An exhaust gas purification device for EPI epitaxial process

Abstract

The application relates to a tail gas purification device for an EPI epitaxial process, and belongs to the technical field of silicon epitaxial processes, which comprises a rack, a first hydrolysis box, a first water outlet pipe, a backwater pipe, a feed pipe, a connecting pipe and a flushing assembly, a circulating pump is arranged on the rack; the first hydrolysis box is filled with clean water, the first hydrolysis box is communicated with an air outlet pipe, and the purified tail gas is discharged through the air outlet pipe; the first water outlet pipe and the backwater pipe are communicated with the circulating pump, the first water outlet pipe is used for spraying into the first hydrolysis box, and the backwater pipe is communicated with the first hydrolysis box; the feed pipe is communicated with the connecting pipe, one end of the connecting pipe away from the feed pipe is communicated with the first hydrolysis box; the flushing assembly is used for flushing the inner wall of the pipeline; and the whole inside is in a negative pressure state during equipment operation. The application has the beneficial effects of reducing the possibility of adhesion and accumulation of silicon dioxide powder in the treatment equipment, reducing the damage of the equipment caused by powder accumulation, and prolonging the service life of the equipment.

Description

Technical Field

[0001] This application relates to the field of silicon epitaxial process technology, and in particular to an exhaust gas purification device for EPI epitaxial process. Background Technology

[0002] Trichlorosilane (SiHCl3) is a widely used organosilicon monomer, a raw material for manufacturing solar-grade and electronic-grade polycrystalline silicon, as well as semiconductor-grade monocrystalline silicon. It is also a fundamental monomer in the synthesis of various organosilicones. With the advancement of science and technology, the fine chemical, new energy, and optoelectronic communication fields are developing rapidly, leading to an increasing demand for silicon and various silicon-containing products. Products made from trichlorosilane as a raw material or intermediate are particularly favored by the silicon industry. EPI epitaxy, or silicon epitaxy, refers to the growth of a single-crystal semiconductor thin film on a suitable crystalline substrate. During silicon epitaxy, trichlorosilane produces harmful exhaust gases after reacting in the reaction chamber.

[0003] Currently, silicon epitaxy technology is not yet mature, and the amount of exhaust gas is unstable. When using exhaust gas treatment equipment to treat the exhaust gas generated by silicon epitaxy, a large amount of silica powder is easily generated in the exhaust gas treatment equipment. Silica powder is easy to adhere to and accumulate in the treatment equipment, and the exhaust gas is also mixed with other powdery pollutants. Over time, this can easily damage the exhaust gas treatment equipment and affect its treatment effect. Summary of the Invention

[0004] In order to improve the problem that silica powder is easy to adhere to and accumulate in the processing equipment, this application provides an exhaust gas purification device for EPI epitaxial process.

[0005] The exhaust gas purification device for EPI epitaxial process provided in this application adopts the following technical solution:

[0006] An exhaust gas purification device for EPI epitaxial process includes:

[0007] A frame, on which a circulation pump is mounted;

[0008] A hydrolysis assembly includes a primary hydrolysis tank filled with clean water. The primary hydrolysis tank is used to purify exhaust gas. An exhaust pipe is connected to the primary hydrolysis tank, and the purified exhaust gas is discharged through the exhaust pipe.

[0009] A spraying assembly, comprising a first outlet pipe and a return pipe, both of which are connected to a circulating pump. The first outlet pipe is located inside a primary hydrolysis tank and is used to spray water into the primary hydrolysis tank. The return pipe is connected to the primary hydrolysis tank.

[0010] The feeding assembly comprises a feeding pipe and a connecting pipe, the feeding pipe is communicated with the connecting pipe, one end of the feeding pipe away from the connecting pipe is communicated with the trichlorosilane reaction cavity, and one end of the connecting pipe away from the feeding pipe is communicated with the first hydrolysis box;

[0011] The flushing assembly is used for flushing the inner wall of the pipeline in the feeding assembly.

[0012] When the tail gas purification device is in operation, the feeding pipe, the connecting pipe, the first hydrolysis box and the gas outlet pipe are in a negative pressure state.

[0013] By adopting the above technical scheme, the tail gas enters the first hydrolysis box through the feeding pipe and the connecting pipe. Since the water vapor in the first hydrolysis box overflows through the connecting pipe, the tail gas is prone to react with the water vapor in the flushing pipe and the connecting pipe to generate a small amount of silicon dioxide powder. The flushing assembly can flush the inner wall of the connecting pipe, thereby reducing the possibility of the silicon dioxide powder adhering to the pipeline. After the tail gas enters the first hydrolysis box, the first water outlet pipe continuously sprays, so that the water in the first hydrolysis box is always in a turbulent state. The silicon dioxide powder generated by the reaction is mixed with water to form a suspension, further reducing the possibility of the silicon dioxide powder adhering to the inner wall of the first hydrolysis box. The purified tail gas is discharged through the gas outlet pipe, greatly reducing the possibility of the silicon dioxide powder adhering and accumulating in the treatment device, reducing the damage to the device caused by powder accumulation, and thereby prolonging the service life of the device.

[0014] Preferably, the feeding assembly further comprises a flushing pipe, the feeding pipe, the flushing pipe and the connecting pipe are connected in sequence, the flushing assembly comprises a first flushing member and a second flushing member, the first flushing member is arranged on the flushing pipe and used for introducing clean water into the flushing pipe, and the second flushing member is arranged on the connecting pipe and used for introducing clean water into the connecting pipe.

[0015] By adopting the above technical scheme, the operator introduces the tail gas into the feeding pipe. Since the water vapor in the first hydrolysis box overflows through the connecting pipe, the tail gas is prone to react with the water vapor in the flushing pipe and the connecting pipe to generate a small amount of silicon dioxide powder. At this time, the first flushing member and the second flushing member can be used to flush the inner wall of the flushing pipe and the connecting pipe, so that the silicon dioxide powder is not easy to adhere to the inner wall of the flushing pipe and the connecting pipe, thereby reducing the risk of blocking the pipeline.

