A polishing pad cleaning apparatus

Abstract

The present application relates to a kind of polishing pad cleaning equipment, polishing pad cleaning equipment includes workbench, polishing pad fixing station and cleaning component set on workbench;Polishing pad fixing station is equipped with the load-bearing surface for placing polishing pad, load-bearing surface is distributed with multiple air holes, air hole is used to communicate with vacuum pump, polishing pad fixing station is rotatably connected with workbench, so that polishing pad fixing station can rotate around its center axis;Cleaning component is oppositely arranged with polishing pad fixing station, for cleaning polishing pad.Compared with prior art, air hole is provided on polishing pad fixing station, air hole can communicate with vacuum pump, and polishing pad is tightly fixed on load-bearing surface by suction force, so when polishing pad fixing station rotates around workbench, it can drive polishing pad to rotate relative to cleaning component, so that cleaning component can clean the slag on each position of polishing pad, effectively improve the polishing pad cleaning efficiency.

Description

Technical Field

[0001] This invention relates to the field of polishing pad cleaning, and more particularly to a polishing pad cleaning device. Background Technology

[0002] Electronic wafers are formed by depositing different layered materials. Silicon wafers are one of the substrates for layered materials. When each new material layer is deposited, a grinding or polishing step is often required to remove excess deposited material and planarize the wafer. Therefore, this polishing process is often called Chemical Mechanical Polishing (CMP). Since wafers are formed by stacking various thin film material layers, multiple CMP polishing steps are necessary to uniformly remove the material layers from the wafer surface and achieve planarization.

[0003] During chemical mechanical polishing (CMP), a chemical polishing slurry is introduced between the wafer and the polishing pad. The deposited thin film material layer is removed from the wafer surface through chemical interaction with the slurry or through mechanical interaction with particles in the slurry. Grooves are typically etched into the polishing surface of the polishing pad. These grooves increase the friction between the pad and the wafer, ensure uniform distribution of the polishing slurry on the pad's surface, and allow abrasive particles and polishing debris suspended in the slurry to flow out of the pad's surface along the grooves.

[0004] After grooving the polishing pad, the debris left behind is distributed on the polishing surface and grooves of the pad. On the one hand, the debris in the grooves can clog the grooves, affecting the distribution and flow of the polishing fluid in the grooves and reducing the planarization effect; on the other hand, the debris on the polishing surface can rub against the wafer, damaging the wafer surface. Therefore, a specialized device is needed to perform deep cleaning of the polishing pad after grooving. Summary of the Invention

[0005] The purpose of this invention is to overcome the shortcomings of the prior art and provide a polishing pad cleaning device to improve the cleaning of polishing pads.

[0006] The objective of this invention can be achieved through the following technical solutions:

[0007] A polishing pad cleaning device, the polishing pad cleaning device comprising:

[0008] Workbench;

[0009] A polishing pad fixing platform is provided on the worktable. The polishing pad fixing platform is provided with a bearing surface for placing the polishing pad. Multiple air holes are distributed on the bearing surface. The air holes are used to communicate with a vacuum pump. The polishing pad fixing platform is rotatably connected to the worktable, so that the polishing pad fixing platform can rotate around its own central axis.

[0010] A cleaning component is disposed opposite to the polishing pad fixing platform and is used to clean the polishing pad.

[0011] In one embodiment, the workbench is provided with a horizontal slide rail, the cleaning component slides in cooperation with the horizontal slide rail, and the guiding direction of the horizontal slide rail is parallel to the bearing surface.

[0012] In one embodiment, the horizontal slide rail includes a slide rail bracket, a first horizontal slide rail, and a second horizontal slide rail. The first horizontal slide rail is disposed on the slide rail bracket, and the slide rail bracket is slidably engaged with the second horizontal slide rail. The guiding direction of the second horizontal slide rail is parallel to the bearing surface and perpendicular to the guiding direction of the first horizontal slide rail.

[0013] In one embodiment, the second horizontal slide rail includes a drive motor, a transmission screw, and a sliding rod. The transmission screw and the sliding rod are respectively disposed on both sides of the polishing pad fixing platform. One end of the transmission screw is connected to the drive motor, and both ends of the slide rail bracket are slidably engaged with the transmission screw and the sliding rod, respectively.

[0014] In one embodiment, the polishing pad cleaning device includes a lead screw protective shell and a transmission block. The drive motor and the lead screw are both located inside the lead screw protective shell. The transmission block is connected to the lead screw in a transmission connection, and the transmission block passes through the lead screw protective shell and is connected to the slide rail bracket.

[0015] In one embodiment, the polishing pad cleaning device includes a plurality of compressible protective covers and a sliding block. The sliding block is connected to the slide rail bracket and slides in cooperation with the sliding rod. The plurality of compressible protective covers are fitted onto the sliding rod and distributed on both sides of the sliding block.

[0016] In one embodiment, the workbench is provided with a first wire storage box arranged in parallel with the first horizontal slide rail and a second wire storage box arranged in parallel with the second horizontal slide rail. Both the first wire storage box and the second wire storage box include multiple storage sections that are hinged sequentially along the length direction. The wires of the drive motor pass through the first wire storage box and the second wire storage box in sequence and are connected to the power supply.

[0017] In one embodiment, a vertical slide rail is provided on the first horizontal slide rail, the vertical slide rail is slidably engaged with the first horizontal slide rail, the cleaning component is slidably engaged with the vertical slide rail, and the guiding direction of the vertical slide rail is perpendicular to the bearing surface.

[0018] In one embodiment, the workbench is provided with a limiting platform, and the cleaning component is provided with a position-adjustable limiting rod. One end of the limiting rod points towards the limiting platform. When the cleaning component slides along the vertical slide rail close to the bearing surface, the limiting rod abuts against the limiting platform, thereby limiting the minimum distance between the cleaning component and the bearing surface.

[0019] In one embodiment, the cleaning component is provided with a thickness gauge, and the thickness gauge is provided with a measuring head for pressing against the limiting platform. The distance between the measuring head and the limiting platform is less than the distance between the limiting rod and the limiting platform.

