Application device for preferably partially enhancing the application
By introducing a second pipe section as a bypass into the application device, the time delay and transition zone problems of material alternation in the prior art are solved, realizing rapid and seamless material alternation and ensuring the stability and continuity of the mixing ratio.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- DUERR SYSTEMS GMBH
- Filing Date
- 2021-10-19
- Publication Date
- 2026-05-26
AI Technical Summary
Existing application devices have time delays and undefined transition zones during the transition process, resulting in uneven mixing ratios and making it difficult to achieve rapid and seamless material alternation.
An application device is designed, including a first pipe section and a second pipe section. The first pipe section is used to mix 2C material, and the second pipe section is connected directly or indirectly to the application nozzle as a bypass, allowing the first component material to bypass the mixer, realizing the alternating application of materials, and reducing or eliminating the transition area.
It enables rapid and seamless alternating application of materials, ensuring the stability and continuity of the mixing ratio, reducing transition time, and improving application efficiency.
Smart Images

Figure CN116507426B_ABST