[0016] Preferably, the first flushing member comprises a flushing disc and a first water inlet pipe, the flushing disc is sleeved on the flushing pipe, a flushing cavity is formed in the flushing disc, the first water inlet pipe extends into the flushing disc and is communicated with the flushing cavity, a plurality of connecting holes for connecting the flushing cavity and the flushing pipe are formed in the flushing disc, and one end of the first water inlet pipe away from the flushing disc is communicated with the circulating pump.

[0017] By adopting the technical scheme, when the circulating pump is started, the clean water is introduced into the flushing cavity through the first water inlet pipe, and then is introduced into the flushing pipe through the plurality of connecting holes, so that the spray water curtain is formed in the flushing pipe, and the inner wall of the flushing pipe is cleaned.

[0018] Preferably, the second flushing member comprises a second water inlet pipe and a control valve, one end of the second water inlet pipe is connected with the control valve, the other end is connected with the connecting pipe, the third water inlet pipe is arranged on the circulating pump, and the end of the control valve away from the second water inlet pipe is connected with the circulating pump through the third water inlet pipe.

[0019] By adopting the technical scheme, when the control valve is opened, the second water inlet pipe and the third water inlet pipe are communicated, the clean water is introduced into the second water inlet pipe through the third water inlet pipe, and then is introduced into the connecting pipe, so that the inner wall of the connecting pipe can be cleaned.

[0020] Preferably, the feeding assembly further comprises an isolation pipe, the isolation pipe is connected to the end of the flushing pipe away from the connecting pipe, and the isolation pipe is connected with the feeding pipe, and the gas curtain pipe is connected to the isolation pipe, and the gas curtain pipe is used for introducing nitrogen into the isolation pipe.

[0021] By adopting the technical scheme, since the reaction of trichlorosilane and water is an exothermic reaction, the clean water in the flushing pipe and the connecting pipe is easy to generate part of water vapor, after the water vapor contacts with the inner wall of the feeding pipe, small water droplets are easy to be generated on the inner wall of the feeding pipe, after the tail gas enters the feeding pipe, the tail gas is easy to react with the part of water droplets, and the silicon dioxide powder is generated and adheres to the inner wall of the feeding pipe; the nitrogen in the isolation pipe can form a gas curtain to block the water vapor, reduce the possibility of reaction of the tail gas in the feeding pipe, and reduce the possibility of generation of the silicon dioxide powder adhering to the inner wall of the feeding pipe.

[0022] Preferably, the feeding assembly further comprises a wall scraping assembly, the wall scraping assembly comprises a scraping plate and a scraping driving source, the scraping driving source is arranged at the end of the isolation pipe away from the flushing pipe, the scraping plate is arranged in the isolation pipe, and the scraping driving source is used for driving the scraping plate to move axially along the isolation pipe.

[0023] By adopting the technical scheme, when the water curtain in the flushing pipe still has part of water vapor overflowing and entering the isolation pipe, the tail gas enters the flushing pipe through the feeding pipe, and passes through the isolation pipe, and is easy to react with the water vapor in the isolation pipe, after the scraping driving source is started, the scraping plate is driven to move along the isolation pipe towards the flushing pipe, and the silicon dioxide powder adhering to the pipe wall is scraped off, and the powder is pushed to the spray water curtain, and under the action of the water curtain, the powder is cleaned.

[0024] Preferably, the primary hydrolysis box comprises a first hydrolysis zone and a first spraying zone, the first water outlet pipe comprises a first spraying air exposure pipe and a plurality of first spraying pipes, the first spraying air exposure pipe is a Venturi pipe, the first spraying air exposure pipe is arranged at the bottom of the primary hydrolysis box and located in the first hydrolysis zone, the plurality of first spraying pipes are arranged in the first spraying zone and arranged along the height direction of the first spraying zone, and the spraying directions of the first spraying air exposure pipe and the first spraying pipes are opposite.

[0025] By adopting the above technical scheme, due to the opposite spraying directions of the first spraying air exposure pipe and the first spraying pipes, under the mutual cooperation of the second spraying pipe and the first spraying air exposure pipe, the water in the primary hydrolysis box is always in a turbulent state, the silicon dioxide powder generated after the reaction of the tail gas and the water forms a suspension, and the possibility of the silicon dioxide powder adhering to the inner wall of the primary hydrolysis box is reduced.

[0026] Preferably, the hydrolysis assembly further comprises a secondary hydrolysis box, the primary hydrolysis box and the secondary hydrolysis box are connected and the bottoms of the two are communicated, and the spraying assembly further comprises a second water outlet pipe, the second water outlet pipe comprises a second spraying pipe, and the second spraying pipe is arranged in the inner top wall of the secondary hydrolysis box.

[0027] The secondary hydrolysis box is provided with a reinforcing assembly, the reinforcing assembly comprises a connecting plate and a communication pipe, the connecting plate is movably arranged in the secondary hydrolysis box, the connecting plate divides the secondary hydrolysis box into a second hydrolysis zone and a second spraying zone, and the second hydrolysis zone is located below the second spraying zone.

[0028] The connecting plate is provided with a communication hole, one end of the communication pipe is communicated with the second spraying pipe, and the other end of the communication pipe is located in the communication hole and communicated with the second hydrolysis zone.

[0029] By adopting the above technical scheme, when the tail gas enters the second spraying zone, the second spraying pipe sprays high-speed water flow into the second spraying zone, so that the entering tail gas reacts with water rapidly, since the second spraying pipe is communicated with the communication pipe, the second spraying pipe sprays toward the communication pipe, so that the water flow carries the silicon dioxide powder generated by the reaction to quickly pass through the communication pipe into the second hydrolysis zone, and the possibility of the silicon dioxide powder adhering to the inner wall of the box is reduced.

[0030] Preferably, the reinforcing assembly further comprises a water storage pipe, the pipe wall of the water storage pipe is provided with a turbulent hole, the second water outlet pipe further comprises a water supplement pipe, and the water supplement pipe is used for supplementing water into the water storage pipe.

[0031] By adopting the above technical scheme, the water supplement pipe supplements water into the water storage pipe, and the water flow overflows to the second spraying zone through the turbulent hole, so that the water in the second spraying zone is always in a turbulent state.