[0020] In one embodiment, the polishing pad cleaning device includes a rotation sensor connected to the polishing pad mounting platform for monitoring the number of rotations of the polishing pad mounting platform.

[0021] In one embodiment, the polishing pad cleaning device includes a signal generator and a signal receiver. The signal receiver is disposed on the worktable, and the signal generator is disposed on the polishing pad fixing platform. The signal generator and the signal receiver are arranged opposite to each other to determine the rotation starting point of the polishing pad fixing platform.

[0022] In one embodiment, the cleaning assembly includes a cleaning bracket and a cleaning brush, the cleaning brush including a roller brush rotatably connected to the cleaning bracket, the roller brush being rotatable about its own axis, and the axis of the roller brush being parallel to the bearing surface.

[0023] In one embodiment, the roller brush has connecting portions at both ends, and the cleaning bracket has strip grooves at both ends located along the axial direction of the roller brush. The connecting portions are rotatably connected to the strip grooves, and an elastic element is provided between the connecting portions and the top wall of the strip grooves.

[0024] In one embodiment, the cleaning assembly includes a vacuum head, the two ends of the cleaning bracket are respectively connected to the workbench and the vacuum head, the cleaning brush is located inside the vacuum head, the vacuum port of the vacuum head faces the polishing pad mounting platform, and the cleaning surface of the cleaning brush protrudes from the plane where the vacuum port is located.

[0025] In one embodiment, the vacuum head is provided with a partition that divides the internal space of the vacuum head into a first space and a second space. The partition is provided with a plurality of through first vacuum holes arranged in multiple rows along the axial direction of the roller brush. The first space is connected to the vacuum pump, and the second space is provided with the roller brush.

[0026] In one embodiment, the cleaning component includes an electrostatic dust removal bar connected to the cleaning bracket and disposed opposite to the polishing pad mounting platform.

[0027] In one embodiment, the axis of the roller brush is parallel to the axis of the electrostatic dust removal rod, and the distance between the cleaning surface of the cleaning brush and the bearing surface is not greater than the distance between the electrostatic dust removal rod and the bearing surface.

[0028] Compared with the prior art, the present invention has the following advantages:

[0029] 1. The polishing pad cleaning equipment described above has air holes on the polishing pad fixing platform. The air holes can be connected to a vacuum pump. The polishing pad is tightly fixed to the bearing surface by suction. Therefore, when the polishing pad fixing platform rotates around the worktable, it can drive the polishing pad to rotate relative to the cleaning component, so that the cleaning component can clean the debris in various positions on the polishing pad, effectively improving the polishing pad cleaning efficiency.

[0030] 2. The polishing pad cleaning device is equipped with a first horizontal slide rail and a second horizontal slide rail that are perpendicular to each other, so that the cleaning component can reach any position on the bearing surface along the first horizontal slide rail and the second horizontal slide rail. Therefore, by moving the cleaning component, any position on the polishing pad can be cleaned, which effectively improves the cleaning efficiency and cleaning effect.

[0031] 3. The second horizontal slide rail is equipped with a transmission screw and a sliding rod located on both sides of the polishing pad fixing platform, which helps improve the stability of the slide rail bracket and the first horizontal slide rail sliding along the second horizontal slide rail. Simultaneously, a screw protective shell and a compressible protective cover are provided to enclose the transmission screw and sliding rod respectively, effectively preventing debris accumulation on the transmission screw or sliding rod without affecting the sliding connection, thus extending the service life of the second horizontal slide rail.

[0032] 4. The cable storage box is equipped with multiple hinged storage sections. The first end of the cable storage box can move closer to or further away from the second end of the cable storage box as the cleaning bracket moves along the horizontal slide rail. Therefore, the cable storage box can effectively position the cable and ensure its mobility. On the one hand, it can prevent the movement of the cleaning bracket from being restricted after the cable is completely fixed. On the other hand, it can prevent the cable from moving randomly as the cleaning bracket moves, thereby affecting the operation of the cleaning components and the polishing pad fixing table, thus improving the operating efficiency and safety of the polishing pad cleaning equipment.

[0033] 5. Since the cleaning component is slidably connected to the vertical slide rail, the distance between the cleaning component and the polishing pad fixing table can be adjusted by moving along the vertical slide rail, so that the cleaning component abuts against the polishing pad to achieve cleaning of the polishing pad. However, since the polishing pad is relatively thin, the adjustment accuracy of the distance between the cleaning component and the polishing pad fixing table is required to be high. Therefore, a limiting platform on the worktable and a limiting rod on the cleaning component are further provided. When the limiting rod abuts against the limiting platform, the cleaning component cannot continue to approach the bearing surface, and the cleaning component abuts against the polishing pad. Therefore, the distance between the cleaning component and the bearing surface can be adjusted by adjusting the distance between the limiting rod and the limiting platform, thereby adapting to polishing pads of different thicknesses and improving the adjustment accuracy of the cleaning component.

[0034] 6. The cleaning component is equipped with a thickness gauge. Since the distance between the thickness gauge and the limiting platform is equal to the distance between the cleaning component and the bearing surface, that is, the distance between the thickness gauge and the limiting platform is less than the distance between the limiting rod and the limiting platform. This difference is the difference between the distance between the thickness gauge and the limiting platform and the distance between the limiting rod and the limiting platform, which is also the thickness of the polishing pad that can be accommodated between the cleaning component and the bearing surface. Therefore, the thickness gauge allows the polishing pad cleaning equipment to accurately adjust the cleaning component and the bearing surface so that the cleaning component just abuts against the polishing pad, improving cleaning efficiency and reducing damage to the polishing pad.

[0035] 7. A rotation sensor is set to monitor the number of rotations of the polishing pad mounting stage. Therefore, the cleanliness of the polishing pad can be estimated by monitoring the number of rotations of the polishing pad mounting stage, or the cleanliness of the polishing pad can be controlled by controlling the number of rotations of the polishing pad mounting stage.

