other and are separated.

[0105] As described with reference to Figure 3 and Figure 5 , the touch sensing electrodes TE can be connected to the touch sensing lines SL through the contact holes to transmit the touch scan signal. As shown, the touch sensing lines SL are not provided at the boundaries between the touch blocks TB1 to TB4, and no contact regions for connecting the touch sensing lines SL are formed.

[0106] The display device according to the present embodiment and the manufacturing method thereof can secure the required transmittance of the display panel and improve the viewing angle of the display panel.

[0107] Furthermore, the display device according to the present embodiment and the manufacturing method thereof can reduce the number of masks during the manufacturing process and reduce the manufacturing cost by omitting components.

[0108] It will be understood by those of ordinary skill in the art to which the present disclosure pertains that the present disclosure can be implemented in other specific forms without changing the technical spirit or essential characteristics thereof. Therefore, it should be understood that the above-described embodiments are exemplary in all aspects and are not limited. The scope of the present disclosure is indicated by the appended claims rather than the scope of the specification, and it should be understood that all changes or modifications derived from the meaning and scope of the claims and their equivalents are included in the scope of the present disclosure.

Claims

1. A display device, comprising: Pixel electrodes in the opening region; A common electrode, wherein the common electrode has at least one region overlapping with the pixel electrode in the opening region; Gate lines extending in the row direction in a non-opening region, the non-opening region surrounding the opening region; A data line that extends along the non-opening region in a column direction perpendicular to the row direction; A thin-film transistor, the thin-film transistor including a source electrode connected to the data line and a drain electrode connected to the pixel electrode; as well as A touch sensing line extends in the column direction through the opening region. The touch sensing line is on the same layer as the data line, the source electrode, and the drain electrode. The data line is located between the source electrode and the drain electrode on the same layer in at least one region, and the touch sensing line does not overlap with the data line. The opening region has a shape in which the length of the opening region in the row direction is longer than the length of the opening region in the column direction.

2. The display device according to claim 1, wherein, The pixel electrode has a rectangular shape in which the length of the pixel electrode in the row direction is longer than the length of the pixel electrode in the column direction.

3. The display device according to claim 1, wherein, The common electrode includes: A plurality of branches extending along the row direction in the opening region, the plurality of branches being arranged at equal intervals in the column direction, such that the distance between each pair of adjacent branches is the same; and A stem that connects the plurality of branches together, the stem extending in the column direction.

4. The display device according to claim 1, further comprising: Color filter in the opening area; as well as A black matrix surrounding the color filter and overlapping with the touch sensing line.

5. The display device according to claim 1, further comprising: A substrate, the substrate including the opening region and the non-opening region; A first conductive layer on the substrate, the first conductive layer including the gate line; A second conductive layer on the first conductive layer, the second conductive layer including the data line and the touch sensing line; as well as Passivation layer on the second conductive layer, The pixel electrode is located on the passivation layer, and the common electrode is located on the pixel electrode.

6. A method for manufacturing a display device, the method comprising: A light-blocking layer is formed on a substrate using a first mask, the substrate including an opening region and a non-opening region surrounding the opening region; An active layer is formed on the light-blocking layer using a second mask; A third mask is used to form gate lines extending in the row direction in the non-opening region; Form an interlayer insulating layer covering the gate lines; A first contact hole is formed using a fourth mask to expose a region of the active layer; A data line extending in the column direction perpendicular to the row direction in the non-opening area is formed using a fifth mask, and a touch sensing line extending in the column direction through the opening area; as well as A sixth mask is used to form pixel electrodes in the opening region. The opening region has a shape in which the length of the opening region in the row direction is longer than the length of the opening region in the column direction.

7. The method for manufacturing a display device according to claim 6, wherein, Forming the gate line includes forming a gate electrode of a transistor that overlaps with the channel region of the active layer, and The formation of the data line and the touch sensing line includes forming the drain electrode and source electrode of the transistor that overlap with the first contact hole.

8. The method for manufacturing a display device according to claim 7, further comprising: A passivation layer is formed covering the pixel electrode; A second contact hole is formed using a seventh mask to expose a region of the drain electrode; as well as An eighth mask is used to form a common electrode having at least one region overlapping with the pixel electrode, the common electrode being connected to the drain electrode through the second contact hole.

9. The method for manufacturing a display device according to claim 8, wherein, The data line and the touch sensing line are formed on the same layer and do not overlap each other.

10. The method of manufacturing a display device according to claim 8, wherein, The pixel electrode has a rectangular shape in which the length of the pixel electrode in the row direction is longer than the length of the pixel electrode in the column direction.

11. The method of manufacturing a display device according to claim 8, wherein, The common electrode is patterned to include: A plurality of branches extending along the row direction in the opening region, the plurality of branches being arranged at equal intervals in the column direction, such that the distance between each pair of adjacent branches is the same; and A stem that connects the plurality of branches together, the stem extending in the column direction.

12. The method of manufacturing a display device according to claim 8, further comprising: A color filter is formed in the opening region; as well as A black matrix is ​​formed around the color filter and overlaps with the touch sensing line.

13. A display device, comprising: Multiple pixels, including pixels having an open area for displaying an image and a non-open area for not displaying the image, wherein the length of the open area in a first direction is longer than the length of the open area in a second direction, the second direction being different from the first direction; A plurality of gate lines connected to the plurality of pixels, the plurality of gate lines including gate lines extending along the first direction in the non-opening region of the pixel; A plurality of data lines connected to the plurality of pixels, the plurality of data lines including data lines extending along the second direction in the non-opening region of the pixels; A plurality of thin-film transistors, each thin-film transistor including a source electrode connected to one of the plurality of data lines and a drain electrode connected to one of the plurality of pixel electrodes included in the plurality of pixels; as well as A plurality of touch sensing lines, including touch sensing lines extending in the second direction through the opening region of the pixel, wherein the touch sensing lines are on the same layer as the data lines, the source electrode and the drain electrode of one of the plurality of thin-film transistors, the data lines being located between the source electrode and the drain electrode on the same layer in at least one region, and the touch sensing lines not overlapping the data lines. The pixel includes a pixel electrode in the opening region of the pixel and a common electrode in the opening region having a portion overlapping with the pixel electrode, wherein the length of the portion of the common electrode in the first direction is longer than the length of the portion of the common electrode in the second direction.

14. The display device according to claim 13, wherein, The portion of the common electrode in the opening region includes a plurality of protrusions extending in the opening region along the first direction, the plurality of protrusions being arranged at equal intervals in the second direction such that the distance between each pair of adjacent protrusions is the same.

15. The display device according to claim 14, wherein, The common electrode also includes a connecting portion extending along the second direction in the non-opening region, the connecting portion connecting the plurality of protrusions together.

16. The display device according to claim 13, wherein, The pixel electrode has a rectangular shape in which the length of the pixel electrode in the first direction is longer than the length of the pixel electrode in the second direction.

17. The display device according to claim 13, further comprising: substrate; A first conductive layer on the substrate, the first conductive layer including the gate line; A second conductive layer on the first conductive layer, the second conductive layer including the data line and the touch sensing line; as well as Passivation layer on the second conductive layer, The pixel electrode is located on the passivation layer, and the common electrode is located on the pixel electrode.

18. The display device according to claim 13, further comprising: Color filter in the opening area; as well as A black matrix surrounding the color filter and overlapping with the touch sensing line.

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