[0032] Preferably, the water storage pipe is provided with a partition plate, the communication pipe is fixed opposite to the partition plate, the partition plate is provided with a water supplement hole, a reinforcing cavity is formed between the communication pipe, the partition plate and the inner wall of the water storage pipe, the connecting plate is further provided with a reinforcing hole, and the outer wall of the communication pipe is provided with a blocking plate.

[0033] By adopting the technical scheme, the blocking plate blocks the reinforcing hole, the reinforcing cavity and the second hydrolysis area are in a state of being cut off, the water supplement pipe continuously supplements water into the reinforcing cavity, the water level of the reinforcing cavity is continuously raised, under the action of buoyancy, the partition plate, the communication pipe and the blocking plate move upward synchronously, the reinforcing hole and the reinforcing cavity are communicated, the reinforcing cavity and the second hydrolysis area are communicated, the water flow in the reinforcing cavity rapidly flows into the second hydrolysis area from the reinforcing hole, the silica powder generated in the second spraying area is further carried into the second hydrolysis area, and the silica powder remaining or accumulating in the reinforcing cavity, the water storage pipe wall and the second spraying area is reduced, after the water in the reinforcing cavity overflows, the partition plate, the communication pipe and the blocking plate automatically descend, the blocking plate blocks the reinforcing hole again, the reinforcing hole and the reinforcing cavity are separated, and the reinforcing cavity can continuously store water.

[0034] In summary, the present application has at least one of the following beneficial technical effects:

[0035] 1. The tail gas enters the first hydrolysis box through the feeding pipe and the connecting pipe, the water vapor in the first hydrolysis box overflows through the connecting pipe, the tail gas is easy to react with the water vapor in the washing pipe and the connecting pipe, a small amount of silica powder is generated, the washing assembly can wash the inner wall of the connecting pipe, and the possibility of silica powder adhering to the pipeline is reduced; after the tail gas enters the first hydrolysis box, the first water outlet pipe continuously sprays, the water in the first hydrolysis box is always in a turbulent state, the silica powder generated by the reaction is mixed with water to form a suspension, the possibility of silica powder adhering to the inner wall of the first hydrolysis box is further reduced, the purified tail gas is discharged through the gas outlet pipe, the possibility of silica powder adhering and accumulating in the treatment equipment is greatly reduced, the damage to the equipment caused by powder accumulation is reduced, and the service life of the equipment is prolonged.

[0036] 2. Due to the opposite spraying directions of the first spraying gas exposure pipe and the first spraying pipe, under the mutual cooperation of the second spraying pipe and the first spraying gas exposure pipe, the water in the first hydrolysis box is always in a turbulent state, the silica powder generated after the tail gas reacts with water is mixed with water to form a suspension, and the possibility of silica powder adhering to the inner wall of the first hydrolysis box is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0037] Figure 1 It is a schematic diagram of the overall structure of the tail gas purification equipment in the embodiment of the present application.

[0038] Figure 2 is a schematic diagram of a detail structure in the air inlet device in the embodiment of the present application.

[0039] Figure 3 is a schematic diagram of a detail structure in the reaction device in the embodiment of the present application.

[0040] Figure 4 is a schematic diagram of a detail structure in the secondary hydrolysis tank in the embodiment of the present application.

[0041] Figure 5 is a schematic diagram of a structure of the reinforcing assembly in the embodiment of the present application.

[0042] Figure 6 is a schematic diagram of a detail structure in the tertiary hydrolysis tank in the embodiment of the present application.

[0043] BRIEF DESCRIPTION OF THE DRAWINGS 1, rack; 2, circulating pump; 21, third water inlet pipe; 3, air inlet device; 31, feeding assembly; 311, feeding pipe; 312, flushing pipe; 313, connecting pipe; 314, isolation pipe; 3141, air curtain pipe; 315, blowdown pipe; 3151, flush butterfly valve; 32, flushing assembly; 321, flushing disc; 3211, flushing cavity; 3212, connecting hole; 322, first water inlet pipe; 323, second water inlet pipe; 324, control valve; 33, wall scraping assembly; 331, scraping air cylinder; 332, scraper; 34, first connecting assembly; 341, first connecting block; 3411, connecting groove; 342, second connecting block; 3421, locking hole; 343, first connecting plate; 345, locking piece; 346, second connecting plate; 347, first connecting disc; 348, second connecting disc; 35, second connecting assembly; 4, reaction device; 41, hydrolysis assembly; 42, primary hydrolysis tank; 421, first hydrolysis zone; 422, first spraying zone; 423, blocking plate; 424, blocking through hole; 43, secondary hydrolysis tank; 431, support plate; 432, second hydrolysis zone; 433, second spraying zone; 434, tail gas through hole one; 435, tail gas through hole two; 44, tertiary hydrolysis tank; 441, filter plate; 442, through hole; 443, gas outlet tank; 5, spraying assembly; 51, first water outlet pipe; 511, first spraying air exposure pipe; 512, first spraying pipe; 52, second water outlet pipe; 521, second spraying pipe; 522, water supplement pipe; 53, third water outlet pipe; 531, one-way spraying pipe; 532, two-way spraying pipe; 54, water return pipe; 6, reinforcing assembly; 61, connecting plate; 611, communication hole; 612, reinforcing hole; 62, water storage pipe; 621, tumbling hole; 63, communication pipe; 631, plugging plate; 64, partition plate; 641, connecting ring; 642, water supplement hole; 65, limiting block; 7, guide assembly; 71, receiving pipe; 711, overflow hole; 72, guide plate; 8, gas outlet pipe. Detailed Implementation

[0044] The following is in conjunction with the appendix Figures 1-6 This application will be described in further detail.

[0045] This application discloses an exhaust gas purification device for EPI epitaxial processes, such as... Figure 1 As shown, the device includes a frame 1, an air intake device 3, and a reaction device 4. Both the air intake device 3 and the reaction device 4 are located inside the frame 1. The exhaust gas generated after the reaction of trichlorosilane enters the reaction device 4 through the air intake device 3, where the toxic and harmful substances contained in the exhaust gas are decomposed and treated, so that the exhaust gas emitted into the atmosphere meets environmental protection requirements. When the exhaust gas purification equipment is running, the entire internal environment is under negative pressure.