[0036] 8. The signal generator and signal receiver are used to determine the starting point of rotation of the polishing pad mounting platform. When the signal generator and signal receiver are set facing each other, the signal receiver can receive the signal from the signal generator, indicating that the polishing pad mounting platform is located at the starting point of rotation. The polishing pad mounting platform can be started to rotate and clean, thus avoiding abnormal start-up of the polishing pad mounting platform.

[0037] 9. This polishing pad cleaning equipment uses a roller brush to roll and rub the surface of the polishing pad. At the same time, an elastic element is set between the connecting part of the roller brush and the cleaning bracket, so that the distance between the roller brush and the polishing pad is adaptable. The roller brush can closely rub against the surface and groove of the polishing pad respectively, avoiding excessive friction between the roller brush and the surface of the polishing pad, thus avoiding wear on the surface of the polishing pad. It also increases the friction between the roller brush and the groove of the polishing pad, improving the cleaning ability of the groove of the polishing pad.

[0038] 10. This polishing pad cleaning device features a cleaning brush inside the suction head. During use, the cleaning brush first rubs against the polishing pad, adsorbing debris from the pad onto the brush or lifting it up. Simultaneously, a vacuum pump uses suction to remove dust from the cleaning brush and its surrounding area. Therefore, the cleaning brush can separate debris tightly adhered to the polishing pad or located in grooves and other difficult-to-remove areas from the pad, allowing the vacuum pump to remove most of the debris and improving the cleaning effect of suction.

[0039] 11. The polishing pad cleaning equipment is equipped with a cleaning brush and an electrostatic dust removal rod. The cleaning brush can remove large particles of debris from the surface and grooves of the polishing pad through friction. The electrostatic dust removal rod can attract small particles of debris that are lifted by the cleaning brush and float in the air, preventing the debris floating in the air from falling back onto the polishing pad, thus effectively improving the cleaning effect of the polishing pad. Attached Figure Description

[0040] Figure 1 This is a perspective view of a polishing pad cleaning device in one embodiment.

[0041] Figure 2 This is a front view of a polishing pad cleaning device in one embodiment.

[0042] Figure 3 This is a perspective view of a polishing pad cleaning device (workbench and top cover hidden) in one embodiment.

[0043] Figure 4 This is a rear view of a polishing pad cleaning device (workbench and top cover hidden) in one embodiment.

[0044] Figure 5 This is a perspective view of a polishing pad cleaning device in another embodiment.

[0045] Figure 6 This is a top view of a polishing pad cleaning device (top cover hidden) in another embodiment.

[0046] Figure 7 This is a perspective view of a polishing pad cleaning device in yet another embodiment.

[0047] Figure 8 This is a top view of a polishing pad cleaning device in yet another embodiment.

[0048] Figure 9 This is a top view of the polishing pad holder and cleaning assembly in one embodiment.

[0049] Figure 10 This is a top view of the polishing pad holder and cleaning assembly in another embodiment.

[0050] Figure 11 This is a side view of the polishing pad holder and cleaning assembly in another embodiment.

[0051] Figure 12 This is a side view of the cleaning component in one embodiment.

[0052] Figure 13 This is a cross-sectional view of the cleaning component in another embodiment.

[0053] Figure Descriptions: 100. Polishing pad cleaning equipment; 10. Workbench; 11. Safety door alarm; 12. Motion controller; 13. Power supply; 20. Polishing pad mounting platform; 21. Air vent; 22. Rotation sensor; 23. Signal generator; 24. Signal receiver; 25. Polishing pad; 26. LED light panel; 30. Cleaning assembly; 31. Cleaning bracket; 311. Mounting plate; 32. Cleaning brush; 321. Roller brush; 322. Connecting part; 323. Elastic element; 33. Vacuum head; 331. Partition; 332. Suction concentrator nozzle; 333. First suction hole; 334. Second suction hole; 335. First space; 336. Second space; 34. Dust removal plate; 35. Electrostatic dust removal rod; 36. Induction counter; 361. Counting display; 40. Safety door; 41. Door frame; 411. Sliding recess 42. Slot; 43. Detector; 44. Sensor; 45. Movable door; 46. Roller; 47. Fixed door; 58. Horizontal slide rail; 59. First horizontal slide rail; 50. Second horizontal slide rail; 51. Transmission block; 52. Sliding block; 523. Lead screw protective shell; 524. Compressible protective cover; 53. Drive motor; 54. Slide rail bracket; 60. Top cover; 70. Dust extraction pipe; 71. Pipe bracket; 72. Pressure gauge; 80. Wire storage box; 81. Storage section; 82. Storage track; 83. First wire storage box; 84. Second wire storage box; 85. Wire; 90. Vertical slide rail; 91. Hydraulic drive; 92. Limiting platform; 93. Limiting rod; 94. Thickness gauge; 941. Thickness measuring bracket; 942. Thickness measuring instrument; 943. Measuring head; 95. First abutment part; 96. Second abutment part. Detailed Implementation

[0054] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments. These embodiments are based on the technical solution of the present invention and provide detailed implementation methods and specific operating procedures. However, the scope of protection of the present invention is not limited to the following embodiments.

[0055] The following describes in detail a polishing pad cleaning device 100 in some embodiments with reference to the accompanying drawings.

[0056] like Figures 1 to 13 As shown, in one embodiment, a polishing pad cleaning device 100 is provided, which includes a worktable 10, a polishing pad fixing table 20 disposed on the worktable 10, and a cleaning component 30.

[0057] The polishing pad fixing platform 20 is provided with a bearing surface for placing the polishing pad 25. Multiple air holes 21 are distributed on the bearing surface. The air holes 21 are used to communicate with the vacuum pump. The polishing pad fixing platform 20 is rotatably connected to the worktable 10, so that the polishing pad fixing platform 20 can rotate around its central axis. The cleaning component 30 is arranged opposite to the polishing pad fixing platform 20 and is used to clean the debris on the surface of the polishing pad 25.

[0058] In this specific embodiment, multiple air holes 21 are distributed in concentric circles around the center of the bearing surface.