[0046] like Figure 1 and 2 As shown, the air intake device 3 includes a feeding assembly 31 and a flushing assembly 32. The feeding assembly 31 includes a feeding pipe 311, a flushing pipe 312, and a connecting pipe 313. One end of the feeding pipe 311 is connected to the trichlorosilane reaction chamber, and the other end is connected to the flushing pipe 312. The feeding pipe 311, the flushing pipe 312, and the connecting pipe 313 are connected in sequence. The end of the connecting pipe 313 away from the flushing pipe 312 is connected to the reaction device 4.

[0047] like Figure 1 and 2 As shown, the rinsing assembly 32 includes a first rinsing component and a second rinsing component. The first rinsing component is disposed on the rinsing pipe 312 and is used to pass clean water into the rinsing pipe 312. The second rinsing component is disposed on the connecting pipe 313 and is used to pass clean water into the connecting pipe 313. The clean water cleans the inner walls of the rinsing pipe 312 and the connecting pipe 313, making it less likely for silica powder to adhere to the inner walls of the rinsing pipe 312 and the connecting pipe 313.

[0048] like Figure 1 and 2As shown, the circulating pump 2 is arranged in the rack 1, the first flushing member includes a flushing disc 321 and a first water inlet pipe 322, the flushing disc 321 is sleeved on the flushing pipe 312, the flushing disc 321 is provided with a flushing cavity 3211, the first water inlet pipe 322 extends into the flushing disc 321 and communicates with the flushing cavity 3211, the flushing disc 321 is provided with a plurality of connecting holes 3212 for connecting the flushing cavity 3211 and the flushing pipe 312, the axes of the plurality of connecting holes 3212 and the axis of the flushing cavity 3211 form acute angles, and the axes of the plurality of connecting holes 3212 are inclined along the axis of the flushing cavity 3211 in the same direction. The end of the first water inlet pipe 322 away from the flushing disc 321 communicates with the circulating pump 2. The second flushing member includes a second water inlet pipe 323 and a control valve 324, one end of the second water inlet pipe 323 communicates with the control valve 324, and the other end communicates with the connecting pipe 313. The third water inlet pipe 21 is further connected to the circulating pump 2, and the end of the control valve 324 away from the second water inlet pipe 323 communicates with the circulating pump 2 through the third water inlet pipe 21.

[0049] When the operator uses the tail gas treatment equipment to treat the tail gas, the operator introduces the tail gas into the feed pipe 311, because the equipment is running, the internal environment is negative pressure, the tail gas automatically enters the flushing pipe 312 through the feed pipe 311. The water vapor in the reaction device 4 is overflowed through the connecting pipe 313, and the tail gas reacts with the water vapor during movement to produce a small amount of silicon dioxide powder. In order to prevent the silicon dioxide powder from adhering to the inner wall of the flushing pipe 312 and the connecting pipe 313, the circulating pump 2 is started, and the clean water is introduced into the flushing cavity 3211 through the first water inlet pipe 322, and then introduced into the flushing pipe 312 through the plurality of connecting holes 3212, so that a vortex-shaped water curtain is formed in the flushing pipe 312, and the inner wall of the flushing pipe 312 is cleaned. At the same time, the control valve 324 is opened, so that the second water inlet pipe 323 and the third water inlet pipe 21 are communicated, the clean water enters the second water inlet pipe 323 through the third water inlet pipe 21, and then enters the connecting pipe 313, so that the inner wall of the connecting pipe 313 can be cleaned, the adhesion or even accumulation of the silicon dioxide powder is reduced, and the possibility of blockage of the feed pipe 311, the flushing pipe 312 and the connecting pipe 313 is reduced.

[0050] As Figure 1As shown, in order to facilitate the operator to control the control valve 324 more accurately, the feed pipe 311 is connected with a pressure detector (not shown in the figure), and the output end of the pressure detector extends into the feed pipe 311. The end of the connecting pipe 313 away from the flushing pipe 312 is communicated with a blowdown pipe 315, and the blowdown pipe 315 is provided with a flush butterfly valve 3151, and the butterfly valve is in a closed state when the tail gas treatment equipment is normally operated. According to the program setting, in the process of treating tail gas, the pressure detector detects the pressure in the feed pipe 311 in real time, and when the detection value of the pressure detector is higher than the pressure set threshold value in the feed pipe 311, the control valve 324 is started, and the clean water is introduced into the connecting pipe 313 to clean the inner wall of the connecting pipe 313; when the detection value of the pressure detector still does not meet the pressure set threshold value in the feed pipe 311 after cleaning, the flush butterfly valve 3151 is opened, so that the blowdown pipe 315 is communicated with the connecting pipe 313, at this time, the clean water in the flushing pipe 312 and the connecting pipe 313 can flush the silicon dioxide powder in the flushing pipe 312 and the connecting pipe 313 into the blowdown pipe 315, so that the silicon dioxide powder is discharged from the blowdown pipe 315.

[0051] As shown in Figure 1 and 2 shown, the feed assembly 31 further comprises an insulation pipe 314 connected to the end of the flushing pipe 312 away from the connecting pipe 313, and the insulation pipe 314 is connected with the feed pipe 311. The insulation pipe 314 is communicated with an air curtain pipe 3141, and the air curtain pipe 3141 is used to introduce nitrogen into the insulation pipe 314. Since the reaction of trichlorosilane with water is an exothermic reaction, it is easy for the clean water in the flushing pipe 312 and the connecting pipe 313 to generate part of water vapor, and after the water vapor contacts with the inner wall of the feed pipe 311, it is easy to generate small water droplets on the inner wall of the feed pipe 311. After the tail gas enters the feed pipe 311, it is more likely to react with the part of water droplets to generate silicon dioxide powder and adhere to the inner wall of the feed pipe 311. The nitrogen entering the insulation pipe 314 can form an air curtain to block the water vapor, reduce the possibility of reaction of the tail gas in the feed pipe 311, reduce the possibility of generating silicon dioxide powder and adhering to the inner wall of the feed pipe 311, and further reduce the possibility of blocking the feed pipe 311.

[0052] As shown in Figure 1As shown, the air inlet device 3 further comprises a wall scraping assembly 33, which comprises a scraping plate 332 and a scraping driving source, which is a scraping cylinder 331, the cylinder body of which is fixedly connected to one end of the insulation pipe 314 away from the flushing pipe 312. The scraping plate 332 is arranged in the insulation pipe 314 and is fixedly connected to the end of the piston rod of the scraping cylinder 331. When the water curtain in the flushing pipe 312 still has some water vapor overflowing into the insulation pipe 314, and the tail gas enters the flushing pipe 312 through the feed pipe 311, it is easy to react with the water vapor in the insulation pipe 314 when passing through the insulation pipe 314, generating silicon dioxide powder attached to the inner wall of the insulation pipe 314. According to the program setting, the scraping cylinder 331 can be started regularly, and after the scraping cylinder 331 is started, the scraping plate 332 is driven to move along the insulation pipe 314 towards the flushing pipe 312, and the silicon dioxide powder attached to the wall is scraped off, and the powder is pushed to the vortex-shaped spray water curtain, and under the action of the vortex water curtain, the powder is cleaned.

[0053] As shown in Figure 1 and 2 In order to facilitate cleaning of the flushing pipe 312 and the connecting pipe 313, the first connecting assembly 34 is connected between the feed pipe 311 and the flushing pipe 312, and the second connecting assembly 35 is connected between the flushing pipe 312 and the connecting pipe 313.

[0054] As shown in Figure 2 The first connecting assembly 34 and the second connecting assembly 35 each comprise a first connecting block 341 and a second connecting block 342, and two adjacent first connecting blocks 341 are connected by a first connecting plate 343, and the first connecting plate 343 is rotatably connected with the two adjacent first connecting blocks 341, and two adjacent second connecting blocks 342 are connected by a locking member 345. The second connecting block 342 and the adjacent first connecting block 341 are connected by a second connecting plate 346, one end of the second connecting plate 346 is rotatably connected with the adjacent first connecting block 341, and the other end is rotatably connected with the adjacent second connecting block 342.

[0055] As shown in Figure 2 The first connecting disc 347 is connected to one end of the flushing pipe 312 close to the connecting pipe 313 and one end of the feed pipe 311 close to the flushing pipe 312, and the second connecting disc 348 is arranged on one end of the connecting pipe 313 close to the flushing pipe 312 and one end of the feed pipe 311 close to the flushing pipe 312, and the second connecting disc 348 abuts against the corresponding first connecting disc 347. The first connecting block 341 and the second connecting block 342 are each provided with a connecting groove 3411, and the first connecting disc 347 and the second connecting disc 348 are arranged in the corresponding connecting groove 3411.

[0056] As shown in Figure 2As shown, the locking member 345 comprises a locking rod, and locking holes 3421 are formed in the two adjacent second connecting blocks 342, and the locking rod is arranged in the locking holes 3421 and is in threaded connection with the inner walls of the locking holes 3421.

[0057] When the flushing pipe 312 and the connecting pipe 313 need to be used, the operator abuts the first connecting disc 347 on the flushing pipe 312 against the second connecting disc 348 on the feeding pipe 311, and then arranges each first connecting block 341 and second connecting block 342 outside the first connecting disc 347 and the second connecting disc 348, and then the operator presses each first connecting block 341 and second connecting block 342, so that the first connecting disc 347 and the second connecting disc 348 are clamped into the corresponding connecting grooves 3411. The operator rotates the locking rod, and at the same time, the operator limits one of the second connecting blocks 342, at this time, the locking rod drives the two adjacent second connecting blocks 342 to move towards the opposite direction, and when the first connecting disc 347 and the second connecting disc 348 abut against the inner walls of the corresponding connecting grooves 3411, the connection between the flushing pipe 312 and the feeding pipe 311 is completed, and the installation mode between the flushing pipe 312 and the connecting pipe 313 is also as described above, which will not be repeated here.

[0058] When the flushing pipe 312 and the connecting pipe 313 need to be disassembled, the operator limits one of the second connecting blocks 342, and then rotates the locking rod, which drives the two adjacent second connecting blocks 342 to move towards the opposite direction, and then the operator moves each first connecting block 341 and second connecting block 342 away from the first connecting disc 347 and the second connecting disc 348, so that the first connecting disc 347 and the second connecting disc 348 are separated from the corresponding connecting grooves 3411, at this time, the operator can separate the flushing pipe 312 or the connecting pipe 313, so as to clean the inner walls of the flushing pipe 312 and the connecting pipe 313 respectively.

[0059] As shown in Figure 1 and 3 The reaction device 4 comprises a hydrolysis assembly 41 and a spraying assembly 5, the hydrolysis assembly 41 comprises a first-stage hydrolysis tank 42, a second-stage hydrolysis tank 43 and a third-stage hydrolysis tank 44, the first-stage hydrolysis tank 42, the second-stage hydrolysis tank 43 and the third-stage hydrolysis tank 44 are connected in sequence, and the bottoms of the three are communicated. The connecting pipe 313 is communicated with the first-stage hydrolysis tank 42. The spraying assembly 5 comprises a first water outlet pipe 51, a second water outlet pipe 52, a third water outlet pipe 53 and a water return pipe 54, the first water outlet pipe 51, the second water outlet pipe 52, the third water outlet pipe 53 and the water return pipe 54 are all communicated with the circulating pump 2, and the circulating pump 2 enables the whole air inlet device 3 and the whole reaction device 4 to be communicated and circulated.

[0060] As shown in Figure 3As shown, the first hydrolysis box 42 comprises a first hydrolysis zone 421 and a first spraying zone 422, and the first water outlet pipe 51 comprises a first spraying air exposure pipe 511 and a plurality of first spraying pipes 512. The first spraying air exposure pipe 511 is a Venturi pipe, and is arranged at the lower part of the first hydrolysis box 42 and in the first hydrolysis zone 421. The plurality of first spraying pipes 512 are arranged in the first spraying zone 422 and are uniformly arranged along the height direction of the first spraying zone 422. The water return pipe 54 extends into the first hydrolysis zone 421 from the end away from the circulating pump 2 and is in communication.