[0059] Specifically, such as Figure 2 , Figure 3 and Figure 4 As shown, in one embodiment, the workbench 10 is provided with a first horizontal slide rail 51, the cleaning component 30 slides in cooperation with the first horizontal slide rail 51, and the guiding direction of the first horizontal slide rail 51 is parallel to the bearing surface.

[0060] Furthermore, the workbench 10 is provided with a slide rail bracket 54 and a second horizontal slide rail 52. The first horizontal slide rail 51 is provided on the slide rail bracket 54. The slide rail bracket 54 and the second horizontal slide rail 52 are slidably engaged. The guiding direction of the second horizontal slide rail 52 is parallel to the bearing surface and perpendicular to the guiding direction of the first horizontal slide rail 51.

[0061] The second horizontal slide rail 52 includes a transmission screw and a sliding rod, which are respectively located on both sides of the polishing pad fixing platform 20. The two ends of the slide rail bracket 54 are respectively slidably engaged with the transmission screw and the sliding rod.

[0062] Continue to refer to Figure 2 , Figure 3 and Figure 4 In one embodiment, the polishing pad cleaning device 100 includes a lead screw protective shell 523 and a transmission block 521. The drive motor 53 and the transmission lead screw are both located inside the lead screw protective shell 523. One end of the transmission lead screw is rotatably connected to the lead screw protective shell 523, and the other end of the transmission lead screw is connected to the drive motor 53. The transmission block 521 is connected to the transmission lead screw and passes through the lead screw protective shell 523 to connect to the slide rail bracket 54.

[0063] Furthermore, the polishing pad cleaning device 100 includes multiple compressible protective covers 524 and sliding blocks 522. The sliding blocks 522 are connected to the slide rail bracket 54 and slide in cooperation with the sliding rod. The multiple compressible protective covers 524 are sleeved on the sliding rod and distributed on both sides of the sliding blocks 522. The compressible protective covers 524 are used to protect the sliding rod and prevent debris from falling on the sliding rod and affecting the movement of the cleaning component 30 along the second horizontal slide rail 52.

[0064] Furthermore, in one embodiment, the polishing pad cleaning device 100 includes a drive motor 53 connected to a lead screw for driving the first lead screw to rotate around an axis.

[0065] Specifically, such as Figure 3 and Figure 4 As shown, in one embodiment, a vertical slide rail 90 is provided on the first horizontal slide rail 51, the vertical slide rail 90 is slidably engaged with the first horizontal slide rail 51, the cleaning component 30 is slidably engaged with the vertical slide rail 90, and the guiding direction of the vertical slide rail 90 is perpendicular to the bearing surface.

[0066] Furthermore, in one embodiment, the polishing pad cleaning device 100 includes a limiting platform 92, which is disposed on the worktable 10. The cleaning component 30 is provided with a position-adjustable limiting rod 93, one end of which points towards the limiting platform 92. When the cleaning component 30 slides along the vertical slide rail 90 close to the bearing surface, the limiting rod 93 abuts against the limiting platform 92, thereby limiting the minimum distance between the cleaning component 30 and the bearing surface.

[0067] The cleaning component 30 is provided with a first mounting hole, and a slidable limiting rod 93 is provided in the first mounting hole. The limiting rod 93 is arranged opposite to the limiting platform 92. When the limiting rod 93 abuts against the limiting platform 92, the cleaning component 30 cannot continue to move along the vertical slide rail 90 towards the bearing surface. The distance between the cleaning component 30 and the bearing surface can only be adjusted by adjusting the position of the limiting rod 93 and the cleaning component 30. When the length of the limiting rod 93 extending out of the cleaning component 30 is shortened, the distance between the cleaning component 30 and the bearing surface decreases. When the length of the limiting rod 93 extending out of the cleaning component 30 is extended, the distance between the cleaning component 30 and the bearing surface increases. In the aforementioned polishing pad cleaning device 100, the cleaning component 30 is slidably connected to the vertical slide rail 90. Therefore, the distance between the cleaning component 30 and the polishing pad fixing table 20 can be adjusted by moving along the vertical slide rail 90, allowing the cleaning component 30 to clean the polishing pad 25 at a specific distance. However, since the polishing pad 25 has a small thickness, the distance adjustment accuracy between the cleaning component 30 and the polishing pad fixing table 20 requires high precision. Therefore, a limiting platform 92 located on the worktable 10 and a limiting rod 93 located on the cleaning component 30 are further provided. When the limiting rod 93 abuts against the limiting platform 92, the cleaning component 30 cannot continue to approach the bearing surface. Therefore, the distance between the cleaning component 30 and the bearing surface can be adjusted by adjusting the distance between the limiting rod 93 and the limiting platform 92, thereby adapting to polishing pads 25 of different thicknesses and improving the adjustment accuracy of the cleaning component 30.

[0068] The cleaning component 30 is equipped with a thickness gauge 94 positioned opposite the limiting platform 92. The thickness gauge 94 has a measuring head 943 for pressing against the limiting platform 92. The distance between the measuring head 943 and the limiting platform 92 is less than the distance between the limiting rod 93 and the limiting platform 92. The limiting platform 92 has a first abutment portion 95 and a second abutment portion 96. The first abutment portion 95 abuts against the limiting rod 93, and the second abutment portion 96 abuts against the thickness gauge 94. The first abutment portion 95 and the second abutment portion 96 are flush.

[0069] The cleaning component 30 is equipped with a thickness gauge 94. Since the distance between the thickness gauge 94 and the limiting platform 92 is less than the distance between the limiting rod 93 and the limiting platform 92, when the limiting rod 93 abuts against the limiting platform 92, the measuring head 943 is pressed back by the limiting platform 92. At this time, the value displayed by the thickness gauge 94 is the difference between the distance between the thickness gauge 94 and the limiting platform 92 and the distance between the limiting rod 93 and the limiting platform 92, which is the thickness of the polishing pad 25 that the cleaning component 30 and the bearing surface can accommodate. Therefore, the thickness gauge 94 enables the polishing pad cleaning device 100 to precisely adjust the cleaning component 30 and the bearing surface so that the cleaning component 30 just abuts against the polishing pad 25, thereby improving cleaning efficiency and reducing damage to the polishing pad 25.