[0061] As shown in Figure 3 , the tail gas enters the first hydrolysis box 42 through the connecting pipe 313, the first spraying air exposure pipe 511 sprays upward, driving the tail gas to move upward at high speed; at the same time, the plurality of second spraying pipes 521 spray downward, and the second spraying pipes 521 cooperate with the first spraying air exposure pipe 511 to keep the water in the first hydrolysis box 42 in a turbulent state, so that the silicon dioxide powder produced after the reaction of the tail gas with the water is mixed with the water to form a suspension, reducing the possibility of the silicon dioxide powder adhering to the inner wall of the first hydrolysis box 42.

[0062] As shown in Figure 3 and 4 , the second water outlet pipe 52 comprises a second spraying pipe 521 and a water supplement pipe 522. The second spraying pipe 521 is arranged in the second hydrolysis box 43 and is a Venturi pipe. The second spraying pipe 521 is fixedly connected to the inner top wall of the second hydrolysis box 43. The second hydrolysis box 43 is provided with a reinforcing assembly 6. The reinforcing assembly 6 comprises a connecting plate 61, a water storage pipe 62 and a communication pipe 63. The inner wall of the second hydrolysis box 43 is fixedly connected with a support plate 431. The surface of the connecting plate 61 abuts against the surface of the support plate 431, so that the connecting plate 61 is movably connected to the second hydrolysis box 43. The connecting plate 61 divides the second hydrolysis box 43 into a second hydrolysis zone 432 and a second spraying zone 433. The second hydrolysis zone 432 is located below the second spraying zone 433.

[0063] As shown in Figure 4 and 5As shown, the second spraying area 433 is provided with a tail gas through hole one 434, and the tail gas moves from the first spraying area 422 to the second spraying area 433 through the tail gas through hole one 434. The second spraying pipe 521 is fixedly connected to the inner top wall of the second spraying area 433, and the second spraying pipe 521 sprays downward; the water storage pipe 62 is fixedly connected to the connecting plate 61 and located in the second spraying area 433. The water storage pipe 62 is provided with a partition plate 64, the partition plate 64 is provided with a connecting ring 641, and the connecting pipe 63 is screwedly connected to the connecting ring 641. The connecting plate 61 is provided with a communication hole 611 and a reinforcing hole 612, one end of the connecting pipe 63 is aligned with the second spraying pipe 521 in communication, and the other end of the connecting pipe 63 is located in the communication hole 611 and communicates with the second hydrolysis area 432; the end portion of the connecting pipe 63 is fixedly connected with a blocking plate 631 around the outer wall, and the blocking plate 631 is used for blocking the reinforcing hole 612. The connecting pipe 63, the partition plate 64 and the inner wall of the water storage pipe 62 form a reinforcing cavity. The partition plate 64 is provided with a water supplement hole 642, the water supplement pipe 522 supplements water into the water storage pipe 62, and the water flow enters the reinforcing cavity through the water supplement hole 642. The pipe wall of the water storage pipe 62 is provided with a tumbling hole 621 around and located in the reinforcing cavity, and the water flow entering the reinforcing cavity flows out to the second spraying area 433 through the tumbling hole 621, so that the water in the second spraying area 433 is always in a tumbling state.

[0064] As shown in Figure 4 and 5 When the tail gas enters the second spraying area 433 from the first spraying area 422, the second spraying pipe 521 sprays high-speed water flow into the second spraying area 433, so that the entering tail gas reacts with water quickly. Since the second spraying pipe 521 communicates with the connecting pipe 63, the second spraying pipe 521 sprays toward the connecting pipe 63, so that the water flow carrying the generated silicon dioxide powder quickly enters the second hydrolysis area 432 through the connecting pipe 63. The water supplement pipe 522 supplements water into the reinforcing cavity, and the water flow continuously flows out through the tumbling hole 621, so that the water in the second spraying area 433 is always in a tumbling state, which is beneficial to mixing the generated silicon dioxide powder with water to form a suspension, and reduces the possibility of the silicon dioxide powder adhering to the inner wall of the box. At this time, the connecting pipe 63 is located in the communication hole 611, the blocking plate 631 blocks the reinforcing hole 612, and the reinforcing cavity and the second hydrolysis area 432 are in a state of being cut off;

[0065] The water supplement pipe 522 continuously supplements water into the reinforcing cavity, and the water level in the reinforcing cavity is continuously raised. Under the action of buoyancy, the partition plate 64, the communication pipe 63 and the blocking plate 631 are synchronously moved upward, so that the reinforcing hole 612 is in communication with the reinforcing cavity, and the reinforcing cavity is in communication with the second hydrolysis area 432. Then, the water flow in the reinforcing cavity rapidly flows into the second hydrolysis area 432 from the reinforcing hole 612, further carries the generated silicon dioxide powder in the second spraying area 433 into the second hydrolysis area 432, and reduces the silicon dioxide powder residues or accumulation in the reinforcing cavity, the wall of the water storage pipe 62 and the second spraying area 433. After the water in the reinforcing cavity overflows, the partition plate 64, the communication pipe 63 and the blocking plate 631 automatically descend, and the blocking plate 631 again blocks the reinforcing hole 612, so that the reinforcing hole 612 is separated from the reinforcing cavity, and the water in the reinforcing cavity is continuously stored.

[0066] As shown in Figure 5 , in order to prevent the communication pipe 63 from being separated from the communication hole 611 during the lifting movement, the floating height of the partition plate 64 and the communication pipe 63 needs to be limited. The inner wall of the water storage pipe 62 is fixedly connected with a limiting block 65, and the limiting block 65 abuts against the plate surface of the partition plate 64. The communication pipe 63 and the partition plate 64 float upward under the action of water flow buoyancy, and stop rising when the plate surface of the partition plate 64 abuts against the limiting block 65. At this time, the communication of the reinforcing hole 612 can be realized, and the relative position stability between the communication pipe 63 and the hole wall of the communication hole 611 can be guaranteed, so as to facilitate the resetting of the communication pipe 63 and the blocking plate 631.

[0067] As shown in Figure 3 and 4 , since the pipe opening of the backwater pipe 54 is arranged in the first hydrolysis box 42, in order to reduce the possibility that the silicon dioxide powder blocks the backwater pipe 54, the second hydrolysis box 43 is further provided with a guide assembly 7. The guide assembly 7 includes a receiving pipe 71 and a flow guide plate 72. The receiving pipe 71 is fixedly connected to the bottom of the second hydrolysis area 432, and water is always contained in the receiving pipe 71. The receiving pipe 71 is in communication with the communication pipe 63. The side wall of the receiving pipe 71 is provided with an overflow hole 711, and the flow guide plate 72 is fixedly connected to the side wall of the receiving pipe 71 and located on the side of the hole wall of the overflow hole 711. The flow guide plate 72 is arc-shaped, and the arc surface of the flow guide plate 72 faces one side of the third hydrolysis box 44.

[0068] As shown in Figure 4As shown, the water flow with silica powder flows rapidly, passes through the communication pipe 63 and then falls into the receiving pipe 71. Since there is always water in the receiving pipe 71, the falling suspension can be buffered, reducing the splashing of the water flow and the silica powder. The water and silica powder entering the receiving pipe 71 are discharged through the overflow hole 711, so that the receiving pipe 71 is not easy to accumulate too much silica powder. The suspension formed by the silica powder and water moves towards the side of the third hydrolysis box 44 under the guidance of the flow guide plate 72, reducing the possibility of backflow of the suspension to the first hydrolysis box 42. In order to facilitate the remaining tail gas to enter the third hydrolysis box 44, the second hydrolysis area 432 is provided with a tail gas through hole two 435.

[0069] As shown in Figure 3 If part of the suspension still backflows into the first hydrolysis box 42, in order to further block the silica powder, the first hydrolysis area 421 is fixedly connected with a blocking plate 423 at the bottom. The blocking plate 423 is arranged around the opening of the backwater pipe 54, and a plurality of blocking through holes 424 are formed in the blocking plate 423. The blocking through holes 424 are beneficial to the backflow of water in the reaction device 4.

[0070] As shown in Figure 3 , 4 and 6, the third hydrolysis box 44 is fixedly connected with a filter plate 441 and an air outlet box 443. The filter plate 441 is provided with a plurality of through holes 442, and the air outlet box 443 is connected with an air outlet pipe 8 at the top. A plurality of gas-liquid separation balls (not shown in the figure) are placed in the filter plate 441 and the air outlet box 443. The third water outlet pipe 53 includes a spray pipe 531 and a spray pipe 532. The spray pipe 531 passes through the air outlet box 443 and is located in the third hydrolysis box 44. The spray pipe 531 is provided with two, and the spray pipe 532 is located in the air outlet box 443. The spray pipe 531 and the spray pipe 532 are both downwardly sprayed.

[0071] The tail gas enters the third hydrolysis box 44 through the tail gas through hole two 435 and continuously reacts with water. The silica powder is blocked below the filter plate 441, and the tail gas continues to move upward in the third hydrolysis box 44 through the through hole 442. Under the action of the spray pipe 531 and the spray pipe 532, the tail gas is further purified. After passing through the gas-liquid separation ball, the purified tail gas is separated from the water, so that the tail gas meets the emission standard and is then discharged through the air outlet pipe 8.

[0072] The implementation principle of the tail gas purification equipment for the EPI epitaxial process is as follows:

[0073] When the tail gas is treated by the tail gas treatment device, the tail gas is automatically introduced into the flushing pipe 312 after being introduced into the feed pipe 311. The water vapor in the reaction device 4 is overflowed through the connecting pipe 313. In order to prevent the generated silica powder from being easily adhered to the inner wall of the flushing pipe 312 and the connecting pipe 313, the clean water is introduced into the flushing cavity 3211 through the first water inlet pipe 322, and then is introduced into the flushing pipe 312 through the connecting holes 3212, so that the vortex-shaped water curtain is formed in the flushing pipe 312, and the inner wall of the flushing pipe 312 is cleaned. The clean water is introduced into the second water inlet pipe 323 through the third water inlet pipe 21, and the inner wall of the connecting pipe 313 is cleaned.

[0074] The tail gas enters the first hydrolysis box 42, the first spraying pipe 511 sprays upward, and the second spraying pipe 521 sprays downward. The second spraying pipe 521 cooperates with the first spraying pipe 511, so that the water in the first hydrolysis box 42 is always in a turbulent state. The silica powder generated by the reaction of the tail gas and the water forms a suspension, which reduces the possibility of the silica powder adhering to the inner wall of the first hydrolysis box 42.

[0075] When the tail gas enters the second spraying area 433 from the first spraying area 422, the second spraying pipe 521 sprays high-speed water flow into the second spraying area 433, so that the entering tail gas reacts with water quickly. Since the second spraying pipe 521 is communicated with the connecting pipe 63, the second spraying pipe 521 sprays toward the connecting pipe 63, so that the water flow carries the generated silica powder quickly through the connecting pipe 63 into the second hydrolysis area 432. The water supplement pipe 522 supplements water into the reinforced cavity, and the water flow continuously overflows outward through the turbulent hole 621, so that the water in the second spraying area 433 is always in a turbulent state. The adhesion and even the accumulation of the silica powder are reduced, the possibility of equipment blockage is reduced, the smoothness of equipment operation is improved, and the service life of the equipment is prolonged.

[0076] The above are the preferred embodiments of the present application, which do not limit the protection scope of the present application. Therefore, any equivalent changes made on the basis of the structure, shape, and principle of the present application should be covered by the protection scope of the present application.