[0070] The method of using the above-mentioned polishing pad cleaning device 100 is as follows:

[0071] Slide the cleaning component 30 along the vertical slide rail 90 to bring the cleaning component 30 close to the bearing surface until the limiting rod 93 on the cleaning component 30 abuts against the limiting platform 92. At this time, the distance between the cleaning component 30 and the bearing surface is the minimum distance. The measuring head 943 of the thickness gauge 94 is retracted under pressure, and the reading of the thickness gauge 94 is the minimum distance.

[0072] Adjust the position of the limit rod 93 and the cleaning component 30. When the length of the limit rod 93 extending out of the cleaning component 30 is shortened, the minimum distance decreases, the measuring head 943 of the thickness gauge 94 is further compressed and shortened, and the reading of the thickness gauge 94 decreases. When the length of the limit rod 93 extending out of the cleaning component 30 is extended, the minimum distance increases, the measuring head 943 of the thickness gauge 94 rebounds and extends, and the reading of the thickness gauge 94 increases.

[0073] In this specific embodiment, the cleaning component 30 includes a mounting plate 311, which is disposed opposite to the limiting platform 92. The mounting plate 311 is provided with a limiting rod 93 and a thickness gauge 94. The limiting rod 93 is threadedly connected to the mounting plate 311, and one end of the limiting rod 93 is provided with a fixing nut. The mounting plate 311 is provided with a through second mounting hole. The thickness gauge 94 includes a thickness measuring bracket 941, a thickness measuring instrument 942, and a measuring head 943. The thickness measuring bracket 941 is connected to the thickness measuring instrument 942, and the thickness measuring instrument 942 is movably connected to the measuring head 943. The thickness measuring bracket 941 is disposed on the mounting plate 311, and the measuring head 943 passes through the second mounting hole and is disposed opposite to the limiting platform 92. The distance between the measuring head 943 and the limiting platform 92 is a third distance.

[0074] Furthermore, in one embodiment, a hydraulic drive 91 is provided on the first horizontal slide rail 51, and the hydraulic drive 91 is connected to the cleaning component 30 to drive the cleaning component 30 to move along the vertical slide rail 90.

[0075] Specifically, such as Figure 5 and Figure 6 As shown, in one embodiment, the polishing pad cleaning device 100 includes a safety door 40 and a door frame 41 disposed on the workbench 10. The safety door 40 is disposed around the polishing pad fixing table 20. The safety door 40 is provided with a detector 42, and the door frame 41 is provided with a sensor 43. When the safety door 40 is closed, the detector 42 can detect the sensor 43.

[0076] The safety door 40 includes a movable door 44 and a fixed door 45. A detector 42 is mounted on the movable door 44. Multiple door frames 41 are spaced apart along the circumference of the workbench 10. One part of the door frame 41 has a door rail, with the movable door 44 slidingly engaging with the door rail. The other part of the door frame 41 has a fixed door 45. The movable door 44 includes multiple door bodies arranged sequentially along the door rail, with adjacent door bodies hinged together.

[0077] In this specific embodiment, the door slide rail is an arc-shaped slide rail with a central angle greater than 90 degrees, and the shape of the movable door 44 is adapted to the shape of the door slide rail. A sliding groove 411 is provided inside the door slide rail, and multiple rollers 441 are provided at the bottom of the movable door 44, with the circumference of the rollers 441 abutting against the side wall of the sliding groove 411.

[0078] The aforementioned polishing pad cleaning equipment 100 features a safety door 40 around the polishing pad fixing platform 20, isolating the polishing pad fixing platform 20 and cleaning components 30 from external personnel. Detectors 42 and sensors 43 are installed on the safety door 40 and door frame 41 respectively to monitor the opening and closing status of the safety door 40, preventing the cleaning equipment from being activated when the safety door 40 is open, thus effectively improving the safety of the cleaning equipment. Additionally, a fixed door 45 and a movable door 44 are provided. The movable door 44 slides along a door rail, facilitating the opening and closing of the safety door 40. The detectors 42 and sensors 43 monitor the opening and closing status of the movable door 44, effectively improving the efficiency of the cleaning equipment.

[0079] Specifically, such as Figure 7 and Figure 8 As shown, in one embodiment, the workbench 10 is provided with a wire storage box 80 arranged parallel to the horizontal slide rail 50. The wire storage box 80 includes a plurality of storage sections 81 that are hinged sequentially along the length direction. The wire 85 of the drive motor 53 passes through both ends of the wire storage box 80 and is connected to the power supply. The first end of the wire storage box 80 near the cleaning component 30 is fixedly connected to the wire 85, and the second end of the wire storage box 80 is fixedly connected to the workbench 10. When the cleaning bracket 31 moves along the horizontal slide rail 50, the two ends of the wire storage box 80 are folded, and the wire 85 can drive the first end of the wire storage box 80 to move closer to or away from the second end of the wire storage box 80. The workbench 10 is provided with a storage rail 82, which is arranged parallel to the horizontal slide rail 50. The wire storage box 80 is disposed in the storage rail 82, and one end of the wire storage box 80 is fixedly connected to the storage rail 82.

[0080] The cable storage box 80 includes a first cable storage box 83 and a second cable storage box 84. The first cable storage box 83 is arranged in parallel with the first horizontal slide rail 51, and the second cable storage box 84 is arranged in parallel with the second horizontal slide rail 52. The cable 85 of the drive motor 53 passes through the first cable storage box 83 and the second cable storage box 84 in sequence and is connected to the power supply. The first end of the first cable storage box 83 away from the second cable storage box 84 is fixedly connected to the cable 85. The second end of the first cable storage box 83 is fixedly connected to the worktable 10. The first end of the second cable storage box 84 near the first cable storage box 83 is fixedly connected to the cable 85. The second end of the second cable storage box 84 is fixedly connected to the worktable 10.

[0081] The polishing pad cleaning device 100 described above is equipped with a wire storage box 80. The wire storage box 80 stores the wire 85 by being sleeved on it. The wire storage box 80 has multiple hinged storage sections 81. Therefore, the first end of the wire storage box 80 can move closer to or further away from the second end of the wire storage box 80 as the cleaning bracket 31 moves along the horizontal slide rail 50. Thus, the wire storage box 80 can effectively position the wire 85 and ensure the mobility of the wire 85. On the one hand, it can prevent the movement of the cleaning bracket 31 from being restricted after the wire 85 is completely fixed. On the other hand, it can prevent the wire 85 from moving randomly as the cleaning bracket 31 moves, thereby affecting the operation of the cleaning component 30 and the polishing pad fixing table 20. This improves the operating efficiency and safety of the polishing pad cleaning device 100.

[0082] Specifically, such as Figure 9 As shown, in one embodiment, the polishing pad cleaning device 100 includes a rotation sensor 22 connected to the polishing pad mounting platform 20 for monitoring the number of rotations of the polishing pad mounting platform 20. Since the rotation sensor 22 monitors the number of rotations of the polishing pad mounting platform 20, the cleanliness of the polishing pad 25 can be estimated by monitoring the number of rotations of the polishing pad mounting platform 20, or the cleanliness of the polishing pad 25 can be controlled by controlling the number of rotations of the polishing pad mounting platform 20.

[0083] Furthermore, the polishing pad cleaning device 100 includes a signal generator 23 and a signal receiver 24. The signal receiver 24 is mounted on the worktable 10, and the signal generator 23 is mounted on the polishing pad fixing platform 20. The signal generator 23 and the signal receiver 24 are arranged opposite to each other to determine the rotation starting point of the polishing pad fixing platform 20. When the signal generator 23 and the signal receiver 24 are directly opposite each other, the signal receiver 24 can receive the signal from the signal generator 23, indicating that the polishing pad fixing platform 20 is at the rotation starting point, and the polishing pad fixing platform 20 can be started for rotation cleaning, thus preventing abnormal start-up of the polishing pad fixing platform 20.

[0084] In this specific embodiment, an LED light panel 26 is provided on the polishing pad fixing platform 20, and the LED light panel 26 is used to place the polishing pad 25. When the polishing pad 25 is placed on the LED light panel 26, the LED light panel 26 can illuminate the polishing pad 25 and the area above it, making the debris on the polishing pad 25 and the area above it clearly visible. This helps the operator to judge the cleaning progress at different positions on the polishing pad 25, so as to control the cleaning position and cleaning time of the cleaning component 30 and improve cleaning efficiency.

[0085] Specifically, such as Figure 3 , Figure 10 and Figure 11As shown, in one embodiment, the cleaning assembly 30 includes a cleaning bracket 31, a cleaning brush 32, and an electrostatic dust removal rod 35. The cleaning brush 32 and the electrostatic dust removal rod 35 are respectively connected to the cleaning bracket 31 and are both positioned opposite to the polishing pad mounting platform 20. The cleaning brush 32 is used for contact and friction with the polishing pad 25, and the electrostatic dust removal rod 35 is used for electrostatic adsorption of dust on the polishing pad 25. The cleaning brush 32 can remove large particles of debris from the surface and grooves of the polishing pad 25 through friction and contact, while the electrostatic dust removal rod 35 can electrostatically adsorb small particles of debris that are raised by the cleaning brush 32 and float in the air, preventing the debris floating in the air from falling back onto the polishing pad 25, thus effectively improving the cleaning effect of the polishing pad 25. Further, as... Figure 12 and Figure 13 As shown, in one embodiment, the cleaning brush 32 includes a roller brush 321, which is rotatably connected to the cleaning bracket 31 and can rotate about a horizontal axis. The axis of the roller brush 321 is parallel to the axis of the electrostatic dust removal rod 35. The polishing pad fixing platform 20 is provided with a bearing surface for placing the polishing pad 25. The distance between the cleaning surface of the cleaning brush 32 and the bearing surface is not greater than the distance between the electrostatic dust removal rod 35 and the bearing surface. The rotation direction of the polishing pad fixing platform 20 is opposite to the rotation direction of the roller brush 321. That is, when the polishing pad fixing platform 20 rotates clockwise, the roller brush 321 rotates counterclockwise, which helps the roller brush 321 to carry out the debris in the groove and improves the cleaning efficiency.

[0086] The roller brush 321 has connecting portions 322 at both ends, and the cleaning bracket 31 has strip grooves at both ends along the axial direction of the roller brush 321. The connecting portions 322 are rotatably connected to the strip grooves, and an elastic element 323 is provided between the connecting portions 322 and the sidewalls of the strip grooves. This polishing pad cleaning device 100 uses the roller brush 321 to perform rolling friction on the surface of the polishing pad 25. Simultaneously, the elastic element 323 is provided between the connecting portions 322 of the roller brush 321 and the cleaning bracket 31, making the distance between the roller brush 321 and the polishing pad 25 adaptable. The roller brush 321 can closely rub against the surface and grooves of the polishing pad 25, preventing excessive friction between the roller brush 321 and the surface of the polishing pad 25, thus avoiding wear on the surface of the polishing pad 25. It also increases the friction between the roller brush 321 and the grooves of the polishing pad 25, improving the cleaning ability of the grooves of the polishing pad 25.

[0087] Continue to refer to Figure 12 and Figure 13 In one embodiment, the cleaning assembly 30 includes a vacuum head 33, a cleaning bracket 31 connected to the vacuum head 33, an electrostatic dust removal rod 35 disposed outside the vacuum head 33, and a cleaning brush 32 disposed inside the vacuum head 33. The vacuum head 33 has an opening facing the polishing pad mounting platform 20 and is used to communicate with the vacuum pump. The cleaning surface of the cleaning brush 32 protrudes from the plane where the opening of the vacuum head 33 is located.