Claims

1. An apparatus for purifying exhaust gas for an EPI epitaxial process, characterized by comprising: Comprise: Rack (1), which is provided with circulating pump (2); Hydrolysis assembly (41), which includes primary hydrolysis box (42), which is filled with clean water, which is used for purifying tail gas, which is communicated with gas outlet pipe (8), through which the purified tail gas is discharged; Spray assembly (5), which includes first water outlet pipe (51) and backwater pipe (54), both of which are communicated with circulating pump (2), the first water outlet pipe (51) is arranged in the primary hydrolysis box (42), and is used for spraying in the primary hydrolysis box (42), and the backwater pipe (54) is communicated with the primary hydrolysis box (42); Feed assembly (31), which includes feed pipe (311) and connecting pipe (313), the feed pipe (311) is communicated with the connecting pipe (313), one end of the feed pipe (311) away from the connecting pipe (313) is communicated with the trichlorosilane reaction cavity, and one end of the connecting pipe (313) away from the feed pipe (311) is communicated with the primary hydrolysis box (42); The flushing assembly (32) is used for flushing the inner wall of the pipeline in the feed assembly (31); Wherein, when the tail gas purification equipment is running, the feed pipe (311), the connecting pipe (313), the primary hydrolysis box (42) and the gas outlet pipe (8) are in a negative pressure state; The feed assembly (31) further includes flushing pipe (312), the feed pipe (311), the flushing pipe (312) and the connecting pipe (313) are connected in sequence, the flushing assembly (32) includes first flushing part and second flushing part, the first flushing part is arranged on the flushing pipe (312) and used for introducing clean water into the flushing pipe (312), the second flushing part is arranged on the connecting pipe (313) and used for introducing clean water into the connecting pipe (313), the first flushing part includes flushing disc (321) and first water inlet pipe (322), the flushing disc (321) is sleeved on the flushing pipe (312), the flushing disc (321) is provided with flushing cavity (3211), the first water inlet pipe (322) extends into the flushing disc (321) and is communicated with the flushing cavity (3211), a plurality of connecting holes (3212) for connecting the flushing cavity (3211) and the flushing pipe (312) are formed in the flushing disc (321), and one end of the first water inlet pipe (322) away from the flushing disc (321) is communicated with the circulating pump (2).The second flushing member comprises a second water inlet pipe (323) and a control valve (324), one end of the second water inlet pipe (323) is communicated with the control valve (324), the other end is communicated with the connecting pipe (313), a third water inlet pipe (21) is arranged on the circulating pump (2), and the end, away from the second water inlet pipe (323), of the control valve (324) is communicated with the circulating pump (2) through the third water inlet pipe (21); the feeding assembly (31) further comprises an isolation pipe (314), the isolation pipe (314) is connected to the end, away from the connecting pipe (313), of the flushing pipe (312), and the isolation pipe (314) is connected with the feeding pipe (311), the isolation pipe (314) is communicated with an air curtain pipe (3141), and the air curtain pipe (3141) is used for introducing nitrogen into the isolation pipe (314).

2. The exhaust gas purification apparatus for an EPI epitaxial process according to claim 1, characterized by: Further comprising a wall scraping assembly (33), the wall scraping assembly (33) comprising a scraping plate (332) and a scraping driving source, the scraping driving source being arranged at one end of the insulation pipe (314) away from the flushing pipe (312), the scraping plate (332) being arranged in the insulation pipe (314), and the scraping driving source being used to drive the scraping plate (332) to move axially along the insulation pipe (314).

3. The exhaust gas purification apparatus for an EPI epitaxial process according to claim 1, characterized by: The first hydrolysis box (42) comprises a first hydrolysis zone (421) and a first spraying zone (422), and the first water outlet pipe (51) comprises a first spraying air exposure pipe (511) and a plurality of first spraying pipes (512), the first spraying air exposure pipe (511) being a Venturi pipe, the first spraying air exposure pipe (511) being arranged at the lower part of the first hydrolysis box (42) and located in the first hydrolysis zone (421), and the plurality of first spraying pipes (512) being arranged in the first spraying zone (422) and arranged along the height direction of the first spraying zone (422), the spraying directions of the first spraying air exposure pipe (511) and the first spraying pipes (512) being opposite.

4. The apparatus for purifying exhaust gas for an EPI epitaxial process according to claim 1, characterized in that: The hydrolysis assembly (41) further comprises a second hydrolysis box (43), the first hydrolysis box (42) and the second hydrolysis box (43) being connected and the bottoms of the two being communicated, and the spraying assembly (5) further comprises a second water outlet pipe (52), the second water outlet pipe (52) comprising a second spraying pipe (521), the second spraying pipe (521) being arranged on the top wall of the second hydrolysis box (43); the second hydrolysis box (43) is provided with a reinforcing assembly (6), the reinforcing assembly (6) comprising a connecting plate (61) and a communication pipe (63), the connecting plate (61) being movably arranged in the second hydrolysis box (43), the connecting plate (61) dividing the second hydrolysis box (43) into a second hydrolysis zone (432) and a second spraying zone (433), the second hydrolysis zone (432) being located below the second spraying zone (433); the connecting plate (61) is provided with a communication hole (611), one end of the communication pipe (63) being communicated with the second spraying pipe (521), and the other end of the communication pipe (63) being located in the communication hole (611) and communicated with the second hydrolysis zone (432).

5. The apparatus for purifying exhaust gas for an EPI epitaxial process according to claim 4, characterized by: The reinforcing assembly (6) further comprises a water storage pipe (62), the pipe wall of the water storage pipe (62) being provided with a tumbling hole (621), and the second water outlet pipe (52) further comprises a water supplement pipe (522), the water supplement pipe (522) being used to supplement water into the water storage pipe (62).

6. The apparatus according to claim 5, wherein: The water storage pipe (62) is provided with a partition plate (64), the communication pipe (63) and the partition plate (64) being fixed oppositely, the partition plate (64) being provided with a water supplement hole (642), and a reinforcing cavity being formed between the communication pipe (63), the partition plate (64) and the inner wall of the water storage pipe (62), the connecting plate (61) being further provided with a reinforcing hole (612), and the outer wall of the communication pipe (63) being provided with a blocking plate (631), the blocking plate (631) being used to block the reinforcing hole (612).

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