[0088] Furthermore, the vacuum head 33 is equipped with a partition 331, which divides the internal space of the vacuum head 33 into a first space 335 and a second space 336. The partition 331 has multiple through first suction holes 333. The first space 335 is connected to the vacuum pump, and the second space 336 contains a roller brush 321. The vacuum head 33 has two spaces connected by the first suction holes 333, which reduces the size of the air intake channel in the first space 335 and concentrates the suction power of the vacuum pump near the cleaning brush 32, which helps to improve suction power and vacuuming efficiency.

[0089] The partition 331 is provided with a suction concentrator 332, which is positioned opposite to the surface of the roller brush 321. The suction concentrator 332 is provided with a second suction hole 334 that communicates with the first suction hole 333. The suction concentrator 332, which is in close contact with the surface of the roller brush 321, further enhances the suction of debris on the cleaning brush 32.

[0090] In this specific embodiment, a dust removal plate 34 extending axially along the roller brush 321 is provided on the inner wall of the suction head 33, and the dust removal plate 34 abuts against the bristles of the roller brush 321. The dust removal plate 34 is provided inside the suction head 33 to abut against the cleaning brush 32, so that the debris adsorbed on the surface of the cleaning brush 32 is dislodged inside the suction head 33, preventing the debris adsorbed on the surface of the cleaning brush 32 from falling back onto the polishing pad 25, effectively improving cleaning efficiency.

[0091] Furthermore, such as Figure 3 As shown, the cleaning bracket 31 is equipped with a sensor counter 36, which is positioned opposite to the polishing pad fixing platform 20 and is used to count the number of polishing pads 25. The sensor counter 36 is used to count the cumulative number of polishing pads 25 processed by each cleaning brush 32, and thus can determine whether the cleaning brush 32 needs to be replaced based on its service life, thereby improving the cleaning effect of the polishing pads 25.

[0092] The cleaning bracket 31 is equipped with a counting display 361 that is electrically connected to the induction counter 36, which is used to display the number of polishing pads 25 counted by the induction counter 36.

[0093] Furthermore, such as Figure 5As shown, in one embodiment, the workbench 10 is provided with a top cover 60, which has an opening. The cleaning component 30 includes a vacuum head 33, a vacuum pipe 70, and a vacuum pump. The top cover 60 is provided with a pipe support 71. The vacuum head 33 is disposed opposite to the polishing pad fixing platform 20. The vacuum pump is located at the bottom of the workbench 10. One end of the vacuum pipe 70 is connected to the vacuum head 33, and the other end of the vacuum pipe 70 passes through the opening and the pipe support 71 in sequence and is connected to the vacuum pump. The polishing pad cleaning device 100 is provided with a top cover 60 and a vacuum pipe 70. The vacuum pipe 70 is movably inserted through a fixing ring, which facilitates the movement of the vacuum pipe 70 along the horizontal slide rail 50 with the cleaning component 30.

[0094] Meanwhile, the cleaning component 30 is equipped with a pressure gauge 72, which is connected to the vacuum pipe 70 to monitor the air pressure in the vacuum pipe 70 and the vacuum head 33, so as to prevent the vacuum pipe 70 and the vacuum head 33 from becoming blocked and causing accidents.

[0095] Specifically, such as Figure 1 and Figure 2 As shown, in one embodiment, a safety door alarm 11 is provided on the top cover 60. The safety door alarm 11 is electrically connected to the detector 42 of the safety door 40 and the rotation sensor 22 of the polishing pad mounting platform 20. When the detector 42 of the safety door 40 detects that the safety door 40 is in an open state, and the rotation sensor 22 of the polishing pad mounting platform 20 detects that the polishing pad mounting platform 20 is in a rotating state, the safety door alarm 11 will light up.

[0096] Furthermore, the workbench 10 is also equipped with a motion controller 12 and multiple drive motors 53. The drive motors 53 are used to drive the cleaning component 30 along the first horizontal slide rail 51, the second horizontal slide rail 52 and the vertical slide rail 90, and to drive the rotation of the polishing pad fixing table 20 and the rotation of the roller brush 321. The motion controller 12 is electrically connected to the hydraulic drive 91 and the multiple drive motors 53, and is used to control the movement of the cleaning component 30 along the first horizontal slide rail 51, the second horizontal slide rail 52 and the vertical slide rail 90. At the same time, it can also control the rotation of the polishing pad fixing table 20 and the rotation of the roller brush 321.

[0097] In this specific embodiment, the workbench 10 is also equipped with a power supply 13, which provides power to the hydraulic drive 91, drive motor 53, motion controller 12, detector 42 of safety door 40, rotation sensor 22 of polishing pad fixing table 20, signal receiver 24, etc.

[0098] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0099] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0100] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0101] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0102] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.

[0103] The preferred embodiments of the present invention have been described in detail above. It should be understood that those skilled in the art can make numerous modifications and variations based on the concept of the present invention without creative effort. Therefore, all technical solutions that can be obtained by those skilled in the art based on the concept of the present invention through logical analysis, reasoning, or limited experimentation on the basis of existing technology should be within the scope of protection defined by the claims.

Claims

1. A polishing pad cleaning device, characterized in that, The polishing pad cleaning device (100) includes: Workbench (10); A polishing pad fixing platform (20) is provided on the worktable (10). The polishing pad fixing platform (20) is provided with a bearing surface for placing the polishing pad (25). A plurality of air holes (21) are distributed on the bearing surface. The air holes (21) are used to communicate with the vacuum pump. The polishing pad fixing platform (20) is rotatably connected to the worktable (10) so that the polishing pad fixing platform (20) can rotate around its own central axis. A cleaning component (30) is disposed opposite to the polishing pad fixing platform (20) and is used to clean the polishing pad (25); The workbench (10) is provided with a vertical slide rail (90), the cleaning component (30) slides in cooperation with the vertical slide rail (90), and the guiding direction of the vertical slide rail (90) is perpendicular to the bearing surface; The worktable (10) is provided with a limiting platform (92), and the cleaning component (30) is provided with a position-adjustable limiting rod (93). One end of the limiting rod (93) points to the limiting platform (92). When the cleaning component (30) slides along the vertical slide rail (90) and approaches the bearing surface, the limiting rod (93) abuts against the limiting platform (92), which can limit the minimum distance between the cleaning component (30) and the bearing surface, so that the cleaning component (30) is kept at the cleaning height corresponding to the polishing pad (25). The cleaning assembly (30) includes a cleaning bracket (31) and a cleaning brush (32). The cleaning brush (32) includes a roller brush (321). The roller brush (321) is rotatably connected to the cleaning bracket (31) so that the roller brush (321) can rotate around its own axis. The axis of the roller brush (321) is parallel to the bearing surface, and the rotation direction of the polishing pad fixing platform (20) is opposite to the rotation direction of the roller brush (321) in order to clean the polishing surface of the polishing pad (25). The roller brush (321) has connecting parts (322) at both ends. The cleaning bracket (31) has strip grooves at both ends located in the axial direction of the roller brush (321). The connecting parts (322) are rotatably connected to the strip grooves. An elastic element (323) that can be vertically compressed is provided between the connecting parts (322) and the strip grooves to clean the grooves of the polishing pad (25).

2. The polishing pad cleaning device according to claim 1, characterized in that, The workbench (10) is provided with a horizontal slide rail (50), and the cleaning component (30) slides in cooperation with the horizontal slide rail (50). The guiding direction of the horizontal slide rail (50) is parallel to the bearing surface.

3. The polishing pad cleaning device according to claim 2, characterized in that, The horizontal slide rail (50) includes a slide rail bracket (54), a first horizontal slide rail (51), and a second horizontal slide rail (52). The first horizontal slide rail (51) is mounted on the slide rail bracket (54). The slide rail bracket (54) and the second horizontal slide rail (52) are slidably engaged. The guiding direction of the second horizontal slide rail (52) is parallel to the bearing surface and perpendicular to the guiding direction of the first horizontal slide rail (51).

4. The polishing pad cleaning device according to claim 3, characterized in that, The second horizontal slide rail (52) includes a drive motor (53), a transmission screw and a sliding rod. The transmission screw and the sliding rod are respectively located on both sides of the polishing pad fixing platform (20). One end of the transmission screw is connected to the drive motor (53), and both ends of the slide rail bracket (54) are slidably engaged with the transmission screw and the sliding rod, respectively.

5. The polishing pad cleaning device according to claim 4, characterized in that, The polishing pad cleaning device (100) includes a lead screw protective shell (523) and a transmission block (521). The drive motor (53) and the transmission lead screw are both located inside the lead screw protective shell (523). The transmission block (521) is connected to the transmission lead screw and passes through the lead screw protective shell (523) to connect with the slide rail bracket (54).

6. The polishing pad cleaning device according to claim 4, characterized in that, The polishing pad cleaning device (100) includes multiple compressible protective covers (524) and sliding blocks (522). The sliding blocks (522) are connected to the slide rail bracket (54) and slide in cooperation with the sliding rod. The multiple compressible protective covers (524) are sleeved on the sliding rod and distributed on both sides of the sliding blocks (522).

7. The polishing pad cleaning device according to claim 4, characterized in that, The workbench (10) is provided with a first wire storage box (83) arranged in parallel with the first horizontal slide rail (51) and a second wire storage box (84) arranged in parallel with the second horizontal slide rail (52). The first wire storage box (83) and the second wire storage box (84) each include a plurality of storage sections (81) that are hinged sequentially along the length direction. The wire (85) of the drive motor passes through the first wire storage box (83) and the second wire storage box (84) in sequence and is connected to the power supply.

8. The polishing pad cleaning device according to claim 1, characterized in that, The cleaning component (30) is provided with a thickness gauge (94), and the thickness gauge (94) is provided with a measuring head (943) for pressing against the limiting platform (92). The distance between the measuring head (943) and the limiting platform (92) is less than the distance between the limiting rod (93) and the limiting platform (92).

9. A polishing pad cleaning device according to claim 1, characterized in that, The polishing pad cleaning device (100) includes a rotation sensor (22) connected to the polishing pad fixing platform (20) for monitoring the number of rotations of the polishing pad fixing platform (20).

10. A polishing pad cleaning device according to claim 1, characterized in that, The polishing pad cleaning device (100) includes a signal generator (23) and a signal receiver (24). The signal receiver (24) is located on the worktable (10), and the signal generator (23) is located on the polishing pad fixing table (20). The signal generator (23) and the signal receiver (24) are arranged opposite to each other to determine the rotation starting point of the polishing pad fixing table (20).

11. A polishing pad cleaning device according to claim 1, characterized in that, The cleaning assembly (30) includes a vacuum head (33), and the two ends of the cleaning bracket (31) are respectively connected to the workbench (10) and the vacuum head (33). The cleaning brush (32) is located inside the vacuum head (33), and the suction port of the vacuum head (33) faces the polishing pad fixing platform (20). The cleaning surface of the cleaning brush (32) protrudes from the plane where the suction port is located.

12. A polishing pad cleaning device according to claim 11, characterized in that, The vacuum head (33) is provided with a partition (331), which divides the internal space of the vacuum head (33) into a first space (335) and a second space (336). The partition (331) is provided with a plurality of through first vacuum holes (333), which are arranged in multiple rows along the axial direction of the roller brush (321). The first space (335) is connected to the vacuum pump, and the second space (336) is provided with the roller brush (321).

13. The polishing pad cleaning device according to claim 1, characterized in that, The cleaning component (30) includes an electrostatic dust removal rod (35), which is connected to the cleaning bracket (31) and is disposed opposite to the polishing pad fixing platform (20).

14. A polishing pad cleaning device according to claim 13, characterized in that, The axis of the roller brush (321) is parallel to the axis of the electrostatic dust removal rod (35), and the distance between the cleaning surface of the cleaning brush (32) and the bearing surface is not greater than the distance between the electrostatic dust removal rod (35) and the bearing surface.

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